JPH03191355A - Method of development processing for photosensitive planographic plate - Google Patents
Method of development processing for photosensitive planographic plateInfo
- Publication number
- JPH03191355A JPH03191355A JP33226789A JP33226789A JPH03191355A JP H03191355 A JPH03191355 A JP H03191355A JP 33226789 A JP33226789 A JP 33226789A JP 33226789 A JP33226789 A JP 33226789A JP H03191355 A JPH03191355 A JP H03191355A
- Authority
- JP
- Japan
- Prior art keywords
- developer
- lithium
- plate
- acid
- printing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 69
- 238000011161 development Methods 0.000 title claims description 34
- 238000012545 processing Methods 0.000 title claims description 11
- 238000007639 printing Methods 0.000 claims abstract description 35
- 229910003002 lithium salt Inorganic materials 0.000 claims abstract description 13
- 159000000002 lithium salts Chemical class 0.000 claims abstract description 13
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 4
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 3
- -1 organic acid salts Chemical class 0.000 abstract description 54
- 150000003839 salts Chemical class 0.000 abstract description 21
- 229910052782 aluminium Inorganic materials 0.000 abstract description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 13
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052744 lithium Inorganic materials 0.000 abstract description 8
- 239000010802 sludge Substances 0.000 abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract description 4
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 abstract 1
- 229940049964 oleate Drugs 0.000 abstract 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000002253 acid Substances 0.000 description 17
- 230000008569 process Effects 0.000 description 17
- 239000000243 solution Substances 0.000 description 15
- 239000002736 nonionic surfactant Substances 0.000 description 14
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 8
- 235000014113 dietary fatty acids Nutrition 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 239000000194 fatty acid Substances 0.000 description 8
- 229930195729 fatty acid Natural products 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229940031993 lithium benzoate Drugs 0.000 description 8
- LDJNSLOKTFFLSL-UHFFFAOYSA-M lithium;benzoate Chemical compound [Li+].[O-]C(=O)C1=CC=CC=C1 LDJNSLOKTFFLSL-UHFFFAOYSA-M 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 239000003093 cationic surfactant Substances 0.000 description 6
- 150000004665 fatty acids Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910052913 potassium silicate Inorganic materials 0.000 description 6
- 235000019353 potassium silicate Nutrition 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- 239000005711 Benzoic acid Substances 0.000 description 5
- 239000004111 Potassium silicate Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 5
- 235000010233 benzoic acid Nutrition 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 238000000586 desensitisation Methods 0.000 description 4
- 238000002845 discoloration Methods 0.000 description 4
- 238000000866 electrolytic etching Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000003672 processing method Methods 0.000 description 4
- 230000001737 promoting effect Effects 0.000 description 4
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 159000000000 sodium salts Chemical class 0.000 description 4
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical class OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000008049 diazo compounds Chemical class 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- GLDQAMYCGOIJDV-UHFFFAOYSA-N 2,3-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1O GLDQAMYCGOIJDV-UHFFFAOYSA-N 0.000 description 2
- UIAFKZKHHVMJGS-UHFFFAOYSA-N 2,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1O UIAFKZKHHVMJGS-UHFFFAOYSA-N 0.000 description 2
- WXTMDXOMEHJXQO-UHFFFAOYSA-N 2,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC=C1O WXTMDXOMEHJXQO-UHFFFAOYSA-N 0.000 description 2
- UYEMGAFJOZZIFP-UHFFFAOYSA-N 3,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC(O)=C1 UYEMGAFJOZZIFP-UHFFFAOYSA-N 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 2
- 229960004050 aminobenzoic acid Drugs 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000306 component Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- YNQRWVCLAIUHHI-UHFFFAOYSA-L dilithium;oxalate Chemical compound [Li+].[Li+].[O-]C(=O)C([O-])=O YNQRWVCLAIUHHI-UHFFFAOYSA-L 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- CDFDJGUTYJLKSQ-UHFFFAOYSA-M lithium;naphthalene-1-carboxylate Chemical compound [Li+].C1=CC=C2C(C(=O)[O-])=CC=CC2=C1 CDFDJGUTYJLKSQ-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 150000008054 sulfonate salts Chemical class 0.000 description 2
- 239000012224 working solution Substances 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- YUCTUWYCFFUCOR-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC YUCTUWYCFFUCOR-UHFFFAOYSA-N 0.000 description 1
- CUOSYYRDANYHTL-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC CUOSYYRDANYHTL-UHFFFAOYSA-N 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- BFXKJHOJSIMHSJ-UHFFFAOYSA-N 1-(hexadecoxymethyl)pyridin-1-ium Chemical class CCCCCCCCCCCCCCCCOC[N+]1=CC=CC=C1 BFXKJHOJSIMHSJ-UHFFFAOYSA-N 0.000 description 1
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- SJJCQDRGABAVBB-UHFFFAOYSA-N 1-hydroxy-2-naphthoic acid Chemical compound C1=CC=CC2=C(O)C(C(=O)O)=CC=C21 SJJCQDRGABAVBB-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- XDESGXRLUIHEJT-UHFFFAOYSA-N 2,3,4-tribenzylphenol Chemical compound C=1C=CC=CC=1CC1=C(CC=2C=CC=CC=2)C(O)=CC=C1CC1=CC=CC=C1 XDESGXRLUIHEJT-UHFFFAOYSA-N 0.000 description 1
- 229940082044 2,3-dihydroxybenzoic acid Drugs 0.000 description 1
- IWSZDQRGNFLMJS-UHFFFAOYSA-N 2-(dibutylamino)ethanol Chemical compound CCCCN(CCO)CCCC IWSZDQRGNFLMJS-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- UPHOPMSGKZNELG-UHFFFAOYSA-N 2-hydroxynaphthalene-1-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=C(O)C=CC2=C1 UPHOPMSGKZNELG-UHFFFAOYSA-N 0.000 description 1
- LMWMTSCFTPQVCJ-UHFFFAOYSA-N 2-methylphenol;phenol Chemical compound OC1=CC=CC=C1.CC1=CC=CC=C1O LMWMTSCFTPQVCJ-UHFFFAOYSA-N 0.000 description 1
- UOBYKYZJUGYBDK-UHFFFAOYSA-N 2-naphthoic acid Chemical compound C1=CC=CC2=CC(C(=O)O)=CC=C21 UOBYKYZJUGYBDK-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- LBBOQIHGWMYDPM-UHFFFAOYSA-N 2-tert-butylphenol;formaldehyde Chemical compound O=C.CC(C)(C)C1=CC=CC=C1O LBBOQIHGWMYDPM-UHFFFAOYSA-N 0.000 description 1
- ALKYHXVLJMQRLQ-UHFFFAOYSA-N 3-Hydroxy-2-naphthoate Chemical compound C1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 ALKYHXVLJMQRLQ-UHFFFAOYSA-N 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- XRHGYUZYPHTUJZ-UHFFFAOYSA-N 4-chlorobenzoic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1 XRHGYUZYPHTUJZ-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- XZIIFPSPUDAGJM-UHFFFAOYSA-N 6-chloro-2-n,2-n-diethylpyrimidine-2,4-diamine Chemical compound CCN(CC)C1=NC(N)=CC(Cl)=N1 XZIIFPSPUDAGJM-UHFFFAOYSA-N 0.000 description 1
- ZRDSGWXWQNSQAN-UHFFFAOYSA-N 6-diazo-n-phenylcyclohexa-2,4-dien-1-amine Chemical compound [N-]=[N+]=C1C=CC=CC1NC1=CC=CC=C1 ZRDSGWXWQNSQAN-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical class N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- 229940123208 Biguanide Drugs 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- ISBWNEKJSSLXOD-UHFFFAOYSA-N Butyl levulinate Chemical compound CCCCOC(=O)CCC(C)=O ISBWNEKJSSLXOD-UHFFFAOYSA-N 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- 206010013496 Disturbance in attention Diseases 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- DCXXMTOCNZCJGO-UHFFFAOYSA-N Glycerol trioctadecanoate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC DCXXMTOCNZCJGO-UHFFFAOYSA-N 0.000 description 1
- 239000004166 Lanolin Substances 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000005643 Pelargonic acid Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920001213 Polysorbate 20 Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical group [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- ZZXDRXVIRVJQBT-UHFFFAOYSA-M Xylenesulfonate Chemical compound CC1=CC=CC(S([O-])(=O)=O)=C1C ZZXDRXVIRVJQBT-UHFFFAOYSA-M 0.000 description 1
- WFBNDFINWKDJCJ-UHFFFAOYSA-M [Li+].NC1=CC=CC=C1S([O-])(=O)=O Chemical compound [Li+].NC1=CC=CC=C1S([O-])(=O)=O WFBNDFINWKDJCJ-UHFFFAOYSA-M 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- XFOZBWSTIQRFQW-UHFFFAOYSA-M benzyl-dimethyl-prop-2-enylazanium;chloride Chemical compound [Cl-].C=CC[N+](C)(C)CC1=CC=CC=C1 XFOZBWSTIQRFQW-UHFFFAOYSA-M 0.000 description 1
- 229940114055 beta-resorcylic acid Drugs 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- HJZGNWSIJASHMX-UHFFFAOYSA-N butyl acetate;ethane-1,2-diol Chemical compound OCCO.CCCCOC(C)=O HJZGNWSIJASHMX-UHFFFAOYSA-N 0.000 description 1
- 229940005460 butyl levulinate Drugs 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 229960000541 cetyl alcohol Drugs 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001896 cresols Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical group [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- AXFZAZQUMXZWJV-UHFFFAOYSA-N diazanium;phosphono phosphate Chemical group [NH4+].[NH4+].OP(O)(=O)OP([O-])([O-])=O AXFZAZQUMXZWJV-UHFFFAOYSA-N 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 229940061607 dibasic sodium phosphate Drugs 0.000 description 1
- PMUKAEUGVCXPDF-UAIGNFCESA-L dilithium;(z)-but-2-enedioate Chemical compound [Li+].[Li+].[O-]C(=O)\C=C/C([O-])=O PMUKAEUGVCXPDF-UAIGNFCESA-L 0.000 description 1
- JHFZWTMEVGPUTE-UHFFFAOYSA-L dilithium;2-hydroxybutanedioate Chemical compound [Li+].[Li+].[O-]C(=O)C(O)CC([O-])=O JHFZWTMEVGPUTE-UHFFFAOYSA-L 0.000 description 1
- IYTDPMYQQWZOSO-UHFFFAOYSA-L dilithium;benzene-1,2-disulfonate Chemical compound [Li+].[Li+].[O-]S(=O)(=O)C1=CC=CC=C1S([O-])(=O)=O IYTDPMYQQWZOSO-UHFFFAOYSA-L 0.000 description 1
- VNSVQJIXVXZDJF-UHFFFAOYSA-L dilithium;phthalate Chemical compound [Li+].[Li+].[O-]C(=O)C1=CC=CC=C1C([O-])=O VNSVQJIXVXZDJF-UHFFFAOYSA-L 0.000 description 1
- QTTDHHKBHTUYCK-UHFFFAOYSA-L dilithium;propanedioate Chemical compound [Li+].[Li+].[O-]C(=O)CC([O-])=O QTTDHHKBHTUYCK-UHFFFAOYSA-L 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical class COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- WTPRWPLPFYNFMC-UHFFFAOYSA-N dimethyl-[[4-(6-methylheptyl)phenyl]methyl]-[2-(2-phenoxyethoxy)ethyl]azanium Chemical class C1=CC(CCCCCC(C)C)=CC=C1C[N+](C)(C)CCOCCOC1=CC=CC=C1 WTPRWPLPFYNFMC-UHFFFAOYSA-N 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 239000006196 drop Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- MLTWWHUPECYSBZ-UHFFFAOYSA-N ethene-1,1,2-triol Chemical group OC=C(O)O MLTWWHUPECYSBZ-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- YQEMORVAKMFKLG-UHFFFAOYSA-N glycerine monostearate Natural products CCCCCCCCCCCCCCCCCC(=O)OC(CO)CO YQEMORVAKMFKLG-UHFFFAOYSA-N 0.000 description 1
- SVUQHVRAGMNPLW-UHFFFAOYSA-N glycerol monostearate Natural products CCCCCCCCCCCCCCCCC(=O)OCC(O)CO SVUQHVRAGMNPLW-UHFFFAOYSA-N 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 235000019388 lanolin Nutrition 0.000 description 1
- 229940039717 lanolin Drugs 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 229940071264 lithium citrate Drugs 0.000 description 1
- WJSIUCDMWSDDCE-UHFFFAOYSA-K lithium citrate (anhydrous) Chemical compound [Li+].[Li+].[Li+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WJSIUCDMWSDDCE-UHFFFAOYSA-K 0.000 description 1
- HGPXWXLYXNVULB-UHFFFAOYSA-M lithium stearate Chemical compound [Li+].CCCCCCCCCCCCCCCCCC([O-])=O HGPXWXLYXNVULB-UHFFFAOYSA-M 0.000 description 1
- WAHQBNXSPALNEA-UHFFFAOYSA-L lithium succinate Chemical compound [Li+].[Li+].[O-]C(=O)CCC([O-])=O WAHQBNXSPALNEA-UHFFFAOYSA-L 0.000 description 1
- 229960004254 lithium succinate Drugs 0.000 description 1
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 1
- ZPPPLBXXTCVBNC-ZVGUSBNCSA-M lithium;(2r,3r)-2,3,4-trihydroxy-4-oxobutanoate Chemical compound [Li+].OC(=O)[C@H](O)[C@@H](O)C([O-])=O ZPPPLBXXTCVBNC-ZVGUSBNCSA-M 0.000 description 1
- AVOVSJYQRZMDQJ-KVVVOXFISA-M lithium;(z)-octadec-9-enoate Chemical compound [Li+].CCCCCCCC\C=C/CCCCCCCC([O-])=O AVOVSJYQRZMDQJ-KVVVOXFISA-M 0.000 description 1
- FGLLQDSAOUJRST-UHFFFAOYSA-M lithium;2-acetyloxybenzoate Chemical compound [Li+].CC(=O)OC1=CC=CC=C1C([O-])=O FGLLQDSAOUJRST-UHFFFAOYSA-M 0.000 description 1
- PREAJQDJMZQQOQ-UHFFFAOYSA-M lithium;2-chlorobenzoate Chemical compound [Li+].[O-]C(=O)C1=CC=CC=C1Cl PREAJQDJMZQQOQ-UHFFFAOYSA-M 0.000 description 1
- PSBOOKLOXQFNPZ-UHFFFAOYSA-M lithium;2-hydroxybenzoate Chemical compound [Li+].OC1=CC=CC=C1C([O-])=O PSBOOKLOXQFNPZ-UHFFFAOYSA-M 0.000 description 1
- ZDQOIOKFXTVUCZ-UHFFFAOYSA-M lithium;2-nitrobenzoate Chemical compound [Li+].[O-]C(=O)C1=CC=CC=C1[N+]([O-])=O ZDQOIOKFXTVUCZ-UHFFFAOYSA-M 0.000 description 1
- ZSICDRPAYOOLQB-UHFFFAOYSA-M lithium;2-phenylacetate Chemical compound [Li+].[O-]C(=O)CC1=CC=CC=C1 ZSICDRPAYOOLQB-UHFFFAOYSA-M 0.000 description 1
- MNKMDLVKGZBOEW-UHFFFAOYSA-M lithium;3,4,5-trihydroxybenzoate Chemical compound [Li+].OC1=CC(C([O-])=O)=CC(O)=C1O MNKMDLVKGZBOEW-UHFFFAOYSA-M 0.000 description 1
- ZBAFARDUZOEUPJ-UHFFFAOYSA-M lithium;4-aminobenzenesulfonate Chemical compound [Li+].NC1=CC=C(S([O-])(=O)=O)C=C1 ZBAFARDUZOEUPJ-UHFFFAOYSA-M 0.000 description 1
- KWMSBWLIJHPSTD-UHFFFAOYSA-M lithium;4-aminobenzoate Chemical compound [Li+].NC1=CC=C(C([O-])=O)C=C1 KWMSBWLIJHPSTD-UHFFFAOYSA-M 0.000 description 1
- VIDXETATLKBUBY-UHFFFAOYSA-M lithium;benzenesulfonate Chemical compound [Li+].[O-]S(=O)(=O)C1=CC=CC=C1 VIDXETATLKBUBY-UHFFFAOYSA-M 0.000 description 1
- DNXKVOCRSQBZHO-UHFFFAOYSA-M lithium;dodecane-1-sulfonate Chemical compound [Li+].CCCCCCCCCCCCS([O-])(=O)=O DNXKVOCRSQBZHO-UHFFFAOYSA-M 0.000 description 1
- LAJNCCPAYZUOGR-UHFFFAOYSA-M lithium;naphthalene-1-sulfonate Chemical compound [Li+].C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 LAJNCCPAYZUOGR-UHFFFAOYSA-M 0.000 description 1
- GBPZIFLFRULNBM-UHFFFAOYSA-N lithium;oxalic acid Chemical compound [Li].OC(=O)C(O)=O GBPZIFLFRULNBM-UHFFFAOYSA-N 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940044652 phenolsulfonate Drugs 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- DJEHXEMURTVAOE-UHFFFAOYSA-M potassium bisulfite Chemical compound [K+].OS([O-])=O DJEHXEMURTVAOE-UHFFFAOYSA-M 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000010259 potassium hydrogen sulphite Nutrition 0.000 description 1
- 229940093932 potassium hydroxide Drugs 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229940047670 sodium acrylate Drugs 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Inorganic materials [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229940083608 sodium hydroxide Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AZXQLMRILCCVDW-UHFFFAOYSA-M sodium;5-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(C(C)C)=CC=CC2=C1S([O-])(=O)=O AZXQLMRILCCVDW-UHFFFAOYSA-M 0.000 description 1
- 229940035044 sorbitan monolaurate Drugs 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229940071104 xylenesulfonate Drugs 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、感光性平版印刷版の現像処理方法に関し1詳
しくはアルミニウム支持体が現像液に侵されるのを防止
し、現像性に優れ、スラッジの発生を防止でき、かつ現
像液の濃縮性に優れる感光性平版印刷版(以下、必要に
応じて「28版」という、)の現像処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for developing a photosensitive lithographic printing plate. Specifically, the present invention relates to a method for developing a photosensitive lithographic printing plate. The present invention relates to a method for developing a photosensitive lithographic printing plate (hereinafter referred to as "28 plate" as necessary) that can prevent the generation of sludge and has excellent developer concentration properties.
(従来の技術)
従来、現像液の管理が不要でかつ高品質の平版印刷版を
安定して得られる28版の処理方法として、特開昭61
−243455号や同62−42159号に示されるよ
うに、実質的に未使用の現像液を、処理される28版の
版面に供給して現像処理を行う方法が知られている。(Prior Art) Conventionally, Japanese Patent Application Laid-Open No. 61 (1983) was developed as a 28-plate processing method that does not require developer management and can stably obtain high-quality lithographic printing plates.
As shown in Japanese Patent No. 243455 and No. 62-42159, a method is known in which a substantially unused developer is supplied to the surface of the 28 plate to be processed for development.
(発明が解決しようとする課題)
従来の処理方法では、実質的に未使用の現像液を用いる
関係上、コストアップを防ぐために現像液の使用量を少
なくする、すなわち、少量の現像液を28版の版面に供
給して現像する必要がある。このように少量の現像液を
用いて迅速処理を行うためには、現像液のpHを高くす
る必要がある。(Problem to be Solved by the Invention) In the conventional processing method, since substantially unused developer is used, the amount of developer used is reduced in order to prevent cost increase. In other words, a small amount of developer is It is necessary to supply it to the surface of the plate and develop it. In order to perform rapid processing using such a small amount of developer, it is necessary to increase the pH of the developer.
しかしながら、高pHの現像液を用いると、処理される
28版の支持体であるアルミニウム板の裏面が現像液に
侵されて白い粉をふいた様になり(これを支持体裏面の
ヤラレという)、生じた白い粉が製版時に他の版に付着
したり、粉塵の発生により作業環埴を害する等の問題が
ある。However, when a high pH developer is used, the back side of the aluminum plate, which is the support for the 28th plate being processed, is eroded by the developer and looks like a white powder (this is called discoloration on the back side of the support). There are problems such as the generated white powder adhering to other plates during plate making and the generation of dust damaging the work environment.
また現像液中に溶出したアルミニウム成分が現像液に含
まれるシリカ成分やカリウム成分と結びついてスラ・ン
ジを生じるという問題があった。Further, there is a problem in that the aluminum component eluted into the developer combines with the silica component and potassium component contained in the developer, resulting in sludge.
このような問題を解決する手段として、現像液中のアル
カリ金属ケイ融塩の含有量を高めることが知られている
。As a means to solve such problems, it is known to increase the content of alkali metal silicate in the developer.
しかし、現像性が悪くなったり、現像液の濃縮性が悪く
なるという問題かある。またSjO,等が析出して自動
現像機の現像液供給ノズル等の目詰まりが起こり易くな
るという問題もある。更に現像液に界面活性剤などの添
加剤を添加する際、その溶解を妨げるという問題もある
。However, there are problems such as poor developability and poor concentration of the developer. There is also the problem that SjO, etc. are precipitated and clogging of the developer supply nozzle of an automatic processor is apt to occur. Furthermore, when additives such as surfactants are added to the developer, there is also the problem that their dissolution is hindered.
そこで本発明の目的は、アルミニウム支持体が現像液に
侵されるのを防止し、現像性に優れ、スラッジの発生を
防止でき、かつ現像液の濃縮性に優れる感光性平版印刷
版の現像処理方法を提供することにある。Therefore, an object of the present invention is to develop a photosensitive lithographic printing plate that prevents an aluminum support from being attacked by a developer, has excellent developability, prevents the generation of sludge, and has excellent developer concentration. Our goal is to provide the following.
本発明者は、上記目的を達成すべく鋭意検討の結果、本
発明に至った。As a result of intensive studies to achieve the above object, the inventors have arrived at the present invention.
即ち、本発明に係る感光性平版印刷版の現像処理方法は
、支持体上に感光層を有する感光性平版印刷版を画像露
光後、水を主たる溶媒とする実質的に未使用のアルカリ
性現像液を、処理される感光性平版印刷版1枚毎に、そ
の版面に供給し現像する感光性平版印刷版の現像処理方
法において。That is, in the method for developing a photosensitive lithographic printing plate according to the present invention, after imagewise exposing a photosensitive lithographic printing plate having a photosensitive layer on a support, a substantially unused alkaline developer containing water as a main solvent is used. In a method for developing a photosensitive lithographic printing plate, which comprises supplying and developing the lithographic printing plate to the surface of each photosensitive lithographic printing plate to be processed.
該現像液が、(i) 0.01〜5′rfL量%のリ
チウム塩を含有し、(ii) pl+ 12〜13.5
であり、かつ(iii) 0.05≦rsio*]/
[M ] < 0.50であり(但しMはLi以外のア
ルカリ金属である。)、現像液供給量が感光性平版印刷
版1m”当り70〜700m1であることを特徴とする
。The developer solution contains (i) a lithium salt in an amount of 0.01 to 5'rfL, and (ii) a pl+ of 12 to 13.5.
and (iii) 0.05≦rsio*]/
[M] < 0.50 (provided that M is an alkali metal other than Li), and the amount of developer supplied is 70 to 700 ml per 1 m'' of the photosensitive planographic printing plate.
以下1本発明について詳説する。The present invention will be explained in detail below.
本発明に用いられる現像液は、水を主たる溶媒とするア
ルカリ性の現像液であり、リチウム塩を含有する。The developer used in the present invention is an alkaline developer that uses water as a main solvent and contains a lithium salt.
本発明の現像液に用いられるリチウム塩としては、塩化
リチウム、臭化リチウム、硝酸リチウム、水酸化リチウ
ム、炭酸リチウム、硫酸リチウムなどの無機リチウム塩
、ステアリン酸リチウム、オレイン酸リチウム、ラウリ
ルスルホン酸リチウム、シュウ酸リチウム、クエン酸リ
チウム、マレイン酸リチウム、リンゴ酸リチウム、マロ
ン酸リチウム、コハク酸リチウム、酒石酸リチウムなど
の有機脂肪酸リチウム、安息香酸リチウム。Examples of lithium salts used in the developer of the present invention include inorganic lithium salts such as lithium chloride, lithium bromide, lithium nitrate, lithium hydroxide, lithium carbonate, and lithium sulfate, lithium stearate, lithium oleate, and lithium lauryl sulfonate. , lithium organic fatty acids such as lithium oxalate, lithium citrate, lithium maleate, lithium malate, lithium malonate, lithium succinate, lithium tartrate, lithium benzoate.
トルイル酸リチウム、クロロ安息香酸リチウム。Lithium toluate, lithium chlorobenzoate.
ニトロ安息香酸リチウム、アミノ安息香酸リチウム、サ
リチル酸リチウム、アセチルサリチル酸リチウム、没食
子酸リチウム、フタル酸リチウム、フェニル酢酸リチウ
ム、ケイ皮酸リチウム、ナフトエ酸リチウム、ナフトエ
酸リチウム、ベンゼンスルホン酸リチウム、トルエンス
ルホン酸リチウム、キシレンスルホン酸り・チウム、フ
ェノールスルホン酸リチウム、ベンゼンジスルホン酸リ
チウム、スルファニル酸リチウム、アミノベンゼンスル
ホン酸リチウム、ナフタレンスルホン酸リチウムなどの
有機芳香族カルボン酸およびスルホン酸のリチウム塩な
どが挙げられるが、これらのうち有機芳香族カルボン酸
およびスルホン酸のリチウム塩を用いることが好ましい
、これらのリチウム塩は2種以上を併用しても良い。Lithium nitrobenzoate, lithium aminobenzoate, lithium salicylate, lithium acetylsalicylate, lithium gallate, lithium phthalate, lithium phenylacetate, lithium cinnamate, lithium naphthoate, lithium naphthoate, lithium benzenesulfonate, toluenesulfonic acid Examples include lithium salts of organic aromatic carboxylic acids and sulfonic acids such as lithium, lithium xylene sulfonate, lithium phenolsulfonate, lithium benzenedisulfonate, lithium sulfanilate, lithium aminobenzenesulfonate, and lithium naphthalenesulfonate. However, among these, it is preferable to use lithium salts of organic aromatic carboxylic acids and sulfonic acids, but two or more of these lithium salts may be used in combination.
リチウム塩の含有量は使用時の現像液の総重量に対して
、0,01〜5重量%であり、好ましくは0.05〜2
重量%である。 0.01重量%より少ないとリチウム
塩の効果が不十分であり、5重量%より多くなると沈澱
が生じやすくなり、現像液の濃縮性も悪くなる。The content of the lithium salt is 0.01 to 5% by weight, preferably 0.05 to 2% by weight, based on the total weight of the developer when used.
Weight%. When it is less than 0.01% by weight, the effect of the lithium salt is insufficient, and when it is more than 5% by weight, precipitation tends to occur and the concentration of the developer becomes poor.
本発明に用いられる現像液はアルカリ剤としてケイ酸ア
ルカリを含有する。ケイ酸アルカリとしては例えばケイ
酸カリウム、ケイ酸ナトリウム、メタケイ酸ナトリウム
、メタケイ酸カリウム、ケイ酸アンモニウム等が挙げら
れる。The developer used in the present invention contains an alkali silicate as an alkaline agent. Examples of the alkali silicate include potassium silicate, sodium silicate, sodium metasilicate, potassium metasilicate, and ammonium silicate.
ケイ酸アルカリの現像液中の含有量は酸化ケイ素(Si
Oa)濃度として使用時の現像液の総重量に対して0.
1〜5重量%が好適であり、好ましくは0.3〜2重量
%である。The content of alkali silicate in the developer is silicon oxide (Si
Oa) The concentration is 0.0% based on the total weight of the developer when used.
1 to 5% by weight is suitable, preferably 0.3 to 2% by weight.
本発明に用いられる現像液にはケイ酸カリウム等のカリ
ウム塩を用いることか現像液中に沈澱物を生じにくいと
いう点から好ましい。It is preferable to use a potassium salt such as potassium silicate in the developer used in the present invention because it is less likely to form a precipitate in the developer.
本発明に用いられる現像液にはケイ酸アルカリ以外のア
ルカリ剤を併用することができ、例えば水酸化カリウム
、水酸化ナトリウム、第三リン酸ナトリウム、第ニリン
酸ナトリウム、第三リン酸カリウム、第ニリン酸カリウ
ム、第三リン酸アンモニウム、第ニリン酸アンモニウム
、重炭酸ナトリウム、)&Mナトリウム、炭酸カリウム
、炭酸アンモニウムなどのような無機アルカリ剤、モノ
、ジ又はトリエタノールアミン及び水酸化テトラアルキ
ルのような有機アルカリ剤を併用することがてきる。The developer used in the present invention may contain alkaline agents other than alkali silicates, such as potassium hydroxide, sodium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic potassium phosphate, Inorganic alkaline agents such as potassium diphosphate, tertiary ammonium phosphate, diammonium diphosphate, sodium bicarbonate, )&M sodium, potassium carbonate, ammonium carbonate, etc., mono-, di- or triethanolamines and tetraalkyl hydroxides. An organic alkaline agent can be used in combination.
本発明に用いられる現像液のpHは12〜13.5であ
る。pllが12未満てあれば現像性か悪くなり、また
pHか13.5を越えると An支持体裏面のヤラレ、
28版の画像部が侵される、沈殿か生じる等の問題があ
る。The pH of the developer used in the present invention is 12 to 13.5. If the pll is less than 12, the developability will be poor, and if the pH exceeds 13.5, the back side of the An support will be discolored.
There are problems such as the image area of the 28th plate being eroded and precipitation occurring.
本発明に用いられる現像液の[510g1/ [M]
(MはLi以外のアルカリ金属)の値は0.[]5≦[
5jOtl/rM7 <0.50テあル、コノ値がO,
OS未満ではリチウム塩を添加してももはや支持体裏面
のヤラレを防止することはできず、O,SOを越えると
現像性が悪く、また現像液の濃縮性が悪く本発明の効果
を発揮し得ない。[510g1/[M] of the developer used in the present invention
(M is an alkali metal other than Li) has a value of 0. []5≦[
5jOtl/rM7 <0.50 Teal, Kono value is O,
If it is less than OS, even if a lithium salt is added, it is no longer possible to prevent the back surface of the support from discoloration, and if it exceeds O or SO, the developability is poor and the developer concentration is poor, making it impossible to achieve the effects of the present invention. I don't get it.
本発明に用いられる現像液には、必要に応じて界面活性
剤、有機溶媒、有機カルボン酸を含有させることができ
る。The developer used in the present invention can contain a surfactant, an organic solvent, and an organic carboxylic acid, if necessary.
界面活性剤としては、ノニオン、カチオン、アニオ、ン
、両性のいずれてもよいが、好ましくはノニオン界面活
性剤又はカチオン界面活性剤であり、より好ましくはノ
ニオン界面活性剤である。The surfactant may be nonionic, cationic, anionic, amphoteric, or amphoteric, but is preferably a nonionic surfactant or a cationic surfactant, and more preferably a nonionic surfactant.
ノニオン界面活性剤には、ポリエチレングリコール型と
多価アルコール型があるが、どちらも使用できる。現像
性能の点からはポリエチレングリコール型のノニオン界
面活性剤が好ましく、その中でもエチレンオキシ基(−
(:H2CH20−)を3以上有し、かつIILB値(
IILBはHydrophile−LipophiIe
Ba1anceの略)が5以上(より好ましくは8〜
2眠更に好ましくは15〜20)のノニオン界面活性剤
がより好ましい。Nonionic surfactants include polyethylene glycol type and polyhydric alcohol type, both of which can be used. From the viewpoint of development performance, polyethylene glycol type nonionic surfactants are preferred, and among them, ethyleneoxy group (-
(:H2CH20-) of 3 or more, and IILB value (
IILB is Hydrophile-Lipophile
Abbreviation of Ba1ance) is 5 or more (more preferably 8 to 8)
A nonionic surfactant of 2, more preferably 15 to 20) is more preferred.
また、ノニオン界面活性剤のうち、エチレンオキシ基と
プロピレンオキシ基の両者を有するものか特に好ましく
、そのなかでHLB値が8以上のものがより好ましい。Furthermore, among nonionic surfactants, those having both an ethyleneoxy group and a propyleneoxy group are particularly preferred, and among these, those having an HLB value of 8 or more are more preferred.
ノニオン界面活性剤の好ましい例として下記−綴代(1
)〜〔8〕で表される化合物が挙げられる。Preferred examples of nonionic surfactants include the following - Tsuzuriyo (1)
) to [8].
(1) If−Q−(C112(:l120)nil
(2)
(6) +10(C2](,0)a−((:21(,
0)b−(C21(,0)cH(8) +1O−(C
H2CI+20)nH(1)〜〔8〕式において、Rは
水素原子又は1価の有機基を表す、該有機基としては、
例えば直鎖もしくは分岐の炭素数1〜3oの、置換基(
例えばアリール基(フェニル等))を有していてもより
アルキル基、アルキル部分が上記アルキル基であるアル
キルカルボニル基、置換基(例えばヒドロキシル基、上
記のようなアルキル基等)を有していてもよいフェニル
基等が挙げられる。a。(1) If-Q-(C112(:l120) nil
(2) (6) +10(C2](,0)a-((:21(,
0) b-(C21(,0)cH(8) +1O-(C
H2CI+20)nH (1) ~ In formulas [8], R represents a hydrogen atom or a monovalent organic group, and the organic group is:
For example, a linear or branched substituent having 1 to 3 carbon atoms (
For example, an alkyl group that has an aryl group (such as phenyl), an alkyl carbonyl group whose alkyl moiety is the above-mentioned alkyl group, or a substituent (such as a hydroxyl group or the above-mentioned alkyl group) Examples include a phenyl group and the like. a.
b、c、m、n、x及びyは各々1〜40の整数を表す
。b, c, m, n, x and y each represent an integer of 1 to 40.
次に、ノニオン界面活性剤の具体例を示す。Next, specific examples of nonionic surfactants will be shown.
(具体例)
ポリエチレングリコール、ポリオキシエチレンラウリル
エーテル、ポリオキシエチレンノニルエーテル、ポリオ
キシエチレンセチルエーテル、ポリオキシエチレンステ
アリルエーテル、ポリオキシエチレンオレイルエーテル
、ポリオキシエチレンベヘニルエーテル、ポリオキシエ
チレンポリオキシプロピレンセチルエーテル、ポリオキ
シエチレンポリオキシプロピレンベヘニルエーテル、ポ
リオキシエチレンノニルフェニルエーテル、ポリオキシ
エチレンオクチルフェニルエーテル、ポリオキシエチレ
ンステアリルアミン、ポリオキシエチレンオレイルアミ
ン、ポリオキシエチレンステアリン酸アミド、ポリオキ
シエチレンオレイン醜アミド、ポリオキシエチレンヒマ
シ油、ポリオキシエチレンアビエチルエーテル、ポリオ
キシエチレンラノリンエーテル、ポリオキシエチレンモ
ノラウレート、ポリオキシエチレンモノステアレート、
ポリオキシエチレングリセリルモノオレート、ポリオキ
シエチレングリセリルモノステアレート、ポリオキシエ
チレンプロピレングリコールモノステアレート、オキシ
エチレンオキシプロピレンブロックボリマー、ジスチレ
ン化フェノールポリエチレンオキシド付加物、トリベン
ジルフェノールポリエチレンオキシド付加物、オクチル
フェノールポリオキシエチレンボリオキシフ゛ロピレン
付加物、グリセロールモノステアレート、ソルビタンモ
ノラウレート、ポリオキシエチレンソルビタンモノラウ
レート等。(Specific examples) Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether, polyoxyethylene polyoxypropylene cetyl Ether, polyoxyethylene polyoxypropylene behenyl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene stearamide, polyoxyethylene olein amide, Polyoxyethylene castor oil, polyoxyethylene abiethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxyethylene monostearate,
Polyoxyethylene glyceryl monooleate, polyoxyethylene glyceryl monostearate, polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct, octylphenol poly Oxyethylene polyoxypropylene adduct, glycerol monostearate, sorbitan monolaurate, polyoxyethylene sorbitan monolaurate, etc.
ノニオン界面活性剤の重量平均分子量は30(1〜10
000の範囲が好ましく、 500〜5000の範囲が
特に好ましい。The weight average molecular weight of the nonionic surfactant is 30 (1 to 10
A range of 000 is preferred, and a range of 500 to 5000 is particularly preferred.
ノニオン型界面活性剤は1種を単独で含有させても、又
2種以上を併用してもよい。One type of nonionic surfactant may be contained alone, or two or more types may be used in combination.
カチオン界面活性剤はアミン型と第四アンモニウム塩型
に大別されるが、これらの何れをも用いることができる
。Cationic surfactants are broadly classified into amine type and quaternary ammonium salt type, and any of these can be used.
アミン型の例としては、ポリオキシエチレンアルキルア
ミン、N−アルキルプロピレンアミン、N−アルキルポ
リエチレンポリアミン、N−アルキルポリエチレンポリ
アミンジメチル硫酸塩、アルキルビグアニド、長鎖アミ
ンオキシド、アルキルイミダシリン、1−ヒドロキシエ
チル−2−アルキルイミダシリン、1−アセチルアミノ
エチル−2−アルキルイミダシリン、2−アルキル−4
−メチル−4−ヒドロキシメチルオキサゾリン等がある
。Examples of amine types include polyoxyethylenealkylamines, N-alkylpropyleneamines, N-alkylpolyethylenepolyamines, N-alkylpolyethylenepolyamine dimethyl sulfates, alkyl biguanides, long chain amine oxides, alkylimidacillines, 1-hydroxy Ethyl-2-alkylimidacyline, 1-acetylaminoethyl-2-alkylimidacyline, 2-alkyl-4
-Methyl-4-hydroxymethyloxazoline and the like.
また、第四アンモニウム塩型の例としては、長鎖第1ア
ミン塩、アルキルトリメチルアンモニウム塩1、ジアル
キルジメチルエチルアンモニウム塩、アルキルジメチル
アンモニウム塩、アルキルジメチルベンジルアンモニウ
ム塩、アルキルピリジニウム塩、アルキルキノリニウム
塩、アルキルイソキノリニウム塩、アルキルピリジニウ
ム硫酸塩、ステアラミドメチルピリジニウム塩、アシル
アミノエチルジエチルアミン塩、アシルアミノエチルメ
チルジエチルアンモニウム塩、アルキルアミドプロピル
ジメチルベンジルアンモニウム塩、脂肪酸ポリエチレン
ポリアミド、アシルアミノエチルピリジニウム塩、アシ
ルコラミノホルミルメチルピリジニウム塩、ステアロオ
キシメチルピリジニウム塩、脂肪酸トリエタノールアミ
ン、脂肪酸トリエタノールアミンギ酸塩、トリオキシエ
チレン脂肪酸トリエタノールアミン1、脂肪酸ジブチル
アミノエタノール、セチルオキシメチルピリジニウム塩
、p−イソオクチルフェノキシエトキシエチルジメチル
ベンジルアンモニウム塩等がある。(上記化合物の例の
中の「アルキル」とは炭素数6〜20の、直鎖または一
部置換されたアルキルを示し、具体的には、ヘキシル、
オクチル、セチル、ステアリル等の直鎖アルキルが好ま
しく用いられる。ン
これらの中では、特に水溶性の第四アンモニウム塩型の
カチオン界面活性剤か有効で、その中でも、アルキルト
リメチルアンモニウム塩、アルキルジメチルベンジルア
ンモニウム塩、エチレンオキシド付加アンモニウム塩等
が好適である。また、カチオン成分をくり返し単位とし
て有する重合体も広い意味ではカチオン界面活性剤であ
り、本発明に用いられるカチオン界面活性剤に金色され
る。特に、親油性モノマーと共重合して得られた第四ア
ンモニウム塩を含む重合体を好適に用いることができる
。Examples of quaternary ammonium salts include long-chain primary amine salts, alkyltrimethylammonium salts, dialkyldimethylethylammonium salts, alkyldimethylammonium salts, alkyldimethylbenzylammonium salts, alkylpyridinium salts, and alkylquinolinium salts. salt, alkylisoquinolinium salt, alkylpyridinium sulfate, stearamidemethylpyridinium salt, acylaminoethyldiethylamine salt, acylaminoethylmethyldiethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide, acylaminoethylpyridinium salt, acylcolaminoformylmethylpyridinium salt, stearoxymethylpyridinium salt, fatty acid triethanolamine, fatty acid triethanolamine formate, trioxyethylene fatty acid triethanolamine 1, fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p -isooctylphenoxyethoxyethyldimethylbenzylammonium salt and the like. ("Alkyl" in the above compound examples refers to straight chain or partially substituted alkyl having 6 to 20 carbon atoms, specifically hexyl,
Straight chain alkyls such as octyl, cetyl and stearyl are preferably used. Among these, water-soluble quaternary ammonium salt type cationic surfactants are particularly effective, and among these, alkyltrimethylammonium salts, alkyldimethylbenzylammonium salts, ethylene oxide-adducted ammonium salts, and the like are preferred. Further, a polymer having a cationic component as a repeating unit is also a cationic surfactant in a broad sense, and the cationic surfactant used in the present invention has a golden color. In particular, a polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic monomer can be suitably used.
該重合体の重量平均分子量は300〜5ooooの範囲
であり、特に好ましくは500〜5000の範囲である
。これらのカチオン界面活性剤は単独で使用するほが、
2種以上を併用してもよい。The weight average molecular weight of the polymer is in the range of 300 to 5000, particularly preferably in the range of 500 to 5000. These cationic surfactants are better when used alone.
Two or more types may be used in combination.
アニオン型界面活性剤としては、高級アルコール(Ca
〜C22)硫酸エステル塩類[例えば、ラウリルアルコ
ールサルフェートのナトリウム塩、オクチルアルコール
サルフェートのナトリウム塩、ラウリルアルコールサル
フェートのアンモニウム塩、r Teepol−81」
(商品名・シェル化学製)、第二ナトリウムアルキルサ
ルフェートなどコ、脂肪族アルコールリン酸エステル塩
類(例えば、セチルアルコールリン酸エステルのナトリ
ウム塩など)、アルキルアリールスルホン酸塩類(例え
ば、ドデシルベンゼンスルホン酸のナトリウム塩、イソ
プロピルナフタレンスルホン酸のナトリウム塩、シナフ
タレンジスルホン酸のナトリウム塩、メタニトロベンゼ
ンスルホン酸のナトリウム塩など)、アルキルアミドの
スルホン酸塩類(例えば、C+y11:+zCON(C
II+)Ct(2so:+Naなど)、二塩基性脂肪酸
エステルのスルホン酸塩類(例えば。As anionic surfactants, higher alcohols (Ca
~C22) Sulfuric acid ester salts [e.g., sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, rTeepol-81”
(trade name, manufactured by Shell Chemical), sodium chloride alkyl sulfate, aliphatic alcohol phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate, etc.), alkylaryl sulfonates (e.g., dodecylbenzenesulfonic acid) sodium salt of isopropylnaphthalenesulfonic acid, sodium salt of sinapthalenedisulfonic acid, sodium salt of metanitrobenzenesulfonic acid, etc.), sulfonate salts of alkylamides (e.g., C+y11:+zCON(C
II+)Ct(2so:+Na etc.), sulfonic acid salts of dibasic fatty acid esters (e.g.
ナトリウムスルホコハク酸ジオクチルエステル、ナトリ
ウムスルホコハク酸ジヘキシルエステルなど)がある、
これらの中で特にスルホン酸塩類が好適に用いられる。sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.)
Among these, sulfonate salts are particularly preferably used.
両性界面活性剤としては、例えばN−メチル−N=ペン
タデシルアミノ酢酸ナトリウムのような化合物を用いる
ことかできる。As the amphoteric surfactant, a compound such as sodium N-methyl-N=pentadecylaminoacetate can be used.
界面活性剤は、現像液に0.01〜10重量%の範囲の
濃度で含有させるのが好ましい。The surfactant is preferably contained in the developer at a concentration in the range of 0.01 to 10% by weight.
本発明に用いられる現像液が含有する有機溶媒としては
、20°Cおける水に対する溶解度か10重量%以下の
ものが好ましく、例えば酢酸エチル、酢酸プロピル、酢
酸ブチル、酢酸ベンジル、エチレングリコールモノブチ
ルアセテート、乳酸ブチル、レブリン酸ブチルのような
カルボン酸エステル:エチルブチルケトン、メチルイソ
ブチルケトン、シクロヘキサノンのようなケトン類:エ
チレングリコールモノブチルエーテル、エチレングリコ
ールペンシルエーテル、エチレングリコールモノフェニ
ルエーテル、ベンジルアルコール、メチルフェニルカル
ビノール、n−アミルアルコール、メチルアミンアルコ
ールのようなアルコール類;キシレンのようなアルキル
置換芳香族炭化水素:メチレンシクロライト、エチレン
ジクロライド、モノクロロベンゼンのようなハロゲン化
炭化水素などがある。これらの有機溶媒は一種以上を用
いてもよい。The organic solvent contained in the developer used in the present invention preferably has a solubility in water at 20°C of 10% by weight or less, such as ethyl acetate, propyl acetate, butyl acetate, benzyl acetate, ethylene glycol monobutyl acetate. Carboxylic acid esters such as butyl lactate, butyl levulinate; ketones such as ethyl butyl ketone, methyl isobutyl ketone, cyclohexanone; ethylene glycol monobutyl ether, ethylene glycol pencil ether, ethylene glycol monophenyl ether, benzyl alcohol, methyl phenyl Alcohols such as carbinol, n-amyl alcohol, and methylamine alcohol; alkyl-substituted aromatic hydrocarbons such as xylene; halogenated hydrocarbons such as methylene cyclolite, ethylene dichloride, and monochlorobenzene. One or more types of these organic solvents may be used.
有機溶剤の現像液中の含有量は0.05〜10重量%の
範囲か好ましい。The content of the organic solvent in the developer is preferably in the range of 0.05 to 10% by weight.
有機カルボン酸には、炭素原子数6〜20の脂肪族カル
ボン酸、およびベンゼン環またはナフタレン環にカルボ
キシル基が置換した芳香族カルボン酸が包含される。The organic carboxylic acids include aliphatic carboxylic acids having 6 to 20 carbon atoms and aromatic carboxylic acids in which a benzene ring or a naphthalene ring is substituted with a carboxyl group.
脂肪族カルボン酸としては、炭素数6〜20のアルカン
酸か好ましく、具体的な例としては、カフロン酸、エナ
ンチル酸、カプリル醜、ペラルゴン酸、カプリン酸、ラ
ウリン酸、ミスチリン酸、バルミチン酸、ステアリン酸
等があり、特に好ましいのは炭素数6〜12のアルカン
酸である。また炭素鎖中に二重結合を有する脂肪酸でも
、枝分れした炭素鎖のものでもよい、上記脂肪族カルボ
ン酸はナトリウムやカリウムの塩またはアンモニウム塩
として用いてもよい。The aliphatic carboxylic acid is preferably an alkanoic acid having 6 to 20 carbon atoms, and specific examples include cafuroic acid, enantylic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mystylic acid, valmitic acid, and stearin. Examples include acids, and particularly preferred are alkanoic acids having 6 to 12 carbon atoms. Further, the aliphatic carboxylic acid, which may be a fatty acid having a double bond in its carbon chain or a branched carbon chain, may be used as a sodium or potassium salt or an ammonium salt.
芳香族カルボン酸の具体的な化合物としては。Specific compounds of aromatic carboxylic acids include:
安息香酸、0−クロロ安息香酸、p−クロロ安息香酸、
0−ヒドロキシ安息香酸、p−ヒドロキシ安息香酸、
p−tart−ブチル安息香酸、0−アミノ安息香酸、
p−アミノ安息香酸、2,4−ジヒドロキシ安息香酸、
2,5−ジヒドロキシ安息香酸、2,3−ジヒドロキシ
安息香酸、3.5−ジヒドロキシ安息香酸、没食子酸、
1−ヒドロキシ−2−ナフトエ酸、3−ヒドロキシ−2
−ナフトエ酸、2−ヒドロキシ−1−ナフトエ酸、1−
ナフトエ酸、2−ナフトエ酸等がある。Benzoic acid, 0-chlorobenzoic acid, p-chlorobenzoic acid,
0-hydroxybenzoic acid, p-hydroxybenzoic acid,
p-tart-butylbenzoic acid, 0-aminobenzoic acid,
p-aminobenzoic acid, 2,4-dihydroxybenzoic acid,
2,5-dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, gallic acid,
1-hydroxy-2-naphthoic acid, 3-hydroxy-2
-naphthoic acid, 2-hydroxy-1-naphthoic acid, 1-
These include naphthoic acid and 2-naphthoic acid.
上記芳香族カルボン酸はナトリウムやカリウムの塩また
はアンモニウム塩とし・て用いてもよい。The above aromatic carboxylic acid may be used as a sodium or potassium salt or an ammonium salt.
脂肪族カルボン酸、芳香族カルボン酸の含有量は格別な
制限はないが、 0.1重量%より低いと効果が十分で
なく、また30重量%以上てはそれ以上の効果の改善が
計れないばかりが、別の添加剤を併用する詩に溶解をさ
またげることがある。従って好ましくは0−1〜10重
量%の添加量であり、より好ましくは0.5〜4重量%
である。There are no particular restrictions on the content of aliphatic carboxylic acids and aromatic carboxylic acids, but if it is less than 0.1% by weight, the effect will not be sufficient, and if it is more than 30% by weight, no further improvement in the effect can be measured. However, this may hinder dissolution when using other additives. Therefore, the amount added is preferably 0-1 to 10% by weight, more preferably 0.5 to 4% by weight.
It is.
本発明に用いられる現像液には更に亜硫酸塩を含有させ
ることができる。亜硫酸塩としては亜硫酸ナトリウム、
亜硫酸カリウム、亜硫酸アンモニウム、′ii硫酸水素
ナトリウム、亜硫酸水素カリウム等が挙げられる。The developer used in the present invention may further contain a sulfite. Sulfites include sodium sulfite,
Potassium sulfite, ammonium sulfite, sodium hydrogen sulfite, potassium hydrogen sulfite and the like can be mentioned.
亜硫酸塩の含有量は使用時の現像液の総重量に対して0
.1〜lO重量%が好適であり、より好ましくは0.5
〜5重■%である。The content of sulfites is 0 based on the total weight of the developer when used.
.. 1 to 10% by weight is suitable, more preferably 0.5
~5% ■%.
本発明に用いられる現像液には現像性能を高めるために
前記の他に以下のような添加剤を加えることができる1
例えば特開昭58−75152号公報記載のHacl、
KCfL、 K[lr等の中性塩、特開昭59−190
952号公報記載のEDTA、 NT^等のキレート剤
、特開昭59−121:lコロ号公報記載の[C0(N
H3)]6CJ13等の錯体、特開昭56−14225
8号公報記載のビニルベンジルトリメチルアンモニウム
クロライドとアクリル酸ナトリウムの共重合体等の両性
高分子電解質、特開昭59−75255号公報記載のS
i、、Ti等を含む有機金属界面活性剤、特開昭59−
84241号公報記載の有機硼素化合物等が挙げられる
。In addition to the above, the following additives may be added to the developer used in the present invention in order to enhance the developing performance.
For example, Hacl described in JP-A No. 58-75152,
Neutral salts such as KCfL, K[lr, etc., JP-A-59-190
Chelating agents such as EDTA and NT^ described in Publication No. 952, [C0(N
H3)] Complexes such as 6CJ13, JP-A-56-14225
Ampholytic polymer electrolyte such as a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in Publication No. 8, S described in JP-A-59-75255
Organometallic surfactant containing i, Ti, etc., JP-A-59-
Examples include organic boron compounds described in Japanese Patent No. 84241.
25版上に現像液を供給する方法としては、例えばシャ
ワーバイブやノズルを使って液を版面に噴射、噴霧又は
滴下する方法、或いは版面に接触または非接触の位置に
置いた現像液供給部材から現像液を版面に塗布するよう
な形で供給する方法等がある。The method of supplying the developer onto the plate is, for example, by using a shower vibrator or nozzle to spray, spray or drop the liquid onto the plate surface, or from a developer supplying member placed in a position that is in contact with or not in contact with the plate surface. There is a method of supplying a developer by coating it on the printing plate.
現像液供給部材と28版を接触させ現像液を25版上に
供給する方法には、例えばスポンジあるいは布などのよ
うな吸水性の部材で28版を擦ることにより供給する方
法あるいはゴムなどのような非吸水性の部材、前記スポ
ンジあるいは布などのような吸水性の部材にかかわらず
、これらの部材をローラー状にし、搬送される感光性平
版印刷版とローラーの回転を同調させながら供給する方
法1例えばフィルムベースのような可撓性のある板材を
用い、2枚の上記板材により形成されたスリットの先端
を28版に接触させ、該スリットの間隙からps版上に
現像液を供給する方法などが挙げられる。The method of bringing the developer supplying member into contact with the 28th plate and supplying the developer onto the 25th plate includes, for example, a method of supplying the developer by rubbing the 28th plate with a water-absorbing member such as a sponge or cloth, or a method of supplying the developer by rubbing the 28th plate with a water-absorbing member such as a sponge or cloth, or a method using a rubber or the like. Regardless of whether it is a non-water-absorbing member or a water-absorbing member such as the sponge or cloth, these members are formed into rollers and the rotation of the roller is synchronized with the photosensitive lithographic printing plate being transported. 1 For example, a method using a flexible plate material such as a film base, bringing the tip of a slit formed by the two plates into contact with a 28 plate, and supplying a developer onto the PS plate from the gap between the slits. Examples include.
また現像液供給部材と28版を非接触で現像液を25版
上に供給する方法には1例えば細い間隙に現像液をため
ておき、その中を印刷版を通過させることにより供給す
る方法あるいは、現像液供給部材に表面張力により竿状
に垂れ下がる現像液に28版を接触させ供給する方法、
あるいは筒状の物に現像液を貯めておき、該筒状の物の
側面に細い間隙を作り、その間隙に28版を通過させる
ことにより、供給する方法などが挙げられる。In addition, there are two methods for supplying the developer onto the 25th plate without contact between the developer supplying member and the 28th plate: 1, for example, a method of storing the developer in a narrow gap and supplying it by passing the printing plate through the gap; , a method of supplying the 28 plate by bringing it into contact with the developer that hangs down in a rod shape due to surface tension from the developer supply member;
Another method is to store the developer in a cylindrical object, make a narrow gap on the side of the cylindrical object, and supply the developer by passing the 28 plate through the gap.
また、これらの現像液供給方法において、現像液は液状
のみならず泡状として25版上に供給することがてきる
。さらに現像を噴射方式により供給する方法ては、現像
液を霧状て供給することもてきる。Further, in these developer supply methods, the developer can be supplied onto the 25th plate not only in liquid form but also in foam form. Furthermore, in the method of supplying the developer by spraying, the developer can also be supplied in the form of a mist.
その他の現像液供給方法としてはフィルムベースなどに
現像液を付着させそれを25版上にラミネートすること
により供給する方法や、ワックス状の現像液を印刷版と
接触させて供給する方法などが挙げられる。Other methods of supplying the developer include a method of supplying the developer by attaching the developer to a film base etc. and laminating it on the 25 plate, and a method of supplying the wax-like developer by bringing it into contact with the printing plate. It will be done.
前記現像液の供給方法は、1つの方法のみを用いても良
いし、2つ以上の方法を組み合わせて用いても良い。As the developer supply method, only one method may be used, or two or more methods may be used in combination.
これらの方法によって版面上に供給される現像液の量は
、本発明においては印刷版1rr1′当り70厘文〜7
0口■旦である。供給量が70℃文/m″未満であると
一枚の版上で均一な現像を行なうことが困難である。ま
た700■立を越えると、コストアップ、更に現像液が
版上に保持されずに流れ落ちたり、眼中央部の現像液量
が極端に多くなり、現像ムラを生じる欠点がある。In the present invention, the amount of developer supplied onto the printing plate by these methods is between 70 and 70 kg per 1 rr of printing plate.
It's 0 mouths. If the supply rate is less than 70 °C m/m, it will be difficult to develop uniformly on a single plate. If it exceeds 700 °C, the cost will increase and the developer will not be retained on the plate. There are disadvantages in that the developing solution may run down, or the amount of developing solution in the center of the eye may become extremely large, resulting in uneven development.
現像液のより好ましい供給量は90m又/m″〜500
−文/rn’であり、特に100■文/ゴ乃至30〇−
文/m″とすることが好ましし)。A more preferable supply amount of the developer is 90 m/m'' to 500 m/m''
- Sentence/rn', especially 100 ■ Sentence/Go to 300-
sentence/m'').
また現像液の供給量は上記の範囲内であれば印刷版の面
積1種類、非画像の面積比率、或いは版の幅、長さ等に
応じて変化させることができる。Further, the amount of developer supplied can be changed within the above range depending on the area of one type of printing plate, the area ratio of non-images, the width and length of the plate, etc.
使用時の現像液の温度は5°C乃至60℃、好まし〈は
10℃乃至45°C1より好ましくは25°C乃至35
℃の範囲である。The temperature of the developer during use is 5°C to 60°C, preferably 10°C to 45°C, more preferably 25°C to 35°C.
℃ range.
現像液は使用液に仕上げられたものを貯蔵槽に貯えてお
き処理時に25版上に供給してもよく、また原液と稀釈
液、又は組成を異する複数の液に分けて貯蔵槽に貯え、
各法を版面上に供給し、或いは供給時日動的に混合して
使用液に仕上げて供給してもよいが、自動的に混合し均
一状態として版面に供給する方が好ましい。The developer may be finished into a working solution and stored in a storage tank and supplied onto the 25th plate during processing, or it may be divided into a stock solution and a diluted solution, or multiple solutions with different compositions and stored in a storage tank. ,
Each method may be supplied onto the printing plate, or dynamically mixed at the time of supply to prepare a working solution and supplied, but it is preferable to mix automatically and supply it to the printing plate in a uniform state.
版面に供給される現像液は実質的に未使用の現像液であ
るが、ここに「実質的に」とは原則として全量未使用の
新液であるが、本発明の効果を損なわない範囲で一部一
度使用した液を混合して使用してもよいことを意味する
。The developer supplied to the printing plate is a substantially unused developer. Here, "substantially" means, as a general rule, the entire amount of new developer, but it may be used within the range that does not impair the effects of the present invention. This means that some of the liquids used once may be mixed and used.
現像液供給部には、25版の有無を検出するセンサー等
の検出機構に連動した制御機構を宥していて、25版が
現像部に搬入される前及び通過後は停+l: 機構が働
くようになっていることか望ましい。The developer supply section is equipped with a control mechanism linked to a detection mechanism such as a sensor that detects the presence or absence of the 25th plate, and the mechanism is activated before the 25th plate is carried into the developing section and after passing through. It is desirable that it be like this.
本発明の方法においては現像処理時、現像を促進する何
らかの操作を付加することが好ましい。In the method of the present invention, it is preferable to add some kind of operation to accelerate the development during the development process.
現像促進操作には、現像促進する物理的、化学的、電気
的、機械的などのすべての手段を利用することができる
。For the development promotion operation, all physical, chemical, electrical, mechanical, etc. means for promoting development can be used.
機械的促進手段としては、版面な擦る方法、例えば回転
するローラ状の擦り部材を用いて擦る方法、平板状の擦
り部材を回転することにより擦る方法、平板状の擦り部
材を前後および/または左右に移動させることにより擦
り方法、またはローラー状の擦り部材あるいは平板状の
擦り部材を回転しながら前後および/または左右に移動
させることにより擦る方法などが挙げられる。尚これら
の擦り部材は複数個組み合わせて使用しても良い、これ
らの擦り部材は例えばブラシ、スポンジ、或いは布等を
用いて作成することかできる。Mechanical acceleration means include a method of rubbing the plate surface, for example, a method of rubbing using a rotating roller-like rubbing member, a method of rubbing by rotating a flat rubbing member, a method of rubbing by rotating a flat rubbing member, and a method of rubbing the plate-like rubbing member back and forth and/or left and right. Examples include a method of rubbing by moving a roller-shaped rubbing member or a flat-plate rubbing member while rotating it and moving it back and forth and/or left and right. Note that a plurality of these rubbing members may be used in combination, and these rubbing members can be made using, for example, a brush, a sponge, or cloth.
その他の現像促進手段には例えば高圧空気を吹きつける
方法、超音波を照射する方法、ps版に振動を与える方
法、特開昭58−42042号公報に記載されているよ
うな電気化学的に現像する方法、あるいはマイクロウェ
ーブの照射により瞬時に25版上の現像液を加熱する方
法、あるいは研磨剤粉末を含む処理液てホーニングする
方法などが挙げられる。Other development accelerating means include, for example, a method of blowing high-pressure air, a method of irradiating ultrasonic waves, a method of applying vibration to the PS plate, and an electrochemical development method as described in JP-A-58-42042. A method of instantly heating the developing solution on the 25 plate by microwave irradiation, or a method of honing using a processing solution containing abrasive powder.
現像促進手段を付加する時期は、現像液を供給する前あ
るいは供給中あるいは供給後のいずれの時期でも良いか
現像液の供給中あるいは供給後に付加することか好まし
い。The development accelerator may be added before, during or after the developer is supplied, or preferably during or after the developer is supplied.
また、前記の現像液供給手段と現像促進手段とは一体化
されていても良い、例えば現像促進手段か円盤状のブラ
シであり、現像液供給手段がノズルである場合、円盤状
ブラシの回転軸の中心にノズルを設置することもてきる
。Further, the developer supplying means and the development promoting means may be integrated, for example, the development promoting means is a disc-shaped brush, and when the developer supplying means is a nozzle, the rotating shaft of the disc-shaped brush It is also possible to install a nozzle in the center of the
本発明において現像ゾーンを25版が通過する時間は1
08′〜60秒であることか好ましい。In the present invention, the time it takes for the 25th plate to pass through the development zone is 1
It is preferable that the time is 08' to 60 seconds.
本発明の方法の実施に用いられる自動現像機は25版を
自動的に搬送処理するもので、処理時PS版1枚毎にそ
の版面上に予め定められた量の水系アルカリ性現像液を
供給する手段及び現像を促進する手段を備えたものであ
れば、その形状、構成、構造等は特に限定されない。搬
送形式は例えば搬送ローラやエンドレスベルト等を用い
たものか好ましい。The automatic developing machine used to carry out the method of the present invention automatically transports and processes 25 plates, and supplies a predetermined amount of aqueous alkaline developer onto the plate surface for each PS plate during processing. There are no particular limitations on its shape, configuration, structure, etc., as long as it is equipped with means and means for promoting development. It is preferable to use a conveyance method such as a conveyance roller or an endless belt.
また本発明の現像処理方法及びその方法に用いられる自
動現像機は前記現像処理工程の他に必要ならば、現像処
理工程後、現像停止処理工程(停止処理液は使い捨て方
式や循環使用の方式を含む)、不感脂化処理工程の各々
個々の処理工程、現像停止処理工程とそれに引続ぐ不感
脂化処理工程、現像処理工程と不感脂化処理と組合せた
処理工程、或いは現像停止処理工程と不感脂化処理工程
とを組合せた例えば特開昭54−8002号公報記載の
処理工程等を含んでいてもよい、また、現像処理工程お
よび他の工程は各々複数あっても良く、例えば現像処理
工程を第1の現像処理工程および第2の現像処理工程に
分けても良い。In addition to the above-mentioned development process, if necessary, the development process method of the present invention and the automatic developing machine used in the process may include a development stop process (the stop process liquid can be used in a disposable or cyclical manner). ), each individual desensitization process, a development stop process and a subsequent desensitization process, a process that combines a development process and a desensitization process, or a development stop process and a desensitization process. It may include a processing step described in JP-A No. 54-8002 in combination with a fatification processing step, and there may be a plurality of each of the development processing step and other steps, for example, the development processing step may be divided into a first development process and a second development process.
本発明に使用される感光性平版印刷版の感光性組成物は
必須成分として感光性物質を含んでおり、感光性物質と
して露光又はその後の現像処理により、その物理的、化
学的性質が変化するもので1例えば露光により現像液に
対する溶解性に差が生じるもの、露光の前後で分子間の
tlc着力に差が生しるもの、露光又はその後の現像処
理により水及び油に対する親和性に差が生じるもの、更
に電子写真方式により画像部を形成できるもの、又特開
昭55−166645号に記載されている多層構成のも
の等が使用できる。The photosensitive composition of the photosensitive lithographic printing plate used in the present invention contains a photosensitive substance as an essential component, and the physical and chemical properties of the photosensitive substance change upon exposure or subsequent development treatment. 1 For example, there is a difference in solubility in a developer due to exposure, a difference in TLC adhesion between molecules before and after exposure, and a difference in affinity for water and oil due to exposure or subsequent development treatment. It is possible to use those that produce an image, those that can form an image area by electrophotography, and those that have a multilayer structure as described in JP-A-55-166645.
感光性物質の代表的なものとしては、例えば感光性ジア
ゾ化合物、感光性アジド化合物、エチレン性不飽和二重
結合を有する化合物、酸触媒て重合を起こすエポキシ化
合物、酸で分解するC−〇−C基を有する化合物等が挙
げられる。露光によりアルカリ可溶性に変化する代表的
なポジ型のものとして0−キノンジアジド化合物や酸分
解性のエーテル化合物、エステル化合物が挙げられる。Typical photosensitive substances include, for example, photosensitive diazo compounds, photosensitive azide compounds, compounds with ethylenically unsaturated double bonds, epoxy compounds that undergo polymerization with acid catalysts, and C-〇- compounds that decompose with acids. Examples include compounds having a C group. Typical positive-type compounds that become alkali-soluble upon exposure include 0-quinonediazide compounds, acid-decomposable ether compounds, and ester compounds.
露光により溶解性が減少するネガ型のものとして芳香族
ジアゾニウム塩等が挙げられる。Aromatic diazonium salts are examples of negative-type compounds whose solubility decreases upon exposure to light.
0−キノンジアジド化合物の具体例としては1例えば特
開昭47−5303号、同48−63802号、同48
−63803号、同49−387旧号、同56−104
4号、同56−1045号、特公昭41−11222号
、同43−28403号、同45−9610号、同49
−17481号、米国特許2,797,213号、同3
.046,120号、同 3,188,210号、同3
,454,400号、同3,544,323号、同:l
、573,917号、同3,674.495号、同3,
785,825号、英国特許1,227,602号、同
1,251.:145号、同1,267.005号、同
1 、329.888号、同1,330,932号、ド
イツ特許854,890号があり、S分解性化合物の例
としては特開昭60−37549号、同60−1024
7号、同60−3625号などに記載されているものを
挙げることができ、これらの化合物を単独或いは組合せ
て感光成分として用いた感光性平版印刷版に対して少な
くとも本発明を好ましく適用することができる。Specific examples of 0-quinonediazide compounds include 1, for example, JP-A-47-5303, JP-A-48-63802, and JP-A-48.
-63803, 49-387 old number, 56-104
No. 4, No. 56-1045, Special Publication No. 41-11222, No. 43-28403, No. 45-9610, No. 49
-17481, U.S. Patent No. 2,797,213, U.S. Patent No. 3
.. No. 046,120, No. 3,188,210, No. 3
, No. 454,400, No. 3,544,323, No.:l
, No. 573,917, No. 3,674.495, No. 3,
785,825, British Patent No. 1,227,602, British Patent No. 1,251. 145, 1,267.005, 1, 329.888, 1,330,932, and German Patent No. 854,890. No. 37549, 60-1024
No. 7, No. 60-3625, etc., and the present invention is preferably applied at least to photosensitive lithographic printing plates using these compounds alone or in combination as photosensitive components. I can do it.
これらの感光成分には芳香族ヒドロキシ化合物の0−キ
ノンジアジドスルホン酸エステル又はO−キノンジアジ
ドカルボン酸エステル及び芳香族アミノ化合物の0−キ
ノンジアジドスルホン酸アミド又は0−キノンジアジド
カルボン酸アミドが包含され、又、これら0−キノンジ
アジド化合物を単独で使用したもの、及びアルカリ可溶
性樹脂と混合し、この混合物を感光層として設けたもの
が包含される。These photosensitive components include 0-quinonediazide sulfonic acid esters or O-quinonediazidecarboxylic acid esters of aromatic hydroxy compounds and 0-quinonediazide sulfonic acid amide or 0-quinonediazidecarboxylic acid amide of aromatic amino compounds; These include those in which the 0-quinonediazide compound is used alone, and those in which it is mixed with an alkali-soluble resin and this mixture is provided as a photosensitive layer.
アルカリ可溶性樹脂には、ノボラック型フェノール樹脂
が含まれ、具体的にはフェノールホルムアルデヒド樹脂
、クレゾールホルムアルデヒド樹脂、フェノールクレゾ
ー′ル混合ホルムアルデヒド樹脂、クレゾールキシレノ
ール混合ホルムアルデヒド樹脂などが含まれる。更に特
開昭50−125806号に記載されているように、上
記のようなフェノール樹脂に共に、t−ブチルフェノー
ルホルムアルデヒド樹脂のような炭素数3〜8のアルキ
ル基で置換されたフェノール又はクレゾールとホルムア
ルデヒドとの縮合物とを併用したものも適用できる。0
−キノンジアジド化合物を感光成分とする感光層には、
必要に応じて更に染料、可塑剤、プリントアウト性能を
与える成分などの添加剤を加えることができる。Alkali-soluble resins include novolak-type phenolic resins, and specifically include phenol formaldehyde resins, cresol formaldehyde resins, phenol-cresol mixed formaldehyde resins, cresol xylenol mixed formaldehyde resins, and the like. Furthermore, as described in JP-A-50-125806, in addition to the above-mentioned phenol resin, phenol or cresol substituted with an alkyl group having 3 to 8 carbon atoms such as t-butylphenol formaldehyde resin and formaldehyde are used. It is also possible to use a condensate of the same. 0
-The photosensitive layer containing a quinonediazide compound as a photosensitive component includes:
If necessary, additives such as dyes, plasticizers, and components imparting printout performance can be added.
0−キノンジアジド化合物を感光成分とする感光層の単
位面積当たりの量は好ましくは約0.5〜7g/rrf
の範囲について本発明を適用できる。The amount per unit area of the photosensitive layer containing the 0-quinonediazide compound as a photosensitive component is preferably about 0.5 to 7 g/rrf.
The present invention can be applied to the range of
本発明の方法を適用するポジ型感光性平版印刷版の画像
露光は特に変える必要はなく常法に従えばよい。The image exposure of the positive photosensitive lithographic printing plate to which the method of the present invention is applied does not need to be particularly changed and may be carried out in accordance with a conventional method.
ネガ型感光層の感光成分の代表的なものはジアゾ化合物
であり1例えばジアゾニウム塩及び/又はp−ジアゾジ
フェニルアミンとホルムアルデヒドとの縮合物であるジ
アゾ樹脂、特公昭52−7364号に記載されているp
−ジアゾジフェニルアミンのフェノール塩又はフルオロ
カプリン酸塩等、特公昭49−48001号に記載され
ている共重縮合物の有機溶媒可溶性塩からなるジアゾ樹
脂、p−ジアゾジフェニルアミンとホルムアルデヒドと
の縮合物の2−メトキシ−4−ヒドロキシ−5−ベンゾ
イルベンゼンスルホン酸塩、p−ジアゾジフェニルアミ
ンとホルムアルデヒドとの縮合物のテトラフルオロホウ
酸塩、ヘキサフルオロリン酸塩等が挙げられる。Typical photosensitive components of the negative photosensitive layer are diazo compounds.1 For example, diazo resin, which is a condensate of diazonium salt and/or p-diazodiphenylamine and formaldehyde, is described in Japanese Patent Publication No. 7364/1983. p
- A diazo resin consisting of an organic solvent-soluble salt of a copolycondensate described in Japanese Patent Publication No. 49-48001, such as a phenol salt or fluorocaprate of diazodiphenylamine, and a condensate of p-diazodiphenylamine and formaldehyde. Examples include -methoxy-4-hydroxy-5-benzoylbenzenesulfonate, tetrafluoroborate of a condensate of p-diazodiphenylamine and formaldehyde, and hexafluorophosphate.
これらを感光成分とするネガ型感光性平版印刷版に対し
て少なくとも本発明を好ましく適用できる。The present invention can be preferably applied at least to negative photosensitive planographic printing plates containing these as photosensitive components.
これらのジアゾ化合物を単独で使用したもののばかに感
光層の物性を向上させるために、種々の樹脂と混合して
用いたものに対しても本発明を適用できる。かかる樹脂
としては、シェラツク、ポリビニルアルコールの誘導体
のほかに特開昭50−] 118802号に記載されて
いる側鎖にアルコール性水酸基を有する共重合体、特開
昭55−155:155号に記載されているフェノール
性水酸基を側鎖に持つ共重合体が挙げられる。Although these diazo compounds are used alone, the present invention can also be applied to those used in combination with various resins in order to improve the physical properties of the photosensitive layer. Such resins include shellac, derivatives of polyvinyl alcohol, copolymers having alcoholic hydroxyl groups in side chains as described in JP-A-50-118802, and those described in JP-A-55-155:155. Examples include copolymers with phenolic hydroxyl groups in their side chains.
これらの樹脂には下記−綴代で湿される構造単位を少な
くとも50重量%含む共重合体、(式中、R1は水素原
子又はメチル基を示し、R2は水素原子、メチル基、エ
チル基又はクロルメチル基を示し、nは1〜10の整数
である。)及び芳香族性水酸基を有する単量体単位を1
〜80モル%、ならびにアクリル酸エステル及び/又は
メタクリル酸エステル単量体単位を5〜90モル%有し
、10〜200の酸価を持つ高分子化合物が包含される
。These resins include the following - copolymers containing at least 50% by weight of structural units that are wetted by the binding margin (wherein R1 represents a hydrogen atom or a methyl group, and R2 represents a hydrogen atom, a methyl group, an ethyl group, or chloromethyl group, n is an integer of 1 to 10) and an aromatic hydroxyl group.
-80 mol%, and 5-90 mol% of acrylic ester and/or methacrylic ester monomer units, and polymer compounds having an acid value of 10-200 are included.
本発明の現像方法が適用されるネガ型感光性平版印刷版
の感光層には、更に染料、可塑剤、プリントアウト性能
を与える成分等の添加剤を加えることができる。Additives such as dyes, plasticizers, and components imparting printout performance can be added to the photosensitive layer of the negative photosensitive lithographic printing plate to which the developing method of the present invention is applied.
上記感光層の単位面積当たりの量は少なくとも0.1〜
7 godの範囲について本発明を適用できる。The amount per unit area of the photosensitive layer is at least 0.1 to
The present invention is applicable to the range of 7 God.
前記の感光性平版印刷版に使用される支持体としては、
アルミニウム(アルミニウム合金も含む)又はアルミニ
ウム被覆された複合支持体が挙げられる。The support used in the photosensitive lithographic printing plate is as follows:
Mention may be made of aluminum (including aluminum alloys) or aluminum-coated composite supports.
又、アルミニウム材の表面は、保水性を高め感光層と密
着性を向上させる目的て粗面化処理されていることか望
ましい。Further, it is desirable that the surface of the aluminum material be roughened for the purpose of increasing water retention and adhesion to the photosensitive layer.
粗面化方法としては、一般に公知のブラシ研磨法、ボー
ル研磨法、電解エツチング、化学画工・ンチング、液体
ホーニング、サンドブラスト等の方法及びこれらの組合
せか挙げられ、好ましくはブラシ研磨法、電解エツチン
グ、化学画工・ンチング及び液体ホーニン・グが挙げら
れ、これらのうちで特に電解エツチングの使用を含む粗
面化方法が特に好ましい。又、電解エツチングの際に用
いられる電解浴としては、酸、アルカリ又はそれらの塩
を含む水溶液或いは有機溶剤を含む水性溶液が用いられ
、これらのうちで特に塩酸、硝酸又はそれらの塩を含む
電解液が好ましい、更に粗面化処理の施されたアルミニ
ウム板は、必要に応して酸又はアルカリの水溶液にてデ
スマット処理される。Examples of surface roughening methods include generally known methods such as brush polishing, ball polishing, electrolytic etching, chemical painting/etching, liquid honing, sandblasting, etc., and combinations thereof. Preferably, brush polishing, electrolytic etching, Chemical etching and liquid honing may be mentioned, of which surface roughening methods involving the use of electrolytic etching are particularly preferred. The electrolytic bath used in electrolytic etching is an aqueous solution containing an acid, an alkali, or a salt thereof, or an aqueous solution containing an organic solvent. A liquid is preferable, and the aluminum plate subjected to the surface roughening treatment is desmutted with an acid or alkali aqueous solution, if necessary.
こうして得られたアルミニウム板は陽極酸化処理される
ことか望ましく、特に好ましくは、硫酸又はリン酸を含
む浴で処理する方法が挙げられる。又、更に必要に応じ
て封孔処理、その他部化ジルコニウム酸カリウム水溶液
への浸漬などによる表面処理を行うことができる。It is preferable that the aluminum plate thus obtained be anodized, and particularly preferably, the aluminum plate is treated in a bath containing sulfuric acid or phosphoric acid. Further, if necessary, a sealing treatment and other surface treatments such as immersion in an aqueous potassium zirconate solution can be performed.
(発明の効果)
本発明によれば、アルミニウム支持体が現像液に侵され
るのを防止し、現像性に優れ、スラッジの発生を防止で
き、かつ現像液の濃縮性に優れる感光性平版印刷版の現
像処理方法を提供できる。(Effects of the Invention) According to the present invention, a photosensitive lithographic printing plate that prevents an aluminum support from being attacked by a developer, has excellent developability, can prevent the generation of sludge, and has excellent developer concentration. It is possible to provide a development processing method.
〔実施例) 以下、本発明を実施例により、詳細に説明する。〔Example) Hereinafter, the present invention will be explained in detail with reference to Examples.
ポジ型ps版rSHP−NJ (コニカ社製)の10
0:1m5X 800+u+サイズのものに透明ポジ原
稿を密着させ、2KWのメタルハライドランプで60c
mの距離から50秒間画像露光した。Positive PS version rSHP-NJ (manufactured by Konica) 10
0:1m5
The image was exposed for 50 seconds from a distance of m.
このように露光した28版を下記組成の現像液を用い、
自動現像機rPSU−820J (コニカ社製)にて
27°Cで20秒間現像処理(1)〜(11)を行った
。The 28th plate exposed in this way was processed using a developer with the following composition.
Development treatments (1) to (11) were performed at 27°C for 20 seconds using an automatic developing machine rPSU-820J (manufactured by Konica).
現像処理の後、現像インキrsPo−IJ (コニカ
社製)を用いてインキ盛りを行った。After development, ink was applied using development ink rsPo-IJ (manufactured by Konica).
(現像液の組成)
現像液(1)
水
5670g安息香酸 1
20g50%水酸化カリウム溶液 260g
エマルゲンA−500
(化工輛製、ノニオン界面活性剤) 5gケ
イ酸カリウム溶液
(Sing含有26重量L K、O含有13141)安
息香酸リチウム
現像液(2)
水
安息香酸
50%水酸化カリウム溶液
シュウ酸リチウム
狐5」LL夫り
水
安息香酸
50%水酸化カリウム溶液
50g
g
ル豊1」I[土工上
水
安息香酸
50%水酸化カリウム溶液
670g
20g
60g
670g
20g
エマルゲンA−500
(化工■製、ノニオン界面活性剤)
g
60g
g
ケイ酸カリウム溶液
(Sin、含有26重量2、に20含有13重量X)安
息香酸リチウム
塩1災盈亘ユニ上
、水
安息香酸
50%水酸化カリウム溶液
50g
0.5g
670g
20g
60g
670g
20g
エマルゲンA−500
(化工−製、ノニオン界面活性剤)
g
60g
シュウ酸リチウム
g
安息香酸リチウム
比1JjL液」」」−
水
安息香酸
0.5g
335g
20g
50%水酸化カリウム溶液
エマルゲンA−500
(化工−製、ノニオン界面活性剤)
安息香酸リチウム
比較現像液(4)
水
安息香酸
50%水酸化カリウム溶液
60g
g
42g
Aケイ酸カリウム溶液
(Sioz含有26重量L K、0含有13重量2)安
息香酸リチウム
ル事」1(液」」D−
水
安息香酸
50%水酸化カリウム溶液
80g
g
410g
20g
70g
730g
20g
エマルゲンA、500
(化工輛製、ノニオン界面活性剤) 5g3
0g
安息香酸リチウム
比較現像液(5)
水
安息香酸
50%水酸化カリウム溶液
エマルゲンA−500
(化工v4製、)二オン界面活性剤)
g
610g
20g
90g
g
安息香酸リチウム 7g各処理に
おける現像液の種類、リチウム(Li)塩の濃度、現像
液のpH1[5iO−1/ [Ml値および現像時の2
8版面への供給量は表1に示す通りである。(Composition of developer) Developer (1) Water
5670g benzoic acid 1
20g 50% potassium hydroxide solution 260g
Emulgen A-500 (Nonionic surfactant manufactured by Kakoyoshi) 5g Potassium silicate solution (Sing containing 26 weight L K, O containing 13141) Lithium benzoate developer (2) Water Benzoic acid 50% Potassium hydroxide solution Oxalic acid Lithium Fox 5" LL Water Benzoic Acid 50% Potassium Hydroxide Solution 50 g Le Toyo 1" I Surfactant) g 60 g g Potassium silicate solution (Sin, containing 26 weight 2, 20 containing 13 weight 670g 20g 60g 670g 20g Emulgen A-500 (manufactured by Kako, nonionic surfactant) g 60g Lithium oxalate g Lithium benzoate ratio 1JjL solution - Hydrobenzoic acid 0.5g 335g 20g 50% potassium hydroxide solution Emulgen A-500 (manufactured by Kako, nonionic surfactant) Lithium benzoate comparative developer (4) Hydrobenzoic acid 50% potassium hydroxide solution 60g g 42g A Potassium silicate solution (Sioz content 26wt L K, 0 content 13 Weight 2) Lithium benzoate 1 (Liquid) D- Water Benzoic acid 50% potassium hydroxide solution 80g g 410g 20g 70g 730g 20g Emulgen A, 500 (manufactured by Kakogyo, nonionic surfactant) 5g3
0g Lithium benzoate comparison developer (5) Hydrobenzoic acid 50% potassium hydroxide solution Emulgen A-500 (manufactured by Kako V4, diionic surfactant) g 610g 20g 90g g Lithium benzoate 7g Developer solution in each treatment Type, concentration of lithium (Li) salt, pH of developer solution 1[5iO-1/[Ml value and 2 during development]
The amount supplied to the 8th printing plate is as shown in Table 1.
(評価) ■アルミニウム支持体裏面のヤラレ 目視によって評価した。(evaluation) ■ Discoloration on the back side of the aluminum support Evaluation was made visually.
◎:ヤラレがでない。◎: There is no damage.
0:ヤラレがほとんどでない。0: There is almost no yare.
×・裏面が白変する。×・The back side turns white.
■現像性 現像処理された画像を目視によって評価した。■Developability The developed image was visually evaluated.
○ニア倍濃縮可 ×:6倍濃縮で若干不溶物か見られる。○ Near-fold concentration possible ×: Some insoluble matter was observed after 6-fold concentration.
以上の評価結果を表1に示す。The above evaluation results are shown in Table 1.
◎:非常に良好。◎: Very good.
O1良好。O1 good.
×:悪い。×: Bad.
■沈殿性
23版を100版処理した後の現像液を100m文サン
プリンタして放置し、沈澱性を確認して、評価した。(2) Sedimentability The developer after processing the 100th plate of the 23rd plate was placed in a 100m sample printer and left to stand, and the sedimentation was confirmed and evaluated.
041か月で沈殿発生。Precipitation occurred in 041 months.
O:3週間で沈殿発生。O: Precipitation occurred in 3 weeks.
×・6日間で沈殿発生。×・Precipitation occurred in 6 days.
■現像液の濃縮性
前記の組成の各現像液から水を減らした現像液を調製し
、どこまで濃厚な現像液か調製可能か確認した。(2) Concentration of developer A developer was prepared by reducing the amount of water from each of the developers having the above compositions, and it was confirmed how concentrated a developer could be.
目視によって評価した。Evaluation was made visually.
◎:8倍濃縮可
上記衣からあきらかなように、本発明の処理方法に従っ
た場合にのみ、アルミニウム支持体裏面のヤラレ、現像
性、沈殿性、現像液の濃縮性という本発明の効果を同時
に満足することが判った。◎: Can be concentrated 8 times.As is clear from the above coating, only when the processing method of the present invention is followed can the effects of the present invention such as discoloration on the back side of the aluminum support, developability, precipitation, and concentration of the developing solution be achieved. I found that I was satisfied at the same time.
また処理法(1)において安息香酸リチウムをLiC1
にかえた以外は同様に処理した結果、濃縮性が処理法(
2)より10%悪くなり、濃縮性は有機Li塩の方がよ
いことが判った。In addition, in treatment method (1), lithium benzoate is
As a result of the same treatment except that the concentration was changed to
It became 10% worse than 2), and it was found that the organic Li salt had better concentrating properties.
Claims (1)
後、水を主たる溶媒とする実質的に未使用のアルカリ性
現像液を、処理される感光性平版印刷版1枚毎に、その
版面に供給し現像する感光性平版印刷版の現像処理方法
において、 該現像液が、(i)0.01〜5重量%のリチウム塩を
含有し、(ii)pH12〜13.5であり、かつ(i
ii)0.05≦[SiO_2]/[M]<0.50で
あり(但しMはLi以外のアルカリ金属である。)、 現像処理液供給量が感光性平版印刷版1m^2当り70
〜700mlであることを特徴とする感光性平版印刷版
の現像処理方法。[Scope of Claims] A photosensitive lithographic printing plate 1 which, after imagewise exposure of a photosensitive lithographic printing plate having a photosensitive layer on a support, is treated with a substantially unused alkaline developer containing water as a main solvent. In a method for developing a photosensitive lithographic printing plate, in which the developer is supplied to the plate surface of each plate for development, the developer (i) contains 0.01 to 5% by weight of lithium salt, and (ii) has a pH of 12 to 13%. .5, and (i
ii) 0.05≦[SiO_2]/[M]<0.50 (however, M is an alkali metal other than Li), and the amount of development processing solution supplied is 70% per 1 m^2 of the photosensitive planographic printing plate.
A method for developing a photosensitive lithographic printing plate, characterized in that the volume is 700 ml.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33226789A JPH03191355A (en) | 1989-12-20 | 1989-12-20 | Method of development processing for photosensitive planographic plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33226789A JPH03191355A (en) | 1989-12-20 | 1989-12-20 | Method of development processing for photosensitive planographic plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03191355A true JPH03191355A (en) | 1991-08-21 |
Family
ID=18253037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33226789A Pending JPH03191355A (en) | 1989-12-20 | 1989-12-20 | Method of development processing for photosensitive planographic plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03191355A (en) |
-
1989
- 1989-12-20 JP JP33226789A patent/JPH03191355A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2123162A (en) | Developing solution for light-sensitive printing plates | |
EP0206308B1 (en) | Developing method for photosensitive material | |
JPH03101735A (en) | Method for processing photosensitive planographic printing plate | |
JPH03191355A (en) | Method of development processing for photosensitive planographic plate | |
JPS6323160A (en) | Method for developing process of photosensitive planographic printing plate having improved stability, uniformity or the like | |
EP0066990B1 (en) | Process for production of presensitized lithographic printing plates | |
JPS6242159A (en) | Method and device for processing photosensitive lithographic plate | |
JPS63200154A (en) | Developing solution for photosensitive planographic printing plate which can commonly process negative type and positive type | |
JPH03191354A (en) | Method of development processing for photosensitive planographic plate | |
JP3023711B2 (en) | Processing method of photosensitive lithographic printing plate | |
JPS62187856A (en) | Processing method for photosensitive lithographic printing plate | |
JPH0391750A (en) | Processing method for photosensitive planographic plate | |
JPH01223448A (en) | Method for processing photosensitive material | |
JPS63103255A (en) | Method and apparatus for processing photosensitive material having improved stability of development or the like | |
JPS63109443A (en) | Developing process method for photosensitive lithographic printing plate improved in stability or the like of developing process | |
JPH03144659A (en) | Etching solution for planographic printing plate | |
JP3561859B2 (en) | Processing method of photosensitive recording material | |
JPH01223447A (en) | Method for processing photosensitive material | |
JPH06348038A (en) | Processing method for photosensitive planographic printing plate | |
JPS6238470A (en) | Method for processing photosensitive lithographic printing plate | |
JPS63213847A (en) | Method for processing photosensitive planographic printing plate | |
JPS6235362A (en) | Method for processing photosensitive lithographic printing plate | |
JPS61246750A (en) | Treatment for developing photosensitive lithographic plate | |
JPS61243455A (en) | Method for developing photosensitive lithographic plate | |
JPS6315252A (en) | Processing method for photosensitive lithographic printing plate which is improved in development stability or the like |