JPH03268382A - Manufacture of semiconductor laser device - Google Patents
Manufacture of semiconductor laser deviceInfo
- Publication number
- JPH03268382A JPH03268382A JP6756390A JP6756390A JPH03268382A JP H03268382 A JPH03268382 A JP H03268382A JP 6756390 A JP6756390 A JP 6756390A JP 6756390 A JP6756390 A JP 6756390A JP H03268382 A JPH03268382 A JP H03268382A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- adhesion
- deposition
- preventing
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000000034 method Methods 0.000 claims abstract description 13
- 230000008021 deposition Effects 0.000 claims description 11
- 238000007740 vapor deposition Methods 0.000 abstract description 14
- 238000000151 deposition Methods 0.000 description 12
- 230000002265 prevention Effects 0.000 description 7
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0201—Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は半導体レーザダイオード等において、端面を
保護し且つ所定の反射率に加工する為の蒸着膜を形成す
る半導体レーザ装置の製造方法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a semiconductor laser device, which forms a vapor deposited film to protect the end face of a semiconductor laser diode or the like and process it to a predetermined reflectance. It is.
第2図(a)(b)は従来の半導体レーザダイオードの
骨間端面の蒸着方法を示す斜視図で、図(a)において
、(1)f−11:半導体レーザダイオードバー、(2
)はバーホルダー治具、(3)はバー締付ポルl−、(
4)は蒸着源蒸気を示している。ま九図(b)において
、(5)はチップ分離溝、(6)は共振器端面である。FIGS. 2(a) and 2(b) are perspective views showing a conventional vapor deposition method for the interosseous end surface of a semiconductor laser diode. In FIG. 2(a), (1) f-11: semiconductor laser diode bar;
) is a bar holder jig, (3) is a bar tightening pole l-, (
4) indicates the vapor deposition source. In Figure 9(b), (5) is the chip separation groove, and (6) is the resonator end face.
次に動作について説明する。Next, the operation will be explained.
従来半導体レーザダイオードの共振器端面に蒸着膜を形
成する場合、特に1度に多数個の半導体レーザダイオー
ドチップに対して均一な蒸着膜を形成する時K、各半導
体レーザダイオードチップの共振器端面(6)が同一平
面上に並んだ半導体レーザダイオードバー(1)を形成
し、この半導体レーザダイオードバー(1)をバーホル
ダー治具(2)に、多数セットし、バー締付ポルト(3
)で固定し、蒸着源蒸気(4)により、半導体レーザダ
イオードバー(1)の端面(6)に膜の形成を行なう。Conventionally, when forming a deposited film on the resonator end face of a semiconductor laser diode, especially when forming a uniform deposited film on a large number of semiconductor laser diode chips at once, the resonator end face of each semiconductor laser diode chip ( 6) form semiconductor laser diode bars (1) lined up on the same plane, set a large number of these semiconductor laser diode bars (1) in a bar holder jig (2), and tighten the bar tightening port (3).
), and a film is formed on the end face (6) of the semiconductor laser diode bar (1) using the vapor deposition source (4).
なお半導体レーザダイオードバー(1)の厚みは約10
0μmである。The thickness of the semiconductor laser diode bar (1) is approximately 10
It is 0 μm.
〔発明が解決しようとする課題]
半導体レーザダイオードをコンパクトディスク等に応用
する際、ディスクのトラッキング機構として、3ビ一ム
方式がある。この方式はレーザビ−ムを回折格子により
3つに分解し、信号読取用主ビームの他にトラッキング
補正用のサブビームを2つ設けて、ディスク上で反射さ
れる2つのサブビームの強度により、トラッキング状態
を検知し補正するものである。この方式ではディスクか
らのサブビームの一方がレーザダイオード共振器端面に
戻ってくることが避けられず、その戻って来た光がレー
ザダイオード共振器端面で反射され、再びディスク上に
照射されることにより1本来のサブビームと干渉し、2
つのサブビームの強度のバランスがくずれ、正確なトラ
ッキングが出来なくなるという問題点があった。[Problems to be Solved by the Invention] When a semiconductor laser diode is applied to a compact disc or the like, there is a three-beam system as a tracking mechanism for the disc. In this method, the laser beam is separated into three parts by a diffraction grating, and in addition to the main beam for signal reading, two sub-beams are provided for tracking correction.The tracking state is determined by the intensity of the two sub-beams reflected on the disk. It detects and corrects. In this method, it is unavoidable that one of the sub-beams from the disk returns to the laser diode resonator end face, and the returned light is reflected by the laser diode resonator end face and is irradiated onto the disc again. 1 interferes with the original sub-beam, 2
There was a problem in that the intensity of the two sub-beams was unbalanced, making accurate tracking impossible.
第3図にレーザダイオード共振器端面にサブビームが戻
った状態を示す。図中、(7)が発光点、(8)がサブ
ビーム戻り点、(9)が放熱体である。レーザ発光点(
7)からサブビーム戻り点(8)までの距離は約50〜
100#口程度であるう
以上のことより共振器端面上で、サブビーム戻り点付近
は発光点付近に比べて反射率の非常に低い膜を形成する
必要があった。しかしながら、従来の蒸着方法ではレー
ザチップ同一共振器面内に相異なる反射率を有する蒸着
膜を形成することは不可能であるという問題点があった
。FIG. 3 shows the state in which the sub-beam returns to the end face of the laser diode resonator. In the figure, (7) is a light emitting point, (8) is a sub-beam return point, and (9) is a heat sink. Laser emission point (
The distance from 7) to the sub-beam return point (8) is approximately 50~
For this reason, it was necessary to form a film on the resonator end face with a much lower reflectance near the sub-beam return point than near the light emitting point. However, the conventional deposition method has a problem in that it is impossible to form deposited films having different reflectances within the same resonator plane of a laser chip.
この発明は上記の様な問題点を解消するためになされた
もので、従来技術の利点である一度に多数個のレーザチ
ップに対して均一な蒸着膜を形成する特徴を損なわずに
、レーザダイオードの同一共振器面内に複数種の反射率
を有する蒸着膜を形成することが出来る半導体V−ザ装
置の製造方法を得ることを目的とする。This invention was made in order to solve the above-mentioned problems, and it is possible to improve the performance of laser diodes without impairing the advantage of the conventional technology, which is the ability to form a uniform deposition film on a large number of laser chips at once. An object of the present invention is to obtain a method for manufacturing a semiconductor V-za device that can form deposited films having a plurality of types of reflectance within the same resonator plane.
〔課題を解決するための手段J
この発明に係る半導体レーザ装置の製造方法は、被蒸着
部以外に蒸着膜の付着を阻止する様な防着板をバーホル
ダー治具に設けるようにして蒸着するようにしたもので
ある。[Means for Solving the Problems J] A method for manufacturing a semiconductor laser device according to the present invention performs vapor deposition by providing a bar holder jig with an anti-deposition plate that prevents the deposition film from adhering to a portion other than the portion to be vapor-deposited. This is how it was done.
[作用]
この発明における蒸着方法は、被蒸着部以外の部分に蒸
着膜が形成されない様に、防着板をパーホルダー治具に
取付けることにより、同一面内に複数種の蒸着膜を形成
することができる。[Function] The vapor deposition method of the present invention forms multiple types of vapor deposited films within the same plane by attaching a deposition prevention plate to a par holder jig so that the vapor deposited film is not formed on parts other than the part to be vapor deposited. be able to.
以下、この発明の一実施例を図について説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第1図において、(1)はレーザダイオードバー、(2
)はパーホルダー治具、(3)はバー締付ポル) 、
(4)は蒸着源蒸気、(10)は防着板である。In Figure 1, (1) is a laser diode bar, (2
) is a par holder jig, (3) is a bar tightening pole),
(4) is the vapor deposition source vapor, and (10) is the deposition prevention plate.
次に動作について説明する。Next, the operation will be explained.
従来の技術と同様に、レーザダイオードバー(1)ラバ
ーホルダー治具(2)に多数個セットし、バー締付ボル
ト(3)で固定した後に、所望の防着部をおおう様に加
工され九防着板(10)を、パーホルダー治具(2)の
蒸着源蒸気(4)の側に取りつけて薄着を行なう。Similar to the conventional technology, a large number of laser diode bars (1) are set in a rubber holder jig (2), fixed with bar tightening bolts (3), and then processed to cover the desired anti-seize area. The deposition prevention plate (10) is attached to the vapor deposition source vapor (4) side of the par holder jig (2) to perform thin deposition.
この防着板の有無による蒸着1[t−レーザダイオード
端面内で、多種変えることが可能となり、又、防着板の
加工を変えることで防着領域を変化させることができる
。Depending on the presence or absence of this deposition prevention plate, it is possible to vary the deposition 1 [t-laser diode end facet] in a wide variety of ways, and by changing the processing of the deposition prevention plate, the deposition prevention area can be changed.
以上の様にこの発明によれば、同一平面にあるレーザダ
イオード端面内に、数数種の反射率を有する蒸着膜を所
望の領域へ蒸着することができ、作業性が容易で、安定
したレーザダイオードが得られる効果がある。As described above, according to the present invention, it is possible to deposit a vapor deposition film having several types of reflectance in a desired area within the end face of a laser diode that is on the same plane, which facilitates workability and provides a stable laser beam. This has the effect of a diode.
第1図はこの発明の一実施例による半導体レーザ装置の
製造方法を示す斜視図、第2図(aHb)は従来の半導
体レーザ装置の製造方法を示す斜視図、第3図は従来の
共振器の発光点と戻り光点を示す斜視図である。
図において、(1)はレーザダイオードバー、(2)ハ
バーホルダー治具、(10)は防着板を示すっなお、図
中同一符号は同一、又は相当部分を示すOFIG. 1 is a perspective view showing a method for manufacturing a semiconductor laser device according to an embodiment of the present invention, FIG. 2 (aHb) is a perspective view showing a method for manufacturing a conventional semiconductor laser device, and FIG. 3 is a perspective view showing a method for manufacturing a conventional semiconductor laser device. FIG. 3 is a perspective view showing a light emitting point and a returning light point. In the figure, (1) indicates the laser diode bar, (2) the huber holder jig, and (10) the adhesion prevention plate.
Claims (1)
に並んだバーを共振器端面に蒸着する様にセットしたホ
ルダー治具に、前記共振器端面の所望部分に蒸着膜を形
成させない様な防着板脱着をし、2種以上の蒸着膜を得
ることを特徴とした半導体レーザ装置の製造方法。A holder jig in which bars in which the cavity end faces of a plurality of semiconductor laser chips are lined up in the same plane is set so as to be deposited on the cavity end face is equipped with a holder jig that prevents the deposition film from being formed on a desired portion of the cavity end face. A method for manufacturing a semiconductor laser device, characterized by attaching and detaching plates and obtaining two or more types of deposited films.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6756390A JPH03268382A (en) | 1990-03-16 | 1990-03-16 | Manufacture of semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6756390A JPH03268382A (en) | 1990-03-16 | 1990-03-16 | Manufacture of semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03268382A true JPH03268382A (en) | 1991-11-29 |
Family
ID=13348555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6756390A Pending JPH03268382A (en) | 1990-03-16 | 1990-03-16 | Manufacture of semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03268382A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0558856A2 (en) * | 1992-03-04 | 1993-09-08 | Sharp Kabushiki Kaisha | A method for producing a semiconductor laser device |
EP0806494A1 (en) * | 1996-05-09 | 1997-11-12 | Lucent Technologies Inc. | Method and fixture for laser bar facet coating |
KR100361036B1 (en) * | 2000-02-07 | 2002-11-18 | 한국과학기술연구원 | Sample holder apparatus of semicondutor optical devices chip for antireflection coatings |
KR100972311B1 (en) * | 2008-02-28 | 2010-07-26 | 경희대학교 산학협력단 | Sample holder for coating high-reflectivity mirror facet of semiconductor laser diode and method for coating thereof |
JP2013058593A (en) * | 2011-09-08 | 2013-03-28 | Mitsubishi Electric Corp | Semiconductor laser element manufacturing apparatus and manufacturing method |
CN104218446A (en) * | 2014-09-22 | 2014-12-17 | 山东华光光电子有限公司 | Strip installing device and strip installing method for semiconductor laser |
-
1990
- 1990-03-16 JP JP6756390A patent/JPH03268382A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0558856A2 (en) * | 1992-03-04 | 1993-09-08 | Sharp Kabushiki Kaisha | A method for producing a semiconductor laser device |
EP0806494A1 (en) * | 1996-05-09 | 1997-11-12 | Lucent Technologies Inc. | Method and fixture for laser bar facet coating |
JPH1056232A (en) * | 1996-05-09 | 1998-02-24 | Lucent Technol Inc | Coating method for laser buffer set and securing unit therefor |
US5911830A (en) * | 1996-05-09 | 1999-06-15 | Lucent Technologies Inc. | Method and fixture for laser bar facet coating |
US6037006A (en) * | 1996-05-09 | 2000-03-14 | Lucent Technologies Inc. | Method and fixture for laser bar facet coating |
KR100361036B1 (en) * | 2000-02-07 | 2002-11-18 | 한국과학기술연구원 | Sample holder apparatus of semicondutor optical devices chip for antireflection coatings |
KR100972311B1 (en) * | 2008-02-28 | 2010-07-26 | 경희대학교 산학협력단 | Sample holder for coating high-reflectivity mirror facet of semiconductor laser diode and method for coating thereof |
JP2013058593A (en) * | 2011-09-08 | 2013-03-28 | Mitsubishi Electric Corp | Semiconductor laser element manufacturing apparatus and manufacturing method |
CN104218446A (en) * | 2014-09-22 | 2014-12-17 | 山东华光光电子有限公司 | Strip installing device and strip installing method for semiconductor laser |
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