JPH03211276A - Vacuum treating device - Google Patents
Vacuum treating deviceInfo
- Publication number
- JPH03211276A JPH03211276A JP611290A JP611290A JPH03211276A JP H03211276 A JPH03211276 A JP H03211276A JP 611290 A JP611290 A JP 611290A JP 611290 A JP611290 A JP 611290A JP H03211276 A JPH03211276 A JP H03211276A
- Authority
- JP
- Japan
- Prior art keywords
- gap
- slit
- vacuum
- spacing
- electromagnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007789 sealing Methods 0.000 claims abstract description 22
- 238000001514 detection method Methods 0.000 claims abstract description 16
- 230000005284 excitation Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、プラスチック成形品、たとえば。[Detailed description of the invention] [Industrial application field] The present invention is applicable to plastic molded products, for example.
PETフィルムや合成繊維などの被処理物を連続的に真
空状態でプラズマ処理等を行う装置のシール装置に関す
る。The present invention relates to a sealing device for an apparatus that continuously performs plasma processing on objects to be processed such as PET films and synthetic fibers in a vacuum state.
従来の装置は、特開昭62−4866号公報、特願昭6
0−141506号明細書に記載のように、シールボッ
クス内のシール板を、ステッピングモータによって回転
駆動軸を介して昇降させて、ギツプを開閉させるように
なっていた。The conventional device is disclosed in Japanese Unexamined Patent Application Publication No. 62-4866 and Japanese Patent Application No. 1983.
As described in Japanese Patent Application No. 0-141506, a seal plate in a seal box is raised and lowered by a stepping motor via a rotary drive shaft to open and close a cast.
被処理物の表面の性状の悪化を防止するため、非接触に
よるシール方式が必要であり、そのシールギツプは出来
るだけ小さい方が良い。In order to prevent deterioration of the surface properties of the workpiece, a non-contact sealing method is required, and the seal gap should be as small as possible.
このシールギツプの制御方法として、被処理物の厚さを
搬入側で検出し、その信号によりステッピングモータを
回転させてシール装置間隙を制御していた。As a method of controlling this seal gap, the thickness of the object to be processed is detected on the loading side, and a stepping motor is rotated based on the signal to control the gap between the sealing devices.
ステッピングモータを使用する方式では、ステッピング
モータを取付けるスペースの確保のため、装置が大形と
なること、また、ボールねじとナツトを介してシールブ
ロックと一体となったコラムを上下させて、ギツプを調
整しているが、シールブロックとコラムの直角度の確保
、ボールねじとナツトなどの組立に多大な調整時間を要
していた。In systems that use a stepping motor, the equipment is large in order to secure space to install the stepping motor, and the column integrated with the seal block is moved up and down via a ball screw and nut to remove the cast. Although adjustments were made, it took a lot of time to ensure the perpendicularity of the seal block and column, and to assemble the ball screw and nuts.
上記目的は、被処理物の厚さを検出する検出手段と、ス
リット状シール間隙を検出する検出手段とを設け、前記
検出手段からの信号によりスリットの間隙を制御する制
御手段と、前記制御手段からの信号によりスリット間隙
を移動する手段に電磁石の吸込力を利用することにより
達成される。The above object is to provide a detection means for detecting the thickness of an object to be processed and a detection means for detecting a slit-shaped seal gap, a control means for controlling the gap between the slits based on a signal from the detection means, and a control means for controlling the gap between the slits based on a signal from the detection means. This is achieved by using the suction force of an electromagnet as a means for moving the slit gap in response to a signal from the slit.
被処理物の厚さ検出は、シール装置の前側に非接触によ
る被処理物厚さ検出手段を設け、その信号によりシール
ブロックを浮上させる制御手段が、スリット状シール装
置の間隙を制御する。To detect the thickness of the workpiece, a non-contact means for detecting the thickness of the workpiece is provided on the front side of the sealing device, and a control means that levitates the seal block based on the signal controls the gap between the slit-shaped sealing devices.
このシールブロックを浮上させる制御手段に電磁石を用
いる。An electromagnet is used as a control means to levitate this seal block.
さらに、スリット状シール装置の間隙検出手段によりシ
ールブロックの位置を検出し1間隙検出手段からの信号
とあらかじめ定められた最適シールギツプを加えた最適
ギツプに常になるよう間隙を制御する。Further, the position of the seal block is detected by the gap detection means of the slit-shaped seal device, and the gap is controlled so that the gap is always the optimum gap, which is the sum of the signal from the gap detection means and a predetermined optimum seal gap.
これによって、スリット状シール装置の間隙は被処理物
の厚さに応じた最適なものとなり、種々の厚さの被処理
物を搬送することが可能となる。As a result, the gap between the slit-shaped sealing devices becomes optimal according to the thickness of the workpiece, and it becomes possible to transport workpieces of various thicknesses.
以下、本発明の実施例を図面により説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第4図において、1は被処理物Fを真空状態で連続的に
プラズマ処理する真空装置室、2は真空処理室1の前方
側に複数個配置される予備真空室。In FIG. 4, reference numeral 1 denotes a vacuum equipment chamber in which a workpiece F is subjected to continuous plasma processing in a vacuum state, and 2 denotes a plurality of preliminary vacuum chambers arranged at the front side of the vacuum processing chamber 1.
3は真空処理室1の後方側に複数個配置される予備真空
室で、真空処理室内はこれに接続する真空ポンプにより
10−3Torr程度の真空圧力に保持するように排気
導管4を介して真空排気される。Reference numeral 3 designates a plurality of pre-vacuum chambers arranged at the rear of the vacuum processing chamber 1, and the vacuum processing chamber is evacuated via an exhaust conduit 4 to maintain a vacuum pressure of approximately 10-3 Torr by a vacuum pump connected to the vacuum processing chamber. Exhausted.
予備真空室2,3は、これに接続する真空ポンプ5によ
り、真空処理室1内の真空圧力より若干高く、かつ大気
圧より段階的に減じる真空を保持するように排気導管6
を介して真空排気される。The preliminary vacuum chambers 2 and 3 are connected to the vacuum pumps 5 through which the exhaust conduits 6 are maintained to maintain a vacuum that is slightly higher than the vacuum pressure in the vacuum processing chamber 1 and gradually lowers than the atmospheric pressure.
It is evacuated through.
被処理物Fは巻出軸7より送り出され、前方側の予備真
空室内の被処理物の張力を制御するガイドロール8を経
て、前方側予備真空室2に送られる。前方側予備真空室
2の入口において、備えられた被処理物の厚さ検出手段
1bにより、厚さを検出する。The workpiece F is sent out from the unwinding shaft 7 and sent to the front preliminary vacuum chamber 2 via a guide roll 8 that controls the tension of the workpiece in the front preliminary vacuum chamber. At the entrance of the front preliminary vacuum chamber 2, the thickness of the object to be processed is detected by a thickness detecting means 1b provided therein.
その後、被処理物Fは前方側予備真空室2を経て真空処
理室1に送られ、そこでプラズマ処理される。プラズマ
処理された被処理物Fは後方側の予備真空室3を経て、
後方側予備真空室内の張力を制御するガイドロール9を
経て巻取軸10にて巻取られる。Thereafter, the object to be processed F is sent to the vacuum processing chamber 1 via the front preliminary vacuum chamber 2, where it is subjected to plasma processing. The plasma-treated workpiece F passes through the preliminary vacuum chamber 3 on the rear side,
The film is wound up on a winding shaft 10 via a guide roll 9 that controls the tension in the rear preliminary vacuum chamber.
第1図は、予備真空室2及び3を構成するシール装置の
主要部とシール装置システムの構成を示す。 第2図は
、第1図のA−A断面である。FIG. 1 shows the main parts of the sealing device constituting the preliminary vacuum chambers 2 and 3 and the configuration of the sealing device system. FIG. 2 is a cross section taken along the line AA in FIG. 1.
11は上ケース、12は下ケース、13は下ケースに案
内されるシールブロックであり、被処理物Fは上ケース
11とシールブロック13で形成されるスリットの間を
接触しないで搬送される。11 is an upper case, 12 is a lower case, and 13 is a seal block guided by the lower case, and the workpiece F is conveyed between the slits formed by the upper case 11 and the seal block 13 without contacting them.
15は電磁石であり、これによって発生する電磁力を制
御することによりシールブロック13を上、下方向に動
かす。Reference numeral 15 denotes an electromagnet, and by controlling the electromagnetic force generated by the electromagnet, the seal block 13 is moved upward and downward.
14は上ケース11とシールブロック13で形成される
スリット間隙を間接的に測定する位置検出手段である。Reference numeral 14 denotes a position detection means for indirectly measuring the slit gap formed between the upper case 11 and the seal block 13.
20.21は被処理物の厚さに応じて、被処理物を適当
な張力でシールボックスに案内するガイドローラである
。20’ 、21’は適正な張力を発生させる加圧手段
である。Guide rollers 20 and 21 guide the workpiece to the seal box with an appropriate tension depending on the thickness of the workpiece. 20' and 21' are pressure means for generating appropriate tension.
被処理物の厚さ検出手段1bと上ケース11とシールブ
ロック13で形成されるスリット間隙検出手段14およ
びガイドローラ加圧手段20’21′よりの信号は、演
算器18に入り、制御器19で被処理物の厚さに応じた
最適なシール間隙になるような電力を増幅器19を介し
電磁石に出力する。Signals from the slit gap detection means 14 formed by the thickness detection means 1b of the workpiece, the upper case 11 and the seal block 13, and the guide roller pressure means 20'21' are input to the computing unit 18 and sent to the controller 19. Power is outputted to the electromagnet via the amplifier 19 so as to provide the optimum sealing gap depending on the thickness of the object to be processed.
電磁石の構造は、第3図に示すシール間隙のストローク
と励磁さハで発生する吸引力の特性が最も制御し易い特
性になるよう巻線数等を決める。Regarding the structure of the electromagnet, the number of windings, etc. are determined so that the characteristics of the attraction force generated by the stroke of the seal gap and the excitation shown in FIG. 3 can be most easily controlled.
次に、本発明の作用について説明する。Next, the operation of the present invention will be explained.
演算器に所要のシール間隙を入力し、制御器には、第3
図に示す電磁石の特性である励磁電力によって発生する
吸収力とシール間隙の関係を入力しておく。Enter the required seal gap into the calculator, and enter the third seal gap into the controller.
Input the relationship between the absorption force generated by the excitation power and the seal gap, which is a characteristic of the electromagnet shown in the figure.
巻出軸より搬送された被処理物Fは、シールブロックの
前方にある検出手段1bで厚さを測定されその信号を演
算器17に送られる。The thickness of the workpiece F conveyed from the unwinding shaft is measured by the detection means 1b located in front of the seal block, and the measured signal is sent to the computing unit 17.
この時点で、電磁石は励磁されておらず、シールブロッ
ク13は下方に落下している。At this point, the electromagnet is not energized and the seal block 13 has fallen downward.
演算器17では、あらかじめ入力されている所要のシー
ル間隙と被処理物の厚さの合計値に、上ケース11とシ
ールブロック13で形成するスリット間隙がなるよう制
御器18に信号を出力する制御器18は電力増幅器19
を介し、電磁石に励磁電力を送り、シールブロック13
を電磁力により浮上させ、所要シール間隙を形成させる
。The calculator 17 outputs a signal to the controller 18 so that the slit gap formed by the upper case 11 and the seal block 13 becomes the sum of the required seal gap and the thickness of the object to be processed, which have been input in advance. The device 18 is a power amplifier 19
Send excitation power to the electromagnet through the seal block 13
is floated by electromagnetic force to form the required seal gap.
上、下のシール間隙は20’ 、21’のガイドローラ
位置決め手段に対し、制御器18より出力信号が送られ
均等になるように制御される。The upper and lower seal gaps are controlled to be equal by sending an output signal from the controller 18 to guide roller positioning means 20' and 21'.
被処理物Fの厚さ変動や、運転中の熱膨張等によるシー
ル間隙の変化については、シール間隙の間接的検出手段
14により測定し、その信号を演算器172戸制御器1
8に送り、常に、所定のシール間隙になるように制御さ
れる。Changes in the seal gap due to changes in the thickness of the workpiece F, thermal expansion during operation, etc. are measured by the seal gap indirect detection means 14, and the signals are sent to the computer 172 and the controller 1.
8 and is controlled to always maintain a predetermined sealing gap.
これらにより被処理物Fの厚さに応じて、シールブロッ
ク13が被処理Fと接触せず、常に、所定のシール性能
を保つように、シールブロック13の微妙な位置を自動
的に設定することが可能となる。With these, the delicate position of the seal block 13 is automatically set according to the thickness of the workpiece F so that the seal block 13 does not come into contact with the workpiece F and always maintains a predetermined sealing performance. becomes possible.
本発明によれば、スリット状シール装置のスリット間隙
をステッピングモータなどで調整する方法に比べ、ステ
ッピングモータの回転運動をシールブロックの上下直線
運動に変える駆動装置が不要となり、装置の小型化や組
立作業の容易などが図られ駆動部をシールする必要が無
くなるため真空装置としてのシール性が著しく向上する
。According to the present invention, compared to a method in which the slit gap of a slit-shaped seal device is adjusted using a stepping motor or the like, there is no need for a drive device that converts the rotational movement of the stepping motor into vertical linear movement of the seal block. The work is made easier and there is no need to seal the drive section, so the sealing performance of the vacuum device is significantly improved.
第1図は本発明の一実施例のシール装置の縦断面図、第
2図は第1図のA−A断面図、第3図は電磁石の吸引力
とストロークの関係を示す特性図、第4図は真空連続処
理装置の縦断面図である。
F・・・被処理物、11・・・上ケース、12・・・下
ケース、13・・・シールブロック、15・・・電磁石
、14゜16・・・検出手段、17・・・演算手段、1
8・・・制御手段、19・・・増幅手段、20.21・
・・ガイドローラ、20’ 、21’ ・・・ガイドロ
ーラ位置決め手段。FIG. 1 is a longitudinal sectional view of a sealing device according to an embodiment of the present invention, FIG. 2 is a sectional view taken along line AA in FIG. FIG. 4 is a longitudinal sectional view of the vacuum continuous processing apparatus. F...Processed object, 11...Upper case, 12...Lower case, 13...Seal block, 15...Electromagnet, 14°16...Detection means, 17...Calculation means ,1
8... Control means, 19... Amplification means, 20.21.
...Guide rollers, 20', 21'...Guide roller positioning means.
Claims (1)
備真空室を配置して、被処理物を搬送し、前記真空処理
室を外部からシールするスリット状のシール装置をもつ
た真空連続処理装置において、 前記スリット状のシール装置の間隙の制御手段として、
搬入側に被処理物膜厚検出手段を設け、前記検出手段か
らの信号により前記スリット状のシール装置の間隙を制
御する手段として電磁石を備え、その吸引力により前記
スリット状のシール装置の間隙を調整すると共に、前記
スリット状のシール装置の間隙を検出する位置検出手段
を設けたことを特徴とする真空連続処理装置。1. In a vacuum continuous processing apparatus having at least one pre-vacuum chamber disposed on each side of the vacuum processing chamber at the front and rear sides thereof, and having a slit-shaped sealing device for transporting the workpiece and sealing the vacuum processing chamber from the outside, As a means of controlling the gap in a slit-shaped seal device,
A film thickness detection means for the processed material is provided on the carry-in side, and an electromagnet is provided as a means for controlling the gap of the slit-shaped sealing device based on a signal from the detection device, and the gap of the slit-shaped sealing device is controlled by the suction force of the electromagnet. A continuous vacuum processing apparatus characterized in that a position detection means is provided for adjusting and detecting a gap between the slit-shaped sealing devices.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP611290A JPH03211276A (en) | 1990-01-17 | 1990-01-17 | Vacuum treating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP611290A JPH03211276A (en) | 1990-01-17 | 1990-01-17 | Vacuum treating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03211276A true JPH03211276A (en) | 1991-09-17 |
Family
ID=11629423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP611290A Pending JPH03211276A (en) | 1990-01-17 | 1990-01-17 | Vacuum treating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03211276A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5164499A (en) * | 1984-05-03 | 1992-11-17 | E. I. Du Pont De Nemours And Company | Nitroaryl carbonyl compounds, nitrodihydroaryl carbonyl intermediates thereto, and processes |
US8432605B2 (en) | 2010-10-18 | 2013-04-30 | Samsung Display Co., Ltd. | Electrophoretic indication display device |
-
1990
- 1990-01-17 JP JP611290A patent/JPH03211276A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5164499A (en) * | 1984-05-03 | 1992-11-17 | E. I. Du Pont De Nemours And Company | Nitroaryl carbonyl compounds, nitrodihydroaryl carbonyl intermediates thereto, and processes |
US8432605B2 (en) | 2010-10-18 | 2013-04-30 | Samsung Display Co., Ltd. | Electrophoretic indication display device |
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