JPH0345631U - - Google Patents
Info
- Publication number
- JPH0345631U JPH0345631U JP10748689U JP10748689U JPH0345631U JP H0345631 U JPH0345631 U JP H0345631U JP 10748689 U JP10748689 U JP 10748689U JP 10748689 U JP10748689 U JP 10748689U JP H0345631 U JPH0345631 U JP H0345631U
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- spray
- casing
- spinner
- chips
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989107486U JPH062260Y2 (ja) | 1989-09-13 | 1989-09-13 | スプレー装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989107486U JPH062260Y2 (ja) | 1989-09-13 | 1989-09-13 | スプレー装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0345631U true JPH0345631U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-04-26 |
| JPH062260Y2 JPH062260Y2 (ja) | 1994-01-19 |
Family
ID=31656177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989107486U Expired - Lifetime JPH062260Y2 (ja) | 1989-09-13 | 1989-09-13 | スプレー装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH062260Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006024963A (ja) * | 2005-09-22 | 2006-01-26 | Tokyo Electron Ltd | 洗浄処理装置 |
| JP2012142399A (ja) * | 2010-12-28 | 2012-07-26 | Tokyo Electron Ltd | 液処理装置および液処理方法 |
| JP2013004662A (ja) * | 2011-06-15 | 2013-01-07 | Tokyo Electron Ltd | 液処理装置および液処理方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5248633B2 (ja) * | 2011-01-18 | 2013-07-31 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5272579A (en) * | 1975-12-12 | 1977-06-17 | Ibm | Method of liquid treatment for semiconductor wafer |
| JPS5963726A (ja) * | 1982-10-05 | 1984-04-11 | Toshiba Corp | ホトレジスト現像装置 |
| US4564280A (en) * | 1982-10-28 | 1986-01-14 | Fujitsu Limited | Method and apparatus for developing resist film including a movable nozzle arm |
| JPS62187680U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1986-05-20 | 1987-11-28 |
-
1989
- 1989-09-13 JP JP1989107486U patent/JPH062260Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5272579A (en) * | 1975-12-12 | 1977-06-17 | Ibm | Method of liquid treatment for semiconductor wafer |
| JPS5963726A (ja) * | 1982-10-05 | 1984-04-11 | Toshiba Corp | ホトレジスト現像装置 |
| US4564280A (en) * | 1982-10-28 | 1986-01-14 | Fujitsu Limited | Method and apparatus for developing resist film including a movable nozzle arm |
| JPS62187680U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1986-05-20 | 1987-11-28 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006024963A (ja) * | 2005-09-22 | 2006-01-26 | Tokyo Electron Ltd | 洗浄処理装置 |
| JP2012142399A (ja) * | 2010-12-28 | 2012-07-26 | Tokyo Electron Ltd | 液処理装置および液処理方法 |
| JP2013004662A (ja) * | 2011-06-15 | 2013-01-07 | Tokyo Electron Ltd | 液処理装置および液処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH062260Y2 (ja) | 1994-01-19 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |