JPH0322528U - - Google Patents
Info
- Publication number
- JPH0322528U JPH0322528U JP8415989U JP8415989U JPH0322528U JP H0322528 U JPH0322528 U JP H0322528U JP 8415989 U JP8415989 U JP 8415989U JP 8415989 U JP8415989 U JP 8415989U JP H0322528 U JPH0322528 U JP H0322528U
- Authority
- JP
- Japan
- Prior art keywords
- collection electrode
- vacuum chamber
- vacuum
- dust collection
- device equipped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000428 dust Substances 0.000 claims description 7
- 239000006096 absorbing agent Substances 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
- Cleaning In General (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8415989U JPH0322528U (it) | 1989-07-18 | 1989-07-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8415989U JPH0322528U (it) | 1989-07-18 | 1989-07-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0322528U true JPH0322528U (it) | 1991-03-08 |
Family
ID=31632412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8415989U Pending JPH0322528U (it) | 1989-07-18 | 1989-07-18 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0322528U (it) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08325733A (ja) * | 1995-05-26 | 1996-12-10 | Tel Varian Ltd | 真空処理方法および真空処理装置 |
JP2002151495A (ja) * | 2000-11-14 | 2002-05-24 | Sharp Corp | プラズマ処理装置およびそれを用いて作製した半導体装置 |
-
1989
- 1989-07-18 JP JP8415989U patent/JPH0322528U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08325733A (ja) * | 1995-05-26 | 1996-12-10 | Tel Varian Ltd | 真空処理方法および真空処理装置 |
JP2002151495A (ja) * | 2000-11-14 | 2002-05-24 | Sharp Corp | プラズマ処理装置およびそれを用いて作製した半導体装置 |