JPH03232108A - Production of thin-film magnetic head - Google Patents
Production of thin-film magnetic headInfo
- Publication number
- JPH03232108A JPH03232108A JP2913490A JP2913490A JPH03232108A JP H03232108 A JPH03232108 A JP H03232108A JP 2913490 A JP2913490 A JP 2913490A JP 2913490 A JP2913490 A JP 2913490A JP H03232108 A JPH03232108 A JP H03232108A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- reproducing
- film
- insulator
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000010408 film Substances 0.000 claims abstract description 72
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000012212 insulator Substances 0.000 claims abstract description 37
- 230000001681 protective effect Effects 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims description 22
- 238000007790 scraping Methods 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 abstract description 7
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
- G11B5/3179—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
- G11B5/3183—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は例えば電子計算装置の磁気ディスク記憶装置
に用いられる薄膜磁気ヘッドの製造方法の改良に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in a method of manufacturing a thin film magnetic head used, for example, in a magnetic disk storage device of an electronic computing device.
第６図は例えは特開昭５７−１４３７２６号公報に示さ
れた従来の薄膜磁気ヘッドを示す斜視図、第７図は第６
図の■−■断面図である。これらの図において、（１）
はスライダを構成する基板、（２）は基板（１）の上面
に設けられた薄膜記録再生部であり、この薄膜記録再生
部（２）は第７図に示されるように基板（１）上に形成
されたパーマロイ等の下部磁性膜（３）と、この下部磁
性膜（３）上に第１の絶縁体４）を介し形成されたコイ
ル（５１と、このコイル（５）上に第２の絶縁体（６）
を介し形成された記録再生用ギャップ部（７１を有する
上部磁性膜（８）とで構成されている。FIG. 6 is a perspective view of a conventional thin film magnetic head disclosed in Japanese Patent Application Laid-Open No. 57-143726, and FIG.
It is a sectional view taken along ■-■ in the figure. In these figures, (1)
is a substrate constituting the slider, and (2) is a thin film recording/reproducing section provided on the upper surface of the substrate (1).This thin film recording/reproducing section (2) is provided on the substrate (1) as shown in FIG. A lower magnetic film (3) such as permalloy is formed on the lower magnetic film (3), a coil (51) is formed on the lower magnetic film (3) via the first insulator 4), and a second coil (51) is formed on the coil (5). Insulator (6)
It is composed of an upper magnetic film (8) having a recording/reproducing gap part (71) formed through the upper magnetic film (8).
（９ａ）は薄膜記録再生部（２）を覆うように形成され
た保護膜兼スライダである。００）は基板（１）と、薄
膜記録再生部（２）と、保護膜兼スライダ（９ａ）とて
構成された薄膜磁気ヘッドである。(9a) is a protective film/slider formed to cover the thin film recording/reproducing section (2). 00) is a thin film magnetic head composed of a substrate (1), a thin film recording/reproducing section (2), and a protective film/slider (9a).
次に以上のように構成された薄膜磁気ヘッド（１０）の
製造方法について、その工程を示す第８図（ａ） （ｂ
）を用いて以下説明する。先ず第８図（ａ）に示される
ように基板（１）上に複数個の薄膜記録再生部（２）を
形成する。その形成方法は基板（１）上に第７図に示さ
れる下部磁性膜（３）と、第１の絶縁体（４）と、コイ
ル（５）と、第２の絶縁体（６）と、上部磁性膜（８）
とを蒸着またはスパッタリング等の成膜技術とホトリソ
グラフィ技術によって形成し、上部磁性膜（８）の記録
再生用ギャップ部（７）を例えばホトエツチング法によ
って形成するか、又は特開昭５５−１３２５１９号公報
に記述されているように、記録再生用ギャップ部（７）
を境にして上部磁性膜（８）を第１と第２の上部磁性膜
に分け、第１の上部磁性膜を、その記録再生用ギャップ
部（７）となる部分にテーパを付して形成し、その上に
磁気的絶縁膜を形成した後、この磁気的絶縁膜に重なる
ように上記第２の上部磁性膜を形成する。しかる後、第
８図（ｂ）に示されるように基板（１）の薄膜記録再生
部（２）の形成面の全面にＳｉ Ｏ２、Ａ Ｉ ２０３
などの材質からなる保護膜（９）をスパッタリング等の
成膜技術により付着させた後、保護膜（９）を所望のス
ライド幅（１１）になるようエツチング技術等で加工す
る。第９図は第８図（ｂ）のＩＸ−■断面図てあり、同
図に示されるように保護膜（９）か基板面（Ａ）上およ
び薄膜記録再生部（２）上に一様に形成されている。そ
して次の工程として基板面Ａを基準に上記保護膜（９）
の上面部をラッピングし記録再生用ギャップ部［７１を
露出させる。Next, FIGS. 8(a) and 8(b) show the steps of manufacturing the thin film magnetic head (10) configured as described above.
) will be explained below. First, as shown in FIG. 8(a), a plurality of thin film recording/reproducing parts (2) are formed on a substrate (1). The formation method is to form a lower magnetic film (3) shown in FIG. 7 on a substrate (1), a first insulator (4), a coil (5), a second insulator (6), Upper magnetic film (8)
The recording/reproducing gap portion (7) of the upper magnetic film (8) may be formed by, for example, a photoetching method, or the recording/reproducing gap portion (7) of the upper magnetic film (8) may be formed using a film forming technique such as vapor deposition or sputtering, and a photolithography technique. As described in the official gazette, the recording/reproducing gap section (7)
The upper magnetic film (8) is divided into a first and a second upper magnetic film at the boundary, and the first upper magnetic film is formed by tapering the portion that will become the recording/reproducing gap portion (7). After forming a magnetic insulating film thereon, the second upper magnetic film is formed so as to overlap this magnetic insulating film. Thereafter, as shown in FIG. 8(b), SiO2, AI 203 is applied to the entire surface of the substrate (1) on which the thin film recording/reproducing section (2) is formed.
After a protective film (9) made of a material such as the following is deposited by a film forming technique such as sputtering, the protective film (9) is processed by an etching technique or the like so as to have a desired sliding width (11). FIG. 9 is a cross-sectional view taken along the line IX in FIG. is formed. Then, in the next step, the above protective film (9) is formed on the substrate surface A as a reference.
The upper surface part of the recording/reproducing gap part [71] is exposed by wrapping.
この工程を経た断面図を第１０図に示す。上記ラッピン
グ工程後、第８図（ｂ）の切断線（１２）に沿って切断
することにより第６図に示される薄膜磁気ヘット００）
が得られる。A cross-sectional view after this step is shown in FIG. After the above wrapping process, the thin film magnetic head 00 shown in FIG. 6 is obtained by cutting along the cutting line (12) in FIG. 8(b).
is obtained.
従来の薄膜磁気ヘッドの製造方法は以上のように基板（
１）上に下部磁性膜（３）、第１の絶縁体は）、コイル
（５）、第２の絶縁体（６）、記録再生用ギャップ部（
７１を有する上部磁性膜（８）を順次積み上げ形成した
薄膜記録再生部（２）上に保護膜（９）を形成し、基板
面Ａを基準に上記保護膜（９）を削り記録再生用ギャッ
プ部（７１を露出するようにしているのて、薄膜記録再
生部（２）を形成する上記各部の厚さの誤差か累積され
、かつこの誤差は個々の薄膜記録再生部ｆ２１で異なる
ため、複数個の薄膜記録再生部（２）の厚さかそれぞれ
異なり、第１０図に示されるように他よりも厚く形成さ
れた薄膜記録再生部（２）の記録再生用ギャップ部（７
）の上部が切除され、磁気ヘッドの特性を決める重要因
子の−っである記録再生用ギャップ部深さ（１３）かほ
らつき、特性の揃った磁気ヘットが得られない等の問題
点があった。The conventional manufacturing method for thin film magnetic heads is as described above.
1) A lower magnetic film (3) on top, a first insulator), a coil (5), a second insulator (6), a recording/reproducing gap part (
A protective film (9) is formed on the thin film recording/reproducing section (2) formed by sequentially stacking upper magnetic films (8) having 71 layers, and the protective film (9) is shaved with respect to the substrate surface A to form a recording/reproducing gap. Since the portion (71) is exposed, the error in the thickness of each of the above portions forming the thin film recording/reproducing portion (2) is accumulated, and this error differs for each thin film recording/reproducing portion f21. The thickness of each of the thin film recording and reproducing sections (2) is different, and as shown in FIG.
) was removed, causing problems such as the depth of the recording/reproducing gap (13), which is an important factor determining the characteristics of a magnetic head, becoming uneven, and making it impossible to obtain a magnetic head with uniform characteristics. Ta.
この発明は上記のような問題点を解消するためなされた
もので、記録再生用ギャップ部を削ることなく保護膜の
削り加工が行なえ、記録再生用ギャップ部深さか略等し
く、特性の揃った薄膜磁気へッｌ〜が容易に得られる薄
膜磁気ヘッドの製造方法を提供することを目的としてい
る。This invention was made to solve the above-mentioned problems, and it is possible to scrape the protective film without scraping the recording/reproducing gap, and to create a thin film with approximately the same depth and uniform characteristics in the recording/reproducing gap. It is an object of the present invention to provide a method for manufacturing a thin film magnetic head in which a magnetic head can be easily obtained.
この発明に係る薄膜磁気ヘッドの製造方法は複数個の薄
膜記録再生部をそれぞれ構成する第２の絶縁層の記録再
生用ギヤツブ部形成部の基板面からの高さが所定値にな
るよう上記第２の絶縁層を形成し、この第２の絶縁層上
に記録再生用ギャップ部を有する上部磁性膜を形成し、
この上部磁性膜上に保護膜を形成し上記基板面分基準に
上記保護膜を削り上記記録再生用ギャップ部を露出させ
るようにしたものである。The method for manufacturing a thin film magnetic head according to the present invention is such that the height from the substrate surface of the recording and reproducing gear part forming portion of the second insulating layer constituting each of the plurality of thin film recording and reproducing sections becomes a predetermined value. forming a second insulating layer, and forming an upper magnetic film having a recording/reproducing gap portion on the second insulating layer;
A protective film is formed on the upper magnetic film, and the protective film is removed based on the surface of the substrate to expose the recording/reproducing gap portion.
この発明においては基板面を基準に形成された各部２の
絶縁体上に上部磁性膜の各記録再生用ギャップ部が形成
され、上記上部磁性膜上に形成された保護膜が上記基板
面を基準面として削られるので、上記各記録再生用ギャ
ップ部は削られることなく各記録再生用ギャップ部深さ
は略等しくなる。In this invention, each recording/reproducing gap portion of the upper magnetic film is formed on the insulator of each portion 2 formed with the substrate surface as a reference, and the protective film formed on the upper magnetic film is formed with the substrate surface as a reference. Since it is cut as a surface, the respective recording/reproducing gap portions are not cut, and the depths of the respective recording/reproducing gap portions become approximately equal.
以下この発明の一実施例を第１図および第２図について
説明する。第１図はこの発明の一実施例を示す斜視図、
第２図は第１図のＩＩ−ＩＩ断面図である。これらの図
において第６図および第７図と同一符号は相当部分を示
す。（２）はスライダを構成する基板（１）に埋設され
た薄膜記録再生部で、第２図に示されるように基板（１
）の凹部（１４）の底部に形成された下部磁性膜（３）
と、この下部磁性膜（３）上に第１の絶縁体（イ）を介
し形成されたコイル（町と、このコイル（５）上に第２
絶縁体（６）を介し形成された記録再生用ギャップ（７
）を有する上部磁性膜（８）とで構成されている。（１
０１は基板（１）と、薄膜記録再生部（２）と、保護膜
兼スライタ（９ａ）とで構成された薄膜磁気ヘットであ
る。An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. FIG. FIG. 1 is a perspective view showing an embodiment of the present invention;
FIG. 2 is a sectional view taken along line II-II in FIG. 1. In these figures, the same reference numerals as in FIGS. 6 and 7 indicate corresponding parts. (2) is a thin film recording/reproducing section embedded in the substrate (1) constituting the slider, as shown in FIG.
) The lower magnetic film (3) formed at the bottom of the recess (14)
A coil is formed on this lower magnetic film (3) via the first insulator (a), and a second coil is formed on this coil (5).
A recording/reproducing gap (7) formed through an insulator (6).
) and an upper magnetic film (8). (1
01 is a thin film magnetic head composed of a substrate (1), a thin film recording/reproducing section (2), and a protective film/slider (9a).
次に以上のように構成された薄膜磁気ヘット００］の製
造方法について、その工程の一実施例を示す第３図（ａ
）、ｒｂ）および第４図（ａｌ、（ｂ）、（Ｃ）を用い
て以下説明する。先ず第３図（ａ）に示されるように基
板（１）に薄膜記録再生部（２）を埋設する部分を例え
はパターニングしたマスク（図示せず）を用いてスパッ
タエツチング法でエツチングし、所定の深さの複数個の
四部（１４）を形成する。次に第３図（ｂ）に示すよう
に四部（１４）内に薄膜記録再生部（２）を形成する。Next, regarding the manufacturing method of the thin film magnetic head 00 configured as described above, FIG.
), rb) and FIGS. 4(al, (b), and (C)). First, as shown in FIG. The part to be buried is etched by sputter etching using a patterned mask (not shown) to form a plurality of four parts (14) of a predetermined depth.Next, as shown in FIG. 3(b). A thin film recording/reproducing section (2) is formed within the fourth section (14) as shown in FIG.
この形成方法を第４図（ａ）、（ｂ）、（ｃ）に示す工
程図を用いて説明する。第４図（ａ）に示されるように
凹部（１４）の底部と下部磁性膜（３）を形成し、この
下部磁性膜（３）上に第１の絶縁体は）を介しコイル（
５）を形成する。これらの下部磁性膜（３）、第１の絶
縁体４）、コイル（５）は蒸着またはスパッタリング等
の成膜技術とホトリソクラフィ技術によって形成する９
次に下部磁性膜（３）、第１の絶縁体４）、コイル（５
）上にフォトレジスト（１５）を基板（１）の下部磁性
膜（３）形成面側の基板面（Ａ）と同し高さまで塗布す
る。次にフォトレジスト（１５）をホトリソクラフィ技
術等で製版、焼成することにより第４図（ｂ）に示され
るように最上部（Ｂ）か基板面（Ａ）と同じ高さの第２
の絶縁体（６）が形成される。そして第４図（Ｃ）に示
されるように第２の絶縁体（６）の最上部（Ｂ）に記録
再生用ギャップ部（７）か形成されるように上部磁性膜
（８）を従来と同様の方法により形成し、その上に５ｉ
Ｏ１，Ａｌ□Ｏ１などの材質からなる保護１ （９１を
スパッタリングなどの成膜技術により形成する。This forming method will be explained using process diagrams shown in FIGS. 4(a), (b), and (c). As shown in FIG. 4(a), a lower magnetic film (3) is formed on the bottom of the recess (14), and the first insulator is placed on the lower magnetic film (3) via the coil (
5) Form. These lower magnetic film (3), first insulator 4), and coil (5) are formed by film-forming techniques such as vapor deposition or sputtering, and photolithography techniques.
Next, the lower magnetic film (3), the first insulator 4), the coil (5)
) A photoresist (15) is applied on the substrate (1) to the same height as the substrate surface (A) on the side where the lower magnetic film (3) is formed. Next, the photoresist (15) is made into a plate using photolithography technology, etc., and then baked to form a second plate at the top (B) or at the same height as the substrate surface (A), as shown in FIG. 4(b).
An insulator (6) is formed. Then, as shown in FIG. 4(C), the upper magnetic film (8) is placed in a conventional manner so that a recording/reproducing gap part (7) is formed on the top (B) of the second insulator (6). 5i is formed by the same method, and 5i
The protection 1 (91) made of a material such as O1 or Al□O1 is formed by a film forming technique such as sputtering.
上記のようにして複数個の薄膜記録再生部（２）か形成
された基板（１）を、第３図に示されるように所定のス
ライダ幅（１１）になるように研磨、エツチング等の技
術で加工する。そして次に基板面（Ａ、）を基準に保護
膜（９）をラッピングし記録再生用ギャップ（７）を露
出させる。しかる後第３図（ｂ）の２点鎖線の切断線（
１２）に沿って切断し、第１図に示される薄膜磁気へラ
ド００）を得る。The substrate (1) on which a plurality of thin film recording/reproducing parts (2) are formed as described above is polished, etched, etc. so that it has a predetermined slider width (11) as shown in FIG. Process with. Then, the protective film (9) is wrapped with the substrate surface (A, ) as a reference to expose the recording/reproducing gap (7). After that, the cutting line of the two-dot chain line in Fig. 3(b)
12) to obtain a thin film magnetic helad 00) shown in FIG.
なお、以上の製造方法によれは複数個の薄膜記録再生部
（２）の記録再生用ギャップ部（７）はラッピングの基
準となる基板面（Ａ）と略同−高さに形成された第２の
絶縁体（６）上にそれぞれ形成されているので、保護膜
（９）のラッピング時、記録再生用キヤ・・７７部（７
１の上部が従来のように切除されることがなく、特性の
揃った薄膜磁気ヘッドが容易に得られ、かつ記録再生部
（２）はスライダを構成する基板（１）内に埋設され外
部から加わる衝撃から保護されているので、衝撃による
損傷が防止される。Incidentally, according to the above manufacturing method, the recording/reproducing gap portions (7) of the plurality of thin film recording/reproducing portions (2) are formed at approximately the same height as the substrate surface (A) which serves as a reference for lapping. When wrapping the protective film (9), the recording/reproducing carrier...77 parts (7
The upper part of the slider 1 is not cut off as in the conventional case, and a thin film magnetic head with uniform characteristics can be easily obtained. Since it is protected from the applied impact, damage due to impact is prevented.
なお、以上は基板（１）に複数個の四部（１４）を形成
し、この凹部（Ｉ４）に記録再生部（２）を形成したも
のについて述べたか、基板（１）に四部を形成すること
なく、その凹部形成位置と同位置の基板面−Ｆに薄膜記
録再生部（２）を形成しても良く、その形成方法を第５
図（ａ） （ｂ） （ｃ）に示す工程図について説明す
る。Incidentally, the above description has been made regarding the case where a plurality of four parts (14) are formed on the substrate (1) and the recording/reproducing part (2) is formed in the recessed part (I4). Instead, a thin film recording/reproducing section (2) may be formed on the substrate surface -F at the same position as the recess formation position, and the method for forming it is described in the fifth section.
The process diagrams shown in Figures (a), (b), and (c) will be explained.
第５図において第４図と異なるところは基板面上に下部
磁性膜（３）と、第１の絶縁体（イ）、コイル（５１を
形成し、その上に所定の高さｈまでフォトレジスト（１
５）を塗布し、ホトリソクラフイ技術等で製版焼成して
第５図（ｂ）に示されるように第２の絶縁体（６）を形
成した点て、このあとの工程は前述と同様、第５図（Ｃ
）に示されるように第２の絶縁体（６）の最上部ＣＢ）
に記録再生用ギャップ部（７）が形成されるように上部
磁性膜（８）を形成し、その上に保護膜（９）を形成す
る。このようにして複数個の薄膜記録再生部（２）か形
成された基板（１）を第３図に示されるように所定のス
ライダ幅（１１）になるように研磨、エツチング等の技
術で、加工し、次に基板面（Ａ）を基準に保護膜（９）
をラッピングし記録再生用ギャップ部（７）を露出させ
る。複数個の薄膜記録再生部（２）の記録再生用ギャッ
プ部（７）は基板面＜Ａ）を基準とする同一高さの第２
の絶縁体（６）上に形成されているので、上記ラッピン
グ工程時に記録再生用ギャップ部（７）の上部か従来の
ように切除されるようなことがない。上記ラッピング工
程後、第３図（ｂ）の２点鎖線の切断線（１２）に沿っ
て切断することにより薄膜磁気ヘッドが得られる。The difference between FIG. 5 and FIG. 4 is that a lower magnetic film (3), a first insulator (A), and a coil (51) are formed on the substrate surface, and a photoresist is placed on top of it to a predetermined height h. (1
The second insulator (6) was formed by coating the second insulator (6) as shown in FIG. Figure (C
) on the top of the second insulator (6) CB)
An upper magnetic film (8) is formed so that a recording/reproducing gap part (7) is formed thereon, and a protective film (9) is formed thereon. The substrate (1) on which a plurality of thin film recording/reproducing parts (2) have been formed in this way is polished, etched, etc. so that it has a predetermined slider width (11) as shown in FIG. Processing, then apply a protective film (9) based on the substrate surface (A).
is wrapped to expose the recording/reproducing gap portion (7). The recording/reproducing gap portions (7) of the plurality of thin film recording/reproducing portions (2) are arranged at the same height with respect to the substrate surface <A).
Since the recording/reproducing gap section (7) is formed on the insulator (6), the upper part of the recording/reproducing gap section (7) is not cut off during the above-mentioned lapping process as in the conventional case. After the lapping process, a thin film magnetic head is obtained by cutting along the two-dot chain cutting line (12) in FIG. 3(b).
なお、以上の実施例においては、下部磁性膜の上に第１
の絶縁層を介しコイル形成後、その上に所定の高さまて
フォトレジストを塗布しホトリソグラフィ技術で製版、
焼成し、記録再生用ギャップ部か形成される最上部が所
定の高さの第２の絶縁体を形成するようにしたものにつ
いて述へたか、フォトレジストを所定の高さ以上の高さ
に塗布し、ホトリソグラフィ技術等で製版、焼成し、上
記最上部か所定の高さ以上の第２の絶縁体を形成し、基
板面を基準にラッピングすることにより基板面から最上
部まての高さか所定の高さの第２絶縁体を形成する−よ
うにしても良い。Note that in the above embodiment, the first magnetic film is placed on the lower magnetic film.
After forming the coil through an insulating layer, photoresist is applied to a predetermined height on top of the coil, and plate making is performed using photolithography technology.
I mentioned above that the second insulator is baked and the top part where the recording/reproducing gap part is formed has a predetermined height, or the photoresist is applied to a height higher than the predetermined height. Then, plate making and baking are performed using photolithography technology, etc., to form a second insulator having a predetermined height or higher above the top, and by lapping with the substrate surface as a reference, the height from the substrate surface to the top is increased. The second insulator may be formed to have a predetermined height.
１発明の効果〕
以上のようにこの発明によれは、下部磁性膜上に第１の
絶縁体を介し形成されたコイル上に第２の絶縁体をその
記録再生用ギャップ部形成部が基板面を基準に所定の高
さになるよう形成した後、その上に上記記録再生用ギャ
ップ部形成部に記録再生用ギャップ部か形成されるよう
北部磁性膜を形成しているので、記録再生用ギャップ部
の基板面に対する高さは下部磁性膜、第１の絶縁体、コ
イルの形成厚み誤差の影響を受けることなく所定値とな
り、記録再生用ギャップ部上に形成された保護膜の上記
基板面を基準とするラッピング等による削り加工時、上
記記録再生用ギャップ部の切削か防止され、記録再生用
ギャップ部の深さが略等しくなり、特性の揃った薄膜磁
気ヘットが容易に得られる。1. Effects of the Invention As described above, according to the present invention, the second insulator is placed on the coil formed on the lower magnetic film through the first insulator so that the recording/reproducing gap forming portion is on the substrate surface. After forming the northern magnetic film to a predetermined height based on the height, the northern magnetic film is formed so that a recording/reproducing gap is formed in the above-mentioned recording/reproducing gap forming section. The height of the portion relative to the substrate surface is a predetermined value without being affected by errors in the formation thicknesses of the lower magnetic film, the first insulator, and the coil, and the height of the protective film formed on the recording/reproducing gap portion relative to the substrate surface is a predetermined value. When machining by lapping or the like as a reference, cutting of the recording/reproducing gap portion is prevented, the depths of the recording/reproducing gap portions become approximately equal, and a thin film magnetic head with uniform characteristics can be easily obtained.
第１図はこの発明の製造方法によって形成された薄膜磁
気ヘットの斜視図、第２図は第１図の■■断面図、第３
図（ａ） （ｂ）および第４図（ａ）、（ｂ）、（Ｃ）
はこの発明の薄膜磁気ヘッドの製造方法の一実施例を示
す工程図、第５図（ａ）、（ｂ）、（ｃ）はこの発明の
他の実施例を示す工程図、第６図は従来の製造方法によ
って形成されｆＳ薄膜磁気ヘットの斜視図、第７図は第
６図の■−■断面図、第８図（ａ） （ｂ）は従来の薄
膜磁気ヘットの製造方法を示す工程図、第９図は第８図
（ｂ）のＩＸ−ＩＸ断面図、第１０図は保護膜をラッピ
ングし記録再生用ギャップ部を露出する工程後の第８図
（ｂ）のＩＸ−ＩＸ断面図である。
図において、（１）は基板、（３）は下部磁性膜、（４
）は第１の絶縁体、（５）はコイル、（６）は第２の絶
縁体、（７）は記録再生用ギャップ部、（８）は上部磁
性膜、Ａは基板面である。
なお、図中同一符号は同一または相当部分を示す。FIG. 1 is a perspective view of a thin film magnetic head formed by the manufacturing method of the present invention, FIG. 2 is a sectional view of FIG.
Figures (a) (b) and Figure 4 (a), (b), (C)
5(a), (b), and (c) are process diagrams showing another embodiment of the present invention, and FIG. A perspective view of an fS thin film magnetic head formed by a conventional manufacturing method, FIG. 7 is a sectional view taken along the line ■-■ of FIG. 6, and FIGS. Figures 9 and 9 are IX-IX cross-sectional views in Figure 8(b), and Figure 10 are IX-IX cross-sectional views in Figure 8(b) after the step of lapping the protective film and exposing the recording/reproducing gap. It is a diagram. In the figure, (1) is the substrate, (3) is the lower magnetic film, and (4) is the substrate.
) is the first insulator, (5) is the coil, (6) is the second insulator, (7) is the recording/reproducing gap, (8) is the upper magnetic film, and A is the substrate surface. Note that the same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
数個の下部磁性膜上にそれぞれ第１の絶縁体と、コイル
と、第２の絶縁体と、記録再生用ギャップ部を有する上
部磁性膜とを順次積み上げ複数個の薄膜記録再生部を形
成する工程と、上記薄膜記録再生部上に保護膜を形成す
る工程と、上記下部磁性膜形成側の基板面を基準に上記
保護膜の外面部を削り上記記録再生用ギャップ部を露出
させる工程とを備え、上記第２の絶縁体の記録再生用ギ
ャップ部形成部の上記基板面からの高さが所定値になる
よう上記第２の絶縁体を形成したことを特徴とする薄膜
磁気ヘッドの製造方法。forming a plurality of lower magnetic films on a substrate; and an upper part having a first insulator, a coil, a second insulator, and a recording/reproducing gap portion on the plurality of lower magnetic films, respectively. a step of sequentially stacking magnetic films to form a plurality of thin film recording and reproducing sections; a step of forming a protective film on the thin film recording and reproducing section; and scraping the outer surface portion to expose the recording/reproducing gap portion, and removing the second insulator so that the height of the recording/reproducing gap forming portion of the second insulator from the substrate surface is a predetermined value. A method for manufacturing a thin film magnetic head, characterized in that an insulator is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2913490A JPH03232108A (en) | 1990-02-07 | 1990-02-07 | Production of thin-film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2913490A JPH03232108A (en) | 1990-02-07 | 1990-02-07 | Production of thin-film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03232108A true JPH03232108A (en) | 1991-10-16 |
Family
ID=12267821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2913490A Pending JPH03232108A (en) | 1990-02-07 | 1990-02-07 | Production of thin-film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03232108A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1143419A2 (en) * | 2000-03-30 | 2001-10-10 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
-
1990
- 1990-02-07 JP JP2913490A patent/JPH03232108A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1143419A2 (en) * | 2000-03-30 | 2001-10-10 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
| US6665143B2 (en) | 2000-03-30 | 2003-12-16 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
| EP1143419A3 (en) * | 2000-03-30 | 2004-05-06 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
| US7100267B2 (en) | 2000-03-30 | 2006-09-05 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0827925B2 (en) | Magnetic head slider having protective coating and method of manufacturing the same | |
| JPS60133516A (en) | Production of thin film magnetic head | |
| JPH03232108A (en) | Production of thin-film magnetic head | |
| US6067703A (en) | Method for fabricating a combined thin film magnetic head | |
| JPH0118495B2 (en) | ||
| JPH02766B2 (en) | ||
| JP2564284B2 (en) | Method of manufacturing thin film coil | |
| JPH05159221A (en) | Thin-film head and production thereof | |
| JPH0371411A (en) | Production of thin-film magnetic head | |
| JPH0227727B2 (en) | ||
| JPS62119715A (en) | Production of thin film magnetic head | |
| JP2774487B2 (en) | Thin film magnetic head | |
| JPH09198624A (en) | Combined magnetic head and its production | |
| JPS6115492B2 (en) | ||
| JPS6271007A (en) | Gap forming method for magnetic head | |
| JPH01227211A (en) | Manufacture of thin film magnetic head | |
| JPH02216605A (en) | Production of thin film magnetic head | |
| JPS6124007A (en) | Thin film magnetic head | |
| JPS61289516A (en) | Production of thin film magnetic head | |
| JPH03207005A (en) | Production of thin-film magnetic head | |
| JPS63257910A (en) | Thin film magnetic head | |
| JPH0765319A (en) | Forming method of thin film and production of thin film magnetic head using the same | |
| JPS5857614A (en) | Production of thin film magnetic head | |
| JPH04341907A (en) | Thin film magnetic head and its manufacture | |
| JPH03237605A (en) | Production of composite type magnetic head |