JPH03210533A - Electro-optical device - Google Patents

Abstract

PURPOSE:To reduce the electrostatic breakdown of a non-linear resistance element and to obtain an electro-optical device having high yield by forming a wiring electrode on a non-linear resistance thin film so that one side of the electrode comes into contact with a substrate. CONSTITUTION:The electro-optical device having many picture element so as to be used for a television or the like is constituted of the wiring electrode 14, a transparent picture element electrode 12 and the non-linear resistance element 13 on the inside of at least one substrate 11 and the non-linear resistance element is constituted of the 1st conductor consisting of the electrode 14, the 2nd conductor consisting of the electrode 12 and the non-linear resistance thin film 13 formed between the 1st and 2nd conductors 14, 12. In this case, at least one side of the electrode 14 comes into contact with the substrate 11 along the thin film 13. Consequently, static electricity accumulated on the substrate 11 can be discharged without passing it through the non-linear resistance element, the occurrence of a picture element defect due to electrostatic breakdown can be reduced and high yield can be attained.

Description

Detailed Description of the Invention [Field of Industrial Application] The present invention relates to an electro-optical device having a large number of pixels used in displays for personal computers, displays for hand belt computers, day displays for various measuring instruments, televisions, etc. Regarding.

[Summary of the invention]

In the present invention, an inner surface of at least one substrate includes a wiring electrode, a pixel electrode, and a nonlinear resistance element, and the nonlinear resistance element includes a first conductor consisting of the wiring electrode, and a second conductor consisting of the pixel electrode, and By providing an electro-optical device consisting of a nonlinear resistance thin film formed between a first conductor and a second conductor, one side of the wiring electrode is in contact with the substrate along the nonlinear resistance thin film, This allows static electricity accumulated on the substrate to be discharged without passing through the nonlinear resistance element.

[Prior Art] Nonlinear resistance elements using a silicon nitride film, a silicon oxide film, or a silicon nitride oxide film as a nonlinear resistance thin film are conventionally known. Conventionally, as shown in FIG. 2, a pixel electrode 22 is formed on a substrate 21, a nonlinear resistance thin film 23 is formed on the pixel electrode, and a wiring electrode 24 is formed on the nonlinear resistance thin film. A nonlinear resistance element is obtained by the pixel electrode, the nonlinear resistance element, and the wiring electrode.

[Problem to be Solved by the Invention 1] However, when wiring electrodes are formed on a nonlinear resistance thin film, since there is no contact point between the substrate and the wiring electrodes, the charges accumulated on the substrate are difficult to discharge, and the nonlinear resistance element was prone to electrostatic damage.

The present invention provides an electro-optical device that reduces electrostatic damage to nonlinear resistance elements and has a high yield.

Means for Solving Problem C] The electro-optical device of the present invention solves the above problems, and in a nonlinear resistance element consisting of a pixel electrode, a wiring electrode, and a nonlinear resistance thin film, one side of the wiring electrode is attached to the substrate. By forming it on a nonlinear resistive thin film so that it is in contact with
[Function] As described above, by contacting the substrate with one side of the wiring electrode, an electro-optical device with fewer pixel defects can be obtained, and a high-performance electro-optical device can be obtained. It depends on the yield.

[Example J Embodiments of the present invention will be described below based on the drawings.

FIG. 3(A) clearly shows one pixel of a substrate on which a nonlinear resistance element of a liquid crystal display device according to the present invention is formed,
The liquid crystal layer, the counter substrate for enclosing the liquid crystal, the polarizing plate, etc. are omitted for the sake of simplicity.

FIG. 3(B) is a diagram clearly showing one pixel in the vertical cross-sectional structure of the liquid crystal display device according to the present invention.

In FIG. 3, 31 is a transparent substrate, which is made of soda glass, pyrex glass, etc. and has a thickness of 0.5 to 1.1 mm. 32 is a transparent pixel electrode, and 100 to 500 indium tin oxide (ITO) films are deposited by magnetron sputtering and patterned into a predetermined shape by photoetching. 33 is an amorphous material whose main component is silicon;
After patterning the transparent pixel electrode, about 750 to 1,500 silicon particles are sputtered onto a silicon nitride target using a magnetron sputtering device using a sputtering method using argon gas or a reactive sputtering method using argon gas and nitrogen gas for a silicon target. A nitride film was deposited and patterned into a predetermined shape by photoetching. 34 is a wiring electrode, which is one of the matrix electrodes, and in this example, aluminum or chromium metal is formed by magnetron sputtering after patterning the nonlinear resistance thin film 33 to a thickness of about 1000 to 1000.
8,000 people were deposited and patterned by photoetching into a shape in which one side was in contact with 31 transparent substrates. Further, in this example, after forming 32 transparent pixel electrodes into a predetermined shape, a silicon nitride film was deposited by reacting silane gas and nitrogen gas using a plasma CVD apparatus, and the electrodes were formed into a predetermined shape. Then, deposit aluminum or chromium by magnetron sputtering.
Photo-etching was also used to pattern the wiring electrode 34 into a shape in which one side was in contact with the transparent pixel electrode 31. FIG. 1 shows a nonlinear resistance element formed by the above process, and FIG. 2 shows a conventional nonlinear resistance element for comparison. As shown in Figure 2, when the wiring electrode is formed on a nonlinear resistance thin film and the transparent substrate and the wiring electrode are not in contact, the charges accumulated in the transparent substrate are difficult to discharge, and the nonlinear resistance element may be damaged by electrostatic discharge. there were. Therefore, pixel defects were likely to occur, but in the present invention, since the transparent substrate and the wiring electrode are in contact with each other, static electricity accumulated on the transparent substrate can be discharged or grounded by flowing to the wiring electrode without passing through the nonlinear thin film. As a result, the occurrence of pixel defects due to electrostatic discharge damage can be reduced, resulting in a high yield.

Moreover, as shown in FIG. 4, in this embodiment, all dividends #! By forming the electrode in a shape that connects one end of the electrode, it becomes easier to perform grounding from the outside, thereby further reducing the occurrence of pixel defects due to electrostatic discharge damage.

[Effects of the Invention] As described above, by using the nonlinear resistance element according to the present invention, an electro-optical device with fewer pixel defects caused by electrostatic discharge damage can be achieved, resulting in a high yield.

[Brief explanation of drawings]

Figure 1 is a sectional view of a nonlinear resistance element according to the present invention, Figure 2 is a sectional view of a conventional nonlinear resistance element, Figure 3 (A) is a perspective view of the electrode structure of a substrate, and Figure 3 (B) is a liquid crystal display. FIG. 4 is a longitudinal sectional view of the display device and a plan view of the wiring electrode terminal portion of the embodiment. 11.21 , 3 12, 22, 3 13, 23, 3 14, 24, 3 1, 38 ・Transparent substrate 2.41.52 ・Transparent pixel electrode 3.42 ・Nonlinear resistance thin film 4.43.54 ...・Wiring electrode 35...Liquid crystal 36...Alignment film 37...Transparent electrode 39...Polarizing plate

Claims (1)

[Claims] The inner surface of at least one substrate includes a wiring electrode, a pixel electrode, and a nonlinear resistance element, and the nonlinear resistance element includes a first conductor made of the wiring electrode, a second conductor made of the pixel electrode, and a second conductor made of the pixel electrode. and a nonlinear resistance thin film formed between the conductor and the second conductor, wherein at least one side of the wiring electrode is in contact with the substrate along the nonlinear resistance thin film.