JPH03189653A - Method for generating exposure data - Google Patents

Abstract

PURPOSE:To easily and surely verify various kinds of errors by generating the result of processing for a specified parameter in an area out of the effective exposed area of a mask reticle in exposure data. CONSTITUTION:In the processing of parameter, mask data is read at a step (ST) 101 first so as to perform only specified processing, and a pattern for dummy is additionally inserted at an ST 102. Then, the specified processing of parameter, that means, reduction processing and sizing processing and logical processing are performed to the pattern data for dummy. The result is generated in the area equivalent to the outside of the effective exposed area of the mask reticle in the exposure data. Whether or not each processing of parameter is accurately performed in the process of processing for generating the exposure data is easily and surely varified.

Description

[Detailed Description of the Invention] [Summary] The present invention relates to an exposure data generation method using a computer that generates exposure data for a mask/reticle based on mask pattern data provided by a designer. The purpose of this test is to easily and reliably verify errors in various parameters during exposure data generation processing, and to verify mask pattern data provided by designers.
In an exposure data generation method that generates exposure data for masks and reticles by sequentially performing various parameter processes such as reduction processing, sizing processing, and logical processing, only specified processing among the above-mentioned parameter processing is performed. additionally inserts dummy pattern data in such a way that the dummy pattern data is applied, and generates the result of the specified parameter processing for the dummy pattern data as a monitor pattern in the area corresponding to the outside of the effective exposure area of the mask/reticle in the exposure data. Configure it to do so.

[Industrial application field]

The present invention relates to a method of generating exposure data using a computer that generates exposure data for a mask/reticle based on mask pattern data provided by a designer.

Processing of mask pattern data and data format conversion using computers are increasingly required to be highly integrated and highly accurate.

In addition, the processing methods have become more complex, and it has become increasingly difficult to accurately and quickly discover and manage human and equipment errors in processing.

[Conventional technology]

A conventional exposure data generation method is shown in the flowchart of FIG.

As shown in the figure, this method first reads mask pattern data provided by the designer (step 301).
), reduction processing (step 302), and sizing processing (step 30) are performed on this mask pattern data.
By sequentially performing various parameter processing such as 3) and logic processing (step 304), exposure data for the mask/reticle is generated and output (step 305).

By the way, confirmation that such exposure data generation processing assumptions (steps 301 to 305) have been performed correctly can be made based on the list output showing the processing process of the computer, management records, etc. pattern (e.g. dimensions, etc.)
This was done by inserting the .

However, if there is a programming error, there may be a discrepancy between the list output and the final exposure data, and management records are not necessarily complete considering human error. Although it is optimal in principle to insert and measure patterns further, there is a problem in that it requires a lot of man-hours to handle each individual process, making it impractical.

[Problem to be solved by the invention]

As mentioned above, the conventional process confirmation method for exposure data generation processing has problems such as not being able to deal with programming errors, not being able to completely eliminate human errors, and not being practical due to the amount of man-hours. there were.

This invention was made in view of the above-mentioned problems,
The purpose is to provide an exposure data generation method that allows various errors in this type of exposure data generation processing to be easily and reliably verified.

[Means to solve the problem]

In order to achieve the above object, this invention sequentially performs various parameter processing such as reduction processing, sizing processing, and logical processing on mask pattern data provided by a designer. In the exposure data generation method for generating exposure data, dummy pattern data is additionally inserted so that only specified processing among the above-mentioned parameter processing is performed, and the specified parameter for the dummy pattern data is This method is characterized in that the processing results are generated as a monitor pattern in an area corresponding to outside the effective exposure area of the mask/reticle in the exposure data.

[Effect]

According to this configuration, a mask/reticle is created based on the obtained exposure data, and a dummy pattern formed outside the effective exposure area is measured, thereby easily and easily correcting errors that occur in the exposure data generation process. It can be verified with certainty.

〔Example〕

FIG. 1 is a flowchart showing an embodiment of an exposure data generation method according to the present invention.

In the figure, when the process is started, mask pattern data (FIG. 2(a)) provided by the designer is read from the magnetic tape (step 101).

The mask pattern data shown in FIG. 2(a) has a two-layer structure consisting of an alias "1" and an alias "2", and a reduction value of 90% is specified for the reduction process. For sizing processing, +0.5 is specified for the first layer pattern, 10 and 2 are specified for the second layer pattern, and OR for logical processing.
Processing is specified.

Next, additional reading of dummy pattern data is performed from the magnetic tape or keyboard (step 102).
.

In this example, a square pattern made of aXa is used as the dummy pattern, as shown in FIG.

These dummy patterns are shown in Figures 2(b) to (e).
(b) sizing, reduction,
(C) With only reduct, (d) With only sizing, (
e) Four attributes are assigned, all of which are present.

In this way, when reading of the master pattern data and dummy pattern data is completed (step 101.
102), after which reduction processing, sizing processing, and logic processing are performed as necessary (step 104.
106.108).

In other words, as shown in FIG. 2(b), if there is no sizing, reduct, or logical processing, the square pattern of aXa, which is a dummy pattern, is generated as is for the aliases "1" and "2". (step 103 NO).

105NO, 107NO).

In addition, as shown in FIG. 2(C), when there is only a reduct, reduced square patterns consisting of 0.9aXQ and 9a are generated for the aliases "1" and "2", respectively ( Step 103 YES, 104 , 1
05NO, 107No).

In addition, in the case of only sizing, as shown in Figure 2 (d), for the alias "1", (a + 0.5)
The square pattern of x (a+0.5) is also known as “2
”, a square pattern consisting of (a-0, 2) x (a-0, 2) is generated (step 1Q5
YES, step 107 NO).

Further, if all of them are present, a square pattern in which two large and small squares are overlapped is generated as shown in FIG. 2(e) (step 103: YES).

104.105YES, 107YES, 108).

Next, the dummy pattern after each process obtained above (
FIGS. 2(b) to (e)) show the positioning (
addressing) (step 109).

Thereafter, exposure data output processing similar to the conventional one is performed (step 110).

If electron beam exposure for the mask/reticle is performed based on the exposure data obtained above, the areas outside the effective exposure area on the obtained mask/reticle are shown in Figures 2(b) to (e). Since dummy patterns are formed, by appropriately measuring these dummy patterns, it is possible to easily and reliably verify whether or not the specified parameter processing was performed correctly in the exposure data generation process.

〔Effect of the invention〕

As is clear from the above description, according to the present invention, it is possible to easily and reliably verify whether each parameter processing has been performed correctly in the process of exposure data generation processing.

[Brief explanation of drawings]

FIG. 1 is a flow chart of the method of the present invention, FIG. 2 is a conceptual diagram showing the process of the method of the present invention, and FIG. 3 is a flow chart of the conventional method. 101...Mask pattern reading processing 2...Dummy pattern data additional reading processing 4...Reduction processing 6...Sizing processing 8...Logic processing 9...Dummy pattern generation processing 0...Exposure data Output processing

Claims (1)

[Claims] For mask pattern data provided by a designer,
By sequentially performing various parameter processing such as reduction processing (step 104), sizing processing (step 106), and logical processing (step 108), exposure data for masks and reticles is generated (step 110). In the generation method, dummy pattern data is additionally inserted so that only specified processing among the above parameter processing is performed (
Steps 103, 105, 107), and generating the result of the specified parameter processing on the dummy pattern data in an area corresponding to outside the effective exposure area of the mask/reticle in the exposure data (Step 109). How to generate exposure data.