JPH03287790A - Treatment of liquid etchant for iron-nickel alloy - Google Patents
Treatment of liquid etchant for iron-nickel alloyInfo
- Publication number
- JPH03287790A JPH03287790A JP8916490A JP8916490A JPH03287790A JP H03287790 A JPH03287790 A JP H03287790A JP 8916490 A JP8916490 A JP 8916490A JP 8916490 A JP8916490 A JP 8916490A JP H03287790 A JPH03287790 A JP H03287790A
- Authority
- JP
- Japan
- Prior art keywords
- exchange membrane
- etching solution
- cation exchange
- iron
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 title claims abstract description 11
- 239000007788 liquid Substances 0.000 title description 6
- 239000012528 membrane Substances 0.000 claims abstract description 39
- 238000005341 cation exchange Methods 0.000 claims abstract description 35
- 239000002253 acid Substances 0.000 claims abstract description 17
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 17
- 239000011707 mineral Substances 0.000 claims abstract description 17
- 239000003011 anion exchange membrane Substances 0.000 claims abstract description 15
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 238000005530 etching Methods 0.000 claims description 55
- 239000000243 solution Substances 0.000 claims description 49
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 29
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 20
- 229910001453 nickel ion Inorganic materials 0.000 claims description 18
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 8
- 238000000909 electrodialysis Methods 0.000 claims description 8
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 5
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 5
- 230000005611 electricity Effects 0.000 claims description 3
- 229910001608 iron mineral Inorganic materials 0.000 claims description 3
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical group [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
- 150000001450 anions Chemical class 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 abstract 4
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 238000005349 anion exchange Methods 0.000 abstract 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- 238000011084 recovery Methods 0.000 description 8
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 7
- -1 Hydrogen ions Chemical class 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000002505 iron Chemical class 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical class [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- PWHVEHULNLETOV-UHFFFAOYSA-N Nic-1 Natural products C12OC2C2(O)CC=CC(=O)C2(C)C(CCC2=C3)C1C2=CC=C3C(C)C1OC(O)C2(C)OC2(C)C1 PWHVEHULNLETOV-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910001447 ferric ion Inorganic materials 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 229910001448 ferrous ion Inorganic materials 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、鉄−ニッケル合金のエツチング液の処理方法
、更に詳しくは、鉄−ニッケル合金を鉱酸の第二鉄塩の
塩酸水溶液でエツチングすることにより、ニッケル濃度
が高（なった劣化エツチング液を再生するための処理方
法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for treating an iron-nickel alloy with an etching solution, and more specifically, to etching an iron-nickel alloy with an aqueous hydrochloric acid solution of a ferric salt of a mineral acid. The present invention relates to a treatment method for regenerating a degraded etching solution that has a high nickel concentration.
［従来技術］
鉄−ニッケル合金製品のエツチング液としては、塩化鉄
系エツチング液が広（使用されている。該エツチング液
は、塩化第二鉄を主成分とし、エツチング能力を高める
ために塩酸を添加した水溶液が一般的である。[Prior art] Iron chloride-based etching solutions are widely used as etching solutions for iron-nickel alloy products. These etching solutions contain ferric chloride as a main component, and hydrochloric acid is added to increase the etching ability. Added aqueous solutions are common.
かかる塩化鉄系エツチング液を用いた鉄−ニッケル合金
製品のエツチングは下記の反応により行なわれる。Etching of iron-nickel alloy products using such an iron chloride-based etching solution is carried out by the following reaction.
２ Ｆｅ”＋ Ｆｅ −＊ ３ Ｆｅ”２Ｆｅ”＋
Ｎｉ −ｅ ２Ｆｅ”＋Ｎｉ”従って、エツチング
の進行につれて、エツチング液中の第二鉄塩が第一鉄塩
に変化するとともに、ニッケルイオン濃度が増大し、エ
ツチング液の能力が劣化する。2 Fe”+ Fe −* 3 Fe”2Fe”+
Ni -e 2Fe"+Ni" Therefore, as etching progresses, the ferric salt in the etching solution changes to ferrous salt, the nickel ion concentration increases, and the performance of the etching solution deteriorates.
従来より劣化した塩化鉄系エツチング液を再生する方法
は、幾つか提案されているが、いずれも生じた第一鉄塩
を第二鉄塩に転化する方法であり、劣化したエツチング
液からニッケルイオンを除去する方法は極めて少なく、
未だ工業的に実施されていない。Several methods have been proposed to regenerate degraded iron chloride etching solutions, but all of them involve converting the ferrous salts produced into ferric salts, and converting nickel ions from degraded etching solutions. There are very few ways to remove
It has not yet been implemented industrially.
従って、現在はエツチング液中のニッケルイオン濃度が
所定値以下になるように塩化第二鉄溶液を大量に供給す
るか、又はニッケルイオンが所定値以上に至った場合に
は、エツチング液を新たなものと入れ替えることが一般
的に実施されている。Therefore, currently, a large amount of ferric chloride solution is supplied to keep the nickel ion concentration in the etching solution below a predetermined value, or when the nickel ion concentration exceeds a predetermined value, a new etching solution is added. It is common practice to replace it with something else.
［問題点を解決するための手段］
本発明は前述の問題点を解決するべくなされたものであ
り、電極間に複数の陽イオン交換膜又は陽イオン交換膜
と陰イオン交換膜とを交互に配列して構成される電気透
析槽内の陽極側が陽イオン交換膜又は陰イオン交換膜で
、陰極側が陽イオン交換膜で区画される一つおきの画室
に、鉄−ニッケル合金のエツチング液を供給し、残る一
つおきの画室に鉱酸又は鉄の鉱酸塩の水溶液を供給して
通電し、上記エツチング液中のニッケルを分離すること
を特徴とする鉄−ニッケル合金のエツチング液の処理方
法にある。[Means for Solving the Problems] The present invention has been made to solve the above-mentioned problems, and includes a plurality of cation exchange membranes or a cation exchange membrane and an anion exchange membrane alternately arranged between the electrodes. An iron-nickel alloy etching solution is supplied to every other compartment in an electrodialysis tank that is arranged in an array, with a cation exchange membrane or anion exchange membrane on the anode side and a cation exchange membrane on the cathode side. A method for treating an etching solution for an iron-nickel alloy, characterized in that the nickel in the etching solution is separated by supplying an aqueous solution of a mineral acid or an iron mineral salt to every other remaining compartment and energizing the solution. It is in.
本発明は、その代表的例についての添付第１図により説
明される。第１図に示されるように、−枚以上好ましく
は１００〜２０００枚の複数枚の陽イオン交換膜が、陰
極と陽極間に配列され、所謂電気透析槽が構成される。The invention is illustrated by the attached FIG. 1, a representative example thereof. As shown in FIG. 1, a plurality of cation exchange membranes, preferably 100 to 2000, are arranged between a cathode and an anode to constitute a so-called electrodialysis cell.
電気透析槽は、いずれの形式のものも使用できるが、所
謂フィルタープレス型のものが好ましい。Although any type of electrodialysis tank can be used, a so-called filter press type is preferred.
かかる電気透析槽の好ましくは一つおきの画室Ａ、、Ａ
２．Ａ８．・・・（以下エツチング液室ともいう）に劣
化エツチング液１が供給され、一方、これらの画室と陽
イオン交換膜を介して隣接する残りの一つおきの画室Ｂ
、、Ｂ２．Ｂ、、・・・（以下ニッケル回収室ともいう
）には、鉱酸又は鉱酸の鉄塩の水溶液２が供給される。Preferably every other compartment A, , A of such an electrodialysis cell
2. A8. ...(hereinafter also referred to as etching liquid chambers) is supplied with degraded etching liquid 1, while every other compartment B is adjacent to these chambers via a cation exchange membrane.
,,B2. An aqueous solution 2 of a mineral acid or an iron salt of a mineral acid is supplied to B, . . . (hereinafter also referred to as a nickel recovery chamber).
劣化エツチング液の代表的なものは、５５０〜７００ｇ
／ｆｆの塩化第二鉄、１〜５０ｇ／ρの塩化第一鉄、遊
離塩酸０．Ｏ１〜１．ＯＮからなり、好ましくは４〜１
０ｃｍ／ｓｅｃでエッチグ室に供給される。A typical degraded etching solution weighs 550 to 700g.
/ff ferric chloride, 1-50 g/ρ ferrous chloride, free hydrochloric acid 0. O1~1. ON, preferably 4 to 1
It is supplied to the etching chamber at a rate of 0 cm/sec.
方、ニッケル回収室に供給される鉱酸又は鉱酸の鉄塩水
溶液の代表的なものは、６〜１２Ｎの塩酸又は２００〜
７００ｇ／ρの塩化第二鉄の水溶液であり、これらは、
好ましくは４〜ｌ Ｏｃｍ／ｓｅａで供給される。On the other hand, typical mineral acids or iron salt aqueous solutions of mineral acids supplied to the nickel recovery chamber are 6-12N hydrochloric acid or 200-12N hydrochloric acid.
700 g/ρ aqueous solution of ferric chloride, these are:
Preferably, it is supplied at 4 to 1 Ocm/sea.
上記のようにして電気透析槽に含液を供給、好ましくは
循環させて、好ましくはｌＯ〜２０Ａ／ｄｍ２にて通電
した場合、第１図のように劣化エツチング液中のニッケ
ルイオンＮｉ１４は陽イオン交換膜Ｃを通じて隣接する
ニッケル回収室に移行すると同時に鉱酸又は鉱酸の鉄塩
水溶液中の水素イオン又は鉄イオンはエツチング液室に
移行する。か（して、通電により、ニッケルイオンと水
素イオン又は鉄イオンの置換が行なわれ、劣化エツチン
グ液中のニッケルイオンが分離除去されることになる。When a liquid is supplied to the electrodialysis tank as described above, preferably circulated, and energized preferably at 10 to 20 A/dm2, the nickel ions Ni14 in the degraded etching solution are converted to cations as shown in Figure 1. Hydrogen ions or iron ions in the mineral acid or iron salt aqueous solution of mineral acids are transferred to the etching liquid chamber at the same time as they are transferred to the adjacent nickel recovery chamber through the exchange membrane C. (Thus, by applying current, nickel ions are replaced with hydrogen ions or iron ions, and the nickel ions in the deteriorated etching solution are separated and removed.
かかる本発明による塩化鉄系の劣化エツチング液からの
ニッケルイオンの分離除去は、陽イオン交換膜の有する
物性を巧みに利用することにより初めて可能になったも
のである。即ち、陽イオン交換膜は陽イオンのうちでも
ニッケルイオンに対して、第一鉄や第二鉄イオンに対す
るよりも大きい選択透過性を有するためにエツチング液
中のニッケルイオンが陽イオン交換膜を通過して選択的
に除去されることになる。The separation and removal of nickel ions from a deteriorated iron chloride etching solution according to the present invention has been made possible for the first time by skillfully utilizing the physical properties of a cation exchange membrane. In other words, the cation exchange membrane has a higher selective permeability for nickel ions among cations than for ferrous and ferric ions, so the nickel ions in the etching solution pass through the cation exchange membrane. It will be selectively removed.
上記本発明で使用する陽イオン交換膜としては、強酸性
乃至弱酸性で均質系又は不均質系のいずれのものも使用
できる。なかでもエツチング液が供給される画室の陰極
側の陽イオン交換膜としては、ニッケルイオンに対して
大きな選択透過性を有する、強酸性陽イオン交換膜の使
用が好ましい。一方、エツチング液が供給される画室の
陽極側の陽イオン交換膜としては、水素イオンに対して
大きな選択透過性の有する高架橋性の強酸性陽イオン交
換膜の使用が好ましい。The cation exchange membrane used in the present invention may be either strongly acidic to weakly acidic, homogeneous or heterogeneous. Among these, as the cation exchange membrane on the cathode side of the compartment to which the etching solution is supplied, it is preferable to use a strongly acidic cation exchange membrane that has a high selective permeability to nickel ions. On the other hand, as the cation exchange membrane on the anode side of the compartment to which the etching solution is supplied, it is preferable to use a highly crosslinked strongly acidic cation exchange membrane having a high selective permeability to hydrogen ions.
上記第１図では、いずれも陽イオン交換膜を使用する本
発明の例を説明したが、エツチング液が供給される画室
の陽極側のイオン交換膜として、上記陽イオン交換膜に
代えて陰イオン交換膜を使用することができる。陰イオ
ン交換膜を使用して通電した場合、鉱酸中の水素イオン
が陰イオン交換膜を通過してエツチング室に移行するか
又は、エツチング液中の鉱酸又は鉱酸塩を形成する陰イ
オンが陰イオン交換膜を通過する。かくすることにより
エツチング液からは、ニッケルイオンが分離除去される
ことになる。In FIG. 1 above, an example of the present invention using a cation exchange membrane has been explained.However, as the ion exchange membrane on the anode side of the compartment to which the etching solution is supplied, an anion exchange membrane is used instead of the cation exchange membrane. Exchange membranes can be used. When an anion exchange membrane is used and electricity is applied, hydrogen ions in the mineral acid pass through the anion exchange membrane and transfer to the etching chamber, or anions form the mineral acid or mineral salt in the etching solution. passes through the anion exchange membrane. By doing this, nickel ions are separated and removed from the etching solution.
しかしながら、上記陰イオン交換膜が使用される場合に
は、通電処理によりエツチング液中のニッケルイオンが
陽イオン交換膜を通じて除去されるとともにエツチング
液中の陰イオンも陰イオン交換膜を通じて除去される為
、エツチング液の電解質濃度が小さくなり、液の電導性
が小さくなり、電気透析槽の電圧が上昇することになる
。これを防止するため、電気透析槽の運転に応じて、鉱
酸２は鉄の鉱酸塩を添加することができる。However, when the above-mentioned anion exchange membrane is used, the nickel ions in the etching solution are removed through the cation exchange membrane and the anions in the etching solution are also removed through the anion exchange membrane by the current treatment. , the electrolyte concentration of the etching solution decreases, the conductivity of the solution decreases, and the voltage of the electrodialysis cell increases. In order to prevent this, an iron mineral acid salt can be added to the mineral acid 2 depending on the operation of the electrodialyzer.
上記本発明で使用される陰イオン交換膜としては、好ま
しくは強塩基性のイオン交換容量０．８〜１．５ミリ当
量／ｇ乾燥樹脂のものが良好に使用されろ。The anion exchange membrane used in the present invention is preferably a strongly basic ion exchange capacity of 0.8 to 1.5 milliequivalents/g dry resin.
以下に本発明を更に具体的に示すために実施例を示す。Examples are shown below to more specifically illustrate the present invention.
実施例１
第１図に示されるように、陽イオン交換膜として、スル
ホン酸型陽イオン交換膜（交換容量０．９ミリ当量／ｇ
、厚み４００μｍ）１１枚と、スルホン酸型陽イオン交
換膜（交換容量１，２ミリ当量／ｇ、厚み２５０μｍ）
１０枚とを交互に陽極、陰極間に組込んで構成したフィ
ルタープレス型電気透析槽（旭硝子製Ｄｕ−Ｏｂ型）の
エツチング液室に、性能の劣化した塩化鉄系エツチング
液（ＦｅＣ１３５８０ｇ／ｊ２ 、 ＦｅＣｌ２３４ｇ
／ρ、 ＮｉＣ１，５８ｇ／β、 ＨＣｌ ３６ｇ＃２
） ２βを供給し、一方ニッケル回収室には６Ｎ塩酸２
氾を供給して循環し、電流密度１０Ａ／ｄｍ２にて約４
時間通電した。Example 1 As shown in FIG. 1, a sulfonic acid type cation exchange membrane (exchange capacity 0.9 meq/g) was used as the cation exchange membrane.
, thickness 400 μm) and 11 sulfonic acid type cation exchange membranes (exchange capacity 1.2 meq/g, thickness 250 μm).
An iron chloride-based etching solution with degraded performance (FeC13580g/j2, FeCl234g
/ρ, NiC1,58g/β, HCl 36g#2
) 2β is supplied, while 6N hydrochloric acid 2β is supplied to the nickel recovery chamber.
Supply and circulate flood water, approximately 4 at a current density of 10 A/dm2.
Power was on for an hour.
かくして、エツチング液室から得られたエツチング液中
のＮｉＣ１５溶液は４４ｇ／ρに低下し、方、ニッケル
回収室に移動したＮｉ量は４０ｇであり、その電流効率
は約５％であり、ニッケル回収室に移動した鉄量は７０
ｇであった。In this way, the NiC15 solution in the etching solution obtained from the etching solution chamber decreased to 44 g/ρ, while the amount of Ni transferred to the nickel recovery chamber was 40 g, and the current efficiency was about 5%. The amount of iron transferred to the room was 70
It was g.
実施例２
イオン交換膜として、スルホン酸型陽イオン交換膜（交
換容量０．９ミリ当量／ｇ、厚み４００μｍ）１１枚と
、強塩基性陰イオン交換膜（交換容量１．２ミリ当量／
ｇ、厚み２５０ｇｍ）１０枚とを交互に陽極、陰極間と
組込んで構成したフィルタープレス型電気透析槽（旭硝
子製Ｄｕ−ｏｂ型）のエツチング液室（陰極側が陽イオ
ン交換膜、陽極側が陰イオン交換膜で区画される画室を
いう）に、性能の劣化した塩化鉄系エツチング液（Ｆｅ
Ｃ１ｇ ５８０ｇ／−９、ＦｅＣｌ２３４ｇ／ｆｆ 、
ＮＩＣ１２８８ｇ／β、 ＨＣｌ ５４ｇ／Ｉ２）
２ ｎを供給し、一方ニッケル回収室（陰極側が陰イオ
ン交換膜、陽極側が陽イオン交換膜で区画される画室を
いう）には６Ｎ塩酸２℃を供給して循環し、電流密度３
Ａ ／ ｄ ｍ ２にて約５時間通電した。Example 2 As ion exchange membranes, 11 sulfonic acid type cation exchange membranes (exchange capacity 0.9 meq/g, thickness 400 μm) and strongly basic anion exchange membranes (exchange capacity 1.2 meq/g) were used.
Etching liquid chamber of a filter press type electrodialysis tank (Du-ob type manufactured by Asahi Glass) consisting of 10 sheets (250 gm, thickness 250 gm) installed alternately between the anode and the cathode (the cathode side is the cation exchange membrane, the anode side is the anode side). An iron chloride-based etching solution (Fe
C1g 580g/-9, FeCl234g/ff,
NIC1288g/β, HCl 54g/I2)
2n was supplied, while 6N hydrochloric acid was supplied at 2°C to the nickel recovery chamber (a compartment partitioned by an anion exchange membrane on the cathode side and a cation exchange membrane on the anode side) and circulated at a current density of 3.
Electricity was applied at A/dm2 for about 5 hours.
かくして、エツチング液室から得られたエツチング液中
のＮｉＣ１゜溶液は７１ｇ／βに低下し、方、ニッケル
回収室に移動したＮｌ量は１５ｇであり、その電流効率
は約５％であり、ニッケル回収室に移動した鉄量は５０
ｇであった。Thus, the NiC 1° solution in the etching solution obtained from the etching solution chamber decreased to 71 g/β, while the amount of Nl transferred to the nickel recovery chamber was 15 g, and its current efficiency was about 5%. The amount of iron transferred to the recovery room was 50.
It was g.
［発明の効果］
本発明の方法によれば、ニッケルー鉄合金を塩化鉄系エ
ツチング液にてエツチングすることにより、ニッケルイ
オン濃度の増加した劣化エツチング液から、ニッケルイ
オンを移動、除去し、エツチング液中のニッケルイオン
濃度を管理することが可能である。[Effects of the Invention] According to the method of the present invention, by etching a nickel-iron alloy with an iron chloride-based etching solution, nickel ions are moved and removed from a deteriorated etching solution with increased nickel ion concentration, and the nickel ions are removed from the etching solution. It is possible to control the nickel ion concentration inside.
特にＩＣ基板のエツチング液のように精密なエツチング
を要求される用途においてその寄与は大きい。In particular, its contribution is large in applications that require precise etching, such as an etching solution for IC substrates.
第１図は本発明の詳細な説明するためのものである。 Ｃ・・・陽イオン交換膜 FIG. 1 provides a detailed explanation of the invention. C...Cation exchange membrane
Claims (5)
膜と陰イオン交換膜とを交互に配列して構成される電気
透析槽内の陽極側が陽イオン交換膜又は陰イオン交換膜
で、陰極側が陽イオン交換膜で区画される一つおきの画
室に鉄−ニッケル合金のエッチング液を供給し、それに
隣接する残る一つおきの画室に鉱酸又は鉄の鉱酸塩水溶
液を供給して通電し、上記エッチング液からニッケルを
分離することを特徴とする鉄−ニッケル合金のエッチン
グ液の処理方法。(1) The anode side of the electrodialysis tank, which is constructed by alternately arranging a plurality of cation exchange membranes or cation exchange membranes and anion exchange membranes between the electrodes, is a cation exchange membrane or an anion exchange membrane, An iron-nickel alloy etching solution is supplied to every other compartment whose cathode side is partitioned by a cation exchange membrane, and a mineral acid or iron mineral salt aqueous solution is supplied to every other remaining compartment adjacent to it. A method for treating an etching solution for an iron-nickel alloy, which comprises applying electricity to separate nickel from the etching solution.
ン交換膜がニッケルイオン選択性透過膜であり、上記画
室の陽極側の陽イオン交換膜が、水素イオン選択性透過
膜である請求項（１）の方法。(2) The cation exchange membrane on the cathode side of the compartment to which the etching solution is supplied is a nickel ion selective permeable membrane, and the cation exchange membrane on the anode side of the compartment is a hydrogen ion selective permeable membrane. Method (1).
求項（１）又は（２）の方法。(3) The method of claim (1) or (2), wherein the etching solution is an aqueous solution of ferric chloride in hydrochloric acid.
１），（２）又は（３）の処理方法。(4) Claim in which the mineral acid is hydrochloric acid with a concentration of 0.1 to 12N (
1), (2) or (3) processing method.
項（１），（２），（３），又は（４）の処理方法。(5) The treatment method according to claim (1), (2), (3), or (4), wherein the current density is 0.1 to 30 A/dm^2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8916490A JPH03287790A (en) | 1990-04-05 | 1990-04-05 | Treatment of liquid etchant for iron-nickel alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8916490A JPH03287790A (en) | 1990-04-05 | 1990-04-05 | Treatment of liquid etchant for iron-nickel alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03287790A true JPH03287790A (en) | 1991-12-18 |
Family
ID=13963176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8916490A Pending JPH03287790A (en) | 1990-04-05 | 1990-04-05 | Treatment of liquid etchant for iron-nickel alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03287790A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995024518A1 (en) * | 1994-03-07 | 1995-09-14 | Mib Metallurgie Und Oberflächentechnik Und Innovation In Berlin Gmbh & Co. | Electrolysis process for regenerating a ferric chloride or sulphate solution, in particular for spray etching steel |
-
1990
- 1990-04-05 JP JP8916490A patent/JPH03287790A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995024518A1 (en) * | 1994-03-07 | 1995-09-14 | Mib Metallurgie Und Oberflächentechnik Und Innovation In Berlin Gmbh & Co. | Electrolysis process for regenerating a ferric chloride or sulphate solution, in particular for spray etching steel |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3385553B2 (en) | Electric deionized water production apparatus and deionized water production method | |
| US2794777A (en) | Electrolytic deionization | |
| JPH10128338A (en) | Method and device for preventing scale from being deposited in electric regeneration type continuous desalting apparatus | |
| JP4855068B2 (en) | Electric deionized water production apparatus and deionized water production method | |
| WO2005075359A1 (en) | Apparatus for forming ion-exchanged water and method for regenerating ion exchange resin therein | |
| JP3956836B2 (en) | Electrodeionization equipment | |
| JP5868421B2 (en) | Electrodeionization equipment | |
| CN109987682A (en) | A kind of wide water temperature module of continuous electric desalination | |
| JP4403621B2 (en) | Electrodeionization equipment | |
| JP3512425B2 (en) | Electrochemical treatment of ion exchange materials | |
| JP3644759B2 (en) | Electric regenerative pure water manufacturing method and pure water manufacturing apparatus | |
| JP2001079553A (en) | Method for packing ion exchanger in electric deionizer, and electric deionizer | |
| JP6042234B2 (en) | Desalination method and desalting apparatus | |
| JP4146649B2 (en) | Process for producing dealkalized water glass and apparatus for producing the same | |
| JP6163078B2 (en) | Desalination method and desalting apparatus | |
| JP4597388B2 (en) | Electric deionized water production apparatus and deionized water production method | |
| JPH03287790A (en) | Treatment of liquid etchant for iron-nickel alloy | |
| JPH07299333A (en) | Regeneration of organic acid | |
| JP5492612B2 (en) | Electric deionized water production equipment | |
| GB2383275A (en) | Ion exchange column regeneration by electrodialysis | |
| JP2003326270A (en) | Electric regenerative demineralizer | |
| JP6994351B2 (en) | Electric deionized water production equipment | |
| JP4431710B2 (en) | ION CONDUCTIVE SPACER, METHOD FOR PRODUCING THE SAME, ELECTRIC DESALTING DEVICE | |
| JP4660890B2 (en) | Operation method of electrodeionization equipment | |
| Strathmann et al. | Effluent Free Electrolytic Regeneration of Ion-Exchange Resins |