JPH01242795A - Tin-lead alloy plating bath - Google Patents
Tin-lead alloy plating bathInfo
- Publication number
- JPH01242795A JPH01242795A JP7095388A JP7095388A JPH01242795A JP H01242795 A JPH01242795 A JP H01242795A JP 7095388 A JP7095388 A JP 7095388A JP 7095388 A JP7095388 A JP 7095388A JP H01242795 A JPH01242795 A JP H01242795A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- tin
- plating bath
- borofluoride
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 65
- 229910001174 tin-lead alloy Inorganic materials 0.000 title claims description 10
- 229930185605 Bisphenol Natural products 0.000 claims abstract description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000004094 surface-active agent Substances 0.000 claims abstract description 10
- -1 aromatic amine compound Chemical class 0.000 claims description 14
- 150000002475 indoles Chemical class 0.000 claims description 5
- 125000002943 quinolinyl group Chemical class N1=C(C=CC2=CC=CC=C12)* 0.000 claims 1
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 abstract description 6
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 abstract description 3
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910020816 Sn Pb Inorganic materials 0.000 abstract 2
- 229910020922 Sn-Pb Inorganic materials 0.000 abstract 2
- 229910008783 Sn—Pb Inorganic materials 0.000 abstract 2
- 229910045601 alloy Inorganic materials 0.000 abstract 2
- 239000000956 alloy Substances 0.000 abstract 2
- TZOKMWXGAXPQIM-UHFFFAOYSA-N 2-(4-bromophenyl)-6-chloro-8-methylquinoline-4-carboxylic acid Chemical compound N1=C2C(C)=CC(Cl)=CC2=C(C(O)=O)C=C1C1=CC=C(Br)C=C1 TZOKMWXGAXPQIM-UHFFFAOYSA-N 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 20
- 239000000654 additive Substances 0.000 description 17
- 230000000996 additive effect Effects 0.000 description 15
- 238000005187 foaming Methods 0.000 description 10
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 10
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- LEMQFBIYMVUIIG-UHFFFAOYSA-N trifluoroborane;hydrofluoride Chemical compound F.FB(F)F LEMQFBIYMVUIIG-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 229960003540 oxyquinoline Drugs 0.000 description 4
- 229940044652 phenolsulfonate Drugs 0.000 description 4
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 4
- 150000003248 quinolines Chemical class 0.000 description 4
- ZFRKQXVRDFCRJG-UHFFFAOYSA-N skatole Chemical compound C1=CC=C2C(C)=CNC2=C1 ZFRKQXVRDFCRJG-UHFFFAOYSA-N 0.000 description 4
- 239000001888 Peptone Substances 0.000 description 3
- 108010080698 Peptones Proteins 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 235000019319 peptone Nutrition 0.000 description 3
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 2
- QZOPRMWFYVGPAI-UHFFFAOYSA-N 1-chloroindole Chemical compound C1=CC=C2N(Cl)C=CC2=C1 QZOPRMWFYVGPAI-UHFFFAOYSA-N 0.000 description 2
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 2
- CHIFTAQVXHNVRW-UHFFFAOYSA-N 1h-indole-3-carbonitrile Chemical compound C1=CC=C2C(C#N)=CNC2=C1 CHIFTAQVXHNVRW-UHFFFAOYSA-N 0.000 description 2
- PYFVEIDRTLBMHG-UHFFFAOYSA-N 2,3-dimethyl-1h-indole Chemical compound C1=CC=C2C(C)=C(C)NC2=C1 PYFVEIDRTLBMHG-UHFFFAOYSA-N 0.000 description 2
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 2
- JBIJLHTVPXGSAM-UHFFFAOYSA-N 2-naphthylamine Chemical compound C1=CC=CC2=CC(N)=CC=C21 JBIJLHTVPXGSAM-UHFFFAOYSA-N 0.000 description 2
- YHIWBVHIGCRVLE-UHFFFAOYSA-N 3-bromo-1h-indole Chemical compound C1=CC=C2C(Br)=CNC2=C1 YHIWBVHIGCRVLE-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- CYJJLCDCWVZEDZ-UHFFFAOYSA-N 8-aminonaphthalene-1-sulfonic acid Chemical compound C1=CC(S(O)(=O)=O)=C2C(N)=CC=CC2=C1 CYJJLCDCWVZEDZ-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- 229940054051 antipsychotic indole derivative Drugs 0.000 description 2
- 229940027991 antiseptic and disinfectant quinoline derivative Drugs 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- PNOXNTGLSKTMQO-UHFFFAOYSA-L diacetyloxytin Chemical compound CC(=O)O[Sn]OC(C)=O PNOXNTGLSKTMQO-UHFFFAOYSA-L 0.000 description 2
- OCDGBSUVYYVKQZ-UHFFFAOYSA-N gramine Chemical compound C1=CC=C2C(CN(C)C)=CNC2=C1 OCDGBSUVYYVKQZ-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 2
- 229920002114 octoxynol-9 Polymers 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 229940044654 phenolsulfonic acid Drugs 0.000 description 2
- YLSMOFSAPNMDOC-UHFFFAOYSA-N quinoline-5,6-dione Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=N1 YLSMOFSAPNMDOC-UHFFFAOYSA-N 0.000 description 2
- UOOVFPYJUPSROO-UHFFFAOYSA-M sodium;naphthalene-1-sulfinate Chemical compound [Na+].C1=CC=C2C(S(=O)[O-])=CC=CC2=C1 UOOVFPYJUPSROO-UHFFFAOYSA-M 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- NBYLBWHHTUWMER-UHFFFAOYSA-N 2-Methylquinolin-8-ol Chemical compound C1=CC=C(O)C2=NC(C)=CC=C21 NBYLBWHHTUWMER-UHFFFAOYSA-N 0.000 description 1
- WXYKQNAKEPRCGF-UHFFFAOYSA-N 2-methylquinoline-3-carboxylic acid Chemical compound C1=CC=C2C=C(C(O)=O)C(C)=NC2=C1 WXYKQNAKEPRCGF-UHFFFAOYSA-N 0.000 description 1
- DPJCXCZTLWNFOH-UHFFFAOYSA-N 2-nitroaniline Chemical compound NC1=CC=CC=C1[N+]([O-])=O DPJCXCZTLWNFOH-UHFFFAOYSA-N 0.000 description 1
- XJCVRTZCHMZPBD-UHFFFAOYSA-N 3-nitroaniline Chemical compound NC1=CC=CC([N+]([O-])=O)=C1 XJCVRTZCHMZPBD-UHFFFAOYSA-N 0.000 description 1
- HDHQZCHIXUUSMK-UHFFFAOYSA-N 4-hydroxy-2-quinolone Chemical compound C1=CC=C2C(O)=CC(=O)NC2=C1 HDHQZCHIXUUSMK-UHFFFAOYSA-N 0.000 description 1
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 description 1
- GQBZFTRMWRYAMS-UHFFFAOYSA-N 5-nitro-1h-indole-2-carbaldehyde Chemical compound [O-][N+](=O)C1=CC=C2NC(C=O)=CC2=C1 GQBZFTRMWRYAMS-UHFFFAOYSA-N 0.000 description 1
- KYFZSGBVGJNEPN-UHFFFAOYSA-N 6-nitro-1h-indole-3-carbaldehyde Chemical compound [O-][N+](=O)C1=CC=C2C(C=O)=CNC2=C1 KYFZSGBVGJNEPN-UHFFFAOYSA-N 0.000 description 1
- LGDFHDKSYGVKDC-UHFFFAOYSA-N 8-hydroxyquinoline-5-sulfonic acid Chemical compound C1=CN=C2C(O)=CC=C(S(O)(=O)=O)C2=C1 LGDFHDKSYGVKDC-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methyl-N-phenylamine Natural products CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- LSGKMZLPZFPAIN-UHFFFAOYSA-N Oxime-1H-Indole-3-carboxaldehyde Natural products C1=CC=C2C(C(=O)N)=CNC2=C1 LSGKMZLPZFPAIN-UHFFFAOYSA-N 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- OLNJUISKUQQNIM-UHFFFAOYSA-N indole-3-carbaldehyde Chemical compound C1=CC=C2C(C=O)=CNC2=C1 OLNJUISKUQQNIM-UHFFFAOYSA-N 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- LLABTCPIBSAMGS-UHFFFAOYSA-L lead(2+);methanesulfonate Chemical compound [Pb+2].CS([O-])(=O)=O.CS([O-])(=O)=O LLABTCPIBSAMGS-UHFFFAOYSA-L 0.000 description 1
- AICMYQIGFPHNCY-UHFFFAOYSA-J methanesulfonate;tin(4+) Chemical compound [Sn+4].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O AICMYQIGFPHNCY-UHFFFAOYSA-J 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- OIJHFHYPXWSVPF-UHFFFAOYSA-N para-Nitrosodiphenylamine Chemical compound C1=CC(N=O)=CC=C1NC1=CC=CC=C1 OIJHFHYPXWSVPF-UHFFFAOYSA-N 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
- ZKIHLVYBGPFUAD-UHFFFAOYSA-N quinoline-2-sulfonic acid Chemical compound C1=CC=CC2=NC(S(=O)(=O)O)=CC=C21 ZKIHLVYBGPFUAD-UHFFFAOYSA-N 0.000 description 1
- ITXXHPLNLYEVQT-UHFFFAOYSA-N quinoline-3-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CN=C21 ITXXHPLNLYEVQT-UHFFFAOYSA-N 0.000 description 1
- NVJSPQCVDHGYRE-UHFFFAOYSA-N quinoline-5,8-dione Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=N1 NVJSPQCVDHGYRE-UHFFFAOYSA-N 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- UPMFZISCCZSDND-JJKGCWMISA-M sodium gluconate Chemical compound [Na+].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O UPMFZISCCZSDND-JJKGCWMISA-M 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
Abstract
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、錫−鉛合金めっき浴に関する。[Detailed description of the invention] Industrial applications The present invention relates to a tin-lead alloy plating bath.
従来技術とその問題点
従来、錫−鉛合金めっき浴(ハンダめっき浴)において
は、光沢剤として、ポリオキシエチレンノニルフェニル
エーテル、ポリオキシエチレンオクチルフェニルエーテ
ル、ポリオキシエチレンラウリルエーテルなどのノニオ
ン系界面活性剤が使用されており、さらに必要に応じて
ペプトン、ゼラチンなどが併用されている。Conventional technology and its problems Conventionally, in tin-lead alloy plating baths (solder plating baths), nonionic interfaces such as polyoxyethylene nonylphenyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene lauryl ether, etc. have been used as brighteners. An activator is used, and if necessary, peptone, gelatin, etc. are also used in combination.
しかしながら、この様な公知のノニオン系界面活性剤か
らなる光沢剤は、発泡性が高いために、めっき操作時に
浴自体が発泡して作業性を低下させるのみならず、得ら
れるめっき皮膜が暗灰色で緻密性および整面性に欠ける
ものとなる欠点があった。However, since brighteners made of known nonionic surfactants have high foaming properties, the bath itself foams during plating operations, reducing workability, and the resulting plating film has a dark gray color. However, there was a drawback that it lacked density and flatness.
問題点を解決するための手段
本発明者は、上記の如き従来技術の問題点に鑑みて種々
研究を重ねた結果、特定のポリオキシアルキレンビスフ
ェノール型界面活性剤を添加として錫−鉛合金めっき浴
に配合する場合には、発泡という作業性低下要因を実質
的に解消若しくは大巾に軽減し得るのみならず、めっき
浴の安定性が向上し、めっき皮膜の特性も著しく改善さ
れることを見出した。Means for Solving the Problems As a result of various studies in view of the problems of the prior art as described above, the present inventor has developed a tin-lead alloy plating bath by adding a specific polyoxyalkylene bisphenol type surfactant. It has been found that, when added to a plating film, it is not only possible to substantially eliminate or significantly reduce the factor of foaming that reduces workability, but also to improve the stability of the plating bath and to significantly improve the properties of the plating film. Ta.
すなわち、本発明は、下記に示す錫−鉛合金めっき浴を
提供するものである。That is, the present invention provides a tin-lead alloy plating bath shown below.
■ポリオキシアルキレンビスフェノール型界面活性剤を
1〜200 g / Q含有することを特徴とする錫−
鉛合金めっき浴:および
■ポリオキシアルキレンビスフェノール型界面活性剤を
1〜200 g / Qならびにキノリン誘導体、イン
ドール誘導体および芳香族アミン化合物の少なくとも一
種を0.1〜20 z / Q含有することを特徴とす
る錫−鉛合金めっき浴。■A tin product characterized by containing 1 to 200 g/Q of polyoxyalkylene bisphenol type surfactant.
Lead alloy plating bath: and ■Contains 1 to 200 g/Q of polyoxyalkylene bisphenol type surfactant and 0.1 to 20 z/Q of at least one of quinoline derivatives, indole derivatives, and aromatic amine compounds. Tin-lead alloy plating bath.
本発明において使用するポリオキシアルキレンビスフェ
ノール型界面活性剤は、下記の一般式(1)で示される
化合物を含む。The polyoxyalkylene bisphenol type surfactant used in the present invention includes a compound represented by the following general formula (1).
一般式(1): (式中、各記号は、それぞれ以下のことを意味する。General formula (1): (In the formula, each symbol means the following.
X:CH2CH20
R5水素原子およびC1〜C5のアルキル基n1および
n2:1〜20の数、nI=n2であって良い。X: CH2CH20 R5 hydrogen atom and C1 to C5 alkyl group n1 and n2: number of 1 to 20, nI=n2.
m、およびm2 :0〜10の数、m H= m 2で
あって良い。m, and m2: a number from 0 to 10, mH=m2.
なお、繰返し単位としてのXとYの位置は、任意に変更
可能であり、両者がランダムに存在していても良い。)
本発明による錫−鉛合金めっき浴においては、上記のポ
リオキシアルキレンビスフェノール型界面活性剤を1〜
200g/lの割合で配合する。Note that the positions of X and Y as repeating units can be changed arbitrarily, and both may exist randomly. ) In the tin-lead alloy plating bath according to the present invention, the above-mentioned polyoxyalkylene bisphenol type surfactant is added in amounts of 1 to 10%.
Blend at a rate of 200g/l.
配合世が、1 g / Q未満の場合には、めっき浴の
安定性向上、めっき皮膜の整面性などの効果が十分に達
成されず、一方、200 g / Qを上回る場合には
、めっき浴への溶解が不十分になるとともに、発泡性が
大となる。If the compounding ratio is less than 1 g/Q, the effects such as improving the stability of the plating bath and the leveling of the plating film will not be sufficiently achieved, while if it exceeds 200 g/Q, the plating The dissolution in the bath becomes insufficient and the foaming property increases.
本発明においては、上記のポリオキシアルキレンビスフ
ェノール型界面活性剤と併せて、さらにキノリン誘導体
、インドール誘導体および芳香族アミン化合物の少なく
とも一種を配合することにより、めっき皮膜をより緻密
なものとすることができる。In the present invention, the plating film can be made denser by further blending at least one of a quinoline derivative, an indole derivative, and an aromatic amine compound in addition to the above polyoxyalkylene bisphenol type surfactant. can.
キノリン誘導体としては、キノリン、イソキノリン、8
−ヒドロキシキノリン、8−ヒドロキシキノリン−5−
スルホン酸、キノリン−2−スルホン酸、キノリン−3
−スルホン酸、2−メチルキノリン、2−メチルキノリ
ン−3−カルボン酸、キノリン−2−カルボン酸、キノ
リン−5,6−キノン、キノリン−5,8−キノン、キ
ノリン−2,4−ジオール、4−オキシキナルジン酸な
どが例示される。As quinoline derivatives, quinoline, isoquinoline, 8
-Hydroxyquinoline, 8-hydroxyquinoline-5-
Sulfonic acid, quinoline-2-sulfonic acid, quinoline-3
-sulfonic acid, 2-methylquinoline, 2-methylquinoline-3-carboxylic acid, quinoline-2-carboxylic acid, quinoline-5,6-quinone, quinoline-5,8-quinone, quinoline-2,4-diol, Examples include 4-oxyquinaldic acid.
インドール誘導体としては、インドール、3−メチルイ
ンドール、2.3−ジメチルインドール、2、 3.
3−)ジメチルインドール、1−クロロインドール、β
−ジメチルアミノインドール、インドール−3−アルデ
ヒド、3−インドール、1−クロロインドール、3−ブ
ロモインドール、3−シアノインドール、6−ニトロイ
ンドール−3−アルデヒド、5−ニトロインドール−ア
ルデヒドなどが例示される。Examples of indole derivatives include indole, 3-methylindole, 2,3-dimethylindole, 2, 3.
3-) Dimethylindole, 1-chloroindole, β
-Dimethylaminoindole, indole-3-aldehyde, 3-indole, 1-chloroindole, 3-bromoindole, 3-cyanoindole, 6-nitroindole-3-aldehyde, 5-nitroindole-aldehyde, etc. .
芳香族アミン化合物としては、アニリン、o −トルイ
ジン、m−)ルイジン、p−トルイジン、O−ニトロア
ニリン、m−ニトロアニリン、p−ニトロアニリン、2
.3−ジメチルアニリン、2゜4−ジメチルアニリン、
N、N−ジメチルアニリン、0−アミノフェノール、p
−アミノフェノール、2,4.6−ドリメチルアニリン
、2.5−ジニトロアニリン、1.8−ナフタリンジア
ミン、1.5−ナフタリンジアミン、α−ナフチルアミ
ン、β−ナフチルアミン、ナフチオン酸ナトリウム、1
−ナフチルアミン−6−スルホン酸、1−ナフチルアミ
ン−8−スルホン酸、p−ニトロソジフェニルアミンな
どが例示される。Aromatic amine compounds include aniline, o-toluidine, m-)luidine, p-toluidine, O-nitroaniline, m-nitroaniline, p-nitroaniline, 2
.. 3-dimethylaniline, 2゜4-dimethylaniline,
N,N-dimethylaniline, 0-aminophenol, p
-Aminophenol, 2,4.6-drimethylaniline, 2.5-dinitroaniline, 1.8-naphthalene diamine, 1.5-naphthalene diamine, α-naphthylamine, β-naphthylamine, sodium naphthionate, 1
Examples include -naphthylamine-6-sulfonic acid, 1-naphthylamine-8-sulfonic acid, and p-nitrosodiphenylamine.
本発明めっき浴におけるキノリン誘導体、インドール誘
導体および芳香族アミン化合物の少なくとも一種の配合
量は、0.1〜20g/lの範囲内とする。これらの化
合物の量が0. 1g/l未満の場合には、効果の改善
が十分でなく、一方、20g/lを上回る場合には、め
っき浴中に完全に溶解し難くなり、経済的にも不利とな
る。The amount of at least one of the quinoline derivative, indole derivative and aromatic amine compound in the plating bath of the present invention is within the range of 0.1 to 20 g/l. If the amount of these compounds is 0. If it is less than 1 g/l, the effect will not be improved sufficiently, while if it exceeds 20 g/l, it will be difficult to completely dissolve in the plating bath, which will be economically disadvantageous.
本発明錫−鉛めっき浴における上記の添加剤以外の成分
は、公知のめっき浴におけるそれと変わるところはない
。すなわち、本発明のめっき浴は、公知のホウフッ化錫
−鉛めっき浴、有機酸錫−鉛めっき浴などに上記の添加
剤を所定の割合で配合することにより、得られる。The components other than the above-mentioned additives in the tin-lead plating bath of the present invention are the same as those in known plating baths. That is, the plating bath of the present invention can be obtained by blending the above additives in a predetermined ratio into a known tin borofluoride-lead plating bath, organic acid tin-lead plating bath, or the like.
発明の効果
本発明による錫−鉛めっき浴を使用してめっきを行う場
合には、従来よりも広い電流密度範囲において、安定し
た操作が可能となり、均一な白色めっき皮膜を得ること
が出来る。また、得られためっき皮膜は、極めて緻密で
あり、良好なハンダ付は性を示す。Effects of the Invention When plating is performed using the tin-lead plating bath according to the present invention, stable operation is possible in a wider current density range than before, and a uniform white plating film can be obtained. Moreover, the obtained plating film is extremely dense and exhibits good soldering properties.
実施例
以下に実施例および比較例を示し、本発明の特徴とする
ところをより一層明確にする。EXAMPLES Examples and comparative examples are shown below to further clarify the features of the present invention.
なお、実施例および比較例におけるめっき皮膜の状態観
察は、ハルセル試験により行った。ハルセル試験では、
浴温度を25℃とし、電流IAで5分間または電流0.
5Aで5分間のめっきを行い、均一な白色皮膜が得られ
た電流密度の範囲およびその際に得られた皮膜の緻密さ
を比較した。In addition, the state observation of the plating film in Examples and Comparative Examples was performed by a Hull cell test. In the Hull Cell test,
The bath temperature was 25°C, and the current IA was applied for 5 minutes or the current 0.
Plating was performed at 5 A for 5 minutes, and the range of current density at which a uniform white film was obtained and the density of the film obtained at that time were compared.
実施例1
下記に示す組成の錫−鉛めっき浴を使用してめっきを行
ない、得られためっき皮膜の特性を調べた。Example 1 Plating was carried out using a tin-lead plating bath having the composition shown below, and the characteristics of the resulting plated film were investigated.
45%ホウフッ化第−錫 100 g: / 94
5%ホウフッ化第−鉛 40g/942%ホウフ
ッ化水素酸 300 g / Q本発明添加剤
40g/l(一般式(1)において、R
=メチル、エチレンオキサイド10モル添加物)
めっき皮膜は、白色で、走査型電子顕微鏡写真(640
0倍)から、均一かつ緻密であることが、確認された。45% tin-borofluoride 100 g: / 94
5% leadenium borofluoride 40 g / 942% hydroborofluoric acid 300 g / Q Inventive additive
40 g/l (in general formula (1), R
= methyl, ethylene oxide 10 mole additive) The plating film is white, and the scanning electron micrograph (640
0x), it was confirmed that the film was uniform and dense.
実施例2
下記に示す組成の錫−鉛めっき浴を使用してめっきを行
なった。Example 2 Plating was carried out using a tin-lead plating bath having the composition shown below.
45%ホウフッ化第−錫 120g/245%ホ
ウフッ化第−鉛 60 g / 942%ホウ
フッ化水素酸 300 g / Qホ ウ
酸 10g1Q本
発明添加剤 20g/l(一般式(
1)において、R=メチル、エチレンオキサイド12モ
ル、プロピレンオキサイド1モル付加物)
2−メチル−8−ヒドロキシキノリン 0.5g/l2
−メチル−8−ヒドロキシキノリンを配合することによ
り、実施例1に比して、より広い電流密度範囲で、均一
で緻密な白色のめっき皮膜を得ることができた。45% stannous borofluoride 120 g / 245% leadenous borofluoride 60 g / 942% hydrofluoroboric acid 300 g / Q fluoride
Acid 10g1Q Inventive additive 20g/l (general formula (
In 1), R = methyl, 12 moles of ethylene oxide, 1 mole of propylene oxide adduct) 2-methyl-8-hydroxyquinoline 0.5 g/l2
By blending -methyl-8-hydroxyquinoline, a uniform and dense white plating film could be obtained in a wider current density range than in Example 1.
比較例1
下記に示す組成の公知の錫−鉛めっき浴を使用してめっ
きを行ない、得られためっき皮膜の特性を調べた。Comparative Example 1 Plating was performed using a known tin-lead plating bath having the composition shown below, and the characteristics of the resulting plating film were investigated.
45%ホウフッ化第−錫 100g/245%ホウ
フッ化第−鉛 40 g / 942%ホウフッ
化水素酸 300 g / Qポリオキシエチレン
ノニル
フェニルエーテル 40g/9(エチレン
オキサイド10モル付加物)得られためっき皮膜は、全
体に暗黒色を呈しており、高電流密度部分では、黒いス
ポンジ状の析出が認められた。45% stannous borofluoride 100 g / 245% leadenium borofluoride 40 g / 942% hydrofluoroboric acid 300 g / Q polyoxyethylene nonylphenyl ether 40 g / 9 (ethylene oxide 10 mole adduct) Obtained plating The entire film was dark black, and black spongy deposits were observed in the high current density areas.
また、走査型電子顕微鏡写真(6400倍)により、実
施例1及び実施例2の場合に比して、めっき皮膜の緻密
性が劣っていることが明らかとなった。Furthermore, scanning electron micrographs (6400x magnification) revealed that the denseness of the plating film was inferior to that of Examples 1 and 2.
比較例2
下記に示す組成の公知の錫−鉛めっき浴を使用してめっ
きを行ない、得られためっき皮膜の特性を調べた。Comparative Example 2 Plating was performed using a known tin-lead plating bath having the composition shown below, and the characteristics of the resulting plating film were investigated.
45%ホウフッ化第−錫 120 g / 945
%ホウフッ化第−鉛 50 g / 942%ポ
ウフッ化水素酸 240 g / Qポリオキシエ
チレンオクチル
フェニルエーテル 40 g / Q(エ
チレンオキサイド15モル付加物)ペプトン
’5g/l得られためっき皮膜は、比較
例1の場合と同様に、全体に暗黒色を呈しており、高電
流密度部分では、黒いスポンジ状の析出が認められた。45% stannous borofluoride 120 g / 945
%Leadium borofluoride 50 g / 942% borofluoride 240 g / Q polyoxyethylene octylphenyl ether 40 g / Q (ethylene oxide 15 mole adduct) peptone
As in the case of Comparative Example 1, the plated film obtained at 5 g/l had a dark black color as a whole, and black spongy deposits were observed in the high current density areas.
また、走査型電子顕微鏡写真(6400倍)により、実
施例1及び2の場合に比して、やはりめっき皮膜の緻密
性が劣っていることが、確認された。Furthermore, scanning electron micrographs (6400x magnification) confirmed that the denseness of the plating film was still inferior to that of Examples 1 and 2.
実施例3〜14
下記にそれぞれ示す本発明の錫−鉛めっき浴を使用して
めっきを行なった。Examples 3 to 14 Plating was carried out using the tin-lead plating baths of the present invention shown below.
実施例3:
フェノールスルホン酸錫 20 g / Qフェ
ノールスルホン酸鉛 10g/lフェノールスル
ホン酸 70g1Q本発明添加剤
20g/l(一般式(1)において、R=メチル
、エチレンオキサイド20モル付加物)
8−ヒドロキシキノリン 5g/l実施例4:
45%ホウフッ化第−錫 120 g / 945
%ホウフッ化第−鉛 60g/l42%ホウフッ
化水素酸 300g1Q本発明添加剤
20g/l(一般式(1)において、R=エチル
、エチレンオキサイド20モル、プロピレンオキサイド
2モル付加物)
2−メチルキノリン 1g/l実施例5:
45%ホウフッ化第−錫 160 g / Q45
%ポウフッ化第−鉛 80 g / 942%ホ
ウフッ化水素酸 240g/l本発明添加剤
50 g / Q(一般式(1)において
、R−水素、但しエチレンオキサイド10モルとプロピ
レンオキサイド4モルとがランダムに付加している)キ
ノリン−5,6−キノン 0.1g/l実施例6:
酢酸第一錫 30 g / Q酢酸
第−鉛 10 g / Qクエン酸
70g1Q本発明添加剤
20g/Ω(一般式(1)において、R
=水素、エチレンオキサイド12モル付加物)
3−メチルインドール 2 g / Q実施
例7:
45%ホウフッ化第−錫 60 g / 945
%ホウフッ化第−鉛 30 、g / 942%
ホウフッ化水素酸 200g/l本発明添加剤
20g/l(一般式(1)において、R
=メチル、但しエチレンオキサイド12モルとプロピレ
ンオキサイド4モルとがブロック状に付加している)イ
ンドール 1g/l実施例8:
塩化第一錫 40g/l硝酸塩
10 g/lグルコン酸ナトリウ
ム 100 g / Q本発明添加剤
20 g / Q(一般式(1)において、R
=メチル、エチレンオキサイド15モル、プロピレンオ
キサイド3モル付加物)
β−ジメチルアミノメチル
インドール 0.2g:/l実施例9:
メタンスルホン酸錫 30 g / Qメタ
ンスルホン酸鉛 10 g / Qメタンス
ルホン酸 100 g / Q本発明添加剤
20g/l(一般式(1)において
、R=メチル、エチレンオキサイド15モル付加物)
2.4−ジメチルアニリン 1 g / Q8−
ヒドロキシキノリン 0.5g/l実施例10;
45%ホウフッ化第−錫 30 g / Q45
%ホウフッ化第−鉛 10g、142%ホウフッ
化水素酸 100 g / Q本発明添加剤
20 g / Q(一般式(1)において
、R=水素、エチレンオキサイド12モル、プロピレン
オキサイド5モル付加物)
実施例11:
酢酸第一錫 60 g / Q酢酸
第−鉛 20 g / Qグルコン
酸ナトリウム 150g:/12本発明添加剤
20 g / Q(一般式(1)にお
いて、R=メチル、エチレンオキサイド10モル付加物
)
β−ナフチルアミン 2 g / Q実施
例12:
45%ホウフッ化第−錫 120g/l45%ホウ
フッ化第−鉛 60g/l42%ホウフッ化水素
酸 350 g / Q本発明添加剤
20g/l(一般式(1)において、R−メチル
、エチレンオキサイド10モル付加物)
1.8−ナフタリンジアミン 1 g / Q実施
例13:
フェノールスルホン酸錫 100 g / Qフェ
ノールスルホン酸鉛 40 g / Qフェノー
ルスルホン酸 200 g / Q本発明添加剤
15g/l(一般式(1)において
、R−エチル、但しエチレンオキサイド? モルとプロ
ピレンオキサイド7モルとがランダムに付加している)
ナフチオン酸ナトリウム 0.5g/!2実施例1
4:
45%ホウフッ化第−錫 100 g / Q45
%ホウフッ化第−鉛 40 g / Q4296
ホウフツ化水素酸 200 g / Q本発明添加
剤 20g/l(一般式(1)におい
て、R−メチル、エチレンオキサイド17.5モル付加
物)
キノリン 1g/l1−ナフチ
ルアミン−8−スルホン酸0.5g/Ω−に記実施例3
〜14のめっき浴をそれぞれ使用して、めっきを行った
ところ、広い電流密度範囲で均一な白色のめっき皮膜が
得られた。Example 3: Tin phenolsulfonate 20 g/Q Lead phenolsulfonate 10 g/l phenolsulfonic acid 70 g 1Q Inventive additive
20 g/l (in general formula (1), R = methyl, 20 mole adduct of ethylene oxide) 8-hydroxyquinoline 5 g/l Example 4: 45% stannous borofluoride 120 g / 945
%Leadium borofluoride 60g/l42% Hydrofluoroboric acid 300g1Q Inventive additive
20 g/l (in general formula (1), R = ethyl, 20 mol of ethylene oxide, 2 mol of propylene oxide adduct) 2-methylquinoline 1 g/l Example 5: 45% stannous borofluoride 160 g/Q45
% leadenium fluoride 80 g / 942% fluoroboric acid 240 g/l Inventive additive
50 g/Q (in general formula (1), R-hydrogen, however, 10 moles of ethylene oxide and 4 moles of propylene oxide are randomly added) Quinoline-5,6-quinone 0.1 g/l Example 6 : Stannous acetate 30 g / Q Leaden acetate 10 g / Q Citric acid 70 g 1 Q Inventive additive
20g/Ω (in general formula (1), R
= hydrogen, 12 mole adduct of ethylene oxide) 3-methylindole 2 g/Q Example 7: 45% stannous borofluoride 60 g/945
%Leadium borofluoride 30, g/942%
Hydrofluoroboric acid 200g/l Inventive additive
20 g/l (in general formula (1), R
= methyl, but 12 moles of ethylene oxide and 4 moles of propylene oxide are added in block form) Indole 1 g/l Example 8: Stannous chloride 40 g/l nitrate
10 g/l Sodium gluconate 100 g/Q Inventive additive
20 g/Q (in general formula (1), R
= methyl, 15 moles of ethylene oxide, 3 moles of propylene oxide adduct) β-dimethylaminomethylindole 0.2 g: /l Example 9: Tin methanesulfonate 30 g / Q lead methanesulfonate 10 g / Q methanesulfonic acid 100 g/Q Inventive additive 20 g/l (In general formula (1), R = methyl, 15 mole adduct of ethylene oxide) 2.4-dimethylaniline 1 g/Q8-
Hydroxyquinoline 0.5 g/l Example 10; 45% stannous borofluoride 30 g/Q45
%Leadium borofluoride 10g, 142% Hydroborofluoride acid 100g/Q Inventive additive
20 g/Q (in general formula (1), R=hydrogen, 12 moles of ethylene oxide, 5 moles of propylene oxide adduct) Example 11: Stannous acetate 60 g/Q Lead acetate 20 g/Q Gluconic acid Sodium 150g:/12 Inventive additive
20 g/Q (in general formula (1), R = methyl, 10 mole adduct of ethylene oxide) β-naphthylamine 2 g/Q Example 12: 45% stannous borofluoride 120 g/l 45% leadenium borofluoride 60g/l 42% fluoroboric acid 350g/Q Inventive additive
20 g/l (R-methyl, 10 mole adduct of ethylene oxide in general formula (1)) 1.8-naphthalene diamine 1 g / Q Example 13: Tin phenolsulfonate 100 g / Q Lead phenolsulfonate 40 g / Q phenolsulfonic acid 200 g / Q additive of the present invention 15 g/l (In general formula (1), R-ethyl, however, 1 mol of ethylene oxide and 7 mol of propylene oxide are randomly added)
Sodium naphthionate 0.5g/! 2 Example 1
4: 45% tin-borofluoride 100 g/Q45
%Leadium borofluoride 40 g/Q4296
Hydroborofluoric acid 200 g/Q Inventive additive 20 g/l (in general formula (1), R-methyl, 17.5 mol adduct of ethylene oxide) Quinoline 1 g/l 1-naphthylamine-8-sulfonic acid 0.5 g /Ω- Example 3
When plating was performed using each of ~14 plating baths, a uniform white plating film was obtained over a wide current density range.
これらの皮膜は、いずれも緻密であり、良好なハンダ性
を示した。All of these films were dense and showed good solderability.
実施例15
下記に示す組成の錫−鉛めっき浴を使用して、浴の起泡
性および消泡性を調べた。Example 15 Using a tin-lead plating bath having the composition shown below, the foaming and defoaming properties of the bath were investigated.
まず、起泡性試験として、めっき液を収容したIQのメ
スシリンダーにエアーストーンを入れ、ポンプにより空
気を送り込み、30秒後の泡立ちの高さ(mm)を測定
した。使用したポンプの空気供給能力は、30秒間当り
約650m1であった。First, as a foaming test, an air stone was placed in an IQ measuring cylinder containing a plating solution, air was pumped in, and the height (mm) of foaming was measured after 30 seconds. The air supply capacity of the pump used was approximately 650 ml per 30 seconds.
また、消泡性試6験として、上記のポンプによる空気の
送給を停止した後、30秒後、1分後、2分後および3
分後の泡立ちの高さ(mm)を測定した。In addition, as six defoaming tests, after stopping the air supply by the above pump, 30 seconds, 1 minute, 2 minutes, and 3
The foaming height (mm) was measured after minutes.
結果を第1表に示す。The results are shown in Table 1.
45%ホウフッ化第−錫 90 g / 945
%ホウフッ化第−鉛 10g/l42%ホウフッ
化水素酸 240 g / Q本発明添加剤
50g/l(一般式(1)において、R−
メチル、エチレンオキサイド10モル付加物)
8−ヒドロキシキノリン 2 g / Q比較
例3
下記に示す組成の錫−鉛めっき浴を使用して、実施例1
5と同様にして、浴の起泡性および消泡性を調べた。45% tin-borofluoride 90 g / 945
%Leadium borofluoride 10g/l42% Hydrofluoroboric acid 240g/QAdditive of the present invention
50g/l (in general formula (1), R-
methyl, ethylene oxide 10 mole adduct) 8-hydroxyquinoline 2 g/Q Comparative Example 3 Using a tin-lead plating bath having the composition shown below, Example 1
The foaming and defoaming properties of the bath were examined in the same manner as in Example 5.
結果を第1表に併せて示す。The results are also shown in Table 1.
45%ホウフッ化第−錫 90 g / 245
%ホウフッ化第−鉛 10 g / 942%ホ
ウフッ化水素酸 240 g/lポリオキシエチレ
ンノニル
フェニルエーテル 50g/l(エチレン
オキサイド10モル付加物)ペプトン
5 g / Q第1表
起泡性 消泡性
(30秒)(30秒)(1分)(2分)(3分)実施例
上ヒ十交例
第1表に示す結果から、本発明によるめっき浴は、公知
のめっき浴に比して、起泡性がほぼ半減している。また
、消泡性においても、非常に優れている。45% stannous borofluoride 90 g / 245
%Leadium borofluoride 10 g / 942% Hydrofluoroboric acid 240 g/l Polyoxyethylene nonylphenyl ether 50 g/l (ethylene oxide 10 mole adduct) Peptone
5 g / Q 1st table Foaming property Defoaming property (30 seconds) (30 seconds) (1 minute) (2 minutes) (3 minutes) From the results shown in Table 1 of Examples, Compared to known plating baths, the plating bath according to the present invention has approximately half the foaming property. It also has excellent antifoaming properties.
(以上)
手続、?A5正書(自発)
昭和63年4月25日
1 事件の表示
昭和63年特許願第70953号
2 発明の名称
錫−鉛合金めっき浴
3 補正をする者
事件との関係 特許出願人
奥野製薬工業株式会社
4代理人
′ 大阪市東区平野町2の10 沢の鶴ビル自 発
6 補正の対象
明細書中「発明の詳細な説明」の項
7 補正の内容
補正の内容
1 明細書第18頁第10行乃至第12行「但しエチレ
ンオキサイド・・・・・・・・・7モル」とあるのを下
記の通りに訂正する。(And more) Procedures? A5 official document (spontaneous) April 25, 1988 1 Indication of the case Patent Application No. 70953 of 1988 2 Name of the invention Tin-lead alloy plating bath 3 Relationship with the amended party Patent applicant Okuno Pharmaceutical Co., Ltd. Agent Co., Ltd. 4' Sawanotsuru Building, 2-10 Hirano-cho, Higashi-ku, Osaka City 6 Section 7 of "Detailed Description of the Invention" in the specification subject to amendment Contents of amendment 1 Contents of amendment 1 Specification page 18 The statement in lines 10 to 12, "However, ethylene oxide...7 moles" is corrected as follows.
「但しエチレンオキサイド15モルとプロピレンオキサ
イド5モル」
(以 」二)"However, 15 moles of ethylene oxide and 5 moles of propylene oxide" (hereinafter referred to as "2")
Claims (2)
剤を1〜200g/l含有することを特徴とする錫−鉛
合金めっき浴。(1) A tin-lead alloy plating bath characterized by containing 1 to 200 g/l of a polyoxyalkylene bisphenol type surfactant.
剤を1〜200g/lならびにキノリン誘導体、インド
ール誘導体および芳香族アミン化合物の少なくとも一種
を0.1〜20g/l含有することを特徴とする錫−鉛
合金めつき浴。(2) A tin-lead alloy containing 1 to 200 g/l of a polyoxyalkylene bisphenol type surfactant and 0.1 to 20 g/l of at least one of a quinoline derivative, an indole derivative, and an aromatic amine compound. Pleasant bath.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7095388A JPH01242795A (en) | 1988-03-24 | 1988-03-24 | Tin-lead alloy plating bath |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7095388A JPH01242795A (en) | 1988-03-24 | 1988-03-24 | Tin-lead alloy plating bath |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01242795A true JPH01242795A (en) | 1989-09-27 |
JPH0320479B2 JPH0320479B2 (en) | 1991-03-19 |
Family
ID=13446384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7095388A Granted JPH01242795A (en) | 1988-03-24 | 1988-03-24 | Tin-lead alloy plating bath |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01242795A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207189A (en) * | 1981-06-16 | 1982-12-18 | Hooker Chemicals Plastics Corp | Method and composition for electrodepositing tin |
JPS61223193A (en) * | 1985-03-26 | 1986-10-03 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath and plating method thereby |
JPS624895A (en) * | 1985-06-26 | 1987-01-10 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath |
JPH01268894A (en) * | 1987-12-10 | 1989-10-26 | Learonal Inc | Tin, lead or tin/lead alloy electrolyte for high speed electroplating and method |
-
1988
- 1988-03-24 JP JP7095388A patent/JPH01242795A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207189A (en) * | 1981-06-16 | 1982-12-18 | Hooker Chemicals Plastics Corp | Method and composition for electrodepositing tin |
JPS61223193A (en) * | 1985-03-26 | 1986-10-03 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath and plating method thereby |
JPS624895A (en) * | 1985-06-26 | 1987-01-10 | マツクジ−ン−ロ−コ・インコ−ポレ−テツド | Aqueous plating bath |
JPH01268894A (en) * | 1987-12-10 | 1989-10-26 | Learonal Inc | Tin, lead or tin/lead alloy electrolyte for high speed electroplating and method |
Also Published As
Publication number | Publication date |
---|---|
JPH0320479B2 (en) | 1991-03-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI286580B (en) | Methods of minimizing whisker growth in tin electrodeposits | |
JP4719822B2 (en) | Electrolytic gold plating solution and gold film obtained using the same | |
JP5574912B2 (en) | Tin plating solution | |
JP4392640B2 (en) | Non-cyanide gold-tin alloy plating bath | |
JP2013023693A (en) | Imidazole ring-bonded type oxyalkylene compound and plating bath containing the compound | |
TW379259B (en) | Palladium alloy plating compositions | |
US20070068823A1 (en) | Tin electroplating solution and tin electroplating method | |
JPH1121693A (en) | Tin-silver alloy plating bath and plated material | |
US20180135195A1 (en) | Barrel plating or high-speed rotary plating using a neutral tin plating solution | |
JPH01242795A (en) | Tin-lead alloy plating bath | |
JP4750486B2 (en) | Electrolytic copper plating additive, electrolytic copper plating bath containing the additive, and electrolytic copper plating method using the plating bath | |
KR20040019968A (en) | Plating method | |
US2238069A (en) | Solder flux | |
CN107630239A (en) | The method of indium electroplating compositions and indium plating containing 1,10 coffee quinoline compounds | |
CN107630238B (en) | Indium electroplating compositions and method for indium plating | |
JPH06330336A (en) | Electroless gold plating bath | |
US6331201B1 (en) | Bismuth coating protection for copper | |
US4100040A (en) | Electrodeposition of bright zinc utilizing aliphatic ketones | |
CN109570825A (en) | A kind of Low-temperature halogen-free lead-free solder paste and preparation method thereof | |
CN110965064B (en) | Application of alkylamide benzimidazole compound, organic weldable protective agent, preparation method, use method and application thereof | |
TWI663184B (en) | Flux | |
WO2024046398A1 (en) | Composition and use thereof, leveling agent, and preparation method | |
JP3986125B2 (en) | Tin-silver alloy plating bath | |
CN107630236A (en) | The method of indium electroplating compositions and indium plating containing 2 imidazolidine thione compounds | |
TW201807095A (en) | Water-based organic solderability preservative, and electronic board and surface treatment method using the same |