JPH0336940U - - Google Patents

Info

Publication number
JPH0336940U
JPH0336940U JP9762689U JP9762689U JPH0336940U JP H0336940 U JPH0336940 U JP H0336940U JP 9762689 U JP9762689 U JP 9762689U JP 9762689 U JP9762689 U JP 9762689U JP H0336940 U JPH0336940 U JP H0336940U
Authority
JP
Japan
Prior art keywords
light
liquid leakage
detecting
reflective
submerged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9762689U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9762689U priority Critical patent/JPH0336940U/ja
Publication of JPH0336940U publication Critical patent/JPH0336940U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Examining Or Testing Airtightness (AREA)
JP9762689U 1989-08-22 1989-08-22 Pending JPH0336940U (enEXAMPLES)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9762689U JPH0336940U (enEXAMPLES) 1989-08-22 1989-08-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9762689U JPH0336940U (enEXAMPLES) 1989-08-22 1989-08-22

Publications (1)

Publication Number Publication Date
JPH0336940U true JPH0336940U (enEXAMPLES) 1991-04-10

Family

ID=31646761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9762689U Pending JPH0336940U (enEXAMPLES) 1989-08-22 1989-08-22

Country Status (1)

Country Link
JP (1) JPH0336940U (enEXAMPLES)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011044735A (ja) * 2004-07-12 2011-03-03 Nikon Corp 露光装置及びデバイス製造方法
JP2012225780A (ja) * 2011-04-20 2012-11-15 Disco Abrasive Syst Ltd 漏液検出機構
US9760026B2 (en) 2003-07-28 2017-09-12 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133335A (ja) * 1985-12-06 1987-06-16 Nec Corp 漏洩検出装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133335A (ja) * 1985-12-06 1987-06-16 Nec Corp 漏洩検出装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9760026B2 (en) 2003-07-28 2017-09-12 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus
US10185232B2 (en) 2003-07-28 2019-01-22 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus
JP2011044735A (ja) * 2004-07-12 2011-03-03 Nikon Corp 露光装置及びデバイス製造方法
JP2012009897A (ja) * 2004-07-12 2012-01-12 Nikon Corp 露光装置及びデバイス製造方法
JP2012225780A (ja) * 2011-04-20 2012-11-15 Disco Abrasive Syst Ltd 漏液検出機構

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