JPS63165434A - Optical disk and production thereof - Google Patents
Optical disk and production thereofInfo
- Publication number
- JPS63165434A JPS63165434A JP61309164A JP30916486A JPS63165434A JP S63165434 A JPS63165434 A JP S63165434A JP 61309164 A JP61309164 A JP 61309164A JP 30916486 A JP30916486 A JP 30916486A JP S63165434 A JPS63165434 A JP S63165434A
- Authority
- JP
- Japan
- Prior art keywords
- hydrocarbon group
- substrate
- aliphatic hydrocarbon
- carbon atoms
- optical disc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000011347 resin Substances 0.000 claims abstract description 40
- 229920005989 resin Polymers 0.000 claims abstract description 40
- 229920002492 poly(sulfone) Polymers 0.000 claims abstract description 23
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 16
- 238000001746 injection moulding Methods 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 66
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 125000002723 alicyclic group Chemical group 0.000 claims description 9
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000000463 material Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 14
- 239000004033 plastic Substances 0.000 description 14
- 229920003023 plastic Polymers 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 11
- 239000004417 polycarbonate Substances 0.000 description 10
- 239000004925 Acrylic resin Substances 0.000 description 7
- 229920000178 Acrylic resin Polymers 0.000 description 7
- 229920000515 polycarbonate Polymers 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 5
- 229920005668 polycarbonate resin Polymers 0.000 description 5
- 239000004431 polycarbonate resin Substances 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- -1 SiN Chemical class 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 239000005341 toughened glass Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 235000010893 Bischofia javanica Nutrition 0.000 description 1
- 240000005220 Bischofia javanica Species 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000012994 photoredox catalyst Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Polyethers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光ディスク及びその製造法に係り、特に光学的
歪みが小さく、しかも記録膜との密着性の良いプラスチ
ック製光ディスク及びその製造法7 に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an optical disc and a method for manufacturing the same, and particularly relates to a plastic optical disc with low optical distortion and good adhesion to a recording film, and a method for manufacturing the same. .
−mにビデオディスクやデジタルオーディオディスク等
の光ディスクの断面構造には、例えば特開昭59−17
8636号で開示されているエアーサンドインチ方式の
ものが存在する。-m, the cross-sectional structure of optical discs such as video discs and digital audio discs, for example,
There is an air sand inch method disclosed in No. 8636.
第2図は、その光ディスクの断面構造例を示す。FIG. 2 shows an example of the cross-sectional structure of the optical disc.
又、第3図の光ディスクの構成によれば、スペーサ24
を介して基板22が相対向配置され、この基板22同士
によって形成される空間内に基板22の双方の面に中間
膜(熱吸収膜ともいう)21、記録膜20及び保護膜2
3(図示せず)が形成されている。Further, according to the configuration of the optical disc shown in FIG. 3, the spacer 24
The substrates 22 are arranged facing each other with the substrates 22 interposed therebetween, and an intermediate film (also referred to as a heat absorption film) 21, a recording film 20, and a protective film 2 are formed on both surfaces of the substrates 22 in the space formed by the substrates 22.
3 (not shown) is formed.
光ディスクには、上記記録膜20の種類、性質などの違
いにより、また、レーザ光線等の熱エネルギーを用いて
記録膜に穴形成をおこなったり、記録膜の構造を変化さ
せたり、光磁気を用いることにより光の反射率を変化さ
せるなど数多くの方式のものが存在する。いずれの方式
においても、レーザ光線等の熱エネルギーを用いて再生
または記録および再生をおこなうものであることには相
違がない。Depending on the type and properties of the recording film 20, optical discs may be produced by forming holes in the recording film using thermal energy such as a laser beam, by changing the structure of the recording film, or by using magneto-optical technology. There are many methods for changing the reflectance of light. In either method, there is no difference in that reproduction or recording and reproduction is performed using thermal energy such as a laser beam.
中間膜21はニトロセルロース、ビスマス系化合物、ア
クリル樹脂SiN、 Sin、 Stow等で構成され
、熱が外部に逃げるのを防ぎレーザ光線の熱エネルギー
の変換効率を上げている。The interlayer film 21 is made of nitrocellulose, bismuth-based compounds, acrylic resins such as SiN, Sin, Stow, etc., and prevents heat from escaping to the outside, increasing the conversion efficiency of the thermal energy of the laser beam.
また、スペーサ24は金属あるいはプラスチックおよび
プラスチック複合材から構成されており、ギャップ調整
および中心駆動用軸とのマツチング等の機能を果たして
いる。Further, the spacer 24 is made of metal or plastic and a plastic composite material, and performs functions such as gap adjustment and matching with the center drive shaft.
書き換え可能な光ディスクの方式としては、結晶状態→
非晶状態と相変化する記録材料を利用する方式と光磁気
を利用する方式とがある0両方式の優劣はなかなかつけ
難いが、製品として登場するのは間近いと見られる。こ
れらの記録材料のうち、光磁気用の記録材料、例えばG
dTbPeGe又は、TbFeCo系の合金系の記録材
料を用いて書き込み、消去をくり返えすと、記録材料表
面温度は、瞬間的に250〜300℃に達すると言われ
ている。The method of rewritable optical discs is crystal state→
It is difficult to judge the superiority or inferiority of two methods: one uses a recording material that changes its phase to an amorphous state, and the other uses magneto-optical technology, but it seems likely that a commercial product will appear soon. Among these recording materials, magneto-optical recording materials, such as G
It is said that when writing and erasing are repeated using a dTbPeGe or TbFeCo alloy recording material, the surface temperature of the recording material instantaneously reaches 250 to 300°C.
上記基板22は、ビデオディスクの場合には一般にPM
MA等のアクリル樹脂で構成され、オーディオディスク
の場合は一般にpc樹脂(ポリカーボネート樹脂)もし
くはPMMAで構成され、さらに追記可能型ディスクの
場合には一般にPMMA、pc樹脂もしくは強化ガラス
で構成されている。しかし、上記基板材料は一長一短が
あり、強化ガラスは長期の信頼性において優れているが
比重が高くコストがかさむという問題点がある。また、
プラスチック基板では比重が低く、コストが安い一方で
耐熱性が低く、しかも吸湿性が高いため、長期の信頼性
が劣っているという問題がある。In the case of a video disc, the substrate 22 is generally a PM
It is made of acrylic resin such as MA, audio discs are generally made of PC resin (polycarbonate resin) or PMMA, and write-once discs are generally made of PMMA, PC resin, or tempered glass. However, the above-mentioned substrate materials have advantages and disadvantages, and although tempered glass is excellent in long-term reliability, it has a problem of high specific gravity and high cost. Also,
Although plastic substrates have a low specific gravity and are inexpensive, they have low heat resistance and high moisture absorption, resulting in poor long-term reliability.
例えばアクリル樹脂系の基板では、複屈折性は良好であ
る一方で、耐熱性が低く、吸湿性が大きく、衝撃強度等
が劣っている。また、近年アクリル樹脂メーカで研究、
試作等が盛んに行われ、超耐熱アクリル樹脂が開発され
ているが、耐熱性は従来のアクリル樹脂に比べて向上は
しているが、吸湿性および衝撃強度等はほとんど改良さ
れていない。For example, an acrylic resin substrate has good birefringence, but has low heat resistance, high moisture absorption, and poor impact strength. In addition, in recent years, research at acrylic resin manufacturers,
Many prototypes have been made, and super heat-resistant acrylic resins have been developed, but although the heat resistance has improved compared to conventional acrylic resins, there has been little improvement in hygroscopicity, impact strength, etc.
一方、pc樹脂では、分子量を下げ、流動性を向上させ
ることにより複屈折性に若干問題は残すものの吸湿性お
よび衝撃強度等は良好であり、再生専用および追記可能
型のディスク基板としてほぼ問題ないと言われている。On the other hand, with PC resin, by lowering the molecular weight and improving fluidity, although there are some problems with birefringence, moisture absorption and impact strength are good, and there are almost no problems as a playback-only or write-once disk substrate. It is said that
しかし、光ディスクの種類が現在の再生専用、追記可能
型に加えて、書き換えタイプへと進むにつれて多くの新
しい記録材料が開発されつつある。これらの書き換えタ
イプの光ディスクの場合は、レーザ光線による記録、再
生時に基板表面は、かなりの高温になること及び記録膜
そのものがかなり厚くなることもあり、記録膜と基板と
の密着性も問題となる。又、光ディスクのエラーレート
がIQ−1を以下を目標としている等のため、さらに光
学的歪の小さいもの、すなわち低複屈折性であるととも
に耐熱性もより高く、しかも記録膜との密着性の良いプ
ラスチック基板が要求されるようになってきている。こ
のため、ポリカーボネート以外にも化学構造の主鎖に芳
香環を含む耐熱透明材料を光デイスク用プラスチック基
板に適用する試みが一部見うけられる。However, many new recording materials are being developed as the types of optical discs move from the current read-only and write-once types to rewritable types. In the case of these rewritable optical discs, the surface of the substrate becomes quite hot during recording and reproduction using a laser beam, and the recording film itself can become quite thick, so the adhesion between the recording film and the substrate is also a problem. Become. In addition, since the error rate of optical discs is targeted to be less than IQ-1, it is necessary to use discs with even lower optical distortion, that is, lower birefringence, higher heat resistance, and better adhesion to the recording film. There is a growing demand for high-quality plastic substrates. For this reason, some attempts have been made to apply heat-resistant transparent materials other than polycarbonate, which contain an aromatic ring in the main chain of their chemical structure, to plastic substrates for optical disks.
しかし、これらの耐熱透明材料は、耐熱性及び記録膜と
の密着性はほぼ良好であるが、これらの材料を用いて射
出成形法でディスク基板を作ると、光学歪、すなわち、
複屈折性が大きい問題が残る。However, although these heat-resistant transparent materials have almost good heat resistance and adhesion to the recording film, when a disk substrate is made by injection molding using these materials, optical distortion, that is,
The problem of large birefringence remains.
また、特開昭61−55117号のように、耐熱性と複
屈折性が改良されたポリカーボネート樹脂組成物を用い
てディスク基板を製造する方法が紹介されている。これ
らのポリカーボネート組成物で成形したディスク基板の
耐熱性とりタープ−ジョンは良好であるが、この基板を
用いて光ディスクを製造すると記録膜とディスク基板と
の密着性が悪(寿命がほとんど無いという問題がある。Further, as in JP-A-61-55117, a method for manufacturing a disk substrate using a polycarbonate resin composition with improved heat resistance and birefringence has been introduced. Disk substrates molded from these polycarbonate compositions have good heat resistance and tarpaulin, but when optical disks are manufactured using these substrates, there is a problem of poor adhesion between the recording film and the disk substrate (almost no lifespan). There is.
この基板及びその他のポリカーボネート系樹脂組成物で
成形した基板に関し、記録膜と基板との間に各種の中間
膜をスパッタして種々検討を加えたがいずれも同様な結
果が得られた。尚、記録膜と基板との密着性は、記録膜
の種類によっても差があるが、特にGdTbFeGe及
びTbFeCo等の合金系の記録膜を用いた時特に密着
性が悪く、光ディスクとして寿命がほとんど無かった。Regarding this substrate and other substrates molded from polycarbonate resin compositions, various studies were conducted by sputtering various intermediate films between the recording film and the substrate, but similar results were obtained in all cases. Although the adhesion between the recording film and the substrate varies depending on the type of recording film, the adhesion is particularly poor when using an alloy-based recording film such as GdTbFeGe and TbFeCo, and the optical disc has almost no lifespan. Ta.
本発明の目的は、耐熱性に優れ、光学的歪みが小さく、
しかも寿命の長い光ディスクを得ることである。The purpose of the present invention is to have excellent heat resistance, low optical distortion,
Moreover, the objective is to obtain an optical disk with a long life.
本発明者らは鋭意検討を重ねた結果、特定のポリスルホ
ン樹脂を基板の樹脂成分として用いることにより、耐熱
性に優れ、光学歪の小さい、しかも記録膜との密着性が
良いため寿命の長い光ディスクを製造することができる
ことを見い出し、上記従来技術の問題点を解決した。As a result of extensive studies, the inventors of the present invention found that by using a specific polysulfone resin as the resin component of the substrate, optical disks with excellent heat resistance, low optical distortion, and good adhesion with the recording film have a long life. We have discovered that it is possible to produce a 100% polyurethane resin, and have solved the problems of the prior art described above.
すなわち、前記目的は、光デイスク用基板の樹脂成分と
して、下記一般式(I)で示されるポリスルホン系材料
を用いることによって達成される。That is, the above object is achieved by using a polysulfone material represented by the following general formula (I) as the resin component of the optical disk substrate.
一般式(1)
%式%
上記式中Xは、水素原子、炭素数1〜6の脂肪族炭化水
素基、芳香族炭化水素基または脂環族炭化水素基であり
、Yは、水素原子、炭素数1〜6の脂肪族炭化水素基、
芳香族炭化水素基または脂環族炭化水素基であり、Zお
よびWは水素原子または炭素数1〜6の脂肪族炭化水素
基である。ただし、X、Z及びWが水素原子である場合
、又はXがメチル基で2及びWが水素原子である場合、
Yは炭素数2〜6の脂肪族炭化水素基、芳香族炭化水素
基、又は脂環族炭化水素基である。General formula (1) % formula % In the above formula, X is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 6 carbon atoms, an aromatic hydrocarbon group, or an alicyclic hydrocarbon group, and Y is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 6 carbon atoms,
It is an aromatic hydrocarbon group or an alicyclic hydrocarbon group, and Z and W are a hydrogen atom or an aliphatic hydrocarbon group having 1 to 6 carbon atoms. However, when X, Z and W are hydrogen atoms, or when X is a methyl group and 2 and W are hydrogen atoms,
Y is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an alicyclic hydrocarbon group having 2 to 6 carbon atoms.
本発明で用いるポリスルホン樹脂は、特公昭42−77
99の実施例3等に準じて製造することができる。The polysulfone resin used in the present invention is
It can be manufactured according to Example 3 of No. 99.
本発明の一般式(1)のポリスルホン樹脂を用いて射出
成形方法でディスク基板を製造すると、溶融樹脂の粘度
が一般のポリスルホン樹脂より、高いにもかかわらず、
樹脂の光弾性定数が小さいため冷却過程中に応力緩和を
生じ、得られたディスク基板の光学歪、すなわち複屈折
性が小さくなる。When a disk substrate is manufactured by an injection molding method using the polysulfone resin of the general formula (1) of the present invention, although the viscosity of the molten resin is higher than that of general polysulfone resin,
Since the photoelastic constant of the resin is small, stress relaxation occurs during the cooling process, and the optical strain, ie, birefringence, of the obtained disk substrate becomes small.
しかし、ディスク基板の複屈折性は、射出成形条件によ
っても変化するため、本発明のポリスルホン樹脂の射出
成形条件は、シリンダ温度370℃以上、金型温度13
0℃以上が好ましい。より好ましくはシリンダ温度40
0℃以上、金型温度140℃以上である。However, since the birefringence of the disk substrate also changes depending on the injection molding conditions, the injection molding conditions for the polysulfone resin of the present invention are: cylinder temperature 370°C or higher, mold temperature 13°C.
The temperature is preferably 0°C or higher. More preferably cylinder temperature 40
The temperature is 0°C or higher, and the mold temperature is 140°C or higher.
本発明に用いられるポリスルホンW*の耐熱性は、ガラ
ス転位温度で155℃以上が好ましい、また構造単位の
くり返し数、nは機械的強度及び樹脂の流動性から考え
て6G−80が好ましい0本発明のポリスルホン樹脂(
一般式〔■〕)と、一般式(1)以外のポリスルホン樹
脂を適宜混合させても良いが、溶融流動性、光弾性定数
との双方を考慮して本発明のポリスルホン樹脂が15〜
106重量%含まれていることが望ましい。The heat resistance of the polysulfone W* used in the present invention is preferably 155°C or higher in terms of glass transition temperature, and the number of repeating structural units, n, is preferably 6G-80 from the viewpoint of mechanical strength and resin fluidity. Inventive polysulfone resin (
Although the general formula [■]) and a polysulfone resin other than the general formula (1) may be appropriately mixed, considering both melt fluidity and photoelastic constant, the polysulfone resin of the present invention is
It is desirable that the content be 106% by weight.
上記本発明の構成において、基板はレーザ光線によって
記録、再生をおこなうため、例えば1.2−の基板にお
いて8094以上(827m−で測定)の透過率が必要
である。透過率としては、好ましくは90%以上である
。透過率が80%以下になると損失が太き(なるために
、使用する半導体レーザのパワーを太き(しなければな
らない、従って、エネルギー的に不利になる。In the above structure of the present invention, since the substrate performs recording and reproduction using a laser beam, a transmittance of 8094 or more (measured at 827 m-) is required for a substrate of, for example, 1.2-. The transmittance is preferably 90% or more. When the transmittance is less than 80%, the loss increases, so the power of the semiconductor laser used must be increased, which is disadvantageous in terms of energy.
上記本発明に係る光ディスクにおいて、中間層ををする
場合には前述したニトロセルロースやS■。In the optical disc according to the present invention, when the intermediate layer is formed, the above-mentioned nitrocellulose or S2 is used.
Sin、 5303.ビスマス系化合物、アクリル樹脂
等の他に記録膜の種類および基板材料との組合せで相性
の良い中間層を用いることができる。Sin, 5303. In addition to bismuth-based compounds, acrylic resins, and the like, an intermediate layer that is compatible with the type of recording film and substrate material can be used.
実際にディスクを作る場合には、ディスク表面の耐摩耗
性を向上させるため、表面にハードコート等を施す必要
があり、使用条件および基板との相性を考えてA 1
toss SlO+ 5to1. Ti0g+ ZrO
冨または有機高分子等のハードコートを適用することが
できる。When actually making a disk, it is necessary to apply a hard coat etc. to the disk surface in order to improve its wear resistance.
toss SlO+ 5to1. Ti0g+ ZrO
A hard coat such as a rich or organic polymer can be applied.
光ディスクのプラスチック基板に特に要求される特性の
中に、リターデーシッン(光学歪)と記録膜との密着性
とがある。また、ポリカーボネー)11m及びポリスル
ホン樹脂とも一般に市販されているものは、以下に示す
ビスフェノール八を片方の出発原料としている。Among the properties particularly required of plastic substrates for optical discs are retardation (optical distortion) and adhesion with recording films. In addition, both polycarbonate 11m and polysulfone resin, which are generally commercially available, use bisphenol 8 shown below as a starting material for one of them.
5Is
l)リターデーシ廖ンの改良
主鎖中に芳香環(ベンゼン環)を有する材料(一般のポ
リカーボネートあるいはポリスルホン樹脂)は、射出成
形を行うと、流れ方向に芳香環が層状にならぶため光学
的に異方性になり、このためリターデーシ雷ンが大きく
なると考えられている。5Is l) Improvement of retardation When materials with aromatic rings (benzene rings) in the main chain (general polycarbonate or polysulfone resins) are injection molded, the aromatic rings are arranged in layers in the flow direction, resulting in optical problems. It is thought that this makes it anisotropic, which increases the retardation.
そこで、上記ビスフェノールAの中央炭素の上。Therefore, above the central carbon of bisphenol A.
下のメチル基(CBa)の一方、あるいは両方を炭素数
2以上の脂肪族炭化水素基、芳香環、あるいは脂環族炭
化水素等で置き換えることにより、また、ビスフェノー
ルへの左右の芳香環に脂肪族炭化水素を置換させること
により、各七ツマ一単位の分極率が変化し、応力印加時
のモノマ一単位の配向による配向複屈折を少なくできる
ためプラスチック基板のりターデージ曽ンを下げること
ができると推論した。By replacing one or both of the methyl groups (CBa) below with an aliphatic hydrocarbon group having 2 or more carbon atoms, an aromatic ring, or an alicyclic hydrocarbon, it is also possible to add aliphatic to the left and right aromatic rings of bisphenol. By substituting group hydrocarbons, the polarizability of each monomer unit changes, and the orientational birefringence due to the orientation of monomer units when stress is applied can be reduced, making it possible to lower the adhesive strength of the plastic substrate. reasoned.
2)記録膜との密着性の改良
光ディスクのプラスチック基板に記録膜をスパッタする
工程としては、まず、基板の上にSiN等の中間膜をス
パッタし、その上に記録膜をスパッタする。このため、
基板の記amとの密着性は、この基板とSiN等の密着
性による。2) Improving Adhesion with Recording Film In the process of sputtering a recording film onto a plastic substrate of an optical disc, first, an intermediate film such as SiN is sputtered onto the substrate, and then a recording film is sputtered onto it. For this reason,
The adhesion between the substrate and the memory depends on the adhesion between the substrate and SiN or the like.
ポリカーボネート樹11基板にSiNをスパッタし、更
に記録膜をスパッタする場合、スバフタ条件をいろいろ
変えても密着性が悪かった。そこで、ブスパッタする場
合、SiNの一部がイオン化し、極性基をもったものが
発生し、これが、極性の強いポリスルホン樹脂基板に化
学的に結合するため強固に密着すると推論した。When sputtering SiN onto a polycarbonate tree 11 substrate and then sputtering a recording film, the adhesion was poor even when the buffing conditions were varied. Therefore, in the case of bus sputtering, a part of the SiN is ionized and a substance having a polar group is generated, which is chemically bonded to the highly polar polysulfone resin substrate, so that it adheres firmly.
以上、l)、2)の推論から実施例を見れば明らかなよ
うに一般式(1)のポリスルホン樹脂を用いればリター
デーシ四ンが小さく、しかも記録膜との密着性の良い光
デイスク用プラスチック基板を得ることができた。As is clear from the above inferences 1) and 2) and looking at the examples, if the polysulfone resin of general formula (1) is used, the retardation will be small and the plastic substrate for optical disks will have good adhesion to the recording film. was able to obtain.
000社出願の特公昭42−7799の実施例3および
1G、更にこれらに準じて下記の2価フェノールを用い
て本発明の一般式(1)に該当するポリスルホン樹脂を
得た。A polysulfone resin corresponding to the general formula (1) of the present invention was obtained using Examples 3 and 1G of Japanese Patent Publication No. 42-7799 filed by 000 Co., Ltd. and the following dihydric phenol.
得られた樹脂の構造式を第1表の1lhl〜15に示す
。また、同様に特公昭42−7799の実施例1. 5
に準じてポリスルホン樹脂を得た。得られた樹脂の構造
式を第1表のNa16.17に示す。The structural formulas of the obtained resins are shown in Table 1, 1lhl to 15. Similarly, Example 1 of Japanese Patent Publication No. 42-7799. 5
Polysulfone resin was obtained according to . The structural formula of the obtained resin is shown in Na16.17 in Table 1.
実施例1
第1表の阻1のポリスルホン樹脂の溶融粘度を測定し、
溶融粘度が500ポイズになる温度を第1表に示した。Example 1 The melt viscosity of polysulfone resin No. 1 in Table 1 was measured,
Table 1 shows the temperature at which the melt viscosity becomes 500 poise.
尚、溶融粘度の測定は高化式フローテスタで行った。こ
の溶融粘度の値を参考にして、シリンダ温度430℃、
金型温度140℃とし、住友重機械工業製ネスクールS
−165/75型射出成形機を用い、厚さ1.2 M、
φ130の溝付ディスク基板を成形した。得られたディ
スク基板の光学的歪を調べるため、情況光学製DVA
36 LS型エリプソメータを用いてリターデーション
を測定し、第1表に示した。また、引張試験片に荷重を
段階的にかけ、同様にエリプソメータでリターデーショ
ンを測定し、計算により光弾性定数を求め第1表に示し
た。The melt viscosity was measured using a Koka type flow tester. Based on this melt viscosity value, the cylinder temperature is 430℃,
The mold temperature was set to 140°C, and Necool S manufactured by Sumitomo Heavy Industries was used.
- Using a 165/75 type injection molding machine, thickness 1.2 M,
A grooved disk substrate of φ130 was molded. In order to examine the optical distortion of the obtained disk substrate, we used a DVA manufactured by Shotō Kogaku.
Retardation was measured using a 36 LS ellipsometer and is shown in Table 1. In addition, a load was applied stepwise to the tensile test piece, the retardation was similarly measured using an ellipsometer, and the photoelastic constant was calculated and shown in Table 1.
更に得られたディスク基板を用いて真空理工型T?’1
A−1500型熱物理試験器により耐熱性の指針として
ガラス転位温度(Tg )を求めあわせて第1表に示し
た。次に、このディスク基板を超音波つき界面活性剤水
溶液洗浄槽、超音波つき超純水洗浄槽等の各種洗浄槽を
順々に通過させ、洗浄後70〜120℃で減圧度(10
−2〜10−sa1g)で10〜30時間加熱し充分乾
燥する。その後、スパッタ装置内で第2図に示すように
、中間膜(SiOz) *記録膜(TbPeCo) 、
保護膜(SiN)を順々に形成し、更にエポキシ系の接
着剤を用いて上で形成した記録膜付プラスチック基板を
スペーサをかいして貼り合わせて光ディスクを製造した
。Furthermore, the obtained disk substrate was used to create a Vacuum Riko type T? '1
The glass transition temperature (Tg) was determined as a guideline for heat resistance using a thermophysical tester model A-1500 and is shown in Table 1. Next, this disk substrate is sequentially passed through various cleaning tanks such as a surfactant aqueous solution cleaning tank with ultrasonic waves and an ultrapure water cleaning tank with ultrasonic waves, and after cleaning, the degree of vacuum (10
-2 to 10-sa (1 g) for 10 to 30 hours and thoroughly dried. Thereafter, as shown in FIG. 2 in the sputtering device, an intermediate film (SiOz) *recording film (TbPeCo),
A protective film (SiN) was sequentially formed, and then the plastic substrate with the recording film formed above was bonded to the film using an epoxy adhesive using a spacer to produce an optical disc.
このような光ディスクの製法によれば、ディスクの軽量
化を図ることができ、更に射出成形方法で成形ができる
ためディスク基板の製造コストも安くなり、スペーサの
一体化も可能性があり、経済性、簡略化にすぐれたもの
となる。According to this method of manufacturing an optical disk, it is possible to reduce the weight of the disk, and since the disk can be molded using an injection molding method, the manufacturing cost of the disk substrate is also low, and it is possible to integrate the spacer, making it economical. , which is excellent in simplification.
この光ディスクをドライブにかけC/N比(信号出力と
雑音出力の比であるSN比の1種)の測定を行い、結果
を第1表に示した。又、光ディスクの寿命の簡易評価法
として、60℃/95%RHの環境下に先に作製した記
録膜付プラスチック基板を保管後取り出し、室温で記録
膜の反射率を測定し、光反射率が70%になった時点を
寿命とした。これらの結果を第1図に示す。This optical disk was driven and the C/N ratio (a type of S/N ratio that is the ratio of signal output to noise output) was measured, and the results are shown in Table 1. In addition, as a simple method for evaluating the lifespan of an optical disk, the plastic substrate with a recording film prepared previously in an environment of 60°C/95% RH is taken out after storage, and the reflectance of the recording film is measured at room temperature. The time when it reached 70% was defined as the life span. These results are shown in FIG.
実施例2〜15
基板材料として第1表の隘2〜15を用いた他は、実施
例1と同様に行った。それらの結果を第1表に示す。Examples 2 to 15 The same procedure as in Example 1 was carried out except that boxes 2 to 15 in Table 1 were used as the substrate material. The results are shown in Table 1.
比較例1. 2
基板材料として第1表のNa15.17を用いた他は実
施例1と同様に行った。それらの結果を第1表に示す。Comparative example 1. 2 The same procedure as in Example 1 was conducted except that Na15.17 shown in Table 1 was used as the substrate material. The results are shown in Table 1.
比較例3.4
基板材料として特開昭61−55117に記載されてい
るような高耐熱、低複屈性ポリカーボネート系材料及び
奇人化成製ポリカーボネート樹脂八〇−5503を用い
た他は実施例1と同様に行った。Comparative Example 3.4 Same as Example 1 except that a high heat resistant, low birefringence polycarbonate material as described in JP-A No. 61-55117 and polycarbonate resin 80-5503 manufactured by Kijin Kasei were used as the substrate material. I did the same.
第1表によれば、実施例1〜15の基板材料で成形した
ディスク基板によって製造された光ディスクのC/N比
は、50〜57dBと非常に良い値となった。これは実
施例1〜15に用いた樹脂の流動性は比較例1.2の樹
脂に比べて若干低下するが、光弾性定数が小さいため、
樹脂の流動過程中に応力緩和が生じ、得られたディスク
基板のりタープ−ジョンが小さくなったためC/N比が
向上したと考えられる。しかも、第1図より明らかなよ
うにこれらのプラスチック基板と記録膜との密着性が良
いために、60℃/95%RHという環境下で5X10
!時間以上と寿命が非常に長(なった。According to Table 1, the C/N ratios of the optical discs manufactured using the disc substrates molded from the substrate materials of Examples 1 to 15 were very good values of 50 to 57 dB. This is because although the fluidity of the resins used in Examples 1 to 15 is slightly lower than that of the resin of Comparative Example 1.2, the photoelastic constant is small.
It is thought that stress relaxation occurred during the flow process of the resin, and the resulting disk substrate paste turpion became smaller, resulting in an improvement in the C/N ratio. Moreover, as is clear from Fig. 1, the adhesion between these plastic substrates and the recording film is good, so the 5X10
! It has a very long lifespan (over an hour).
これらに反して、比較例1.2は、寿命は実施例1〜1
5と同様に長いが、実施例に比べて、いずれも光弾性定
数が大きいため、溶融樹脂の応力緩和がしすらいためデ
ィスク基板のりタープ−ジョンが大きくなり、光ディス
クのC/N比が小さくなったものと推定される。比較例
3は、光弾性定数が小さいため、また比較例4は、溶融
粘度が低いため基板のりタープ−ジョンが小さくなり、
このため光ディスクのClN比は実施例1〜15に近い
値が得られた。しかし、比較3.4のポリカーボネート
系のディスク基板は、記録膜の密着性が悪いため寿命は
、24時間、36時間と短かくなった。On the contrary, Comparative Example 1.2 has a lifespan similar to that of Examples 1 to 1.
Although they are long like No. 5, they all have a larger photoelastic constant compared to the example, so the stress relaxation of the molten resin is slow, so the disk substrate paste turbulence becomes large, and the C/N ratio of the optical disk becomes small. It is estimated that the Comparative Example 3 has a small photoelastic constant, and Comparative Example 4 has a low melt viscosity, so the tarpsion of the substrate is small.
Therefore, the ClN ratio of the optical disc was close to that of Examples 1 to 15. However, the lifespan of the polycarbonate disk substrate of Comparative 3.4 was shortened to 24 hours and 36 hours due to poor adhesion of the recording film.
尚、これらポリカーボネート系樹脂基板について、UV
処理、オゾン処理等で基板表面の活性化処理を行ったが
いずれも寿命の改良には至らなかった。Furthermore, regarding these polycarbonate resin substrates, UV
Although the substrate surface was activated by treatment, ozone treatment, etc., none of them resulted in an improvement in life.
(本頁以下余白)
〔発明の効果〕
以上説明したように、本発明のポリスルホン樹脂を用い
た光ディスクは、耐熱性に優れており、光学歪が小さい
ので記録および再生時にエラーが生じるおそれが少なく
、しかも基板と記録膜との密着性が改良されるためディ
スクの寿命が長くなる。(Margins below this page) [Effects of the Invention] As explained above, the optical disc using the polysulfone resin of the present invention has excellent heat resistance and low optical distortion, so there is little risk of errors occurring during recording and playback. Moreover, since the adhesion between the substrate and the recording film is improved, the life of the disk is extended.
第1図は、本発明による記録膜付光ディスク基板の寿命
曲線、第2図は、光ディスクの断面構造図、第3図は、
エアーサンドインチ方式の光ディスクの断面構造図であ
る。
1・・・実施例1のデータ、2・・・実施例2のデータ
、3・・・実施例3のデータ、4・・・実施例4のデー
タ、5・・・実施例5のデータ、6・・・実施例6のデ
ータ、7・・・実施例7のデータ、8・・・実施例8の
データ、9・・・実施例9のデータ、10・・・実施例
10のデータ、11・・・実施例11のデータ、12・
・・実施例12のデータ、13・・・実施例13のデー
タ、14・・・実施例14のデータ、15・・・実施例
15のデータ、16・・・比較例1のデータ、17・・
・比較例2のデータ、18・・・比較例3のデータ、1
9・・・比較例4のデータ、20・・・記録膜、21・
・・中間膜、22・・・プラスチック基板、23・・・
保護膜、24・・・スペーサ。FIG. 1 is a lifespan curve of an optical disk substrate with a recording film according to the present invention, FIG. 2 is a cross-sectional structural diagram of the optical disk, and FIG. 3 is a
FIG. 2 is a cross-sectional structural diagram of an air sand inch optical disc. 1... Data of Example 1, 2... Data of Example 2, 3... Data of Example 3, 4... Data of Example 4, 5... Data of Example 5, 6... Data of Example 6, 7... Data of Example 7, 8... Data of Example 8, 9... Data of Example 9, 10... Data of Example 10, 11...Data of Example 11, 12.
...Data of Example 12, 13...Data of Example 13, 14...Data of Example 14, 15...Data of Example 15, 16...Data of Comparative Example 1, 17.・
・Data of Comparative Example 2, 18...Data of Comparative Example 3, 1
9... Data of Comparative Example 4, 20... Recording film, 21.
...Intermediate film, 22...Plastic substrate, 23...
Protective film, 24...spacer.
Claims (1)
一般式〔 I 〕で示されるポリスルホン系樹脂を含有す
る樹脂から構成されることを特徴とする光ディスク。 一般式〔 I 〕 ▲数式、化学式、表等があります▼。 n=60〜80 上記式中Xは、水素原子、炭素数1〜6の脂肪族炭化水
素基、芳香族炭化水素基または脂環族炭化水素基であり
、Yは、水素原子、炭素数1〜6の脂肪族炭化水素基、
芳香族炭化水素基または脂環族炭化水素基であり、Zお
よびWは水素原子または炭素数1〜6の脂肪族炭化水素
基である、ただし、X、Z及びWが水素原子である場合
、又はXがメチル基でZ及びWが水素原子である場合、
Yは炭素数2〜6の脂肪族炭化水素基、芳香族炭化水素
基、又は脂環族炭化水素基である。 2、基板が、一般式〔 I 〕で示されるポリスルホン系
樹脂を15〜100重量%含有する樹脂から構成される
ことを特徴とする特許請求の範囲第1項記載の光ディス
ク。 3、基板を有する光ディスクを製造する方法において、
下記一般式〔 I 〕で示されるポリスルホン樹脂を含有
する樹脂をシリンダ温度370℃以上、金型温度130
℃以上で射出成形することによって基板を製造すること
を特徴とする光ディスクの製造方法。 一般式〔 I 〕 ▲数式、化学式、表等があります▼ n=60〜80 上記式中Xは、水素原子、炭素数1〜6の脂肪族炭化水
素基、芳香族炭化水素基または脂環族炭化水素基であり
、Yは、水素原子、炭素数1〜6の脂肪族炭化水素基、
芳香族炭化水素基または脂環族炭化水素基であり、Zお
よびWは水素原子または炭素数1〜6の脂肪族炭化水素
基である、ただし、X、Z及びWが水素原子である場合
、又はXがメチル基でZ及びWが水素原子である場合、
Yは炭素数2〜6の脂肪族炭化水素基、芳香族炭化水素
基、又は脂環族炭化水素基である。[Scope of Claims] 1. An optical disc having a substrate, characterized in that the substrate is made of a resin containing a polysulfone resin represented by the following general formula [I]. General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼. n = 60 to 80 In the above formula, X is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 6 carbon atoms, an aromatic hydrocarbon group, or an alicyclic hydrocarbon group, and Y is a hydrogen atom, ~6 aliphatic hydrocarbon groups,
is an aromatic hydrocarbon group or an alicyclic hydrocarbon group, and Z and W are hydrogen atoms or aliphatic hydrocarbon groups having 1 to 6 carbon atoms, provided that when X, Z and W are hydrogen atoms, Or when X is a methyl group and Z and W are hydrogen atoms,
Y is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an alicyclic hydrocarbon group having 2 to 6 carbon atoms. 2. The optical disc according to claim 1, wherein the substrate is made of a resin containing 15 to 100% by weight of a polysulfone resin represented by the general formula [I]. 3. In a method of manufacturing an optical disc having a substrate,
A resin containing a polysulfone resin represented by the following general formula [I] was heated at a cylinder temperature of 370°C or higher and a mold temperature of 130°C.
A method of manufacturing an optical disc, characterized in that a substrate is manufactured by injection molding at a temperature of ℃ or higher. General formula [I] ▲ Numerical formulas, chemical formulas, tables, etc. are available ▼ n = 60 to 80 In the above formula, X is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 6 carbon atoms, an aromatic hydrocarbon group, or an alicyclic group A hydrocarbon group, Y is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 6 carbon atoms,
is an aromatic hydrocarbon group or an alicyclic hydrocarbon group, and Z and W are hydrogen atoms or aliphatic hydrocarbon groups having 1 to 6 carbon atoms, provided that when X, Z and W are hydrogen atoms, Or when X is a methyl group and Z and W are hydrogen atoms,
Y is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an alicyclic hydrocarbon group having 2 to 6 carbon atoms.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61309164A JPS63165434A (en) | 1986-12-27 | 1986-12-27 | Optical disk and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61309164A JPS63165434A (en) | 1986-12-27 | 1986-12-27 | Optical disk and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63165434A true JPS63165434A (en) | 1988-07-08 |
Family
ID=17989698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61309164A Pending JPS63165434A (en) | 1986-12-27 | 1986-12-27 | Optical disk and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63165434A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4913949A (en) * | 1987-07-29 | 1990-04-03 | Basf Aktiengesellschaft | Planar, multilayered, laser-optical recording material |
JPH02107414A (en) * | 1988-10-18 | 1990-04-19 | Hitachi Ltd | Optical disk and manufacture thereof |
-
1986
- 1986-12-27 JP JP61309164A patent/JPS63165434A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4913949A (en) * | 1987-07-29 | 1990-04-03 | Basf Aktiengesellschaft | Planar, multilayered, laser-optical recording material |
JPH02107414A (en) * | 1988-10-18 | 1990-04-19 | Hitachi Ltd | Optical disk and manufacture thereof |
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