JPH0317888A - Storage device - Google Patents
Storage deviceInfo
- Publication number
- JPH0317888A JPH0317888A JP1151908A JP15190889A JPH0317888A JP H0317888 A JPH0317888 A JP H0317888A JP 1151908 A JP1151908 A JP 1151908A JP 15190889 A JP15190889 A JP 15190889A JP H0317888 A JPH0317888 A JP H0317888A
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- Prior art keywords
- bit line
- information
- potential
- storage
- storage device
- Prior art date
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- 239000003990 capacitor Substances 0.000 claims abstract description 26
- 210000000352 storage cell Anatomy 0.000 abstract description 16
- 230000010354 integration Effects 0.000 abstract description 6
- 210000004027 cell Anatomy 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- 230000003321 amplification Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 101100165885 Penicillium decumbens calC gene Proteins 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
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Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は1トランジスタ,lキャパシタにより構成され
た単位記憶セルに3値の情報を記憶するこ−ζが可能な
記憶装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a memory device capable of storing three-value information in a unit memory cell constituted by one transistor and one capacitor.
従来の技術
1トランジスタ,1キャパシタにより単位記憶セルを構
成した記憶装置、いわゆるダイナミック型記憶装置は、
単位記憶セルの構造が簡単で素子数が少なく高集積化に
適しており、微細加工技術の進展により、メガビットク
ラスのものが実現されている。Conventional technology A memory device in which a unit memory cell is composed of one transistor and one capacitor, a so-called dynamic memory device, is as follows.
The unit memory cell has a simple structure and a small number of elements, making it suitable for high integration, and advances in microfabrication technology have led to the realization of megabit-class memory cells.
以下に従来の記憶装置について説明する。第4図は従来
の記憶装置の記憶セルとその周辺の制御回路、第5図は
従来の記憶装置の読み出し時の制御信号のタイミング図
を示したものである。以下第4図のように構成された記
憶装置についてその動作を説明する。まず待機時には制
御信号ΦIが低レベルになりトランジスタQ+ ,Q2
.Q3がオン状態になり、ビット線BL,BLともビ
ット線プリチャージ電位VBp ( = 1/2Vcc
)に充電される。動作時には制御信号Φ1が高レベルに
なりトランジスタQ+ ,Q2 ,Q3はオフ状態にな
りワードl$WLが選択されてトランジスタQ4がオン
状態になり、ビット線BLと記憶セルキャパシタCOが
接続される。このとき、記憶情報蓄積部であるキャパシ
タ部には記憶情報“1”の場合には電源電位に相当する
電荷が、記憶情報“O”の場合には接地電位に相当する
電荷が蓄積されている。記憶セルキャパシタの対向電極
電位VCPを1/2Vcc、記憶セル容量をCsとする
と、蓄積電荷量は記憶情報“1”の場合1/2VccC
s、“O”の場合−1/2VccCsとなり、この電荷
がビット線容量をCBとすればca l Csの容量分
割で移動し、ビット線BLの電位に微小変位をもたらす
。一方、比較基準電位側のビット線BLの電位は1 /
2 Vccのままで変化しない。次に感知増幅器SA
を制御信号Φ2,Φ3により起動しビット線BL.BL
間の微小電位差を増幅した後、制御信号Φ10を高レベ
ルにして記憶情報がI/O線上に読み出される。A conventional storage device will be explained below. FIG. 4 shows a memory cell of a conventional memory device and its peripheral control circuit, and FIG. 5 shows a timing chart of control signals during reading of the conventional memory device. The operation of the storage device configured as shown in FIG. 4 will be explained below. First, during standby, the control signal ΦI becomes low level and the transistors Q+, Q2
.. Q3 turns on, and both bit lines BL and BL have a bit line precharge potential VBp (= 1/2Vcc
) is charged. During operation, the control signal Φ1 becomes high level, transistors Q+, Q2, and Q3 are turned off, word l$WL is selected, transistor Q4 is turned on, and the bit line BL and storage cell capacitor CO are connected. At this time, a charge corresponding to the power supply potential is accumulated in the capacitor section, which is the memory information storage section, in the case of the memory information "1", and a charge corresponding to the ground potential in the case of the memory information "O". . If the counter electrode potential VCP of the storage cell capacitor is 1/2Vcc and the storage cell capacitance is Cs, the amount of accumulated charge is 1/2VccC when the storage information is "1".
In the case of s, "O", the charge becomes -1/2VccCs, and if the bit line capacitance is CB, then this charge moves by dividing the capacitance of calCs, causing a slight displacement in the potential of the bit line BL. On the other hand, the potential of the bit line BL on the comparison reference potential side is 1/
2 It remains at Vcc and does not change. Next, sense amplifier SA
is activated by control signals Φ2 and Φ3, and bit lines BL. BL
After amplifying the minute potential difference between them, the control signal Φ10 is set to high level and the stored information is read onto the I/O line.
発明が解決しようとする課題
しかしながら上記従来の構成では、単位記憶セルキャパ
シタ部へ蓄積される記憶情報は“1”または“O”の2
値であり、1ビットの情報量しか記憶することができず
更なる高集積,大容量化を実現するには効率的でないと
いう問題点を有していた。Problems to be Solved by the Invention However, in the above-mentioned conventional configuration, the storage information stored in the unit storage cell capacitor section is ``1'' or ``O''.
It has the problem that it can only store 1 bit of information and is not efficient in achieving higher integration and larger capacity.
課題を解決するための手段
この目的を達成するために本発明の記憶装置は単位記憶
セルキャパシタ部に記憶情報として“1”情報である電
源電位、“O”情報である接地電位とは興なる第三の電
位に相当する電荷量を蓄積し、本記憶情報を上記“1”
,“0”の記憶情報と区別するための制御装置を備えた
構戒とするものである。Means for Solving the Problems In order to achieve this object, the memory device of the present invention has a unit storage cell capacitor section with a power supply potential representing "1" information and a ground potential representing "O" information as stored information. Accumulates the amount of charge corresponding to the third potential, and stores the main memory information as "1" above.
, "0" and is equipped with a control device to distinguish it from stored information.
作用
この構成により、単位記憶セルに3値の記憶情報を蓄積
することが可能となり、記憶装置の高集積,大容量化を
効率的に実現することができる。Effect: With this configuration, it is possible to store ternary storage information in a unit storage cell, and it is possible to efficiently achieve high integration and large capacity of a storage device.
実施例
以下、本発明の実施例について図面を参照しながら説明
する。第1図は本発明の実施例における記憶装置の記憶
セルとその周辺制御回路図、第2図は本発明の実施例に
おける記憶装置の読み出し時の制御信号のタイミング図
、第3図は本発明の実施例における記憶装置の再書き込
み動作制御回路図を示したものである。VBPはビット
線プリチャージ電位、VCPは記憶セルキャパシタ対向
電極電位、WLはワード線、BL.BLはビット線対、
Coは記憶セルキャパシタ、SA+ + SA2は感
較基準電位を発生するためのスイッチングトランジスタ
を制御するためのダミーワード線、CI,C2は比較基
準電位を発生するためのキャパシタ、I/O,I/Oは
データ線、Φ1はビット線プリチャージを行うための制
御信号、Φ2,Φ3,Φ6,Φ7は感知増幅器を起動す
るための制御信号、Φ4,Φ8は比較基準電位を発生す
るためのキャパシタ蓄積電荷を待機時に初期化するため
の制御信号、Φ5,Φ9は時分割感知増幅を行うための
転送ゲートをコントロールする制御信号、ΦIO+Φ1
!は感知増幅出力とデータ線とを接続するための制御信
号、Q+ ,Q2 .Q3はPチャネルMOSトランジ
ス夕、Q4・Qs, Qs , Q7・Q8・Q9 ,
Q+o・QllI Q+2. Q+3, QI4.
Q+s,Q+eはNチャネルMOSトランジスタ、VC
Cは電源電位、VSSは接地電位、lはΦ1発生回路、
2はΦ5発生回路である。EXAMPLES Hereinafter, examples of the present invention will be described with reference to the drawings. FIG. 1 is a diagram of a memory cell and its peripheral control circuit of a memory device according to an embodiment of the present invention, FIG. 2 is a timing chart of control signals during reading of a memory device according to an embodiment of the present invention, and FIG. 3 is a diagram of a control signal according to the present invention. 2 is a diagram showing a rewrite operation control circuit diagram of a storage device in an embodiment of the present invention. VBP is a bit line precharge potential, VCP is a storage cell capacitor counter electrode potential, WL is a word line, BL. BL is a bit line pair,
Co is a storage cell capacitor, SA+ + SA2 is a dummy word line for controlling a switching transistor for generating a sensing reference potential, CI and C2 are capacitors for generating a comparison reference potential, I/O, I/ O is a data line, Φ1 is a control signal for precharging the bit line, Φ2, Φ3, Φ6, Φ7 is a control signal for starting the sense amplifier, Φ4, Φ8 is a capacitor storage for generating a comparison reference potential. Control signals for initializing charges during standby, Φ5 and Φ9 are control signals for controlling transfer gates for time-division sensing amplification, ΦIO+Φ1
! are control signals for connecting the sense amplification output and the data line, Q+, Q2 . Q3 is a P-channel MOS transistor, Q4, Qs, Qs, Q7, Q8, Q9,
Q+o・QllI Q+2. Q+3, QI4.
Q+s, Q+e are N-channel MOS transistors, VC
C is the power supply potential, VSS is the ground potential, l is the Φ1 generation circuit,
2 is a Φ5 generation circuit.
つぎに本実施例の記憶装置についてその動作を説明する
。まず待機時には制御信号Φ1が低レベルになりトラン
ジスタQ+ .Q2 ,Q3がオン状態になり、ビッ
ト線BL,BLともビット線プリチャージ電位Vap
(= 1/2Vcc)に充電され、また制御信号Φ5,
Φ9は高レベルになりトランジスタQ9 . Q+a,
Ql1. Ql2がオンし感知増幅器の出力N+ .
N+ ,N2 ,N2 も初期状態1/2VCCとなる
。一方制御信号Φ4,Φ8は高レベルになりトランジス
タQs .Q7がオンしキャパシタC,は接地電位に相
当する電荷が、キャパシタC2には電源電位に相当する
電荷が蓄積されている。動作時には制御信号Φiが高レ
ベルになりトランジスタQ+ ,Q2 .Q3はオフ状
態になり、その後ワード線WLが選択されてトランジス
タQ4がオン状態になり、ビット線BLと記憶セルキャ
パシタCoが接続される。このとき、記憶情報蓄積部で
あるキャパシタ部には記憶情報“1”の場合には電源電
位に相当する電荷が、記憶情報“O”の場合には接地電
位に相当する電荷が、記憶情報“1”,“0”とは異な
る場合(記憶情報“1/2”と称することにする)には
電源電位の半分1/2Vccに相当する電荷が蓄積され
ている。Next, the operation of the storage device of this embodiment will be explained. First, during standby, the control signal Φ1 becomes low level and the transistor Q+. Q2 and Q3 turn on, and both bit lines BL and BL reach the bit line precharge potential Vap.
(= 1/2Vcc), and control signals Φ5,
Φ9 becomes high level and transistor Q9. Q+a,
Ql1. Ql2 is turned on and the sense amplifier output N+ .
N+, N2, and N2 also have an initial state of 1/2VCC. On the other hand, the control signals Φ4, Φ8 become high level, and the transistors Qs. When Q7 is turned on, a charge corresponding to the ground potential is accumulated in the capacitor C, and a charge corresponding to the power supply potential is accumulated in the capacitor C2. During operation, the control signal Φi goes high and the transistors Q+, Q2 . Q3 is turned off, and then word line WL is selected, transistor Q4 is turned on, and bit line BL and storage cell capacitor Co are connected. At this time, the capacitor section which is the storage information storage section has a charge corresponding to the power supply potential when the storage information is "1", and a charge corresponding to the ground potential when the storage information is "O". If the information is different from ``1'' and ``0'' (hereinafter referred to as storage information ``1/2''), a charge corresponding to 1/2 Vcc, which is half of the power supply potential, is accumulated.
記憶セルキャパシタの対向電極電位vcpを1/21/
2Vcc,記憶セル容量をCsとすると、蓄積電荷量は
記憶情報“1”の場合1/2VccCs“0”の場合−
1/2VccCs “1/2”の場合Oとなり、こ
の電荷がビット線容量をCBとすれば、CB . cs
の容量分割で移動し、ビット線BLの電位は“1”の場
合1/2Vcc+Cs Vcc/2 (Co +cs
)、“O”の場合1/2Vcc−CS VCC/2 (
Cn+Cs)と変化し、“1/2”の場合には1/2V
ccのままで変化しない。一方、ワード*WLが選択さ
れるのと同時にダミーワード線D W L +が選択さ
れ比較基準電位側のビットIBLの電位は、キャパシタ
C!の容量を1/2Csとすると−1/4VccCsの
蓄積電荷がCOとの容量分割で移動し、1/2Vcc−
Cs Vcc/4 (Cs +Cs )になる。つぎに
制御信号Φ6を低レベルにしてビット線と感知増幅器S
A+ を切り離した後、制御信号Φ2,Φ3によりSA
+ を起動し微小電位差を増幅することにより,記憶情
報“1”2 “1/2”は電源電位Vccとして、記憶
情報“0”は接地電位としてN1に出力される。つぎに
ダミーワード&il D W L 2が選択され比較基
準電位側のビット線BLの電位は、キャパシタC2の容
量をCsとすれば1/2VccCsの蓄積電荷がCBと
の容量分割で移動し、l/2Vcc+Cs VCC/4
(CB +CS )になる。この後、制御信号Φ9を
低レベルにしてビット線と感知増幅器SA2を切り離し
た後、制御信号Φ6.Φ7によりSA2を起動し微小電
位差を増幅することによ、記憶情報“1”は電源電位V
CCとして、記憶情報“0”,“1/2”は接地電位と
してN2に出力される。記憶情報のI/O線上への読み
出しは制御信号Φ10,Φ■を順次高レベルにすること
により実現される。記憶情報の再書き込みは動作はワー
ド線が低レベルになる前に、SA+とSA2の出力Nl
,N2を比較して排他的論理和をとり、その結果が“1
”の時(紀憶情報が“1”あるいは“O”の時)は制御
信号Φ5を高レベルにすることにより、また“O”の時
(紀憶情報が“1/2”の時)は制御信号Φ1を低レベ
ルにすることにより実現される。The counter electrode potential vcp of the memory cell capacitor is set to 1/21/
2Vcc, and the storage cell capacity is Cs, the amount of accumulated charge is 1/2VccCs when the storage information is "1" and - when the storage information is "0".
If 1/2VccCs is "1/2", it becomes O, and if this charge represents the bit line capacitance as CB, then CB. cs
The potential of the bit line BL is 1/2Vcc+Cs Vcc/2 (Co+cs
), “O” 1/2Vcc-CS VCC/2 (
Cn+Cs), and in the case of "1/2", 1/2V
It remains cc and does not change. On the other hand, at the same time that word *WL is selected, dummy word line D W L + is selected, and the potential of bit IBL on the comparison reference potential side is set to capacitor C! If the capacitance of CO is 1/2Cs, the accumulated charge of -1/4VccCs moves by capacitance division with CO, and becomes 1/2Vcc-
Cs Vcc/4 (Cs + Cs). Next, set the control signal Φ6 to low level and connect the bit line and sense amplifier S.
After disconnecting A+, SA is set by control signals Φ2 and Φ3.
By activating + and amplifying the minute potential difference, the stored information "1" 2 "1/2" is outputted to N1 as the power supply potential Vcc, and the stored information "0" is outputted as the ground potential. Next, the dummy word &il D W L 2 is selected, and the potential of the bit line BL on the comparison reference potential side is determined by the fact that if the capacitance of the capacitor C2 is Cs, the accumulated charge of 1/2 VccCs moves by capacitance division with CB, and /2Vcc+Cs VCC/4
(CB + CS). Thereafter, the control signal Φ9 is set to low level to disconnect the bit line and the sense amplifier SA2, and then the control signal Φ6. By starting SA2 with Φ7 and amplifying the minute potential difference, the stored information "1" is stored at the power supply potential V.
As a CC, stored information "0" and "1/2" are outputted to N2 as a ground potential. Reading of stored information onto the I/O line is achieved by sequentially setting the control signals Φ10 and Φ■ to high level. To rewrite stored information, the output Nl of SA+ and SA2 is activated before the word line becomes low level.
, N2 and perform exclusive OR, and the result is “1”.
” (when the memory information is “1” or “O”), by setting the control signal Φ5 to high level, and when it is “O” (when the memory information is “1/2”), This is achieved by setting the control signal Φ1 to a low level.
発明の効果
以上のように本発明によれば記憶セルキャパシタ部に記
憶情報として“1”情報である電源電位、または“O”
情報である接地電位とは異なる第三の電位に相当する電
荷量を蓄積し、本記憶情報を上記“1”,“O”の記憶
情報と区別するための制御装置を備えた構成とすること
により単位記憶セルに3値の記憶情報を蓄積することが
可能となり、高集積,大容量化を効率的に実現できる記
憶装置が得られる。Effects of the Invention As described above, according to the present invention, the storage cell capacitor section is supplied with a power supply potential which is "1" information or "O" as stored information.
The configuration includes a control device for accumulating a charge amount corresponding to a third potential different from the ground potential that is information and distinguishing this stored information from the above-mentioned "1" and "O" stored information. This makes it possible to store ternary storage information in a unit storage cell, and provides a storage device that can efficiently achieve high integration and large capacity.
第1図は本発明の実施例における記憶装置の記憶セルと
その周辺制御回路図、第2図は本発明の実施例における
記憶装置の読み出し時の制御信号のタイミング図、第3
図は本発明の実施例における記憶装置の再書き込み動作
制御回路図、第4図信号のダイミング図である。
vsp・・・・・・ビット線プリチャージ電位、VCP
・・・・・・記憶セルキャパシタ対向電極電位、WL・
・・・・・ワード線、BL,BL・・・・・・ビット線
対、Co ・・・・・・記憶セルキャパシタ、SAI,
SA2・・・・・・感知増幅器、号、Φ5,Φ9・・・
・・・時分割感知増幅を行うための転送ゲートをコント
ロールする制御信号、Φ10,ΦI1・・・・・・感知
増幅出力とデータ線とを接続するための制御信号、Q+
,Q2 ,Q3・・・・・・PチャネルM O S
トランジスタ、Q4. Qs. Q61 Q71 Q8
,Qs , Q+o. Qll, Ql2, Ql3I
Q+4. Q+5.Q+e・・・・・・NチャネルM
OS トランジスタ、VCC・・・・・・・・・電源電
位、VSS・・・・・・接地電位、l・・・・・・ΦI
発生回路、2・・・・・・Φ5発生回路。FIG. 1 is a diagram of a memory cell of a memory device and its peripheral control circuit in an embodiment of the present invention, FIG. 2 is a timing chart of control signals during reading of a memory device in an embodiment of the present invention, and FIG.
The figure is a rewrite operation control circuit diagram of a storage device in an embodiment of the present invention, and FIG. 4 is a signal dimming diagram. vsp・・・Bit line precharge potential, VCP
...Memory cell capacitor counter electrode potential, WL・
...Word line, BL, BL...Bit line pair, Co...Storage cell capacitor, SAI,
SA2...Sense amplifier, No., Φ5, Φ9...
... Control signal for controlling the transfer gate for time-division sense amplification, Φ10, ΦI1 ... Control signal for connecting the sense amplification output and the data line, Q+
,Q2,Q3...P channel MOS
Transistor, Q4. Qs. Q61 Q71 Q8
, Qs, Q+o. Qll, Ql2, Ql3I
Q+4. Q+5. Q+e...N channel M
OS transistor, VCC......power supply potential, VSS...ground potential, l...ΦI
Generation circuit, 2...Φ5 generation circuit.
Claims (4)
端をキャパシタ部に他端をビット線に接続して単位記憶
セルを構成し、キャパシタ部に記憶情報として“1”情
報である電源電位、または“0”情報である接地電位と
は異なる第三の電位に相当する電荷量を蓄積し、本記憶
情報を上記“1”、“0”の記憶情報と区別するための
制御装置を備えたことを特徴とする記憶装置。(1) One end of a word selection switching MOS transistor is connected to a capacitor part and the other end to a bit line to form a unit memory cell, and the capacitor part has a power supply potential that is "1" information or "0" information as stored information. It is characterized by comprising a control device for accumulating an amount of charge corresponding to a third potential different from the ground potential, and for distinguishing the main storage information from the above-mentioned storage information of "1" and "0". Storage device.
するため、スイッチングMOSトランジスタの一端をキ
ャパシタ部に他端をビット線に接続した制御回路を2組
搭載し、2個のキャパシタ部の他端はそれぞれ電源電位
、接地電位としキャパシタ部容量値は一方を上記単位記
憶セルと同一に他方を上記単位記憶セルの1/2に設定
する構成としたことを特徴とする特許請求の範囲第1項
記載の記憶装置。(2) In order to generate a comparison reference potential for each bit line, the control device is equipped with two sets of control circuits in which one end of a switching MOS transistor is connected to a capacitor section and the other end is connected to a bit line. The other end is set to a power supply potential and a ground potential, respectively, and the capacitance value of the capacitor part is set to be the same as the unit memory cell at one end and 1/2 of the unit memory cell at the other end. The storage device according to item 1.
路を時分割動作させて発生したビット線対間の微小電位
差を各ビット線対毎に転送ゲートを介した2組の感知増
幅器により増幅し、本出力状態により3値記憶情報を識
別する構成としたことを特徴とする特許請求の範囲第1
項記載の記憶装置。(3) The control device operates the two sets of comparison reference potential generation control circuits in a time-division manner to generate minute potential differences between the bit line pairs using two sets of sense amplifiers via transfer gates for each bit line pair. Claim 1 characterized in that the ternary storage information is amplified and the ternary storage information is identified based on the output state.
Storage device described in section.
組の感知増幅器にラッチされた電位情報により感知増幅
器、ビット線対間に設けた転送ゲートおよびビット線プ
リチャージ開始タイミングを制御する構成としたことを
特徴とする特許請求の範囲第1項記載の記憶装置。(4) During the rewrite operation associated with the read operation, the above 2.
Claim 1, characterized in that the sense amplifier, the transfer gate provided between the bit line pair, and the bit line precharge start timing are controlled by potential information latched in the sense amplifier pair. Storage device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1151908A JPH0317888A (en) | 1989-06-14 | 1989-06-14 | Storage device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1151908A JPH0317888A (en) | 1989-06-14 | 1989-06-14 | Storage device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0317888A true JPH0317888A (en) | 1991-01-25 |
Family
ID=15528823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1151908A Pending JPH0317888A (en) | 1989-06-14 | 1989-06-14 | Storage device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0317888A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60239994A (en) * | 1984-05-15 | 1985-11-28 | Seiko Epson Corp | Multivalued dynamic random access memory |
JPS62192999A (en) * | 1986-02-18 | 1987-08-24 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Sensing circuit for multiplex level memory |
JPS63195897A (en) * | 1987-02-06 | 1988-08-12 | Mitsubishi Electric Corp | Dynamic ram device for multivalued storage |
-
1989
- 1989-06-14 JP JP1151908A patent/JPH0317888A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60239994A (en) * | 1984-05-15 | 1985-11-28 | Seiko Epson Corp | Multivalued dynamic random access memory |
JPS62192999A (en) * | 1986-02-18 | 1987-08-24 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Sensing circuit for multiplex level memory |
JPS63195897A (en) * | 1987-02-06 | 1988-08-12 | Mitsubishi Electric Corp | Dynamic ram device for multivalued storage |
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