JPS6251411A - Manufacture of plastic substrate excellent in dimensional stability - Google Patents

Manufacture of plastic substrate excellent in dimensional stability

Info

Publication number
JPS6251411A
JPS6251411A JP19140085A JP19140085A JPS6251411A JP S6251411 A JPS6251411 A JP S6251411A JP 19140085 A JP19140085 A JP 19140085A JP 19140085 A JP19140085 A JP 19140085A JP S6251411 A JPS6251411 A JP S6251411A
Authority
JP
Japan
Prior art keywords
temperature
substrate
resin
molded product
molded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19140085A
Other languages
Japanese (ja)
Inventor
Ryoji Handa
半田 良治
Koji Takahashi
宏治 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP19140085A priority Critical patent/JPS6251411A/en
Publication of JPS6251411A publication Critical patent/JPS6251411A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a reliable information recording medium, which does not deform even when it is placed under the environment liable to develop the deformation and warpage therein by a method wherein a thermoplastic resin molded product, which is injection-molded after being heated up to a temperature exceeding its flow temperature, is held at a temperature lower than the heat distortion temperature of the resin under high humidity until the moisture in the molded product reaches a specified state. CONSTITUTION:After thermoplastic resin, which is heated up to a temperature exceeding its flow temperature, is injectioned-molded, the resultant molded product is held at a temperature lower than the heat distortion temperature of the resin by 20 deg.C or more under high humidity until the moisture in the molded product reaches 40% or more of the equilibrium condition. The above-mentioned high temperature means 70% relative humidity and more or preferably 90% relative humidity and more. Under the condition less than 70% relative humidity, the effect of moisture is small and the time for treatment becomes longer and the effect is not enough. A temperature lower than the heat distortion temperature of the resin by 20 deg.C or more is used as an annealing temperature. In case of methyl methacrylate resin, the effective annealing environment is 30-80 deg.C or preferably 40-70 deg.C. The processing temperature exceeding the heat distortion temperature minus 20 deg.C is not preferable, because the deformation develops in the molded product under said temperature.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は寸法安定性に優れた熱可塑性樹脂の射出成形に
よるプラスチック基板の製造法に関するものである。特
に光デイスク用に適したプラスチック基板の製造法に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a plastic substrate by injection molding of a thermoplastic resin having excellent dimensional stability. In particular, the present invention relates to a method of manufacturing a plastic substrate suitable for optical disks.

[従来の技術] 光デイスク用基板としては、透明な熱可塑性樹脂を射出
成形したものが多く用いられる。しかしながら、射出成
形法では得られる基板内には後変形の原因になる残留応
力が生じ、問題となっている。従来、光デイスク用基板
としては透明な熱可塑性樹脂としてポリ塩化ビニル、ポ
リカーボネート、ポリメチルメタクリレート、ポリ4−
メチルペンテン等が用いられている。特にポリメチルメ
タフリレート系樹脂は、その優れた光学特性、成形性の
ため、オプトエレクトロニクス関連素材に多く用いられ
るようになっている。
[Prior Art] As substrates for optical disks, substrates made by injection molding of transparent thermoplastic resin are often used. However, the injection molding method causes a problem in that residual stress that causes post-deformation occurs in the obtained substrate. Conventionally, transparent thermoplastic resins such as polyvinyl chloride, polycarbonate, polymethyl methacrylate, and poly(4-4) have been used as substrates for optical disks.
Methylpentene etc. are used. In particular, polymethyl methacrylate resins are increasingly used in optoelectronic materials due to their excellent optical properties and moldability.

たとえば、光フアイバー素材として、あるいは光学レン
ズや光ディスク、光カード等の記録用基板としての用途
がある。後者の光ディスクの基板については光学式のビ
デオディスク基板としてメチルメタクリレート系樹脂が
主として用いられている。
For example, it is used as an optical fiber material or as a recording substrate for optical lenses, optical discs, optical cards, etc. As for the latter optical disk substrate, methyl methacrylate resin is mainly used as an optical video disk substrate.

しかし、一方メチルメタクリレート系樹脂の熱変形温度
は100℃前後ではあるが、若干の吸湿性を有するため
、肉厚の薄い成形品は、高湿度の環境におかれると、か
なり低い温度でも、反り。
However, although the heat distortion temperature of methyl methacrylate resin is around 100°C, it has some hygroscopicity, so thin molded products can warp even at fairly low temperatures when placed in a high humidity environment. .

ねじれ、だれといった変形を伴うことがあり、より高度
な寸法精度を必要とする書き込み可能な光ディスクへの
用途などが制限されることになる。
This may result in deformation such as twisting or drooping, which limits its application to writable optical discs that require higher dimensional accuracy.

メチルメタクリレート系樹脂のこのような特性は、成形
法によっても差があるが、射出成形の場合はかなりの成
形歪を持っているため、上述した変形は最も顕著に現れ
る。
These characteristics of methyl methacrylate resins vary depending on the molding method, but in the case of injection molding, the above-mentioned deformation is most noticeable because the molding distortion is considerable.

従来より、上述のような問題点の解決法として。Conventionally, as a solution to the problems mentioned above.

一つの方法はポリマー組成を変更し、吸湿性そのものを
小さくすることが提案されている。この方法は低吸湿性
を賦与する共重合単量体をかなり大量に用いる必要があ
り、そのためメチルメタクリレート系樹脂の特徴が失わ
れ、光学特性が低下したり、また成形品がもろくなるな
どの問題点が多くなり、現在に至るまでこれといった決
め手はない。
One method proposed is to change the polymer composition to reduce the hygroscopicity itself. This method requires the use of a fairly large amount of a copolymerized monomer that imparts low hygroscopicity, resulting in problems such as loss of characteristics of the methyl methacrylate resin, deterioration of optical properties, and brittle molded products. The number of points has increased, and up until now there has been no decisive factor.

もう一つの方法としては、成形物を7ニールする方法が
知られている0通常、成形品のアニールは熱変形温度よ
り10〜20℃低い温度で一定時間処理する方法がとら
れる。従ってメチルメタクリレート系樹脂の場合、90
〜80℃で処理するのが一般的である。
Another known method is to anneal the molded product for 7 times. Usually, the molded product is annealed at a temperature 10 to 20° C. lower than the heat distortion temperature for a certain period of time. Therefore, in the case of methyl methacrylate resin, 90
It is common to process at ~80°C.

[発明が解決しようとする問題点] しかし、成形物をアニールする方法において、成形物の
厚みが薄い場合、上述のような温度でアニールすると成
形体が大きく変形し、使用に耐えない。また、アニール
温度を下げると7二−ルの効果が出ないか、又はアニー
ル効果を出すために長時間の処理が必要になる。
[Problems to be Solved by the Invention] However, in the method of annealing a molded product, if the thickness of the molded product is thin, the molded product will be greatly deformed if annealed at the above-mentioned temperature, making it unusable. In addition, if the annealing temperature is lowered, the effect of the 7-mer will not be produced, or a long time treatment will be required to produce the annealing effect.

上述のような技術的課題に鑑み、本発明者らは変形を伴
わないアニール方法について検討の結果。
In view of the technical issues described above, the present inventors have investigated an annealing method that does not involve deformation.

高湿度下では成形体の変形量が多いことに注目し、アニ
ール効果におよぼす水分および温度の効果をそれぞれ分
離して検討し、それぞれ単独の効果からは予測できない
相乗効果があることを見出し、本発明に到達したもので
ある。
Focusing on the large amount of deformation of molded bodies under high humidity, we separately investigated the effects of moisture and temperature on the annealing effect, and found that there is a synergistic effect that cannot be predicted from the effects of each alone. This invention has been achieved.

[問題点を解決するための手段] すなわち本発明は、熱可塑性樹脂を射出成形して基板を
製造するに際し、流動温度以上に加熱された熱可塑性樹
脂を射出成形した後、該成形物を樹脂の熱変形温度より
20℃以上低い温度で高湿度下に、該成形物中の水分が
平衡状態の40%以上に達するまで保持することを特徴
とする寸法安定性に優れたプラスチック基板の製造法に
ある。
[Means for Solving the Problems] That is, the present invention, when manufacturing a substrate by injection molding a thermoplastic resin, involves injection molding the thermoplastic resin heated to a temperature higher than the flow temperature, and then molding the molded product into the resin. A method for producing a plastic substrate with excellent dimensional stability, characterized by maintaining the molded product under high humidity at a temperature 20°C or more lower than the heat distortion temperature of the molded product until the moisture content in the molded product reaches 40% or more of the equilibrium state. It is in.

本発明でいう高湿度とは相対湿度70%以上、好ましく
は90%以上をいう。70%未満の条件では、水分の効
果が小さく、処理時間が長くなり、効果が充分でない。
In the present invention, high humidity refers to a relative humidity of 70% or more, preferably 90% or more. If it is less than 70%, the effect of moisture is small, the processing time becomes long, and the effect is not sufficient.

アニール温度としては樹脂の熱変形温度より20℃以上
低い温度が用いられる。メチルメタクリレート樹脂の場
合は30〜80℃、好ましくは40〜70℃の環境下に
おくことが効果的である。
As the annealing temperature, a temperature that is 20° C. or more lower than the thermal deformation temperature of the resin is used. In the case of methyl methacrylate resin, it is effective to keep it in an environment of 30 to 80°C, preferably 40 to 70°C.

処理温度が熱変形温度−20℃を超えると、成形物に変
形を生じるため、好ましくない。
If the treatment temperature exceeds the heat distortion temperature -20°C, the molded product will be deformed, which is not preferable.

本発明の方法は平板でもよいし、また、平板上に空溝の
形成されたもの、ビットの形成されたものにも適用する
ことができる。
The method of the present invention may be applied to a flat plate, or to a flat plate with grooves or bits formed thereon.

本発明の方法は成形物が少量の水を吸収する性質を利用
しており、水分を若干吸収する材料ならメチルメタクリ
レート系樹脂に限らず、各種の熱可塑性樹脂に有効であ
る。また、成形物内部での水分の拡散係数は小さいため
、肉厚の成形物に対しては、その効果は期待できない。
The method of the present invention utilizes the property of a molded article to absorb a small amount of water, and is effective for not only methyl methacrylate resin but also various thermoplastic resins as long as the material absorbs a small amount of water. Furthermore, since the diffusion coefficient of moisture inside the molded product is small, this effect cannot be expected for thick molded products.

成形物の処理に当っては、被処理品の保持方法を考慮す
る必要がある。成形物の厚みが薄いものでは、高湿度下
では条件により成形物の自重により1重力方向に変形す
ることがあるため、成形物がディスク状のような場合、
ディスク面を重力に対して垂直に保持することが必要で
あり、さらにはこれを回転させることが好ましい、大量
のディスク成形品を処理する場合、種々の方法が考えら
れるが、恒温恒湿槽に回転軸を取付け、それに成形物、
必要ならスペーサーのセンターホールを通して固定し、
一定の速度で回転させる方法や、同様に成形物が互いに
触れず1重力に対して垂直になるよう保持したコンベア
にのせ、温度、湿度を調節したトンネルを通過させるよ
うな連続処理方法も採用することができる。
When processing molded products, it is necessary to consider the method of holding the product. If the thickness of the molded product is thin, it may deform in the direction of 1 gravity due to its own weight under high humidity conditions, so if the molded product is disc-shaped,
When processing large quantities of molded discs, where it is necessary to hold the disc surface perpendicular to gravity and it is preferable to rotate it, various methods can be considered. Attach the rotating shaft, attach the molded product to it,
If necessary, fix it through the center hole of the spacer,
We also use continuous processing methods, such as rotating at a constant speed, or placing the molded products on a conveyor that holds them perpendicular to 1 gravity without touching each other, and passing them through a tunnel with controlled temperature and humidity. be able to.

このような処理を施された基板を用いた光デイスク板は
通常のポリメチルメタクリレート基板が変形や反りを生
ずるような環境におかれても変形することもなく、信頼
性のある情報記録媒体となる。
Optical disk plates using substrates treated in this way do not deform even when placed in environments where ordinary polymethyl methacrylate substrates would deform or warp, making them reliable information recording media. Become.

以下、実施例および比較例によって本発明を具体的に説
明する。実施例および比較例において湿度はすべて相対
湿度を示す。
Hereinafter, the present invention will be specifically explained with reference to Examples and Comparative Examples. In Examples and Comparative Examples, all humidity refers to relative humidity.

[実施例] 実施例1 市販のメチルメタクリレート樹脂ペレットとして、アク
リベットvH(三菱レイヨン株式会社製商品名)を用い
、直径300mm、厚さ1.2+imのプリグループの
ついたディスク基板を名種グイナメルタ射出成形機を用
いてシリンダ一温度285℃、金型温度60℃で射出成
形した。この基板2枚を60℃、相対湿度90%に調節
された恒温、恒湿槽中で2時間処理した。処理後の吸水
率は1.2%であった。なお、基板は重力に対して垂直
になるよう回転軸に固定し、軸をBrp−の速度で回転
させた。
[Example] Example 1 Using Acryvet vH (trade name manufactured by Mitsubishi Rayon Co., Ltd.) as a commercially available methyl methacrylate resin pellet, a disk substrate with a pre-group having a diameter of 300 mm and a thickness of 1.2+im was injected using the famous Guina Melta injection method. Injection molding was performed using a molding machine at a cylinder temperature of 285°C and a mold temperature of 60°C. The two substrates were treated for 2 hours in a constant temperature and humidity chamber adjusted to 60° C. and 90% relative humidity. The water absorption rate after treatment was 1.2%. Note that the substrate was fixed to a rotating shaft so as to be perpendicular to gravity, and the shaft was rotated at a speed of Brp-.

処理した基板のうちの1枚および未処理基板を固定治具
を用いて45℃、90%の恒温恒湿槽に静置し、一定時
間後に取り出して、自重によって変形した量をマイクロ
メーターを用いて測定した。
One of the treated substrates and the untreated substrate were placed in a constant temperature and humidity chamber at 45°C and 90% using a fixing jig, and after a certain period of time, they were taken out and the amount of deformation due to their own weight was measured using a micrometer. It was measured using

第1図(a)は変形量測定用固定治具と基板の側面図、
第1図(b)は変形量測定位置の説明図である。
Figure 1(a) is a side view of the fixture for measuring deformation and the board;
FIG. 1(b) is an explanatory diagram of the deformation measurement position.

(1)は固定治具、(2)は被測定用基板を示す。(1) shows a fixture, and (2) shows a substrate to be measured.

3−1〜3−8は変形量測定位置、ΔHは基板の端部に
おける変形量を示す。
3-1 to 3-8 are deformation measurement positions, and ΔH is the deformation amount at the edge of the substrate.

また、別に未処理基板と残りの処理基板を真空蒸着法に
より、ディスク検査機を用いてディスクグループをトラ
ッキングさせながら反射率の変化を電気信号に変換して
グループ面の変化を観察した。処理基板の反射信号は、
未処理基板と比較して有意差は認められなかった。第1
表は変形量の経時変化を示す表である。処理条件は45
℃、90%の雰囲気下で行なったn=8の平均値である
Separately, untreated substrates and remaining treated substrates were vacuum evaporated, and changes in the group surface were observed by tracking the disk group using a disk inspection machine and converting changes in reflectance into electrical signals. The reflected signal of the processing board is
No significant difference was observed compared to the untreated substrate. 1st
The table shows changes in deformation amount over time. Processing conditions are 45
It is an average value of n=8 conducted in an atmosphere of 90% Celsius.

第  1  図 比較例1 実施例1と同じ回転治具に取付けた直径300■のディ
スク基板を80℃のオーブンで30分処理したもの、お
よび60℃で2時間処理したもの−h−AI  Q  
kh −7” /−1m喜I  J−Jvf    詰
h44/T’+ 1t、 B514 HL+  +(−
4−きく、以下のテストに供することはできなかった。
Fig. 1 Comparative Example 1 A disk substrate with a diameter of 300 cm attached to the same rotating jig as in Example 1 was processed in an oven at 80°C for 30 minutes, and processed at 60°C for 2 hours - h-AI Q
kh -7" /-1m x I J-Jvf Tsume h44/T'+ 1t, B514 HL+ +(-
4- Listen, it could not be used for the following tests.

後者には0.3 on以下の小さい変形は発生したが、
1枚はそのまま、実施例1と同様に45℃、90%の恒
温恒湿槽に静置して変形量を測定した。24時間後の変
形量は”平均0.75 mm、7日後のそれはl、 3
 mmであった。もう1枚の処理基板にアルミ反射膜を
つけ、グループ面の反射信号を観察したが、トラッキン
グがかかりにくく、トラッキングのかかるところも、そ
の波形が乱れ、グループに何らかの変形を生じたことが
推定された。
Although a small deformation of less than 0.3 on occurred in the latter,
One sheet was left as it was in a constant temperature and humidity chamber at 45° C. and 90% as in Example 1, and the amount of deformation was measured. The amount of deformation after 24 hours was 0.75 mm on average, and after 7 days it was l, 3
It was mm. We attached an aluminum reflective film to another processing board and observed the reflected signal on the group surface, but it was difficult to track, and even in the areas where tracking was applied, the waveform was disturbed and it was presumed that some deformation occurred in the group. Ta.

第2図はグループ面の反射信号の波形を示す図面で、(
a)は未処理基板、(b)は60℃で2時間処理した基
板の波形を示している。
Figure 2 is a diagram showing the waveform of the reflected signal on the group plane.
(a) shows the waveform of an untreated substrate, and (b) shows the waveform of a substrate treated at 60° C. for 2 hours.

比較例2 25±0.5℃の恒温水槽に直径300履mのディスク
基板を72時間浸漬した。この時の吸水率は1.4%で
あった。この基板を実施例1と同様に45℃、90%の
恒温恒湿槽にffi地し、変形量を測定した。この変形
量の経時変化は未処理基板とはとんと差がなかった。
Comparative Example 2 A disk substrate with a diameter of 300 m was immersed in a constant temperature water bath at 25±0.5° C. for 72 hours. The water absorption rate at this time was 1.4%. This substrate was placed in a constant temperature and humidity chamber at 45° C. and 90% as in Example 1, and the amount of deformation was measured. The change in the amount of deformation over time was not significantly different from that of the untreated substrate.

実施例2 実施例1と同様に直径300■lのポリメチルメタクリ
レート成形基板を45℃、90%の恒温恒湿槽に静置し
、変形量を測定した。7日後の変形量は0.5mmであ
った。
Example 2 As in Example 1, a polymethyl methacrylate molded substrate with a diameter of 300 μl was placed in a constant temperature and humidity chamber at 45° C. and 90%, and the amount of deformation was measured. The amount of deformation after 7 days was 0.5 mm.

比較例3 実施例2において基板の処理時間を5時間とした以外は
全〈実施例2と同様に処理し、変形量を測定した。処理
後の吸水量は0.6%であり、7日後の変形量は2.1
 amであった。
Comparative Example 3 The entire process was carried out in the same manner as in Example 2 except that the processing time of the substrate was changed to 5 hours, and the amount of deformation was measured. The amount of water absorption after treatment is 0.6%, and the amount of deformation after 7 days is 2.1
It was am.

実施例3 実施例1で用いたと同じ樹脂材料を用いて直径200+
smのプリグループ付ディスク基板を成形し70℃、9
5%の環境下で1時間処理した。(なお、処理方法は実
施例1に準じて行なった。)処理された基板を55℃、
90%の恒温恒湿槽に固定静置し、変形量を測定したと
ころ7日後の変形量は0.5鵬鳳であった。同様にして
比較測定した未処理基板の変形量は2.6■層であった
Example 3 Using the same resin material as used in Example 1, a diameter of 200+
sm pre-grouped disc substrate was molded and heated at 70℃, 9
It was treated in a 5% environment for 1 hour. (The treatment method was carried out according to Example 1.) The treated substrate was heated at 55°C.
When the amount of deformation was measured after being fixed in a 90% constant temperature and humidity chamber, the amount of deformation after 7 days was 0.5 degrees. The amount of deformation of the untreated substrate, which was similarly measured for comparison, was 2.6 layers.

実施例4 ポリカーボネート樹脂(三菱化成工業社製ツバレックス
7020AD2)をシリンダ一温度355℃、全型温9
0℃で直径200mmのプリグループ付ディスク基板を
成形した。
Example 4 Polycarbonate resin (Tubarex 7020AD2 manufactured by Mitsubishi Chemical Industries, Ltd.) was heated to a cylinder temperature of 355°C and a total mold temperature of 9.
A disk substrate with a pregroup having a diameter of 200 mm was molded at 0°C.

この基板を75℃、90%で5時間処理した。This substrate was treated at 75° C. and 90% for 5 hours.

この処理基板を80℃、90%の雰囲気に固定静置して
変形量を測定した。24時間ごとの処理基板の変形量は
0.3■■以下であったが、未処理基板は0.9 m朧
した。
This treated substrate was fixed and left in an atmosphere of 80° C. and 90%, and the amount of deformation was measured. The amount of deformation of the treated substrate every 24 hours was 0.3■■ or less, but the untreated substrate became hazy by 0.9 m.

[発明の効果] 以上の実施例、比較例かられかるように、射出成形した
プラスチック基板を高湿下で、比較的低温で処理するこ
とにより寸法安定性に優れた基板を製造することができ
る。
[Effect of the invention] As can be seen from the above examples and comparative examples, a substrate with excellent dimensional stability can be manufactured by processing an injection molded plastic substrate under high humidity and at a relatively low temperature. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)は変形量測定用固定治具と基板の側面図、
第1図(b)は変形量測定位置の説明図。 第2図はグループ面の反射信号の波形を示す図面である
。 図において1は固定治具、2は測定用基板を示す。 第1図(a) 第1図(b) 罎。
Figure 1(a) is a side view of the fixture for measuring deformation and the board;
FIG. 1(b) is an explanatory diagram of the deformation measurement position. FIG. 2 is a drawing showing the waveform of the reflected signal on the group plane. In the figure, 1 indicates a fixing jig, and 2 indicates a measurement board. Figure 1 (a) Figure 1 (b).

Claims (1)

【特許請求の範囲】 1)熱可塑性樹脂を射出成形して基板を製造するに際し
、流動温度以上に加熱された熱可塑性樹脂を射出成形し
た後、該成形物を樹脂の熱変形温度より20℃以上低い
温度で高湿度下に、該成形物中の水分が平衡状態の40
%以上に達するまで保持することを特徴とする寸法安定
性に優れたプラスチック基板の製造法。 2)成形基板を高湿度下に保持するに際し、回転軸に取
り付けた成形基板または、成形基板または成形基板集積
体を該基板の半径方向が平面に対して垂直になるように
して回転することを特徴とする特許請求の範囲第1項記
載の寸法安定性に優れたプラスチック基板の製造法。 3)熱可塑性樹脂がポリメチルメタクリレートあるいは
メチルメタクリレート単位を70重量%以上含有するメ
チルメタクリレート系樹脂である特許請求の範囲第1項
または第2項記載の寸法安定性に優れたプラスチック基
板の製造法。 4)熱可塑性樹脂がポリカーボネート樹脂である特許請
求の範囲第1項または第2項記載の寸法安定性に優れた
プラスチック基板の製造法。
[Scope of Claims] 1) When producing a substrate by injection molding a thermoplastic resin, after injection molding the thermoplastic resin heated above the flow temperature, the molded product is heated to 20°C above the heat distortion temperature of the resin. When the moisture in the molded product is in an equilibrium state at a temperature lower than 40% and under high humidity,
A method for producing a plastic substrate with excellent dimensional stability, which is characterized by holding the substrate until it reaches % or more. 2) When holding the molded substrate under high humidity, rotate the molded substrate attached to the rotating shaft, the molded substrate, or the molded substrate assembly so that the radial direction of the substrate is perpendicular to the plane. A method for manufacturing a plastic substrate with excellent dimensional stability as set forth in claim 1. 3) The method for producing a plastic substrate with excellent dimensional stability according to claim 1 or 2, wherein the thermoplastic resin is polymethyl methacrylate or a methyl methacrylate resin containing 70% by weight or more of methyl methacrylate units. . 4) The method for producing a plastic substrate with excellent dimensional stability according to claim 1 or 2, wherein the thermoplastic resin is a polycarbonate resin.
JP19140085A 1985-08-30 1985-08-30 Manufacture of plastic substrate excellent in dimensional stability Pending JPS6251411A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19140085A JPS6251411A (en) 1985-08-30 1985-08-30 Manufacture of plastic substrate excellent in dimensional stability

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19140085A JPS6251411A (en) 1985-08-30 1985-08-30 Manufacture of plastic substrate excellent in dimensional stability

Publications (1)

Publication Number Publication Date
JPS6251411A true JPS6251411A (en) 1987-03-06

Family

ID=16273971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19140085A Pending JPS6251411A (en) 1985-08-30 1985-08-30 Manufacture of plastic substrate excellent in dimensional stability

Country Status (1)

Country Link
JP (1) JPS6251411A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005178361A (en) * 2003-11-28 2005-07-07 Mitsubishi Rayon Co Ltd Method for manufacturing plastic rod lens and method for manufacturing plastic rod lens array

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005178361A (en) * 2003-11-28 2005-07-07 Mitsubishi Rayon Co Ltd Method for manufacturing plastic rod lens and method for manufacturing plastic rod lens array

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