JPH0340243A - Read-only optical disk - Google Patents
Read-only optical diskInfo
- Publication number
- JPH0340243A JPH0340243A JP1176533A JP17653389A JPH0340243A JP H0340243 A JPH0340243 A JP H0340243A JP 1176533 A JP1176533 A JP 1176533A JP 17653389 A JP17653389 A JP 17653389A JP H0340243 A JPH0340243 A JP H0340243A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- glass substrate
- read
- regenerated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 238000009792 diffusion process Methods 0.000 claims abstract description 21
- 239000011521 glass Substances 0.000 claims abstract description 17
- 230000001681 protective effect Effects 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 229910052718 tin Inorganic materials 0.000 claims abstract description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910001020 Au alloy Inorganic materials 0.000 claims abstract 2
- 229910052737 gold Inorganic materials 0.000 claims abstract 2
- 230000002265 prevention Effects 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 4
- 150000004767 nitrides Chemical class 0.000 abstract description 4
- 238000003980 solgel method Methods 0.000 abstract description 3
- 238000010030 laminating Methods 0.000 abstract description 2
- 150000002739 metals Chemical class 0.000 abstract description 2
- 230000003449 preventive effect Effects 0.000 abstract 3
- 238000001354 calcination Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 17
- 230000005856 abnormality Effects 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 238000010304 firing Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 239000005345 chemically strengthened glass Substances 0.000 description 9
- 230000003247 decreasing effect Effects 0.000 description 9
- 150000002902 organometallic compounds Chemical class 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910017401 Au—Ge Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 229910001362 Ta alloys Inorganic materials 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003426 chemical strengthening reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明はレーザーを用いて情報の読み出しを行う光ディ
スクに関し、特に信頼性、耐候性に優れた読み出し専用
の光ディスクに関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an optical disc from which information is read using a laser, and particularly to a read-only optical disc with excellent reliability and weather resistance.
（従来の技術）
読み出し専用の光ディスクとしてコンパクトディスク（
以下、ＣＤと呼ぶ。）が広く知られている。ＣＤはポリ
カーボネート基板・（以下、ＰＣ基板と呼ぶ。）上にア
ルミニウムからなる反射膜及びＵＶ硬化樹脂からなる保
護膜を設けた構成になっており、予めＰＣ基板上に形成
された微小な凹凸（以下、ビットと呼ぶ。）による光の
変調を利用して、音声の再生を可能にするものである。(Prior technology) Compact discs (
Hereinafter, it will be referred to as CD. ) is widely known. The CD has a structure in which a reflective film made of aluminum and a protective film made of UV curing resin are provided on a polycarbonate substrate (hereinafter referred to as PC substrate). (hereinafter referred to as bits), it is possible to reproduce audio using the modulation of light.
また、近年、上述した音声再生用のみならず、ＣＤ−Ｒ
ＯＭと呼ばれる各種データの読み出し専用光ディスクも
いろいろな分野に用いられつつある。In addition, in recent years, not only for audio playback mentioned above, but also for CD-R
Read-only optical disks for various data called OM are also being used in various fields.
例えば、パーソナルコンピュータ用のデータ媒体、電子
出版媒体などへ展開している。For example, it has been developed into data media for personal computers, electronic publishing media, etc.
（発明が解決しようとする課題）
ＣＤ−ＲＯＭは従来のＣＤ作製技術によりＰＣ基板を用
いて容易に作製できるが、読み出しの信頼性、データの
保存性（ＣＤ−ＲＯＭの耐候性）を強く要求される場合
はＰＣ基板では問題となる。即ち、ＰＣ基板が持つ吸水
性、透湿性のために反りあるいは反射膜の腐食、剥離な
どの劣化を生じ易い。また、ＣＤにおいても、例えば車
両搭載などを考えると、その環境条件は苛酷なものであ
り、より高品質のものが求められる。(Problem to be solved by the invention) CD-ROMs can be easily manufactured using a PC board using conventional CD manufacturing techniques, but there are strong requirements for read reliability and data storage (weather resistance of CD-ROMs). If this occurs, it becomes a problem for PC boards. That is, due to the water absorption and moisture permeability of the PC board, deterioration such as warping or corrosion or peeling of the reflective film is likely to occur. Furthermore, when CDs are installed in vehicles, for example, the environmental conditions are harsh, and higher quality is required.
本発明の目的は高信頼性、高耐候性を有する読み出し専
用光ディスクを提供することにある。An object of the present invention is to provide a read-only optical disc having high reliability and high weather resistance.
（課題を解決するための手段）
以下、第１図を用いて本発明を説明する。第１図は、本
発明の概略断面図である。(Means for Solving the Problems) The present invention will be explained below using FIG. 1. FIG. 1 is a schematic cross-sectional view of the present invention.
本発明によれば、吸湿性、透湿性のないガラス基板１を
用い、まず、拡散防止層２を形成する。次に、その拡散
防止層の上にいわゆるゾルゲル法と呼ばれる手法を用い
て、有機金属化合物を焼成することにより得られるガラ
ス状のピットパターンをもった金属アルコレートの焼成
層３を形威し、次いで高耐食性の反射膜４、保護膜５を
順次積層することにより、高信頼性の読み出し専用光デ
ィスクが得られる。According to the present invention, first, a diffusion prevention layer 2 is formed using a glass substrate 1 that is neither hygroscopic nor moisture permeable. Next, a fired layer 3 of metal alcoholate having a glass-like pit pattern obtained by firing an organometallic compound is formed on the diffusion prevention layer using a method called a so-called sol-gel method. Next, by sequentially laminating a highly corrosion-resistant reflective film 4 and a protective film 5, a highly reliable read-only optical disc can be obtained.
ガラス基板１としては通常のソーダライムガラス、アル
ミノケイ酸ガラスなどが用いられるが、光ディスクとし
ての信頼性の観点からみると、化学強化を施されたもの
が好ましい。As the glass substrate 1, ordinary soda lime glass, aluminosilicate glass, etc. can be used, but from the viewpoint of reliability as an optical disc, one that has been chemically strengthened is preferable.
しかしながら、通常の化学強化を行うためにはガラスが
Ｌｉ、 Ｎａ等のアルカリ金属を含むことが必要になる
。このアルカリ金属は、ガラスを高温高湿下に置いた場
合、ガラス表面に拡散し、例えばＮａ２ＣＯ３のような
塩にすることが良く知られている。このような変化はレ
ーザ光を照射して読み出しを行う際の障害となり、光デ
ィスクとしての特性上好ましくない。そこで、この様な
塩の析出を抑える拡散防止層２が必要になる。この拡散
防止層２の材料は各種無機酸化物を用いることが出来る
が、光ディスクとしての特性を勘案すると、Ｓｉ、 Ｔ
ｉ。However, in order to perform normal chemical strengthening, the glass needs to contain alkali metals such as Li and Na. It is well known that when the glass is placed under high temperature and high humidity, this alkali metal diffuses onto the glass surface and becomes a salt such as Na2CO3. Such a change becomes a hindrance when reading by irradiating with a laser beam, and is undesirable from the viewpoint of the characteristics of an optical disc. Therefore, a diffusion prevention layer 2 is required to suppress the precipitation of such salts. Various inorganic oxides can be used as the material for the diffusion prevention layer 2, but considering the characteristics of the optical disc, Si, T
i.
Ｔａ、 Ｚｒ、 Ａｌ、 Ｓｎ、 Ｃｒの酸化物を単独
もしくは組み合わせて使用することが好ましい。また、
Ｓｉ３Ｎ４も良好な特性を示す。これらの酸化物あるい
は窒化物はスパッタ法などにより容易に形成することが
出来る。It is preferable to use oxides of Ta, Zr, Al, Sn, and Cr alone or in combination. Also,
Si3N4 also shows good properties. These oxides or nitrides can be easily formed by sputtering or the like.
所望のピットパターンを拡散防止層２の上に形成するに
は、以下に示すようにゾルゲル法を用いて容易に行うこ
とが出来る。A desired pit pattern can be easily formed on the diffusion prevention layer 2 using a sol-gel method as described below.
まず、金属アルコレート、水、塩酸、アルコールなどか
ら戒る塗布溶液を調製し、拡散防止層を形成したガラス
基板上に所定の厚さになるようにスピンコードする。次
いで、所望のピットパターンになるように設計された樹
脂製の型を押し当て、６０〜１２０°Ｃ程度の温度で一
次焼戒を行う。その後、ガラス基板を離型し、２５０〜
４００°Ｃで二次焼成を行い、溶剤、添加剤などの有機
成分を除去することにより所望のピットパターンを有す
る非晶質の金属酸化物層３を形成できる。First, a coating solution is prepared from metal alcoholate, water, hydrochloric acid, alcohol, etc., and spin-coated onto a glass substrate on which a diffusion prevention layer is formed to a predetermined thickness. Next, a resin mold designed to form a desired pit pattern is pressed against the mold, and primary burning is performed at a temperature of about 60 to 120°C. After that, the glass substrate was released from the mold, and the
By performing secondary firing at 400° C. and removing organic components such as solvents and additives, an amorphous metal oxide layer 3 having a desired pit pattern can be formed.
ここで用いられる金属アルコレートとしては各種の金属
アルコレー、例えばＳｉ、 Ｔｉ、 Ｚｒ、 Ａｌ、
Ｂなどのアルコレート、が使用できるが、光ディスクと
しての特性、製造上の取り扱いやすさなどがら、Ｓｉ系
アルコレートあるいはＳｉ系アルコレートとＴｉ系アル
コレートの混合系が好ましい。The metal alcoholates used here include various metal alcoholates, such as Si, Ti, Zr, Al,
Although alcoholates such as B can be used, Si-based alcoholates or a mixture of Si-based alcoholates and Ti-based alcoholates are preferred in view of their properties as optical discs and ease of handling in production.
このようにして所望のピットパターンを有する透明なガ
ラス基板を得ることが出来る。In this way, a transparent glass substrate having a desired pit pattern can be obtained.
次に、得られたピットパターンを持った焼成層の上に、
反射膜４をスパッタ法などにより付け、更に、保護膜５
をその上に被覆することにより読み出し専用光ディスク
が得られる。Next, on top of the fired layer with the resulting pit pattern,
A reflective film 4 is applied by sputtering or the like, and then a protective film 5 is applied.
A read-only optical disc is obtained by coating it on it.
反射膜４の材料としては、各種の金属、金属窒化物など
を用いることが出来るが、光ディスクとしての特性を満
足すると共に、高耐食性を示すものが好ましく、Ａｕ、
Ａｕ系合金、ＴｉＮが本発明の目的を満たす。Various metals, metal nitrides, etc. can be used as the material for the reflective film 4, but it is preferable to use a material that satisfies the characteristics of an optical disc and exhibits high corrosion resistance.
Au-based alloys and TiN meet the objectives of the present invention.
保護膜５としては、５ｉ０２などの無機酸化物、Ｓｉ３
Ｎ４などの無機窒化物のような無機系のものあるいはＵ
Ｖ硬化樹脂などのような有機系のものが単独もしくは組
み合わせて使用できる。As the protective film 5, inorganic oxide such as 5i02, Si3
Inorganic materials such as inorganic nitrides such as N4 or U
Organic materials such as V-curing resins can be used alone or in combination.
（作用）
本発明による読み出し専用光ディスクは、耐湿性に優れ
る拡散防止層付きのガラス基板及び耐食性に優れる反射
膜を有しているために、高い信頼性を実現できる。(Function) The read-only optical disk according to the present invention can achieve high reliability because it has a glass substrate with a diffusion prevention layer that has excellent moisture resistance and a reflective film that has excellent corrosion resistance.
（実施例） 以下、実施例に基づき詳細に説明する。(Example) Hereinafter, a detailed explanation will be given based on examples.
実施例１
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法により５ｉ０２膜を：ｔｏｏｏＡ形威した。形成
で、この５ｉ０２膜の上に、テトラエトキシシラン、塩
酸、水、ポリエチレングリコールを含むエチルアルコー
ル溶液をスピンコードし、有機金属化合物を２０００〜
３０００Ａ形威した。次いで、表面に所定のビットパタ
ーンを有する樹脂製の型を有機金属化合物層に押し当て
、ピットパターンを転写すると共に１２０°Ｃで一次焼
成を行った。その後、ガラス基板を離型し、３５０’Ｃ
で二次焼成を行った。Example 1 A 5i02 film was formed as a diffusion prevention layer on a chemically strengthened glass substrate by sputtering. During formation, an ethyl alcohol solution containing tetraethoxysilane, hydrochloric acid, water, and polyethylene glycol was spin-coded onto this 5i02 film, and an organometallic compound
It was the 3000A model. Next, a resin mold having a predetermined bit pattern on its surface was pressed against the organometallic compound layer to transfer the pit pattern, and primary firing was performed at 120°C. After that, the glass substrate was released from the mold and heated to 350°C.
Secondary firing was performed.
このようにして作製したビットパターンを有する焼成層
の上に、反射膜としてスパッタ法でＡｕ−Ｔａ合金膜を
約１０００Ａ、保護膜として５ｉ０２膜を１ｏｏｏＡ順
次戒膜した。On the baked layer having the bit pattern produced in this way, an Au--Ta alloy film of about 1000 Å as a reflective film and a 5i02 film of 100 Å as a protective film were sequentially coated by sputtering.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．２Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には２．４Ｘ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 190% RH, the initial block error rate was 2.2X10, but after 500 hours it was 2.4X10.
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例２
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法により５ｉ０２−Ｔａ２０５膜を１００ＯＡ形成
した。次いで、この５ｉ０２−Ｔａ２０５膜の上に、テ
トラエトキシシラン、塩酸、水、ポリエチレングリコー
ルを含むエチルアルコール溶液をスピンコードし、有機
金属化合物層を２０００〜３０００Ａ形威した。Example 2 A 5i02-Ta205 film of 100 OA was formed as a diffusion prevention layer on a chemically strengthened glass substrate by sputtering. Next, an ethyl alcohol solution containing tetraethoxysilane, hydrochloric acid, water, and polyethylene glycol was spin-coded onto this 5i02-Ta205 film to form an organometallic compound layer of 2000 to 3000 A.
次いで、表面に所定のビットパターンを有する樹脂製の
型を有機金属化合物層に押し当て、ピットパターンを転
写すると共に１２０°Ｃで一次焼成を行った。その後、
ガラス基板を離型し、３５０°Ｃで二次焼成を行った。Next, a resin mold having a predetermined bit pattern on its surface was pressed against the organometallic compound layer to transfer the pit pattern, and primary firing was performed at 120°C. after that,
The glass substrate was released from the mold, and secondary firing was performed at 350°C.
このようにして作製したピットパターンを有する焼成層
の上に、スパッタ法でＡｕ−Ｔａ合金膜を約１０００Ａ
、 ５ｉ０２膜をｘｏｏｏＡＪ順次戒膜した。On the fired layer having the pit pattern thus prepared, an Au-Ta alloy film is deposited at a thickness of approximately 1000 Å by sputtering.
, 5i02 membrane was sequentially treated with xooooAJ.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．２Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には２．５Ｘ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 190% RH, the block error rate, which had an initial value of 2.2X10, decreased to 2.5X10 after 500 hours.
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例３
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法により５ｉ０２−Ｔｉ０２膜をｔｏｏｏＡ形威し
た形成に、実施例２と同様に、順次焼成層、反射膜、保
護膜を形成した。Example 3 On a chemically strengthened glass substrate, a 5i02-Ti02 film was formed by sputtering as a diffusion prevention layer in a too-A shape, and a fired layer, a reflective film, and a protective film were sequentially formed in the same manner as in Example 2. .
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．３Ｘ１０−３であった
ブロックエラーレートが、５００時間後には２．７Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 190% RH, the block error rate, which had an initial value of 2.3X10-3, decreased to 2.7X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０’Ｃ，９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for one hour under the conditions of 80'C and 90% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例４
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法により５ｉ０２−Ｚｒ０２膜を５ｏｏＡ形成した
。次に、実施例２と同様に、順次焼成層、反射膜、保護
膜を形成した。Example 4 A 500A 5i02-Zr02 film was formed as a diffusion prevention layer on a chemically strengthened glass substrate by sputtering. Next, in the same manner as in Example 2, a fired layer, a reflective film, and a protective film were sequentially formed.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が１．８Ｘ１０−３であった
ブロックエラーレートが、５００時間後には２．３Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 190% RH, the initial block error rate was 1.8X10-3, but after 500 hours it was 2.3X1.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０’Ｃ，９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for one hour under the conditions of 80'C and 90% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例５
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法により５ｉ０２−Ｃｒ０２膜を５ｏｏＡ形威した
。次に、実施例２と同様に、順次焼成層、反射膜、保護
膜を形成した。Example 5 On a chemically strengthened glass substrate, a 5i02-Cr02 film was formed in a 5ooA shape as a diffusion prevention layer by sputtering. Next, in the same manner as in Example 2, a fired layer, a reflective film, and a protective film were sequentially formed.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．ｌＸ１０−３であった
ブロックエラーレートが、５００時間後には２．３Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 190%RH, the initial value was 2. The block error rate that was lX10-3 decreased to 2.3X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例６
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法により５ｉ０２−Ａ１２０３膜を８００人形威形
成。次に、実施例２と同様に、順次焼成層、反射膜、保
護膜を形成した。Example 6 On a chemically strengthened glass substrate, a 5i02-A1203 film was formed in 800 layers as a diffusion prevention layer by sputtering. Next, in the same manner as in Example 2, a fired layer, a reflective film, and a protective film were sequentially formed.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．５Ｘ１０−３であった
ブロックエラーレートが、５００時間後には２．７Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 190% RH, the block error rate, which had an initial value of 2.5X10-3, decreased to 2.7X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例７
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法により５ｉ０２−８ｎ０２膜を１００ＯＡ形成し
た。次に、実施例２と同様に、順次焼成層、反射膜、保
護膜を形成した。Example 7 A 5i02-8n02 film of 100 OA was formed as a diffusion prevention layer on a chemically strengthened glass substrate by sputtering. Next, in the same manner as in Example 2, a fired layer, a reflective film, and a protective film were sequentially formed.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．６Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には３．ｌＸ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 190% RH, the block error rate, which had an initial value of 2.6X10, decreased to 3. lX10
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０’Ｃ，９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for one hour under the conditions of 80'C and 90% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例８
化学強化されたガラス基板上に、スパッタ法により５ｉ
０２−Ｔａ２０５膜をｔｏｏｏＡ形成した。次いで、テ
トラエトキシシラン、テトラブトキシチタン、塩酸、水
、ポリエチレングリコールを含むエチルアルコール溶液
をスピンコードし、有機金属化合物層を２０００〜３０
００Ａ形威した。次いで、表面に所定のピットパターン
を有する樹脂製の型を有機金属化合物層に押し当て、ピ
ットパターンを転写すると共に１００’Ｃで一次焼成を
行った。その後、ガラス基板を離型し、３５０°Ｃで二
次焼成を行った。Example 8 5i was deposited on a chemically strengthened glass substrate by sputtering.
02-Ta205 film was formed tooA. Next, an ethyl alcohol solution containing tetraethoxysilane, tetrabutoxytitanium, hydrochloric acid, water, and polyethylene glycol was spin-coded to form an organometallic compound layer with a
00A shape was used. Next, a resin mold having a predetermined pit pattern on its surface was pressed against the organometallic compound layer, the pit pattern was transferred, and primary firing was performed at 100'C. Thereafter, the glass substrate was released from the mold, and secondary firing was performed at 350°C.
このようにして作製したピットパターンを有する焼成層
の上に、反射膜としてスパッタ法でＡｕ−Ｇｅ合金膜を
約１００ＯＡ、保護膜として５ｉ０２膜を１００ＯＡ順
次成膜した。更にその上をＵＶ硬化樹脂層で被覆した。On the fired layer having the pit pattern thus produced, an Au-Ge alloy film of about 100 OA as a reflective film and a 5i02 film of 100 OA as a protective film were sequentially formed by sputtering. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が１．８Ｘ１０ ”であった
ブロックエラーレートが、５００時間後には２．ｌＸ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 190% RH, the block error rate, which had an initial value of 1.8X10'', decreased to 2.1X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例９
化学強化されたガラス基板上に、スパッタ法によりＳｉ
３Ｎ４膜を８００人形威形成。次いで、テトラエトキシ
シラン、テトラブトキシチタン、塩酸、水、ポリエチレ
ングリコールを含むエチルアルコール溶液をスピンコー
ドし、有機金属化合物層を２０００〜３０００Ａ形威し
た。次いで、表面に所定のピットパターンを有する樹脂
製の型を有機金属化合物層に押し当て、ピッ、ドパター
ンを転写すると共に１００°Ｃで一次焼成を行った。そ
の後、ガラス基板を離型し、３５０°Ｃで二次焼成を行
った。Example 9 Si was deposited on a chemically strengthened glass substrate by sputtering.
3N4 film was formed for 800 times. Next, an ethyl alcohol solution containing tetraethoxysilane, tetrabutoxytitanium, hydrochloric acid, water, and polyethylene glycol was spin-coded to form an organometallic compound layer of 2000 to 3000A. Next, a resin mold having a predetermined pit pattern on the surface was pressed against the organometallic compound layer, the pit pattern was transferred, and primary firing was performed at 100°C. Thereafter, the glass substrate was released from the mold, and secondary firing was performed at 350°C.
このようにして作製したピットパターンを有する焼成層
の上に、反射膜としてスパッタ法でＡｕ−Ｇｅ合金膜を
約１０００人、保護膜として５ｉ０２膜を１００ＯＡ順
次戒膜した。更にその上をＵＶ硬化樹脂層で被覆した。On the fired layer having the pit pattern produced in this manner, approximately 1000 Au-Ge alloy films were deposited by sputtering as a reflective film and 100 OA of a 5i02 film was sequentially deposited as a protective film. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．ｌＸ１０−３であった
ブロックエラーレートが、５００時間後には２．３Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 190%RH, the initial value was 2. The block error rate that was lX10-3 decreased to 2.3X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例１０
実施例２と同様にして作製したピットパターンを有する
焼成層の上に、クラスターイオンビーム法でＴｉＮ膜を
約１０００人、スパッタ法でＳｉ３Ｎ４膜を８００〜１
０００人順次戒膜した。更にその上をＵＶ硬化樹脂層で
被覆した。Example 10 On the fired layer having a pit pattern produced in the same manner as in Example 2, a TiN film was deposited using a cluster ion beam method in an amount of approximately 1,000 layers, and a Si3N4 film was deposited in an amount of approximately 800 to 1000 nm using a sputtering method.
000 people were sentenced to death one by one. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が１．８Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には２．２Ｘ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 190% RH, the block error rate, which had an initial value of 1.8X10, decreased to 2.2X10 after 500 hours.
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例１１
実施例２と同様にして作製したピットパターンを有する
焼成層の上に、スパッタ法を用いてＡｕ膜を約１０００
人、Ｓｉ３Ｎ４膜を８００〜１０００人順次成膜した。Example 11 On the fired layer having a pit pattern produced in the same manner as in Example 2, an Au film with a thickness of about 1000 mm was deposited using a sputtering method.
800 to 1000 people successively deposited Si3N4 films.
更にその上をＵＶ硬化樹脂層で被覆した。Further, a UV curable resin layer was coated thereon.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．３Ｘ１０−３であった
ブロックエラーレートが、５００時間後には３．２Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 190% RH, the block error rate, which had an initial value of 2.3X10-3, decreased to 3.2X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間はど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 190% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
比較例
市販されている音楽用のＣＤディスクについて同様に耐
候性の評価を行ったところ、ブロックエラーレートは５
Ｘ１０−’（初期値）から著しく変化し、５００時間後
には測定不能になっていた。また、８０Ｃ１９０％ＲＨ
条件下に１時間はど放置した後、取り出して再生を行っ
たところ、反りが大きいため再生不能であった。Comparative Example When we similarly evaluated the weather resistance of commercially available music CD discs, the block error rate was 5.
It changed significantly from X10-' (initial value) and became unmeasurable after 500 hours. Also, 80C190%RH
After leaving it for one hour under these conditions, it was taken out and regenerated, but it was found to be unable to be regenerated due to large warpage.
（発明の効果）
以上述べてきたように、本発明による読み出し専用光デ
ィスクは信頼性、耐候性に優れており、従来使用できな
かった応用分野への展開を可能にするものである。(Effects of the Invention) As described above, the read-only optical disk according to the present invention has excellent reliability and weather resistance, and can be applied to fields of application that could not be used conventionally.
第１図は本発明による読み出し専用光ディスクの概略、
断面図である。
１・・・ガラス基板、２・・・拡散防止層、３・・・金
属アルコレートの焼成層、４・・・反射膜、５・・・保
護膜FIG. 1 schematically shows a read-only optical disc according to the present invention.
FIG. DESCRIPTION OF SYMBOLS 1... Glass substrate, 2... Diffusion prevention layer, 3... Baked layer of metal alcoholate, 4... Reflective film, 5... Protective film
Claims (3)
凸を有する金属アルコレートの焼成層と、Ａｕ、Ａｕ合
金もしくはＴｉＮからなる反射膜と、保護膜とを順次積
層したことを特徴とする読み出し専用光ディスク。(1) A diffusion prevention layer, a fired layer of metal alcoholate having minute irregularities, a reflective film made of Au, Au alloy, or TiN, and a protective film are sequentially laminated on a transparent glass substrate. A read-only optical disc.
ｎ、Ｃｒの中から選ばれた少なくとも一種類以上の元素
からなる酸化物であることを特徴とする特許請求の範囲
第１項記載の読み出し専用光ディスク。(2) Diffusion prevention layer is Si, Ti, Ta, Al, Zr, S
2. The read-only optical disk according to claim 1, wherein the read-only optical disk is an oxide consisting of at least one element selected from n, Cr.
する特許請求の範囲第１項記載の読み出し専用光ディス
ク。(3) The read-only optical disk according to claim 1, wherein the anti-diffusion layer is made of Si_3N_4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1176533A JPH0762915B2 (en) | 1989-07-06 | 1989-07-06 | Read-only optical disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1176533A JPH0762915B2 (en) | 1989-07-06 | 1989-07-06 | Read-only optical disc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0340243A true JPH0340243A (en) | 1991-02-21 |
| JPH0762915B2 JPH0762915B2 (en) | 1995-07-05 |
Family
ID=16015273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1176533A Expired - Lifetime JPH0762915B2 (en) | 1989-07-06 | 1989-07-06 | Read-only optical disc |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0762915B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7811684B2 (en) | 2005-02-18 | 2010-10-12 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
| US8501270B2 (en) | 2005-02-18 | 2013-08-06 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
-
1989
- 1989-07-06 JP JP1176533A patent/JPH0762915B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7811684B2 (en) | 2005-02-18 | 2010-10-12 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
| US7931936B2 (en) | 2005-02-18 | 2011-04-26 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
| US8501270B2 (en) | 2005-02-18 | 2013-08-06 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0762915B2 (en) | 1995-07-05 |
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