JPH034076B2 - - Google Patents
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- Publication number
- JPH034076B2 JPH034076B2 JP18927582A JP18927582A JPH034076B2 JP H034076 B2 JPH034076 B2 JP H034076B2 JP 18927582 A JP18927582 A JP 18927582A JP 18927582 A JP18927582 A JP 18927582A JP H034076 B2 JPH034076 B2 JP H034076B2
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- JP
- Japan
- Prior art keywords
- parts
- formula
- acid
- solvent
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 150000001875 compounds Chemical class 0.000 claims description 15
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 8
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 21
- 230000009102 absorption Effects 0.000 description 13
- 238000010521 absorption reaction Methods 0.000 description 13
- 239000002904 solvent Substances 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- -1 acrylate ester Chemical class 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 238000003847 radiation curing Methods 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- QFSYADJLNBHAKO-UHFFFAOYSA-N 2,5-dihydroxy-1,4-benzoquinone Chemical compound OC1=CC(=O)C(O)=CC1=O QFSYADJLNBHAKO-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- UIXRDRQSWYSVNK-UHFFFAOYSA-N 2-butyl-4,6-dimethylphenol Chemical compound CCCCC1=CC(C)=CC(C)=C1O UIXRDRQSWYSVNK-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000003348 petrochemical agent Substances 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Description
本発明は新規な不飽和化合物およびその製造方
法に関するものである。
カプロラクトンと種々の重合開始剤とよりポリ
カプロラクトンエステルのような、相当するそれ
らの誘導体を製造する反応は、特公昭34−5292号
公報、特公昭34−5293号公報、特公昭41−9559号
公報等に開示されている。また、従来より各種の
アクリレートエステル類が合成されている。しか
しながら一般式〔〕
(但し、R2はCH3,C2H5,又はC3H7を表わ
す。)
で表わされるジオール類のカプロラクトン誘導体
の(メタ)アクリレートエステルは先行技術にお
いて示唆され、あるいは開示されたことはなかつ
た。
本発明の新規な不飽和化合物は下記構造式によ
り定義されるものである。
(式中、R1はH、又はCH3、R2はCH3,C2H5,
又はC3H7;m及びnの平均値は、0〜15の数、
m+nの平均合計値は1〜30の数であつて、好ま
しくは1〜6である。)
この新規な不飽和化合物〔〕は一般式〔〕
(但し、式〔〕中R2はCH3,C2H5,又は
C3H7;m及びnの平均値は0〜15の数、m+n
の平均合計値は1〜30の数であつて、好ましくは
1〜6である。)で表わされる、前記一般式〔〕
で表わされるジオール類とエプシロンカプロラク
トンとの縮合物をアクリル酸もしくはメタクリル
酸でエステル化する事によつて製造する事を特徴
とする。更に詳しく説明するならば、本発明に用
る一般式〔〕で表わされるジオール類とエプシ
ロンカプロラクトンとの縮合物は一般式〔〕で
表わされるジオール類とエプシロンカプロラクト
ンを付加させ得られたものである。したがつて、
式中のm及びnはエプシロンカプロラクトンの平
均的付加量である。またアクリル酸またはメタク
リル酸は化学量論比以上に使用されるのが通常で
ある。一般にアルコールに対するカルボン酸のモ
ル比は1.0〜2.0であるが好ましくは1.1〜1.5であ
る。反応は触媒を使用し生成する水は蒸留する事
により促進されるこのような触媒は、硫酸、p−
トルエンスルホン酸等の酸性触媒であり、その使
用量はアクリル酸またはメタクリル酸に対して
0.1〜10モル%、好ましくは1〜5モル%使用さ
れる。反応により生成した水を蒸留するのには共
沸溶剤を用いるのが有利である。このような共沸
溶剤は60℃〜130℃の沸点を有し、水と分離し易
いものなら使用できるが、n−ヘキサン、n−ヘ
プタンのような脂肪族炭化水素、ベンゼン、トル
エンのような芳香族炭化水素、シクロヘキサンの
ような脂環式炭化水素が適している。その使用量
は、通常、反応混合物の5〜70重量パーセントで
ある。反応温度は、60〜130℃の範囲でよいが、
反応時間の短縮と重合防止の点から、75〜120℃
で行われるのが有利である。
アクリル酸またはメタクリル酸には既に重合防
止剤が添加されているのが普通であるが、反応時
に改めて重合防止剤を添加してもよい。そのよう
な重合防止剤には、ハイドロキノン、p−メトキ
シフエノール、2,4−ジメチル−6−1−ブチ
ルフエノール、3−ヒドロキシチオール、α−ニ
トロソ−β−ナフトール、p−ベンゾキノン、
2,5−ジヒドロキシ−p−キノン、フエノチア
ジン、N−ニトロソジフエニルアミン、銅塩等が
挙げられる。その使用量は通常反応混合物に対し
て0.01〜1重量%である。
本発明の不飽和化合物は、必要ならば水若しく
はアルカリ水溶液等で洗滌したり、減圧蒸留のよ
うな方法で溶剤と分離する事によつて、工業的用
途に使用される。この不飽和化合物は、コーテイ
ング及びインキ組成物のビヒクルとして有用であ
り、それらは、放射線により、または熱的手段に
より硬化させることができる。放射線硬化はイオ
ン化もしくは電子線のような微粒子放射により、
または紫外線放射のような化学線により行うこと
ができる。化学線により硬化を行う場合には一般
的に当業界に公知の多くの種類の光増感剤または
光重合開始剤を包含させる。放射線硬化技術及び
熱硬化技術は当業者に周知であり、それらのそれ
ぞれにより硬化を行うことができる。該不飽和化
合物はそれ自体単独で、または他の単量体もしく
は重合体と混合して使用することができる。この
新規な不飽和化合物は有機過酸化物の添加によつ
ても重合させることもできる。
以下実施例を以つて説明する。例中、部とは重
量部を示す。
実施例 1
撹拌機、温度調節装置、温度計、凝縮器及び分
離器を備えた2反応器に、下記の構造を有する
化合物
とエプシロンカプロラクトンの付加体である下記
の構造を有する化合物700部
アクリル酸237.4部、硫酸7.8部、ハイドロキノン
2.5部、ベンゼン560部、シクロヘキサン140部を
仕込み、加熱し、生成水は溶剤と共に蒸留、凝縮
させ分離器で水のみ系外に取り除き、溶剤は反応
器に戻す。水が56.4部生成した時点で冷却した。
反応温度は80〜85℃であつた。反応混合物をベン
ゼン1080部、シクロヘキサン270部に溶解し、20
%苛性ソーダ水溶液で中和した後、20%食塩水
500部で3回洗滌する。溶剤を減圧留去して淡黄
色の液体723部を得た。このものは、下記の性質
を有する。
比 重(25℃) 1.0900
粘 度(25℃) 486.6 CPS
酸 価 0.02
屈折率 1.4730(20℃)
元素分析 C(%) H(%)
62.49% 8.49%
得られた生成物の高分解能核磁気共鳴
(NMR)による吸収周波数の測定を行つた結果
を下記に示す。
No. 吸収周波数(Hz)
1 2601.562
2 2597.656
3 2490.234
4 1966.796
5 1955.078
6 1927.734
7 1607.421
8 1568.359
9 1189.453
10 1158.203
11 1125.000
12 1078.125
13 1066.406
14 1037.109
15 960.937
16 957.031
17 947.265
18 583.984
19 576.171
20 572.265
No. 吸収周波数(Hz)
21 568.359
22 548.828
23 537.109
24 533.203
25 505.859
26 419.921
27 378.906
28 363.281
29 351.562
30 339.843
31 287.109
32 253.906
33 113.281
34 95.703
35 −1.953
猶、上記測定には基準物質としてテトラメチル
シランを用い溶媒としてクロロホルムを用いて
H1,C13−Hのカツプリングさせた測定をして最
終的にC13のDカツプルの同定結果を示した。上
記吸収のうち、No.9,10,11は溶媒の吸収のピー
ク位置を示す。
実施例 2
実施例1と同一反応器に、下記の構造を有する
化合物600部
アクリル酸134.6部、硫酸4.4部、ハイドロキノン
1.0部、ベンゼン360部、シクロヘキサン90部仕込
み、生成水が32部になるまで、実施例1と同様に
反応を行つた。反応温度は、78〜84℃であつた。
反応混合物をベンゼン960部、シクロヘキサン240
部に溶解し、20%苛性ソーダ水溶液で中和した
後、20%NaCl水溶液500部で3回洗滌する。溶剤
を減圧留去して淡黄色の液体578部を得た。この
ものは、下記の性質を有する。
比 重(25℃) 1.0900
粘 度(25℃) 2373 CPS
酸 価 0.03 mgKOH/g
屈折率 1.4735
元素分析 C(%) H(%)
62.60% 8.71%
NMRによる測定結果
No. 吸収周波数(Hz)
1 2603.515
2 2599.609
3 2454.140
4 1957.031
5 1929.687
6 1609.375
7 1570.312
8 1191.406
9 1160.156
10 1126.953
11 1080.078
12 1070.312
13 1037.109
14 970.703
15 962.890
16 958.984
17 949.218
18 931.640
No. 吸収周波数(Hz)
19 585.937
20 576.171
21 550.781
22 539.062
23 535.156
24 507.812
25 482.421
26 421.875
27 380.859
28 365.234
29 353.515
30 341.796
31 289.062
32 164.062
33 113.281
34 105.468
35 97.656
36 76.171
37 19.531
38 −3.906
上記吸収のうち、No.8,9,10は溶媒の吸収の
ピーク位置を示す。
実施例 3
実施例1と同一の反応器に、下記の構造を有す
る化合物
660部、メクタリル酸87.7部、p−トルエンスル
ホン酸12.5部、ハイドロキノン1.2部、トルエン
750部仕込み、生成水が17.4部になるまで、実施
例1と同様に反応を行つた。反応温度は113〜117
℃であつた。反応混合物をトルエン1424部に溶解
し、20%苛性ソーダ水溶液で中和した後、20%
NaCl水溶液300部で3回洗滌する。溶剤を減圧留
去して淡黄色の常温でワツクス状のもの575部を
得た。
このものは、下記の性質を有する。
比 重(50℃) 1.0720
粘 度(50℃) 514.7 CPS
酸 価 0.02 mgKOH/g
屈折率 1.4640(50℃)
元素分析 C(%) H(%)
63.10% 8.90%
NMRによる測定結果
No. 吸収周波数(Hz)
1 2601.562
2 2597.656
3 2046.875
4 2044.921
5 1876.953
6 1568.359
7 1189.453
8 1158.203
9 1125.000
10 1076.171
11 1066.406
12 1035.156
13 962.890
14 957.031
15 947.265
16 929.687
17 574.218
18 537.109
No. 吸収周波数(Hz)
19 531.250
20 505.859
21 480.468
22 419.921
23 378.906
24 363.281
25 351.562
26 287.109
27 269.531
28 95.703
上記吸収のうち、No.7,8,9は溶媒の吸収の
ピーク位置を示す。
応用例 1,2,3
実施例1,2,3で得られた新規な不飽和化合
物50部に対して、エポキシアクリレート樹脂(エ
ピコート828(シエル石油化学社製ビスフエノール
型エポキシ樹脂)をアクリル酸でエステル化した
得られた樹脂)50部、光増感剤としてイルガキユ
アー651(チバ・ガイギー社製)を5.0部加え、鋼
板パネル上に塗布し、高圧水銀灯(東芝社製、
2KW)により紫外線硬化させた。
結果を下表1に示す。
The present invention relates to a novel unsaturated compound and a method for producing the same. Reactions of caprolactone and various polymerization initiators to produce corresponding derivatives thereof, such as polycaprolactone esters, are described in Japanese Patent Publication No. 34-5292, Japanese Patent Publication No. 5293-1973, and Japanese Patent Publication No. 41-9559. etc. are disclosed. Furthermore, various acrylate esters have been synthesized so far. However, the general formula [] (However, R 2 represents CH 3 , C 2 H 5 , or C 3 H 7. ) The (meth)acrylate ester of the caprolactone derivative of diols represented by Nakatsuta. The novel unsaturated compound of the present invention is defined by the following structural formula. (In the formula, R 1 is H or CH 3 , R 2 is CH 3 , C 2 H 5 ,
or C 3 H 7 ; the average value of m and n is a number from 0 to 15,
The average total value of m+n is a number from 1 to 30, preferably from 1 to 6. ) This new unsaturated compound [] has the general formula [] (However, R 2 in formula [] is CH 3 , C 2 H 5 , or
C 3 H 7 ; The average value of m and n is a number from 0 to 15, m + n
The average total value of is a number from 1 to 30, preferably from 1 to 6. ), the above general formula []
It is characterized in that it is produced by esterifying a condensate of diols represented by and epsilon caprolactone with acrylic acid or methacrylic acid. To explain in more detail, the condensate of diols represented by the general formula [] and epsilon caprolactone used in the present invention is obtained by adding the diols represented by the general formula [] and epsilon caprolactone. . Therefore,
m and n in the formula are average amounts of epsilon caprolactone added. Further, acrylic acid or methacrylic acid is usually used in an amount greater than the stoichiometric ratio. Generally, the molar ratio of carboxylic acid to alcohol is 1.0 to 2.0, preferably 1.1 to 1.5. The reaction is promoted by using a catalyst and the water produced is distilled.Such catalysts include sulfuric acid, p-
It is an acidic catalyst such as toluenesulfonic acid, and the amount used is relative to acrylic acid or methacrylic acid.
It is used in an amount of 0.1 to 10 mol%, preferably 1 to 5 mol%. Advantageously, an azeotropic solvent is used to distill the water produced by the reaction. Such azeotropic solvents can be used as long as they have a boiling point of 60℃ to 130℃ and can be easily separated from water, but aliphatic hydrocarbons such as n-hexane and n-heptane, benzene, and toluene can be used. Aromatic hydrocarbons and cycloaliphatic hydrocarbons such as cyclohexane are suitable. The amount used is usually 5 to 70 percent by weight of the reaction mixture. The reaction temperature may be in the range of 60 to 130°C, but
75-120℃ from the viewpoint of shortening reaction time and preventing polymerization
Advantageously, it is carried out in Although a polymerization inhibitor is usually already added to acrylic acid or methacrylic acid, the polymerization inhibitor may be added again during the reaction. Such polymerization inhibitors include hydroquinone, p-methoxyphenol, 2,4-dimethyl-6-1-butylphenol, 3-hydroxythiol, α-nitroso-β-naphthol, p-benzoquinone,
Examples include 2,5-dihydroxy-p-quinone, phenothiazine, N-nitrosodiphenylamine, and copper salts. The amount used is usually 0.01 to 1% by weight based on the reaction mixture. The unsaturated compound of the present invention can be used for industrial purposes by washing it with water or an aqueous alkali solution, if necessary, or by separating it from the solvent by a method such as vacuum distillation. The unsaturated compounds are useful as vehicles for coating and ink compositions, which can be cured by radiation or by thermal means. Radiation curing is caused by ionization or particulate radiation such as electron beams.
or by actinic radiation such as ultraviolet radiation. When curing is carried out with actinic radiation, many types of photosensitizers or photoinitiators commonly known in the art are included. Radiation curing techniques and heat curing techniques are well known to those skilled in the art, and curing can be accomplished by each of them. The unsaturated compounds can be used alone or in admixture with other monomers or polymers. The new unsaturated compounds can also be polymerized by addition of organic peroxides. Examples will be described below. In the examples, parts indicate parts by weight. Example 1 A compound having the following structure was placed in two reactors equipped with a stirrer, a temperature controller, a thermometer, a condenser, and a separator. 700 parts of a compound having the following structure, which is an adduct of epsilon caprolactone and 237.4 parts of acrylic acid, 7.8 parts of sulfuric acid, hydroquinone
2.5 parts of benzene, 560 parts of benzene, and 140 parts of cyclohexane are charged and heated. The produced water is distilled and condensed together with the solvent, and only the water is removed from the system in a separator, and the solvent is returned to the reactor. Cooling occurred when 56.4 parts of water had been produced.
The reaction temperature was 80-85°C. The reaction mixture was dissolved in 1080 parts of benzene and 270 parts of cyclohexane, and 20
% saline after neutralization with aqueous caustic soda solution
Wash 3 times with 500 copies. The solvent was distilled off under reduced pressure to obtain 723 parts of a pale yellow liquid. This material has the following properties. Specific gravity (25℃) 1.0900 Viscosity (25℃) 486.6 CPS Acid number 0.02 Refractive index 1.4730 (20℃) Elemental analysis C(%) H(%) 62.49% 8.49% High-resolution nuclear magnetic resonance of the obtained product The results of absorption frequency measurement by (NMR) are shown below. No. Absorption frequency (Hz) 1 2601.562 2 2597.656 3 2490.234 4 1966.796 5 1955.078 6 1927.734 7 1607.421 8 1568.359 9 1189.453 10 1158.203 11 1 125.000 12 1078.125 13 1066.406 14 1037.109 15 960.937 16 957.031 17 947.265 18 583.984 19 576.171 20 572.265 No. Absorption Frequency (Hz) 21 568.359 22 548.828 23 537.109 24 533.203 25 505.859 26 419.921 27 378.906 28 363.281 29 351.562 30 339.843 31 287.1 09 32 253.906 33 113.281 34 95.703 35 −1.953 However, in the above measurement, tetramethylsilane was used as the reference material and the solvent using chloroform as
A coupled measurement of H 1 and C 13 -H was performed, and the results finally showed the identification of the D couple of C 13 . Among the above absorptions, Nos. 9, 10, and 11 indicate the absorption peak positions of the solvent. Example 2 Into the same reactor as in Example 1, 600 parts of a compound having the following structure was added. 134.6 parts of acrylic acid, 4.4 parts of sulfuric acid, hydroquinone
1.0 parts of benzene, 360 parts of benzene, and 90 parts of cyclohexane were charged, and the reaction was carried out in the same manner as in Example 1 until the amount of produced water became 32 parts. The reaction temperature was 78-84°C.
Add 960 parts of benzene and 240 parts of cyclohexane to the reaction mixture.
After neutralizing with 20% caustic soda aqueous solution, the solution was washed three times with 500 parts of 20% NaCl aqueous solution. The solvent was distilled off under reduced pressure to obtain 578 parts of a pale yellow liquid. This material has the following properties. Specific gravity (25℃) 1.0900 Viscosity (25℃) 2373 CPS Acid value 0.03 mgKOH/g Refractive index 1.4735 Elemental analysis C(%) H(%) 62.60% 8.71% NMR measurement result No. Absorption frequency (Hz) 1 2603.515 2 2599.609 3 2454.140 4 1957.031 5 1929.687 6 1609.375 7 1570.312 8 1191.406 9 1160.156 10 1126.953 11 1080.078 12 1070.312 13 1037.109 14 970.703 15 962.890 16 958.984 17 949.218 18 931.640 No. Absorption frequency (Hz) 19 585.937 20 576.171 21 550.781 22 539. 062 23 535.156 24 507.812 25 482.421 26 421.875 27 380.859 28 365.234 29 353.515 30 341.796 31 289.062 32 164.062 33 113.281 34 105.468 35 97.656 36 76.171 37 19.531 38 −3.906 Among the above absorptions, No. 8, 9, and 10 are the absorption of the solvent. Indicates peak position. Example 3 In the same reactor as in Example 1, a compound having the following structure was added. 660 parts, mectaryl acid 87.7 parts, p-toluenesulfonic acid 12.5 parts, hydroquinone 1.2 parts, toluene
750 parts were charged, and the reaction was carried out in the same manner as in Example 1 until the amount of water produced was 17.4 parts. Reaction temperature is 113-117
It was warm at ℃. The reaction mixture was dissolved in 1424 parts of toluene, neutralized with a 20% aqueous solution of caustic soda, and then 20%
Wash three times with 300 parts of NaCl aqueous solution. The solvent was distilled off under reduced pressure to obtain 575 parts of a pale yellow wax-like product at room temperature. This material has the following properties. Specific gravity (50℃) 1.0720 Viscosity (50℃) 514.7 CPS Acid value 0.02 mgKOH/g Refractive index 1.4640 (50℃) Elemental analysis C(%) H(%) 63.10% 8.90% NMR measurement result No. Absorption frequency (Hz) 1 2601.562 2 2597.656 3 2046.875 4 2044.921 5 1876.953 6 1568.359 7 1189.453 8 1158.203 9 1125.000 10 1076.171 11 1066.4 06 12 1035.156 13 962.890 14 957.031 15 947.265 16 929.687 17 574.218 18 537.109 No. Absorption frequency (Hz) 19 531.250 20 505.859 21 480.468 22 419.921 23 378.906 24 363.281 25 351.562 26 287.109 27 269.531 28 95.703 Among the above absorptions, No. 7, 8, and 9 indicate the peak positions of absorption of the solvent. Application examples 1, 2, 3 50 parts of the new unsaturated compound obtained in Examples 1, 2, and 3 were mixed with epoxy acrylate resin (Epicote 828 (bisphenol type epoxy resin manufactured by Ciel Petrochemicals) with acrylic acid. 50 parts of the obtained resin), 5.0 parts of Irgakiure 651 (manufactured by Ciba Geigy) as a photosensitizer were added, and the mixture was coated on a steel plate panel, and a high-pressure mercury lamp (manufactured by Toshiba Corporation,
2KW) was UV-cured. The results are shown in Table 1 below.
【表】
過させた時の指触乾燥するまでの水銀灯
の通過回数。
[Table] Number of times a mercury lamp passes through the lamp until it is dry to the touch.
Claims (1)
又はC3H7;m及びnの平均値はそれぞれ0−15
の数、m+nの平均合計値は1〜30の数である。)
で表わされる不飽和化合物。 2 下記一般式〔〕 (但し、式〔〕中R2はCH3,C2H5又は
C3H7;m及びnの平均値はそれぞれ0〜15の数、
m+nの平均合計値は1〜30の数である。)で表
わされる化合物をアクリル酸もしくは、メタクリ
ル酸でエステル化する事を特徴とする下記一般式
〔〕で表わされる不飽和化合物の製造方法。 (但し、式〔〕中の各記号は前記式〔〕と
同様であり、R1はH、又はCH3を表わす。)[Claims] 1. General formula (In the formula, R 1 is H or CH 3 ; R 2 is CH 3 , C 2 H 5 ,
or C 3 H 7 ; average values of m and n are each 0-15
The average total value of m+n is a number from 1 to 30. )
An unsaturated compound represented by 2 General formula below [] (However, R 2 in formula [] is CH 3 , C 2 H 5 or
C 3 H 7 ; The average values of m and n are each a number from 0 to 15,
The average total value of m+n is a number from 1 to 30. ) A method for producing an unsaturated compound represented by the following general formula [ ], which comprises esterifying the compound represented by acrylic acid or methacrylic acid. (However, each symbol in the formula [] is the same as the above formula [], and R 1 represents H or CH 3. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57189275A JPS5980676A (en) | 1982-10-29 | 1982-10-29 | Unsaturated compound and preparation thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57189275A JPS5980676A (en) | 1982-10-29 | 1982-10-29 | Unsaturated compound and preparation thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5980676A JPS5980676A (en) | 1984-05-10 |
JPH034076B2 true JPH034076B2 (en) | 1991-01-22 |
Family
ID=16238586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57189275A Granted JPS5980676A (en) | 1982-10-29 | 1982-10-29 | Unsaturated compound and preparation thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5980676A (en) |
-
1982
- 1982-10-29 JP JP57189275A patent/JPS5980676A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5980676A (en) | 1984-05-10 |
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