JPH0334138A - Optical recording medium and production thereof - Google Patents
Optical recording medium and production thereofInfo
- Publication number
- JPH0334138A JPH0334138A JP1166942A JP16694289A JPH0334138A JP H0334138 A JPH0334138 A JP H0334138A JP 1166942 A JP1166942 A JP 1166942A JP 16694289 A JP16694289 A JP 16694289A JP H0334138 A JPH0334138 A JP H0334138A
- Authority
- JP
- Japan
- Prior art keywords
- resin substrate
- recording medium
- substrate
- drying
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000000758 substrate Substances 0.000 claims abstract description 80
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 50
- 239000002904 solvent Substances 0.000 claims abstract description 30
- 239000002952 polymeric resin Substances 0.000 claims abstract description 19
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 13
- 230000002528 anti-freeze Effects 0.000 claims description 18
- 229920005989 resin Polymers 0.000 abstract description 30
- 239000011347 resin Substances 0.000 abstract description 30
- 229920000642 polymer Polymers 0.000 abstract description 18
- 238000001035 drying Methods 0.000 abstract description 12
- 238000001291 vacuum drying Methods 0.000 abstract description 11
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 239000012024 dehydrating agents Substances 0.000 abstract description 2
- 238000002310 reflectometry Methods 0.000 abstract 1
- 239000000975 dye Substances 0.000 description 12
- 239000010410 layer Substances 0.000 description 10
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 6
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 244000103152 Eleocharis tuberosa Species 0.000 description 1
- 235000014309 Eleocharis tuberosa Nutrition 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 235000014030 Podocarpus spicatus Nutrition 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XLSMFKSTNGKWQX-UHFFFAOYSA-N hydroxyacetone Chemical compound CC(=O)CO XLSMFKSTNGKWQX-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は基板上に溶媒塗布型記録媒体を形成した光記録
媒体およびその製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical recording medium in which a solvent-coated recording medium is formed on a substrate, and a method for manufacturing the same.
[従来の技術]
従来、染料等からなる溶媒塗布型記録媒体を用いた光記
録媒体は、染料を溶媒に溶解した溶液をプラスチック基
板上にスピンコード、スプレーコート又はグラビアコー
ト等によってコーティングした後、溶媒を除去して染料
記録層を形成する方法により製造されている。[Prior Art] Conventionally, an optical recording medium using a solvent-coated recording medium made of a dye or the like is produced by coating a plastic substrate with a solution in which a dye is dissolved in a solvent by spin cording, spray coating, gravure coating, etc. It is manufactured by a method in which a dye recording layer is formed by removing the solvent.
[発明か解決しようとする課題]
しかしながら、プラスチック基板上に溶媒塗布型記録媒
体を形成する場合においては、プラスチック基板が塗布
溶媒に対する耐溶剤性が低いことが問題となる。塗布溶
媒によって基板表面か溶解すると、その結実膜れる現象
として基板表面に形成された塗布型染料記録層の反射率
の低下が認められる。この現象は、染料溶液の基板上へ
の塗布および乾燥過程で、基板表面が染料溶媒によって
溶解し、溶出した基板構成物質と染料分子との反応又は
相互作用によって染料層の一部が変化するために発生す
るものと考えられる。[Problems to be Solved by the Invention] However, when a solvent-coated recording medium is formed on a plastic substrate, a problem arises in that the plastic substrate has low solvent resistance to the coating solvent. When the substrate surface is dissolved by the coating solvent, a reduction in the reflectance of the coated dye recording layer formed on the substrate surface is observed as a phenomenon in which a film forms. This phenomenon occurs because during the coating and drying process of the dye solution on the substrate, the substrate surface is dissolved by the dye solvent, and a part of the dye layer changes due to reaction or interaction between the eluted substrate constituents and dye molecules. It is thought that this occurs in
この様な製造工程での反射率の低下は、光記録媒体の耐
光性の低下、および高温多湿下の耐環境性テストでの性
能低下を促進する。Such a decrease in reflectance during the manufacturing process promotes a decrease in the light resistance of the optical recording medium and a decrease in performance in an environmental resistance test under high temperature and high humidity.
したかって、基板の耐溶剤性を向上させる必要があるが
、その手段として、
■ 電子線による基板表面の硬化および改質。Therefore, it is necessary to improve the solvent resistance of the substrate, and the means for achieving this are: 1. Hardening and modification of the substrate surface using electron beams.
■ 基板と染料層の間に下引き層を設ける、などの方法
が知られている。(2) A known method is to provide an undercoat layer between the substrate and the dye layer.
しかしながら、■の電子線処理においては、電子線処理
時に発生する静電気によるゴミや異物の吸着か製造上の
問題となり、大ががりな除電対策か必要となる。However, in the electron beam processing (2), the static electricity generated during the electron beam processing causes problems in manufacturing due to the adsorption of dust and foreign matter, and extensive static elimination measures are required.
また、■の下引き1層を設ける方法においては、下引き
層による記録感度の低下および反射光のノイズの増加、
又は基板上にインジェクション法などによって設けられ
た光ヘッドのためのプリフォーマット信号が下引き層の
ために読み出しにくくなる間瑚か生じている。In addition, in the method (2) of providing one undercoat layer, the undercoat layer reduces recording sensitivity and increases noise in reflected light.
Alternatively, preformatted signals for an optical head provided on a substrate by an injection method or the like may become difficult to read due to the undercoat layer.
従来、基板の処理方法として基板の光学的ひずみ、例え
ば、基板の複屈折を除去するために基板のTg(ガラス
転移点)近傍の温度で基板を加熱処理することが知られ
ている。(特開昭63−184943号公報)
また、特開昭63−607:19号公報には、基板の加
熱処理装置の開示がなされているが、これもまた光学的
ひずみ、又は基板の変形を防ぐための装置である。2. Description of the Related Art Conventionally, it is known as a substrate processing method to heat a substrate at a temperature near the Tg (glass transition point) of the substrate in order to remove optical distortion of the substrate, such as birefringence of the substrate. (Japanese Unexamined Patent Publication No. 184943/1983) In addition, JP 63/607:19 discloses a substrate heat treatment apparatus, which also prevents optical distortion or deformation of the substrate. This is a device to prevent this.
上記2件の従来例には、いずれもプラスチック基板上に
形成された塗布型記録媒体の反射率を向上させる効果お
よび作用については全く開示されていない。None of the above two conventional examples discloses the effect or function of improving the reflectance of a coated recording medium formed on a plastic substrate.
また、7g近傍で加熱処理すると基板か熱変形しやすく
なり、製造時に基板をホットプレート等の平面ヒーター
上で加熱処理する必要がある。基板を鉛直に立てて処理
した場合、基板か変形しやすくなる。したがって、7g
近傍の加熱処理は光記録媒体の量産には不向きである。Further, if heat-treated at around 7 g, the substrate tends to be thermally deformed, and it is necessary to heat-treat the substrate on a flat heater such as a hot plate during manufacturing. If the substrate is held vertically during processing, the substrate will easily deform. Therefore, 7g
Nearby heat treatment is not suitable for mass production of optical recording media.
本発明は、この様な従来技術の問題を解決するためにな
されたものであり、高分子樹脂基板の耐溶剤性を向上し
、高分子樹脂基板を用いた塗布型記録媒体の反射率を安
定化させた光記録媒体およびその製造方法を提供するこ
とを目的とするものである。The present invention was made to solve the problems of the prior art, and improves the solvent resistance of polymer resin substrates and stabilizes the reflectance of coated recording media using polymer resin substrates. It is an object of the present invention to provide an optical recording medium that can be converted into an optical recording medium and a method for manufacturing the same.
[課題を解決するための手段]
即ち、本発明は、高分子樹脂基板上に溶媒塗布型記録媒
体を形成してなる光記録媒体において、前記高分子樹脂
基板の不凍水の含水量が0.05%以下であることを特
徴とする光記録媒体、および高分子樹脂基板上に溶媒塗
布型記録媒体を形成した光記録媒体の製造方法において
、前記高分子樹脂基板の不凍水の含水量が0.05%以
下になる様に高分子樹脂基板の前処理を行なった後、高
分子樹脂基板上に溶媒塗布型記録媒体を形成することを
特徴とする光記録媒体の製造方法を提供することである
。[Means for Solving the Problems] That is, the present invention provides an optical recording medium formed by forming a solvent-coated recording medium on a polymer resin substrate, in which the antifreeze water content of the polymer resin substrate is 0. In an optical recording medium and a method for producing an optical recording medium in which a solvent-coated recording medium is formed on a polymer resin substrate, the water content of antifreeze water in the polymer resin substrate is .05% or less. Provided is a method for producing an optical recording medium, characterized in that a polymer resin substrate is pretreated so that the amount of 0.05% or less is obtained, and then a solvent-coated recording medium is formed on the polymer resin substrate. That's true.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明の光記録媒体の製造方法において用いられる高分
子樹脂基板(以下、樹脂基板と記す)としては、ポリカ
ーボネート、ポリメチルメタアクリレートおよびポリス
チレンなどの透明樹脂が用いられるが、これ等の透明樹
脂は常温、常湿下で製造された場合には必ず水を含んで
いる。これらの樹脂基板が含んでいる水を高分子の含有
水と定義する。さらに、高分子の含有水は示差走査熱量
計(D、S、C: Differential Sca
nningCalorimetry )を用いることに
よって、本発明において表現されている「不凍水」と、
一般に知られている「凍る水」に大別できる。この高分
子の含有水を2つに分けることは、下記の引用文献に報
告されている。Transparent resins such as polycarbonate, polymethyl methacrylate, and polystyrene are used as the polymer resin substrate (hereinafter referred to as resin substrate) used in the method for manufacturing an optical recording medium of the present invention. If it is manufactured at room temperature and humidity, it will always contain water. The water contained in these resin substrates is defined as polymer-containing water. Furthermore, the water contained in the polymer was measured using a differential scanning calorimeter (D, S, C: Differential Scanning Calorimeter).
nnningCalorimetry), the "unfreeze water" expressed in the present invention,
It can be broadly classified into what is commonly known as ``freezing water.'' Dividing the water contained in this polymer into two parts is reported in the cited document below.
引用文献
1 、 r NETSUSOKUTEIJ 7 (1
) 18−25 (1980年)初心者のための熱分
析
(2) DTA、 DSCの高分子液晶物質などへの応
用2 、 T、 Hatakeyama、 H
,Hatakeyama and K、 Nak
a−aura、 r 5tudies on boun
d water of celluloseby di
fferential scanning calor
imetryJ 、 TextRes−J、、 51
(1981) 607゜3 、 M、 A、 From
mer and D、 J、 Lancet、 r
Freezi−ng and nonfreezing
wa、ter in cellulose acet
a−te membranes J 、 J、
Appl、 Polym、 Sci、、 1
6(1972)1295゜
4.Y、Ogawa and S、5uzuki、
ron the natureof fre
e and bound water in
water per+5eationof ce
llulose acetate membran
es in reverseosmosisJ
、Desalination、42 (1982)5
7゜5 、5IR)IAsHDEODFIAR,and
PHILIP LINER,r Measurem
ent of Bound (Nonfreez
ing)water by Differenti
al Scanning Clorimetry、
J AIlericanChemical 5oci
ety Report、 No、127 (1980
年)chapter 16.237 〜285゜一般
に知られている「凍る水」は文献等では自由水(fre
e water)と呼ばれているもので、低温からの昇
温時のD−3,Cの測定で、−3〜+3°C付近に氷の
融解熱のピークとして観察される。Cited document 1, r NETSUSOKUTEIJ 7 (1
) 18-25 (1980) Thermal analysis for beginners (2) Application of DTA and DSC to polymeric liquid crystal materials, etc. 2, T., Hatakeyama, H.
, Hatakeyama and K, Nak
a-aura, r 5tudies on boun
d water of cellulose by di
fferential scanning color
imetryJ, TextRes-J,, 51
(1981) 607゜3, M, A, From
mer and D, J, Lancet, r
Freezing and nonfreezing
wa, ter in cellulose acet
a-te membranes J, J,
Appl, Polym, Sci, 1
6 (1972) 1295°4. Y, Ogawa and S, 5uzuki,
ron the nature of fre
e and bound water in
water per+5ation of ce
lulose acetate membrane
es in reverse osmosisJ
, Desalination, 42 (1982) 5
7゜5, 5IR) IAsHDEODFIAR, and
PHILIP LINER,r Measurem
Ent of Bound (Nonfreez
ing) water by Differenti
al Scanning Chromimetry,
J AIlericanChemical 5oci
ety Report, No. 127 (1980
Chapter 16.237 - 285゜The generally known "frozen water" is referred to as free water (free water) in literature.
When measuring D-3,C when the temperature is raised from a low temperature, it is observed as a peak of the heat of melting of ice around -3 to +3°C.
一方、不凍水は、結合水9束縛水およびバウンド ウォ
ーター(bound water )と呼ばれ、O,S
、Cによる低温(−30〜−40°C)からの昇温過程
で、融解熱のピークが現われない水、又は融解熱のピー
クが一10℃以下に現われる水、として定義されている
(引用文献: T、 Hatakeyama、 H。On the other hand, antifreeze water is called bound water and bound water, and is composed of O, S
It is defined as water that does not show a heat of fusion peak during the temperature raising process from a low temperature (-30 to -40°C) using C, or water that shows a heat of fusion peak below 110°C (cited Literature: T., Hatakeyama, H.
Hatakeyama and K、Nakamu
ra、 rstudies onbound w
ater of cellulose by
differentialscanning cal
orimetryJ 、Text、Res、J、、5
1(1981)607)
不凍水は、高分子のマトリックスと水素結合し、(高分
子)−(水)−(高分子)の結合を高分子マトリックス
内で作っていると考えられる。Hatakeyama and K, Nakamu
ra, rstudies onbound w
ater of cellulose by
differential scanning cal
orimetryJ,Text,Res,J,,5
1 (1981) 607) It is thought that antifreeze water forms hydrogen bonds with a polymer matrix, creating a (polymer)-(water)-(polymer) bond within the polymer matrix.
一方、緻密な構造を有する高分子では、高分子含有水の
ほとんどは不凍水であると考えられる。On the other hand, in a polymer having a dense structure, most of the polymer-containing water is considered to be antifreeze water.
(引用文献: Water in Polymer、
AC3Report No。(References: Water in Polymer,
AC3Report No.
127 (1980) chapter 16.27
3−285.)したがって、本発明者は光記録媒体の基
板としてポリカーボネート、ポリメチルメタアクリレー
ト、その他アクリル樹脂、例えばポリメタアクリル酸ブ
チル等、およびポリスチレンなどの透明な樹脂基板を用
いる場合に、樹脂基板の不凍水を除去することによって
(高分子)−(水)−(高分子)の結合が(高分子)−
(高分子〉の結合に変わり、高分子が収縮し、その結果
、高分子間力が増加し基板表面の耐溶剤性が向上するこ
とを見出した。127 (1980) chapter 16.27
3-285. ) Therefore, when using polycarbonate, polymethyl methacrylate, other acrylic resins such as polybutyl methacrylate, and transparent resin substrates such as polystyrene as substrates for optical recording media, the inventors have found that By removing water, the bond between (polymer) - (water) - (polymer) is changed to (polymer) -
(Polymer) bond, the polymer contracts, and as a result, the inter-polymer force increases and the solvent resistance of the substrate surface improves.
上記透明な樹脂基板から不凍水を除去する方法は、真空
乾燥、加熱(90〜110°C〉乾燥、脱水剤(吸湿材
)による乾燥、およびそれらの複合した乾燥方法を用い
るこができる。As a method for removing antifreeze water from the transparent resin substrate, vacuum drying, heating (90 to 110° C.) drying, drying using a dehydrating agent (hygroscopic material), and a combination of these drying methods can be used.
乾燥時間は乾燥方法によって異なるが、基板の重量(g
)又は収縮量(mm又はILmオーダ)か一定となり、
樹脂基板の不凍水の含水量が0.05%以下になるまで
行なう。不凍水の含水量が0.05%をこえていると高
分子表面の耐溶剤性が低いので塗布型染料記録層の反射
率低下を引きおこすので好ましくない。The drying time varies depending on the drying method, but depends on the weight of the substrate (g
) or the amount of contraction (mm or ILm order) is constant,
This process is continued until the water content of the antifreeze water on the resin substrate becomes 0.05% or less. If the water content of the antifreeze water exceeds 0.05%, the solvent resistance of the polymer surface will be low, causing a decrease in the reflectance of the coated dye recording layer, which is not preferable.
上記の様にして樹脂基板を乾燥して前処理を行なった後
、樹脂基板上に溶媒塗布型記録媒体を形成する。前処理
を行なった樹脂基板に塗布法により染料層を形成する方
法は、ポリメチン系、ビリリウム系、シアニン系、ナフ
トキノン系、トリフェニルメタン系などの染料などを溶
媒に溶解し、スピンコータ、グラビアコータ、スプレー
コータ等で塗布することによって形成される。溶媒とし
ては、特に制限はなく通常使用されている有機溶媒が用
いられ、例えばエタノール、ジアセトンアルコール、ジ
クロルエタン、メチルセルソルブ又はそれらの混合液等
が挙げられる。After the resin substrate is dried and pretreated as described above, a solvent-coated recording medium is formed on the resin substrate. The method of forming a dye layer on a pretreated resin substrate by coating is to dissolve polymethine-based, biryllium-based, cyanine-based, naphthoquinone-based, triphenylmethane-based dyes, etc. in a solvent, and then use a spin coater, gravure coater, etc. It is formed by coating with a spray coater or the like. The solvent is not particularly limited, and commonly used organic solvents may be used, such as ethanol, diacetone alcohol, dichloroethane, methylcellosolve, or a mixture thereof.
[実施例] 以下、実施例を示し本発明をさらに具体的に説明する。[Example] Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例1
第1図は、樹脂基板として0.4■厚のポリメチルメタ
アクリレート(PMMA)を用いた場合の樹脂基板の真
空乾燥時間と、樹脂基板の不凍水量の変化および樹脂基
板の収縮量との関係を示す。系内圧力1〜2 am)I
g、温度25°C2時間2〜10h「の真空乾燥によっ
て樹脂基板の不凍水量は減少し、かつ樹脂基板は収縮し
た。なお、樹脂基板の不凍水量の含水率は示差走査熱量
計によって測定した値を示す。Example 1 Figure 1 shows the vacuum drying time of a resin substrate, changes in the amount of antifreeze water in the resin substrate, and shrinkage of the resin substrate when 0.4-inch thick polymethyl methacrylate (PMMA) is used as the resin substrate. Shows the relationship with quantity. System pressure 1-2 am) I
By vacuum drying at a temperature of 25°C for 2 to 10 hours, the amount of antifreeze water on the resin substrate decreased and the resin substrate shrank.The water content of the amount of antifreeze water on the resin substrate was measured by a differential scanning calorimeter. shows the value.
次に、各時間真空乾燥した樹脂基板に、下記構造i(r
)
(C2)(−)J+ NトN(C2H9)2
cI!o4e
アセトンアルコール中に3wt%となるように溶解し、
グラビアコータを用いて塗布した。さらに、エチレン−
酢酸ビニル系の接着剤(日本マタイ製、エルファン0H
506)を用いて、ポリメチルメタアクリレート(PM
MA)からなる保護基板を設け、第2図に示されるよう
な光カード媒体を作成した。Next, the following structure i(r
) (C2)(-)J+NtN(C2H9)2
cI! o4e Dissolved in acetone alcohol to a concentration of 3 wt%,
It was coated using a gravure coater. Furthermore, ethylene-
Vinyl acetate adhesive (Nippon Matai, Elfan 0H)
506), polymethyl methacrylate (PM
A protective substrate made of MA) was provided, and an optical card medium as shown in FIG. 2 was produced.
各光カードについて媒体の反射率を測定し、真空乾燥時
間と反射率との関係を第3図に示した。The reflectance of the medium was measured for each optical card, and the relationship between the vacuum drying time and the reflectance is shown in FIG.
同図において、2値の巾が大きいほど反射率値が不安定
であることを表わす。In the figure, the larger the width of the binary values, the more unstable the reflectance value is.
第3図から明らかなように、真空乾燥時間か増加するに
従って反射率は増加し、不凍水量がO,OS%以下のと
きに反射率は飽和値になり、溶媒塗布型記録媒体を用い
ても反射率の安定した光カード媒体を作成することがで
きた。As is clear from Figure 3, the reflectance increases as the vacuum drying time increases, and when the amount of antifreeze water is less than O,OS%, the reflectance reaches a saturated value, and when a solvent-coated recording medium is used, the reflectance increases. We were also able to create an optical card medium with stable reflectance.
真空乾燥しない場合は反射率のバラツキが大きく、安定
した反射率の数値をもつ光カード媒体が得られなかった
。When vacuum drying was not performed, the reflectance varied greatly and an optical card medium with a stable reflectance value could not be obtained.
実施例2
樹脂基板として0.4■厚のPMMAを用い、樹脂基板
を真空加熱(圧力1hm)Ig、温度90°C2時間2
分〜120分)した後に、実施例1と同様な材料を用い
光カート媒体を得た。Example 2 Using PMMA with a thickness of 0.4 mm as a resin substrate, the resin substrate was heated in vacuum (pressure 1 hm) at Ig, temperature 90°C for 2 hours 2
120 minutes), an optical cart medium was obtained using the same materials as in Example 1.
これらの光カード離体の反射率および不凍水量と真空乾
燥時間の関係を第4図に示す。第4図より、不凍水量か
0.05%以下のとき反射率か飽和値に達し、反射率の
安定した光カード媒体を作成することができた。FIG. 4 shows the relationship between the reflectance of these optical card detachments, the amount of antifreeze water, and the vacuum drying time. From FIG. 4, the reflectance reached a saturation value when the amount of antifreeze water was 0.05% or less, and an optical card medium with stable reflectance could be produced.
[発明の効果コ
以上説明した様に、本発明によれば、樹脂基板の不凍水
の含水量を0.05%以下にすることによって樹脂基板
の高分子間力が増加し、樹脂基板の耐溶剤性を向上させ
ることができる。その結果、溶媒塗布型記録媒体の反射
率は数値のバラツキが少なくなり、かつ不凍水が存在す
る場合と比較して、絶対値で1〜2%反射率反射率なり
、安定した光記録媒体を得ることができた。[Effects of the Invention] As explained above, according to the present invention, by reducing the water content of antifreeze water in the resin substrate to 0.05% or less, the interpolymer force of the resin substrate increases, and the strength of the resin substrate increases. Solvent resistance can be improved. As a result, the reflectance of the solvent-coated recording medium has less variation in numerical values, and compared to the case where antifreeze water is present, the reflectance is 1 to 2% in absolute value, making it a stable optical recording medium. I was able to get
第1図は実施例1における真空乾燥時間と樹脂基板の含
水率の変化および樹脂基板の収縮率との関係を示すグラ
フ、第2図は実施例1で、製造された光カード媒体の模
式図、第3図は第2図の光カード媒体における樹脂基板
の真空乾燥時間と反射率との関係を示すグラフ、第4図
は実施例2の光カード媒体の反射率および樹脂基板の不
凍水量と真空乾燥時間の関係を示すグラフである。
l・・・樹脂基板
2・・・溶媒塗布型記録媒体
3・・・接着層
4・・・保護基板FIG. 1 is a graph showing the relationship between the vacuum drying time, the moisture content of the resin substrate, and the shrinkage rate of the resin substrate in Example 1, and FIG. 2 is a schematic diagram of the optical card medium manufactured in Example 1. , FIG. 3 is a graph showing the relationship between vacuum drying time and reflectance of the resin substrate in the optical card medium of FIG. 2, and FIG. 4 is a graph showing the reflectance of the optical card medium of Example 2 and the amount of antifreeze water on the resin substrate. It is a graph which shows the relationship between and vacuum drying time. l... Resin substrate 2... Solvent coated recording medium 3... Adhesive layer 4... Protective substrate
Claims (2)
てなる光記録媒体において、前記高分子樹脂基板の不凍
水の含水量が0.05%以下であることを特徴とする光
記録媒体。(1) An optical recording medium formed by forming a solvent-coated recording medium on a polymer resin substrate, characterized in that the antifreeze water content of the polymer resin substrate is 0.05% or less. recoding media.
た光記録媒体の製造方法において、前記高分子樹脂基板
の不凍水の含水量が0.05%以下になる様に高分子樹
脂基板の前処理を行なった後、高分子樹脂基板上に溶媒
塗布型記録媒体を形成することを特徴とする光記録媒体
の製造方法。(2) In a method for manufacturing an optical recording medium in which a solvent-coated recording medium is formed on a polymer resin substrate, the polymer resin is A method for producing an optical recording medium, which comprises forming a solvent-coated recording medium on a polymer resin substrate after pre-treating the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1166942A JPH0334138A (en) | 1989-06-30 | 1989-06-30 | Optical recording medium and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1166942A JPH0334138A (en) | 1989-06-30 | 1989-06-30 | Optical recording medium and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0334138A true JPH0334138A (en) | 1991-02-14 |
Family
ID=15840496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1166942A Pending JPH0334138A (en) | 1989-06-30 | 1989-06-30 | Optical recording medium and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0334138A (en) |
-
1989
- 1989-06-30 JP JP1166942A patent/JPH0334138A/en active Pending
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