JPH02180849A - Novel (meth)acrylate compound - Google Patents
Novel (meth)acrylate compoundInfo
- Publication number
- JPH02180849A JPH02180849A JP64000275A JP27589A JPH02180849A JP H02180849 A JPH02180849 A JP H02180849A JP 64000275 A JP64000275 A JP 64000275A JP 27589 A JP27589 A JP 27589A JP H02180849 A JPH02180849 A JP H02180849A
- Authority
- JP
- Japan
- Prior art keywords
- meth
- formula
- compound
- compound shown
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 acrylate compound Chemical class 0.000 title claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 19
- 238000010521 absorption reaction Methods 0.000 abstract description 18
- 150000001875 compounds Chemical class 0.000 abstract description 15
- 238000000576 coating method Methods 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 6
- 229920000642 polymer Polymers 0.000 abstract description 5
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 abstract description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003431 cross linking reagent Substances 0.000 abstract description 4
- 239000005548 dental material Substances 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 abstract description 4
- 230000003287 optical effect Effects 0.000 abstract description 4
- 239000007870 radical polymerization initiator Substances 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 abstract 1
- 230000009102 absorption Effects 0.000 description 17
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 12
- 238000001723 curing Methods 0.000 description 10
- 239000002904 solvent Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 230000005484 gravity Effects 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000000976 ink Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 238000003847 radiation curing Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- DEVSOMFAQLZNKR-RJRFIUFISA-N (z)-3-[3-[3,5-bis(trifluoromethyl)phenyl]-1,2,4-triazol-1-yl]-n'-pyrazin-2-ylprop-2-enehydrazide Chemical compound FC(F)(F)C1=CC(C(F)(F)F)=CC(C2=NN(\C=C/C(=O)NNC=3N=CC=NC=3)C=N2)=C1 DEVSOMFAQLZNKR-RJRFIUFISA-N 0.000 description 1
- OWEYKIWAZBBXJK-UHFFFAOYSA-N 1,1-Dichloro-2,2-bis(4-hydroxyphenyl)ethylene Chemical compound C1=CC(O)=CC=C1C(=C(Cl)Cl)C1=CC=C(O)C=C1 OWEYKIWAZBBXJK-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- OPLCSTZDXXUYDU-UHFFFAOYSA-N 2,4-dimethyl-6-tert-butylphenol Chemical compound CC1=CC(C)=C(O)C(C(C)(C)C)=C1 OPLCSTZDXXUYDU-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は下記一般式〔l〕で示される新規な(メタ)ア
クリレート化合物に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a novel (meth)acrylate compound represented by the following general formula [1].
(式中、RはH又はCHiを示す。’I+ ’2は平均
付加モル数を示し、nl+n2=1〜I O)〔1〕式
で表わされる(メタ)アクリレート化合物は、熱、紫外
線、電子線、ラジカル重合開始剤の存在下で容易に単独
重合または他の不飽和基含有化合物と共重合を行なう事
が出来、各種コーティング、インキ組成物のビヒクル、
レンズ等の光学材料、電子部品材料、歯科材料、高分子
架橋剤等として有用である。(In the formula, R represents H or CHi. 'I + '2 represents the average number of moles added, nl + n2 = 1 to I O) [1] The (meth)acrylate compound represented by the formula It can be easily homopolymerized or copolymerized with other unsaturated group-containing compounds in the presence of a radical polymerization initiator, and can be used as a vehicle for various coatings and ink compositions.
It is useful as optical materials such as lenses, electronic component materials, dental materials, polymer crosslinking agents, etc.
従来より各種の多官能(メタ)アクリレート化合物が知
られている。例えばヘキサンジオールジ(メjI)アク
リレート、ネオペンチルグリコールジ(メタ)アクリレ
ート、ポリエチレングリコールジ(メタ)アクリレート
、ポリプロビレングリコールジ(メタ)アクリレート、
エチレンオキサイド変性ビスフェノールAジ(メタ)ア
クリレート、グリセリントリ(メタ)アクリレート、ト
リメチロールプロパントリ(メタ)アクリレート、ペン
タエリスリトールトリ(メタ)アクリレート、ジペンタ
エリスリトールヘキサ(メタ)アクリレート等である。Various polyfunctional (meth)acrylate compounds have been known. For example, hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate,
These include ethylene oxide-modified bisphenol A di(meth)acrylate, glycerin tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and the like.
これ等の多官能(メタ)アクリレートは、重合(硬化)
時の体積収縮が大きい、吸水性が大きく耐水性に劣る、
耐光性が充分でなく太陽光等で着色する、等の欠点を持
つものが多い。These polyfunctional (meth)acrylates are polymerized (cured)
The volumetric shrinkage is large, the water absorption is large, and the water resistance is poor.
Many of them have drawbacks such as insufficient light resistance and discoloration when exposed to sunlight.
本発明は重合性、特に紫外線や電子線による硬化性に優
れ、硬化収縮率と吸水性が小さく、耐光性の良好な、各
種コーティング、インキ、光学材料、電子部品材料、歯
科材料、各種高分子架措剤等のモノマーとなり得る新規
な多官能(メタ)アクリレート化合物を提供する事を目
的とするものである。The present invention provides various coatings, inks, optical materials, electronic component materials, dental materials, and various polymers that have excellent polymerizability, especially curability with ultraviolet rays and electron beams, low curing shrinkage and water absorption, and good light resistance. The purpose of this invention is to provide a novel polyfunctional (meth)acrylate compound that can be used as a monomer for crosslinking agents and the like.
本発明者等は通常の多官能(メタ)アクリレートが示す
、重合(硬化)時に示す大きな収縮性、光による着色、
吸水性が大きい事による耐水性の不足等の問題点を解決
すべく鋭意検討した結果、新規な(メタ)アクリレート
化合物として一般式〔1〕で示される化合物を見出し、
本発明を完成させるに至った。The present inventors have discovered that common polyfunctional (meth)acrylates exhibit large shrinkage during polymerization (curing), coloration due to light,
As a result of intensive study to solve problems such as lack of water resistance due to high water absorption, we discovered a compound represented by the general formula [1] as a new (meth)acrylate compound,
The present invention has now been completed.
1(−〇;Cl−12
〔l〕
(式中、■(は■1又はCI−hを示す。nl、ngは
平均付加モル数を示し、nl + ng = l〜10
好ましくは1〜5)
一般式(1)で示される化合物は、下記−紋穴(It)
で表される化合物をアクリル酸もしくはメタクリル酸で
エステル化する事によって得る事が出来る。1(-〇; Cl-12 [l] (in the formula, ■( indicates ■1 or CI-h. nl, ng indicate the average number of added moles, nl + ng = l ~ 10
Preferably 1 to 5) The compound represented by the general formula (1) is the following - Monna (It)
It can be obtained by esterifying the compound represented by with acrylic acid or methacrylic acid.
(式中、nl+n!は平均付加モル数を示し、n、 +
n2=l〜10)
又−紋穴rll)で表わされる化合物は水添ビスフェノ
ールAK!−カプロラクトンを付加する事によって得ら
れたものである。(In the formula, nl+n! indicates the average number of added moles, n, +
n2=l~10) Also, the compound represented by -Momonanarll) is hydrogenated bisphenol AK! -obtained by adding caprolactone.
ξ−カプロラクトンの付加モル数は自由に調整する事が
出来るが、平均付加モル数はlQmol以下が好ましい
。Although the number of moles of ξ-caprolactone added can be adjusted freely, the average number of moles added is preferably 1Qmol or less.
平均付加モル数が10 molを越えると、硬化のスピ
ードが遅くなり実用性に欠ける結果となる。If the average number of moles added exceeds 10 mol, the curing speed will be slow and the result will be impractical.
一般にアルコール(−紋穴〔D〕の化合物)の水酸基1
当量に対するカルボン酸のモル比は1.0〜2.0であ
るが好ましくは1.1〜1.5である。In general, the hydroxyl group 1 of alcohol (compound of -Momon [D])
The molar ratio of carboxylic acid to equivalent weight is between 1.0 and 2.0, preferably between 1.1 and 1.5.
反応は触媒を使用し生成する水は蒸留する事により促進
される。このような触媒は、硫酸、p−トルエンスルホ
ン酸等の酸性触媒であり、その使用量はアクリル酸また
はメタクリル酸に対して0.1〜10モル%、好ましく
は1〜5モル%使用される。反応により生成した水を蒸
留するのには共沸溶剤を用いるのが有利である。このよ
うな共沸溶剤は60℃〜130℃の沸点を有し、水と分
離し易いものなら使用できるが、n−ヘキサン、n−へ
ブタンのような脂肪族炭化水素、ベンゼン、トルエンの
ような芳香族炭化水、素、シクロヘキサンのような脂環
式炭化水素が適している。その使用量は、通常、反応混
合物の5〜70重量パーセントである。反応温度は60
〜130℃の範囲でよいが、反応時間の短縮と重合防止
の点から、75〜120℃で行われるのが有利である。The reaction is accelerated by using a catalyst and by distilling the water produced. Such a catalyst is an acidic catalyst such as sulfuric acid or p-toluenesulfonic acid, and the amount used is 0.1 to 10 mol%, preferably 1 to 5 mol%, based on acrylic acid or methacrylic acid. . Advantageously, an azeotropic solvent is used to distill the water produced by the reaction. Such azeotropic solvents can be used as long as they have a boiling point of 60°C to 130°C and can be easily separated from water, but aliphatic hydrocarbons such as n-hexane and n-hebutane, benzene, and toluene are Suitable are aromatic hydrocarbons, hydrogen atoms, and alicyclic hydrocarbons such as cyclohexane. The amount used is usually 5 to 70 percent by weight of the reaction mixture. The reaction temperature is 60
The temperature may range from 130°C to 130°C, but from the viewpoint of shortening the reaction time and preventing polymerization, it is advantageous to carry out the reaction at a temperature of 75°C to 120°C.
アクリル酸またはメタクリル酸には既に重合防止剤が添
加されているのが普通であるが、反応時に改めて重合防
止剤を添加してもよい。Although a polymerization inhibitor is usually already added to acrylic acid or methacrylic acid, the polymerization inhibitor may be added again during the reaction.
そのような重合防止剤には、ハイドロキノン、p−メト
キシフェノール、2.4−ジメチル−6−t−ブチルフ
ェノール、3−ヒドロキシチオール、α−ニトロソ−β
−ナフトール、p−ベンゾキノン、2,5−ジヒドaキ
シ−p−キノン、フェノチアジン、N−ニトロソジフェ
ニルアミン、銅塩等が挙げられる。その使用量は通常反
応混合物に対して0.01〜1重i%である。Such polymerization inhibitors include hydroquinone, p-methoxyphenol, 2,4-dimethyl-6-t-butylphenol, 3-hydroxythiol, α-nitroso-β
-naphthol, p-benzoquinone, 2,5-dihydro-axy-p-quinone, phenothiazine, N-nitrosodiphenylamine, copper salts and the like. The amount used is usually 0.01 to 1% by weight based on the reaction mixture.
本発明のカプロラクトン変性水添ビスフェノールAジ(
メタ)アクリレートは、必要ならば水若しくはアルカリ
水溶液等で洗滌したり、減圧蒸留のような方法で溶剤と
分離する事によって、工業的用途に使用される。このカ
プロラクトン変性水添ビスフェノールAジ(メタ)アク
リレートは、各種コーティング及びインキ組成物のビヒ
クル、レンズ等の光学材料、歯科材料、電子部品、各種
高分子架橋剤等のモノマーとして有用であり、それらは
放射線により、または熱的手段により硬化させることが
できる。放射線硬化はイオン化もしくは電子線のような
微粒子放射により、または紫外線放射のような化学線に
より行うことができる。化学線により硬化を行う場合に
は一般的に当業界に公知の多くの種類の光増感剤または
光重合開始剤を包含させる。caprolactone-modified hydrogenated bisphenol A di(
The meth)acrylate is used for industrial purposes by washing it with water or an aqueous alkali solution, if necessary, or separating it from the solvent by a method such as vacuum distillation. This caprolactone-modified hydrogenated bisphenol A di(meth)acrylate is useful as a vehicle for various coatings and ink compositions, as a monomer for optical materials such as lenses, dental materials, electronic components, various polymer crosslinking agents, etc. It can be cured by radiation or by thermal means. Radiation curing can be carried out by particulate radiation, such as ionizing or electron beams, or by actinic radiation, such as ultraviolet radiation. When curing is carried out with actinic radiation, many types of photosensitizers or photoinitiators commonly known in the art are included.
放射線硬化技術及び熱硬化技術は当業者に周知であり、
それらのそれぞれにより硬化を行うことができるよ5に
することに何も苦労はない。Radiation curing techniques and heat curing techniques are well known to those skilled in the art;
Curing can be done with each of them, so there is no difficulty in making it 5.
該カプロラクトン変性水添とスフエノールAジ(メタ)
アクリレートはそれ自体単独で、または他の単量体もし
くは重合体と混合して使用することができる。この新規
なカプロラクトン変性水添ビスフェノールAジ(メタ)
アクリレートは有機過酸化物の酢加によっても重合させ
ることもできる。The caprolactone modified hydrogenation and suphenol A di(meth)
Acrylates can be used alone or in admixture with other monomers or polymers. This novel caprolactone-modified hydrogenated bisphenol A di(meth)
Acrylates can also be polymerized by acetic acid addition of organic peroxides.
(実施例)
以下実施例を以って説明する。的中、部とは重量部を示
す。(Example) Examples will be described below. Parts indicate parts by weight.
実施例1゜
撹拌機、温度調節装置、温度計、凝縮器及び分離器を備
えた3石反応器に、水添ビスフェノールAとε−カプロ
ラクトンの縮合体である下記の構造を有する化合物70
9部
山+12=1
アクリル酸345.8部、硫酸11.8部、ハイドロキ
ノン3部、ベンゼン400f!S、シクロヘキサン10
・0部を仕込み、加熱し、生成水は溶斉jと共に蒸留、
凝縮させ分離器で水のみ系外忙取り除き、溶剤は反応器
に戻す。水が72部生成した時点で冷却した。反応温度
は82℃〜90’Cであった。Example 1 Compound 70 having the following structure, which is a condensate of hydrogenated bisphenol A and ε-caprolactone, was added to a three-stone reactor equipped with a stirrer, a temperature controller, a thermometer, a condenser, and a separator.
9 parts mountain + 12 = 1 345.8 parts of acrylic acid, 11.8 parts of sulfuric acid, 3 parts of hydroquinone, 400 f of benzene! S, cyclohexane 10
・Prepare 0 parts, heat, and distill the resulting water together with the sol.
Only the water is condensed and removed from the system using a separator, and the solvent is returned to the reactor. Cooling occurred when 72 parts of water had been produced. The reaction temperature was 82°C to 90'C.
反応混合物をベンゼン800部及びシクロヘキサン20
0部に溶解し、20%苛性ソーダ水溶液で中和した後、
20%食塩水400部で3回洗滌する。溶剤を減圧留去
して下記の構造を有する淡黄色の液体786部を得た。The reaction mixture was mixed with 800 parts of benzene and 20 parts of cyclohexane.
After dissolving in 0 parts and neutralizing with 20% caustic soda aqueous solution,
Wash three times with 400 parts of 20% saline. The solvent was distilled off under reduced pressure to obtain 786 parts of a pale yellow liquid having the following structure.
このものは、下記の性質を有する。This material has the following properties.
比 重 (25℃) 1.0579粘
度 (25℃) 2550 cps屈折率(2
0℃) 1.495
得られた生成物の高分解能核磁気共鳴(NN何()によ
る吸収周波数の測定を行った結果を下記に示す。Specific gravity (25℃) 1.0579 viscosity
degree (25℃) 2550 cps refractive index (2
0°C) 1.495 The absorption frequency of the obtained product was measured by high-resolution nuclear magnetic resonance (NN), and the results are shown below.
陥 吸収周波数(Hz)
1 173.091
2 166.203
3 165.683
4 130.467
5 130.077
6 129.168
7 128.648
8 79.268
9 77.188
10 74.980
11 7.3,81.0
12 69.652
13 64.324
% 吸収周波数(Hz)
14 43.402
15 43.012
16 36.645
17 34.566
18 32.226
19 30.667
20 28.328
21 25.469
22 24.819
23 21.180
24 20.531
25 0.000
なお、上記測定には基鵡物質としてテトラメチルシラン
を用い、溶媒としてクロロホルムを用いHl、 clj
−Hのカップリングさせた測定をして最終的に01sの
Dカップルの同定結果を示した。Absorption frequency (Hz) 1 173.091 2 166.203 3 165.683 4 130.467 5 130.077 6 129.168 7 128.648 8 79.268 9 77.188 10 74.980 11 7.3 ,81.0 12 69.652 13 64.324 % Absorption frequency (Hz) 14 43.402 15 43.012 16 36.645 17 34.566 18 32.226 19 30.667 20 28.328 21 25.469 22 24.819 23 21.180 24 20.531 25 0.000 In the above measurements, tetramethylsilane was used as the base material and chloroform was used as the solvent.
-H coupling measurements were performed, and the results finally showed the identification of the 01s D couple.
上記吸収のうち、Nn8,9.10は溶媒の、Nn25
はテトラメチルシランの吸収のピーク位置を示す。Among the above absorptions, Nn8,9.10 is of the solvent, Nn25
indicates the absorption peak position of tetramethylsilane.
l−ヒドロキシシクロへキシルフェニルケトン(光増感
剤)0.5重f、&%を生成物の一部に添加しガラス板
上に塗布し、次いで該コーティングを紫外線に露出して
透明な乾燥した膜状コーティングを得た。この膜状コー
ティングは下記の性質を有する。l-Hydroxycyclohexylphenylketone (photosensitizer) 0.5 F, &% was added to a portion of the product and coated on a glass plate, then the coating was exposed to UV light to dry transparent. A film-like coating was obtained. This film-like coating has the following properties.
比 重 (25°C) 1.1051硬化収
縮率 (25℃) 4.27 %屈折率(20
”C) 1.514
吸水率(23℃) 0.33 %
硬化収縮率は硬化前のモノマーの比重d1と硬化後の膜
の比N d2がら次の様にして求めた。Specific gravity (25°C) 1.1051 Curing shrinkage rate (25°C) 4.27% Refractive index (20
"C) 1.514 Water absorption rate (23°C) 0.33% Curing shrinkage rate was determined as follows from the specific gravity d1 of the monomer before curing and the ratio N d2 of the film after curing.
吸水率はコーテイング膜を23℃の純水に24時同浸漬
後の重量増加な%で表示した。The water absorption rate was expressed as the percentage weight increase after the coating film was immersed in pure water at 23° C. for 24 hours.
実施例2゜
実施例1と同一の反応器に水添ビスフェノールAとC−
カプロラクトンの縮合体である下記の構造を有する化合
物583部
式中 山十02=3
アクリル酸173部、硫酸6部、ハイドロキノン2部、
ベンゼン320部、シクロヘキサン80部を仕込み、加
熱し、実施例1と同89!忙反応して、水が36部生成
した時点で冷却した。反応温度は82℃〜90℃であっ
た。反応混合物をベンゼン800部、シクロヘキサン2
00部に溶解し、20%苛性ソーダ水溶液で中和した後
、20%食塩水300部で3回洗浄する。溶剤を減圧留
去して下記の構造を有する淡黄色の液体587部を得た
。Example 2゜Hydrogenated bisphenol A and C-
A compound having the following structure which is a condensate of caprolactone 583 parts Formula: 173 parts of acrylic acid, 6 parts of sulfuric acid, 2 parts of hydroquinone,
320 parts of benzene and 80 parts of cyclohexane were charged, heated, and the same 89 parts as in Example 1 was obtained. When the reaction was busy and 36 parts of water was produced, the mixture was cooled. The reaction temperature was 82°C to 90°C. The reaction mixture was mixed with 800 parts of benzene and 2 parts of cyclohexane.
00 parts, neutralized with 20% aqueous caustic soda solution, and washed three times with 300 parts of 20% saline. The solvent was distilled off under reduced pressure to obtain 587 parts of a pale yellow liquid having the following structure.
HC=CHz
nl + n、 = 3
吸収周波数(Hz)
173.475
173.091
166.203
130.467
129.038
128.518
79.268
77.188
74.980
73.420
69.262
64.064
43.012
36.645
隘 吸収周波数(I(Z)
15 36.125
16 34.435
17 34.045
18 32.226
19 30.667
20 28.328
21 25.469
22 24.819
23 21.180
24 20.531
25 0.000
上記吸収のうち、Nl’7.Fl、(lは溶媒の吸収の
ピーク位置を示す。r+25はテトラメチルシランの吸
収のピーク位置を示す。HC=CHz nl + n, = 3 Absorption frequency (Hz) 173.475 173.091 166.203 130.467 129.038 128.518 79.268 77.188 74.980 73.420 69.262 64.064 43.012 36.645 Absorption frequency (I(Z) 15 36.125 16 34.435 17 34.045 18 32.226 19 30.667 20 28.328 21 25.469 22 24.819 23 21.180 24 20.531 25 0.000 Among the above absorptions, Nl'7.Fl, (l indicates the absorption peak position of the solvent. r+25 indicates the absorption peak position of tetramethylsilane.
1−ヒドロキシシクロへキシルフェニルケトン(光増感
剤)0.5重量%を生成物の一部に添加し実施例IK記
載のよ5Kして硬化を行い透明な乾燥した膜状コーティ
ングを得た。この膜状コーティングは下記の性質を有す
る
比重(25℃> 1.1173硬化収縮率(2
5℃) 4.48%
屈折率(20℃3 1.507%吸水率(23℃
> 0.72%
〔発明の効果〕
本発明によれば、重合性、特に紫外線や電子線による硬
化性に優れ、硬化収縮率と吸水性が小さく、耐光性の良
好な新規な多官能(メタ)アクリレートが提供される。0.5% by weight of 1-hydroxycyclohexylphenylketone (photosensitizer) was added to a portion of the product and cured for 5K as described in Example IK to obtain a clear dry film coating. . This film-like coating has the following properties: specific gravity (25℃>1.1173 cure shrinkage rate (25℃)
5℃) 4.48% Refractive index (20℃3 1.507% Water absorption rate (23℃)
> 0.72% [Effects of the Invention] According to the present invention, a novel polyfunctional (metal) compound is produced which has excellent polymerizability, particularly curability by ultraviolet rays and electron beams, has low curing shrinkage and water absorption, and has good light resistance. ) acrylate is provided.
特許出願人 日本化薬株式会社Patent applicant: Nippon Kayaku Co., Ltd.
Claims (1)
平均付加モル数を示し、n_1+n_2=1〜10)で
表わされる(メタ)アクリレート化合物(1) General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (In the formula, R represents H or CH_3. n_1 and n_2 represent the average number of added moles, n_1 + n_2 = 1 to 10) (meta) acrylate compound
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP64000275A JP2515586B2 (en) | 1989-01-06 | 1989-01-06 | Novel (meth) acrylate compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP64000275A JP2515586B2 (en) | 1989-01-06 | 1989-01-06 | Novel (meth) acrylate compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02180849A true JPH02180849A (en) | 1990-07-13 |
JP2515586B2 JP2515586B2 (en) | 1996-07-10 |
Family
ID=11469353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP64000275A Expired - Fee Related JP2515586B2 (en) | 1989-01-06 | 1989-01-06 | Novel (meth) acrylate compound |
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JP (1) | JP2515586B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008540775A (en) * | 2005-05-13 | 2008-11-20 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Materials and dental composite materials manufactured therefrom |
CN114262427A (en) * | 2021-12-10 | 2022-04-01 | 湖南聚仁化工新材料科技有限公司 | Method for preparing polycaprolactone polyol and application thereof |
-
1989
- 1989-01-06 JP JP64000275A patent/JP2515586B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008540775A (en) * | 2005-05-13 | 2008-11-20 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Materials and dental composite materials manufactured therefrom |
CN114262427A (en) * | 2021-12-10 | 2022-04-01 | 湖南聚仁化工新材料科技有限公司 | Method for preparing polycaprolactone polyol and application thereof |
CN114262427B (en) * | 2021-12-10 | 2022-10-25 | 湖南聚仁化工新材料科技有限公司 | Preparation method and application of polycaprolactone polyol |
WO2023102950A1 (en) * | 2021-12-10 | 2023-06-15 | 湖南聚仁化工新材料科技有限公司 | Preparation method for and use of polycaprolactone polyol |
Also Published As
Publication number | Publication date |
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JP2515586B2 (en) | 1996-07-10 |
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