JPH0354457B2 - - Google Patents
Info
- Publication number
- JPH0354457B2 JPH0354457B2 JP58222644A JP22264483A JPH0354457B2 JP H0354457 B2 JPH0354457 B2 JP H0354457B2 JP 58222644 A JP58222644 A JP 58222644A JP 22264483 A JP22264483 A JP 22264483A JP H0354457 B2 JPH0354457 B2 JP H0354457B2
- Authority
- JP
- Japan
- Prior art keywords
- internal electrode
- gas
- chamber
- etching
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22264483A JPS60126833A (ja) | 1983-11-24 | 1983-11-24 | プラズマエツチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22264483A JPS60126833A (ja) | 1983-11-24 | 1983-11-24 | プラズマエツチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60126833A JPS60126833A (ja) | 1985-07-06 |
| JPH0354457B2 true JPH0354457B2 (enrdf_load_html_response) | 1991-08-20 |
Family
ID=16785678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22264483A Granted JPS60126833A (ja) | 1983-11-24 | 1983-11-24 | プラズマエツチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60126833A (enrdf_load_html_response) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62241336A (ja) * | 1986-04-11 | 1987-10-22 | Nec Kyushu Ltd | プラズマエツチング装置 |
| JP2832724B2 (ja) * | 1989-06-16 | 1998-12-09 | 東京エレクトロン株式会社 | 被処理体処理装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52127761A (en) * | 1976-04-19 | 1977-10-26 | Fujitsu Ltd | Gas plasma etching unit |
| JPS5358761A (en) * | 1976-11-08 | 1978-05-26 | Sony Corp | Vapor phase growth apparatus |
-
1983
- 1983-11-24 JP JP22264483A patent/JPS60126833A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60126833A (ja) | 1985-07-06 |