JPH031959U - - Google Patents
Info
- Publication number
- JPH031959U JPH031959U JP6153989U JP6153989U JPH031959U JP H031959 U JPH031959 U JP H031959U JP 6153989 U JP6153989 U JP 6153989U JP 6153989 U JP6153989 U JP 6153989U JP H031959 U JPH031959 U JP H031959U
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- source
- deposition source
- evaporation
- window hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6153989U JPH031959U (cs) | 1989-05-26 | 1989-05-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6153989U JPH031959U (cs) | 1989-05-26 | 1989-05-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH031959U true JPH031959U (cs) | 1991-01-10 |
Family
ID=31589873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6153989U Pending JPH031959U (cs) | 1989-05-26 | 1989-05-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH031959U (cs) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012184453A (ja) * | 2011-03-03 | 2012-09-27 | Seiko Epson Corp | 蒸着装置 |
-
1989
- 1989-05-26 JP JP6153989U patent/JPH031959U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012184453A (ja) * | 2011-03-03 | 2012-09-27 | Seiko Epson Corp | 蒸着装置 |
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