JPH03500215A - 洗い出し可能な記録担体を使用する印刷版の製造 - Google Patents

洗い出し可能な記録担体を使用する印刷版の製造

Info

Publication number
JPH03500215A
JPH03500215A JP50784288A JP50784288A JPH03500215A JP H03500215 A JPH03500215 A JP H03500215A JP 50784288 A JP50784288 A JP 50784288A JP 50784288 A JP50784288 A JP 50784288A JP H03500215 A JPH03500215 A JP H03500215A
Authority
JP
Japan
Prior art keywords
printing
line
light
printing plates
original
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50784288A
Other languages
English (en)
Japanese (ja)
Inventor
マインツ，ヘルマ
Original Assignee
ライノタイプ―ヘル　アクチエンゲゼルシャフト
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ライノタイプ―ヘル　アクチエンゲゼルシャフト filed Critical ライノタイプ―ヘル　アクチエンゲゼルシャフト
Publication of JPH03500215A publication Critical patent/JPH03500215A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • G03F3/107—Checking the colour or tonal value of separation negatives or positives using silver halide photosensitive materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP50784288A 1987-10-07 1988-10-07 洗い出し可能な記録担体を使用する印刷版の製造 Pending JPH03500215A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19873733874 DE3733874A1 (de) 1987-10-07 1987-10-07 Druckformherstellung mittels auswaschbarem bildtraeger
DE3733874.9 1987-10-07

Publications (1)

Publication Number Publication Date
JPH03500215A true JPH03500215A (ja) 1991-01-17

Family

ID=6337793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50784288A Pending JPH03500215A (ja) 1987-10-07 1988-10-07 洗い出し可能な記録担体を使用する印刷版の製造

Country Status (4)

Country Link
EP (1) EP0375733A1 (fr)
JP (1) JPH03500215A (fr)
DE (1) DE3733874A1 (fr)
WO (1) WO1989003545A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT394634B (de) * 1989-12-20 1992-05-25 Raganitsch Gmbh Druckverfahren
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5350753A (en) * 1976-10-19 1978-05-09 Process Shizai Heat recording material and method
JPS6194022A (ja) * 1984-10-09 1986-05-12 クロスフィールド　エレクトロニクス　リミティド 変調された放射ビームの発生方法および装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1094860A (fr) * 1976-06-10 1981-02-03 Raimund Faust Procede d'enregistrement d'images au moyen d'un rayon laser
JPS53120905A (en) * 1977-03-29 1978-10-21 Dainippon Printing Co Ltd Method of producing lithographic printing plate
US4225659A (en) * 1979-04-10 1980-09-30 Drexler Technology Corporation Method for making thermochromic photomasks
JPS5895348A (ja) * 1981-11-30 1983-06-06 Dainippon Screen Mfg Co Ltd 印刷版の製版方法
DE3232498A1 (de) * 1982-09-01 1984-03-01 Philips Patentverwaltung Gmbh, 2000 Hamburg Maske fuer die mustererzeugung in lackschichten mittels roentgenstrahllithographie und verfahren zu ihrer herstellung
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
DE3435792A1 (de) * 1983-10-01 1985-04-18 Mitsubishi Paper Mills, Ltd., Tokio/Tokyo Verfahren zur herstellung von lithografischen druckplatten
EP0151191A1 (fr) * 1984-01-25 1985-08-14 American Hoechst Corporation Matériel photosensible pour la fabrication d'originaux

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5350753A (en) * 1976-10-19 1978-05-09 Process Shizai Heat recording material and method
JPS6194022A (ja) * 1984-10-09 1986-05-12 クロスフィールド　エレクトロニクス　リミティド 変調された放射ビームの発生方法および装置

Also Published As

Publication number Publication date
DE3733874A1 (de) 1989-04-27
EP0375733A1 (fr) 1990-07-04
WO1989003545A1 (fr) 1989-04-20

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