JPH03179401A - Surface protective material - Google Patents
Surface protective materialInfo
- Publication number
- JPH03179401A JPH03179401A JP1319474A JP31947489A JPH03179401A JP H03179401 A JPH03179401 A JP H03179401A JP 1319474 A JP1319474 A JP 1319474A JP 31947489 A JP31947489 A JP 31947489A JP H03179401 A JPH03179401 A JP H03179401A
- Authority
- JP
- Japan
- Prior art keywords
- group
- denotes
- surface protective
- functional group
- integer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 16
- 230000001681 protective effect Effects 0.000 title abstract description 5
- 125000000524 functional group Chemical group 0.000 claims abstract description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000000126 substance Substances 0.000 claims abstract description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 3
- 125000001624 naphthyl group Chemical group 0.000 claims abstract description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 3
- 229920000620 organic polymer Polymers 0.000 claims description 14
- 125000000962 organic group Chemical group 0.000 claims description 4
- 150000003440 styrenes Chemical class 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 abstract description 3
- 238000011907 photodimerization Methods 0.000 abstract 3
- 239000011241 protective layer Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- -1 styryl ketone Chemical class 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- HGTUJZTUQFXBIH-UHFFFAOYSA-N (2,3-dimethyl-3-phenylbutan-2-yl)benzene Chemical group C=1C=CC=CC=1C(C)(C)C(C)(C)C1=CC=CC=C1 HGTUJZTUQFXBIH-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- ATMLPEJAVWINOF-UHFFFAOYSA-N acrylic acid acrylic acid Chemical compound OC(=O)C=C.OC(=O)C=C ATMLPEJAVWINOF-UHFFFAOYSA-N 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- FEIQOMCWGDNMHM-UHFFFAOYSA-N cinnamylideneacetic acid Natural products OC(=O)C=CC=CC1=CC=CC=C1 FEIQOMCWGDNMHM-UHFFFAOYSA-N 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、液晶表示素子またはＣＣＤ （チャージカプ
ルドデバイス）、ＢＢＤ（パケットブリケートデバイス
）、ＣＩＤ（チャージインジェクションデバイス）等か
らなる固体撮像素子等のカラーフィルターの表面保護材
料に関する６［従来の技術］
従来、液晶表示ζ子や固体撮像素子のカラーフィルター
の製造において、カラーフィルターの表面保護材料とし
て可視光領域に高い光透過性を有する熱硬化型のアクリ
ル樹脂（例えば、オプトマーＳＳ、日本合成ゴム製など
）が知られている（特開昭６１−２９２６０４号）。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a solid-state image sensor consisting of a liquid crystal display element, a CCD (charge coupled device), a BBD (packet coupled device), a CID (charge injection device), etc. 6 [Prior art] Regarding surface protection materials for color filters such as Curable acrylic resins (for example, Optomer SS, manufactured by Japan Synthetic Rubber, etc.) are known (Japanese Patent Application Laid-Open No. 61-292604).
［発明が解決しようとする課題］
ところが、最近の液晶表示素子や固体撮像素子の高解像
度化に対応して、カラーフィルター表面の平坦性が要求
されてきており、該熱硬化型アクリル樹脂では、カラー
フィルターの画素パターンを平坦化できないという問題
点があった。[Problems to be Solved by the Invention] However, in response to the recent increase in resolution of liquid crystal display elements and solid-state image sensors, flatness of the color filter surface has been required, and the thermosetting acrylic resin has There was a problem in that the pixel pattern of the color filter could not be flattened.
［課題を解決するための手段］
本発明者らは、液晶表示素子や固体撮像素子の高解像度
化を可能とする理想的な平坦性を有するカラーフィルタ
ーの表面保護材料について鋭意検討した結果、本発明に
達した。[Means for Solving the Problems] The present inventors have conducted extensive studies on surface protection materials for color filters that have ideal flatness that enables high resolution of liquid crystal display elements and solid-state image sensors, and have developed the present invention. Achieved invention.
すなはち本発明は、
スチレンまたはスチレン誘導体の単位と側鎖に光二量化
型および／または光重合型の官能基を含有する単位を有
する一般式（１）：
明ｍ書の浄書（内容に変更なし）
（式中、Ｒ＋およびＲ２は、水素原子またはメチル基、
Ｒｓは、光二量化型および／または光重合型の官能基を
含有する一価の有機基、Ａｒは、フェニル基またはナフ
チル基、ｍは、Ｏまたは１以上の整数、ｎは、 １以上
の整数。）
で示される重量平均分子量が５００〜１００００の有機
高分子すらなることを特徴とする表面保護材料である。In other words, the present invention provides general formula (1) having a unit of styrene or a styrene derivative and a unit containing a photodimerizable and/or photopolymerizable functional group in the side chain: None) (wherein R+ and R2 are a hydrogen atom or a methyl group,
Rs is a monovalent organic group containing a photodimerizable and/or photopolymerizable functional group, Ar is a phenyl group or a naphthyl group, m is O or an integer of 1 or more, and n is an integer of 1 or more. . ) It is a surface protection material characterized by comprising an organic polymer having a weight average molecular weight of 500 to 10,000.
一般式（１）において、Ｒａの光二量化型官能基を含有
する一価の有機基としては、
明＃ｉ書の浄書（内容に変更なし）
などのケイ皮酸含有基、
一〇〇〇Ｃ１１２ＣｌＩ２ ｏｃｏｃｕ＝ｃａ−ｃｏ：
ｃＨ＠−Ｃ［１２０ＣＯｆＪ＝ｆｌ：Ｈ−（Ｈ＝ＣＨ＠
などのシンナミリデン酢酸含有基、
−Ｇｏ−Ｃ■＝ｃｎ＠ 、
−ｃｏｏ＠ａｎ：ａトｃｏ＠
などのスチリルケトン含有基、
などのスチルベン含有基、
明細書の浄書（内容に変更なし）
などのα−フェニル含有基、
などのベンゾフェノン含有基などが挙げられる。In the general formula (1), the monovalent organic group containing a photodimerizable functional group of Ra is a cinnamic acid-containing group such as the engraving of Ming #i (no change in content), 1000C112ClI2 ococu=ca-co:
cH@-C[120COfJ=fl:H-(H=CH@
Cinnamylidene acetic acid-containing groups such as -Go-C■=cn@, styryl ketone-containing groups such as -coo@an:atoco@, stilbene-containing groups such as, engraving of the specification (no change in content), etc. Examples include α-phenyl-containing groups and benzophenone-containing groups such as .
Ｒｓの光重合型官能基を含有する一価の有機基としては
、
−ＣＯＯＣＨ２ＣＨ＝ＣＨｔ、
などのビニル含有基、
一０Ｏ０ＣＩＩ＊ＣＨ２０ＣＯＣＲ：（Ｒ２、−ＣＯＯ
ＣＩｈＣ１１＊０ＣＯＣ（（Ｈａ）Ｃ：ＣＨ２、ＣＨａ
ＯＣＯＣＲ＝ＣＨ２，
０ＣＯＮＨＣＨ２ＣＨ２０ＣＯＣ■＝ＣＨ２、明細書の
浄側内容に変更なし）
などのアクリル酸またはメタクリル酸含有基などが挙げ
られる。Monovalent organic groups containing a photopolymerizable functional group of Rs include vinyl-containing groups such as -COOCH2CH=CHt, 10O0CII*CH20COCR: (R2, -COO
CIhC11*0COC((Ha)C:CH2, CHa
Examples include acrylic acid- or methacrylic acid-containing groups such as OCOCR=CH2, 0CONHCH2CH20COC=CH2 (no change to the content of the specification).
Ｒ３の好ましいものは、 である。Preferred R3 are: It is.
ｒｒｈ ｎについては、通常ｍは、Ｏ〜９０ｔｎは、
１〜５０であり、好ましくは、ｍは、０〜６０１ｎは、
２０〜５０である。For rrh n, normally m is O~90tn,
1 to 50, preferably m is 0 to 601n,
It is 20-50.
ｍとｎの比は、通常、Ｏ：１００〜θＯ： １０、であ
り、好ましくは、ｏ：ｉｏｏ〜７０： ３０である。The ratio of m and n is usually O:100 to θO:10, preferably o:ioo to 70:30.
ｎの比率が、１０未満であれば、光硬化時の架橋密度が
少なく、耐熱性、耐薬品性が不充分となる。If the ratio of n is less than 10, the crosslinking density during photocuring will be low, resulting in insufficient heat resistance and chemical resistance.
明細書の浄書（内容に変更なし）
分子量は、通常５００〜ｔｏｏｏｏであり、好ましくは
、２０００〜８０ｏｏである。重量平均分子量が、５０
０未満であれば、光硬化物の耐熱性、耐薬品性が不充分
となる。また、重量平均分子量が１００００を越えると
加熱時の有機高分子の溶融レベリング性が不十分となり
、理想的な平坦面が得られにくくなる。Copying of the specification (no change in content) The molecular weight is usually 500-toooo, preferably 2000-80oo. Weight average molecular weight is 50
If it is less than 0, the heat resistance and chemical resistance of the photocured product will be insufficient. Furthermore, if the weight average molecular weight exceeds 10,000, the melt leveling properties of the organic polymer during heating will be insufficient, making it difficult to obtain an ideal flat surface.
一般式（１）で示される有機高分子の具体例としては、
（有機高分子１）重量平均分子量５０００ｍ：ｎ＝５０
：５０
（有機高分子２）重量平均分子量・８０００ｍ： ｎ
＝６０： ４０
（有機高分子３）
重量平均分子！昶ｏｏ。Specific examples of organic polymers represented by general formula (1) include (Organic polymer 1) Weight average molecular weight 5000m: n=50
:50 (Organic polymer 2) Weight average molecular weight・8000m: n
=60: 40 (Organic polymer 3) Weight average molecule!昶oo.
（有機高分子４）重量平均分子量７０００ｍ： ｎ＝１
０： ９０
などが挙げられる。(Organic polymer 4) Weight average molecular weight 7000m: n=1
Examples include 0:90.
一般式（１）で示される有機高分子の合成法としては、
ＢＦｓ−Ｅ ｔ＊ｏ１Ａ Ｉ Ｃ１＊ｓ Ｔ ｉ Ｃ
１ａ、などのルイス酸やＨ＊ＳＯａ、ＨＣｌ０ａ、ＣＦ
参〇００Ｈ，ｐ−）ルエンスルホン酸などのプロトン酸
によるカチオン重合法、ブチルリチウム、ナトリウム−
ナフタレン錯体などによるアニオン重合法、ベンゾイル
パーオキサイド、ジクミルノｆ−オキサイド、アゾビス
イソブチロニトリルなどのラジカル重合法または、高分
子反応法などがある。As a method for synthesizing the organic polymer represented by general formula (1),
BFs-E t*o1A I C1*s T i C
Lewis acids such as 1a, H*SOa, HCl0a, CF
〇00H, p-) Cationic polymerization method using protic acids such as luenesulfonic acid, butyllithium, sodium-
Examples include an anionic polymerization method using a naphthalene complex, a radical polymerization method using benzoyl peroxide, dicumyl f-oxide, azobisisobutyronitrile, etc., and a polymer reaction method.
本発明の表面保護材料は、一般式（１）で示される有機
高分子を芳香族炭化水素（トルエン、キシレンなど）、
エステル化合物（酢酸エチルセロソルブなど）などに溶
解して使用状態になるｉこの場合の固形物濃度はＭ量基
準で１０〜６０％である。The surface protection material of the present invention combines the organic polymer represented by the general formula (1) with aromatic hydrocarbons (toluene, xylene, etc.),
It is dissolved in an ester compound (ethyl cellosolve acetate, etc.) and ready for use. In this case, the solid concentration is 10 to 60% based on the amount of M.
本発明の表面保護材料の使用方法は、ＲＧＢの三色のカ
ラーフィルターのパターンを有するガラス基板上に一般
式（１）で示される有機高分子をスピン塗布、スプレー
塗布、ロールコート塗布、デイピング塗布、印刷塗布な
どにより膜厚０．５〜１０μｍとなるように塗布する。The method of using the surface protection material of the present invention includes spin coating, spray coating, roll coating, or dipping coating of an organic polymer represented by the general formula (1) on a glass substrate having a pattern of RGB three-color color filters. The coating is applied by printing or the like to a thickness of 0.5 to 10 μm.
続いて、該有機高分子膜を赤外ランプ、ホットプレート
、クリーンオーブンなどにより１００〜２５０℃で加熱
し、溶融流動させ平坦化面を得た後、該有機高分子膜の
耐熱性を向上させるために紫外線ランプまたは、遠紫外
線ランプで硬化させることによりカラーフィルター上に
理想的に平坦な表面保護膜が形成できる。Subsequently, the organic polymer film is heated at 100 to 250°C using an infrared lamp, hot plate, clean oven, etc. to melt and flow it to obtain a flattened surface, and then improve the heat resistance of the organic polymer film. Therefore, by curing with an ultraviolet lamp or deep ultraviolet lamp, an ideally flat surface protective film can be formed on the color filter.
［実施例］
以下、実施例により本発明を更に具体的に説明するが１
本発明の範囲はこれらの実施例によって限定されるもの
ではない。[Example] Hereinafter, the present invention will be explained in more detail with reference to Examples.
The scope of the invention is not limited by these examples.
実施例１
有機高分子１を１０ｇ、キシレンを４０ｇを混合しこれ
を孔径０．２μｍのフィルターで濾過した後、以ドの表
面保護材料用の組成物とした。Example 1 10 g of Organic Polymer 1 and 40 g of xylene were mixed and filtered through a filter with a pore size of 0.2 μm to prepare a composition for the following surface protection material.
第１図に示すように、３μｍの厚さを有するＲＧＢのカ
ラーフィルターパターンを有するガラス基板上に上記表
面保護材料用組成物の溶液を３０００回転で全面に回転
塗布した。塗布膜厚は、３μｍであった。（第２図）
次に、１５０°Ｃで５分間加熱処理を行い（第３図）、
続いて高圧水銀灯により紫外線を１分間照射し硬化を行
った。（第４図）
その結果、０．１μｍ以下に平坦化された表面保護膜層
が得られた。As shown in FIG. 1, a solution of the above-mentioned surface protection material composition was spin-coated on the entire surface of a glass substrate having an RGB color filter pattern having a thickness of 3 μm at 3000 revolutions. The coating film thickness was 3 μm. (Figure 2) Next, heat treatment was performed at 150°C for 5 minutes (Figure 3).
Subsequently, ultraviolet rays were irradiated for 1 minute using a high-pressure mercury lamp to effect curing. (FIG. 4) As a result, a surface protective film layer flattened to 0.1 μm or less was obtained.
また、この１摸は、可視光（４００〜８００ ｎ ｍ
）の透過率が、９８．０％以上で良好な透明性を示した
。In addition, this one sample uses visible light (400 to 800 nm
) had a transmittance of 98.0% or more, indicating good transparency.
さらに、ＩＴ○蒸着の加熱時にグラツク、着色等がなく
、ざらにＩＴＯエツチング時や配向膜塗布時に膜の膨潤
や溶解等がなく良好な耐熱性、耐薬品性を示した。Furthermore, there was no cracking or coloring during heating during IT○ vapor deposition, and there was no swelling or dissolution of the film during ITO etching or alignment film application, showing good heat resistance and chemical resistance.
［発明の効果］
本発明の表面保護材料は、カラーフィルター上に理想的
に平坦性な表面保護層を与え、さらに耐熱性、耐薬品性
また透明性とも良好であった。[Effects of the Invention] The surface protection material of the present invention provided an ideally flat surface protection layer on a color filter, and also had good heat resistance, chemical resistance, and transparency.
これは、液晶表示素子や固体撮像素子の高解像化に充分
対応できるものである。This can sufficiently correspond to higher resolution of liquid crystal display elements and solid-state image sensors.
第工〜４図は、本発明の表面保護材料の使用方法の説明
図（断面図）である。
１・・カラーフィルター
２・・ガラス基板
３・・塗布された表面保護材料
４・・加熱によりレベリングした表面保護材料１
・紫外線硬化した表面保護材料Figures 1 to 4 are explanatory diagrams (cross-sectional views) of the method of using the surface protection material of the present invention. 1. Color filter 2. Glass substrate 3. Coated surface protection material 4. Surface protection material leveled by heating 1. Surface protection material cured by ultraviolet rays.
Claims (1)
量化型および／または光重合型の官能基を含有する単位
を有する一般式（１）： ▲数式、化学式、表等があります▼（１） （式中、Ｒ＿１およびＲ＿２は、水素原子またはメチル
基、Ｒ＿３は、光二量化型および／または光重合型の官
能基を含有する一価の有機基、Ａｒは、フェニル基また
はナフチル基、ｍは、０または１以上の整数、ｎは、１
以上の整数、） で示される重量平均分子量が５００〜１００００の有機
高分子からなることを特徴とする表面保護材料。[Claims] 1 General formula (1) having a unit of styrene or a styrene derivative and a unit containing a photodimerizable and/or photopolymerizable functional group in the side chain: ▲ Includes mathematical formulas, chemical formulas, tables, etc. ▼(1) (In the formula, R_1 and R_2 are hydrogen atoms or methyl groups, R_3 is a monovalent organic group containing a photodimerizable and/or photopolymerizable functional group, and Ar is a phenyl group or naphthyl group. group, m is an integer of 0 or 1 or more, n is 1
A surface protection material comprising an organic polymer having a weight average molecular weight of 500 to 10,000 represented by the following integer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1319474A JPH03179401A (en) | 1989-12-08 | 1989-12-08 | Surface protective material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1319474A JPH03179401A (en) | 1989-12-08 | 1989-12-08 | Surface protective material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03179401A true JPH03179401A (en) | 1991-08-05 |
Family
ID=18110604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1319474A Pending JPH03179401A (en) | 1989-12-08 | 1989-12-08 | Surface protective material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03179401A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160037867A (en) | 2016-03-22 | 2016-04-06 | 주식회사 포스코 | HOT DIP Zn ALLOY PLATED STEEL SHEET HAVING EXCELLENT ANTI-CORROSION AND METHOD FOR MANUFACTURING THE STEEL SHEET USING THE SAME |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4915501A (en) * | 1972-06-02 | 1974-02-12 |
-
1989
- 1989-12-08 JP JP1319474A patent/JPH03179401A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4915501A (en) * | 1972-06-02 | 1974-02-12 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160037867A (en) | 2016-03-22 | 2016-04-06 | 주식회사 포스코 | HOT DIP Zn ALLOY PLATED STEEL SHEET HAVING EXCELLENT ANTI-CORROSION AND METHOD FOR MANUFACTURING THE STEEL SHEET USING THE SAME |
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