JPH0320479B2 - - Google Patents
Info
- Publication number
- JPH0320479B2 JPH0320479B2 JP63070953A JP7095388A JPH0320479B2 JP H0320479 B2 JPH0320479 B2 JP H0320479B2 JP 63070953 A JP63070953 A JP 63070953A JP 7095388 A JP7095388 A JP 7095388A JP H0320479 B2 JPH0320479 B2 JP H0320479B2
- Authority
- JP
- Japan
- Prior art keywords
- tin
- plating
- plating bath
- borofluoride
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007747 plating Methods 0.000 claims description 51
- -1 aromatic amine compound Chemical class 0.000 claims description 12
- 229910001174 tin-lead alloy Inorganic materials 0.000 claims description 9
- 229930185605 Bisphenol Natural products 0.000 claims description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 8
- 150000002475 indoles Chemical class 0.000 claims description 5
- 125000002943 quinolinyl group Chemical class N1=C(C=CC2=CC=CC=C12)* 0.000 claims 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 18
- 239000000654 additive Substances 0.000 description 18
- 230000000996 additive effect Effects 0.000 description 16
- 239000002253 acid Substances 0.000 description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 10
- 238000005187 foaming Methods 0.000 description 9
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- CZZZABOKJQXEBO-UHFFFAOYSA-N 2,4-dimethylaniline Chemical compound CC1=CC=C(N)C(C)=C1 CZZZABOKJQXEBO-UHFFFAOYSA-N 0.000 description 4
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 4
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229960003540 oxyquinoline Drugs 0.000 description 4
- 229940044652 phenolsulfonate Drugs 0.000 description 4
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 4
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 4
- 150000003248 quinolines Chemical class 0.000 description 4
- ZFRKQXVRDFCRJG-UHFFFAOYSA-N skatole Chemical compound C1=CC=C2C(C)=CNC2=C1 ZFRKQXVRDFCRJG-UHFFFAOYSA-N 0.000 description 4
- 239000001888 Peptone Substances 0.000 description 3
- 108010080698 Peptones Proteins 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002431 hydrogen Chemical group 0.000 description 3
- 235000019319 peptone Nutrition 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 2
- YFOOEYJGMMJJLS-UHFFFAOYSA-N 1,8-diaminonaphthalene Chemical compound C1=CC(N)=C2C(N)=CC=CC2=C1 YFOOEYJGMMJJLS-UHFFFAOYSA-N 0.000 description 2
- QZOPRMWFYVGPAI-UHFFFAOYSA-N 1-chloroindole Chemical compound C1=CC=C2N(Cl)C=CC2=C1 QZOPRMWFYVGPAI-UHFFFAOYSA-N 0.000 description 2
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 2
- CHIFTAQVXHNVRW-UHFFFAOYSA-N 1h-indole-3-carbonitrile Chemical compound C1=CC=C2C(C#N)=CNC2=C1 CHIFTAQVXHNVRW-UHFFFAOYSA-N 0.000 description 2
- NBYLBWHHTUWMER-UHFFFAOYSA-N 2-Methylquinolin-8-ol Chemical compound C1=CC=C(O)C2=NC(C)=CC=C21 NBYLBWHHTUWMER-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- JBIJLHTVPXGSAM-UHFFFAOYSA-N 2-naphthylamine Chemical compound C1=CC=CC2=CC(N)=CC=C21 JBIJLHTVPXGSAM-UHFFFAOYSA-N 0.000 description 2
- YHIWBVHIGCRVLE-UHFFFAOYSA-N 3-bromo-1h-indole Chemical compound C1=CC=C2C(Br)=CNC2=C1 YHIWBVHIGCRVLE-UHFFFAOYSA-N 0.000 description 2
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- CYJJLCDCWVZEDZ-UHFFFAOYSA-N 8-aminonaphthalene-1-sulfonic acid Chemical compound C1=CC(S(O)(=O)=O)=C2C(N)=CC=CC2=C1 CYJJLCDCWVZEDZ-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- 229940054051 antipsychotic indole derivative Drugs 0.000 description 2
- 229940027991 antiseptic and disinfectant quinoline derivative Drugs 0.000 description 2
- PNOXNTGLSKTMQO-UHFFFAOYSA-L diacetyloxytin Chemical compound CC(=O)O[Sn]OC(C)=O PNOXNTGLSKTMQO-UHFFFAOYSA-L 0.000 description 2
- OCDGBSUVYYVKQZ-UHFFFAOYSA-N gramine Chemical compound C1=CC=C2C(CN(C)C)=CNC2=C1 OCDGBSUVYYVKQZ-UHFFFAOYSA-N 0.000 description 2
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 2
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 229920002114 octoxynol-9 Polymers 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 229940044654 phenolsulfonic acid Drugs 0.000 description 2
- UOOVFPYJUPSROO-UHFFFAOYSA-M sodium;naphthalene-1-sulfinate Chemical compound [Na+].C1=CC=C2C(S(=O)[O-])=CC=CC2=C1 UOOVFPYJUPSROO-UHFFFAOYSA-M 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 1
- FLHJIAFUWHPJRT-UHFFFAOYSA-N 2,3,3-trimethylindole Chemical compound C1=CC=C2C(C)(C)C(C)=NC2=C1 FLHJIAFUWHPJRT-UHFFFAOYSA-N 0.000 description 1
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- PYFVEIDRTLBMHG-UHFFFAOYSA-N 2,3-dimethyl-1h-indole Chemical compound C1=CC=C2C(C)=C(C)NC2=C1 PYFVEIDRTLBMHG-UHFFFAOYSA-N 0.000 description 1
- VVAKEQGKZNKUSU-UHFFFAOYSA-N 2,3-dimethylaniline Chemical compound CC1=CC=CC(N)=C1C VVAKEQGKZNKUSU-UHFFFAOYSA-N 0.000 description 1
- KWVPRPSXBZNOHS-UHFFFAOYSA-N 2,4,6-Trimethylaniline Chemical compound CC1=CC(C)=C(N)C(C)=C1 KWVPRPSXBZNOHS-UHFFFAOYSA-N 0.000 description 1
- RZKBRXDCJZLQLI-UHFFFAOYSA-N 2,5-dinitroaniline Chemical compound NC1=CC([N+]([O-])=O)=CC=C1[N+]([O-])=O RZKBRXDCJZLQLI-UHFFFAOYSA-N 0.000 description 1
- WXYKQNAKEPRCGF-UHFFFAOYSA-N 2-methylquinoline-3-carboxylic acid Chemical compound C1=CC=C2C=C(C(O)=O)C(C)=NC2=C1 WXYKQNAKEPRCGF-UHFFFAOYSA-N 0.000 description 1
- DPJCXCZTLWNFOH-UHFFFAOYSA-N 2-nitroaniline Chemical compound NC1=CC=CC=C1[N+]([O-])=O DPJCXCZTLWNFOH-UHFFFAOYSA-N 0.000 description 1
- YYFLDZZDOUDZQM-UHFFFAOYSA-N 3-[1-[[4-(3-phenylquinolin-2-yl)phenyl]methyl]piperidin-4-yl]-1h-benzimidazol-2-one Chemical compound O=C1NC2=CC=CC=C2N1C(CC1)CCN1CC(C=C1)=CC=C1C1=NC2=CC=CC=C2C=C1C1=CC=CC=C1 YYFLDZZDOUDZQM-UHFFFAOYSA-N 0.000 description 1
- XJCVRTZCHMZPBD-UHFFFAOYSA-N 3-nitroaniline Chemical compound NC1=CC=CC([N+]([O-])=O)=C1 XJCVRTZCHMZPBD-UHFFFAOYSA-N 0.000 description 1
- HDHQZCHIXUUSMK-UHFFFAOYSA-N 4-hydroxy-2-quinolone Chemical compound C1=CC=C2C(O)=CC(=O)NC2=C1 HDHQZCHIXUUSMK-UHFFFAOYSA-N 0.000 description 1
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 description 1
- UWPJYQYRSWYIGZ-UHFFFAOYSA-N 5-aminonaphthalene-2-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=C2C(N)=CC=CC2=C1 UWPJYQYRSWYIGZ-UHFFFAOYSA-N 0.000 description 1
- GQBZFTRMWRYAMS-UHFFFAOYSA-N 5-nitro-1h-indole-2-carbaldehyde Chemical compound [O-][N+](=O)C1=CC=C2NC(C=O)=CC2=C1 GQBZFTRMWRYAMS-UHFFFAOYSA-N 0.000 description 1
- KYFZSGBVGJNEPN-UHFFFAOYSA-N 6-nitro-1h-indole-3-carbaldehyde Chemical compound [O-][N+](=O)C1=CC=C2C(C=O)=CNC2=C1 KYFZSGBVGJNEPN-UHFFFAOYSA-N 0.000 description 1
- LGDFHDKSYGVKDC-UHFFFAOYSA-N 8-hydroxyquinoline-5-sulfonic acid Chemical compound C1=CN=C2C(O)=CC=C(S(O)(=O)=O)C2=C1 LGDFHDKSYGVKDC-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 1
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methyl-N-phenylamine Natural products CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- LSGKMZLPZFPAIN-UHFFFAOYSA-N Oxime-1H-Indole-3-carboxaldehyde Natural products C1=CC=C2C(C(=O)N)=CNC2=C1 LSGKMZLPZFPAIN-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- OLNJUISKUQQNIM-UHFFFAOYSA-N indole-3-carbaldehyde Chemical compound C1=CC=C2C(C=O)=CNC2=C1 OLNJUISKUQQNIM-UHFFFAOYSA-N 0.000 description 1
- LLABTCPIBSAMGS-UHFFFAOYSA-L lead(2+);methanesulfonate Chemical compound [Pb+2].CS([O-])(=O)=O.CS([O-])(=O)=O LLABTCPIBSAMGS-UHFFFAOYSA-L 0.000 description 1
- AICMYQIGFPHNCY-UHFFFAOYSA-J methanesulfonate;tin(4+) Chemical compound [Sn+4].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O AICMYQIGFPHNCY-UHFFFAOYSA-J 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- VLCMRTMCMQJSKM-UHFFFAOYSA-N phenyl-[4-phenyl-8-(trifluoromethyl)quinolin-3-yl]methanone Chemical compound C=1C=CC=CC=1C(=O)C1=CN=C2C(C(F)(F)F)=CC=CC2=C1C1=CC=CC=C1 VLCMRTMCMQJSKM-UHFFFAOYSA-N 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
- ZKIHLVYBGPFUAD-UHFFFAOYSA-N quinoline-2-sulfonic acid Chemical compound C1=CC=CC2=NC(S(=O)(=O)O)=CC=C21 ZKIHLVYBGPFUAD-UHFFFAOYSA-N 0.000 description 1
- ITXXHPLNLYEVQT-UHFFFAOYSA-N quinoline-3-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CN=C21 ITXXHPLNLYEVQT-UHFFFAOYSA-N 0.000 description 1
- YLSMOFSAPNMDOC-UHFFFAOYSA-N quinoline-5,6-dione Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=N1 YLSMOFSAPNMDOC-UHFFFAOYSA-N 0.000 description 1
- NVJSPQCVDHGYRE-UHFFFAOYSA-N quinoline-5,8-dione Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=N1 NVJSPQCVDHGYRE-UHFFFAOYSA-N 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- UPMFZISCCZSDND-JJKGCWMISA-M sodium gluconate Chemical compound [Na+].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O UPMFZISCCZSDND-JJKGCWMISA-M 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
Description
産業上の利用分野
本発明は、錫−鉛合金めつき浴に関する。
従来技術とその問題点
従来、錫−鉛合金めつき浴(ハンダめつき浴)
においては、光沢剤として、ポリオキシエチレン
ノニルフエニルエーテル、ポリオキシエチレンオ
クチルフエニルエーテル、ポリオキシエチレンラ
ウリルエーテルなどのノニオン系界面活性剤が使
用されており、さらに必要に応じてペプトン、ゼ
ラチンなどが併用されている。
しかしながら、この様な公知のノニオン系界面
活性剤からなる光沢剤は、発泡性が高いために、
めつき操作時に浴自体が発泡して作業性を低下さ
せるのみならず、得られるめつき皮膜が暗灰色で
緻密性および整面性に欠けるものとなる欠点があ
つた。
問題点を解決するための手段
本発明者は、上記の如き従来技術の問題点に鑑
みて種々研究を重ねた結果、特定のポリオキシア
ルキレンビスフエノール型界面活性剤を添加とし
て錫−鉛合金めつき浴に配合する場合には、発泡
という作業性低下要因を実質的に解消若しくは大
巾に軽減し得るのみならず、めつき浴の安定性が
向上し、めつき皮膜の特性も若しく改善されるこ
とを見出した。
すなわち、本発明は、下記に示す錫−鉛合金め
つき浴を提供するものである。
ポリオキシアルキレンビスフエノール型界面
活性剤を1〜200g/含有することを特徴と
する錫−鉛合金めつき浴:および
ポリオキシアルキレンビスフエノール型界面
活性剤を1〜200g/ならびにキノリン誘導
体、インドール誘導体および芳香族アミン化合
物の少なくとも一種を0.1〜20g/含有する
ことを特徴とする錫−鉛合金めつき浴。
本発明において使用するポリオキシアルキレン
ビスフエノール型界面活性剤は、下記の一般式(1)
で示される化合物を含む。
一般式(1):
{式中、各記号は、それぞれ以下のことを意味す
る。
X:CH2CH2O
Y:
INDUSTRIAL APPLICATION FIELD The present invention relates to a tin-lead alloy plating bath. Conventional technology and its problems Conventionally, tin-lead alloy plating bath (solder plating bath)
Nonionic surfactants such as polyoxyethylene nonyl phenyl ether, polyoxyethylene octylphenyl ether, and polyoxyethylene lauryl ether are used as brighteners, and if necessary, peptone, gelatin, etc. are used together. However, since brighteners made of such known nonionic surfactants have high foaming properties,
Not only does the bath itself foam during the plating operation, reducing workability, but the resulting plating film is dark gray and lacks density and surface smoothness. Means for Solving the Problems As a result of various studies in view of the problems of the prior art as described above, the inventor of the present invention has developed a method for adding a specific polyoxyalkylene bisphenol type surfactant to a tin-lead alloy. When added to a plating bath, it not only substantially eliminates or greatly reduces the factor of foaming that reduces workability, but also improves the stability of the plating bath and improves the properties of the plating film. I found out that it can be done. That is, the present invention provides a tin-lead alloy plating bath shown below. A tin-lead alloy plating bath characterized by containing 1 to 200 g of a polyoxyalkylene bisphenol type surfactant: and 1 to 200 g of a polyoxyalkylene bisphenol type surfactant, as well as quinoline derivatives and indole derivatives. and a tin-lead alloy plating bath characterized by containing 0.1 to 20 g/at least of at least one aromatic amine compound. The polyoxyalkylene bisphenol surfactant used in the present invention has the following general formula (1):
Contains the compound shown in General formula (1): {In the formula, each symbol means the following. X: CH 2 CH 2 O Y:
【式】
R:水素原子およびC1〜C5のアルキル基
n1およびn2:1〜20の数、n1=n2であつて良い。
m1およびm2:0〜10の数、m1=m2であつて良
い。
なお、繰返し単位としてのXとYの位置は、任
意に変更可能であり、両者がランダムに存在して
いても良い。}
本発明による錫−鉛合金めつき浴においては、
上記のポリオキシアルキレンビスフエノール型界
面活性剤を1〜200g/の割合で配合する。配
合量が、1g/未満の場合には、めつき浴の安
定性向上、めつき皮膜の整面性などの効果が十分
に達成されず、一方、200g/を上回る場合に
は、めつき浴への溶解が不十分になるとともに、
発泡性が大となる。
本発明においては、上記のポリオキシアルキレ
ンビスフエノール型界面活性剤と併せて、さらに
キノリン誘導体、インドール誘導体および芳香族
アミン化合物の少なくとも一種を配合することに
より、めつき皮膜をより緻密なものとすることが
できる。
キノリン誘導体としては、キノリン、イソキノ
リン、8−ヒドロキシキノリン、8−ヒドロキシ
キノリン−5−スルホン酸、キノリン−2−スル
ホン酸、キノリン−3−スルホン酸、2−メチル
キノリン、2−メチルキノリン−3−カルボン
酸、キノリン−2−カルボン酸、キノリン−5,
6−キノン、キノリン−5,8−キノン、キノリ
ン−2,4−ジオール、4−オキシキナルジン酸
などが例示される。
インドール誘導体としては、インドール、3−
メチルインドール、2,3−ジメチルインドー
ル、2,3,3−トリメチルインドール、1−ク
ロロインドール、β−ジメチルアミノインドー
ル、インドール−3−アルデヒド、3−インドー
ル、1−クロロインドール、3−ブロモインドー
ル、3−シアノインドール、6−ニトロインドー
ル−3−アルデヒド、5−ニトロインドール−ア
ルデヒドなどか例示される。
芳香族アミン化合物としては、アニリン、o−
トルイジン、m−トルイジン、p−トルイジン、
o−ニトロアニリン、m−ニトロアニリン、p−
ニトロアニリン、2,3−ジメチルアニリン、
2,4−ジメチルアニリン、N,N−ジメチルア
ニリン、o−アミノフエノール、p−アミノフエ
ノール、2,4,6−トリメチルアニリン、2,
5−ジニトロアニリン、1,8−ナフタリンジア
ミン、1,5−ナフタリンジアミン、α−ナフチ
ルアミン、β−ナフチルアミン、ナフチオン酸ナ
トリウム、1−ナフチルアミン−6−スルホン
酸、1−ナフチルアミン−8−スルホン酸、p−
ニトロソジフエニルアミンなどが例示される。
本発明めつき浴におけるキノリン誘導体、イン
ドール誘導体および芳香族アミン化合物の少なく
とも一種の配合量は、0.1〜20g/の範囲内と
する。これらの化合物の量が0.1g/未満の場
合には、効果の改善が十分でなく、一方、20g/
を上回る場合には、めつき浴中に完全に溶解し
難くなり、経済的にも不利となる。
本発明錫−鉛めつき浴における上記の添加剤以
外の成分は、公知のめつき浴におけるそれと変わ
るところはない。すなわち、本発明のめつき浴
は、公知のホウフツ化錫−鉛めつき浴、有機酸錫
−鉛めつき浴などに上記の添加剤を安定の割合で
配合することにより、得られる。
発明の効果
本発明による錫−鉛めつき浴を使用してめつき
を行う場合には、従来よりも広い電流密度範囲に
おいて、安定した操作が可能となり、均一な白色
めつき皮膜を得ることが出来る。また、得られた
めつき皮膜は、極めて緻密であり、良好なハンダ
付け性を示す。
実施例
以下に実施例および比較例を示し、本発明の特
徴とするところをより一層明確にする。
なお、実施例および比較例におけるめつき皮膜
の状態観察は、ハルセル試験により行つた。ハル
セル試験では、浴温度を25℃とし、電流1Aで5
分間または電流0.5Aで5分間のめつきを行い、
均一な白色皮膜が得られた電流密度の範囲および
その際に得られた皮膜の緻密さを比較した。
実施例 1
下記に示す組成の錫−鉛めつき浴を使用してめ
つきを行ない、得られためつき皮膜の特性を調べ
た。
45%ホウフツ化第一錫 100g/
45%ホウフツ化第一鉛 40g/
42%ホウフツ化水素酸 300g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド10モル添加物} 40g/
めつき皮膜は、白色で、走査型電子顕微鏡写真
(6400倍)から、均一かつ緻密であることが、確
認された。
実施例 2
下記に示す組成の錫−鉛めつき浴を使用してめ
つきを行なつた。
45%ホウフツ化第一錫 120g/
45%ホウフツ化第一鉛 60g/
42%ホウフツ化水素酸 300g/
ホウ酸 10g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド12モル、プロピレンオキサイ
ド1モル付加物} 20g/
2−メチル−8−ヒドロキシキノリン
0.5g/
2−メチル−8−ヒドロキシキノリンを配合する
ことにより、実施例1に比して、より広い電流密
度範囲で、均一で緻密な白色のめつき皮膜を得る
ことができた。
比較例 1
下記に示す組成の公知の錫−鉛めつき浴を使用
してめつきを行ない、得られためつき皮膜の特性
を調べた。
45%ホウフツ化第一錫 100g/
45%ホウフツ化第一鉛 40g/
42%ホウフツ化水素酸 300g/
ポリオキシエチレンノニルフエニルエーテル{エ
チレンオキサイド10モル付加物) 40g/
得られためつき皮膜は、全体に暗黒色を呈して
おり、高電流密度部分では、黒いスポンジ状の析
出が認められた。
また、走査型電子顕微鏡写真(6400倍)によ
り、実施例1及び実施例2の場合に比して、めつ
き皮膜の緻密性が劣つていることが明らかとなつ
た。
比較例 2
下記に示す組成の公知の錫−鉛めつき浴を使用
してめつきを行ない、得られためつき皮膜の特性
を調べた。
45%ホウフツ化第一錫 120g/
45%ホウフツ化第一鉛 50g/
42%ホウフツ化水素酸 240g/
ポリオキシエチレンオクチルフエニルエーテル
{エチレンオキサイド15モル付加物) 40g/
ペプトン 5g/
得られためつき皮膜は、比較例1の場合と同様
に、全体に暗黒色を呈しており、高電流密度部分
では、黒いスポンジ状の析出が認められた。
また、走査型電子顕微鏡写真(6400倍)によ
り、実施例1及び2の場合に比して、やはりめつ
き皮膜の緻密性が劣つていることが、確認され
た。
実施例 3〜14
下記にそれぞれ示す本発明の錫−鉛めつき浴を
使用してめつきを行なつた。
実施例 3
フエノールスルホン酸錫 20g/
フエノールスルホン酸鉛 10g/
フエノールスルホン酸 70g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド20モル付加物} 20g/
8−ヒドロキシキノリン 5g/
実施例 4
45%ホウフツ化第一錫 120g/
45%ホウフツ化第一鉛 60g/
42%ホウフツ化水素酸 300g/
本発明添加剤{一般式(1)において、R=エチル、
エチレンオキサイド20モル、プロピレンオキサイ
ド2モル付加物} 20g/
2−メチルキノリン 1g/
実施例 5
45%ホウフツ化第一錫 160g/
45%ホウフツ化第一鉛 80g/
42%ホウフツ化水素酸 240g/
本発明添加剤{一般式(1)において、R=水素、但
しエチレンオキサイド10モルとプロピレンオキサ
イド4モルとがランダムに付加している}
50g/
キノリン−5,6−キノン 0.1g/
実施例 6
酢酸第一錫 30g/
酢酸第一鉛 10g/
クエン酸 70g/
本発明添加剤{一般式(1)において、R=水素、エ
チレンオキサイド12モル付加物} 20g/
3−メチルインドール 2g/
実施例 7
45%ホウフツ化第一錫 60g/
45%ホウフツ化第一鉛 30g/
42%ホウフツ化水素酸 200g/
本発明添加剤{一般式(1)において、R=メチル、
但しエチレンオキサイド12モルとプロピレンオキ
サイド4モルとがブロツク状に付加している}
20g/
インドール 1g/
実施例 8
塩化第一錫 40g/
硝酸塩 10g/
グルコン酸ナトリウム 100g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド15モル、プロピレンオキサイ
ド3モル付加物} 20g/
β−ジメチルアミノメチルインドール 0.2g/
実施例 9
メタンスルホン酸錫 30g/
メタンスルホン酸鉛 10g/
メタンスルホン酸 100g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド15ル付加物} 20g/
2,4−ジメチルアニリン 1g/
8−ヒドロキシキノリン 0.5g/
実施例 10
45%ホウフツ化第一錫 30g/
45%ホウフツ化第一鉛 10g/
42%ホウフツ化水素酸 100g/
本発明添加剤{一般式(1)において、R=水素、エ
チレンオキサイド12モル、プロピレンオキサイド
5モル付加物} 20g/
実施例 11
酢酸第一錫 60g/
酢酸第一鉛 20g/
グルコン酸ナトリウム 150g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド10モル付加物} 20g/
β−ナフチルアミン 2g/
実施例 12
45%ホウフツ化第一錫 120g/
45%ホウフツ化第一鉛 60g/
42%ホウフツ化水素酸 350g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド10モル付加物} 20g/
1,8−ナフタリンジアミン 1g/
実施例 13
フエノールスルホン酸錫 100g/
フエノールスルホン酸鉛 40g/
フエノールスルホン酸 200g/
本発明添加剤{一般式(1)において、R=メチル、
但しエチレンオキサイド15モルとプロピレンオキ
サイド5モルとがランダムに付加している}
15g/
ナフチオン酸ナトリウム 0.5g/
実施例 14
45%ホウフツ化第一錫 100g/
45%ホウフツ化第一鉛 40g/
42%ホウフツ化水素酸 200g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド17.5モル付加物} 20g/
キノリン 1g/
1−ナフチルアミン−8−スルホン酸 0.5g/
上記実施例3〜14のめつき浴をそれぞれ使用し
て、めつきを行つたところ、広い電流密度範囲で
均一な白色のめつき皮膜が得られた。
これらの皮膜は、いずれも緻密であり、良好な
ハンダ性を示した。
実施例 15
下記に示す組成の錫−鉛めつき浴を使用して、
浴の起泡性および消泡性を調べた。
まず、起泡性試験として、めつき液を収容した
1のメスシリンダーにエアーストーンを入れ、
ポンプにより空気を送り込み、30秒後の泡立ちの
高さ(mm)を測定した。使用したポンプの空気供
給能力は、30秒間当り約650mlであつた。
また、消泡性試験として、上記のポンプによる
空気の送球を停止した後、30秒後、1分後、2分
後および3分後の泡立ちの高さ(mm)を測定し
た。
結果を第1表に示す。
45%ホウフツ化第一錫 90g/
45%ホウフツ化第一鉛 10g/
42%ホウフツ化水素酸 240g/
本発明添加剤{一般式(1)において、R=メチル、
エチレンオキサイド10モル付加物} 50g/
8−ヒドロキシキノリン 2g/
比較例 3
下記に示す組成の錫−鉛めつき浴を使用して、
実施例15と同様にして、浴の起泡性および消泡性
を調べた。
結果を第1表に併せて示す。
45%ホウフツ化第一錫 90g/
45%ホウフツ化第一鉛 10g/
42%ホウフツ化水素酸 240g/
ポリオキシエチレンノニルフエニルエーテル{エ
チレンオキサイド10モル付加物) 50g/
ペプトン 5g/[Formula] R: hydrogen atom and C 1 -C 5 alkyl group n 1 and n 2 : number of 1 to 20, n 1 = n 2 may be satisfied. m 1 and m 2 : numbers from 0 to 10, m 1 = m 2 may be satisfied. Note that the positions of X and Y as repeating units can be changed arbitrarily, and both may exist randomly. } In the tin-lead alloy plating bath according to the present invention,
The above-mentioned polyoxyalkylene bisphenol type surfactant is blended in a proportion of 1 to 200 g/g. If the blending amount is less than 1g/, effects such as improving the stability of the plating bath and improving the leveling of the plating film will not be achieved sufficiently.On the other hand, if the blending amount exceeds 200g/, the plating bath As well as insufficient solubility in
Foaming properties are increased. In the present invention, the plated film is made more dense by further blending at least one of a quinoline derivative, an indole derivative, and an aromatic amine compound in addition to the above-mentioned polyoxyalkylene bisphenol type surfactant. be able to. Examples of quinoline derivatives include quinoline, isoquinoline, 8-hydroxyquinoline, 8-hydroxyquinoline-5-sulfonic acid, quinoline-2-sulfonic acid, quinoline-3-sulfonic acid, 2-methylquinoline, 2-methylquinoline-3- carboxylic acid, quinoline-2-carboxylic acid, quinoline-5,
Examples include 6-quinone, quinoline-5,8-quinone, quinoline-2,4-diol, and 4-oxyquinaldic acid. Indole derivatives include indole, 3-
Methylindole, 2,3-dimethylindole, 2,3,3-trimethylindole, 1-chloroindole, β-dimethylaminoindole, indole-3-aldehyde, 3-indole, 1-chloroindole, 3-bromoindole, Examples include 3-cyanoindole, 6-nitroindole-3-aldehyde, and 5-nitroindole-aldehyde. Aromatic amine compounds include aniline, o-
Toluidine, m-toluidine, p-toluidine,
o-nitroaniline, m-nitroaniline, p-
Nitroaniline, 2,3-dimethylaniline,
2,4-dimethylaniline, N,N-dimethylaniline, o-aminophenol, p-aminophenol, 2,4,6-trimethylaniline, 2,
5-dinitroaniline, 1,8-naphthalene diamine, 1,5-naphthalene diamine, α-naphthylamine, β-naphthylamine, sodium naphthionate, 1-naphthylamine-6-sulfonic acid, 1-naphthylamine-8-sulfonic acid, p −
Examples include nitrosodiphenylamine. The blending amount of at least one of the quinoline derivative, indole derivative and aromatic amine compound in the plating bath of the present invention is within the range of 0.1 to 20g/. When the amount of these compounds is less than 0.1g/, the improvement of the effect is not sufficient; on the other hand, when the amount of these compounds is less than 0.1g/
If it exceeds 20%, it becomes difficult to completely dissolve in the plating bath, which is economically disadvantageous. The components other than the above additives in the tin-lead plating bath of the present invention are the same as those in known plating baths. That is, the plating bath of the present invention can be obtained by blending the above-mentioned additives in a stable ratio into a known tin borofusate-lead plating bath, organic acid tin-lead plating bath, or the like. Effects of the Invention When plating is performed using the tin-lead plating bath according to the present invention, stable operation is possible in a wider current density range than before, and a uniform white plating film can be obtained. I can do it. Moreover, the obtained tampered film is extremely dense and exhibits good solderability. Examples Examples and comparative examples are shown below to further clarify the features of the present invention. Note that the condition of the plating film in Examples and Comparative Examples was observed by Hull cell test. In the Hull cell test, the bath temperature was 25℃ and the current was 1A.
Plating for 5 minutes or at a current of 0.5A,
The range of current density at which a uniform white film was obtained and the density of the film obtained at that time were compared. Example 1 Plating was carried out using a tin-lead plating bath having the composition shown below, and the characteristics of the resulting matted film were investigated. 45% stannous borofluoride 100 g / 45% leadous borofluoride 40 g / 42% hydroborofluoric acid 300 g / Additive of the present invention {In general formula (1), R = methyl,
Additive of 10 moles of ethylene oxide} 40 g/ The plating film was white, and scanning electron micrographs (6400x magnification) confirmed that it was uniform and dense. Example 2 Plating was carried out using a tin-lead plating bath having the composition shown below. 45% stannous borofluoride 120 g / 45% leadous borofluoride 60 g / 42% hydroborofluoric acid 300 g / boric acid 10 g / Additive of the present invention {In general formula (1), R = methyl,
12 moles of ethylene oxide, 1 mole of propylene oxide adduct} 20g/2-methyl-8-hydroxyquinoline
By blending 0.5 g/2-methyl-8-hydroxyquinoline, a uniform and dense white plating film could be obtained over a wider current density range than in Example 1. Comparative Example 1 Plating was carried out using a known tin-lead plating bath having the composition shown below, and the properties of the resulting matted film were investigated. 45% stannous borofluoride 100g/ 45% leadous borofluoride 40g/ 42% hydroborofluoric acid 300g/ polyoxyethylene nonyl phenyl ether (10 moles of ethylene oxide adduct) 40g/ The resulting sticky film is The entire surface was dark black, and black spongy deposits were observed in the high current density areas. Furthermore, scanning electron micrographs (6400x magnification) revealed that the denseness of the plating film was inferior to that of Examples 1 and 2. Comparative Example 2 Plating was carried out using a known tin-lead plating bath having the composition shown below, and the properties of the resulting matted film were investigated. 45% stannous borofluoride 120g/ 45% leadous borofluoride 50g/ 42% hydroborofluoric acid 240g/ polyoxyethylene octyl phenyl ether (15 mole ethylene oxide adduct) 40g/ peptone 5g/ Obtained weight As in Comparative Example 1, the entire film was dark black, and black spongy deposits were observed in the high current density areas. Furthermore, scanning electron micrographs (6400x magnification) confirmed that the density of the plating film was still inferior to that of Examples 1 and 2. Examples 3 to 14 Plating was carried out using the tin-lead plating baths of the present invention shown below. Example 3 Tin phenolsulfonate 20g/Lead phenolsulfonate 10g/Phenolsulfonic acid 70g/Additive of the present invention {In general formula (1), R=methyl,
20 mole adduct of ethylene oxide} 20g/ 8-hydroxyquinoline 5g/ Example 4 45% stannous borofluoride 120g/ 45% leadous borofluoride 60g/ 42% hydroborofluoric acid 300g/ Additive of the present invention {general In formula (1), R=ethyl,
20 moles of ethylene oxide, 2 moles of propylene oxide adduct} 20 g / 2-methylquinoline 1 g / Example 5 45% stannous borofluoride 160 g / 45% leadous borofluoride 80 g / 42% hydroborofluoric acid 240 g / bottle Inventive additive {In general formula (1), R = hydrogen, but 10 moles of ethylene oxide and 4 moles of propylene oxide are randomly added}
50g/ Quinoline-5,6-quinone 0.1g/ Example 6 Stannous acetate 30g/ Leadous acetate 10g/ Citric acid 70g/ Additive of the present invention {In general formula (1), R = hydrogen, ethylene oxide 12 Molar adduct} 20g/ 3-methylindole 2g/ Example 7 45% stannous borofluoride 60g/ 45% leadous borofluoride 30g/ 42% hydroborofluoric acid 200g/ Additive of the present invention {General formula (1) ), R=methyl,
However, 12 moles of ethylene oxide and 4 moles of propylene oxide are added in the form of blocks.
20g / Indole 1g / Example 8 Stannous chloride 40g / Nitrate 10g / Sodium gluconate 100g / Additive of the present invention {In general formula (1), R = methyl,
15 moles of ethylene oxide, 3 moles of propylene oxide adduct} 20g/β-dimethylaminomethylindole 0.2g/Example 9 Tin methanesulfonate 30g/Lead methanesulfonate 10g/Methanesulfonic acid 100g/Additive of the present invention {General formula In (1), R=methyl,
Ethylene oxide 15 adduct} 20g/ 2,4-dimethylaniline 1g/ 8-hydroxyquinoline 0.5g/ Example 10 45% stannous borofluoride 30g/ 45% leadous borofluoride 10g/ 42% hydrogen borofluoride Acid 100g/ Additive of the present invention {in general formula (1), R = hydrogen, 12 moles of ethylene oxide, 5 moles of propylene oxide adduct} 20g/ Example 11 Stannous acetate 60g/ Leadous acetate 20g/ Gluconic acid Sodium 150g/Additive of the present invention {In general formula (1), R=methyl,
10 moles of ethylene oxide adduct} 20 g / β-naphthylamine 2 g / Example 12 45% stannous borofluoride 120 g / 45% leadous borofluoride 60 g / 42% hydroborofluoric acid 350 g / Additive of the present invention {General formula In (1), R=methyl,
10 moles of ethylene oxide adduct} 20g/ 1,8-naphthalene diamine 1g/ Example 13 Tin phenolsulfonate 100g/ Lead phenolsulfonate 40g/ Phenolsulfonic acid 200g/ Additive of the present invention {In general formula (1), R = methyl,
However, 15 moles of ethylene oxide and 5 moles of propylene oxide are randomly added.
15g/ Sodium naphthionate 0.5g/ Example 14 45% stannous borofluoride 100g/ 45% leadous borofluoride 40g/ 42% hydroborofluoric acid 200g/ Additive of the present invention {In general formula (1), R = methyl,
17.5 moles of ethylene oxide adduct} 20 g / 1 g of quinoline / 0.5 g of 1-naphthylamine-8-sulfonic acid / When plating was performed using each of the plating baths of Examples 3 to 14 above, a wide current density range was obtained. A uniform white plating film was obtained. All of these films were dense and showed good solderability. Example 15 Using a tin-lead plating bath with the composition shown below,
The foaming and defoaming properties of the bath were investigated. First, as a foaming test, an air stone was placed in a graduated cylinder containing plating solution.
Air was pumped in, and the foaming height (mm) was measured 30 seconds later. The air supply capacity of the pump used was approximately 650 ml per 30 seconds. In addition, as a defoaming test, the height (mm) of foaming was measured 30 seconds, 1 minute, 2 minutes, and 3 minutes after the above-mentioned pump stopped sending air. The results are shown in Table 1. 45% stannous borofluoride 90 g / 45% leadous borofluoride 10 g / 42% hydroborofluoric acid 240 g / Additive of the present invention {In general formula (1), R = methyl,
10 moles of ethylene oxide adduct} 50 g / 8-hydroxyquinoline 2 g / Comparative Example 3 Using a tin-lead plating bath with the composition shown below,
In the same manner as in Example 15, the foaming and defoaming properties of the bath were examined. The results are also shown in Table 1. 45% stannous borofluoride 90g/ 45% leadous borofluoride 10g/ 42% hydroborofluoric acid 240g/ polyoxyethylene nonyl phenyl ether (10 moles of ethylene oxide adduct) 50g/ peptone 5g/
【表】
第1表に示す結果から、本発明によるめつき浴
は、公知のめつき浴に比して、起泡性がほぼ半減
している。また、消泡性においても、非常に優れ
ている。[Table] From the results shown in Table 1, the plating bath according to the present invention has a foaming property that is approximately half that of the known plating bath. It also has excellent antifoaming properties.
Claims (1)
活性剤を1〜200g/含有することを特徴とす
る錫−鉛合金めつき浴。 2 ポリオキシアルキレンビスフエノール型界面
活性剤を1〜200g/ならびにキノリン誘導体、
インドール誘導体および芳香族アミン化合物の少
なくとも一種を0.1〜20g/含有することを特
徴とする錫−鉛合金めつき浴。[Scope of Claims] 1. A tin-lead alloy plating bath characterized by containing 1 to 200 g of a polyoxyalkylene bisphenol type surfactant. 2 1 to 200 g of polyoxyalkylene bisphenol type surfactant and quinoline derivative,
A tin-lead alloy plating bath characterized by containing 0.1 to 20 g/at least one of an indole derivative and an aromatic amine compound.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7095388A JPH01242795A (en) | 1988-03-24 | 1988-03-24 | Tin-lead alloy plating bath |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7095388A JPH01242795A (en) | 1988-03-24 | 1988-03-24 | Tin-lead alloy plating bath |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01242795A JPH01242795A (en) | 1989-09-27 |
JPH0320479B2 true JPH0320479B2 (en) | 1991-03-19 |
Family
ID=13446384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7095388A Granted JPH01242795A (en) | 1988-03-24 | 1988-03-24 | Tin-lead alloy plating bath |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01242795A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207189A (en) * | 1981-06-16 | 1982-12-18 | Hooker Chemicals Plastics Corp | Method and composition for electrodepositing tin |
JPS61223193A (en) * | 1985-03-26 | 1986-10-03 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath and plating method thereby |
JPS624895A (en) * | 1985-06-26 | 1987-01-10 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath |
JPH01268894A (en) * | 1987-12-10 | 1989-10-26 | Learonal Inc | Tin, lead or tin/lead alloy electrolyte for high speed electroplating and method |
-
1988
- 1988-03-24 JP JP7095388A patent/JPH01242795A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207189A (en) * | 1981-06-16 | 1982-12-18 | Hooker Chemicals Plastics Corp | Method and composition for electrodepositing tin |
JPS61223193A (en) * | 1985-03-26 | 1986-10-03 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath and plating method thereby |
JPS624895A (en) * | 1985-06-26 | 1987-01-10 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath |
JPH01268894A (en) * | 1987-12-10 | 1989-10-26 | Learonal Inc | Tin, lead or tin/lead alloy electrolyte for high speed electroplating and method |
Also Published As
Publication number | Publication date |
---|---|
JPH01242795A (en) | 1989-09-27 |
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