JPH0343342B2 - - Google Patents
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- Publication number
- JPH0343342B2 JPH0343342B2 JP13099486A JP13099486A JPH0343342B2 JP H0343342 B2 JPH0343342 B2 JP H0343342B2 JP 13099486 A JP13099486 A JP 13099486A JP 13099486 A JP13099486 A JP 13099486A JP H0343342 B2 JPH0343342 B2 JP H0343342B2
- Authority
- JP
- Japan
- Prior art keywords
- container
- calcia
- evaporated
- vacuum evaporation
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 31
- 239000000292 calcium oxide Substances 0.000 claims description 29
- 235000012255 calcium oxide Nutrition 0.000 claims description 29
- 239000000126 substance Substances 0.000 claims description 16
- 238000007738 vacuum evaporation Methods 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 11
- 239000010439 graphite Substances 0.000 description 11
- 229910002804 graphite Inorganic materials 0.000 description 11
- 238000001771 vacuum deposition Methods 0.000 description 9
- 150000002739 metals Chemical class 0.000 description 8
- 239000011819 refractory material Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- -1 resistors Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 229910004261 CaF 2 Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 235000019738 Limestone Nutrition 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 235000011116 calcium hydroxide Nutrition 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052576 carbides based ceramic Inorganic materials 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000010459 dolomite Substances 0.000 description 1
- 229910000514 dolomite Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000006028 limestone Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
［産業上の利用分野］
本発明は真空蒸着用容器に係り、特に真空蒸着
において蒸発させる物質を保持するための容器に
おいて、その高温安定性や保持物質への汚染性を
改善した真空蒸着用容器に関する。
［従来の技術］
金属等の部材表面の耐摩耗性、耐食性等の諸特
性の向上、あるいは装飾美化のために、その表面
に他の金属等の被覆膜を形成する技術は古くから
行われている。
この被覆膜の形成方法としては、近年、真空蒸
着（PVD）、スパツタリング、化学蒸着（CVD）
のような気相めつき法が重視されており、これら
のうち、真空蒸着法は、
物理的操作だけで皮膜を形成できるので水素
脆性の心配がない。
被蒸着面を特に加熱する必要がない。
膜厚が比較的均一である。
非導電性の物体にも被覆できる。
得られる膜面は光沢が優れ、変色が少ない。
等の特徴を有し、極めて有利な方法である。この
ため、真空蒸着法は、表面反射鏡、レンズの反射
防止膜や各種のフイルター、その他、最近ではプ
ラスチツク製品、装飾品、おもちや、ネームプレ
ート、更にペーパーコンデンサ、抵抗器、セレン
整流器、印刷回路等の電気製品等に広く応用され
ている。
真空蒸着の工業的装置では、均一に皮膜が形成
できるように被蒸着体を回転する装置、あるいは
長尺ものを連続的に蒸着する装置を組み込んだも
のがある。蒸発源の加熱方法には、抵抗加熱、高
周波誘導加熱、電子線加熱及び輻射加熱などの方
法が採用されている。現在、蒸発させる金属とし
てアルミニウムが大部分を占めているが、その
他、亜鉛、金、銀、クロム、ニツケル、銅、セレ
ン、フツ化マグネシウム、硫化亜鉛、一酸化ケイ
素などが使用される。
しかして、これらの蒸発させる物質を保持する
ための真空蒸着用容器の材質としては、従来、水
冷銅やAl2O3、ZrO2、MgO等の酸化物系セラミ
ツク、Si3N4、BN、SiC等の窒化物系又は炭化物
系セラミツクが採用されている。
［発明が解決しようとする問題点］
しかしながら、従来の真空蒸着用容器のうち、
水冷銅よりなるものは、金属等の蒸発物質の温度
を高温まで上昇させ難く、電子ビーム等が当つた
場合には銅が溶解して溶湯中に取り込まれ、溶湯
を汚染する場合があるため、高純度の蒸着面が得
られないという欠点がある。
また、Al2O3等の酸化物系セラミツク製容器で
は、これらの金属酸化物が高温で溶融、分解した
り、金属等の蒸発物質と反応し易いために、使用
上限温度が低く、また、活性金属に対する耐食性
が低く溶解中に不純物質を混入させる等の理由に
より、保持し得る金属の種類に制限がある。
Si3N4等のセラミツクもまた、高温で分解し易
く、特に真空中では易分解性となるため、高温で
の使用に耐えないという問題がある。
このため、従来の真空蒸着用容器では、容器内
に保持する蒸発物質を汚染することなく、また高
温溶解を可能とすることにより、良好な真空蒸着
面を効率的に形成することが極めて難しかつた。
［問題点を解決するための手段］
本発明は上記従来の問題点を解決するものであ
つて、真空蒸着において蒸発させる物質を保持す
るための容器の内壁面のうち少なくとも蒸発させ
る物質と接触する部分をカルシア質耐火物で構成
したものである。
以下図面を参照して本発明を詳細に説明する。
なお、本明細書において「％」は「重量％」を示
す。
第１図は本発明の実施例に係る真空蒸着用容器
の縦断面図である。
本発明の真空蒸着用容器１は、その内壁面のう
ち少なくとも蒸発させる物質と接触する部分が、
カルシア質耐火物２で構成されている。
本発明において、カルシア質耐火物としては、
カルシア（CaO）を40％、とりわけ60％以上含む
ものが好適である。また、活性の高い金属等を蒸
発させる場合にはカルシア含有量が90％以上、と
りわけ98％以上の高純度カルシア質耐火物を用い
るのが好ましい。カルシア質耐火物に含有される
その他の成分のうち、特に真空中で分解し易い、
SiO2、MgO、Al2O3、TiO2、B2O3等の含有量
は、各々１％以下、総量で５％以下とするのが好
ましい。また、ZrO2は真空中で比較的安定であ
るが、溶湯との反応、特にＣとの反応を起こし易
いことから多量の含有は望ましくはい。一般に、
カルシア質耐火物中のZrO2含有量は10％以下と
するのが好ましい。
本発明において、カルシア質耐火物としては、
石灰石、消石灰、生石灰等を焼結したカルシア耐
火物の他、電融カルシア等の実質的にカルシアの
みからなるカルシア系耐火物が好適であるが、そ
の他ラルナイト耐火物（安定化2CaO・SiO2）、
メルウイナイト耐火物（3CaO・MgO・2SiO2）、
CaOを富化したドロマイト耐火物等を用いること
もできる。
なお、これらのカルシア質耐火物を用いて本発
明の容器を製造するにあたり、バインダーの使用
量も低減させるのが好ましく、CaF2以外のバイ
ンダーは0.2％以下とするのが好ましい。CaF2は
分解し難いことから、２％以下程度の使用量であ
れば、バインダーとして好適である。
第１図に示す実施例においては、カルシア質耐
火物２よりなる内容器を黒鉛３からなる外容器で
被覆一体化した構成としている。このように黒鉛
製外容器を設けることにより、カルシア質耐火物
容器の強度を補強することができる。
即ち、カルシア質耐火物を、CaO単体でその純
度を向上させてゆくと、焼結が難しくなり、得ら
れる容器の機械的強度が低下してくる。このため
第１図に示すように、黒鉛３等による補強部材で
バツクアツプすることが必要となる場合がある。
この補強部材の材質としては、内容器のカルシア
質耐火物と反応し難いものが好ましく、この点か
ら黒鉛は極めて好適である。黒鉛を用いた場合に
は、高周波加熱や抵抗加熱用の容器としても使用
できるという効果もある。補強部材の材質として
は、その他、ZrO2、MgO等も採用できる。これ
らはCaOとの共晶点が高く、カルシア質耐火物が
電子ビーム等で高温にさらされても共晶反応が起
こり、融点の低下が少ないため、十分に高温度下
での使用に耐え得る。
本発明の真空蒸着用容器の形状は第１図に示す
ものに何ら限定されず、舟型、坩堝型、また、把
手付、半蓋付のもの等、従来より真空蒸着に用い
られているあらゆる容器形状に適用できる。
また、使用する際の加熱手段としては、電子ビ
ーム加熱が最適であるが、第１図に示す如く、黒
鉛等の導電性部材を設けることにより、高周波加
熱、抵抗加熱等、あらゆる加熱手段を採用するこ
とができる。
［作用］
カルシアは高温でも安定であり、しかも真空中
で極めて安定で分解し難い。しかも、黒鉛や
MgO、ZrO2等に対する安定性も高い。このた
め、本発明のカルシア質耐火物で内壁面が構成さ
れた真空蒸着用容器によれば、
容器内に保持する蒸発物質の溶湯を汚染する
ことがなく、高純度の蒸気が得られるため、良
好な蒸着面を形成することができる。
万一、電子ビーム等があたつて、一部が、
2600℃以上の高温にさらされるようになつて
も、分解することはなく、溶解して蒸発物質の
溶湯上に浮上するのみであるので、蒸着に悪影
響を及ぼすことがない。
黒鉛やMgO、ZrO2等に対する反応性が著し
く低いため、これらの部材を複層化することに
より、補強あるいは導電処理することが容易で
ある。
等の優れた利点を有する。
［実施例］
以下、実施例及び比較例について説明する。
実施例 １
第１図に示すようなカルシア質耐火物２の内容
器と黒鉛３の外容器で構成された容器を用いて真
空蒸着を行つた。
即ち、容器中に蒸発物質としてNi−80wt％Cr
合金を入れ、真空蒸着装置（電子ビーム、加熱方
式）に設置して、アルミナセラミツク製の板材表
面に真空蒸着膜を形成した。
得られた蒸着膜の成分分析結果を第１表に示
す。
なお、用いたカルシア質耐火物の組成は第２表
に示す通りである。
比較例 １、２
第２表に示す組成のセラミツクスで構成された
容器を用いたこと以外は実施例１と同様にして真
空蒸着を行つた。
得られた蒸着膜の成分分析結果を第１表に示
す。
[Industrial Application Field] The present invention relates to a container for vacuum evaporation, and particularly to a container for holding a substance to be evaporated in vacuum evaporation, which has improved high-temperature stability and contamination resistance to the retained substance. Regarding. [Prior art] The technology of forming a coating film of other metals, etc. on the surface of a metal member has been practiced for a long time in order to improve various characteristics such as wear resistance and corrosion resistance of the surface of the member, or to beautify the surface. ing. In recent years, methods for forming this coating film include vacuum vapor deposition (PVD), sputtering, and chemical vapor deposition (CVD).
Vapor-phase plating methods such as the above are being emphasized, and among these methods, vacuum evaporation methods do not have to worry about hydrogen embrittlement because they can form a film using only physical operations. There is no need to particularly heat the surface to be deposited. The film thickness is relatively uniform. It can also coat non-conductive objects. The resulting film surface has excellent gloss and little discoloration. This method has the following characteristics and is extremely advantageous. For this reason, the vacuum evaporation method can be applied to surface reflective mirrors, anti-reflection coatings for lenses, various filters, and recently plastic products, decorations, toys, name plates, paper capacitors, resistors, selenium rectifiers, printed circuits, etc. It is widely applied to electrical products such as Some industrial equipment for vacuum evaporation incorporates a device that rotates the object to be deposited so that a film can be formed uniformly, or a device that continuously evaporates a long object. As methods for heating the evaporation source, methods such as resistance heating, high frequency induction heating, electron beam heating, and radiation heating are employed. Currently, aluminum occupies most of the metals to be evaporated, but other metals used include zinc, gold, silver, chromium, nickel, copper, selenium, magnesium fluoride, zinc sulfide, and silicon monoxide. Conventionally, materials for the vacuum evaporation container for holding these substances to be evaporated include water-cooled copper, oxide ceramics such as Al 2 O 3 , ZrO 2 , and MgO, Si 3 N 4 , BN, Nitride-based or carbide-based ceramics such as SiC are used. [Problems to be solved by the invention] However, among the conventional vacuum deposition containers,
With water-cooled copper, it is difficult to raise the temperature of evaporated substances such as metals to high temperatures, and when exposed to electron beams, etc., the copper may melt and be incorporated into the molten metal, contaminating the molten metal. There is a drawback that a highly pure vapor deposition surface cannot be obtained. In addition, in containers made of oxide-based ceramics such as Al 2 O 3 , the upper limit temperature for use is low because these metal oxides melt and decompose at high temperatures and easily react with vaporized substances such as metals. There are limits to the types of metals that can be retained due to low corrosion resistance to active metals and the possibility of contaminating impurities during melting. Ceramics such as Si 3 N 4 also tend to decompose at high temperatures, especially in vacuum, and therefore have the problem of not being able to withstand use at high temperatures. For this reason, with conventional vacuum evaporation containers, it is extremely difficult to efficiently form a good vacuum evaporation surface without contaminating the evaporated substances held in the container and by enabling high-temperature melting. Ta. [Means for Solving the Problems] The present invention solves the above-mentioned problems of the conventional art, and provides at least a portion of the inner wall surface of a container for holding a substance to be evaporated in vacuum evaporation that comes into contact with the substance to be evaporated. Parts are made of calcia refractory. The present invention will be described in detail below with reference to the drawings.
In addition, in this specification, "%" indicates "weight %". FIG. 1 is a longitudinal sectional view of a vacuum deposition container according to an embodiment of the present invention. The vacuum evaporation container 1 of the present invention has at least a portion of its inner wall surface that comes into contact with the substance to be evaporated.
It is composed of calcia refractory 2. In the present invention, the calcia refractories include:
One containing 40%, especially 60% or more of calcia (CaO) is suitable. Furthermore, when highly active metals and the like are evaporated, it is preferable to use a high-purity calcia refractory having a calcia content of 90% or more, particularly 98% or more. Among other components contained in calcia refractories, those that are particularly easy to decompose in vacuum,
The content of SiO 2 , MgO, Al 2 O 3 , TiO 2 , B 2 O 3 and the like is preferably 1% or less each and 5% or less in total. Furthermore, although ZrO 2 is relatively stable in vacuum, it is undesirable to contain a large amount because it tends to react with molten metal, especially with C. in general,
The ZrO 2 content in the calcia refractory is preferably 10% or less. In the present invention, the calcia refractories include:
In addition to calcia refractories made by sintering limestone, slaked lime, quicklime , etc., calcia-based refractories consisting essentially only of calcia, such as fused calcia, are suitable; ,
Melwinite refractory (3CaO・MgO・2SiO 2 ),
CaO-enriched dolomite refractories and the like can also be used. Note that when producing the container of the present invention using these calcia refractories, it is preferable to reduce the amount of binder used, and it is preferable that the amount of binders other than CaF 2 is 0.2% or less. Since CaF 2 is difficult to decompose, it is suitable as a binder if used in an amount of about 2% or less. In the embodiment shown in FIG. 1, an inner container made of calcia refractory 2 is integrally covered with an outer container made of graphite 3. By providing the graphite outer container in this manner, the strength of the calcia refractory container can be reinforced. That is, when the purity of a calcia refractory is improved using CaO alone, sintering becomes difficult and the mechanical strength of the resulting container decreases. For this reason, as shown in FIG. 1, it may be necessary to back it up with a reinforcing member such as graphite 3.
The reinforcing member is preferably made of a material that does not easily react with the calcia refractory of the inner container, and from this point of view graphite is extremely suitable. When graphite is used, it has the advantage that it can also be used as a container for high frequency heating or resistance heating. Other materials such as ZrO 2 and MgO can also be used as the material for the reinforcing member. These have a high eutectic point with CaO, and even when calcia refractories are exposed to high temperatures with electron beams, a eutectic reaction occurs and the melting point decreases little, so they can withstand use at sufficiently high temperatures. . The shape of the vacuum evaporation container of the present invention is not limited to that shown in FIG. Applicable to container shapes. In addition, electron beam heating is the most suitable heating means, but as shown in Figure 1, by providing a conductive member such as graphite, any heating means such as high frequency heating and resistance heating can be used. can do. [Function] Calcia is stable even at high temperatures, and is extremely stable and difficult to decompose in vacuum. Moreover, graphite
It also has high stability against MgO, ZrO 2, etc. Therefore, according to the vacuum evaporation container whose inner wall surface is made of the calcia refractory of the present invention, highly pure vapor can be obtained without contaminating the molten metal of the evaporated substance held in the container. A good vapor deposition surface can be formed. In the unlikely event that an electron beam etc. hits some of them,
Even if it is exposed to high temperatures of 2,600°C or higher, it will not decompose and will only dissolve and float above the molten metal of the evaporated material, so it will not have a negative effect on vapor deposition. Since the reactivity to graphite, MgO, ZrO 2 , etc. is extremely low, it is easy to perform reinforcement or conductive treatment by layering these materials. It has excellent advantages such as [Example] Examples and comparative examples will be described below. Example 1 Vacuum deposition was carried out using a container composed of an inner container of calcia refractory 2 and an outer container of graphite 3 as shown in FIG. That is, Ni-80wt%Cr is contained in the container as an evaporated substance.
The alloy was placed in a vacuum evaporation device (electron beam, heating method) to form a vacuum evaporation film on the surface of the alumina ceramic plate. Table 1 shows the results of component analysis of the obtained vapor deposited film. The composition of the calcia refractory used is as shown in Table 2. Comparative Examples 1 and 2 Vacuum deposition was carried out in the same manner as in Example 1, except that a container made of ceramic having the composition shown in Table 2 was used. Table 1 shows the results of component analysis of the obtained vapor deposited film.
【表】【table】
【表】【table】
【表】
第１表より、本発明の真空蒸着用容器によれ
ば、蒸発物質の溶湯の汚染を防いで、高純度の蒸
着膜を形成することができることが明らかであ
る。
［発明の効果］
以上詳述した通り、本発明の真空蒸着用容器
は、容器内壁面のうち少なくとも蒸発させる物質
と接触する部分がカルシア質耐火物で構成されて
いるものであつて、カルシアの極めて優れた安定
性のために、容器内に保持する蒸発物質の溶湯を
汚染することがなく、高純度の蒸気が得られるた
め、良好な蒸着面を効率的に形成することができ
る。
しかも、黒鉛等に対する反応性が著しく低いこ
とから、これらを複合化することにより、補強、
導電化を図ることができ、極めて有利である。[Table] From Table 1, it is clear that according to the vacuum deposition container of the present invention, it is possible to prevent the contamination of the molten metal by the evaporated substance and form a highly pure deposited film. [Effects of the Invention] As detailed above, in the vacuum evaporation container of the present invention, at least the portion of the inner wall surface of the container that comes into contact with the substance to be evaporated is made of a calcia-based refractory, and Due to its extremely excellent stability, the molten metal of the evaporated substance held in the container is not contaminated, and high-purity vapor is obtained, making it possible to efficiently form a good evaporation surface. Moreover, since the reactivity with graphite etc. is extremely low, by combining these materials, reinforcement,
It is extremely advantageous because it can be made electrically conductive.
第１図は本発明の実施例に係る真空蒸着用容器
を説明する断面図である。
１……真空蒸着用容器、２……カルシア質耐火
物、３……黒鉛。
FIG. 1 is a sectional view illustrating a vacuum deposition container according to an embodiment of the present invention. 1... Container for vacuum deposition, 2... Calcia refractory, 3... Graphite.
Claims (1)
ための容器であつて、容器内壁面のうち少なくと
も蒸発させる物質と接触する部分がカルシア質耐
火物で構成されていることを特徴とする真空蒸着
用容器。1. A container for vacuum evaporation, which is a container for holding a substance to be evaporated in vacuum evaporation, characterized in that at least a portion of the inner wall surface of the container that comes into contact with the substance to be evaporated is made of a calcia refractory.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13099486A JPS62287064A (en) | 1986-06-05 | 1986-06-05 | Vessel for vacuum deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13099486A JPS62287064A (en) | 1986-06-05 | 1986-06-05 | Vessel for vacuum deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62287064A JPS62287064A (en) | 1987-12-12 |
| JPH0343342B2 true JPH0343342B2 (en) | 1991-07-02 |
Family
ID=15047447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13099486A Granted JPS62287064A (en) | 1986-06-05 | 1986-06-05 | Vessel for vacuum deposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62287064A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9090363B2 (en) | 2003-07-30 | 2015-07-28 | Graham Packaging Company, L.P. | Container handling system |
-
1986
- 1986-06-05 JP JP13099486A patent/JPS62287064A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9090363B2 (en) | 2003-07-30 | 2015-07-28 | Graham Packaging Company, L.P. | Container handling system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62287064A (en) | 1987-12-12 |
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