JPH0356128U - - Google Patents
Info
- Publication number
- JPH0356128U JPH0356128U JP11700989U JP11700989U JPH0356128U JP H0356128 U JPH0356128 U JP H0356128U JP 11700989 U JP11700989 U JP 11700989U JP 11700989 U JP11700989 U JP 11700989U JP H0356128 U JPH0356128 U JP H0356128U
- Authority
- JP
- Japan
- Prior art keywords
- spin table
- substrate
- photoresist
- shape
- spin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims 5
- 230000002093 peripheral effect Effects 0.000 claims 1
Landscapes
- Coating Apparatus (AREA)
Description
第1図はこの考案の一実施例によるフオトレジ
スト塗布装置の断面図、第2図は同じく平面図、
第3図は従来のフオトレジスト装置の断面図、第
4図は同じく平面図である。
2……スピンモータ、3……スピンテーブル、
10……凹部、11……傾斜部。
FIG. 1 is a sectional view of a photoresist coating apparatus according to an embodiment of this invention, and FIG. 2 is a plan view thereof.
FIG. 3 is a sectional view of a conventional photoresist apparatus, and FIG. 4 is a plan view of the same. 2...Spin motor, 3...Spin table,
10... recessed part, 11... inclined part.
Claims (1)
平に設け、このスピンテーブルの上に基板を配置
し、この基板の表面にフオトレジストを滴下し、
このフオトレジストをスピンテーブルの回転遠心
力でその表面の全体に拡げて塗布するフオトレジ
スト塗布装置において、前記スピンテーブルを円
形に形成するとともに、その上面に基板の外形形
状に対応しかつ基板の厚さに相当する深さを有す
る凹部を形成し、さらにスピンテーブルの周縁に
その外周側に向つて斜め下方に傾斜する傾斜部を
形成し、前記凹部内に基板を嵌着し、この基板の
上にフオトレジストを滴下して塗布することを特
徴とするフオトレジスト塗布装置。 A spin table that rotates in conjunction with a motor is installed horizontally, a substrate is placed on the spin table, and photoresist is dropped onto the surface of the substrate.
In a photoresist coating device that spreads and coats the photoresist over the entire surface of the spin table using the centrifugal force of rotation of the spin table, the spin table is formed into a circular shape, and the upper surface is provided with a shape that corresponds to the external shape of the substrate and a shape that corresponds to the thickness of the substrate. A recessed portion having a depth corresponding to the height of the spin table is formed, and a sloped portion is formed on the peripheral edge of the spin table that slopes diagonally downward toward the outer circumferential side of the spin table, and a substrate is fitted into the recessed portion. A photoresist coating device characterized by dropping and coating a photoresist on a surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989117009U JPH0754997Y2 (en) | 1989-10-04 | 1989-10-04 | Photoresist coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989117009U JPH0754997Y2 (en) | 1989-10-04 | 1989-10-04 | Photoresist coating device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0356128U true JPH0356128U (en) | 1991-05-30 |
JPH0754997Y2 JPH0754997Y2 (en) | 1995-12-18 |
Family
ID=31665260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989117009U Expired - Lifetime JPH0754997Y2 (en) | 1989-10-04 | 1989-10-04 | Photoresist coating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0754997Y2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52144971A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Spin coating device |
JPS54173669U (en) * | 1978-05-26 | 1979-12-07 | ||
JPS59104650A (en) * | 1982-12-07 | 1984-06-16 | Toshiba Corp | Resist film forming device |
JPS59189235U (en) * | 1983-05-31 | 1984-12-15 | 日本電気ホームエレクトロニクス株式会社 | Coating equipment |
-
1989
- 1989-10-04 JP JP1989117009U patent/JPH0754997Y2/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52144971A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Spin coating device |
JPS54173669U (en) * | 1978-05-26 | 1979-12-07 | ||
JPS59104650A (en) * | 1982-12-07 | 1984-06-16 | Toshiba Corp | Resist film forming device |
JPS59189235U (en) * | 1983-05-31 | 1984-12-15 | 日本電気ホームエレクトロニクス株式会社 | Coating equipment |
Also Published As
Publication number | Publication date |
---|---|
JPH0754997Y2 (en) | 1995-12-18 |
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