JPH0322528U - - Google Patents

Info

Publication number
JPH0322528U
JPH0322528U JP8415989U JP8415989U JPH0322528U JP H0322528 U JPH0322528 U JP H0322528U JP 8415989 U JP8415989 U JP 8415989U JP 8415989 U JP8415989 U JP 8415989U JP H0322528 U JPH0322528 U JP H0322528U
Authority
JP
Japan
Prior art keywords
collection electrode
vacuum chamber
vacuum
dust collection
device equipped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8415989U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8415989U priority Critical patent/JPH0322528U/ja
Publication of JPH0322528U publication Critical patent/JPH0322528U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP8415989U 1989-07-18 1989-07-18 Pending JPH0322528U (it)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8415989U JPH0322528U (it) 1989-07-18 1989-07-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8415989U JPH0322528U (it) 1989-07-18 1989-07-18

Publications (1)

Publication Number Publication Date
JPH0322528U true JPH0322528U (it) 1991-03-08

Family

ID=31632412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8415989U Pending JPH0322528U (it) 1989-07-18 1989-07-18

Country Status (1)

Country Link
JP (1) JPH0322528U (it)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08325733A (ja) * 1995-05-26 1996-12-10 Tel Varian Ltd 真空処理方法および真空処理装置
JP2002151495A (ja) * 2000-11-14 2002-05-24 Sharp Corp プラズマ処理装置およびそれを用いて作製した半導体装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08325733A (ja) * 1995-05-26 1996-12-10 Tel Varian Ltd 真空処理方法および真空処理装置
JP2002151495A (ja) * 2000-11-14 2002-05-24 Sharp Corp プラズマ処理装置およびそれを用いて作製した半導体装置

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