JPH03231245A - Photosensitive material processing device - Google Patents

Abstract

PURPOSE:To prevent the deterioration by the air oxidation of the processing liquid of the processing device so that good processing can be maintained by providing valve bodies which open by coming into tight contact with the outer side of the sectional part of a photosensitive material at the time of passage of the photosensitive material and are held closed at the other times. CONSTITUTION:Plural processing liquid tanks 4 are provided and the photosensitive material repeats the motion to enter the one independent tank 4, to emerge therefrom and to enter the next tank 4. The valve bodies 10 are provided in the apertures of these tanks 4. The valve body 10 is fixed to a frame body 5 and is energized at all times to close a shielding part 3 in a free state and, therefore, the valve body suppresses the passage of the liquid and air while the photosensitive material does not enter the tank. The valve body 10 is formed of a resilient material having good surface smoothness and, therefore, the valve body 10 allows the passage of the photosensitive material while maintaining the tight contact with the sectional shape of the photosensitive material over the entire circumference at the time when the photosensitive material arrives at the shielding part 3 by passing a guide part 2 and forcibly expands the shielding part 3 with the end edge of the photosensitive material. The deterioration of the processing liquid in the processing device by air oxidation is prevented in this way and the good processing is maintained.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a technique for preventing deterioration of a processing agent in a photosensitive material processing apparatus for processing silver salt photosensitive materials.

[Conventional technology]

The processing solution used to develop silver salt photosensitive materials deteriorates when exposed to oxygen, so conventional efforts have been made to reduce oxidation of the processing solution due to air by installing a lid that minimizes the liquid level in the processing solution tank. Ta.

Since it is clear that the processing liquid deteriorates due to oxidation, patent applications have been filed to reduce the opening area as close to zero in order to prevent the processing liquid from coming into contact with air. It merely made a wish and did not specifically disclose any new technology. Even if the opening area of the liquid surface of the processing liquid tank is made small, it is necessary to allow passage of the photosensitive material, so in the case where a fixed opening is provided, the liquid surface is always exposed to the air. In addition, the slit-like opening is formed in accordance with the cross-sectional shape of the photosensitive material, and when the liquid level in the slit rises due to capillary action and descends as the photosensitive material rushes in, a thin film forms on the slit wall surface. The processing liquid remains in the shape of the slit, and the contact area with the air increases rapidly, so oxidation is promoted in this area, and solid components from the oxidation of the processing liquid adhere to the slit walls, which results in a negative effect on the processing. . As described above, the conventional method of preventing oxidation by reducing the opening area is contradictory and is not practical.

[Problem to be solved by the invention]

In view of these drawbacks of the prior art, it is an object of the present invention to provide a photosensitive material processing apparatus that can practically prevent deterioration of the processing liquid of the photosensitive material processing apparatus due to air oxidation and maintain good processing performance. It is something.

[Means to solve the problem]

The purpose of this is to install valve bodies at the entrance and exit of the conveyance path for the photosensitive material to the liquid tank, which are in close contact with the outside of the cross section of the photosensitive material when the material is passing through, and are closed when the material is not passing through. This is achieved by a photosensitive material processing apparatus characterized by the following.

〔Example〕

The configuration of photosensitive material processing equipment is roughly divided into coating type, spray type, and dip type.Since the dip type is suitable for preventing air oxidation of the processing solution, it is used as an automatic ring 11 fi processing machine. In order to use the liquid repeatedly without wasting it, a dip type is used.

The dip type is a method in which a processing liquid tank is filled with a processing liquid, and a photosensitive material is immersed in the tank to perform development processing.

Furthermore, the structure of the photosensitive material processing apparatus is divided into J'L, development processing, fixing processing, water washing, and stabilization processing. It can be visualized. Therefore, even in the dip type described above, since a plurality of processing liquid tanks are provided, the photosensitive material repeats the operation of entering and exiting these independent processing liquid tanks and entering the next processing tank. Since the opening through which the photosensitive material enters and exits the processing liquid tank is essential to the processing liquid tank, it is necessary to allow the photosensitive material to pass through this opening.
A movable valve body 10 is provided to suppress passage of liquid and air as much as possible.

The valve body IO is made of resin or rubber that is flexible and has good surface smoothness, so that when the tip of the photosensitive material enters, it contacts the edge of the photosensitive material and the surface of the material sequentially. However, it suppresses the active passage of liquid and air. As shown in FIG. 1, the structure of the valve body 10 includes an introduction part 1 and a guide part 2.
and a shielding part 3, and the introduction part l is made thicker than the cross section of the photosensitive material and has a size that allows the penetration of the photosensitive material without difficulty.

Next, the shielding part 3 has an expansion equal to or larger than the cross section of the photosensitive material, or is closed in a free state to form a -linear sealed opening. As shown in the sectional view of the closed type photosensitive material processing apparatus in FIG. 2 and the sectional view of the roller conveyance type processing apparatus in FIG. 3, the valve body 10 is fixed to the frame body 5 made of a rigid body,
Due to its thickness and shape, it always biases the shielding portion in the direction of closing in the free state, so it has the function of suppressing the passage of liquid and air when the photosensitive material does not enter. Next, how to suppress the passage of liquid and air when the photosensitive material enters will be explained. First, when the photosensitive material passes through the guide section 2 and reaches the shielding section 3, and the shielding section 3 is spread out with the edge of the photosensitive material, the material of the valve body 10 is made flexible and has a smooth surface. Since it is made of good material, the valve body 1
0 can allow the photosensitive material to pass through while closely adhering to the cross-sectional shape of the photosensitive material all around. As an example of the present invention,
The material of the valve body 10 is Teflon resin with a hardness of 5 or more.
25 and good results were obtained. Furthermore, the adhesion length of the shielding part 3 in a free state is 3, measured in the direction of passage of the photosensitive material.
mm to 15mm is fine. This length should be determined depending on whether a long one is preferable in order to maintain a tight seal and suppress the passage of liquid and air, or depending on the stiffness of the photosensitive material, since it will also increase the resistance to the passage of the photosensitive material. There must be.

With this configuration, the inside of the enclosure formed by the processing liquid tank 4 and the valve body 10 can be kept isolated from the outside air. However, if only a small amount of air passes through the photosensitive material because it cannot be suppressed, oxygen will be absorbed inside the upper enclosure and the oxygen content will be maintained at a low level. Even if the opening on the surface of the processing liquid is wide, oxidative deterioration of the processing liquid can be sufficiently prevented.

On the other hand, if the enclosure formed by the valve element IO and the processing liquid tank 4 is filled with liquid and the liquid is pushing against the valve element IO, the photosensitive material cannot be suppressed when it passes through and may pass through. The material is liquid, but as a way to eliminate this liquid, the valve body l
Since the enclosure formed by O and the processing liquid tank 4 is completely filled with liquid, when the photosensitive material enters, the outside atmospheric pressure suppresses the liquid that tries to come out, causing the liquid to evaporate. I was able to prevent it from coming out. However, the smaller the amount of the processing liquid, the more likely it is to solidify, and it is inevitable that such solidified dirt from the processing liquid will adhere to the introduction part 1 of the valve body 10 and the shielding part 3 of the present invention. , as a mitigation measure, valve body 1
It is effective to form the material of 0 with Teflon resin, which has low liquid adhesion. However, the present invention is not limited to Teflon resin.

Preferably, supplying a small amount of water to the outer surface of the valve body lO,
It is best to wet it or wash it to remove dirt.

〔Effect of the invention〕

With this configuration, it is possible to practically prevent the processing liquid of the photosensitive material processing apparatus from deteriorating due to air oxidation, and to maintain good processing.

[Brief explanation of drawings]

FIG. 1 is a perspective view of a valve body according to an embodiment of the present invention. FIG. 2 is a sectional view of a closed type photosensitive material processing apparatus. FIG. 3 is a sectional view of a roller conveyance type photosensitive material processing apparatus in which the valve body of the present invention is applied. l...Introduction part 2...Information part

Claims (1)

[Claims] At the entrance and exit of the conveyance path for the photosensitive material to the liquid tank, a valve body is provided which is in close contact with the outside of the cross section of the photosensitive material when the photosensitive material is passing through and is closed except when the photosensitive material is passing through. Features of photosensitive material processing equipment.