JPH0343244U - - Google Patents
Info
- Publication number
- JPH0343244U JPH0343244U JP10447989U JP10447989U JPH0343244U JP H0343244 U JPH0343244 U JP H0343244U JP 10447989 U JP10447989 U JP 10447989U JP 10447989 U JP10447989 U JP 10447989U JP H0343244 U JPH0343244 U JP H0343244U
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- insulator
- fixing flange
- head fixing
- attached
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第1図は、この考案の一実施例に係るイオン源
構成部品の着脱構造を示す図である。第2図は、
第1図の絶縁碍子周りを同図の左側から見た図で
ある。第3図は、イオン注入装置のイオン源周り
の一例を部分的に示す図である。
2…イオン源、4…プラズマ生成部、6…イオ
ン源ヘツド、10…ヘツド固定フランジ、10a
…平坦面、10b…中心軸、14…絶縁碍子、2
0…イオン源チヤンバー、20b…中心軸、24
…ゲートバルブ(相手側機器)、34…支持盤、
36…ガイドレール、40…台車、42…碍子受
、44…ヘツド固定フランジ位置決め部材、44
a…平坦面。
FIG. 1 is a diagram showing a structure for attaching and detaching ion source components according to an embodiment of this invention. Figure 2 shows
FIG. 2 is a view of the insulator and its surroundings in FIG. 1 as viewed from the left side of the same figure. FIG. 3 is a diagram partially showing an example of the ion source surroundings of the ion implantation apparatus. 2... Ion source, 4... Plasma generation section, 6... Ion source head, 10... Head fixing flange, 10a
...Flat surface, 10b... Central axis, 14... Insulator, 2
0... Ion source chamber, 20b... Central axis, 24
...Gate valve (opposite device), 34...Support board,
36...Guide rail, 40...Dolly, 42...Insulator holder, 44...Head fixing flange positioning member, 44
a...Flat surface.
Claims (1)
ーに対して、リング状の絶縁碍子であつてプラズ
マ生成部を含むイオン源ヘツドを固定するための
ヘツド固定フランジが端面に取り付けられたもの
を着脱するための構造であつて、前記ヘツド固定
フランジの下部周面に二つの平坦面を設けておき
、かつ、イオン源部の支持盤上にガイドレールを
設けてその上に、前記絶縁碍子を支持する二つの
碍子受と、絶縁碍子をこの碍子受に乗せたときに
前記ヘツド固定フランジの各平坦面にそれぞれ当
接して当該ヘツド固定フランジの中心軸と前記イ
オン源チヤンバーの中心軸とを一致させる二つの
平坦面を有するヘツド固定フランジ位置決め部材
とが取り付けられた台車を走行自在に乗せておき
、このような台車を用いて前記絶縁碍子を前記イ
オン源チヤンバーに対して着脱することができる
ようにしたことを特徴とするイオン源構成部品の
着脱構造。 A ring-shaped insulator with a head fixing flange attached to the end face for fixing the ion source head containing the plasma generation part to and from the ion source chamber attached to the other device. The structure is such that two flat surfaces are provided on the lower peripheral surface of the head fixing flange, and a guide rail is provided on the support plate of the ion source section, and two flat surfaces are provided on the support plate of the ion source section, and two flat surfaces are provided on the support plate of the ion source section. an insulator holder; and two flat surfaces that come into contact with each flat surface of the head fixing flange to align the central axis of the head fixing flange with the central axis of the ion source chamber when the insulator is placed on the insulator holder. A cart to which a head fixing flange positioning member having a surface is attached is movably mounted, and the insulator can be attached to and detached from the ion source chamber using such a cart. Features a detachable structure for ion source components.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10447989U JPH0343244U (en) | 1989-09-06 | 1989-09-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10447989U JPH0343244U (en) | 1989-09-06 | 1989-09-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0343244U true JPH0343244U (en) | 1991-04-23 |
Family
ID=31653274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10447989U Pending JPH0343244U (en) | 1989-09-06 | 1989-09-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0343244U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160068637A (en) * | 2014-12-05 | 2016-06-15 | 닛신 이온기기 가부시기가이샤 | Ion source, support member, suspension mechanism, ion source transfer system and ion source transfer method |
-
1989
- 1989-09-06 JP JP10447989U patent/JPH0343244U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160068637A (en) * | 2014-12-05 | 2016-06-15 | 닛신 이온기기 가부시기가이샤 | Ion source, support member, suspension mechanism, ion source transfer system and ion source transfer method |