JPH0320478B2 - - Google Patents
Info
- Publication number
- JPH0320478B2 JPH0320478B2 JP3415987A JP3415987A JPH0320478B2 JP H0320478 B2 JPH0320478 B2 JP H0320478B2 JP 3415987 A JP3415987 A JP 3415987A JP 3415987 A JP3415987 A JP 3415987A JP H0320478 B2 JPH0320478 B2 JP H0320478B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- salts
- zinc
- acid
- salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000003839 salts Chemical class 0.000 claims description 21
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 18
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 claims description 18
- 229910052783 alkali metal Inorganic materials 0.000 claims description 17
- -1 alkali metal salts Chemical class 0.000 claims description 17
- 239000002253 acid Substances 0.000 claims description 14
- 150000003751 zinc Chemical class 0.000 claims description 14
- 150000001879 copper Chemical class 0.000 claims description 13
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical class OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 claims description 13
- 150000001413 amino acids Chemical class 0.000 claims description 12
- 238000009713 electroplating Methods 0.000 claims description 10
- 229920000137 polyphosphoric acid Polymers 0.000 claims description 10
- 229940005657 pyrophosphoric acid Drugs 0.000 claims description 10
- 150000007513 acids Chemical class 0.000 claims description 4
- 238000007747 plating Methods 0.000 description 37
- 235000002639 sodium chloride Nutrition 0.000 description 34
- 235000001014 amino acid Nutrition 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000011701 zinc Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 239000008139 complexing agent Substances 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 4
- 150000002825 nitriles Chemical class 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 235000011180 diphosphates Nutrition 0.000 description 3
- 229940048084 pyrophosphate Drugs 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- 239000011975 tartaric acid Substances 0.000 description 3
- 235000002906 tartaric acid Nutrition 0.000 description 3
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 159000000001 potassium salts Chemical class 0.000 description 2
- WSHYKIAQCMIPTB-UHFFFAOYSA-M potassium;2-oxo-3-(3-oxo-1-phenylbutyl)chromen-4-olate Chemical compound [K+].[O-]C=1C2=CC=CC=C2OC(=O)C=1C(CC(=O)C)C1=CC=CC=C1 WSHYKIAQCMIPTB-UHFFFAOYSA-M 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- MTCFGRXMJLQNBG-REOHCLBHSA-N (2S)-2-Amino-3-hydroxypropansäure Chemical compound OC[C@H](N)C(O)=O MTCFGRXMJLQNBG-REOHCLBHSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- FFRBMBIXVSCUFS-UHFFFAOYSA-N 2,4-dinitro-1-naphthol Chemical compound C1=CC=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FFRBMBIXVSCUFS-UHFFFAOYSA-N 0.000 description 1
- JJKVMNNUINFIRK-UHFFFAOYSA-N 4-amino-n-(4-methoxyphenyl)benzamide Chemical compound C1=CC(OC)=CC=C1NC(=O)C1=CC=C(N)C=C1 JJKVMNNUINFIRK-UHFFFAOYSA-N 0.000 description 1
- JXSRRBVHLUJJFC-UHFFFAOYSA-N 7-amino-2-methylsulfanyl-[1,2,4]triazolo[1,5-a]pyrimidine-6-carbonitrile Chemical compound N1=CC(C#N)=C(N)N2N=C(SC)N=C21 JXSRRBVHLUJJFC-UHFFFAOYSA-N 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- ONIBWKKTOPOVIA-BYPYZUCNSA-N L-Proline Chemical compound OC(=O)[C@@H]1CCCN1 ONIBWKKTOPOVIA-BYPYZUCNSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 description 1
- AYFVYJQAPQTCCC-GBXIJSLDSA-N L-threonine Chemical compound C[C@@H](O)[C@H](N)C(O)=O AYFVYJQAPQTCCC-GBXIJSLDSA-N 0.000 description 1
- QIVBCDIJIAJPQS-VIFPVBQESA-N L-tryptophane Chemical compound C1=CC=C2C(C[C@H](N)C(O)=O)=CNC2=C1 QIVBCDIJIAJPQS-VIFPVBQESA-N 0.000 description 1
- ONIBWKKTOPOVIA-UHFFFAOYSA-N Proline Natural products OC(=O)C1CCCN1 ONIBWKKTOPOVIA-UHFFFAOYSA-N 0.000 description 1
- MTCFGRXMJLQNBG-UHFFFAOYSA-N Serine Natural products OCC(N)C(O)=O MTCFGRXMJLQNBG-UHFFFAOYSA-N 0.000 description 1
- AYFVYJQAPQTCCC-UHFFFAOYSA-N Threonine Natural products CC(O)C(N)C(O)=O AYFVYJQAPQTCCC-UHFFFAOYSA-N 0.000 description 1
- 239000004473 Threonine Substances 0.000 description 1
- QIVBCDIJIAJPQS-UHFFFAOYSA-N Tryptophan Natural products C1=CC=C2C(CC(N)C(O)=O)=CNC2=C1 QIVBCDIJIAJPQS-UHFFFAOYSA-N 0.000 description 1
- CANRESZKMUPMAE-UHFFFAOYSA-L Zinc lactate Chemical compound [Zn+2].CC(O)C([O-])=O.CC(O)C([O-])=O CANRESZKMUPMAE-UHFFFAOYSA-L 0.000 description 1
- RAOSIAYCXKBGFE-UHFFFAOYSA-K [Cu+3].[O-]P([O-])([O-])=O Chemical compound [Cu+3].[O-]P([O-])([O-])=O RAOSIAYCXKBGFE-UHFFFAOYSA-K 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229940116318 copper carbonate Drugs 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- 229960000355 copper sulfate Drugs 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- NSGLMHRMZITSKO-UHFFFAOYSA-L copper;dibromate Chemical compound [Cu+2].[O-]Br(=O)=O.[O-]Br(=O)=O NSGLMHRMZITSKO-UHFFFAOYSA-L 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- ZZBBCSFCMKWYQR-UHFFFAOYSA-N copper;dioxido(oxo)silane Chemical compound [Cu+2].[O-][Si]([O-])=O ZZBBCSFCMKWYQR-UHFFFAOYSA-N 0.000 description 1
- ZQLBQWDYEGOYSW-UHFFFAOYSA-L copper;disulfamate Chemical compound [Cu+2].NS([O-])(=O)=O.NS([O-])(=O)=O ZQLBQWDYEGOYSW-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 239000011641 cupric citrate Substances 0.000 description 1
- 235000019855 cupric citrate Nutrition 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- WBTCZEPSIIFINA-MSFWTACDSA-J dipotassium;antimony(3+);(2r,3r)-2,3-dioxidobutanedioate;trihydrate Chemical compound O.O.O.[K+].[K+].[Sb+3].[Sb+3].[O-]C(=O)[C@H]([O-])[C@@H]([O-])C([O-])=O.[O-]C(=O)[C@H]([O-])[C@@H]([O-])C([O-])=O WBTCZEPSIIFINA-MSFWTACDSA-J 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- UOURRHZRLGCVDA-UHFFFAOYSA-D pentazinc;dicarbonate;hexahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Zn+2].[Zn+2].[Zn+2].[Zn+2].[Zn+2].[O-]C([O-])=O.[O-]C([O-])=O UOURRHZRLGCVDA-UHFFFAOYSA-D 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 235000013930 proline Nutrition 0.000 description 1
- 235000004400 serine Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000001476 sodium potassium tartrate Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 235000008521 threonine Nutrition 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- STDMRMREKPZQFJ-UHFFFAOYSA-H tricopper;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Cu+2].[Cu+2].[Cu+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O STDMRMREKPZQFJ-UHFFFAOYSA-H 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229960001939 zinc chloride Drugs 0.000 description 1
- 239000011576 zinc lactate Substances 0.000 description 1
- 235000000193 zinc lactate Nutrition 0.000 description 1
- 229940050168 zinc lactate Drugs 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- OMSYGYSPFZQFFP-UHFFFAOYSA-J zinc pyrophosphate Chemical compound [Zn+2].[Zn+2].[O-]P([O-])(=O)OP([O-])([O-])=O OMSYGYSPFZQFFP-UHFFFAOYSA-J 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
産業上の利用分野
本発明は、シアン化合物を含まない光沢銅−亜
鉛合金電気めつき浴(以下「電気めつき浴」を単
に「めつき浴」という)に関する。
従来の技術とその問題点
銅−亜鉛合金めつきは、黄銅めつき、真鍮めつ
きとも呼ばれており、金属製品、プラスチツク製
品、セラミツク製品等に真鍮色の金属光沢及び色
調を付与するため装飾めつきとして広く使用され
ている。また、銅一亜鉛合金めつきは、ラジアル
タイヤ用スリールコードとゴムとの密着性を向上
させる目的にも使われている。しかし、現在、工
業的に広く用いられている銅−亜鉛合金めつき浴
は、全てシアン化合物を多量に含んでおり、その
毒性が大きな問題となつている。シアン化合物を
含まない銅−亜鉛めつき浴に関しては数多くの報
告が成されているが、何れも実用に至つていな
い。
例えば、錯化剤としてピロリン酸カリウム、オ
キシカルボン酸等を用いためつき浴が提案されて
いる。ピロリン酸カリウムを錯化剤とするめつき
浴についてテイ・エル・ラマチヤーの研究〔エレ
クトロプレイテイング・アンド・メタル・フイニ
ツシング、12、326(1959)〕は著名であるが、こ
のピロリン酸カリウム浴には、得られる銅−亜鉛
合金めつき金色の光沢範囲が狭い、陽極が不動態
化し易い等の欠点がある。越浦らは、ピロリン酸
カリウム浴にアルカノールポリアミンとエピハロ
ヒドリンとの重合物を添加することによつて上記
の欠点を解消しようとした(特開昭59−215492
号)。しかしながら、この方法は、析出する合金
の金属比がCu:Zn=7〜8:3〜2であるのに
対し、めつき浴中の金属濃度比はCu:Zn=約
1:9であるので、安定した連続作用を行なうた
めの陽極の選定が困難であるという欠点を有して
いる。また、オキシカルボン酸又はその塩を錯化
剤とする浴としては、例えば、青谷らの酒石酸浴
(特公昭49−26815号)、イー・エツチ・マツコイ
のグルコヘプトン酸浴(特開昭59−50151号)等
が知られている。しかし、上記酒石酸浴は、光沢
剤として0.8〜8g/のシアン化金属塩を含ん
でいるため、完全な非シアン浴ではない。一方グ
ルコヘプトン酸浴でめつきを施した場合、光沢を
出すためにめつき後に更にボール研磨を施さなけ
ればならない。
問題点を解決するための手段
本発明者は、上記従来技術の問題点に鑑みて鋭
意研究を重ねた結果、銅塩及び亜鉛塩とともに、
錯化剤としてのピロリン酸のアルカリ金属塩又は
ポリリン酸のアルカリ金属塩及びオキシカルボン
酸又はその塩、並びにアミノ酸又はその塩を含有
し、シアン化合物を含まない無毒性の浴を使用す
ることによつて、極めて優れた光沢を有し、装飾
価値の高い金色の銅−亜鉛合金めつき皮膜を幅広
い電流密度範囲で得られることを見い出し、本発
明を完成した。
即ち本発明は、(a)銅塩及び亜鉛塩、(b)ピロリン
酸のアルカリ金属塩及びポリリン酸のアルカリ金
属塩から選ばれた少くとも1種、(c)オキシカルボ
ン酸及びその塩から選ばれた少くとも1種並びに
(d)アミノ酸及びその塩から選ばれた少くとも1種
を含有することを特徴とする、シアン化合物を含
まない光沢銅−亜鉛合金電気めつき浴に係る。
本発明では、銅塩及び亜鉛塩とともに、錯化剤
としてのピロリン酸の金属塩又はポリリン酸のア
ルカリ金属塩及びオキシカルボン酸又はその塩、
並びにアミノ酸又はその塩の3種の化合物を併用
する場合にのみ、本発明の所期の効果を達成でき
る。銅塩、亜鉛塩及びピロリン酸又はポリリン酸
のアルカリ金属塩のみからなる浴を使用すると、
得られるめつき皮膜は、低電流密度では銅が優先
的に析出して赤銅色になり、高電流密度ではヤケ
が生じる。その間の電流密度、即ち浴の組成によ
つて決まる最適電流密度±0.1A/dm2程度の非
常に狭い範囲では、金色(真鍮色)のめつき皮膜
が得られるが、ガス跡が激しく、その光沢は不充
分である。銅塩、亜鉛塩及びオキシカルボン酸又
はその塩からなる浴では、めつき皮膜が暗緑色と
なり、金色のめつき塗膜は得られない。ピロリン
酸又はポリリン酸のアルカリ金属塩及びオキシカ
ルボン酸又はその塩の2種を使用すると、低電流
密度での銅の優先的な析出がなくなり、かなり広
い電流密度範囲で光沢のある銅−亜鉛合金めつき
皮膜が得られる。しかし、その色調は、電流密度
の上昇に従つて、黄緑→黄金色→真鍮色と変化し
て色ムラを生じるため、装飾めつきとしての実用
化には不充分である。ところが、前記2種の錯化
剤としての化合物とともにアミノ酸又はその塩を
添加すると、非常に広い電流密度で、完全に均質
な金色の色調を有する光沢銅−亜鉛合金めつき皮
膜を得ることができる。本発明では、浴組成を適
宜変更することによつて、0.05〜5A/dm2程度
の著るしく広い電流密度範囲において、極めて優
れた光沢を有する金色の銅−亜鉛合金めつき皮膜
を得ることができる。
銅塩としては、公知のものが何れも使用でき、
例えば、ピロリン酸銅、硫酸銅、塩化第2銅、ス
ルフアミン酸銅、臭酸銅、酢酸第2銅、塩基性炭
酸銅、臭化第2銅、ギ酸銅、水酸化銅、酸化第2
銅、リン酸銅、ケイフツ化銅、ステアリン酸銅、
クエン酸第2銅等を挙げることができる。
亜鉛塩としては、公知のものが何れも使用で
き、例えば、ピロリン酸亜鉛、硫酸亜鉛、塩化亜
鉛、スルフアミン酸亜鉛、酸化亜鉛、酢酸亜鉛、
臭化亜鉛、塩基性炭酸亜鉛、シユウ酸亜鉛、リン
酸亜鉛、ケイフツ化亜鉛、ステアリン酸亜鉛、乳
酸亜鉛等を挙げることができる。銅塩及び亜鉛塩
は、夫々2種以上のものを併用してもかまわな
い。
ピロリン酸のアルカリ金属塩及びポリリン酸の
アルカリ金属塩としては、公知のものが何れも使
用でき、例えば、そのナトリウム塩、カリウム塩
等を挙げることができる。
オキシカルボン酸としては、公知のものが何れ
も使用でき、例えば、グリコール酸、乳酸、リン
ゴ酸、クエン酸、酒石酸、グルコン酸、グルコヘ
プトン酸等を挙げることができる。またその塩と
しては、リチウム塩、ナトリウム塩、カリウム
塩、カルシウム塩等を挙げることができる。更に
酒石酸塩としては、前記塩以外にも、吐酒石(酒
石酸アンチモニルカリウム)、ロツシエル塩(酒
石酸ナトリウムカリウム)等にも使用できる。
またアミノ酸としては、公知のものが何れも使
用でき、例えば、グリシン、アラニン、グルタミ
ン酸、アスパラギン酸、トレオニン、セリン、プ
ロリン、トリプトフアン、ヒスチジン等のα−ア
ミン酸もしくはその塩酸塩、ナトリウム塩等を挙
げることができる。本発明では、上記ピロリン酸
のアルカリ金属塩、ポリリン酸のアルカリ金属
塩、オキシカルボン酸並びにアミノ酸及びその塩
についても、夫々2種以上のものを併用してもか
まわない。
本発明浴における上記各成分の配合量は特に制
限されず、適宜選択すればよいが、工業的な取り
扱いの容易さを考慮すると、銅塩を銅分換算で2
〜40g/程度、亜鉛塩を亜鉛分換算で0.5〜30
g/程度、ピロリン酸のアルカリ金属塩及び/
又はポリリン酸のアルカリ金属塩を150〜400g/
程度、オキシカルボン酸及び/又はその塩を50
〜400g/程度及びアミノ酸及び/又はその塩
を0.5〜50g/程度配合すればよい。めつき浴
中のCuとZnとの濃度比(Cu:Zn)は特に制限さ
れず適宜選択できるが、通常9〜1:1程度とす
ればよく、これによつて金色(真鍮色)のめつき
皮膜を得ることができる。但し、安定した連続作
業を行うことを考慮に入れると、銅塩を銅分換算
で5〜15g/程度、亜鉛塩を亜鉛分換算で1〜
10g/程度添加し、濃度比を5〜1.5:1程度
とすることが好ましい。また、銅塩、亜鉛塩とい
てピロリン酸塩を使用する場合には、このピロリ
ン酸塩をも含めた全ピロリン酸塩濃度が上記範囲
に入るようにしてもよい。
本発明浴を使用して、光沢銅−亜鉛合金めつき
を施すに当つては、通常の電気めつき方法が何れ
も採用でき、例えば被めつき体を、浴温10〜50℃
程度、浴のPH10.0〜14.0程度、陰極電流密度0.1〜
5A/dm2程度のめつき条件で、無攪拌下或いは
機械攪拌下又は空気攪拌下に電気めつきすればよ
い。この際陽極としては、通常の銅−亜鉛合金の
電気めつきに用いられるものが何れも使用でき
る。被めつき体には、上記電気めつきを行う前に
常法に従つてバフ研磨、脱脂、希酸浸漬等の通常
の前処理を施してもよく、或いは光沢ニツケルめ
つき等の下地めつきを施してもよい。まためつき
後には、水洗、湯洗、乾燥等の通常行なわれてい
る操作を行つてもよく、更に必要に応じて、重ク
ロム酸希薄溶液への浸漬、クリアー塗装等を行つ
てもよい。
本発明では、被めつき体としては特に制限され
ず、通常銅−亜鉛合金めつき皮膜を施されるもの
が何れも使用でき、例えば、金属製品、プラスチ
ツク製品、セラミツクス製品等を挙げることがで
き、これらには、通常本発明浴によるめつきを施
す前に、常法に従つて、下地めつきを施すのが好
ましい。
発明の効果
本発明浴によれば、極めて優れた光沢を有し、
装飾価値の高い金色の銅−亜鉛合金めつき皮膜を
幅広い電流密度範囲で得ることができる。また、
本発明浴は、シアン化合物を含有しないので、有
毒ガス等が発生せず、しかも沈殿物の生成等もな
く無害の安定したものとなつている。陽性に銅−
亜鉛合金を用いた場合には、溶解は均一であり、
めつき浴組成は安定に保たれる。更にめつき浴中
のCu:Zn濃度比がほぼめつき皮膜の組成に近い
2〜1.5:1程度の範囲においても金色のめつき
皮膜が得られるので、カーボン、白金めつきチタ
ン等の不溶性陽極を使用した場合にも、銅塩、亜
鉛塩の一定組成の混合物の補給のみで安定した連
続作業が可能である。
実施例
以下に実施例及び比較例を掲げて、本発明の特
徴をより一層明らかにする。
実施例1〜5及び比較例1〜3
第1表(実施例1〜5)及び第2表(比較例1
〜3)に記載のめつき浴組成(各成分の添加量は
全てg/)並びにめつき条件で電気めつきを行
い、得られためつき皮膜の外観・色調を観察し
た。結果を第3表に示す。尚、第1表及び第2表
中、銅塩及び亜鉛塩の項で、( )内に示した数
値は、夫々の金属分換算根(g/)である。
INDUSTRIAL APPLICATION FIELD The present invention relates to a bright copper-zinc alloy electroplating bath (hereinafter referred to simply as "electroplating bath") that does not contain cyanide compounds. Conventional technology and its problems Copper-zinc alloy plating, also called brass plating or brass plating, is used for decoration to give brass-colored metallic luster and color tone to metal products, plastic products, ceramic products, etc. Widely used as plating. Copper-zinc alloy plating is also used to improve the adhesion between the reel cord and rubber for radial tires. However, all copper-zinc alloy plating baths that are currently widely used industrially contain large amounts of cyanide, and their toxicity is a major problem. Although many reports have been made regarding copper-zinc plating baths that do not contain cyanide compounds, none of them have been put to practical use. For example, a soaking bath using potassium pyrophosphate, oxycarboxylic acid, etc. as a complexing agent has been proposed. The study by T.L. Ramatyah [Electroplating and Metal Finishing, 12 , 326 (1959)] on a plating bath using potassium pyrophosphate as a complexing agent is famous; However, the copper-zinc alloy plating has disadvantages such as a narrow range of golden luster and a tendency for the anode to become passivated. Koshiura et al. attempted to solve the above drawback by adding a polymer of alkanol polyamine and epihalohydrin to a potassium pyrophosphate bath (Japanese Patent Laid-Open No. 59-215492).
issue). However, in this method, the metal ratio of the deposited alloy is Cu:Zn = 7-8:3-2, whereas the metal concentration ratio in the plating bath is Cu:Zn = approximately 1:9. However, it has the disadvantage that it is difficult to select an anode for stable and continuous operation. In addition, examples of baths using oxycarboxylic acid or its salt as a complexing agent include the tartaric acid bath of Aoya et al. No.) etc. are known. However, the tartaric acid bath described above is not a completely cyanide-free bath because it contains 0.8 to 8 g/metal cyanide salt as a brightening agent. On the other hand, when plating is performed in a glucoheptonic acid bath, ball polishing must be performed after plating to obtain gloss. Means for Solving the Problems As a result of intensive research in view of the problems of the above-mentioned prior art, the inventors have found that, together with copper salts and zinc salts,
By using a non-toxic bath containing an alkali metal salt of pyrophosphoric acid or an alkali metal salt of polyphosphoric acid and an oxycarboxylic acid or a salt thereof as a complexing agent, and an amino acid or a salt thereof and not containing a cyanide. They have now discovered that a gold-colored copper-zinc alloy plating film with extremely excellent gloss and high decorative value can be obtained over a wide current density range, and have completed the present invention. That is, the present invention provides at least one selected from (a) copper salts and zinc salts, (b) alkali metal salts of pyrophosphoric acid and alkali metal salts of polyphosphoric acid, and (c) oxycarboxylic acids and their salts. at least one type of
(d) A cyanide-free bright copper-zinc alloy electroplating bath characterized by containing at least one selected from amino acids and salts thereof. In the present invention, in addition to copper salts and zinc salts, metal salts of pyrophosphoric acid or alkali metal salts of polyphosphoric acid and oxycarboxylic acids or salts thereof as complexing agents,
The desired effects of the present invention can only be achieved when three types of compounds, including amino acids and amino acids or salts thereof, are used in combination. When using a bath consisting only of copper salts, zinc salts and alkali metal salts of pyrophosphoric acid or polyphosphoric acid,
At low current densities, copper preferentially precipitates in the resulting plating film, giving it a coppery color, while at high current densities, it becomes discolored. In a very narrow range of current density between that range, i.e., the optimum current density of ±0.1 A/dm 2 determined by the bath composition, a gold-colored (brass-colored) plating film can be obtained, but gas traces are severe and The gloss is insufficient. In a bath consisting of a copper salt, a zinc salt, and an oxycarboxylic acid or its salt, the plating film becomes dark green, and a golden plating film cannot be obtained. The use of two types, an alkali metal salt of pyrophosphoric acid or polyphosphoric acid and an oxycarboxylic acid or its salt, eliminates the preferential precipitation of copper at low current densities, resulting in a shiny copper-zinc alloy over a fairly wide current density range. A plated film is obtained. However, as the current density increases, the color tone changes from yellow-green to golden yellow to brass-colored, resulting in color unevenness, which is insufficient for practical use as decorative plating. However, when an amino acid or a salt thereof is added together with the two compounds as complexing agents, a bright copper-zinc alloy plated film having a completely homogeneous golden color can be obtained over a very wide range of current densities. . In the present invention, by appropriately changing the bath composition, it is possible to obtain a golden copper-zinc alloy plating film with extremely excellent gloss in a significantly wide current density range of approximately 0.05 to 5 A/ dm2 . Can be done. Any known copper salt can be used,
For example, copper pyrophosphate, copper sulfate, cupric chloride, copper sulfamate, copper bromate, cupric acetate, basic copper carbonate, cupric bromide, copper formate, copper hydroxide, cupric oxide.
Copper, copper phosphate, copper silicate, copper stearate,
Examples include cupric citrate. Any known zinc salt can be used, such as zinc pyrophosphate, zinc sulfate, zinc chloride, zinc sulfamate, zinc oxide, zinc acetate,
Examples include zinc bromide, basic zinc carbonate, zinc oxalate, zinc phosphate, zinc silica, zinc stearate, and zinc lactate. Two or more types of copper salts and zinc salts may be used in combination. Any known alkali metal salts of pyrophosphoric acid and alkali metal salts of polyphosphoric acid can be used, and examples thereof include sodium salts and potassium salts thereof. Any known oxycarboxylic acid can be used, and examples thereof include glycolic acid, lactic acid, malic acid, citric acid, tartaric acid, gluconic acid, and glucoheptonic acid. Examples of the salts include lithium salts, sodium salts, potassium salts, calcium salts, and the like. Furthermore, as the tartrate, in addition to the above-mentioned salts, tartarite (antimonyl potassium tartrate), Rothsiel's salt (sodium potassium tartrate), etc. can also be used. As the amino acid, any known amino acid can be used, such as α-amic acid such as glycine, alanine, glutamic acid, aspartic acid, threonine, serine, proline, tryptophan, histidine, or its hydrochloride, sodium salt, etc. be able to. In the present invention, two or more of the alkali metal salts of pyrophosphoric acid, alkali metal salts of polyphosphoric acid, oxycarboxylic acids, and amino acids and salts thereof may be used in combination. The blending amount of each of the above components in the bath of the present invention is not particularly limited and may be selected as appropriate. However, considering the ease of industrial handling, the copper salt should be
~40g/about, zinc salt 0.5~30 in terms of zinc content
g/degree, alkali metal salt of pyrophosphoric acid and/or
Or 150-400g/alkali metal salt of polyphosphoric acid
degree, oxycarboxylic acid and/or its salts to 50%
~400g/approximately and amino acids and/or their salts may be blended in an amount of approximately 0.5~50g/approximately. The concentration ratio of Cu and Zn (Cu:Zn) in the plating bath is not particularly limited and can be selected as appropriate, but it is usually about 9 to 1:1, and this will result in a golden (brass) color. A coating film can be obtained. However, taking into consideration stable and continuous work, the copper salt should be used at a rate of 5 to 15 g in terms of copper content, and the zinc salt should be used in an amount of 1 to 15 g in terms of zinc content.
It is preferable to add about 10 g/concentration ratio of about 5 to 1.5:1. Further, when using a pyrophosphate such as a copper salt or a zinc salt, the total pyrophosphate concentration including this pyrophosphate may be within the above range. When applying bright copper-zinc alloy plating using the bath of the present invention, any ordinary electroplating method can be used.
degree, bath pH 10.0~14.0, cathode current density 0.1~
Electroplating may be carried out under plating conditions of about 5 A/dm 2 without stirring, mechanical stirring, or air stirring. In this case, as the anode, any one used for ordinary electroplating of copper-zinc alloys can be used. The body to be plated may be subjected to conventional pretreatments such as buffing, degreasing, and dipping in dilute acid according to conventional methods before electroplating, or may be subjected to undercoat plating such as glossy nickel plating. may be applied. After plating, usual operations such as washing with water, hot water, and drying may be performed, and further, if necessary, immersion in a dilute dichromic acid solution, clear coating, etc. may be performed. In the present invention, the body to be plated is not particularly limited, and any body that is normally coated with a copper-zinc alloy plating film can be used, such as metal products, plastic products, ceramic products, etc. Before plating with the bath of the present invention, it is preferable to apply base plating to these according to a conventional method. Effects of the Invention According to the bath of the present invention, it has extremely excellent gloss;
A golden copper-zinc alloy plating film with high decorative value can be obtained over a wide current density range. Also,
Since the bath of the present invention does not contain cyanide compounds, it does not generate toxic gases or the like, and is harmless and stable without the formation of precipitates. Copper positive
When using zinc alloys, the dissolution is uniform;
The plating bath composition remains stable. Furthermore, a golden plating film can be obtained even when the Cu:Zn concentration ratio in the plating bath is in the range of 2 to 1.5:1, which is close to the composition of the plating film. Even when using a copper salt and a zinc salt, stable continuous operation is possible just by replenishing a mixture of a fixed composition of copper salts and zinc salts. Examples Examples and comparative examples are given below to further clarify the characteristics of the present invention. Examples 1 to 5 and Comparative Examples 1 to 3 Table 1 (Examples 1 to 5) and Table 2 (Comparative Example 1
Electroplating was performed using the plating bath composition (the amount of each component added is all g/) and the plating conditions described in 3) to 3), and the appearance and color tone of the resulting matted film were observed. The results are shown in Table 3. In addition, in Tables 1 and 2, the values shown in parentheses in the copper salt and zinc salt terms are the respective metal equivalent roots (g/).
【表】【table】
【表】【table】
【表】【table】
【表】
第3表から、本発明光沢銅−亜鉛合金めつき浴
においては、(1)ピロリン酸のアルカリ金属塩及
び/又はポリリン酸のアルカリ金属塩、(2)オキシ
カルボン酸及び/又はその塩、並びに(3)アミン酸
及び/又はその塩の3者の相乗作用によつて、装
飾価値が高く、極めて優れた光沢のある銅−亜鉛
合金めつき皮膜を、幅広い電流密度範囲で得られ
ることが判る。[Table] From Table 3, in the bright copper-zinc alloy plating bath of the present invention, (1) an alkali metal salt of pyrophosphoric acid and/or an alkali metal salt of polyphosphoric acid, (2) an oxycarboxylic acid and/or its Through the synergistic action of the salt and (3) the amino acid and/or its salt, a copper-zinc alloy plating film with high decorative value and extremely high gloss can be obtained over a wide current density range. I understand that.
Claims (1)
リ金属塩及びポリリン酸のアルカリ金属塩から選
ばれた少くとも1種、(c)オキシカルボン酸及びそ
の塩から選ばれた少くとも1種並びに(d)アミノ酸
及びその塩から選ばれた少くとも1種を含有する
ことを特徴とする、シアン化合物を含まない光沢
銅−亜鉛合金電気めつき浴。1 (a) At least one selected from copper salts and zinc salts, (b) alkali metal salts of pyrophosphoric acid and alkali metal salts of polyphosphoric acid, (c) at least one selected from oxycarboxylic acids and their salts. A cyanide-free bright copper-zinc alloy electroplating bath characterized by containing at least one selected from amino acids and (d) amino acids and their salts.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3415987A JPS63203790A (en) | 1987-02-17 | 1987-02-17 | Bright copper-zinc alloy electroplating bath containing no cyanogen compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3415987A JPS63203790A (en) | 1987-02-17 | 1987-02-17 | Bright copper-zinc alloy electroplating bath containing no cyanogen compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63203790A JPS63203790A (en) | 1988-08-23 |
JPH0320478B2 true JPH0320478B2 (en) | 1991-03-19 |
Family
ID=12406423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3415987A Granted JPS63203790A (en) | 1987-02-17 | 1987-02-17 | Bright copper-zinc alloy electroplating bath containing no cyanogen compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63203790A (en) |
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WO2010101212A1 (en) | 2009-03-04 | 2010-09-10 | 株式会社ブリヂストン | Copper-zinc alloy electroplating bath and method of plating using same |
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JPH0819550B2 (en) * | 1990-06-05 | 1996-02-28 | 福田金属箔粉工業株式会社 | Surface treatment method for copper foil for printed circuits |
IT1275490B (en) * | 1995-07-07 | 1997-08-07 | Pirelli | ELECTROLYTIC PROCEDURE TO COVER A METAL ELEMENT WITH A BRASS LAYER |
EP2218804A4 (en) * | 2007-11-26 | 2011-08-24 | Bridgestone Corp | Copper-zinc alloy electroplating bath and plating method using the copper-zinc alloy electroplating bath |
JP2009149978A (en) * | 2007-11-26 | 2009-07-09 | Bridgestone Corp | Copper-zinc alloy electroplating bath and plating method using the same |
JP5274817B2 (en) * | 2007-11-26 | 2013-08-28 | 株式会社ブリヂストン | Copper-zinc alloy electroplating bath and plating method using the same |
JP5686961B2 (en) * | 2008-07-30 | 2015-03-18 | 株式会社ブリヂストン | Copper-zinc alloy electroplating bath and steel cord wire for plating steel cord wire |
JP5299994B2 (en) * | 2008-07-30 | 2013-09-25 | 株式会社ブリヂストン | Copper-zinc alloy electroplating bath and steel cord wire with copper-zinc alloy plating |
JP5645422B2 (en) * | 2010-02-23 | 2014-12-24 | 地方独立行政法人 大阪市立工業研究所 | Copper-zinc alloy electroplating solution |
JP5687051B2 (en) * | 2010-12-27 | 2015-03-18 | 株式会社ブリヂストン | Copper-zinc alloy plating method and copper-zinc alloy plating bath used therefor |
CN103866356B (en) * | 2012-12-11 | 2016-08-10 | 中国科学院过程工程研究所 | The method of non-cyanide imitating gold electroplating Cu-Zn bianry alloy |
-
1987
- 1987-02-17 JP JP3415987A patent/JPS63203790A/en active Granted
Cited By (3)
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WO2009139384A1 (en) | 2008-05-12 | 2009-11-19 | 株式会社ブリヂストン | Copper‑zinc alloy electroplating bath and plating method using same |
WO2010101212A1 (en) | 2009-03-04 | 2010-09-10 | 株式会社ブリヂストン | Copper-zinc alloy electroplating bath and method of plating using same |
JP2017517649A (en) * | 2014-06-12 | 2017-06-29 | コンパニー ゼネラール デ エタブリッスマン ミシュラン | In-situ rubberized cable with rubberizing composition containing corrosion inhibitor |
Also Published As
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---|---|
JPS63203790A (en) | 1988-08-23 |
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