JPH03239202A - Surface high reflecting mirror - Google Patents
Surface high reflecting mirrorInfo
- Publication number
- JPH03239202A JPH03239202A JP3581090A JP3581090A JPH03239202A JP H03239202 A JPH03239202 A JP H03239202A JP 3581090 A JP3581090 A JP 3581090A JP 3581090 A JP3581090 A JP 3581090A JP H03239202 A JPH03239202 A JP H03239202A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- chromium sulfide
- silver
- reflection mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims abstract description 94
- 239000000758 substrate Substances 0.000 claims abstract description 33
- DBULDCSVZCUQIR-UHFFFAOYSA-N chromium(3+);trisulfide Chemical compound [S-2].[S-2].[S-2].[Cr+3].[Cr+3] DBULDCSVZCUQIR-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052709 silver Inorganic materials 0.000 claims abstract description 19
- 239000004332 silver Substances 0.000 claims abstract description 19
- 239000011241 protective layer Substances 0.000 claims abstract description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 16
- 239000004033 plastic Substances 0.000 abstract description 12
- 229920003023 plastic Polymers 0.000 abstract description 12
- 229920000515 polycarbonate Polymers 0.000 abstract description 5
- 239000004417 polycarbonate Substances 0.000 abstract description 5
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 229920000728 polyester Polymers 0.000 abstract description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 238000012360 testing method Methods 0.000 description 10
- 238000007738 vacuum evaporation Methods 0.000 description 10
- 229920000178 Acrylic resin Polymers 0.000 description 7
- 239000004925 Acrylic resin Substances 0.000 description 7
- 229920005668 polycarbonate resin Polymers 0.000 description 6
- 239000004431 polycarbonate resin Substances 0.000 description 6
- 239000004645 polyester resin Substances 0.000 description 6
- 229920001225 polyester resin Polymers 0.000 description 6
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 5
- 229910001936 tantalum oxide Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005486 sulfidation Methods 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- 101100130497 Drosophila melanogaster Mical gene Proteins 0.000 description 1
- 101100345589 Mus musculus Mical1 gene Proteins 0.000 description 1
- 241000208125 Nicotiana Species 0.000 description 1
- 235000002637 Nicotiana tabacum Nutrition 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- -1 etc. has developed Polymers 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- YPMOSINXXHVZIL-UHFFFAOYSA-N sulfanylideneantimony Chemical compound [Sb]=S YPMOSINXXHVZIL-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、カメラ、望遠鏡、顕微鏡等の光学製品に使用
される表面反射多層膜を有する表面高反射鏡に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a high surface reflection mirror having a surface reflection multilayer film used in optical products such as cameras, telescopes, and microscopes.
光学製品に使用される表面高反射鏡の反射材料としては
、一般的には、可視から近赤外の範囲に渡って反射率が
高い銀が使用されている。しかしながら、銀を使用する
場合、単層膜では膜付着性、耐湿性、耐硫化性等の点で
劣るという問題がある。Silver, which has a high reflectance in the visible to near-infrared range, is generally used as a reflective material for high-surface reflectance mirrors used in optical products. However, when using silver, there is a problem that a single layer film is inferior in terms of film adhesion, moisture resistance, sulfidation resistance, etc.
このため銀の単層膜に下地層と、保護層とを形成した多
層膜構成とし、膜付着性、耐湿性、耐硫化性等を付与し
ている。For this reason, a multilayer film structure is used in which a base layer and a protective layer are formed on a single layer film of silver, thereby imparting film adhesion, moisture resistance, sulfidation resistance, etc.
例えば、第３図に示すように、４層構造として、基板ｌ
ｅ上に酸化アルミニウムからなる下地層２ｅを形成し、
下地層２ｅ上に銀からなる反射層３ｅを形成し、さらに
反射層３ｅ上に保護層として、酸化アルミニウム層４ｅ
と、二酸化ケイ素層５ｅとを順次形成した例（’Ｒｅｆ
ｌｅｃｔａｎｃｅ ａｎｄ ｄｕｒａｂｉｌｉｔｙ ｏ
ｆ Ａｇ ｍａｒｒｏｒｓ ｃｏａｔｅｄ ｗｉｔｈ
ｔｈｉｎ １ａｙｅｒｓ ｏｆ Ａｌ２Ｏ２ｐｌ、ｕｓ
ｒｅａｃｔｉｖｅｌｙ ｄｅｐｏｓｉｔｅｄ ５ｉｌ
ｉｃｏｎ ｏｘｉｄｅ、”＾ｐｐｌ、 Ｏｐｔ、 。For example, as shown in FIG.
forming a base layer 2e made of aluminum oxide on e;
A reflective layer 3e made of silver is formed on the base layer 2e, and an aluminum oxide layer 4e is further formed as a protective layer on the reflective layer 3e.
An example in which a silicon dioxide layer 5e and a silicon dioxide layer 5e are sequentially formed ('Ref
lectance and durability o
f Ag marrors coated with
thin 1ayers of Al2O2pl, us
reactively deposited 5il
icon oxide,”＾ppl, Opt, .
１４ （１９７５）、 ２６３９）がある。14 (1975), 2639).
また第４図に示すように、６層構造として、基板１ｆ上
に銅からなる下地層２ｆを形成し、下地層２ｒ上に銀か
らなる反射層３ｆを形成し、さらに反射層３ｆ上に保護
層として、酸化アルミニウム層４ｆと、酸化タンタル層
５ｆと、二酸化ケイ素層６ｆと、酸化タンタル層７ｆと
を順次形成した例（′″Ｐｒｏｇｒｅｓｓ １ｎｔｈｅ
ｄｅｖｅｌｏｐｍｅｎｔ ｏｆ ａ ｄｕｒａｂｌｅ
５ｉｌｖｅｒ−ｂａｓｅｄ ｈｉｇｈ−ｒｅｆｌｅｃ
ｔａｎｃｅ ｃｏａｔｉｎｇ ｆｏｒ ａｓｔｒｏｎｏ
ｍｉｃａｌ ｔｅｌｅｓｃｏｐｅｓ、 ”Ａｐｐｌ、Ｏ
ｐｔ、 、 ２４ （１９８５）、 １１６４）がある
。Further, as shown in FIG. 4, in a six-layer structure, a base layer 2f made of copper is formed on the substrate 1f, a reflective layer 3f made of silver is formed on the base layer 2r, and a protective layer 3f is further formed on the reflective layer 3f. An example in which an aluminum oxide layer 4f, a tantalum oxide layer 5f, a silicon dioxide layer 6f, and a tantalum oxide layer 7f are sequentially formed as layers (''Progress 1nthe
development of a durable
5ilver-based high-reflect
tance coating for astrono
Mical telescopes, ”Appl, O
pt., 24 (1985), 1164).
上記方法は、いずれも表面高反射鏡の基板としてガラス
を使用する場合に効果を発揮する。All of the above methods are effective when glass is used as the substrate of the high surface reflection mirror.
〔発明が解決しようとする課題〕
近年、ポリカーボネート、ポリエステル、アクリル樹脂
等のプラスチック成形技術が発達し、またプラスチック
はガラスと比較して複雑な形状を簡単に成形できるとい
う利点から、光学部材としてその使用範囲も拡大してい
る。例えば、カメラに使用されているペンタプリズムは
、コスト低減のためにプラスチック化が望まれており、
内部中空のペンタ形状成形品に表面反射膜を形成した製
品も使用され始めている。しかしながら、基板がポリカ
ーボネート、ポリエステル、アクリル樹脂等のプラスチ
ックで形成されている場合は、基板がガラスで形成され
ている場合と比較して、上述と同様の膜構成では、膜付
着性、耐湿性等の点で劣るという問題点がある。[Problem to be solved by the invention] In recent years, plastic molding technology for polycarbonate, polyester, acrylic resin, etc. has developed, and plastics have the advantage of being easier to mold into complex shapes compared to glass, so they have become popular as optical members. The range of use is also expanding. For example, it is desired that pentaprisms used in cameras be made of plastic to reduce costs.
Products with a reflective film formed on the surface of a hollow penta-shaped molded product are also beginning to be used. However, when the substrate is made of plastic such as polycarbonate, polyester, or acrylic resin, the same film structure as described above has poor film adhesion, moisture resistance, etc. compared to when the substrate is made of glass. There is a problem that it is inferior in terms of.
従って本発明の目的は、基板がポリカーボネート、ポリ
エステル、アクリル樹脂等のプラスチックで形成されて
いる場合においても、膜付着性、耐湿性等に優れた表面
高反射鏡を提供することである。Therefore, an object of the present invention is to provide a high surface reflection mirror that has excellent film adhesion, moisture resistance, etc. even when the substrate is made of plastic such as polycarbonate, polyester, or acrylic resin.
上記目的に鑑み鋭意研究の結果、本発明者は、基板がポ
リカーボネート、ポリエステル、アクリル樹脂等のプラ
スチックで形成されている場合においても、膜付着性、
耐湿性等に優れた表面高反射鏡を得るためには、基板と
銀からなる反射層との付着力を強化すればよいが、硫化
クロムを下地層として基板と反射層との間に形成すれば
その付着力を強化できることを発見し、本発明に想到し
た。As a result of intensive research in view of the above objectives, the present inventors have found that even when the substrate is made of plastic such as polycarbonate, polyester, or acrylic resin, film adhesion and
In order to obtain a high-surface reflection mirror with excellent moisture resistance, etc., it is sufficient to strengthen the adhesion between the substrate and the reflective layer made of silver. The inventors discovered that the adhesive force of tobacco can be strengthened and came up with the present invention.
すなわち、本発明の表面高反射鏡は、（ａ）基板表面上
に形成された硫化クロムからなる下地層と、（５）前記
硫化クロム下地層上に形成された銀からなる反射層と、
（ｃ）前記反射層上に形成された保護層とを有すること
を特徴とする。That is, the high surface reflection mirror of the present invention includes: (a) a base layer made of chromium sulfide formed on the substrate surface; (5) a reflective layer made of silver formed on the chromium sulfide base layer;
(c) a protective layer formed on the reflective layer.
表面高反射鏡において、基板がポリカーボネート、ポリ
エステル、アクリル樹脂等のプラスチックで形成されて
いる場合においても、基板上に基板との付着性の高い硫
化クロムの下地層を形成し、その硫化クロム下地層上に
銀からなる反射層を形成すると、基板と銀からなる反射
層の膜付着力が強化される。これにより膜付着性、耐湿
性の高い表面高反射鏡が得られる。In high-reflection mirrors, even when the substrate is made of plastic such as polycarbonate, polyester, or acrylic resin, a chromium sulfide base layer with high adhesion to the substrate is formed on the substrate, and the chromium sulfide base layer When a reflective layer made of silver is formed thereon, the film adhesion between the substrate and the reflective layer made of silver is strengthened. As a result, a highly reflective mirror with high film adhesion and moisture resistance can be obtained.
第１図は、本発明の一実施例による表面高反射鏡を概略
的に示す。本表面高反射鏡は、３層構造であり、各層は
真空蒸着法、スパッタリング等により形成されている。FIG. 1 schematically shows a high surface reflection mirror according to an embodiment of the invention. This high surface reflection mirror has a three-layer structure, and each layer is formed by vacuum evaporation, sputtering, or the like.
本実施例では、ポリカーボネート、ポリエステル、アク
リル樹脂等のプラスチックで形成された基板ｌａ上に表
面高反射鏡が形成される場合を示すが、ガラス基板上に
も形成し得ることは勿論である。In this embodiment, a case is shown in which a high surface reflection mirror is formed on a substrate la made of plastic such as polycarbonate, polyester, or acrylic resin, but it goes without saying that it can also be formed on a glass substrate.
基板ｌａ上に硫化クロムからなる下地層２ａが形成され
、硫化クロム下地層２ａ上に銀からなる反射層３ａが形
成され、さらに反射層３ａ上に保護層４ａが形成されて
いる。A base layer 2a made of chromium sulfide is formed on the substrate la, a reflective layer 3a made of silver is formed on the chromium sulfide base layer 2a, and a protective layer 4a is further formed on the reflective layer 3a.
硫化クロム下地層２ａは、上記プラスチック材料からな
る基板１ａとの付着性が高い硫化クロムにより形成する
。硫化クロム下地層２ａの厚さは１０ｎｍ以上であり、
特に１５〜５０ｎｍであるのが好ましい。硫化クロム下
地層２ａの膜厚がｌＱｎｍ未満であると、十分な付着力
が得られない。The chromium sulfide base layer 2a is formed of chromium sulfide, which has high adhesion to the substrate 1a made of the above plastic material. The thickness of the chromium sulfide base layer 2a is 10 nm or more,
In particular, it is preferably 15 to 50 nm. If the thickness of the chromium sulfide base layer 2a is less than 1Q nm, sufficient adhesion cannot be obtained.
硫化クロム下地層２ａ上に形成された銀からなる反射層
３ａは、４５ｎｍ以上の膜厚を有するのが好ましく、特
に１００〜２０Ｏｒ＋ｍとするのが好ましい。膜厚が４
５ｎｍ未満であると、完全な反射とならず、ハーフミラ
−化するので、好ましくない。The reflective layer 3a made of silver formed on the chromium sulfide base layer 2a preferably has a thickness of 45 nm or more, particularly preferably 100 to 20 Or+m. Film thickness is 4
If it is less than 5 nm, complete reflection will not occur and a half mirror will result, which is not preferable.
最後に、反射層３ａ上に形成した保護層４ａは、酸化ア
ルミニウムにより形成するのが好ましく、また膜厚は２
０ｎｍ以上、特に２０〜１１００ｎであるのが好 −
６
ましい。膜厚が２０ｎｍ未満であると、反射層３ａの保
護作用が充分でない。Finally, the protective layer 4a formed on the reflective layer 3a is preferably made of aluminum oxide, and has a thickness of 2
It is preferably 0 nm or more, particularly 20 to 1100 nm. If the film thickness is less than 20 nm, the protective effect of the reflective layer 3a will not be sufficient.
第２図は、本発明の別の実施例による表面高反射鏡を概
略的に示す。この実施例では、保護層４ｂは酸化アルミ
ニウム層と透明材料からなる層との多層膜からなるが、
その他の層（下地層２ｈ及び反射層３ｂ）については、
第１図の実施例と同じである。FIG. 2 schematically shows a high surface reflection mirror according to another embodiment of the invention. In this embodiment, the protective layer 4b is made of a multilayer film including an aluminum oxide layer and a layer made of a transparent material.
Regarding other layers (base layer 2h and reflective layer 3b),
This is the same as the embodiment shown in FIG.
透明材料としては、酸化ジルコニウム、酸化タンタル、
酸化チタン、酸化セリウム、酸化ニオブ、二酸化ケイ素
、フッ化マグネシウム等の誘電体があげられ、その膜厚
は２０ｎｍ以上、特に２０〜１１００ｎであるのが好ま
しい。Transparent materials include zirconium oxide, tantalum oxide,
Dielectric materials such as titanium oxide, cerium oxide, niobium oxide, silicon dioxide, and magnesium fluoride can be used, and the film thickness thereof is preferably 20 nm or more, particularly 20 to 1100 nm.
酸化アルミニウム層と透明材料からなる層とは一層ずつ
でもよいが、交互に積層させてもよい。The aluminum oxide layer and the transparent material layer may be one layer at a time, or they may be stacked alternately.
積層の場合、各層は２〜５層程度とするのがよい。In the case of lamination, each layer is preferably about 2 to 5 layers.
本発明を以下の実施例によりさらに詳細に説明する。The present invention will be explained in further detail by the following examples.
実施例１
第１図に示す構成の表面高反射鏡を作成するために、ま
ずポリカーボネートからなる基板ｌａ上に、硫化クロム
からなる層を真空蒸着法により膜厚１５ｎｍに形成し、
硫化クロム下地層２ａとした。この硫化クロム下地層２
ａ上に反射材料として膜厚１１００ｎの銀からなる反射
層３ａを真空蒸着法により形成した。さらに反射層３ａ
上に膜厚１１００ｎの酸化アルミニウムからなる保護層
４ｃを真空蒸着法により形成し、表面高反射鏡を形成し
た。Example 1 In order to create a high surface reflection mirror having the configuration shown in FIG. 1, first, a layer of chromium sulfide was formed to a thickness of 15 nm on a polycarbonate substrate la by vacuum evaporation.
This was used as a chromium sulfide base layer 2a. This chromium sulfide base layer 2
A reflective layer 3a made of silver and having a thickness of 1100 nm was formed as a reflective material on a by vacuum evaporation. Furthermore, the reflective layer 3a
A protective layer 4c made of aluminum oxide and having a thickness of 1100 nm was formed thereon by vacuum evaporation to form a high surface reflection mirror.
この表面高反射鏡を、温度４０℃、湿度９５％Ｒ１１の
恒温室に放置し、２１６時間経過するまで２４時間毎に
セロハンテープによる剥離試験を行い、耐湿性試験を行
った。なお実際の使用を考慮すると、剥離するまでの時
間は２００時間以上が望ましい。結果を第２表に示す。This high surface reflection mirror was left in a constant temperature room with a temperature of 40° C. and a humidity of 95% R11, and a peel test using cellophane tape was performed every 24 hours until 216 hours had elapsed to perform a moisture resistance test. Note that in consideration of actual use, the time required for peeling is preferably 200 hours or more. The results are shown in Table 2.
また実施例１については、上記耐湿性試験前後で４５°
の入射光に対する分光反射率を測定した。In addition, for Example 1, the temperature was 45° before and after the above moisture resistance test.
The spectral reflectance of the incident light was measured.
結果を第５図に示す。この結果によれば、耐湿性試験の
前後で４５°入射光の分光反射率はほとんど変化せず、
また耐湿性試験後においても、波長が４３０〜７００
ｎｍの可視域では、９７％以上の高反射率が得られた。The results are shown in Figure 5. According to this result, the spectral reflectance of 45° incident light hardly changes before and after the moisture resistance test.
Also, even after the moisture resistance test, the wavelength was 430 to 700.
In the visible range of nm, a high reflectance of 97% or more was obtained.
実施例２
第２図に示す構成の表面高反射鏡を作成するために、保
護層４ｂとして酸化アルミニウム層を含む透明材料の多
層膜を形成し、それ以外は実施例１と同じ条件で表面高
反射鏡を形成した。なお、保護Ｎ４ｂは厚さ６５ｎｍの
酸化アルミニウム層と、厚さ５５ｎｍの酸化ジルコニウ
ムからなる誘電体層との２層からなる。実施例）と同様
に試験した結果、膜付着性、耐湿性については、実施例
１と同様であった。Example 2 In order to create a high surface reflection mirror having the configuration shown in FIG. Formed a reflector. Note that the protection N4b consists of two layers: a 65 nm thick aluminum oxide layer and a 55 nm thick dielectric layer made of zirconium oxide. As a result of testing in the same manner as in Example), the film adhesion and moisture resistance were the same as in Example 1.
比較例１〜２
硫化クロム下地層２ａを硫化クロムではなく、硫化亜鉛
（比較例１）及び硫化アンチモン（比較例２）により形
成し、それ以外は実施例１と同じ条件で表面高反射鏡を
形成し、実施例１と同じ耐湿性試験を行った。結果を第
１表に示す。Comparative Examples 1 to 2 The chromium sulfide base layer 2a was formed not from chromium sulfide but from zinc sulfide (Comparative Example 1) and antimony sulfide (Comparative Example 2), and other than that, a high surface reflection mirror was formed under the same conditions as in Example 1. The same moisture resistance test as in Example 1 was conducted. The results are shown in Table 1.
比較例３
第３図に示すような４層構造からなる表面高反射鏡を作
成するために、ポリカーボネートからなる基板ｌｅ上に
膜厚３０ｎｍの酸化アルミニウムからなる下地層２ｅを
真空蒸着法により形成し、この下地層２ｅ上に膜厚１１
００ｎの銀からなる反射層３ｅを真空蒸着法により形成
し、さらに反射層３ｅ上に保護層として、膜厚３０ｎｍ
の酸化アルミニウム層４ｅと、膜厚１５０ｎｍの二酸化
ケイ素層５ｅとを、真空蒸着法により順次形成した。得
られた表面高反射鏡に対して、実施例１と同じ耐湿性試
験を行った。結果を第１表に示す。Comparative Example 3 In order to create a high surface reflection mirror with a four-layer structure as shown in FIG. 3, a base layer 2e made of aluminum oxide with a thickness of 30 nm was formed on a substrate le made of polycarbonate by vacuum evaporation. , a film thickness of 11 is formed on this base layer 2e.
A reflective layer 3e made of 00nm silver is formed by vacuum evaporation, and a protective layer with a thickness of 30nm is further formed on the reflective layer 3e.
An aluminum oxide layer 4e with a thickness of 150 nm and a silicon dioxide layer 5e with a thickness of 150 nm were successively formed by vacuum evaporation. The same moisture resistance test as in Example 1 was conducted on the obtained high surface reflection mirror. The results are shown in Table 1.
比較例４
第４図において、ポリカーボネートで形成された基板ｌ
ｆ上に、銅を真空蒸着法により膜厚４０ｎｍに形成し、
下地層２ｆとした。この下地層２ｆ上に反射材料として
膜厚１１００ｎの銀からなる反射層３ｆを真空蒸着法に
より形成し、さらに反射層３ｆ上に保護層として、膜厚
６０ｎｍの酸化アルミニウム層４ｆと、膜厚７５ｎｍの
酸化タンタル層５ｆと、膜厚７５ｎｎ＋の二酸化ケイ素
層６ｆと、膜厚７５ｎｍの酸化タンタル層７ｆとを、真
空蒸着法により順次形成した。得られた表面高反射鏡に
対して、実施例１と同じ耐湿性試験 ９
−１０−
を行った。結果を第１表に示す。Comparative Example 4 In FIG. 4, a substrate l made of polycarbonate
Copper is formed on f by vacuum evaporation to a thickness of 40 nm,
The base layer was 2f. On this base layer 2f, a reflective layer 3f made of silver with a thickness of 1100 nm is formed as a reflective material by vacuum evaporation, and further on the reflective layer 3f, as a protective layer, an aluminum oxide layer 4f with a thickness of 60 nm and an aluminum oxide layer 4f with a thickness of 75 nm are formed. A tantalum oxide layer 5f having a thickness of 75 nm+, a silicon dioxide layer 6f having a thickness of 75 nm, and a tantalum oxide layer 7f having a thickness of 75 nm were sequentially formed by vacuum evaporation. The same moisture resistance test 9-10- as in Example 1 was conducted on the obtained mirror with high surface reflection. The results are shown in Table 1.
以上詳述したように、本発明の表面高反射鏡においては
、基板と銀からなる反射層との間に硫化クロム下地層を
形成している。従って基板がポリカーボネート、ポリエ
ステル、アクリル樹脂等のプラスチックで形成されてい
る場合においても、基板と反射層との間の付着力が強化
されているため、膜付着性、耐湿性等に優れている。As detailed above, in the high surface reflection mirror of the present invention, a chromium sulfide underlayer is formed between the substrate and the reflective layer made of silver. Therefore, even when the substrate is made of plastic such as polycarbonate, polyester, or acrylic resin, the adhesion between the substrate and the reflective layer is strengthened, resulting in excellent film adhesion, moisture resistance, etc.
以上においてプラスチック基板に反射鏡を形成する場合
について説明したが、本発明はこれに限定されず、ガラ
ス基板に形成した場合にも良好な効果を発揮する。Although the case where the reflective mirror is formed on a plastic substrate has been described above, the present invention is not limited thereto, and good effects can also be achieved when the reflective mirror is formed on a glass substrate.
第１図は本発明の一実施例による表面高反射鏡を示す断
面図であり、
第２図は本発明の別の一実施例による表面高反射鏡を示
す断面図であり、
第３図は従来の表面高反射鏡の一例を示す断面図であり
、
第４図は従来の表面高反射鏡の別の例を示す断面図であ
り、
第５図は本発明の一実施例による表面高反射鏡の２１６
時間耐湿性試験前後での４５°入射光の分光反射率を示
すグラフである。
Ｉａ、ｉｂ、ｌｅ、ｉｆ −・基板
２ａ、 ２ｂ ・・・・・硫化クロム下地層２ｅ・・
・・・・・酸化アルミニウム下地層２ｆ・・・・・・・
銅下地層
３ａ、３ｂ、３ｅ、３ｆ ・・反射層FIG. 1 is a sectional view showing a high surface reflection mirror according to an embodiment of the present invention, FIG. 2 is a sectional view showing a high surface reflection mirror according to another embodiment of the invention, and FIG. 4 is a sectional view showing an example of a conventional high surface reflection mirror; FIG. 4 is a sectional view showing another example of a conventional high surface reflection mirror; FIG. 5 is a sectional view showing another example of a conventional high surface reflection mirror; mirror 216
It is a graph showing the spectral reflectance of 45° incident light before and after a time-moisture resistance test. Ia, ib, le, if - Substrate 2a, 2b...Chromium sulfide base layer 2e...
...Aluminum oxide base layer 2f...
Copper base layer 3a, 3b, 3e, 3f...Reflection layer
Claims (2)
層と、 （ｂ）前記硫化クロム下地層上に形成された銀からなる
反射層と、 （ｃ）前記反射層上に形成された保護層とを有すること
を特徴とする表面高反射鏡。(1) In the surface high reflection mirror, (a) a base layer made of chromium sulfide formed on the substrate surface; (b) a reflective layer made of silver formed on the chromium sulfide base layer; (c) A high surface reflection mirror comprising a protective layer formed on the reflective layer.
化クロム下地層が膜厚１０ｎｍ以上であることを特徴と
する表面高反射鏡。(2) The high surface reflection mirror according to claim 1, wherein the chromium sulfide underlayer has a thickness of 10 nm or more.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3581090A JPH03239202A (en) | 1990-02-16 | 1990-02-16 | Surface high reflecting mirror |
| US07/654,422 US5216551A (en) | 1990-02-16 | 1991-02-12 | Surface reflector |
| GB9103162A GB2241709B (en) | 1990-02-16 | 1991-02-14 | Surface reflector |
| FR919101845A FR2658618B1 (en) | 1990-02-16 | 1991-02-15 | MULTILAYER REFLECTOR FOR OPTICAL DEVICE. |
| DE4104735A DE4104735C2 (en) | 1990-02-16 | 1991-02-15 | surface reflector |
| FR9215033A FR2684769B1 (en) | 1990-02-16 | 1992-12-14 | MULTILAYER REFLECTOR FOR OPTICAL DEVICE. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3581090A JPH03239202A (en) | 1990-02-16 | 1990-02-16 | Surface high reflecting mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03239202A true JPH03239202A (en) | 1991-10-24 |
| JPH052961B2 JPH052961B2 (en) | 1993-01-13 |
Family
ID=12452287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3581090A Granted JPH03239202A (en) | 1990-02-16 | 1990-02-16 | Surface high reflecting mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03239202A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006303478A (en) * | 2005-03-24 | 2006-11-02 | Toray Ind Inc | Reflector for led |
-
1990
- 1990-02-16 JP JP3581090A patent/JPH03239202A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006303478A (en) * | 2005-03-24 | 2006-11-02 | Toray Ind Inc | Reflector for led |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH052961B2 (en) | 1993-01-13 |
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|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |