JPH0320013A - Resist coating device - Google Patents

Abstract

PURPOSE:To prevent occurrences of inferior working when coating is performed by providing mechanical structure that is similar to an electric dust collector at a chamber part. CONSTITUTION:A chamber 1 is provided in such a way that a resist 4 is produced into a fibriform shape and the chamber is charged so as to have its electrical charge which is reverse to that of the above resist. Then, a wafer or a photo mask 3 is set on a spin head 2 which is installed in the chamber 1. Its mechanism makes the resist 4 drop and then, the resist is shaked off. The resist 4 which is produced subsequently into the fibriform shape is attracted to the periphery of the chamber by discharging the air. Further, an electric current is turned on to an electrode that is mounted to the chamber 1 and it always allows the chamber to be charged. As the resist 4, in such a case, is electrified with static electricity, it adheres only to the chamber 1 and does not adhere again to the spin head 2 as well as the coated wafer and photomask 3. Occurrences of inferior working which happens on the occasion of coating are thus lessened.

Description

[Detailed description of the invention] Industrial applications The present invention relates to a resist coating device.

2. Description of the Related Art A champer of a conventional resist coating apparatus will be described below. FIG. 2 shows a part of a conventional coating device. 1 is a chamber, 2 is a spin head, a is a wafer, a photomask, 4 is a fibrous resist generated during coating,
6 is an exhaust port.

The operation will be explained below. A wafer or a photomask is set on a spin head installed in a dye bar, and resist is applied by dropping it and shaking it. When applying, exhaust air through the exhaust port.

Problems to be Solved by the Invention However, in the above conventional structure, after dropping the resist,
During shaking b, the resist flies in the chamber where it becomes fibrous. Because this resist is charged with static electricity, it adheres to the spin head in addition to the inner surface of the chamber, and adheres to the wafer and photomask after coating, resulting in locally thick resist film and defective coating. .

The present invention solves the above-mentioned conventional problems, and aims to reduce defects during coating by causing the generated fibrous resist to adhere only to the chamber.

Means for Solving the Problems In order to achieve this object, the resist coating apparatus of the present invention has a champer that is charged oppositely to the generated fibrous resist.

Function: With this structure, the generated fibrous resist is attracted to the chamber side by the exhaust gas, and can be attracted only to the chamber by the electric action.

EXAMPLES Hereinafter, examples of the present invention will be described with reference to the drawings.

FIG. 1 shows a schematic diagram of a portion of a chamber of a resist coating apparatus according to an embodiment of the present invention. 11 is an electrode, 12 is a power supply,
1 is a chamber, 2 is a spin head, 3 is a wafer, 7 is a photomask, 4 is a fibrous resist, and 6 is an exhaust port.

The operation of the resist coating apparatus constructed as described above will be described below. A wafer or a photomask is set on a spin head placed in a chamber, a resist is dropped, and the resist is shaken. The fibrous resist generated at this time is sucked into the surrounding area by the exhaust gas. If the electrode attached to the chambered chamber is energized and the chamber is constantly charged, the resist will stick only to the chamber because it is charged with static electricity, and will re-attach to the spin head, coated wafer, or photomask. There will be nothing left to do.

Effects of the Invention As described above, the present invention can maintain the spin head in a clean state at all times by providing a part of the chamber with a structure similar to an electrostatic precipitator. Furthermore, since re-adhesion of resist fibers can be prevented, defects during coating can be prevented, and yield can be improved.

[Brief explanation of drawings]

FIG. 1 is a schematic diagram of a part of a chamber of a resist coating apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic diagram of a part of a chamber of a conventional coating apparatus. 11... Electrode, 12... Power supply, 1...
... Champa, 2 ... Spin head, 3.
...Wafer or photomask, 4...
・Resist generated during coating, 6...exhaust port.

Claims (1)

[Claims] A resist coating device that charges a chamber surrounding the spin head.