JPH03224232A - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
JPH03224232A
JPH03224232A JP1956590A JP1956590A JPH03224232A JP H03224232 A JPH03224232 A JP H03224232A JP 1956590 A JP1956590 A JP 1956590A JP 1956590 A JP1956590 A JP 1956590A JP H03224232 A JPH03224232 A JP H03224232A
Authority
JP
Japan
Prior art keywords
wiring
potential
semiconductor integrated
wirings
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1956590A
Other languages
Japanese (ja)
Inventor
Shuichi Takahashi
秀一 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP1956590A priority Critical patent/JPH03224232A/en
Publication of JPH03224232A publication Critical patent/JPH03224232A/en
Pending legal-status Critical Current

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To stabilize the potential level of an analog signal without increasing the areas of wirings and without making small the degree of freedom of the layout of a pattern by the shielding effect of a third wiring, which is formed between parallel wirings and is fixed at a constant potential. CONSTITUTION:Parallel wirings are formed of a first wiring 11 for digital signal use consisting of Al and a second wiring 12 for analog signal use consisting of Al. A third wiring 13, which is fixed at a constant potential and consists of Al, is arranged between these parallel wirings via an insulating film 14. An inter-wiring capacity can be minimized by the shielding effect of the wiring 13. That is, as the capacity between the parallel wirings consisting of the wirings 11 and 12 can be minimized by the shielding effect of the wiring 13, the potential level of an analog signal is stabilized and at the same time, in case the shielding effect is applied to an A/D converter, the accuracy of an A/D conversion can be improved.

Description

【発明の詳細な説明】 (イ)産業上の利用分野 本発明は、半導体集積回路装置に関し、さらに詳しく言
えば、電気的シールドにより、アナログ信号の電位レベ
ルを安定化させた半導体集積回路装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a semiconductor integrated circuit device, and more specifically, to a semiconductor integrated circuit device in which the potential level of an analog signal is stabilized by an electrical shield. .

(ロ)従来の技術 近年、半導体集積回路は、大規模化、高集積化が進み配
線本数の増加、配線間距離の短縮という方向にある。
(b) Prior Art In recent years, semiconductor integrated circuits have become larger and more highly integrated, increasing the number of wires and shortening the distance between wires.

このため、互いに隣接する平行配線間に存在する分布容
量が増大し、隣接する配線の電位変化の影響が大きくな
る傾向にある。
For this reason, the distributed capacitance that exists between adjacent parallel wirings increases, and the influence of potential changes in the adjacent wirings tends to increase.

この場合、デジタル信号配線においては、通常のデジタ
ル回路の耐ノイズ性が比較的大きい為、このような電位
変化の影響により、誤動作することは稀である。
In this case, in the digital signal wiring, since the noise resistance of normal digital circuits is relatively high, malfunctions due to the influence of such potential changes are rare.

しかしながら、デジタル信号配線とアナログ信号配線と
が隣接している平行配線においては、このような電位変
化が直接例えばA/Dコンバータ又はD/Aコンバータ
の変換精度を悪化させるという問題があり、これを避け
るためには配線間の距離を変換精度を悪化させない程度
まで広げるか、又は平行配線を回避するパターンレイア
ウト上の工夫をしなければならなかった。
However, in parallel wiring where digital signal wiring and analog signal wiring are adjacent, there is a problem that such potential changes directly deteriorate the conversion accuracy of, for example, an A/D converter or a D/A converter. In order to avoid this, it was necessary to increase the distance between the wires to an extent that does not deteriorate conversion accuracy, or to devise a pattern layout to avoid parallel wires.

第5図は、従来例に係るA/Dコンバータの回路図であ
り、 第4図は、第5図の回路における第1の配線(1)、第
2の配線(2)を含む断面図である。
FIG. 5 is a circuit diagram of a conventional A/D converter, and FIG. 4 is a cross-sectional view including the first wiring (1) and second wiring (2) in the circuit of FIG. be.

図において、デジタル信号用の第1の配線(1)と、ア
ナログ信号用の第2の配線(2)とから成る平行配線が
形成され、第2の配線(2)はゲートにサンプルホール
ド用の信号φが入力されたPチャンネルトランジスタT
を介して比較器の一方の入力端子に接続され、基準電圧
V refが前記比較器の他方の入力端子に入力されて
いる。
In the figure, parallel wiring is formed consisting of a first wiring (1) for digital signals and a second wiring (2) for analog signals, and the second wiring (2) is connected to the gate for sample and hold. P-channel transistor T to which signal φ is input
is connected to one input terminal of the comparator via a reference voltage V ref is input to the other input terminal of the comparator.

容量C1及び容量C3は第1の配線(1)及び第2の配
線(2〉と半導体基板間の容量である。
Capacitance C1 and capacitance C3 are capacitances between the first wiring (1) and the second wiring (2>) and the semiconductor substrate.

第1の配線(1)と第2の配線(2)との間には容量C
3が形成されている。
There is a capacitance C between the first wiring (1) and the second wiring (2).
3 is formed.

第6図は第5図の回路の動作例を示したタイミングチャ
ートである。サンプルホールド用の信号φがロウレベル
の時、PチャンネルトランジスタTはオンし、その結果
第2の配線(2)においてアナログ信号が比較器の一方
の入力端子に伝達され、アナログ1圧Vに達する。
FIG. 6 is a timing chart showing an example of the operation of the circuit shown in FIG. When the sample and hold signal φ is at a low level, the P-channel transistor T is turned on, and as a result, an analog signal is transmitted to one input terminal of the comparator through the second wiring (2), and reaches an analog voltage V.

次に、信号≠がハイレベルの時、Pチャンネルトランジ
スタTはオフし、その結果前記アナログ電圧Vがホール
ドされる。
Next, when the signal ≠ is at a high level, the P-channel transistor T is turned off, and as a result, the analog voltage V is held.

この時、第1の配線(1)がロウレベルからハイレベル
に変化した場合、配線間容量C1の影響で第2の配線(
2)ノミ位はΔV l= C1/ (CI+ Ct+ 
c s ) x v oだけ増加する。
At this time, when the first wiring (1) changes from low level to high level, the second wiring (1) changes due to the influence of inter-wiring capacitance C1.
2) The chisel position is ΔV l= C1/ (CI+ Ct+
c s ) increases by x vo.

ここで、■、は第1の配線(1)の電位変化である。Here, ■ is the potential change of the first wiring (1).

この容量CIが大きいと、ΔV、の値が大きくなり、基
準電圧V refとの比較において、Δ■1の誤差が生
ずるのでA/D変換の誤差が大きくなってしまう。
If this capacitance CI is large, the value of ΔV becomes large, and an error of Δ■1 occurs in comparison with the reference voltage V ref, resulting in a large error in A/D conversion.

(ハ)発明が解決しようとする課題 従来の半導体集積回路装置においては、デジタル信号配
線とアナログ信号配線とが隣接している平行配線間の容
量によりアナログ信号が変化し、例えばA/Dコンバー
タの変換精度の悪化を招く。
(c) Problems to be Solved by the Invention In conventional semiconductor integrated circuit devices, analog signals change due to the capacitance between parallel wirings where digital signal wiring and analog signal wiring are adjacent. This results in deterioration of conversion accuracy.

したがって、変換精度の悪化を避けるためには、配線間
の距離を広げなければならず、配線面積が増加するとい
う欠点がある。
Therefore, in order to avoid deterioration in conversion accuracy, it is necessary to increase the distance between the wiring lines, which has the drawback of increasing the wiring area.

また、パターンレイアウト上で平行配線を回避すること
は、パターンレイアウトの自由度を小さくし、かつ自動
配置配線上の制約になるという欠点がある。
Furthermore, avoiding parallel wiring on a pattern layout has the disadvantage that it reduces the degree of freedom in pattern layout and becomes a constraint on automatic placement and wiring.

本発明は、前述の課題に鑑みて創作されたものであり、
配線面積を増加させることなく、パターンレイアウトの
自由度を小きくすることなく、かつアナログ信号の電位
レベルを安定化させた半導体集積回路装置を提供するこ
とを目的とする。
The present invention was created in view of the above-mentioned problems,
It is an object of the present invention to provide a semiconductor integrated circuit device in which the potential level of an analog signal is stabilized without increasing the wiring area or reducing the degree of freedom in pattern layout.

(ニ)課題を解決するための手段 本発明の半導体集積回路装置は、デジタル信号用の第1
の配線とアナログ信号用の第2の配線とからなる平行配
線と、前記平行配線間に絶縁膜を介して形成され、かつ
一定の電位に固定された電気的シールド用の第3の配線
とを具備することを特徴とする。
(d) Means for Solving the Problems The semiconductor integrated circuit device of the present invention provides a first
parallel wiring consisting of the wiring and a second wiring for analog signals, and a third wiring for electrical shielding formed between the parallel wiring with an insulating film interposed therebetween and fixed at a constant potential. It is characterized by comprising:

(*〉作用 本発明は、前述のように平行配線間に絶縁膜を介して形
成され、かつ一定の電位に固定された第3の配線のシー
ルド効果により、前記第3の配線の無い場合に比較して
配線間容量を非常に小さくできるので、デジタル信号の
電位変化の影響を小さくし、アナログ信号の電位レベル
を安定化することができる。
(*> Effect) As described above, the present invention utilizes the shielding effect of the third wiring formed between parallel wirings via an insulating film and fixed at a constant potential, so that when there is no third wiring, In comparison, the inter-wiring capacitance can be made very small, so the influence of changes in the potential of digital signals can be reduced and the potential level of analog signals can be stabilized.

(へ)実施例 以下、本発明に係る一実施例を第1図乃至第3図を参照
して説明する。
(F) Example Hereinafter, an example according to the present invention will be described with reference to FIGS. 1 to 3.

第1図は、本発明の一実施例の断面図であり、アルミニ
ウムより成るデジタル信号用の第1の配線(11)と、
アルミニウムより成るアナログ信号用の第2の配線(1
2)とが平行配線を形成している。
FIG. 1 is a cross-sectional view of one embodiment of the present invention, in which a first wiring (11) for digital signals made of aluminum,
The second wiring for analog signals (1
2) form parallel wiring.

平行配線間には、一定電位に固定され、アルミニウムよ
り成る第3の配線(13)が絶縁膜(14)を介して配
置されている。
A third wiring (13) made of aluminum and fixed at a constant potential is arranged between the parallel wirings with an insulating film (14) interposed therebetween.

第2図は、本発明に係るA/Dコンバータ回路の回路図
である0図においては、第3の配線(13)は接地電位
に接続されているが、電源電位に接続されてもよい。
FIG. 2 is a circuit diagram of the A/D converter circuit according to the present invention. In FIG. 0, the third wiring (13) is connected to the ground potential, but it may be connected to the power supply potential.

このような構成によれば、第3の配線(13)のシール
ド効果により、配線間容量を非常に小さくできる。
According to such a configuration, the inter-wiring capacitance can be made extremely small due to the shielding effect of the third wiring (13).

第3図は、第2図の回路の動作例を示すタイミングチャ
ートである。
FIG. 3 is a timing chart showing an example of the operation of the circuit shown in FIG.

サンプルホールド用の信号iがロウレベルの時、Pチャ
ンネルトランジスタTはオンし、その結果第2の配線(
12)においてアナログ信号が比較器の一方の入力端子
に伝達され、アナログ1圧■に達する。
When the sample and hold signal i is at low level, the P-channel transistor T is turned on, and as a result, the second wiring (
At 12), the analog signal is transmitted to one input terminal of the comparator and reaches the analog voltage 1.

次に、信号≠がハイレベルの時、Pfヤンネルトランジ
スタTはオフし、その結果前記アナログ電圧■がホール
ドされる。
Next, when the signal ≠ is at a high level, the Pf channel transistor T is turned off, and as a result, the analog voltage ■ is held.

この時、第1の配線(11)がロウレベルから71イレ
ベルに変化した場合、第2の配線(12)の電位Vは配
線間容量C4により影響を受けるがC6は前述のC1に
比べて非常に小さいため、第2の配線(12)の電位の
変化ΔV、は、Δv1に比べて非常に小さい。従って、
アナログ電圧レベルVの安定度が良くなり、A/D変換
精度を向上することが可能である。
At this time, when the first wiring (11) changes from low level to 71 high level, the potential V of the second wiring (12) is affected by the inter-wiring capacitance C4, but C6 is much smaller than the above-mentioned C1. Therefore, the change in potential of the second wiring (12) ΔV is very small compared to Δv1. Therefore,
The stability of the analog voltage level V is improved, and it is possible to improve the A/D conversion accuracy.

(ト)発明の効果 以上に説明したように、本発明によればデジタル信号配
線とアナログ信号配線とから成る平行配線間の容量を従
来に比べて非常に小さくできるので、アナログ信号の電
位レベルを安定化した半導体集積回路を製造することが
できる。
(G) Effects of the Invention As explained above, according to the present invention, the capacitance between the parallel wiring consisting of the digital signal wiring and the analog signal wiring can be made much smaller than before, so the potential level of the analog signal can be reduced. A stabilized semiconductor integrated circuit can be manufactured.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明に係る一実施例の断面図、第2図は、
本発明に係るA/Dコンバータ回路の回路図、 第3図は、第2図の回路の動作例を示すタイミングチャ
ート、 第4図は、従来例に係る断面図、 第5図は、従来例に係るA/Dコンバータ回路の回路図
、 第6図は、 第5図の回路の動作例を示すタイ ングチヤードである。
FIG. 1 is a sectional view of one embodiment of the present invention, and FIG. 2 is a sectional view of an embodiment according to the present invention.
A circuit diagram of an A/D converter circuit according to the present invention; FIG. 3 is a timing chart showing an example of the operation of the circuit of FIG. 2; FIG. 4 is a sectional view of a conventional example; FIG. 5 is a conventional example. FIG. 6 is a circuit diagram of an A/D converter circuit according to the invention. FIG. 6 is a timing chart showing an example of the operation of the circuit of FIG.

Claims (3)

【特許請求の範囲】[Claims] (1)デジタル信号用の第1の配線と、アナログ信号用
の第2の配線とから成る平行配線を有する半導体集積回
路装置において、前記平行配線間に絶縁膜を介して形成
され、かつ一定の電位に固定された電気的シールド用の
第3の配線とを有することを特徴とする半導体集積回路
装置。
(1) In a semiconductor integrated circuit device having parallel wiring consisting of a first wiring for digital signals and a second wiring for analog signals, the parallel wiring is formed with an insulating film interposed between the parallel wirings, and A semiconductor integrated circuit device comprising: a third wiring for electrical shielding fixed at a potential.
(2)前記第3の配線は、電源電位又は接地電位が印加
され、一定の電位に固定されていることを特徴とする請
求項第1項記載の半導体集積回路装置。
(2) The semiconductor integrated circuit device according to claim 1, wherein the third wiring is applied with a power supply potential or a ground potential and is fixed at a constant potential.
(3)前記第1、第2及び第3の配線は、同一層のアル
ミニウム層又はアルミニウム合金層により形成されて成
ることを特徴とする請求項第1項又は請求項第2項記載
の半導体集積回路装置。
(3) The semiconductor integrated circuit according to claim 1 or claim 2, wherein the first, second, and third wirings are formed of an aluminum layer or an aluminum alloy layer of the same layer. circuit device.
JP1956590A 1990-01-30 1990-01-30 Semiconductor integrated circuit device Pending JPH03224232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1956590A JPH03224232A (en) 1990-01-30 1990-01-30 Semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1956590A JPH03224232A (en) 1990-01-30 1990-01-30 Semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPH03224232A true JPH03224232A (en) 1991-10-03

Family

ID=12002819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1956590A Pending JPH03224232A (en) 1990-01-30 1990-01-30 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPH03224232A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03238823A (en) * 1990-02-15 1991-10-24 Nec Corp Semiconductor integrated circuit
US5585664A (en) * 1993-12-28 1996-12-17 Kabushiki Kaisha Toshiba Semiconductor integrated circuit device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03238823A (en) * 1990-02-15 1991-10-24 Nec Corp Semiconductor integrated circuit
US5585664A (en) * 1993-12-28 1996-12-17 Kabushiki Kaisha Toshiba Semiconductor integrated circuit device

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