JPH0328051B2 - - Google Patents

Info

Publication number
JPH0328051B2
JPH0328051B2 JP11764581A JP11764581A JPH0328051B2 JP H0328051 B2 JPH0328051 B2 JP H0328051B2 JP 11764581 A JP11764581 A JP 11764581A JP 11764581 A JP11764581 A JP 11764581A JP H0328051 B2 JPH0328051 B2 JP H0328051B2
Authority
JP
Japan
Prior art keywords
cassette
substrate
electron beam
beam exposure
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11764581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5821327A (ja
Inventor
Shinichi Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP11764581A priority Critical patent/JPS5821327A/ja
Publication of JPS5821327A publication Critical patent/JPS5821327A/ja
Publication of JPH0328051B2 publication Critical patent/JPH0328051B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3435Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11764581A 1981-07-29 1981-07-29 電子ビ−ム露光装置用基板ホルダ Granted JPS5821327A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11764581A JPS5821327A (ja) 1981-07-29 1981-07-29 電子ビ−ム露光装置用基板ホルダ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11764581A JPS5821327A (ja) 1981-07-29 1981-07-29 電子ビ−ム露光装置用基板ホルダ

Publications (2)

Publication Number Publication Date
JPS5821327A JPS5821327A (ja) 1983-02-08
JPH0328051B2 true JPH0328051B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-04-17

Family

ID=14716808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11764581A Granted JPS5821327A (ja) 1981-07-29 1981-07-29 電子ビ−ム露光装置用基板ホルダ

Country Status (1)

Country Link
JP (1) JPS5821327A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4777371A (en) * 1985-05-06 1988-10-11 Siemens Aktiengesellschaft Support material for electron beam systems

Also Published As

Publication number Publication date
JPS5821327A (ja) 1983-02-08

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