JPH0320946A - Manufacture of sample for transmission electron microscope - Google Patents
Manufacture of sample for transmission electron microscopeInfo
- Publication number
- JPH0320946A JPH0320946A JP15540189A JP15540189A JPH0320946A JP H0320946 A JPH0320946 A JP H0320946A JP 15540189 A JP15540189 A JP 15540189A JP 15540189 A JP15540189 A JP 15540189A JP H0320946 A JPH0320946 A JP H0320946A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- cross
- transmission electron
- electron microscope
- observation position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005540 biological transmission Effects 0.000 title description 13
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 15
- 238000005498 polishing Methods 0.000 claims description 7
- 238000004627 transmission electron microscopy Methods 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 abstract description 2
- 238000007790 scraping Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 5
- 238000005464 sample preparation method Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は透過型電子顕微鏡用の試料作製方法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for preparing a specimen for a transmission electron microscope.
従来の技術
透過型電子顕微鏡で観察するには、試料をできるかぎジ
薄膜化する必要がある。そのため断面観察用の試料作製
は困難であシ、種々の手法が考案されている。In order to observe a sample using a conventional transmission electron microscope, it is necessary to make the sample as thin as possible. Therefore, it is difficult to prepare a sample for cross-sectional observation, and various methods have been devised.
以下、従来の一般的な断面観察用の試料作製方法につい
て図面を用いて説明する。Hereinafter, a conventional general method for preparing a sample for cross-sectional observation will be described with reference to the drawings.
第2図は従来の断面観察用の試料作製方法についての説
明図であシ、1は観察試料、2は試料を薄膜化するため
のイオンビームである。FIG. 2 is an explanatory diagram of a conventional method for preparing a sample for cross-sectional observation, where 1 is an observation sample and 2 is an ion beam for thinning the sample.
以下その試料作製方法について説明する。The sample preparation method will be explained below.
捷ず第2図aに示すような試料1を第2図bに示すよう
にダイヤモンド力ツタを用い約O.SrMn厚に切断す
る。次に機械的な研磨法により10〜20μmとできる
だけ薄膜とした後に、第2図Cに示すように最終仕上げ
としてイオンビーム2を用いたエッチング法により透過
型電子顕微鏡観察が可能な膜厚1で試料を薄くして断面
観察用試料としている。The sample 1 as shown in FIG. 2a without being separated was heated to about 0.05 mm using a diamond forceps as shown in FIG. 2b. Cut into SrMn thickness. Next, after making the film as thin as possible to 10 to 20 μm using a mechanical polishing method, as a final finish, as shown in Figure 2C, an etching method using an ion beam 2 is used to achieve a film thickness of 1 that can be observed with a transmission electron microscope. The sample is thinned and used for cross-sectional observation.
発明が解決しようとする課題
しかしながら、上記従来の透過型電子顕微鏡用の試料作
製方法では、特定部の断面を観察するための試料を作製
することが困難であるという課題があった。Problems to be Solved by the Invention However, the conventional method for preparing a sample for a transmission electron microscope has a problem in that it is difficult to prepare a sample for observing a cross section of a specific portion.
課題を解決するための手段
この問題点を解決するために本発明の透過型電子顕微鏡
用の試料作製方法は、試料の一辺から機械的あるいは化
学的な手法により断面観察位置近〈1で試料を研磨した
後に、断面観察位置を残してこの研磨した側面よシ非常
に近い試料表面から集束イオンビームを用い断面観察位
置より深い溝を掘ることを特徴としたものである。Means for Solving the Problem In order to solve this problem, the method for preparing a sample for a transmission electron microscope of the present invention is to prepare a sample from one side of the sample by a mechanical or chemical method near the cross-sectional observation position. After polishing, a groove deeper than the cross-sectional observation position is dug using a focused ion beam from the sample surface very close to the polished side surface, leaving the cross-sectional observation position.
作 用
この試料作製方法では高い精度での位置合わせが可能な
機械的な研磨法と集束イオンピーム法を用い試料断面の
膜厚を薄くしているため、透過型電子顕微鏡による特定
部の断面観察が可能となる。Function: This sample preparation method uses a mechanical polishing method that enables highly accurate positioning and a focused ion beam method to reduce the thickness of the cross section of the sample, making it easy to observe the cross section of a specific part using a transmission electron microscope. It becomes possible.
実施例
以下、本発明の一実施例について、図面を参照しながら
説明する。EXAMPLE Hereinafter, an example of the present invention will be described with reference to the drawings.
第1図は本発明の一実施例にかける透過型電子顕微鏡用
の試料作製方法を示すものである。第1図に釦いて、1
は観察試料、3は断面観察を必要とする部分、4は集束
イオンビーム、6は集束イオンビーム4で掘った溝であ
る。FIG. 1 shows a method for preparing a sample for a transmission electron microscope according to an embodiment of the present invention. Click on Figure 1 and click 1.
3 is an observation sample, 3 is a portion requiring cross-sectional observation, 4 is a focused ion beam, and 6 is a groove dug by the focused ion beam 4.
以下その試料作製方法について説明する。The sample preparation method will be explained below.
1ず、第1図aに示すような試料1の一辺より断面観察
位置30近く、約500 n mの位置1で機械的に研
磨する(第1図b)。次に断面観察位置3を残して、こ
の研磨した側而よシ約300nm離れた試料表面から集
束イオンビーム4用い、試料表面より0.5μmにある
断面観察位置3より深い、深さ約1.0μmの溝5を掘
る(第1図C)。1. First, mechanical polishing is performed at a position 1 approximately 500 nm from one side of the sample 1 as shown in FIG. 1a, near the cross-sectional observation position 30 (FIG. 1b). Next, leaving the cross-section observation position 3, the focused ion beam 4 is used from the sample surface approximately 300 nm away from the polished side to a depth of about 1.5 μm deeper than the cross-section observation position 3, which is 0.5 μm from the sample surface. Dig a groove 5 of 0 μm (Fig. 1C).
この方法で作製した試料は第3図に示す配置によって、
透過型電子顕微鏡による断面観察が可能である。The sample prepared by this method is arranged as shown in Figure 3.
Cross-sectional observation using a transmission electron microscope is possible.
発明の効果
本発明は、高い精度での位置合わせが可能な機械的な研
磨法と集束イオンビーム法を用い断面観察用試料を作製
しているため、特定部の断面観察が可能な透過型電子顕
微鏡用試料の作製を実現するものである。Effects of the Invention The present invention uses a mechanical polishing method that enables highly accurate positioning and a focused ion beam method to prepare a specimen for cross-sectional observation. This realizes the preparation of specimens for microscopy.
第1図は本発明の一実施例に釦ける透過型電子顕微鏡用
の試料作製方法を示す図、第2図は従来の透過型電子顕
微鏡用の試料作製方法を示す図、第3図は本発明の方法
で作製した試料の透過型電子顕微鏡による観察配置図で
ある。
1・・・・・・観察試料、2・・・・・・試料研磨用イ
オンビーム、3・・・・・・断面観察場所、4・・・・
・・集束イオンビーム、5・・・・・・集束イオンビー
ムで掘った溝、6・・・・・・電子ビーム。Figure 1 is a diagram showing a sample preparation method for a transmission electron microscope according to an embodiment of the present invention, Figure 2 is a diagram showing a conventional sample preparation method for a transmission electron microscope, and Figure 3 is a diagram showing a method for preparing a sample for a transmission electron microscope. FIG. 2 is an observation layout diagram of a sample prepared by the method of the invention using a transmission electron microscope. 1... Observation sample, 2... Ion beam for sample polishing, 3... Cross section observation location, 4...
... Focused ion beam, 5... Groove dug by focused ion beam, 6... Electron beam.
Claims (1)
観察位置の近くまで試料を研磨した後に、断面観察位置
を残してこの研磨した側面より非常に近い試料表面から
集束イオンビームを用い断面観察位置より深い溝を掘る
ことを特徴とした透過型電子顕微鏡用試料の作製方法。After polishing the sample from one side of the sample mechanically or chemically to near the cross-sectional observation position, the cross-sectional observation position is left and a focused ion beam is used from the sample surface very close to the polished side to remove the cross-sectional observation position. A method for preparing specimens for transmission electron microscopy, which is characterized by digging deep grooves.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1155401A JP2529398B2 (en) | 1989-06-16 | 1989-06-16 | Transmission electron microscope material preparation method and observation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1155401A JP2529398B2 (en) | 1989-06-16 | 1989-06-16 | Transmission electron microscope material preparation method and observation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0320946A true JPH0320946A (en) | 1991-01-29 |
JP2529398B2 JP2529398B2 (en) | 1996-08-28 |
Family
ID=15605163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1155401A Expired - Lifetime JP2529398B2 (en) | 1989-06-16 | 1989-06-16 | Transmission electron microscope material preparation method and observation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2529398B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0552721A (en) * | 1991-08-22 | 1993-03-02 | Hitachi Ltd | Sample separating method and method for analyzing separated sample obtained by the separating method |
-
1989
- 1989-06-16 JP JP1155401A patent/JP2529398B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0552721A (en) * | 1991-08-22 | 1993-03-02 | Hitachi Ltd | Sample separating method and method for analyzing separated sample obtained by the separating method |
Also Published As
Publication number | Publication date |
---|---|
JP2529398B2 (en) | 1996-08-28 |
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