JPH0327120U - - Google Patents
Info
- Publication number
- JPH0327120U JPH0327120U JP8837989U JP8837989U JPH0327120U JP H0327120 U JPH0327120 U JP H0327120U JP 8837989 U JP8837989 U JP 8837989U JP 8837989 U JP8837989 U JP 8837989U JP H0327120 U JPH0327120 U JP H0327120U
- Authority
- JP
- Japan
- Prior art keywords
- balanced
- unbalanced
- converter
- output
- adjustment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
Description
第１図は本発明の一実施例を示す構成ブロツク
図、第２図はチヤージアツプの説明図、第３図は
従来のプラズマＣＶＤの構成ブロツク図、第４図
は不平衡−平衡変換器を用いた給電方式の説明図
、第５図はマツチング回路を挿入した給電方式の
説明図である。
１…高周波発振器、７…放電室、８，９…電極
、２０…不平衡−平衡変換器、Ｃ１〜Ｃ３…可変
コンデンサ、Ｌ１，Ｌ２…インダクタ。
Fig. 1 is a configuration block diagram showing an embodiment of the present invention, Fig. 2 is an explanatory diagram of charge up, Fig. 3 is a configuration block diagram of conventional plasma CVD, and Fig. 4 is an unbalanced-balanced converter. FIG. 5 is an explanatory diagram of a power supply system in which a matching circuit is inserted. DESCRIPTION OF SYMBOLS 1... High frequency oscillator, 7... Discharge chamber, 8, 9... Electrode, 20... Unbalanced-balanced converter, C1-C3... Variable capacitor, L1, L2... Inductor.
Claims (1)
−平衡変換器と、該不平衡−平衡変換器の平衡出
力側にそれぞれインピーダンス整合用の調整回路
を設け、これら調整回路で位相を１８０°異なら
しめると共に、インピーダンスを整合して放電室
の電極に印加するように構成した平衡給電回路。 A bridge type unbalanced-balanced converter that receives the output of the high-frequency oscillator, and an adjustment circuit for impedance matching are provided on the balanced output side of the unbalanced-balanced converter, and these adjustment circuits make the phases different by 180 degrees, and A balanced power supply circuit configured to match impedance and apply it to the electrodes in the discharge chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8837989U JPH0327120U (en) | 1989-07-26 | 1989-07-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8837989U JPH0327120U (en) | 1989-07-26 | 1989-07-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0327120U true JPH0327120U (en) | 1991-03-19 |
Family
ID=31637998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8837989U Pending JPH0327120U (en) | 1989-07-26 | 1989-07-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0327120U (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002508883A (en) * | 1997-07-05 | 2002-03-19 | サーフィス テクノロジー システムズ ピーエルシー | Plasma processing equipment |
| KR100955359B1 (en) * | 2004-09-06 | 2010-04-30 | 도쿄엘렉트론가부시키가이샤 | Plasma processing apparatus |
| WO2010055669A1 (en) * | 2008-11-12 | 2010-05-20 | 株式会社アルバック | Electrode circuit, film formation device, electrode unit, and film formation method |
| KR101497483B1 (en) * | 2013-09-06 | 2015-03-02 | 삼성중공업 주식회사 | Painting Device |
| JP2019174099A (en) * | 2018-03-29 | 2019-10-10 | エヌエックスピー ユーエスエイ インコーポレイテッドＮＸＰ ＵＳＡ，Ｉｎｃ． | Defrosting apparatus and methods of operation thereof |
| US10771036B2 (en) | 2017-11-17 | 2020-09-08 | Nxp Usa, Inc. | RF heating system with phase detection for impedance network tuning |
| US10785834B2 (en) | 2017-12-15 | 2020-09-22 | Nxp Usa, Inc. | Radio frequency heating and defrosting apparatus with in-cavity shunt capacitor |
| US10917948B2 (en) | 2017-11-07 | 2021-02-09 | Nxp Usa, Inc. | Apparatus and methods for defrosting operations in an RF heating system |
| US10952289B2 (en) | 2018-09-10 | 2021-03-16 | Nxp Usa, Inc. | Defrosting apparatus with mass estimation and methods of operation thereof |
| US11039512B2 (en) | 2016-08-05 | 2021-06-15 | Nxp Usa, Inc. | Defrosting apparatus with lumped inductive matching network and methods of operation thereof |
| US11039511B2 (en) | 2018-12-21 | 2021-06-15 | Nxp Usa, Inc. | Defrosting apparatus with two-factor mass estimation and methods of operation thereof |
| US11166352B2 (en) | 2018-12-19 | 2021-11-02 | Nxp Usa, Inc. | Method for performing a defrosting operation using a defrosting apparatus |
| US11382190B2 (en) | 2017-12-20 | 2022-07-05 | Nxp Usa, Inc. | Defrosting apparatus and methods of operation thereof |
| US11632829B2 (en) | 2016-08-05 | 2023-04-18 | Nxp Usa, Inc. | Apparatus and methods for detecting defrosting operation completion |
| US11800608B2 (en) | 2018-09-14 | 2023-10-24 | Nxp Usa, Inc. | Defrosting apparatus with arc detection and methods of operation thereof |
-
1989
- 1989-07-26 JP JP8837989U patent/JPH0327120U/ja active Pending
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002508883A (en) * | 1997-07-05 | 2002-03-19 | サーフィス テクノロジー システムズ ピーエルシー | Plasma processing equipment |
| KR100955359B1 (en) * | 2004-09-06 | 2010-04-30 | 도쿄엘렉트론가부시키가이샤 | Plasma processing apparatus |
| TWI402911B (en) * | 2004-09-06 | 2013-07-21 | Tokyo Electron Ltd | Plasma processing device |
| WO2010055669A1 (en) * | 2008-11-12 | 2010-05-20 | 株式会社アルバック | Electrode circuit, film formation device, electrode unit, and film formation method |
| JPWO2010055669A1 (en) * | 2008-11-12 | 2012-04-12 | 株式会社アルバック | Electrode circuit, film forming apparatus, electrode unit, and film forming method |
| KR101497483B1 (en) * | 2013-09-06 | 2015-03-02 | 삼성중공업 주식회사 | Painting Device |
| US11039512B2 (en) | 2016-08-05 | 2021-06-15 | Nxp Usa, Inc. | Defrosting apparatus with lumped inductive matching network and methods of operation thereof |
| US11632829B2 (en) | 2016-08-05 | 2023-04-18 | Nxp Usa, Inc. | Apparatus and methods for detecting defrosting operation completion |
| US10917948B2 (en) | 2017-11-07 | 2021-02-09 | Nxp Usa, Inc. | Apparatus and methods for defrosting operations in an RF heating system |
| US10771036B2 (en) | 2017-11-17 | 2020-09-08 | Nxp Usa, Inc. | RF heating system with phase detection for impedance network tuning |
| US10785834B2 (en) | 2017-12-15 | 2020-09-22 | Nxp Usa, Inc. | Radio frequency heating and defrosting apparatus with in-cavity shunt capacitor |
| US11382190B2 (en) | 2017-12-20 | 2022-07-05 | Nxp Usa, Inc. | Defrosting apparatus and methods of operation thereof |
| US11570857B2 (en) | 2018-03-29 | 2023-01-31 | Nxp Usa, Inc. | Thermal increase system and methods of operation thereof |
| JP2019174099A (en) * | 2018-03-29 | 2019-10-10 | エヌエックスピー ユーエスエイ インコーポレイテッドＮＸＰ ＵＳＡ，Ｉｎｃ． | Defrosting apparatus and methods of operation thereof |
| US10952289B2 (en) | 2018-09-10 | 2021-03-16 | Nxp Usa, Inc. | Defrosting apparatus with mass estimation and methods of operation thereof |
| US11800608B2 (en) | 2018-09-14 | 2023-10-24 | Nxp Usa, Inc. | Defrosting apparatus with arc detection and methods of operation thereof |
| US11166352B2 (en) | 2018-12-19 | 2021-11-02 | Nxp Usa, Inc. | Method for performing a defrosting operation using a defrosting apparatus |
| US11039511B2 (en) | 2018-12-21 | 2021-06-15 | Nxp Usa, Inc. | Defrosting apparatus with two-factor mass estimation and methods of operation thereof |
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