JPH0339241U - - Google Patents

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Publication number
JPH0339241U
JPH0339241U JP10021789U JP10021789U JPH0339241U JP H0339241 U JPH0339241 U JP H0339241U JP 10021789 U JP10021789 U JP 10021789U JP 10021789 U JP10021789 U JP 10021789U JP H0339241 U JPH0339241 U JP H0339241U
Authority
JP
Japan
Prior art keywords
filament
slit
ion source
plasma generation
generation container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10021789U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10021789U priority Critical patent/JPH0339241U/ja
Publication of JPH0339241U publication Critical patent/JPH0339241U/ja
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図Aはこの考案の一実施例に係るイオン源
を示す断面図であり、同図Bはビーム強度分布の
一例を示す図である。第2図Aは従来のイオン源
の一例を示す断面図であり、同図Bはビーム強度
分布の一例を示す図である。 4……プラズマ生成容器、41……スリツト、
6……フイラメント、61……コイル状に巻いた
部分、12……プラズマ、14……イオンビーム
、20……実施例に係るイオン源。
FIG. 1A is a sectional view showing an ion source according to an embodiment of this invention, and FIG. 1B is a diagram showing an example of beam intensity distribution. FIG. 2A is a sectional view showing an example of a conventional ion source, and FIG. 2B is a diagram showing an example of beam intensity distribution. 4... Plasma generation container, 41... Slit,
6... Filament, 61... Coiled portion, 12... Plasma, 14... Ion beam, 20... Ion source according to the example.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] イオンビーム引出し用のスリツトを有するプラ
ズマ生成容器内に、そのスリツトの長手方向に沿
つて直線状のフイラメントを配置した構造のイオ
ン源において、前記フイラメントのプラズラ生成
容器内における両端部近傍に、当該フイラメント
をコイル状に巻いた部分をそれぞれ設けたことを
特徴とするイオン源。
In an ion source having a structure in which a linear filament is arranged in a plasma generation container having a slit for extracting an ion beam, and a linear filament is arranged along the longitudinal direction of the slit, the filament is placed near both ends of the filament in the plasma generation container. An ion source characterized in that each part is provided with a coiled part.
JP10021789U 1989-08-28 1989-08-28 Pending JPH0339241U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10021789U JPH0339241U (en) 1989-08-28 1989-08-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10021789U JPH0339241U (en) 1989-08-28 1989-08-28

Publications (1)

Publication Number Publication Date
JPH0339241U true JPH0339241U (en) 1991-04-16

Family

ID=31649236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10021789U Pending JPH0339241U (en) 1989-08-28 1989-08-28

Country Status (1)

Country Link
JP (1) JPH0339241U (en)

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