JPH03216565A - Input threshold value voltage measuring system - Google Patents
Input threshold value voltage measuring systemInfo
- Publication number
- JPH03216565A JPH03216565A JP2012380A JP1238090A JPH03216565A JP H03216565 A JPH03216565 A JP H03216565A JP 2012380 A JP2012380 A JP 2012380A JP 1238090 A JP1238090 A JP 1238090A JP H03216565 A JPH03216565 A JP H03216565A
- Authority
- JP
- Japan
- Prior art keywords
- input
- semiconductor integrated
- threshold voltage
- integrated circuit
- input threshold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 30
- 230000000630 rising effect Effects 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 7
- 238000000691 measurement method Methods 0.000 claims description 9
- 238000010586 diagram Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 230000004044 response Effects 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000003708 edge detection Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- BVIDQAVCCRUFGU-UHFFFAOYSA-M methyl sulfate;trimethyl(1-phenothiazin-10-ylpropan-2-yl)azanium Chemical compound COS([O-])(=O)=O.C1=CC=C2N(CC(C)[N+](C)(C)C)C3=CC=CC=C3SC2=C1 BVIDQAVCCRUFGU-UHFFFAOYSA-M 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Electric Properties And Detecting Electric Faults (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
(概要)
半導体集積回路の実動作の入カ閾値電圧を測定する入力
閾値電圧測定方式に閏し、
半導体集積回路の実使用条件での正確な入カ閾値電圧を
測定することを目的とし、
半導体集積回路に入力信号を供給して該半導体集・積回
路の出力信号を測定し、該半導体集積回路の入力閾値電
圧を測定する入力閾値電圧測定方式において、立上がり
又は立下がりの傾きが異なる複数の入力信号を該半導体
集積回路に供給し、該複数の入力信号夫々に対する該半
導体集積回路の出力信号が変化するまでの遅延時間の差
を求め、該複数の入力信号の傾きの差と該遅延時間の差
とを用いて入力閾値電圧を求めるよう構成する。[Detailed Description of the Invention] (Summary) This method uses an input threshold voltage measurement method to measure the input threshold voltage of a semiconductor integrated circuit in actual operation, and accurately measures the input threshold voltage under actual operating conditions of the semiconductor integrated circuit. With the purpose of A plurality of input signals having different slopes of decline are supplied to the semiconductor integrated circuit, and the difference in delay time until the output signal of the semiconductor integrated circuit changes with respect to each of the plurality of input signals is determined. The input threshold voltage is determined using the difference in slope and the difference in delay time.
本発明は入力閾値電圧測定方式に関し、半導体集積回路
の実動作の入力閾値電圧を測定する入力閾値電圧測定方
式に関する。The present invention relates to an input threshold voltage measurement method, and more particularly, to an input threshold voltage measurement method for measuring the input threshold voltage of a semiconductor integrated circuit in actual operation.
従来、第5図に示す如く、被測定回路としての半導体集
積回路10をテスタ11に接続して半導体集積回路10
の入力閾値電圧を測定している。Conventionally, as shown in FIG. 5, a semiconductor integrated circuit 10 as a circuit under test is connected to a tester 11.
The input threshold voltage is being measured.
例えばハイレベルの入力閾値の場合、テスタ11より半
導体集積回路10に供給する入力信号のしレベルの電圧
ViLを固定してHレベルの電圧Vifl1とし、以下
順次Hレベルの電圧がViH2・・・viHnと異なる
信号を供給し、半導体集積回路10の出力信号をテスタ
11で期持値と比較して一致したときに試験を終了し、
そのときの入力信号の電圧を半導体集積回路10のハイ
レベルの入力閾値としている。For example, in the case of a high-level input threshold, the low-level voltage ViL of the input signal supplied from the tester 11 to the semiconductor integrated circuit 10 is fixed and set as the H-level voltage Vifl1, and then the H-level voltages are sequentially applied to ViH2...viHn. The tester 11 compares the output signal of the semiconductor integrated circuit 10 with the expected value and ends the test when they match,
The voltage of the input signal at that time is set as the high-level input threshold of the semiconductor integrated circuit 10.
従来の測定方法では半導体集積回路10の入力閾値は静
的な値であり、実使用条件での動的な値とは異なってし
まうという問題があった。また入力信号にノイズ等が重
畳すると測定誤差が大きくなり正確な入力鋼値を求める
ことができないという問題があった。The conventional measurement method has a problem in that the input threshold value of the semiconductor integrated circuit 10 is a static value, which differs from a dynamic value under actual usage conditions. Furthermore, if noise or the like is superimposed on the input signal, there is a problem in that measurement errors become large and accurate input steel values cannot be determined.
本発明は上記の点に鑑みなされたもので、半導体集積回
路10の実使用条件での正確な入力閾値を測定する入力
閾値測定方式を提供することを目的とする。The present invention has been made in view of the above points, and an object of the present invention is to provide an input threshold measurement method that accurately measures an input threshold under actual usage conditions of the semiconductor integrated circuit 10.
(:!R題を解決するための手段〕
本発明の入力閾値電圧測定方式は、
半導体集積回路に入力信号を供給して半導体集積回路の
出力信号を測定し、半導体集積回路の入力閾値電圧を測
定する入カ閾値電圧測定方式において、
立上がり又は立下がりの傾きが異なる複数の入力信号を
半導体集積回路に供給し、
複数の入力信号夫々に対する半導体集積回路の出力信号
が変化するまでの遅延時間の差を求め、複数の入力信号
の傾きの差と該遅延時間の差とを用いて入力閾値電圧を
求める。(Means for solving the problem:!R) The input threshold voltage measurement method of the present invention supplies an input signal to a semiconductor integrated circuit, measures the output signal of the semiconductor integrated circuit, and calculates the input threshold voltage of the semiconductor integrated circuit. In the input threshold voltage measurement method, multiple input signals with different rising or falling slopes are supplied to a semiconductor integrated circuit, and the delay time until the output signal of the semiconductor integrated circuit changes in response to each of the multiple input signals is calculated. The difference is determined, and the input threshold voltage is determined using the difference in slope of the plurality of input signals and the difference in delay time.
(作用)
本発明においては、入力信号の立上がり又は立下がりの
傾きの差と遅延時間との差から入力閾値電圧を求める。(Operation) In the present invention, the input threshold voltage is determined from the difference between the slope of the rising or falling slope of the input signal and the delay time.
つまり傾きを持った動的な入力信号で入力vAlaN圧
を求めるため、実使用条件での動的な入力閾値電圧を求
めることができ、また入力信号にノイズが重畳した場合
の誤差が従来の静的な入力閾値の測定よりも小さくなる
。In other words, since the input vAlaN pressure is determined using a dynamic input signal with a slope, it is possible to determine the dynamic input threshold voltage under actual usage conditions. is smaller than the standard input threshold measurement.
第3図は本発明方式を適用した試験構成のブロック図を
示す。FIG. 3 shows a block diagram of a test configuration to which the method of the present invention is applied.
同図中、該試験回路としての半導体集積回路20の入力
、出力夫々の端子はテスタ21のビンエレクトロニクス
回路22に接続されている。In the figure, input and output terminals of a semiconductor integrated circuit 20 serving as the test circuit are connected to a bin electronics circuit 22 of a tester 21.
テスタ21内の制御部23はメモリ24に格納されてい
る制御プログラムを実行し、ビンエレクトロニクス回路
22の動作制御を行なうと共に、テストメモリ25から
テストデータ及び比較パターンデータを読出してビンエ
レクトロニクス回路22に供給する。A control unit 23 in the tester 21 executes a control program stored in a memory 24 to control the operation of the bin electronics circuit 22 , and also reads out test data and comparison pattern data from the test memory 25 and sends them to the bin electronics circuit 22 . supply
ビンエレクトロニクス回路22は第4図に示す構成であ
る。端子30aに供給されるテストメモリ25よりのテ
ストデータはドライブパターンレジスタ32に格納され
て波形合成回路33に供給される。クロック選択回路3
5は制御部23より端子31aを介して供給される信号
に応じてクロックを選択して波形合成回路33に供給し
、波形モード選択回路36は制御部23より端子3lb
を介して供給される信号に応じてNRZ波形,R2波形
等の波形モードを選択して波形合成回路33に供給し、
波形合成回路33はこれらの信号に基づいて波形合成を
行ない出力バッフ734に供給する。出力バッファ34
にはIIIJw部23より端子31c.31d,31e
夫々を介しTI/0制御信号、ハイレベル指示電圧■i
H,ローレベル指示電圧ViOが供給され、出力バッフ
ァ34にこれらに従った電圧の入力信号を生成して端子
37より半導体集積回路20に供給する。The bin electronics circuit 22 has the configuration shown in FIG. Test data from the test memory 25 supplied to the terminal 30a is stored in the drive pattern register 32 and supplied to the waveform synthesis circuit 33. Clock selection circuit 3
5 selects a clock according to the signal supplied from the control section 23 via the terminal 31a and supplies it to the waveform synthesis circuit 33.
selects a waveform mode such as NRZ waveform or R2 waveform according to the signal supplied via the waveform synthesis circuit 33;
The waveform synthesis circuit 33 performs waveform synthesis based on these signals and supplies the result to an output buffer 734. Output buffer 34
is connected to the terminal 31c from the IIIJw section 23. 31d, 31e
TI/0 control signal, high level instruction voltage ■i
High and low level instruction voltages ViO are supplied, and the output buffer 34 generates an input signal of a voltage according to these, and supplies it to the semiconductor integrated circuit 20 from the terminal 37.
また、端子40に入来する半導体集積回路20の出力信
号はバツファ41を介してコンパレータ42,43に供
給され、ここで制御部23より端子31f,310を介
して供給されるハイレベル閾値電圧VOH,ローレベル
閾値電圧vO[と比較された後、パターン比較回路44
に供給される。パターン比較回路44にはテストメモリ
25より端子30bを介して供給される比較パターンデ
ータを格納した比較パターンレジスタ45より比較パタ
ーンデータが供給されており、パターン比較回路44は
出力信号パターンをこの比較パターンデータと比較して
その比較結果を端子46からill御部23に供給する
。Further, the output signal of the semiconductor integrated circuit 20 that enters the terminal 40 is supplied to the comparators 42 and 43 via the buffer 41, and the high-level threshold voltage VOH supplied from the control unit 23 via the terminals 31f and 310 is supplied here to the comparators 42 and 43. , low level threshold voltage vO[, the pattern comparison circuit 44
is supplied to The pattern comparison circuit 44 is supplied with comparison pattern data from a comparison pattern register 45 that stores comparison pattern data supplied from the test memory 25 via the terminal 30b, and the pattern comparison circuit 44 converts the output signal pattern into this comparison pattern. It compares it with the data and supplies the comparison result to the ill control section 23 from the terminal 46.
本発明においては、テスタ21は第1図(A),(C)
夫々に示す如く、傾きの異なる2種類の入力信号at
,a2を生成して別々に半導体集積回路20に供給する
。この2種類の入力信号のLレベル、Hレベル間の電圧
VHは互いに同一である。In the present invention, the tester 21 is shown in FIGS.
As shown in each figure, two types of input signals with different slopes at
, a2 are generated and separately supplied to the semiconductor integrated circuit 20. The voltages VH between the L level and H level of these two types of input signals are the same.
この第1図(A).(C)夫々の入力信号afta2に
対して半導体集積回路20より第1図(B).(D)夫
々に示す出力信号が得られる。This figure 1 (A). (C) From the semiconductor integrated circuit 20 in response to each input signal afta2 as shown in FIG. 1(B). (D) The output signals shown in each case are obtained.
テスタ21は第1図(A)の入力信号a1の立がり開始
時点1.から第1図(B)の出力信号の立下がり検出時
点t1までの遅延時間11 −10と第1図(C)の入
力信号a2の立上がり開始時点t2から第1図(D)の
出力信号の立下がり検出時点t3までの遅延時間t3−
t2との差△tを求める。また、第1図(A).(C)
夫々の立上がり時間T+ .T2夫々は既知であるから
次式により入力閾値電圧viHTHを求める。The tester 21 detects the rising edge of the input signal a1 shown in FIG. 1(A). The delay time 11 -10 from 11-10 to the falling edge detection time t1 of the output signal in FIG. 1(B) and from the rising start time t2 of the input signal a2 in FIG. 1(C) to the time t2 of the output signal in FIG. 1(D) Delay time t3- until falling detection time t3
Find the difference Δt from t2. Also, Fig. 1(A). (C)
Each rise time T+. Since each T2 is known, the input threshold voltage viHTH is determined by the following equation.
ViHTH=Δt xVH / (Tt −T2 )
(1)この式でT+−T2は入力信号a+ ,8
2夫々の傾きの差から生じる。ViHTH=Δt×VH/(Tt−T2)
(1) In this equation, T+-T2 is the input signal a+,8
This is caused by the difference in slope between the two.
(1)式を説明するために、第1図(A>.(C)夫々
の入力信号at ,a2の時点tl ,t3をそろえる
と第1図(A).(C)の入力信号a+,a2の立上が
りは第2図に示す如くなる。ここでd+ ,62夫々は
入力信号a+ .aZ夫々が立上がり開始から閾値電圧
Vi旧11となるまでの時問であり、次式の関係が成立
する。In order to explain equation (1), if the input signals at, a2 and time t3 of FIG. 1 (A>.(C) are aligned, the input signal a+ of FIG. 1(A). The rise of a2 is as shown in Fig. 2. Here, d+ and 62 are the times from when the input signals a+ and aZ each reach the threshold voltage Vi old 11 from the start of rising, and the following relationship holds true. .
VH / T + = V iHTH/ d +VH/
T2=Vi旧H/dz
d+ −d2 =Δt
このため△t = (T+ −T2 ) ・VillT
ll/Vllこれによって(1)式が導びかれる。VH / T + = V iHTH / d + VH /
T2=Vi old H/dz d+ -d2 =Δt Therefore, △t = (T+ -T2) ・VillT
ll/Vll This leads to equation (1).
このように、(1)式を用いて入力信号aH , az
の立上がりの傾きの差と遅延時間との差から入力閾値電
圧を求める。つまり傾きを持った動的な入力閾値電圧を
求めるため、実使用条件での動的な入力閾値電圧を求め
ることができる。また、入力信号の立上がりは所定の傾
きがあるため、従来の如くHレベルの電圧が固定の入力
信号に比して、入力信号にノイズが重畳しても測定誤差
が小さくなる。In this way, using equation (1), input signals aH, az
The input threshold voltage is determined from the difference between the rising slope of and the delay time. In other words, since a dynamic input threshold voltage with a slope is determined, a dynamic input threshold voltage under actual usage conditions can be determined. Furthermore, since the input signal has a predetermined rising edge, the measurement error is smaller even if noise is superimposed on the input signal, compared to a conventional input signal in which the H level voltage is fixed.
なお、上記実施例ではハイレベルの入力同値電圧の測定
を例として説明したが、これはローレベルの入力閾値の
測定でも同様であり、上記実施例に限定されない。In the above embodiments, the measurement of high level input equivalent voltages has been described as an example, but the same applies to the measurement of low level input thresholds, and the present invention is not limited to the above embodiments.
上述の如く、本発明の入力同値電圧測定方式によれば、
半導体集積回路の実使用条件での動的な入力閾値電圧を
正確に測定でき、ノイズによる影響が小さくて済み、実
用上きわめて有用である。As described above, according to the input equivalent voltage measurement method of the present invention,
The dynamic input threshold voltage of a semiconductor integrated circuit under actual usage conditions can be accurately measured, and the influence of noise is small, making it extremely useful in practice.
第1図は本発明方式を説明するための入出力信号波形図
、
第2図は本発明方式の原理を説明するための図、第3図
は本発明方式を適用した試験機構のブロック図、
第4図はビンエレクトロニクス回路のブロック図、
第5図は従来の試験機構のブロック図である。
図において、
20は半導体集積回路、
21はテスタ、
22はビンエレクトロニクス回路、
23はIIJw部、
24はメモリ、
25はテストメモリ
を示す。FIG. 1 is an input/output signal waveform diagram for explaining the method of the present invention, FIG. 2 is a diagram for explaining the principle of the method of the present invention, and FIG. 3 is a block diagram of a test mechanism to which the method of the present invention is applied. FIG. 4 is a block diagram of the bin electronics circuit, and FIG. 5 is a block diagram of a conventional test mechanism. In the figure, 20 is a semiconductor integrated circuit, 21 is a tester, 22 is a bin electronics circuit, 23 is an IIJw section, 24 is a memory, and 25 is a test memory.
Claims (1)
集積回路(20)の出力信号を測定し、該半導体集積回
路(20)の入力閾値電圧を測定する入力閾値電圧測定
方式において、 立上がり又は立下がりの傾きが異なる複数の入力信号を
該半導体集積回路(20)に供給し、該複数の入力信号
夫々に対する該半導体集積回路(20)の出力信号が変
化するまでの遅延時間の差を求め、 該複数の入力信号の傾きの差と該遅延時間の差とを用い
て入力閾値電圧を求めることを特徴とする入力閾値電圧
測定方式。[Claims] An input threshold voltage for supplying an input signal to a semiconductor integrated circuit (20), measuring an output signal of the semiconductor integrated circuit (20), and measuring an input threshold voltage of the semiconductor integrated circuit (20). In the measurement method, a plurality of input signals having different rising or falling slopes are supplied to the semiconductor integrated circuit (20), and the output signal of the semiconductor integrated circuit (20) for each of the plurality of input signals changes. An input threshold voltage measuring method characterized in that: a difference in delay time is determined; and an input threshold voltage is determined using the difference in slope of the plurality of input signals and the difference in delay time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012380A JPH07111454B2 (en) | 1990-01-22 | 1990-01-22 | Input threshold voltage measurement method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012380A JPH07111454B2 (en) | 1990-01-22 | 1990-01-22 | Input threshold voltage measurement method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03216565A true JPH03216565A (en) | 1991-09-24 |
JPH07111454B2 JPH07111454B2 (en) | 1995-11-29 |
Family
ID=11803669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012380A Expired - Fee Related JPH07111454B2 (en) | 1990-01-22 | 1990-01-22 | Input threshold voltage measurement method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07111454B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008102060A (en) * | 2006-10-20 | 2008-05-01 | Yokogawa Electric Corp | Timing calibration circuit and timing calibration method of semiconductor testing device |
US7482817B2 (en) * | 2005-09-22 | 2009-01-27 | Verigy (Singapore) Pte. Ltd. | Method and an apparatus for measuring the input threshold level of device under test |
-
1990
- 1990-01-22 JP JP2012380A patent/JPH07111454B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7482817B2 (en) * | 2005-09-22 | 2009-01-27 | Verigy (Singapore) Pte. Ltd. | Method and an apparatus for measuring the input threshold level of device under test |
JP2008102060A (en) * | 2006-10-20 | 2008-05-01 | Yokogawa Electric Corp | Timing calibration circuit and timing calibration method of semiconductor testing device |
Also Published As
Publication number | Publication date |
---|---|
JPH07111454B2 (en) | 1995-11-29 |
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