JPH0330881A - Washing apparatus - Google Patents
Washing apparatusInfo
- Publication number
- JPH0330881A JPH0330881A JP16630489A JP16630489A JPH0330881A JP H0330881 A JPH0330881 A JP H0330881A JP 16630489 A JP16630489 A JP 16630489A JP 16630489 A JP16630489 A JP 16630489A JP H0330881 A JPH0330881 A JP H0330881A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- processing chamber
- solvent
- processing
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005406 washing Methods 0.000 title claims abstract description 30
- 239000002904 solvent Substances 0.000 claims abstract description 65
- 230000007246 mechanism Effects 0.000 claims abstract description 53
- 238000004140 cleaning Methods 0.000 claims description 103
- 238000012545 processing Methods 0.000 claims description 89
- 238000004891 communication Methods 0.000 claims description 19
- 239000003463 adsorbent Substances 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 20
- 239000007788 liquid Substances 0.000 abstract description 10
- 239000007789 gas Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 9
- 238000013020 steam cleaning Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 239000011538 cleaning material Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000002156 adsorbate Substances 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は洗浄装置に係るものであって、機械部品、電子
部品、医療用具その他種々の被洗浄物を液洗浄または蒸
気洗浄した後、被洗浄物に付着した溶剤を外部に拡散す
る事なく、確実に処理する事を目的とするとともに被洗
浄物に付着した湿気や、被洗浄物を洗浄装置に収納する
ときに流入する外気の湿気を洗浄作業前に除去すること
を目的としたものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a cleaning device, which cleans mechanical parts, electronic parts, medical instruments, and various other objects by liquid or steam cleaning. The purpose is to reliably dispose of the solvent that adheres to the object without dispersing it to the outside, and also removes moisture adhering to the object to be cleaned and moisture from the outside air that flows in when the object is stored in the cleaning equipment. It is intended to be removed before.
従来の技術
従来被洗浄物を載置する洗浄台を、移動機構に接続して
位置移動自在に形成したものには、実公昭５９−２８７
１４号公報記載の考案が存在するが、洗浄作業の完了し
た被洗浄物は、洗浄槽から外部に持ち出された後に、被
洗浄物に付着した溶剤を、別個に設けた処理装置で乾燥
処理することが行われている。そのため、乾燥処理に多
くの手数を要するばかりでなく、処理装置に移動すると
きに外気と接触し、溶剤がトリクロルエチレン、トリク
ロロトリフルオロエタン等の大気中への拡散が好ましく
ないものである場斤には、健康被害、大気汚染等を生じ
るものとなる。また上記の処理装置も、活性炭等の吸着
物質、冷却凝縮機構等を備えたものが存在するが、上述
のごとき有害物質を吸着除去するのに、有害物質を含ん
だ気体を処理装置に一回だけ通過させ、後は大気中に放
出してしまうものであるため、確実な有害物質除去は困
難なものであった。また従来の処理装置は、洗浄槽と別
個に形成しているため、大型で複雑な機構と成り、溶剤
の回収コストを高価なものとしていた。2. Description of the Related Art Conventionally, a washing table on which an object to be washed is placed is connected to a moving mechanism so that its position can be freely moved.
There is a device described in Publication No. 14, in which after the cleaning work is completed, the object to be cleaned is taken outside from the cleaning tank, and then the solvent adhering to the object to be cleaned is dried in a separately provided processing device. things are being done. Therefore, not only does the drying process require a lot of effort, but it also comes into contact with the outside air when being transferred to the processing equipment, and if the solvent is trichlorethylene, trichlorotrifluoroethane, etc., which is undesirable for diffusion into the atmosphere, This can cause health damage, air pollution, etc. In addition, some of the above-mentioned processing devices are equipped with adsorbent materials such as activated carbon, cooling condensation mechanisms, etc., but in order to adsorb and remove the above-mentioned harmful substances, gas containing harmful substances is passed through the processing device once. Reliable removal of harmful substances has been difficult because only a portion of the substance is allowed to pass through, and the rest is released into the atmosphere. In addition, since the conventional treatment device is formed separately from the cleaning tank, it has a large and complicated mechanism, which increases the cost of recovering the solvent.
また従来は、洗浄作業前の被洗浄物に付着した湿気や、
被洗浄物を洗浄装置に収納するときに流入する外気の湿
気を、Ａ浄作業に入る前に除去する有効な手段が無いた
め、水分が溶剤中に混入し、洗浄効率を悪くしたり、水
分分子ａ器によって溶剤中の水分を除去する作業を必要
としている。Additionally, in the past, moisture adhering to the object to be cleaned before cleaning,
Since there is no effective means to remove the moisture from the outside air that flows in when the items to be cleaned are stored in the cleaning equipment before starting the A cleaning process, moisture may get mixed into the solvent, impairing the cleaning efficiency, or It is necessary to remove water from the solvent using a molecular a device.
発明が解決しようとする問題点
本発明は上述のごとき問題点を解決しようとするもので
あって、機械部品、電子部品、医療用具その他種々の被
洗浄物を液洗浄または蒸気洗浄した後の、被洗浄物にｆ
１着した溶剤の処理を、洗浄装置内で手数を要する事な
く、また外部に有害な物質を拡散しないようにするとと
もに洗浄作業前に被洗浄物に付着した湿気や、被洗浄物
を洗浄装置に収納するときに流入する外気の湿気を、洗
浄作業に入る前に、簡略な機構で廉価に処理しようとす
るものである。Problems to be Solved by the Invention The present invention aims to solve the above-mentioned problems.The present invention is intended to solve the above-mentioned problems. f on the object to be cleaned
The cleaning equipment can process the solvent that has arrived in the cleaning equipment without requiring any trouble, and prevents the diffusion of harmful substances to the outside. The aim is to use a simple mechanism to dispose of the moisture from the outside air that flows in when the product is stored at a low cost, before starting the cleaning process.
問題点を解決するための手段
本発明は上述のごとき問題点を解決するため、被洗浄物
を載置する洗浄台を、移動ｉ横に接続して位Ｉ？ｆ移動
自在に形成することにより、洗浄台にａ置した被洗浄物
を、洗浄槽に接続して設けた９μ埋室と洗浄槽の間で往
復移動可能とし、この処理室と洗浄槽とを、遮蔽体によ
り遮蔽可能とするとともに処理室の外周に、気体が循環
流通し得る循環路を形成し、この循環路内に溶剤を処理
する処理機構を位置して成るものである。Means for Solving the Problems In order to solve the above-mentioned problems, the present invention provides a system in which a washing table on which the object to be washed is placed is connected to the side of the movable table. By forming f to be movable, the object to be cleaned placed on the washing stand can be moved back and forth between the 9μ buried chamber connected to the cleaning tank and the cleaning tank. A circulation path is formed around the outer periphery of the processing chamber through which gas can circulate, and a processing mechanism for treating the solvent is located within the circulation path, which can be shielded by a shielding member.
また本発明は、被洗浄物をｉ置する洗浄台を、移動機構
に接続して位置移動自在に形成することにより、洗浄台
に載置した被洗浄物を、洗浄槽に接続して設けた処理室
と洗浄槽の間で往復移動可能とし、この処理室と洗浄槽
とを、遮蔽体により遮蔽可能とするとともに処理室の外
周に、気体がＷｉ環液流通得る循環路を形成し、この循
環路内に湿気を処理する処理機構を位置して成るもので
ある。In addition, the present invention provides a washing table on which the object to be cleaned is placed, which is connected to a moving mechanism so that the position can be freely moved, so that the object to be cleaned placed on the washing table is connected to the cleaning tank. It is movable back and forth between the processing chamber and the cleaning tank, the processing chamber and the cleaning tank can be shielded by a shield, and a circulation path is formed around the outer periphery of the processing chamber through which gas can circulate through the Wi reflux liquid. A treatment mechanism for treating moisture is located within the circulation path.
処理機構は、溶剤を吸着し得る吸着物質を備えたもので
あっても良い。The treatment mechanism may include an adsorbent that can adsorb the solvent.
処理機構は、湿気を吸着し得る吸着物質を備えたもので
あっても良い。The treatment mechanism may include an adsorbent material capable of adsorbing moisture.
吸着物質は、カセット状に形成し交換可能としたもので
あっても良い。The adsorbent may be formed into a cassette and made replaceable.
処理機構は、加熱部と冷却部を設け、吸着物質に吸着し
た溶剤を加熱分離するとともに冷却部で冷却凝縮し、溶
剤を回収し得るようにしたものであっても良い。The processing mechanism may include a heating section and a cooling section, so that the solvent adsorbed on the adsorbed substance is heated and separated, and the solvent is cooled and condensed in the cooling section to recover the solvent.
処理機構は、溶剤を凝縮し得る冷却手段を備えたもので
あっても良い。The processing mechanism may include cooling means capable of condensing the solvent.
処理機構は、湿気を凝縮し得る冷却手段を備えたもので
あっても良い。The treatment mechanism may include cooling means capable of condensing moisture.
遮蔽体は、処理室と洗浄槽を連通する連通口よりも大き
な直径に洗浄台を形成し、この洗浄台を、洗浄台の移動
に伴う被洗浄物の処理室収納時に、処理室と洗浄槽の連
通口外周に押圧係合して、連通口を密閉することにより
、処理室と洗浄槽とを遮蔽するものであっても良い。The shield forms a cleaning table with a diameter larger than the communication port that communicates the processing chamber and the cleaning tank, and when the cleaning table is moved and the items to be cleaned are stored in the processing chamber, the cleaning table is connected to the processing chamber and the cleaning tank. The processing chamber and the cleaning tank may be shielded by pressingly engaging the outer periphery of the communication port and sealing the communication port.
遮蔽体は、外部操作により処理室と洗浄槽との連通口を
開放または遮蔽するものであっても良い。The shield may open or shield the communication port between the processing chamber and the cleaning tank by an external operation.
作 用
本発明は上述のごとく構成したものであるから、機械部
品、電子部品、医療用具その他種々の被洗浄物を液洗浄
または蒸気洗浄するには、移動機構を作動して、被洗浄
物を載置した洗浄台を洗浄槽中に挿入し、液洗浄、蒸気
洗浄等を行う。この’ｔ／を洗浄、蒸気洗浄の完了後は
再び移動機構を作動して、洗浄台に載置した被洗浄物を
、洗浄槽に接続して設（１な処理室に収納４−る。この
収納陳、または収納と同時に、処理室と洗浄槽と５：遮
蔽体により遮蔽し、被洗浄物に付着した溶剤を除去する
だめの処理機構を作動する。この処理機構は、気体が循
環流通し得る循環路内に設けたものであるから、処理室
内の気体は反復して連続的に処理機構で処理する事が可
能となり、被洗浄物にｆ・１着した有機溶剤等を確実に
除去するまで、溶剤の除去作業を繰り返し行うことが出
来る。この処理後に、被洗浄物を処理室から収り出せば
、有害な気体を大気中に拡散したり、作業者が吸引する
ことも無く、安全な洗浄作業を可能とする。Function: Since the present invention is constructed as described above, in order to perform liquid cleaning or steam cleaning of mechanical parts, electronic parts, medical instruments, and various other objects to be cleaned, the moving mechanism is operated to move the objects to be cleaned. Insert the mounted cleaning table into the cleaning tank and perform liquid cleaning, steam cleaning, etc. After the cleaning and steam cleaning are completed, the moving mechanism is operated again, and the object to be cleaned placed on the cleaning stand is connected to the cleaning tank and stored in the processing chamber. At the same time as this storage or storage, the processing chamber and cleaning tank 5: A processing mechanism is operated, which is shielded by a shield and removes the solvent attached to the object to be cleaned. Since it is installed in a circulation path that can be cleaned, the gas in the processing chamber can be repeatedly and continuously processed by the processing mechanism, and organic solvents etc. that have adhered to the object to be cleaned are reliably removed. The solvent removal process can be repeated until the solvent is removed.If the object to be cleaned is removed from the processing chamber after this process, harmful gases will not be diffused into the atmosphere or inhaled by the operator. Enables safe cleaning work.
また溶剤の付着した被洗浄物は、洗浄装置から外部に出
る事なく洗浄槽から処理室に収納され、１・１着溶剤の
処理を行うものであるから、従来のごとく、処理機構へ
の被洗浄物の移送手数を要しないばかりでなく、溶剤を
拡散したりすることも無い。また循環路は、処理室の外
周に設けるとともに内部に処理＃！４楕を位置したもの
であるから、機構を簡略化し１■価な溶剤処理を可能と
するものである。In addition, the objects to be cleaned with solvent attached to them are stored in the processing chamber from the cleaning tank without leaving the cleaning equipment and are treated with 1/1 attached solvent, so there is no need to expose the processing mechanism to the cleaning equipment as in the past. Not only is there no need to transport the cleaning material, there is also no need to diffuse the solvent. In addition, a circulation path is provided around the outer periphery of the processing chamber, and a processing #! Since it has four ellipses, it simplifies the mechanism and enables treatment with monovalent solvents.
また上記の被洗浄物の液洗浄または蒸気洗浄に先立って
、被洗浄物が湿気を帯びている場合とか。Also, when the object to be cleaned is damp prior to liquid cleaning or steam cleaning as described above.
外部から処理室に被洗浄物を収納するときに外気が流入
し、処理室内に湿気が流入する場合には、湿気を処理す
る処理機構機構を作動し、シリカゲル等の湿気吸着物質
に湿気を吸着させれば、湿気を除去した被洗浄物の洗浄
作業が可能となり、水分が溶剤中に混入して洗浄効率を
悪くしたりすることが無く、また従来必ず必要とされて
宋だ、水分分離器による溶剤中の水分除去作業を不要と
し、水分分離器を備える必要が無く、廉価で効率の高い
洗浄作業を可能とする。When storing items to be cleaned from the outside into the processing chamber, outside air flows in and if moisture flows into the processing chamber, the processing mechanism that processes the moisture is activated and the moisture is adsorbed by a moisture-absorbing material such as silica gel. By doing so, it is possible to clean the object to be cleaned after removing moisture, and there is no possibility that moisture will get mixed into the solvent and reduce the cleaning efficiency. This eliminates the need for water removal work from a solvent using a water separator, eliminates the need for a water separator, and enables low-cost and highly efficient cleaning work.
実施例
以下本発明の一実施例を図面に於いて説明すれば、（１
）は洗浄台で、被洗浄物（２）を上面に載置するととも
にエアシリンダー、オイルシリンダーチェーン装；り等
の適宜の移動機構（３）に接続１．て上下方向に位置移
動自在に形成している。この洗浄台（１）は、移動機構
（３）を作動さぜることに、Ｌす、上面に載置した被洗
浄物（２）を、洗浄槽（・１）の上部に接続して設けた
処理室（５）と洗浄槽（４）との間て′、往１￥移動ｉ
丁１屯にするとともに、二の隅■甲室（５）と洗浄槽（
１１）とを、遮蔽ｆｋ（６）により遮蔽可能としている
。Embodiment Below, one embodiment of the present invention will be described with reference to the drawings.
1) is a washing table on which the object to be cleaned (2) is placed and connected to an appropriate moving mechanism (3) such as an air cylinder or oil cylinder chain device. It is formed to be movable in the vertical direction. This washing table (1) is connected to the upper part of the washing tank (1) so that when the moving mechanism (3) is operated, the object to be washed (2) placed on the upper surface is connected to the upper part of the washing tank (1). Between the processing chamber (5) and the cleaning tank (4), 1 yen transfer i
In addition to making it 1 ton, the second corner - the upper room (5) and the washing tank (
11) can be shielded by shielding fk(6).
この遮蔽は、第１図、第２ ［Ｎに示すごとく、処理室
（５）と洗浄槽（４）を連通ずる連通口（７〉よりも大
きな直径に洗浄台（１）を形成し・、この洗（？台（１
）を、洗浄台（１）の移動に伴う被洗？争物（２）の処
理室（５）への収納時に、２点鎖線で示すごとく、処理
室（５）と洗浄槽（４）の連通口（７）外周に押圧係合
して、連通口（７）を密閉することにより、処理室（５
）と洗浄槽（４）とを遮蔽するもので、遮蔽体（６）と
洗浄台（１〉とを兼用Ｖるものである。As shown in Figures 1 and 2 [N], this shielding is achieved by forming the cleaning platform (1) with a larger diameter than the communication port (7) that communicates the processing chamber (5) and the cleaning tank (4). This wash (? stand (1
) is washed due to the movement of the washing table (1)? When the object (2) is stored in the processing chamber (5), as shown by the two-dot chain line, it presses into engagement with the outer periphery of the communication port (7) between the processing chamber (5) and the cleaning tank (4), and closes the communication port. (7) by sealing the processing chamber (5).
) and the cleaning tank (4), and also serves as the shield (6) and the cleaning table (1>).
また、洗浄槽（４）と処理室（５）との連通口（７）は
、特別の固定手段を持たない蓋体（１０）を処理室（５
）側に位置することにより、被洗浄物〈２）が洗浄槽（
４）内に位置する時は、常時、連通ｎ（７）を閉止し、
洗浄台（１）の−Ｆ昇時に、洗浄台（１）の」二面に突
出した支持棒（１１）によって、２点鎖線で示すごとく
蓋体（１０）を持ち上げ開放するものである。In addition, the communication port (7) between the cleaning tank (4) and the processing chamber (5) is connected to the lid body (10), which does not have any special fixing means, to the processing chamber (5).
) side, the object to be cleaned (2) is placed in the cleaning tank (
4) When located within, always close communication n(7),
When the washing table (1) is raised to -F, the cover body (10) is lifted and opened as shown by the two-dot chain line by means of support rods (11) protruding from two sides of the washing table (1).
まｌ：、上記のり処理室（５）の外周には気体が１Ｎ環
流通しｌ）る循環路（１２）を設け、この循環路（１２
）内に、被洗浄物（２）に付着した溶剤を除去するため
の処理機ｔＭ（１３）を位置している。この処理機構（
１３）は、溶剤を吸着し得る活性炭等の吸着物質（１４
）を固定的またはカセット状に形成し、交換可能として
いる。A circulation path (12) through which 1N gas circulates is provided around the outer periphery of the glue processing chamber (5), and this circulation path (12)
) is located a processing machine tM (13) for removing the solvent adhering to the object to be cleaned (2). This processing mechanism (
13) is an adsorbent material (14) such as activated carbon that can adsorb solvents.
) is formed fixedly or in the form of a cassette and is replaceable.
また循環路（１２）には、処理室（５）と接続する導入
口（１５）に、循環路（１２）へ強制的に溶剤ガスを導
入するためのファン（１６）を設けるとともに導入口（
１５）に対向する位置の処理室（５）には、循環路（１
２）の排出口（１７）を開口し、溶剤ガスの強制循環を
可能としている。Further, in the circulation path (12), a fan (16) for forcibly introducing solvent gas into the circulation path (12) is provided at the introduction port (15) connected to the processing chamber (5), and a fan (16) for forcibly introducing solvent gas into the circulation path (12) is provided.
The processing chamber (5) located opposite to the circulation path (15) has a circulation path (1
2) is opened to enable forced circulation of the solvent gas.
上述のごとく構成したものに於いて、機械部品、電子部
品、医療用具その他の種々の被洗浄物（２）な、液洗浄
または蒸気洗浄するには、移動ａ横（３）を作動して、
被洗浄物（２）を載置した洗浄台（１）を洗浄槽〈４）
中に下降挿入し、液洗浄または蒸気洗浄若しくはその双
方の洗浄を行う。この液洗浄、蒸気洗浄の完了後は、移
動機構（３）を洗浄台（１）の上昇方向に作動して、洗
浄台（１）に載置した被洗浄物（２）を、洗浄槽（４）
の上部に設けな処理室（へ ） Ｉ゛ＩＩマ 拍 １
ｉｎ’、 ｉＴ’ Ｉ曹（１） ！ｙ １
Ｊ１１． ｌ甲 室 （”； ’Ｊ ！＜ＩＭｊ
、０ンする。In the structure as described above, in order to perform liquid cleaning or steam cleaning of mechanical parts, electronic parts, medical instruments, and other various objects to be cleaned (2), the movement a side (3) is operated,
The cleaning table (1) on which the object to be cleaned (2) is placed is connected to the cleaning tank (4)
into the container and perform liquid cleaning, steam cleaning, or both. After completion of this liquid cleaning and steam cleaning, the moving mechanism (3) is operated in the upward direction of the cleaning platform (1) to move the object to be cleaned (2) placed on the cleaning platform (1) into the cleaning tank ( 4)
A processing chamber (to) I゛II Ma Beat 1
in', iT' I Sergeant (1)! y 1
J11. l A room (”; 'J !<IMj
, zero.
この遮蔽は、洗浄台（１）を連通口（７）よりも大きな
直径に形成しているから、この洗浄台（１）が被洗浄物
（２）を処理室（５）に収納すれば、第１図、第２図の
２点鎖線に示すごとく、連通口（７）の下面外周に洗浄
台（１）の上面が押圧され、連通し＋（７）を密閉する
ことができ、処理室（５）と洗浄槽（４）とを遮蔽ずろ
ものとなる。This shielding has the cleaning platform (1) having a larger diameter than the communication port (7), so if the cleaning platform (1) accommodates the object to be cleaned (2) in the processing chamber (5), As shown by the two-dot chain line in Figures 1 and 2, the upper surface of the washing table (1) is pressed against the outer periphery of the lower surface of the communication port (7), and the communication port (7) can be sealed. (5) and the cleaning tank (4).
この遮蔽を行った隣、フ７・ン（１６）を作動ｆｈば、
処理室（５）内の空気は、溶剤ガスとともに強制的に循
環路（１２）に流入し、吸打物ｆｆ（１４）によって溶
剤ガスを吸着除去することができる。そしてこの吸着除
去は、気体が循環流通し得る循環路（１２）から排出口
（１７）、処理室（５）を介して導入［ＩＮ、５＞に導
入されるもので、Ｐ）るから、処理室（５）内の気体は
溶剤カスが完全に除去されるまで、反復して連続的に処
理機構（１３）で処理する事が可能となり、被洗浄物（
２）に付着した有機溶剤笠を確実に除去することか出来
る。この処理降に、被洗／ＴＩ’ＩＮ □、）を−押室
（へ）かｒ’、 １１’（り出１１ば有害な気体を大気
中に拡散したり、作業者が吸弓することも無く、安全な
洗浄作業を可能とする。Next to this shielding, if you activate F7 (16),
The air in the processing chamber (5) forcibly flows into the circulation path (12) together with the solvent gas, and the solvent gas can be adsorbed and removed by the suction material ff (14). In this adsorption and removal, the gas is introduced from the circulation path (12) through the exhaust port (17) and the processing chamber (5) into [IN, 5>, P). The gas in the processing chamber (5) can be repeatedly and continuously processed by the processing mechanism (13) until the solvent residue is completely removed, and the object to be cleaned (
2) It is possible to reliably remove the organic solvent cap attached to the product. After this process, if the cleaning material/TI'IN □,) is pushed out into the push chamber (r', 11'), harmful gases may be diffused into the atmosphere or may be inhaled by workers. This enables safe cleaning work.
また処理機構（１３）を構成する吸着物質（１４）を、
カセット状にすれば吸着物ｆｆ（１４）の交換を簡易に
行うことができ、常に優れた溶剤ガスの吸着効率を得る
ことができる。In addition, the adsorbent material (14) constituting the processing mechanism (13) is
If it is made into a cassette, the adsorbate ff (14) can be easily replaced, and excellent solvent gas adsorption efficiency can always be obtained.
また溶剤の付着した被洗浄物（２）は、洗浄装置から外
部に出る事なく処理室（５）に収納され、（＝ｆ着した
溶剤の除去処理を行うものであるから、従来のごとく処
理機構（１３）への被洗浄物（２）の移送手数を要しな
いばかりでなく、溶剤を拡散したりすることも無いもの
である。Furthermore, the object to be cleaned (2) with the solvent attached is stored in the processing chamber (5) without exiting from the cleaning device, and since the attached solvent is removed, the object is treated as before. This not only eliminates the need for transferring the object (2) to be cleaned to the mechanism (13), but also eliminates the need to diffuse the solvent.
また上記実施例に於いては、遮蔽体（６）を洗浄台（１
）と兼用したが、他の異なる実施例では、第３図、第４
ＦＡに示すごとく、一対の下板状の遮蔽体（６）を、洗
浄台（１）の下面両側に支持軸（１８）で開開自在に軸
支するとともにこの支持軸（１８）の外方に係り部（２
０）を突出し、このｆ系＆部（２０）を、洗浄台（１）
の移動に伴う被洗浄物（２）の処理室（５）への収納時
に処理室（５）と洗浄槽（６）の連通口〈７）外周に係
合して、支持軸（１８）を支点に回動し、遮蔽体（６）
を密閉することにより、処理室（５）と洗浄槽（４）と
を遮蔽するものである。Further, in the above embodiment, the shield (6) is attached to the washing table (1).
), but in other different embodiments,
As shown in FA, a pair of lower plate-shaped shields (6) are supported by support shafts (18) on both sides of the lower surface of the washing table (1) so as to be openable and openable. Related part (2
0) and place this f system & section (20) on the washing table (1).
When the object to be cleaned (2) is stored in the processing chamber (5) due to the movement of the object (2), the support shaft (18) is Rotates around the fulcrum and shields (6)
By sealing the processing chamber (5) and the cleaning tank (4), the processing chamber (5) and the cleaning tank (4) are shielded.
この遮蔽は、洗浄台〈１）の上昇に伴い、遮蔽体（６）
の側面に突出した係り部（２０）を、連通口（７）の洗
浄槽（４）ｆＩｌｌの外周に突出した係り枠（２１）に
係合して、支持軸（１８）を支点にして、遮蔽体（６）
を同動密閉することにより、処理室（５）と洗浄槽（４
）とを遮蔽するものである。This shielding is caused by the shielding body (6) as the washing table (1) rises.
The engaging part (20) protruding from the side surface is engaged with the engaging frame (21) protruding from the outer periphery of the cleaning tank (4) of the communication port (7), using the support shaft (18) as a fulcrum, Shield (6)
By simultaneously sealing the processing chamber (5) and cleaning tank (4),
).
また遮蔽体（６）による遮蔽方法は、必ずしも上記方法
による必要はなく、任意の方法を選択することが可能で
あり、遮蔽体（６）は、外部操乍により処理室（５）と
洗浄槽（４）との連通口（７）を、シャッター等の任意
の方法で開放または遮蔽するものであっても良いし、被
洗浄物（２）の処理室（５）への収納を、適宜のセンサ
ーで感知し、シャッター等の遮蔽体（６）で処理室（５
）と洗浄槽（４）とを遮蔽するもので有っても良い。Furthermore, the shielding method using the shielding body (6) does not necessarily have to be the above-mentioned method, and any method can be selected. The communication port (7) with (4) may be opened or covered by any method such as a shutter, or the storage of the object to be cleaned (2) in the processing chamber (5) may be controlled as appropriate. Detected by a sensor, the processing room (5) is
) and the cleaning tank (4) may be shielded.
また、上記実施例では洗浄槽（４）の上部に処理室（５
〉を設けたが、他の異なる実施例では洗浄槽（４）と処
理室（５）とを平行に設けても良く、移動機ｙ！（３）
も洗浄台（１）を平面的に移動させるように構成しても
良く、洗浄目的に応じて、任意の設計が可能である。In addition, in the above embodiment, the processing chamber (5) is located above the cleaning tank (4).
], but in other different embodiments, the cleaning tank (4) and the processing chamber (5) may be provided in parallel, and the mobile machine y! (3)
The cleaning table (1) may also be configured to move in a plane, and any design is possible depending on the purpose of cleaning.
また前記実施例では処理機構（１３）を、吸着物質（１
４）に溶剤ガスを吸着させ、カセット状等に形成して適
宜交換し得るように構成したが、他の異なる実施例では
吸着物質（１４）を交換しなくとも良いように、処理機
構（１３）を構成している。Further, in the above embodiment, the treatment mechanism (13) is
4) is configured to adsorb the solvent gas and form it into a cassette shape or the like so that it can be replaced as appropriate. However, in other different embodiments, the processing mechanism (13 ).
即ち、第２図に示すごとく、吸着物質（１４）を適宜間
隔で充填した循環路（１２）内に、ボイラー等の加熱手
段（２２）に配管（２３）を接続した加熱部（２４）を
、吸着物質（１４）の充填間隔に各々位置し、この加熱
部（２４）で吸着物質（１４）に吸着された溶剤を加熱
して、ガス化するとともに循環路（１２）末端の排出口
（１７〉近くに、冷却水タンク（２５）と配管〈２３）
で接続した冷却部（２６）を設け、吸着物質（１４）に
吸着した溶剤を加熱分離するとともに冷却部（２６〉で
冷却凝縮し、回収容器く２７）に回収し得るようにして
いる。この加熱による溶剤の回収は、洗浄作業の完了後
に一定の時間をかけて行うのが望ましい。That is, as shown in FIG. 2, a heating section (24) having a pipe (23) connected to a heating means (22) such as a boiler is placed in a circulation path (12) filled with an adsorbent (14) at appropriate intervals. , are located at the filling interval of the adsorbent material (14), and the heating section (24) heats the solvent adsorbed on the adsorbent material (14) to gasify it and also to the discharge port ( 17> Nearby, the cooling water tank (25) and piping <23)
A cooling section (26) connected to the adsorbent material (14) is provided to heat and separate the solvent adsorbed on the adsorbent material (14), and to cool and condense the solvent in the cooling section (26>) so that it can be recovered in a recovery container (27). It is desirable to recover the solvent by heating over a certain period of time after the cleaning operation is completed.
また処理機構（１３）は、吸着物質（１４）を必ずしも
用いる必要は無く、溶剤を凝縮し得る冷却手段を、循環
路（１２）中に備えたものであっても良い。Further, the treatment mechanism (13) does not necessarily need to use the adsorbent (14), and may be provided with a cooling means capable of condensing the solvent in the circulation path (12).
また処理機構（１３）は、大気中に放出しても無害な水
等の溶剤を熱風にて加熱除去する、加熱手段を備えたも
のであっても良し、被洗浄物に（−１着した灯油等の粘
度の高い溶剤を、エアブロ−により吹き飛ばし、これを
液化回収するエリミネータ−を備えたものであっても良
い。Further, the processing mechanism (13) may be equipped with a heating means that heats and removes a solvent such as water, which is harmless even if released into the atmosphere, with hot air. It may be equipped with an eliminator that blows off a highly viscous solvent such as kerosene with air and liquefies and recovers it.
また上記発明に於いては、被洗浄物に付着した溶剤の除
去および回収について説明したが、第２の発明に置いて
は、溶剤を処理する処理機構に代えて、湿気を処理する
処理機構を設けることにより、洗浄作業前に被洗浄物に
付着した湿気や、被洗浄物を洗浄装置に収納するときに
流入する外気の湿気を、洗浄作業に入る前に、簡略なＦ
１％椹で廉価に処理し、水分が溶剤中に混入して洗浄効
率を悪くしたりすることが無く、また従来必ず必要とさ
れて来た、水分分離器による溶剤中の水分除去作業を不
要とし、水分分離器を備える必要が無く廉価で効率の高
い洗浄作業を可能とすることができる。またこの第２の
発明に於いても、第１の発明とは、処理する対象物が溶
剤と湿気の差が有るのみで、溶剤吸着物質と湿気吸着物
質の点で異なるが、他の作用、構成：まいては全く同一
で有り、実施例についても同様である。Furthermore, in the above invention, the removal and recovery of the solvent attached to the object to be cleaned has been explained, but in the second invention, a processing mechanism that processes moisture is used instead of a processing mechanism that processes the solvent. By installing a simple F
Processed at low cost with 1% bamboo, water does not get mixed into the solvent and reduce cleaning efficiency, and there is no need to remove water from the solvent using a water separator, which was always required in the past. This eliminates the need for a moisture separator, making it possible to perform cleaning operations at low cost and with high efficiency. Also, the second invention differs from the first invention in that the object to be treated is only a solvent and a moisture, and a solvent adsorbing substance and a moisture adsorbing substance are used, but other effects, Configuration: They are completely the same, and the same applies to the embodiments.
発明の効果
本発明は、上述のごとく構成したものであるから、機械
部品、電子部品、医療用具そ力池種々の被洗浄物を液洗
浄または蒸気洗浄した後の、被洗浄物に付着した溶剤を
、手数を要する事なく被洗浄物を洗浄装置内に位置した
まま、確天な除去処理が可能であるとともにこの除去処
理を、外部に有機溶剤等の有害な物質を拡散することな
く行うことができる。また循環路は、処理室の外周に設
けるとともに内部に処理機構を位置したものであるから
、機構を簡略化し廉価な溶剤処理を可能とする。Effects of the Invention Since the present invention is configured as described above, it is possible to remove solvents that adhere to the objects to be cleaned after liquid cleaning or steam cleaning of various objects to be cleaned, such as mechanical parts, electronic parts, and medical equipment. It is possible to perform a reliable removal process while the object to be cleaned remains in the cleaning device without requiring any trouble, and this removal process can be performed without diffusing harmful substances such as organic solvents to the outside. I can do it. Further, since the circulation path is provided on the outer periphery of the processing chamber and the processing mechanism is located inside, the mechanism can be simplified and inexpensive solvent processing can be performed.
また、第２の発明に置いては、溶剤を処理する処理機構
に代えて、湿気を処理する処理機構を設けることにより
、洗浄作業前に被洗浄物に付着した湿気や、被洗浄物を
洗浄装置に収納するときに流入する外気の湿気と、洗浄
作業に入る前に、簡晴な機構で廉価に処理し、水分が溶
剤中に混入して洗浄効率を悪くしたりすることが無く、
また従来必ず必要とされて来た、水分分屋器による溶剤
中の水分除去作業を不要とし、水分分離器を備える必要
が無く、廉価で効率の高い洗浄作業を可能とすることが
できるものである。In addition, in the second invention, by providing a processing mechanism that processes moisture instead of a processing mechanism that processes solvent, it is possible to remove moisture adhering to the object to be cleaned and to clean the object to be cleaned before the cleaning operation. The moisture from the outside air that flows in when the equipment is stored, and before the cleaning process begins, is treated at a low cost using a simple mechanism, which prevents moisture from getting mixed into the solvent and reducing cleaning efficiency.
In addition, it eliminates the need to remove moisture from the solvent using a moisture separator, which was always required in the past, and eliminates the need for a moisture separator, making it possible to perform cleaning operations at low cost and with high efficiency. be.
図面は本発明の一実施例を示すもので、第１図は断面図
、第２図は吸着物質に吸着した溶剤の回収機構を設けた
異なる実施例の断面図、第３図は遮蔽体の異なる実施例
を示すもので被洗浄物の洗浄状態を示す断面図、第４図
は第３図の実施例に於ける溶剤除去状態の断面図である
。
（１）・・洗浄台 （２）・・
（３）・・移動機１ｉＩ（４）・
（５）・・処理室 （６）・
（７）・・連通口 （１２）・
（１３）・・処理機構 （１４）・・
被洗浄物
・洗浄槽
・遮蔽体
・循環路
吸着物質
（２４）・
第
図
加熱部
（２６）・
冷却部The drawings show one embodiment of the present invention; FIG. 1 is a cross-sectional view, FIG. 2 is a cross-sectional view of a different embodiment provided with a recovery mechanism for the solvent adsorbed on the adsorbent, and FIG. 3 is a cross-sectional view of a shielding body. FIG. 4 is a cross-sectional view showing a state in which the object to be cleaned is cleaned, showing a different embodiment. FIG. 4 is a cross-sectional view showing a state in which the solvent is removed in the embodiment of FIG. (1)... Washing table (2)... (3)... Mobile machine 1iI (4) (5)... Processing chamber (6)... (7)... Communication port (12)... (13)...・Processing mechanism (14)... Object to be cleaned, cleaning tank, shield, circulation path adsorbent (24), heating section (26), cooling section
Claims (10)
て位置移動自在に形成することにより、洗浄台に載置し
た被洗浄物を、洗浄槽に接続して設けた処理室と洗浄槽
の問で往復移動可能とし、この処理室と洗浄槽とを、遮
蔽体により遮蔽可能とするとともに処理室の外周に、気
体が循環流通し得る循環路を形成し、この循環路内に溶
剤を処理する処理機構を位置した事を特徴とする洗浄装
置。(1) The cleaning table on which the items to be cleaned are placed is connected to a moving mechanism so that the position can be freely moved, so that the items to be cleaned placed on the cleaning table are connected to the cleaning tank in a processing chamber. The processing chamber and the washing tank can be moved back and forth between the processing chamber and the washing tank, and the processing chamber and the washing tank can be shielded by a shield, and a circulation path through which gas can circulate is formed around the outer periphery of the processing chamber. A cleaning device characterized in that a processing mechanism for processing a solvent is located at the top.
て位置移動自在に形成することにより、洗浄台に載置し
た被洗浄物を、洗浄槽に接続して設けた処理室と洗浄槽
の間で往復移動可能とし、この処理室と洗浄槽とを、遮
蔽体により遮蔽可能とするとともに処理室の外周に、気
体が循環流通し得る循環路を形成し、この循環路内に湿
気を処理する処理機構を位置した事を特徴とする洗浄装
置。(2) A processing chamber in which the cleaning table on which the items to be cleaned are placed is connected to a moving mechanism so that the position can be freely moved, and the items to be cleaned placed on the cleaning table are connected to the cleaning tank. The processing chamber and the cleaning tank can be shielded by a shield, and a circulation path is formed around the outer periphery of the processing chamber in which gas can circulate. A cleaning device characterized in that a processing mechanism for processing moisture is located at the top of the cleaning device.
ものであることを特徴とする請求項１記載の洗浄装置。(3) The cleaning device according to claim 1, wherein the processing mechanism includes an adsorbent that can adsorb a solvent.
ものであることを特徴とする請求項２記載の洗浄装置。(4) The cleaning device according to claim 2, wherein the processing mechanism includes an adsorbent that can adsorb moisture.
ものであることを特徴とする請求項３または４記載の洗
浄装置。(5) The cleaning device according to claim 3 or 4, wherein the adsorbing substance is formed in a cassette shape and is replaceable.
吸着した溶剤を加熱分離するとともに冷却部で冷却凝縮
し、溶剤を回収し得るようにしたことを特徴とする請求
項４または５記載の洗浄装置。(6) The processing mechanism is characterized in that it is provided with a heating section and a cooling section, so that the solvent adsorbed on the adsorbed substance is separated by heating, and the solvent is cooled and condensed in the cooling section, so that the solvent can be recovered. 5. The cleaning device according to 5.
ものであることを特徴とする請求項１記載の洗浄装置。(7) The cleaning device according to claim 1, wherein the processing mechanism is equipped with a cooling means capable of condensing the solvent.
ものであることを特徴とする請求項２記載の洗浄装置。(8) The cleaning device according to claim 2, wherein the processing mechanism is equipped with a cooling means capable of condensing moisture.
も大きな直径に洗浄台を形成し、この洗浄台を、洗浄台
の移動に伴う被洗浄物の処理室収納時に、処理室と洗浄
槽の連通口外周に押圧係合して、連通口を密閉すること
により、処理室と洗浄槽とを遮蔽するものであることを
特徴とする請求項１または２記載の洗浄装置。(9) The shield forms a cleaning table with a diameter larger than the communication port that communicates the processing chamber and the cleaning tank, and when the cleaning table is moved and the objects to be cleaned are stored in the processing chamber. 3. The cleaning device according to claim 1, wherein the processing chamber and the cleaning tank are shielded by being pressed into engagement with the outer periphery of the communication port of the cleaning tank and sealing the communication port.
連通口を開放または遮蔽するものであることを特徴とす
る請求項１または２記載の洗浄装置。(10) The cleaning device according to claim 1 or 2, wherein the shielding body opens or shields the communication port between the processing chamber and the cleaning tank by an external operation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16630489A JPH0330881A (en) | 1989-06-28 | 1989-06-28 | Washing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16630489A JPH0330881A (en) | 1989-06-28 | 1989-06-28 | Washing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0330881A true JPH0330881A (en) | 1991-02-08 |
| JPH0549355B2 JPH0549355B2 (en) | 1993-07-26 |
Family
ID=15828860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16630489A Granted JPH0330881A (en) | 1989-06-28 | 1989-06-28 | Washing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0330881A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10321580A (en) * | 1997-05-15 | 1998-12-04 | Tokyo Electron Ltd | Substrate cleaning unit and substrate cleaning system |
| JP2017170425A (en) * | 2016-03-18 | 2017-09-28 | 株式会社クリンビー | Workpiece cleaning method and workpiece cleaning device |
-
1989
- 1989-06-28 JP JP16630489A patent/JPH0330881A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10321580A (en) * | 1997-05-15 | 1998-12-04 | Tokyo Electron Ltd | Substrate cleaning unit and substrate cleaning system |
| JP2017170425A (en) * | 2016-03-18 | 2017-09-28 | 株式会社クリンビー | Workpiece cleaning method and workpiece cleaning device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0549355B2 (en) | 1993-07-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3348948B2 (en) | Removal device for organic solvent in soil | |
| TW208689B (en) | ||
| JPH0330881A (en) | Washing apparatus | |
| KR900702080A (en) | Method and apparatus for cleaning objects with pollution solvents, especially halogen hydrocarbons | |
| US4917807A (en) | Method for recovering solvent | |
| US4770197A (en) | Apparatus for recovering solvent | |
| CN1035804C (en) | Apparatus for recovering solvents from cleaning system | |
| JP2018013278A (en) | Containment apparatus | |
| JP2000237703A (en) | Vacuum washing/drying method and device | |
| US5311891A (en) | Solvent recovering system for a cleaning machine | |
| JP2894548B2 (en) | Small article dryer | |
| JPH057270B2 (en) | ||
| JPS593523B2 (en) | Pipe oil reheating device | |
| JPH0551357B2 (en) | ||
| JPH0415343Y2 (en) | ||
| JPH03176A (en) | Device for recovering gaseous solvent to be set in cleaning device | |
| JPH0542316B2 (en) | ||
| JPS61152020A (en) | Processor | |
| JPS6330536Y2 (en) | ||
| JP3807886B2 (en) | Purification method for PCB contaminated equipment | |
| JP2651654B2 (en) | Vacuum drying device and vacuum drying method | |
| JPS6218037A (en) | Pass-through room | |
| JPH0710716Y2 (en) | Solvent recovery device for dry cleaning device | |
| JPS6320081A (en) | Moving type steam wahser | |
| JP2004160350A (en) | Decontamination apparatus for pcb contaminant |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |