JPH0350203A - Production of styrene polymer particle - Google Patents
Production of styrene polymer particleInfo
- Publication number
- JPH0350203A JPH0350203A JP18448289A JP18448289A JPH0350203A JP H0350203 A JPH0350203 A JP H0350203A JP 18448289 A JP18448289 A JP 18448289A JP 18448289 A JP18448289 A JP 18448289A JP H0350203 A JPH0350203 A JP H0350203A
- Authority
- JP
- Japan
- Prior art keywords
- polymer particles
- suspension
- amine compound
- polymerization
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title claims abstract description 62
- 229920000642 polymer Polymers 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 title abstract description 16
- 239000004372 Polyvinyl alcohol Substances 0.000 claims abstract description 24
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 24
- -1 amine compound Chemical class 0.000 claims abstract description 22
- 239000000725 suspension Substances 0.000 claims abstract description 18
- 239000003381 stabilizer Substances 0.000 claims abstract description 16
- 239000000178 monomer Substances 0.000 claims abstract description 15
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 11
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 10
- 238000010557 suspension polymerization reaction Methods 0.000 claims abstract description 9
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 239000012071 phase Substances 0.000 description 13
- 238000011109 contamination Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2,2'-azo-bis-isobutyronitrile Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- MLPVBIWIRCKMJV-UHFFFAOYSA-N 2-ethylaniline Chemical compound CCC1=CC=CC=C1N MLPVBIWIRCKMJV-UHFFFAOYSA-N 0.000 description 2
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 description 2
- HRXZRAXKKNUKRF-UHFFFAOYSA-N 4-ethylaniline Chemical compound CCC1=CC=C(N)C=C1 HRXZRAXKKNUKRF-UHFFFAOYSA-N 0.000 description 2
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 description 2
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical group CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- BHRZNVHARXXAHW-UHFFFAOYSA-N sec-butylamine Chemical compound CCC(C)N BHRZNVHARXXAHW-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BJQFWAQRPATHTR-UHFFFAOYSA-N 1,2-dichloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1Cl BJQFWAQRPATHTR-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- QOVCUELHTLHMEN-UHFFFAOYSA-N 1-butyl-4-ethenylbenzene Chemical compound CCCCC1=CC=C(C=C)C=C1 QOVCUELHTLHMEN-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 1
- CTXUTPWZJZHRJC-UHFFFAOYSA-N 1-ethenylpyrrole Chemical compound C=CN1C=CC=C1 CTXUTPWZJZHRJC-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical class C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- LXQOQPGNCGEELI-UHFFFAOYSA-N 2,4-dinitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O LXQOQPGNCGEELI-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- AKCRQHGQIJBRMN-UHFFFAOYSA-N 2-chloroaniline Chemical compound NC1=CC=CC=C1Cl AKCRQHGQIJBRMN-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- LSSICPJTIPBTDD-UHFFFAOYSA-N 2-ethenyl-1h-indole Chemical compound C1=CC=C2NC(C=C)=CC2=C1 LSSICPJTIPBTDD-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- XVTXLKJBAYGTJS-UHFFFAOYSA-N 2-methylpenta-1,4-dien-3-one Chemical compound CC(=C)C(=O)C=C XVTXLKJBAYGTJS-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- DPJCXCZTLWNFOH-UHFFFAOYSA-N 2-nitroaniline Chemical compound NC1=CC=CC=C1[N+]([O-])=O DPJCXCZTLWNFOH-UHFFFAOYSA-N 0.000 description 1
- PNPCRKVUWYDDST-UHFFFAOYSA-N 3-chloroaniline Chemical compound NC1=CC=CC(Cl)=C1 PNPCRKVUWYDDST-UHFFFAOYSA-N 0.000 description 1
- ZXABMDQSAABDMG-UHFFFAOYSA-N 3-ethenoxyprop-1-ene Chemical class C=CCOC=C ZXABMDQSAABDMG-UHFFFAOYSA-N 0.000 description 1
- AMKPQMFZCBTTAT-UHFFFAOYSA-N 3-ethylaniline Chemical compound CCC1=CC=CC(N)=C1 AMKPQMFZCBTTAT-UHFFFAOYSA-N 0.000 description 1
- XJCVRTZCHMZPBD-UHFFFAOYSA-N 3-nitroaniline Chemical compound NC1=CC=CC([N+]([O-])=O)=C1 XJCVRTZCHMZPBD-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- QSNSCYSYFYORTR-UHFFFAOYSA-N 4-chloroaniline Chemical compound NC1=CC=C(Cl)C=C1 QSNSCYSYFYORTR-UHFFFAOYSA-N 0.000 description 1
- ADEYMEHLEBAYMW-UHFFFAOYSA-N 6,6-dichlorocyclohexa-2,4-dien-1-amine Chemical compound NC1C=CC=CC1(Cl)Cl ADEYMEHLEBAYMW-UHFFFAOYSA-N 0.000 description 1
- BQXKOJHVTRDVNZ-UHFFFAOYSA-N 6,6-dinitrocyclohexa-2,4-dien-1-amine Chemical compound [N+](=O)([O-])C1(C(C=CC=C1)N)[N+](=O)[O-] BQXKOJHVTRDVNZ-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical compound BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000012767 functional filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PBZROIMXDZTJDF-UHFFFAOYSA-N hepta-1,6-dien-4-one Chemical compound C=CCC(=O)CC=C PBZROIMXDZTJDF-UHFFFAOYSA-N 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000005673 monoalkenes Chemical class 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HILCQVNWWOARMT-UHFFFAOYSA-N non-1-en-3-one Chemical compound CCCCCCC(=O)C=C HILCQVNWWOARMT-UHFFFAOYSA-N 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- HDBWAWNLGGMZRQ-UHFFFAOYSA-N p-Vinylbiphenyl Chemical compound C1=CC(C=C)=CC=C1C1=CC=CC=C1 HDBWAWNLGGMZRQ-UHFFFAOYSA-N 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 229940078499 tricalcium phosphate Drugs 0.000 description 1
- 229910000391 tricalcium phosphate Inorganic materials 0.000 description 1
- 235000019731 tricalcium phosphate Nutrition 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- FUSUHKVFWTUUBE-UHFFFAOYSA-N vinyl methyl ketone Natural products CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は間隙保持剤、滑り性行与剤、機能性単体、表面
活性を有する単分散粒子、標準粒子、トナー、塗料の流
動性やつや特性を制御する機能性充填剤などに用いられ
るスチレン系重合体粒子の製造方法に関し、特にポリビ
ニルアルコール(以下PVAと記す)を懸濁安定剤とす
るスチレン系重合体粒子の製造方法に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention is applicable to gap-maintaining agents, slipperiness-imparting agents, functional elements, monodisperse particles with surface activity, standard particles, toners, and fluidity and smoothness of paints. The present invention relates to a method for producing styrenic polymer particles used as a functional filler for controlling properties, and particularly to a method for producing styrenic polymer particles using polyvinyl alcohol (hereinafter referred to as PVA) as a suspension stabilizer.
〔従来の技術〕 〔発明が解決しようとする課題〕従来
スチレン系重合体粒子を製造する場合に、スチレン系単
量体を重合開始剤と、懸濁安定剤の存在下で、懸濁重合
を行っており、ここに用いられる懸濁安定剤には種々の
ものがあるが、代表的なものの1つとしてPVAがある
。このPVAは水溶性であり、得られるスチレン系重合
体粒子の表面に付着残留するため、洗浄などにより付着
している懸濁安定剤を除去しなければならない。[Prior Art] [Problem to be Solved by the Invention] Conventionally, when producing styrenic polymer particles, styrenic monomers were subjected to suspension polymerization in the presence of a polymerization initiator and a suspension stabilizer. There are various suspension stabilizers used here, and one of the most representative ones is PVA. Since this PVA is water-soluble and remains attached to the surface of the obtained styrenic polymer particles, the attached suspension stabilizer must be removed by washing or the like.
しかしこの懸濁安定剤であるPVAはスチレン系重合体
粒子の表面と強い親和性があり、その除去は大変困難で
あって、時としてその一部がスチレン系重合体粒子の表
面に埋没して物理的に該粒子表面に固定しているような
場合もあるために、洗浄による懸濁安定剤の完全な除去
は不可能に近いものである。However, PVA, which is a suspension stabilizer, has a strong affinity with the surface of styrenic polymer particles, and its removal is very difficult, and sometimes a part of it is buried in the surface of styrenic polymer particles. Since the suspension stabilizer may be physically fixed to the particle surface, it is almost impossible to completely remove the suspension stabilizer by washing.
懸濁安定剤として第三りん酸カルシウムの如き難溶性の
固体微粉末を用いる場合は、得られるスチレン系重合体
粒子の表面に付着残留する懸濁安定剤を、鉱酸などで溶
解除去する工程が必要で、このため重合装置類を耐酸性
処理をしたり、特別の排水処理施設を設けたりする必要
があるためコスト的には不利な面がある。When using a poorly soluble solid fine powder such as tricalcium phosphate as a suspension stabilizer, there is a step of dissolving and removing the suspension stabilizer remaining on the surface of the resulting styrenic polymer particles using mineral acid or the like. Therefore, it is necessary to treat the polymerization equipment to be acid-resistant and to install special wastewater treatment facilities, which is disadvantageous in terms of cost.
本発明は上記した課題を解決することを目的とするもの
である。The present invention aims to solve the above problems.
〔課題を解決するための手段〕 〔作用〕本発明は、上
記の如き状況に鑑みて鋭意研究の結果なされたもので、
PVAを懸濁安定剤として用いるスチレン系重合体粒子
の製造にあたり、懸濁重合系にアミン化合物を共存させ
ることにより、スチレン系重合体粒子の表面がPVAに
より汚染され難いことを見出した。[Means for Solving the Problems] [Operation] The present invention has been made as a result of intensive research in view of the above circumstances.
In producing styrenic polymer particles using PVA as a suspension stabilizer, it has been found that by coexisting an amine compound in the suspension polymerization system, the surface of the styrenic polymer particles is less likely to be contaminated by PVA.
本発明の概略は、スチレン系単量体を主体とする重合性
単量体を、重合開始剤の存在下で、ポリビニルアルコー
ルを懸濁安定剤として用いて、スチレン系重合体粒子を
製造する方法において、該懸濁重合系に、アミン化合物
を共存させて重合することを特徴とするスチレン系重合
体粒子の製造方法である。The outline of the present invention is a method for producing styrenic polymer particles by using a polymerizable monomer mainly consisting of a styrene monomer in the presence of a polymerization initiator and using polyvinyl alcohol as a suspension stabilizer. A method for producing styrenic polymer particles is characterized in that polymerization is carried out in the presence of an amine compound in the suspension polymerization system.
次に本発明で用いる各材料及びそれによる作用等につい
て詳述する。Next, each material used in the present invention and its effects will be described in detail.
以下%とか部とあるは重量基準による。The following percentages and parts are based on weight.
スチレン系重合性単量体
スチレン、0−メチルスチレン、m−メチルスチレン、
p−メチルスチレン、p−メトキシスチレン、p−フェ
ニルスチレン、p−クロルスチレン、3,4−ジクロル
スチレン、p−エチルスチレン、2,4−ジメチルスチ
レン、p−n−ブチルスチレン、p−tert−ブチル
スチレン、p−n−へキシルスチレン、p−n−オクチ
ルスチレン、p−n−ノニルスチレン、p−n−デシル
スチレン、ジビニルベンゼン等のスチレンおよびその誘
導体が用いられる。Styrenic polymerizable monomer styrene, 0-methylstyrene, m-methylstyrene,
p-methylstyrene, p-methoxystyrene, p-phenylstyrene, p-chlorostyrene, 3,4-dichlorostyrene, p-ethylstyrene, 2,4-dimethylstyrene, p-n-butylstyrene, p-tert Styrene and derivatives thereof such as -butylstyrene, pn-hexylstyrene, pn-octylstyrene, pn-nonylstyrene, pn-decylstyrene, and divinylbenzene are used.
また、スチレン系重合性単量体以外の重合性単量体を、
七ツマー相中の濃度が50%以下の範囲で、1種類或い
は2種類以上添加して共重合をしたものも含まれる。In addition, polymerizable monomers other than styrenic polymerizable monomers,
It also includes copolymerizations in which one or more types are added within a range of 50% or less in concentration in the heptamer phase.
上記の共重合する単量体としては、エチレン、プロピレ
ン、ブチレン、イソブチレン等のエチレン系不飽和モノ
オレフィン類;塩化ビニル、塩化ビニリデン、臭化ビニ
ル、ぶつ化ビニル等のハロゲン化ビニル類;酢酸ビニル
、プロピオン酸ビニル、ベンジェ酸ビニル等の有機酸ビ
ニルエステル類;メタクリル酸、メタクリル酸メチル、
メタクリル酸エチル、メタクリル酸プロピル、メタクリ
ル酸n−ブチル、メタクリル酸n−オクチル、メタクリ
ル酸ドデシル、メタクリル酸2−エチルヘキシル、メタ
クリル酸ステアリル、メタクリル酸フェニル、メタクリ
ル酸ジメチルアミノエチル、メタクリル酸ジエチルアミ
ノエチル等のメタクリル酸及びその誘導体;アクリル酸
、アクリル酸メチル、アクリル酸エチル、アクリル酸n
−ブチル、アクリル酸イソブチル、アクリル酸プロピル
、アクリル酸n−オクチル、アクリル酸ドデシル、アク
リル酸2−エチルヘキシル、アクリル酸ステアリル、ア
クリル酸2−クロルエチル、アクリル酸フェニル等のア
クリル酸及びその誘導体;ビニルメチルエーテル、ビニ
ルエチルエーテル、ビニルイソブチルエーテル等のビニ
ルエーテル類;ビニルメチルケトン、ビニルへキシルケ
トン、ビニルイソプロペニルケトン等のビニルケトン類
、N−ビニルピロール、N−ビニルカルバゾール、N−
ビニルインドール、N−ビニルピロリドン等のN−ビニ
ル化合物;ビニルナフタリン類;アクリロニトリル、メ
タクリロニトリル、アクリルアミド等の重合性単量体を
あげることができる。The monomers to be copolymerized include ethylenically unsaturated monoolefins such as ethylene, propylene, butylene, and isobutylene; vinyl halides such as vinyl chloride, vinylidene chloride, vinyl bromide, and vinyl butylene; vinyl acetate; , organic acid vinyl esters such as vinyl propionate and vinyl benzoate; methacrylic acid, methyl methacrylate,
Ethyl methacrylate, propyl methacrylate, n-butyl methacrylate, n-octyl methacrylate, dodecyl methacrylate, 2-ethylhexyl methacrylate, stearyl methacrylate, phenyl methacrylate, dimethylaminoethyl methacrylate, diethylaminoethyl methacrylate, etc. Methacrylic acid and its derivatives; acrylic acid, methyl acrylate, ethyl acrylate, acrylic acid n
- Acrylic acid and its derivatives such as butyl, isobutyl acrylate, propyl acrylate, n-octyl acrylate, dodecyl acrylate, 2-ethylhexyl acrylate, stearyl acrylate, 2-chloroethyl acrylate, phenyl acrylate; vinylmethyl Vinyl ethers such as ether, vinyl ethyl ether, vinyl isobutyl ether; vinyl ketones such as vinyl methyl ketone, vinyl hexyl ketone, vinyl isopropenyl ketone, N-vinylpyrrole, N-vinylcarbazole, N-
Examples include N-vinyl compounds such as vinyl indole and N-vinylpyrrolidone; vinylnaphthalenes; and polymerizable monomers such as acrylonitrile, methacrylonitrile, and acrylamide.
重合開始剤としては、2.2″−アゾビスイソブチロニ
トリル、2.2°−アゾビス−(2,4ジメチルバレロ
ニトリル)、2.2’ −アゾビス−4−メトキシ−2
,4−ジメチルバレロニトリル、その他のアゾ系又はジ
アゾ系重合開始剤;ベンゾイルパーオキサイド、メチル
エチルケトンパーオキサイド、イソプロピルパーオキシ
カーボネートその他の過酸化物系重合開始剤があげられ
る。As a polymerization initiator, 2.2''-azobisisobutyronitrile, 2.2°-azobis-(2,4 dimethylvaleronitrile), 2.2'-azobis-4-methoxy-2
, 4-dimethylvaleronitrile, and other azo or diazo polymerization initiators; benzoyl peroxide, methyl ethyl ketone peroxide, isopropyl peroxy carbonate, and other peroxide polymerization initiators.
この重合開始剤は2種以上を組み合わせて用いることに
より重合体の分子量や分子量分布を制御したり、重合反
応時間を制御することができる。By using two or more kinds of polymerization initiators in combination, it is possible to control the molecular weight and molecular weight distribution of the polymer, and to control the polymerization reaction time.
また必要に応じ過硫酸アンモニウム、過硫酸カリウム等
の水溶性重合開始剤を併用してもよい。Further, a water-soluble polymerization initiator such as ammonium persulfate or potassium persulfate may be used in combination if necessary.
懸濁安定剤であるPVAは懸濁重合に有用な部分ケン化
PVAが重合体粒子の汚染、特にPVA被膜の形成等が
顕著に認められる。Partially saponified PVA, which is a suspension stabilizer, is useful for suspension polymerization, but contamination of polymer particles, particularly the formation of a PVA film, is noticeable.
従ってこの重合系にアミン化合物を添加することにより
、PVAによる汚染を抑制し、防止することが出来るが
、このアミン化合物としては以下のものがあげられる。Therefore, by adding an amine compound to this polymerization system, contamination by PVA can be suppressed and prevented, and examples of the amine compound include the following.
アニリン、N−メチルアニリン、N−エチルアニリン、
N、N−ジメチルアニリン、N、N−ジエチルアニリン
、2−メチルアニリン、2−エチルアニリン、3−メチ
ルアニリン、3−エチルアニリン、4−メチルアニリン
、4−エチルアニリン、2−ニトロアニリン、3−ニト
ロアニリン、4−ニトロアニリン、2,4−ジニトロア
ニリン、2.2−ジニトロアニリン、2−クロロアニリ
ン、3−クロロアニリン、4−クロロアニリン、2゜4
−ジクロロアニリン、2.2−ジクロロアニリン、0−
フェニレンジアミン、m−フェニレンジアミン、p−フ
ェニレンジアミン等のアニリン誘導体、メチルアミン、
エチルアミン、エタノールアミン、1−プロピルアミン
、2−プロピルアミン、1−ブチルアミン、2−ブチル
アミン、3−ブチルアミン、1−ペンチルアミン、1−
ヘキシルアミン、1−へブチルアミン、1−オクチルア
ミン、エチレンジアミン等の脂肪族アミン誘導体が用い
られる。これらのアミンは単独でまたは複合して用いる
ことが出来る。Aniline, N-methylaniline, N-ethylaniline,
N,N-dimethylaniline, N,N-diethylaniline, 2-methylaniline, 2-ethylaniline, 3-methylaniline, 3-ethylaniline, 4-methylaniline, 4-ethylaniline, 2-nitroaniline, 3 -Nitroaniline, 4-nitroaniline, 2,4-dinitroaniline, 2,2-dinitroaniline, 2-chloroaniline, 3-chloroaniline, 4-chloroaniline, 2゜4
-dichloroaniline, 2,2-dichloroaniline, 0-
Aniline derivatives such as phenylenediamine, m-phenylenediamine, p-phenylenediamine, methylamine,
Ethylamine, ethanolamine, 1-propylamine, 2-propylamine, 1-butylamine, 2-butylamine, 3-butylamine, 1-pentylamine, 1-
Aliphatic amine derivatives such as hexylamine, 1-hebutylamine, 1-octylamine, and ethylenediamine are used. These amines can be used alone or in combination.
本発明でアミン化合物を使用する場合、分散相(モノマ
ー相)に添加することにより、重合体粒子の表面へのP
VAの汚染を防止することが出来た。When using an amine compound in the present invention, by adding it to the dispersed phase (monomer phase), P is applied to the surface of the polymer particles.
It was possible to prevent contamination of VA.
この場合アミン化合物は水に僅かに溶解するものが好ま
しく、分散相(モノマー相)或いは連続相(水相)の何
れか一方又は両方に添加することが出来るが、特に分散
相に添加することにより、大きな汚染抑制の効果を得る
ことが出来る。In this case, the amine compound is preferably one that is slightly soluble in water, and can be added to either the dispersed phase (monomer phase) or the continuous phase (aqueous phase), or both, but especially by adding it to the dispersed phase. , it is possible to obtain a large pollution control effect.
本発明で用いられるアミン化合物の添加量は分散相に添
加する場合その相中の濃度が0.05%〜5%、好まし
くは0.1%〜3%で用いられる。When the amine compound used in the present invention is added to the dispersed phase, the concentration in the phase is 0.05% to 5%, preferably 0.1% to 3%.
アミン化合物の濃度が0.05%未満ではPVAの汚染
が認められ、5%を越えると重合を阻害する傾向が強く
なり、目的とする分子量の重合体を得ることが出来ない
。When the concentration of the amine compound is less than 0.05%, contamination of PVA is observed, and when it exceeds 5%, there is a strong tendency to inhibit polymerization, making it impossible to obtain a polymer with the desired molecular weight.
またこのような汚染防止効果は、重合体粒子の洗浄、乾
燥の問題から、重合体粒子の粒子径が小さくなる程効果
があり、特に重合体の粒子径が1〜100μm程度の場
合が効果的である。In addition, due to the problems of cleaning and drying the polymer particles, this pollution prevention effect becomes more effective as the particle size of the polymer particles becomes smaller, and is particularly effective when the particle size of the polymer is about 1 to 100 μm. It is.
以下実施例について説明する。 Examples will be described below.
実施例1
完全ケン化PVA (重合度1700、酢酸基1モル%
)2.5g、部分ケン化PVA (重合度1700、酢
酸基10モル%)Igを水250mlに溶解し連続相を
調整する。連続相に過酸化ベンゾイルIg、N−メチル
アニリン1gをスチレン100gに溶解して調整した分
散相を加え、TKホモミキサー(特殊機化工業社製)を
用いて110000rpで約20分間分散し、懸濁液を
調整する。この懸濁液を攪拌機、温度針、還流冷却機を
とり付けた内容量500m1の丸底三つロフラスコに加
え、80℃に加熱し、約8時間液滴が沈澱しない程度に
攪拌し、重合する。重合した後、常法により処理し、重
合体粒子を得た。得られた重合体粒子の粒度をコールタ
−カウンター(アパーチャー100I!l11)を用い
て測定したところ、重合体粒子の体積平均の粒子径は1
011mであった。この重合体粒子を走査型電子顕微鏡
で観察したところSEM写真(第1図)に示すように粒
子表面にPVAの汚染が認められなかった。Example 1 Completely saponified PVA (degree of polymerization 1700, acetic acid group 1 mol%)
), partially saponified PVA (degree of polymerization 1700, acetic acid group 10 mol%) Ig was dissolved in 250 ml of water to prepare a continuous phase. A dispersed phase prepared by dissolving Ig benzoyl peroxide and 1 g of N-methylaniline in 100 g of styrene was added to the continuous phase, and the mixture was dispersed for about 20 minutes at 110,000 rpm using a TK homomixer (manufactured by Tokushu Kika Kogyo Co., Ltd.). Adjust the suspension. This suspension is added to a 500 ml round-bottom three-bottle flask equipped with a stirrer, a temperature needle, and a reflux condenser, heated to 80°C, and stirred for about 8 hours to the extent that droplets do not precipitate to polymerize. . After polymerization, treatment was performed by a conventional method to obtain polymer particles. When the particle size of the obtained polymer particles was measured using a Coulter counter (aperture 100I!l11), the volume average particle size of the polymer particles was 1.
It was 011m. When this polymer particle was observed using a scanning electron microscope, no PVA contamination was observed on the particle surface as shown in the SEM photograph (FIG. 1).
実施例2
アミン化合物として4−ニトロアニリン0.6gを用い
、重合開始剤として2.2−アゾビスイソブチロニトリ
ル1gを用いた外は実施例1と同様にして重合体粒子を
得た。得られた重合体粒子の粒度をコールタ−カウンタ
ー(アパーチャー100μn+)を用いて測定したとこ
ろ、重合体粒子の体積平均の粒子径は10μmであった
。この重合体粒子を走査型電子顕微鏡で観察したところ
SEM写真(第1図)と同様に粒子表面にPVAの汚染
が認められなかった。Example 2 Polymer particles were obtained in the same manner as in Example 1, except that 0.6 g of 4-nitroaniline was used as the amine compound and 1 g of 2,2-azobisisobutyronitrile was used as the polymerization initiator. When the particle size of the obtained polymer particles was measured using a Coulter counter (aperture 100 μm+), the volume average particle size of the polymer particles was 10 μm. When this polymer particle was observed with a scanning electron microscope, no PVA contamination was observed on the particle surface as in the SEM photograph (FIG. 1).
実施例3
スチレン90gとn−ブチルアクリレート10gと、カ
ーボンブランク(三菱化成社製)20gとをペイントコ
ンディショナーを用いて室温で約1時間部合分散した後
、セパラブルフラスコにいれ、約30分窒素ガス置換し
た後、100℃以上でカーボンブラックを前記重合性単
量体で表面処理し、表面処理カーボンブラックを得た。Example 3 After partially dispersing 90 g of styrene, 10 g of n-butyl acrylate, and 20 g of carbon blank (manufactured by Mitsubishi Kasei) at room temperature for about 1 hour using a paint conditioner, the mixture was placed in a separable flask and heated with nitrogen for about 30 minutes. After gas replacement, the carbon black was surface-treated with the polymerizable monomer at 100° C. or higher to obtain surface-treated carbon black.
分散相に前記表面処理カーボンブランク10g、重合開
始剤として2,2−アゾビスイソブチロニトリル3gを
添加する以外は実施例1と同様にして重合体粒子を得た
。Polymer particles were obtained in the same manner as in Example 1, except that 10 g of the surface-treated carbon blank and 3 g of 2,2-azobisisobutyronitrile were added as a polymerization initiator to the dispersed phase.
得られた重合体粒子の粒度をコールタ−カウンター(ア
パーチャー100μm)を用いて測定したところ、重合
体粒子の体積平均の粒子径は12μmであった。この重
合体粒子を光学顕微鏡で観察したところ重合体粒子の各
々の粒子はほぼ完全に黒い球状を示し、重合体粒子内に
おけるカーボンブラックの偏在は認められなかった。When the particle size of the obtained polymer particles was measured using a Coulter counter (aperture 100 μm), the volume average particle size of the polymer particles was 12 μm. When this polymer particle was observed under an optical microscope, each particle of the polymer particle had a nearly completely black spherical shape, and no uneven distribution of carbon black was observed within the polymer particle.
更にこの重合体粒子を走査型電子顕微鏡で観察したとこ
ろSEM写真(第1図)と同様に粒子表面にPVAの汚
染が認められなかった。Further, when this polymer particle was observed using a scanning electron microscope, no PVA contamination was observed on the particle surface as in the SEM photograph (FIG. 1).
比較例
アミン化合物を添加しない以外は実施例1に記載の方法
と同様な操作により懸濁重合を行い重合体粒子を製造し
た。得られた重合体粒子の粒度をコールタ−カウンター
(アパーチャー100μm)を用いて測定したところ、
重合体粒子の体積平均の粒子径は19μmであった。こ
の重合体粒子を走査型電子顕微鏡で観察したところSE
M写真(第2図)に示したように粒子表面にPVAの汚
染が確認された。Comparative Example Polymer particles were produced by suspension polymerization in the same manner as in Example 1, except that no amine compound was added. When the particle size of the obtained polymer particles was measured using a Coulter counter (aperture 100 μm),
The volume average particle diameter of the polymer particles was 19 μm. When this polymer particle was observed with a scanning electron microscope, it was found that SE
As shown in the M photograph (Fig. 2), PVA contamination was confirmed on the particle surface.
本発明は、懸濁重合系にアミン化合物を添加したことに
よって粒子表面が懸濁安定剤であるPVAで汚染されな
い重合体粒子を容易に得ることが出来る。In the present invention, by adding an amine compound to the suspension polymerization system, it is possible to easily obtain polymer particles whose particle surfaces are not contaminated with PVA, which is a suspension stabilizer.
第1図は本発明により得られた重合体粒子の構造を示す
電子顕微鏡写真、第2図は従来の方法で得られた重合体
粒子の構造を示す電子顕微鏡写真である。FIG. 1 is an electron micrograph showing the structure of polymer particles obtained by the present invention, and FIG. 2 is an electron micrograph showing the structure of polymer particles obtained by a conventional method.
Claims (1)
始剤の存在下で、ポリビニルアルコールを懸濁安定剤と
して用いて、スチレン系重合体粒子を製造する方法にお
いて、該懸濁重合系に、アミン化合物を共存させて重合
することを特徴とするスチレン系重合体粒子の製造方法
。In a method for producing styrenic polymer particles by using a polymerizable monomer mainly composed of a styrenic monomer in the presence of a polymerization initiator and using polyvinyl alcohol as a suspension stabilizer, the suspension polymerization A method for producing styrenic polymer particles, characterized in that polymerization is carried out in the coexistence of an amine compound in the system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1184482A JPH0737484B2 (en) | 1989-07-19 | 1989-07-19 | Method for producing styrenic polymer particles |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1184482A JPH0737484B2 (en) | 1989-07-19 | 1989-07-19 | Method for producing styrenic polymer particles |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0350203A true JPH0350203A (en) | 1991-03-04 |
JPH0737484B2 JPH0737484B2 (en) | 1995-04-26 |
Family
ID=16153945
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1184482A Expired - Fee Related JPH0737484B2 (en) | 1989-07-19 | 1989-07-19 | Method for producing styrenic polymer particles |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0737484B2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51137790A (en) * | 1975-05-09 | 1976-11-27 | Basf Ag | Particulate swellabl polystyrol having good processability |
JPS56110946A (en) * | 1980-02-06 | 1981-09-02 | Konishiroku Photo Ind Co Ltd | Toner for electrostatic charge image development and its production |
JPS5950450A (en) * | 1982-09-17 | 1984-03-23 | Ricoh Co Ltd | Manufacture of electrostatic image developing toner |
JPS59136748A (en) * | 1983-01-26 | 1984-08-06 | Konishiroku Photo Ind Co Ltd | Toner for developing electrostatic charge image and its manufacture |
-
1989
- 1989-07-19 JP JP1184482A patent/JPH0737484B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51137790A (en) * | 1975-05-09 | 1976-11-27 | Basf Ag | Particulate swellabl polystyrol having good processability |
JPS56110946A (en) * | 1980-02-06 | 1981-09-02 | Konishiroku Photo Ind Co Ltd | Toner for electrostatic charge image development and its production |
JPS5950450A (en) * | 1982-09-17 | 1984-03-23 | Ricoh Co Ltd | Manufacture of electrostatic image developing toner |
JPS59136748A (en) * | 1983-01-26 | 1984-08-06 | Konishiroku Photo Ind Co Ltd | Toner for developing electrostatic charge image and its manufacture |
Also Published As
Publication number | Publication date |
---|---|
JPH0737484B2 (en) | 1995-04-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4885350A (en) | Method of producing polymer particles having narrow particle size distribution | |
JPS61279864A (en) | Toner for electrostatic image development | |
JP3770815B2 (en) | Method for producing resin particles and resin particles obtained by the method | |
JP3946587B2 (en) | Method for producing resin particles | |
JPH0350203A (en) | Production of styrene polymer particle | |
JP2666307B2 (en) | Method for producing positively chargeable toner | |
JPH0315861A (en) | Production of polymerized toner | |
JP2558109B2 (en) | Method for producing toner resin | |
JPH04188156A (en) | Manufacture of polymerized toner | |
JPH07157503A (en) | Preparation of polymer particle | |
JPH01184034A (en) | Production of microencapsulated fine particle | |
JP2014118512A (en) | Method for manufacturing amphoteric ion exchange resin | |
JPH0350563A (en) | Production of polymerized toner | |
JP4977327B2 (en) | Method for producing hollow particles | |
JPH02187768A (en) | Toner and manufacture of same | |
JP2008239637A (en) | Method for producing polymer particle | |
JP2008156469A (en) | Sulfonic acid-based resin particulate emulsion | |
JPH02240106A (en) | Production of aqueous resin particle | |
JP2004118009A (en) | Electrostatic charge image developing toner | |
JPH02240107A (en) | Production of aqueous resin particle | |
JPH03246554A (en) | Production of polymerized toner | |
JP2005060505A (en) | Dispersion | |
JP5185040B2 (en) | Method for producing polymer particles | |
JPS5837017A (en) | Production of spherical anion exchange resin | |
JP2524210B2 (en) | Polymerization toner and method for producing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080426 Year of fee payment: 13 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090426 Year of fee payment: 14 |
|
LAPS | Cancellation because of no payment of annual fees |