JPH0344252Y2 - - Google Patents
Info
- Publication number
- JPH0344252Y2 JPH0344252Y2 JP1984201282U JP20128284U JPH0344252Y2 JP H0344252 Y2 JPH0344252 Y2 JP H0344252Y2 JP 1984201282 U JP1984201282 U JP 1984201282U JP 20128284 U JP20128284 U JP 20128284U JP H0344252 Y2 JPH0344252 Y2 JP H0344252Y2
- Authority
- JP
- Japan
- Prior art keywords
- waste gas
- cleaning liquid
- pipe
- bubbling plate
- supply pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002912 waste gas Substances 0.000 claims description 57
- 238000004140 cleaning Methods 0.000 claims description 36
- 239000007788 liquid Substances 0.000 claims description 32
- 230000005587 bubbling Effects 0.000 claims description 27
- 230000005856 abnormality Effects 0.000 claims description 10
- 239000007921 spray Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 230000002269 spontaneous effect Effects 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984201282U JPH0344252Y2 (xx) | 1984-12-28 | 1984-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984201282U JPH0344252Y2 (xx) | 1984-12-28 | 1984-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61115129U JPS61115129U (xx) | 1986-07-21 |
| JPH0344252Y2 true JPH0344252Y2 (xx) | 1991-09-18 |
Family
ID=30762924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984201282U Expired JPH0344252Y2 (xx) | 1984-12-28 | 1984-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0344252Y2 (xx) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51105679A (ja) * | 1975-03-13 | 1976-09-18 | Sony Corp | Gasusenjosochi |
| JPS5327961U (xx) * | 1976-08-13 | 1978-03-09 | ||
| JPS5541883A (en) * | 1978-09-20 | 1980-03-24 | Hideto Fujii | Explosion preventing method and apparatus for dust collector using bag filter |
| JPS5657423A (en) * | 1979-10-16 | 1981-05-19 | Matsushita Electric Ind Co Ltd | Central cleaner |
| JPS5794323A (en) * | 1980-12-03 | 1982-06-11 | Stanley Electric Co Ltd | Treating method for waste gas of cvd apparatus |
| JPS6142321A (ja) * | 1984-08-06 | 1986-02-28 | Sony Corp | シランガス処理装置 |
-
1984
- 1984-12-28 JP JP1984201282U patent/JPH0344252Y2/ja not_active Expired
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51105679A (ja) * | 1975-03-13 | 1976-09-18 | Sony Corp | Gasusenjosochi |
| JPS5327961U (xx) * | 1976-08-13 | 1978-03-09 | ||
| JPS5541883A (en) * | 1978-09-20 | 1980-03-24 | Hideto Fujii | Explosion preventing method and apparatus for dust collector using bag filter |
| JPS5657423A (en) * | 1979-10-16 | 1981-05-19 | Matsushita Electric Ind Co Ltd | Central cleaner |
| JPS5794323A (en) * | 1980-12-03 | 1982-06-11 | Stanley Electric Co Ltd | Treating method for waste gas of cvd apparatus |
| JPS6142321A (ja) * | 1984-08-06 | 1986-02-28 | Sony Corp | シランガス処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61115129U (xx) | 1986-07-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3280173B2 (ja) | 排ガス処理装置 | |
| US5649985A (en) | Apparatus for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process | |
| US8246732B2 (en) | Exhaust gas cleaning apparatus | |
| KR101597008B1 (ko) | 배기 시스템 | |
| US5693293A (en) | Apparatus for the purification of waste gas | |
| EP1450936B1 (en) | Method and apparatus for treating exhaust gas comprising a fluorine compound and carbon monoxide | |
| US6821317B2 (en) | Wet-process gas treatment method and wet-process gas treatment apparatus | |
| KR20020019018A (ko) | 반도체 제조 배출 가스의 산화 처리용 배기 가스 스트림처리 시스템 | |
| KR20090104804A (ko) | 가스 처리장치 | |
| KR19990045278A (ko) | 과불화물의 처리 방법 및 그 처리 장치 | |
| JP2010063951A (ja) | 排ガス処理方法および処理装置 | |
| JP3866412B2 (ja) | 半導体製造排ガスの除害方法及び除害装置 | |
| JPH0344252Y2 (xx) | ||
| JPH11319485A (ja) | 過弗化物の処理方法及びその処理装置 | |
| JP2001355825A (ja) | 排ガスの処理方法および処理装置 | |
| GB2308991A (en) | Purification of waste gas | |
| US20230390694A1 (en) | Exhaust gas treatment facility | |
| JP5004453B2 (ja) | 排ガスの処理方法及び処理装置 | |
| JPS6362528A (ja) | 排気ガス処理装置 | |
| JP2001179051A (ja) | 水素含有排ガスの除害方法及び除害装置 | |
| US7553356B2 (en) | Exhaust gas scrubber for epitaxial wafer manufacturing device | |
| JP3242875B2 (ja) | 排ガス除害装置及び排ガスの除害方法 | |
| JP7230940B2 (ja) | 排ガス処理設備 | |
| JPH0779949B2 (ja) | 排ガス処理装置 | |
| JP4583880B2 (ja) | 排ガスの処理方法および処理装置 |