JPH0357138A - Manufacture of spacer of plasma display panel - Google Patents
Manufacture of spacer of plasma display panelInfo
- Publication number
- JPH0357138A JPH0357138A JP19496589A JP19496589A JPH0357138A JP H0357138 A JPH0357138 A JP H0357138A JP 19496589 A JP19496589 A JP 19496589A JP 19496589 A JP19496589 A JP 19496589A JP H0357138 A JPH0357138 A JP H0357138A
- Authority
- JP
- Japan
- Prior art keywords
- spacer
- dry film
- dielectric paste
- plasma display
- paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000006850 spacer group Chemical group 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000001035 drying Methods 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 14
- 229920002120 photoresistant polymer Polymers 0.000 claims description 14
- 239000011521 glass Substances 0.000 abstract description 7
- 239000000843 powder Substances 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 5
- 238000000206 photolithography Methods 0.000 abstract description 4
- 239000011230 binding agent Substances 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 11
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 238000010304 firing Methods 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- -1 AJ20 Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は情報表示端末や平面型のテレビ等に利用される
プラズマティスプレイに係り、特にプラズマディスプレ
イパネルの重要な構成部分であるスペーサーを高精細，
高アスベクトに形成する製造方法に関する．
〔従来の技術〕
プラズマディスプレイは放電による可視光あるいは紫外
線光の発生を利用して発光表示を行なうものであるが、
放電表示画素の画定や放電空間ギャップを確保するため
のスペーサーが必要である．スペーサーの形状としては
格子状のものや、ひとつひとつの画素を画定する升目状
のものがあり、通常、誘電体ペーストをスクリーン印刷
し焼成することにより製造されている。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to plasma displays used in information display terminals, flat-panel televisions, etc., and in particular improves spacers, which are important components of plasma display panels. definition,
This article relates to a manufacturing method for forming high asvect. [Prior Art] Plasma displays perform luminescent displays using visible light or ultraviolet light generated by electrical discharge.
A spacer is required to define the discharge display pixels and ensure the discharge space gap. The shape of the spacer includes a grid-like shape and a square-like shape that defines each pixel, and is usually manufactured by screen printing a dielectric paste and firing it.
なるべく広い放電空間を確保したり、カラー表示用パネ
ルでの蛍光体劣化防止のために蛍光体塗布部と強い放電
領域との距離が必要である等の要請のために、スペーサ
ーとしてはなるべく幅が狭く、ある程度の高さのある形
状とすることが望ましい．また、基板上に形或されてい
る放電電極等とも高い精度で目合せされて形或される必
要がある。従来のスクリーン印刷法は簡便なスペーサー
の形或法ではあるが、細幅で且つ数１０ミクロン以上も
の高さのスペーサーを形成するためには多数回の印刷を
繰り返す必要がある。多い場合には十回以上もの印刷の
繰り返しが要求されている。In order to ensure as wide a discharge space as possible and to prevent deterioration of the phosphor in color display panels, a distance between the phosphor coated area and the strong discharge area is required, so the spacer should be as wide as possible. It is desirable to have a narrow shape with some height. In addition, it is necessary to form the electrodes in alignment with the discharge electrodes formed on the substrate with high precision. Although the conventional screen printing method is a method for forming a simple spacer, it is necessary to repeat printing many times in order to form a spacer with a narrow width and a height of several tens of microns or more. In many cases, printing is required to be repeated ten or more times.
プラズマディスプレイパネルの大面積化，高解像度化に
伴ない、このようなスクリーン印刷法によるスペーサー
製造は増々技術的に困難となり、且つコスト的にも不利
となってきている。As plasma display panels become larger in area and in higher resolution, manufacturing spacers by such a screen printing method is becoming more and more technically difficult and disadvantageous in terms of cost.
本発明は、新規なスペーサー形成法により、容易に高精
細，高アスペクト比のスペーサーを大面積に均一に実現
するものである。The present invention uses a novel spacer formation method to easily realize high-definition, high-aspect-ratio spacers uniformly over a large area.
本発明のプラズマディスプレイのスペーサーの製造方法
は、基板上に少なくとも溝状のパタンを有したホトレジ
スト層を形成する工程と、このホトレジスト層の溝に誘
電体ペーストを充填する工程と、この允填された誘電体
ペーストを乾燥する工程と、前記ホトレジスト層を取り
除く工程と、講部に形成されていた前記誘電体ペースト
を焼成し誘電体の！′Ｒ造物とする工程とを少くとも含
むことを特徴とするものであり、更に、良好なスペーサ
ー形状を実現するためにホトレジスト層の溝に誘電体ペ
ーストを充填する工程と、この誘電体べ一ストを乾燥す
る工程とを少なくとも２回以上繰り返すことを特徴とす
るプラズマディスプレイのスペーサーの製造方法である
。The method for manufacturing a spacer for a plasma display according to the present invention includes the steps of forming a photoresist layer having at least a groove-like pattern on a substrate, filling the grooves of the photoresist layer with a dielectric paste, and filling the grooves with a dielectric paste. A step of drying the dielectric paste, a step of removing the photoresist layer, and a step of baking the dielectric paste formed on the base of the dielectric layer. It is characterized by including at least a step of forming a 'R' structure, and further includes a step of filling the grooves of the photoresist layer with a dielectric paste in order to realize a good spacer shape, and a step of filling the dielectric paste into the groove of the photoresist layer. This method of manufacturing a spacer for a plasma display is characterized by repeating the step of drying the paste at least twice or more.
本発明のスペーサーの製造方法では、基板上にドライフ
ィルム等のホトレジスト層を形成し、ホトリソグラフィ
技術によりスペーサーとなるパタンを形成する。この渦
状に形或された部分にスペーサーの原料となる誘電体ペ
ーストを充填し、乾燥．ホトレジスト層除去，焼成によ
りスペーサーを製造するものである。誘電体ペーストと
して結晶化ガラス粉末や適当なフィラーを混入したもの
を選択して使用することにより、焼成時の形状の崩れを
なくすことができるために、ホトレジス１・層のパタン
を母型としたスペーサー形状を得ることができる。ホト
レジスト層では側壁の切り立った細い溝を大面積にわた
って精度良く形成することは比較的容易であり、これを
利用することにより細幅でだれのないスペーサーを実現
することが可能になった。この方法ではスペーサーの高
さはホトレジスト層の厚さで制御することができ、大面
積にわたって均一なスペーサー高さを実現することも容
易である．
高いスペーサーを製造しようとした場合、スペーサーの
中央部に窪みができ、スペーサーの高さの減少，大きな
ばらつき．及び強度の低下等の問題を生じることがある
．これは、主に誘電体ペースト中の溶剤が気化し、体積
減少となったことが原因となっている．この場合、本発
明の製造方法ではホトレジスト層の溝に誘電体ペースト
を充填後、乾燥させることにより溶剤を気化させ、これ
により出きた窪みに再び誘電体ペーストを充填する。必
要によりこの工程の複数回繰り返すことにより、充分な
強度を有する高いスペーサーを製造することができる。In the method for manufacturing a spacer of the present invention, a photoresist layer such as a dry film is formed on a substrate, and a pattern to become a spacer is formed using photolithography technology. This spiral-shaped part is filled with dielectric paste, which will be the raw material for the spacer, and dried. Spacers are manufactured by removing the photoresist layer and baking. By selecting and using a dielectric paste mixed with crystallized glass powder or an appropriate filler, it is possible to prevent the shape from collapsing during firing. A spacer shape can be obtained. In a photoresist layer, it is relatively easy to accurately form narrow grooves with steep sidewalls over a large area, and by utilizing this, it has become possible to realize a narrow spacer with no droop. In this method, the height of the spacer can be controlled by the thickness of the photoresist layer, and it is easy to achieve a uniform spacer height over a large area. If you try to manufacture a tall spacer, a depression will be created in the center of the spacer, resulting in a decrease in the height of the spacer and large variations. This may cause problems such as a decrease in strength and strength. This is mainly due to the evaporation of the solvent in the dielectric paste, resulting in a volume reduction. In this case, in the manufacturing method of the present invention, the grooves of the photoresist layer are filled with dielectric paste, and then the solvent is vaporized by drying, and the recesses created by this are filled with dielectric paste again. By repeating this process multiple times if necessary, a high spacer with sufficient strength can be manufactured.
？お、誘電体ペースト充填，乾燥後のホトレジスト層の
除去は、溶剤や剥離剤を使用して行なっても良いが、焼
成時に焼き飛ばしても良い。? Note that the photoresist layer may be removed after filling the dielectric paste and drying by using a solvent or a stripping agent, or it may be burnt off during baking.
次に本発明の実施例について図面を参照して説明する．
第２図は本発明の一実施例の平面図である。第３図は第
２図のａ−ａ’における断面図、第４図は第２図のｂ−
ｂ”における断面図である。Next, embodiments of the present invention will be described with reference to the drawings. FIG. 2 is a plan view of one embodiment of the present invention. Figure 3 is a sectional view taken along line a-a' in Figure 2, and figure 4 is a cross-sectional view taken along line b-a' in Figure 2.
FIG.
ガラスよりなる第１絶縁基板１に、列電極２を、例えば
ＩＴＯ， ＡＩ，Ｎｉ，Ａｇ等で形成し、その上に第１
絶縁層３を、例えばガラス層膜やＡＪ２０，薄膜で形成
する。さらにその上に蛍光体４を形成する。ガラスより
なる第２の絶縁基板８には、行電極１０をたとえばＡＪ
ｈ Ｎｉ，Ａｇ等で形成し、その上に第２絶縁層７を、
たとえばガラス厚膜やＡ１■０３薄膜で形成し、その上
に保護層６を、例えばＭｇＯで形或する．さらに第１絶
縁基板１と第２絶縁基板８を相対向させ、所定の放電空
間を得るためのスベーサ−５を形或する。Column electrodes 2 are formed of, for example, ITO, AI, Ni, Ag, etc. on a first insulating substrate 1 made of glass, and the first
The insulating layer 3 is formed of, for example, a glass layer film, AJ20, or a thin film. Further, a phosphor 4 is formed thereon. A second insulating substrate 8 made of glass has row electrodes 10, for example, AJ.
h Ni, Ag, etc., and a second insulating layer 7 is formed thereon.
For example, a thick glass film or a thin A103 film is formed, and a protective layer 6 is formed thereon, for example, from MgO. Further, the first insulating substrate 1 and the second insulating substrate 8 are opposed to each other to form a spacer 5 for obtaining a predetermined discharge space.
プラズマディスプレイパネルは通常１００〜４００ｔｏ
ｒｒ程度のガスを内部に封入する。絶縁基板は大気圧を
受けており、十分な放電空間９を確保しながら、ｆ分な
強度をもったスペーサーとする必要がある。本実施例で
は高解像度表示を目的として、スペーサーの設計幅を０
．０８ｎｎとした．このスペーサー製造方法を第１図Ａ
〜Ｇを参照として説明する．
Ａ，ガラス基板上に行電極１０，第２絶縁層７，保護層
６を形或して第２絶縁基板８を用意する．
Ｂ 工程Ａで用意した第２絶縁基板８にドライフィルム
１１を貼付する。Plasma display panels are usually 100 to 400 to
Gas of about rr is sealed inside. Since the insulating substrate is exposed to atmospheric pressure, it is necessary to provide a spacer with a strength corresponding to f while ensuring a sufficient discharge space 9. In this example, the design width of the spacer is set to 0 for the purpose of high resolution display.
．． 08nn. This spacer manufacturing method is shown in Figure 1A.
This will be explained using ~G as a reference. A. A second insulating substrate 8 is prepared by forming row electrodes 10, a second insulating layer 7, and a protective layer 6 on a glass substrate. B. A dry film 11 is attached to the second insulating substrate 8 prepared in step A.
Ｃ，ホトリソグラフィーによりドライフイルム１１にス
ベーサ−５のネガパターンを形或する．溝２０の幅は０
．０８開である．
Ｄ．王程Ｃで形成したドライフイルムの溝に、スベーサ
−５の材料、例えばＰｂＯ粉末とＡＪ，（＞３粉末をバ
インダー溶剤と混合したペーストを充填する。C. Form a negative pattern of the substrate 5 on the dry film 11 by photolithography. The width of the groove 20 is 0
．． It opens in 08. D. The grooves of the dry film formed by Wang Cheng C are filled with a paste of the material of Subaser 5, such as PbO powder and AJ, (>3 powder) mixed with a binder solvent.
Ｅ．基板を１００〜１５０℃程度で乾燥させる。これに
よりバインダーが気化し、図の如く、スベーサ−５の中
央部にへこみか生じる。E. The substrate is dried at about 100 to 150°C. As a result, the binder is vaporized, and a depression is formed in the center of the spacer 5, as shown in the figure.
Ｆ，スベーサ−５の中央部に生じたへこみにべ一ストを
充填する。この後、必要に応じＥ→Ｆの工程を数回くり
かえす。F. Fill the dent formed in the center of the baser 5 with paste. After this, repeat the process from E to F several times as necessary.
Ｇ．ドライフィルム１１を薬液で除去し、５８０℃で焼
成することによりスペーサ−５を完成させる。なお、ド
ライフィルムの薬液除去をせず、’ ５ ８ ０℃の焼
成でドライフィルムをスペーサー焼成と同時に除去して
も同じ結果が得られた。G. The dry film 11 is removed with a chemical solution and fired at 580°C to complete the spacer 5. Note that the same result was obtained even if the dry film was removed at the same time as the spacer firing by firing at 580° C. without removing the chemical solution from the dry film.
以上、スペーサー製造の実施例を説明したが、必要とさ
れるスペーサーの高さが数１０ミクロン以下の低い場合
は、ペーストの充填は一度で実用上ほぼ問題がなかった
が、スペーサーの高さが１００ミクロン程度では２回程
度のペースト充填が有効であり、更に厚い場合には３度
以上の繰り返しが必要であった．この様な最適化により
、断面形状がほぼ直方形で高いアスベクト比の良好なス
ペーサー形状を実現することができた．また、行電極１
０との位置精度も数ミクロン以下であり実用上十分であ
った。The examples of spacer manufacturing have been described above, but if the height of the required spacer is as low as several tens of microns or less, there is almost no practical problem in filling the paste once, but if the height of the spacer is For a thickness of about 100 microns, it is effective to fill the paste about two times, and for thicker cases, it is necessary to repeat the filling three times or more. Through this optimization, we were able to create a spacer with a nearly rectangular cross-sectional shape and a high aspect ratio. In addition, row electrode 1
The positional accuracy with respect to 0 was also several microns or less, which was sufficient for practical use.
なお、本実施例では第２絶縁基板にスペーサーを形成し
たが、第１絶縁基板にスペーサーを形或する場合でも同
様の工程で製造することができた．また、本発明の方法
はスペーサー形状には関係はなく、縞状や枡目状等の種
々のものに適用することができる．
〔発明の効果〕
本発明のスペーサーの製造方法により、アスベクト比の
高い、幅の狭いスペーサーを製造することができ、高解
像度で大面積なプラズマディスプレイパネルを作製する
ことが可能になった。また、カラー表示のプラズマディ
スプレイの場合においても蛍光体へのダメージが少なく
、且つクロストークや色の滲みのない高精細なパネルの
実現に大きく寄与するものである．In this example, the spacer was formed on the second insulating substrate, but the same process could be used to form the spacer on the first insulating substrate. Furthermore, the method of the present invention is not related to the shape of the spacer, and can be applied to various shapes such as striped and grid shapes. [Effects of the Invention] According to the spacer manufacturing method of the present invention, a narrow spacer with a high aspect ratio can be manufactured, and a high-resolution, large-area plasma display panel can be manufactured. Furthermore, in the case of color plasma displays, this will greatly contribute to the realization of high-definition panels with less damage to the phosphor and no crosstalk or color bleeding.
第１図は本発明の一実施例を示す工程図、第２図はプラ
ズマディスプレイパネルの一例を示す平面図、第３図は
第２図のａ−ａ’における断面図、第４図は第２図のｂ
−ｂ’における断面図である。
１・・・第１絶縁基板、２・・・列電極、３・・・第１
絶縁層、４・・・蛍光体、５・・・スペーサー、６・・
・保護層、７・・・第２絶縁層、８・・・第２絶縁基板
、９・・・放電空間、１０・・・行電極、１１・・・ド
ライフイルム。Fig. 1 is a process diagram showing an embodiment of the present invention, Fig. 2 is a plan view showing an example of a plasma display panel, Fig. 3 is a sectional view taken along line a-a' in Fig. b in figure 2
It is a sectional view at -b'. DESCRIPTION OF SYMBOLS 1... First insulating substrate, 2... Column electrode, 3... First
Insulating layer, 4...phosphor, 5... spacer, 6...
- Protective layer, 7... Second insulating layer, 8... Second insulating substrate, 9... Discharge space, 10... Row electrode, 11... Dry film.
Claims (1)
ト層を形成する工程と、このホトレジスト層の溝に誘電
体ペーストを充填する工程と、この充填された誘電体ペ
ーストを乾燥する工程と、前記ホトレジスト層を取り除
く工程と、溝部に形成されていた前記誘電体ペーストを
焼成し誘電体の構造物とする工程とを少くとも含むこと
を特徴とするプラズマディスプレイパネルのスペーサー
の製造方法。a step of forming a photoresist layer having at least a groove-like pattern on a substrate, a step of filling the grooves of the photoresist layer with a dielectric paste, a step of drying the filled dielectric paste, and a step of drying the photoresist layer. 1. A method for manufacturing a spacer for a plasma display panel, the method comprising at least the steps of: removing the dielectric paste formed in the groove, and baking the dielectric paste formed in the groove to form a dielectric structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19496589A JP2923986B2 (en) | 1989-07-26 | 1989-07-26 | Method of manufacturing spacer for plasma display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19496589A JP2923986B2 (en) | 1989-07-26 | 1989-07-26 | Method of manufacturing spacer for plasma display panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0357138A true JPH0357138A (en) | 1991-03-12 |
| JP2923986B2 JP2923986B2 (en) | 1999-07-26 |
Family
ID=16333281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19496589A Expired - Fee Related JP2923986B2 (en) | 1989-07-26 | 1989-07-26 | Method of manufacturing spacer for plasma display panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2923986B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5857633A (en) * | 1996-08-19 | 1999-01-12 | Toyota Technical Center U.S.A., Inc. | Cupholder with engaging rings |
| JP2008262931A (en) * | 2008-08-05 | 2008-10-30 | Toray Ind Inc | Paste for buffer layer formation of plasma display panel |
-
1989
- 1989-07-26 JP JP19496589A patent/JP2923986B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5857633A (en) * | 1996-08-19 | 1999-01-12 | Toyota Technical Center U.S.A., Inc. | Cupholder with engaging rings |
| JP2008262931A (en) * | 2008-08-05 | 2008-10-30 | Toray Ind Inc | Paste for buffer layer formation of plasma display panel |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2923986B2 (en) | 1999-07-26 |
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