JPH0330132A - Read-only optical disk - Google Patents
Read-only optical diskInfo
- Publication number
- JPH0330132A JPH0330132A JP1166079A JP16607989A JPH0330132A JP H0330132 A JPH0330132 A JP H0330132A JP 1166079 A JP1166079 A JP 1166079A JP 16607989 A JP16607989 A JP 16607989A JP H0330132 A JPH0330132 A JP H0330132A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- glass substrate
- layer
- read
- optical disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 239000011521 glass Substances 0.000 claims abstract description 16
- 230000001681 protective effect Effects 0.000 claims abstract description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052718 tin Inorganic materials 0.000 claims abstract description 5
- 238000010030 laminating Methods 0.000 claims abstract description 3
- 229910001020 Au alloy Inorganic materials 0.000 claims abstract 3
- 229910052737 gold Inorganic materials 0.000 claims abstract 3
- 230000007797 corrosion Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 3
- 150000004767 nitrides Chemical class 0.000 abstract description 3
- 238000003980 solgel method Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 abstract 3
- 238000001354 calcination Methods 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 150000002902 organometallic compounds Chemical class 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 230000005856 abnormality Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000005345 chemically strengthened glass Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229910017401 Au—Ge Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- -1 tetraptoxytitanium Chemical compound 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明はレーザーを用いて情報の読み出しを行う光ディ
スクに関し、特に信頼性、耐候性に優れた読み出し専用
の光ディスクに関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an optical disc from which information is read using a laser, and particularly to a read-only optical disc with excellent reliability and weather resistance.
（従来の技術）
読み出し専用の光ディスクとしてコンパクトディスク（
以下、ＣＤと呼ぶ。）が広く知られている。ＣＤはボリ
カーボネート基板（以下、ＰＣ基板と呼ぶ。）上にアル
ミニウムからなる反射膜及びＵＶ硬化樹脂からなる保護
膜を設けた構成になっており、予めＰＣ基板上に形或さ
れた微小な凹凸（以下、ビットと呼ぶ。）による光の変
調を利用して、音声の再生を可能にするものである。(Prior technology) Compact discs (
Hereinafter, it will be referred to as CD. ) is widely known. The CD has a structure in which a reflective film made of aluminum and a protective film made of UV curing resin are provided on a polycarbonate substrate (hereinafter referred to as a PC board). (hereinafter referred to as bits) makes it possible to reproduce audio.
また、近年、上述した音声再生用のみならず、ＣＤ−Ｒ
ＯＭと呼ばれる各種データの読み出し専用光ディスクも
いろいろな分野に用いられりつある。In addition, in recent years, not only for audio playback mentioned above, but also for CD-R
Read-only optical disks for various data, called OM, are also being used in various fields.
例えば、パーソナルコンピュータ用のデータ媒体、電子
出版媒体などへ展開している。For example, it has been developed into data media for personal computers, electronic publishing media, etc.
（発明が解決しようとする課題〉
ＣＤ−ＲＯＭは従来のＣＤ作製技術によりＰＣ基板を用
いて容易に作製できるが、読み出しの信頼性、データの
保存性（ＣＤ−ＲＯＭの耐候性）を強く要求される場合
はＰＣ基板では問題となる。即ち、ＰＣ基板が持つ吸水
性、透湿性のために反りあるいは反射膜の腐食、剥離な
どの劣化を生じ易い。更にＣＤにおいても、例えば車両
搭載などを考えると、その環境条件は苛酷なものであり
、より高品質のものが求められる。(Problem to be solved by the invention) CD-ROMs can be easily manufactured using a PC board using conventional CD manufacturing technology, but there are strong requirements for read reliability and data storage (weather resistance of CD-ROMs). This is a problem for PC boards.In other words, due to the water absorption and moisture permeability of PC boards, deterioration such as warping or corrosion and peeling of the reflective film can easily occur.Furthermore, CDs are also susceptible to deterioration such as corrosion and peeling of the reflective film. Considering the harsh environmental conditions, higher quality products are required.
本発明の目的は高信頼性、高耐候性を有する読み出し専
用光ディスクを提供することにある。An object of the present invention is to provide a read-only optical disc having high reliability and high weather resistance.
（課題を解決するための手段）
以下、第１図を用いて本発明を説明する。第１図は、本
発明の概略断面図である。(Means for Solving the Problems) The present invention will be explained below using FIG. 1. FIG. 1 is a schematic cross-sectional view of the present invention.
本発明は、吸湿性、透湿性のないガラス基板１を用い、
そのガラス基板１上にいわゆるゾルゲル法と呼ばれる手
法を用いて、有機金属化合物を焼戊することにより得ら
れるガラス状のビットパターンを持った金属アルコレー
トの焼成層２を形或し、次いで高耐食性の反射膜３、保
護膜４を順次積層することにより、高信頼性の読み出し
専用光ディスクが得られる。The present invention uses a glass substrate 1 that is neither hygroscopic nor moisture permeable,
A fired layer 2 of metal alcoholate having a glass-like bit pattern obtained by firing an organometallic compound is formed on the glass substrate 1 using a method called the so-called sol-gel method, and then a fired layer 2 of metal alcoholate having a glassy bit pattern obtained by firing an organic metal compound is formed. By sequentially laminating the reflective film 3 and the protective film 4, a highly reliable read-only optical disc can be obtained.
ガラス基板１としては通常のソーダライムガラス、アル
ミノケイ酸ガラスなどが用いられるが、光ディスクとし
ての信頼性の観点からみると、化学強化を施されたもの
が好ましい。As the glass substrate 1, ordinary soda lime glass, aluminosilicate glass, etc. can be used, but from the viewpoint of reliability as an optical disc, one that has been chemically strengthened is preferable.
所望のビットパターンをガラス基板上に形成するには、
以下に示すようにゾルゲル法を用いて容易に行うことが
出来る。To form a desired bit pattern on a glass substrate,
This can be easily carried out using the sol-gel method as shown below.
まず、金属アルコレート、水、塩酸、アルコールなどか
ら或る塗布溶液を調製し、ガラス基板上に所定の厚さに
なるようにスピンコートする。次いで、所望のピットパ
ターンになるように設計された樹脂製の型を押し当て、
６０〜１２０’Ｃ程度の温度で一次焼成を行う。その後
、ガラス基板を離型し、２５０〜４００’Ｃで二次焼或
を行い、溶剤、添加剤などの有機戒分を除去することに
より所望のピットパターンを有する非品質の金属酸化物
層２を゛形戊できる。First, a coating solution is prepared from metal alcoholate, water, hydrochloric acid, alcohol, etc., and spin coated onto a glass substrate to a predetermined thickness. Next, a resin mold designed to create the desired pit pattern is pressed against it.
Primary firing is performed at a temperature of about 60 to 120'C. Thereafter, the glass substrate is released from the mold, and secondary baking is performed at 250 to 400'C to remove organic components such as solvents and additives, resulting in a non-quality metal oxide layer 2 having a desired pit pattern. can be shaped.
ここで用いられる金属アルコレートとしては各種の金属
アルコーレト、例えばＳｉ， Ｔｉ， Ｚｒ， ＡＩ，
Ｂなどのアルコレート、が使用できるが、光ディスク
としての特性、製造上の取り扱いやすさなどがら、Ｓｉ
系アルコレートあるいはＳｉ系アルコレーｌ・とＴｉ系
アルコレートの混合系が好ましい。The metal alcoholates used here include various metal alcoholates, such as Si, Ti, Zr, AI,
Alcoholates such as B can be used, but Si
Preferred is a mixture of a Si-based alcoholate or a Si-based alcoholate and a Ti-based alcoholate.
このようにして所望のビットパターンを有する透明なガ
ラス基板を得ることが出来る。In this way, a transparent glass substrate having a desired bit pattern can be obtained.
次に、得られたピットパターンを持った焼成層の上に、
反射膜３をスバッタ法などにより付け、更に、保護膜４
をその上に被覆することにより読み出し専用光ディスク
が得られる。Next, on top of the fired layer with the resulting pit pattern,
A reflective film 3 is applied by a spatter method, and a protective film 4 is further applied.
A read-only optical disc is obtained by coating it on it.
反射膜３の材料としては、各種の金属、金属窒化物など
を用いることが出来るが、光ディスクとしての特性を満
足し、かつ高耐食性を示すものが好ましく、Ａｕ，Ａｕ
系合金、ＴｉＮが本発明の目的の達或を可能にする。Various metals, metal nitrides, etc. can be used as the material for the reflective film 3, but it is preferable to use a material that satisfies the characteristics of an optical disc and exhibits high corrosion resistance.
The alloy TiN makes it possible to achieve the objects of the invention.
保護膜４としては、Ｓｉ０２などの無機酸化物、Ｓｉ３
Ｎ４などの無機窒化物のような無機系のものあるいはＵ
Ｖ硬化樹脂などのような有機系のものが単独もしくは組
み合わせて使用できる。As the protective film 4, inorganic oxide such as Si02, Si3
Inorganic materials such as inorganic nitrides such as N4 or U
Organic materials such as V-curing resins can be used alone or in combination.
（作用）
本発明による読み出し専用光ディスクは、ガラス基板及
び耐湿性に優れる反射膜を有しているために、高い信頼
性を実現できる。(Function) The read-only optical disk according to the present invention has a glass substrate and a reflective film with excellent moisture resistance, so it can achieve high reliability.
（実施例） 以下、実施例に基づき詳細に説明する。(Example) Hereinafter, a detailed explanation will be given based on examples.
実施例１
化学強化されたガラス基板上に、テトラエトキシシラン
、塩酸、水、ポリエチレングリコールを含むエチルアル
コール溶液をスビンコートし、有機金属化合物を２００
０〜３０００人形威した。次いで、表面に所定のビット
パターンを有する樹脂製の型を有機金属化合物層に押し
当て、ビットパターンを転写すると共に１２０°Ｃで一
次焼或を行った。その後、ガラス基板を離型し、３５０
°Ｃで二次焼戒を行った。Example 1 An ethyl alcohol solution containing tetraethoxysilane, hydrochloric acid, water, and polyethylene glycol was coated on a chemically strengthened glass substrate, and an organometallic compound
0 to 3000 dolls were played. Next, a resin mold having a predetermined bit pattern on its surface was pressed against the organometallic compound layer, the bit pattern was transferred, and primary baking was performed at 120°C. After that, the glass substrate was released from the mold, and
Secondary burning was performed at °C.
このようにして作製したビットパターンを有する焼成層
の上に、反射膜としてスパッ久法でＡｕ−Ｔａ合金膜を
約１０００人、保護膜としてＳｉ０２膜を１０００人順
次戒膜した。On the baked layer having the bit pattern thus prepared, approximately 1,000 Au--Ta alloy films were deposited as a reflective film and 1,000 SiO2 films were deposited as a protective film using a sputtering method.
得られた光ディスクを８０°Ｃ、９０％ＲＨ下で耐候性
を評価したところ、初期値が２．ＯＸ１０ ’であった
ブロックエラーレートが、５００時間後には２．２Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 90% RH, the initial value was 2. The block error rate was OX10', but after 500 hours it was 2.2X1.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％■の条件下に１時間ほど放置し
た後、取り出して再生を行ったところ、何ら異常なく再
生できた。Further, after being left at 80° C. and 90% ■ for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例２
化学強化されたガラス基板上に、テトラエトキシシラン
、テトラプトキシチタン、塩酸、水、ポリエチレングリ
コールを含むエチルアルコール溶液をスピンコートし、
有機金属化合物層を２０００〜３０００Ａ形或した。次
いで、表面に所定のビットパターンを有する樹脂製の型
を有機金属化合物層に押し当て、ビットパターンを転写
すると共に１００°Ｃで一次焼或を行った。その後、ガ
ラス基板を離型し、３５０°Ｃで二次焼戊を行った。Example 2 An ethyl alcohol solution containing tetraethoxysilane, tetraptoxytitanium, hydrochloric acid, water, and polyethylene glycol was spin coated on a chemically strengthened glass substrate,
The organometallic compound layer was 2000-3000A type. Next, a resin mold having a predetermined bit pattern on its surface was pressed against the organometallic compound layer, the bit pattern was transferred, and primary baking was performed at 100°C. Thereafter, the glass substrate was released from the mold and subjected to secondary baking at 350°C.
このようにして作製したビットパターンを有する金属ア
ルコレートの焼成層の上に、スパッタ法でＡｕ−Ｇｅ合
金膜を約１ｏｏｏＡ、保護膜としてＳｉ０２膜を１００
０人順次或膜した。更にその上をＵＶ硬化樹脂層で被覆
した。On the fired layer of metal alcoholate having the bit pattern thus prepared, an Au-Ge alloy film was applied by sputtering at about 100A, and a Si02 film was applied as a protective film at about 100A.
0 people filmed one after another. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０°０１９０％ＲＨ下で耐候性
を評価したところ、初期値が１．５Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には２．ＩＸ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°0190% RH, the block error rate, which had an initial value of 1.5×10, decreased to 2.5×10 after 500 hours. IX10
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例３
実施例２と同様にして作製したピットパターンを有する
金属アルコレートの焼成層の上に、クラスターイオンビ
ーム法でＴｉＮ膜を約１００ＯＡ、スパッタ法でＳｉ３
Ｎ４膜を８００〜ｔｏｏｏＡ順次戒膜した。更にその上
をＵ■硬化樹脂層で被覆した。Example 3 A TiN film of approximately 100 OA was deposited using a cluster ion beam method on a fired layer of metal alcoholate having a pit pattern prepared in the same manner as in Example 2, and a Si3 film was deposited using a sputtering method.
The N4 membrane was coated sequentially from 800 to 800A. Furthermore, it was covered with a U■ cured resin layer.
得られた光ディスクを８０００、９０％ＲＨ下で耐候性
を評価したところ、初期値が１．８Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には２．５Ｘ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 8000 °C and 90% RH, the initial block error rate was 1.8X10, but after 500 hours it was 2.5X10.
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 190% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例４
実施例２と同様にして作製したビットパターンを有する
金属アルコレートの焼成層の上に、スバッタ法を用いて
Ａｕ膜を約１００ＯＡ ， Ｓｉ３Ｎ４膜を８００〜１
０００人順次或膜した。更にその上をＵＶ硬化樹脂層で
被覆した。Example 4 On the fired layer of metal alcoholate having a bit pattern produced in the same manner as in Example 2, an Au film was deposited using a sputtering method at a thickness of approximately 100 OA, and a Si3N4 film was deposited at a thickness of 800 to 100 OA.
000 people were filmed one after another. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０℃、９０％ＲＨ下で耐候性を
評価したところ、初期値が２．３Ｘ１０−３であったブ
ロックエラーレートが、５００時間後には３．２ Ｘ
１０ −３にやや増加した。しかしながら、この程度の
変化は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 90% RH, the initial block error rate was 2.3X10-3, but after 500 hours it was 3.2X.
It increased slightly to 10-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
比較例
市販されている音楽用のＣＤディスクについて同様に耐
候性の評価を行ったところ、ブロックエラーレートは５
Ｘ１０−’（初期値）から著しく変化し、５００時間後
には測定不能になっていた。また、８０Ｃ、９０％ＲＨ
条件下に１時間ほど放置した後、取り出して再生を行っ
たところ、反りが大きいため再生不能であった。Comparative Example When we similarly evaluated the weather resistance of commercially available music CD discs, the block error rate was 5.
It changed significantly from X10-' (initial value) and became unmeasurable after 500 hours. Also, 80C, 90%RH
After leaving it under these conditions for about an hour, it was taken out and regenerated, but it was found to be unable to be regenerated due to large warpage.
（発明の効果）
以上述べてきたように、本発明による読み出し専用光デ
ィスクは信頼性、耐候性に優れており、従来使用できな
かった応用分野への展開を可能にするものである。(Effects of the Invention) As described above, the read-only optical disk according to the present invention has excellent reliability and weather resistance, and can be applied to fields of application that could not be used conventionally.
第１図は本発明による読み出し専用光ディスクの概略断
面図である。
１・・・ガラス基板、
２・・・金属アルコレートの焼或層、３・・・反射膜、
４・・・保護膜FIG. 1 is a schematic cross-sectional view of a read-only optical disc according to the present invention. DESCRIPTION OF SYMBOLS 1... Glass substrate, 2... Metal alcoholate burnt layer, 3... Reflective film,
4...Protective film
Claims (1)
アルコレートの焼成層、Ａｕ、Ａｕ合金もしくはＴｉＮ
からなる反射膜と、保護膜とを順次積層したことを特徴
とする読み出し専用光ディスク。(1) A fired layer of metal alcoholate with minute irregularities on a transparent glass substrate, Au, Au alloy or TiN
A read-only optical disc characterized by sequentially laminating a reflective film consisting of a protective film and a protective film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1166079A JPH07105073B2 (en) | 1989-06-27 | 1989-06-27 | Read-only optical disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1166079A JPH07105073B2 (en) | 1989-06-27 | 1989-06-27 | Read-only optical disc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0330132A true JPH0330132A (en) | 1991-02-08 |
| JPH07105073B2 JPH07105073B2 (en) | 1995-11-13 |
Family
ID=15824592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1166079A Expired - Fee Related JPH07105073B2 (en) | 1989-06-27 | 1989-06-27 | Read-only optical disc |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07105073B2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6414082A (en) * | 1987-07-08 | 1989-01-18 | Nippon Sheet Glass Co Ltd | Grooved substrate |
-
1989
- 1989-06-27 JP JP1166079A patent/JPH07105073B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6414082A (en) * | 1987-07-08 | 1989-01-18 | Nippon Sheet Glass Co Ltd | Grooved substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07105073B2 (en) | 1995-11-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |