JPH0351091B2 - - Google Patents

Info

Publication number
JPH0351091B2
JPH0351091B2 JP57059247A JP5924782A JPH0351091B2 JP H0351091 B2 JPH0351091 B2 JP H0351091B2 JP 57059247 A JP57059247 A JP 57059247A JP 5924782 A JP5924782 A JP 5924782A JP H0351091 B2 JPH0351091 B2 JP H0351091B2
Authority
JP
Japan
Prior art keywords
substrate
infrared
annealing
processed
polycrystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57059247A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58176928A (ja
Inventor
Junji Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57059247A priority Critical patent/JPS58176928A/ja
Publication of JPS58176928A publication Critical patent/JPS58176928A/ja
Publication of JPH0351091B2 publication Critical patent/JPH0351091B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P34/00—

Landscapes

  • Recrystallisation Techniques (AREA)
JP57059247A 1982-04-09 1982-04-09 光アニ−ル方法 Granted JPS58176928A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57059247A JPS58176928A (ja) 1982-04-09 1982-04-09 光アニ−ル方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57059247A JPS58176928A (ja) 1982-04-09 1982-04-09 光アニ−ル方法

Publications (2)

Publication Number Publication Date
JPS58176928A JPS58176928A (ja) 1983-10-17
JPH0351091B2 true JPH0351091B2 (en:Method) 1991-08-05

Family

ID=13107857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57059247A Granted JPS58176928A (ja) 1982-04-09 1982-04-09 光アニ−ル方法

Country Status (1)

Country Link
JP (1) JPS58176928A (en:Method)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0644634B2 (ja) * 1988-11-26 1994-06-08 東光株式会社 可変容量ダイオード素子の製造方法
US6423585B1 (en) 1997-03-11 2002-07-23 Semiconductor Energy Laboratory Co., Ltd. Heating treatment device, heating treatment method and fabrication method of semiconductor device
KR100962610B1 (ko) * 2008-03-17 2010-06-11 주식회사 티지솔라 열처리 방법

Also Published As

Publication number Publication date
JPS58176928A (ja) 1983-10-17

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