JPH034454U - - Google Patents
Info
- Publication number
- JPH034454U JPH034454U JP6348989U JP6348989U JPH034454U JP H034454 U JPH034454 U JP H034454U JP 6348989 U JP6348989 U JP 6348989U JP 6348989 U JP6348989 U JP 6348989U JP H034454 U JPH034454 U JP H034454U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- vacuum chamber
- irradiation device
- shield electrode
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 8
- 239000012212 insulator Substances 0.000 claims description 2
- 238000009413 insulation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 210000003254 palate Anatomy 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6348989U JPH0628773Y2 (ja) | 1989-05-31 | 1989-05-31 | 非走査形の電子線照射装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6348989U JPH0628773Y2 (ja) | 1989-05-31 | 1989-05-31 | 非走査形の電子線照射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH034454U true JPH034454U (enrdf_load_stackoverflow) | 1991-01-17 |
JPH0628773Y2 JPH0628773Y2 (ja) | 1994-08-03 |
Family
ID=31593583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6348989U Expired - Lifetime JPH0628773Y2 (ja) | 1989-05-31 | 1989-05-31 | 非走査形の電子線照射装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0628773Y2 (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005300327A (ja) * | 2004-04-12 | 2005-10-27 | Iwasaki Electric Co Ltd | 電子線照射装置 |
WO2013129072A1 (ja) * | 2012-03-02 | 2013-09-06 | 浜松ホトニクス株式会社 | X線照射源 |
CN114649204A (zh) * | 2022-03-15 | 2022-06-21 | 南京大学 | 一种亚10nm间隙电极对的制备方法 |
-
1989
- 1989-05-31 JP JP6348989U patent/JPH0628773Y2/ja not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005300327A (ja) * | 2004-04-12 | 2005-10-27 | Iwasaki Electric Co Ltd | 電子線照射装置 |
WO2013129072A1 (ja) * | 2012-03-02 | 2013-09-06 | 浜松ホトニクス株式会社 | X線照射源 |
JP2013182814A (ja) * | 2012-03-02 | 2013-09-12 | Hamamatsu Photonics Kk | X線照射源 |
CN114649204A (zh) * | 2022-03-15 | 2022-06-21 | 南京大学 | 一种亚10nm间隙电极对的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0628773Y2 (ja) | 1994-08-03 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |