JPH0317655A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPH0317655A JPH0317655A JP15051689A JP15051689A JPH0317655A JP H0317655 A JPH0317655 A JP H0317655A JP 15051689 A JP15051689 A JP 15051689A JP 15051689 A JP15051689 A JP 15051689A JP H0317655 A JPH0317655 A JP H0317655A
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- layer
- sensitive body
- surface protective
- electrophotographic sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011241 protective layer Substances 0.000 claims abstract description 32
- 239000010410 layer Substances 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 11
- 229920005989 resin Polymers 0.000 claims abstract description 11
- 239000011347 resin Substances 0.000 claims abstract description 11
- 239000011230 binding agent Substances 0.000 claims abstract description 10
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 9
- 229920000402 bisphenol A polycarbonate polymer Polymers 0.000 claims abstract description 4
- 108091008695 photoreceptors Proteins 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 5
- 239000004431 polycarbonate resin Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 2
- 238000010030 laminating Methods 0.000 abstract description 3
- 238000005507 spraying Methods 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 229910001111 Fine metal Inorganic materials 0.000 abstract description 2
- 230000006866 deterioration Effects 0.000 abstract 2
- 238000003618 dip coating Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- -1 nitrate ions Chemical class 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- FKNIDKXOANSRCS-UHFFFAOYSA-N 2,3,4-trinitrofluoren-1-one Chemical compound C1=CC=C2C3=C([N+](=O)[O-])C([N+]([O-])=O)=C([N+]([O-])=O)C(=O)C3=CC2=C1 FKNIDKXOANSRCS-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical group C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229920000715 Mucilage Polymers 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910001370 Se alloy Inorganic materials 0.000 description 1
- 229910018110 Se—Te Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 210000004013 groin Anatomy 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は電子写真用感光体に関し、詳しくは特定の表面
保護層を設けた電子写真用感光体に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an electrophotographic photoreceptor, and more particularly to an electrophotographic photoreceptor provided with a specific surface protective layer.
[従来の技術]
従来、竃子写真用感光体としては、導電性支持体上にセ
レンまたはセレン合金を主体とする光導電層を設けたも
の、酸化亜鉛、硫化カドミウムなどの無機光導電材料を
バインダー中に分散させたもの、ポリーN−ビニル力ル
バゾールとトリニトロフルオレノン或いはアゾ顔料など
の有機光導電材料を用いたもの及び非品質シリコンを用
いたもの等が一般に知られている。[Prior Art] Conventionally, photoreceptors for frame photography have been prepared by providing a photoconductive layer mainly made of selenium or selenium alloy on a conductive support, or by using inorganic photoconductive materials such as zinc oxide or cadmium sulfide. Some methods are generally known, such as those dispersed in a binder, those using organic photoconductive materials such as poly-N-vinyl rubazole and trinitrofluorenone or azo pigments, and those using non-quality silicone.
これらの感光体に対して長時間高画質を保つ信頼性の要
求が年々高まっている。しかし光導電層が露出している
場合、帯電過程のコロナ放電による損傷と複写プロセス
で受ける他部材との接触による物理的あるいは化学的な
損傷が感光体の寿命を損うものであった。The demand for the reliability of these photoreceptors to maintain high image quality over a long period of time is increasing year by year. However, when the photoconductive layer is exposed, damage caused by corona discharge during the charging process and physical or chemical damage caused by contact with other members during the copying process shorten the life of the photoreceptor.
このような欠点を解消する方法として感光体表面に保護
層を設ける技術が知られている。具体的には感光層の表
面に有機フィルムを設ける方広(特公昭38− 154
46)、無機酸化物を設ける方広(特公昭43− 14
517)、接着層を設けた後絶縁層を積層する方法(特
公昭43− 27591)、或いはプラズマCVD法、
光CVD法等によってa−Si層、a−Si:N:H層
、a−St:O:H層等を積層する方法(特開昭57−
179859、特開昭59− 58437)が開示さ
れている。As a method for eliminating such drawbacks, a technique is known in which a protective layer is provided on the surface of the photoreceptor. Specifically, Hohiro (Special Publication No. 38-154), which provided an organic film on the surface of the photosensitive layer,
46), Hohiro who provides an inorganic oxide (Special Publication Publication No. 43-14)
517), a method of laminating an insulating layer after providing an adhesive layer (Japanese Patent Publication No. 43-27591), or a plasma CVD method,
A method of laminating a-Si layer, a-Si:N:H layer, a-St:O:H layer, etc. by photo-CVD method etc.
179859, Japanese Patent Application Laid-Open No. 59-58437).
しかしながら保護層が電子写真的に高抵抗(10I4Ω
・CI1以上)になると、残留電位の増大、繰返し時の
蓄積等が問題となり、実用上好ましくない。However, the protective layer has a high electrophotographic resistance (10I4Ω
- CI1 or higher) causes problems such as an increase in residual potential and accumulation during repetition, which is undesirable from a practical standpoint.
上記欠点を補う技術として保護層を光導電層とする方法
(特公昭48−38427 、特公昭43一18198
、特公昭48− 10258 、米国特許第2901
348)、保護層中に色素やルイス酸に代表される移動
剤を添加する方法(特公昭44− 834、特開昭53
−133444) 、或いは金属や金属酸化物微粒子の
添加により保護層の抵抗を制御する方法(特開昭53−
3338)等が提案されている。A method of using a photoconductive layer as a protective layer as a technique to compensate for the above drawbacks (Japanese Patent Publication No. 48-38427, Japanese Patent Publication No. 43-18198)
, Special Publication No. 48-10258, U.S. Patent No. 2901
348), a method of adding a transfer agent such as a dye or a Lewis acid into the protective layer (Japanese Patent Publication No. 44-834, Japanese Patent Application Laid-Open No. 1986-53)
-133444), or a method of controlling the resistance of a protective layer by adding metal or metal oxide fine particles (Japanese Patent Application Laid-open No. 1983-133-
3338) etc. have been proposed.
しかし、このような場合には保護層による光の吸収が生
じ感光層へ到達する光量が減少するため結果として、感
光体の感度が低下するという問題が生じる。However, in such a case, light is absorbed by the protective layer and the amount of light reaching the photosensitive layer is reduced, resulting in a problem that the sensitivity of the photoreceptor is reduced.
このような観点から特開昭57− 30846に提案さ
れているように平均粒径0.3μ茂以下の金属酸化物微
粒子を抵抗制御剤として保護層中に分散させることによ
り、可祖先に対し実質的に透明にする方法がある。これ
らの保護層を持った感光体は感度低下も少く、保護層の
機械的強度も増し、耐久性が向上する。しかし長期使用
した場合、高湿あるいは急激な湿度変化の環境下で画像
流れが生ずるという欠点を持つことが判明した。From this point of view, as proposed in JP-A No. 57-30846, by dispersing fine metal oxide particles with an average particle size of 0.3 μm or less as a resistance control agent in the protective layer, it is possible to substantially reduce the There is a way to make it transparent. A photoreceptor having such a protective layer has less decrease in sensitivity, has increased mechanical strength of the protective layer, and has improved durability. However, it has been found that when used for a long period of time, it has the disadvantage that image deletion occurs in environments with high humidity or rapid changes in humidity.
これはコロナ放電により生成する放電生成物(硝酸イオ
ン、アンモニウムイオン等)が保護層表面に吸着され、
この放電生成物が大気中の水分を吸湿すると保護層表面
方向の電気抵抗が低下し静電??I像が維持できなくな
ってしまうためである。この画像流れを防止する方法と
して特開昭02− 295008に提案されているよう
に保護層に分散する金属及び金属酸化物微粉末を撥水処
理する方法が提案されているが効果が充分でなく、残留
電位が上昇する等の副作用が生じる。This is because discharge products (nitrate ions, ammonium ions, etc.) generated by corona discharge are adsorbed on the surface of the protective layer.
When this discharge product absorbs moisture from the atmosphere, the electrical resistance toward the surface of the protective layer decreases, resulting in static electricity? ? This is because the I image cannot be maintained. As a method for preventing this image blurring, a method of water-repellent treatment of metal and metal oxide fine powder dispersed in the protective layer has been proposed, as proposed in JP-A-295008/1985, but the effect is not sufficient. , side effects such as an increase in residual potential occur.
又、特開昭63− 43182に開示されているように
水の接触角が80°以上の結着樹脂を主成分とする保護
層が提案され、結着樹脂としてポリエチレン、ポリブチ
レン、ボリスチレン、フッ素樹脂、ポリアクリレート、
ポリカーボネート等が開示されているが効果が充分でな
く、いまだ、この問題を解決すべき技術は完成されてい
ない。Furthermore, as disclosed in JP-A No. 63-43182, a protective layer mainly composed of a binder resin having a water contact angle of 80° or more has been proposed, and the binder resin may be polyethylene, polybutylene, polystyrene, or fluororesin. , polyacrylate,
Although polycarbonate and the like have been disclosed, they are not sufficiently effective, and no technology to solve this problem has been completed yet.
[発明が解決しようとする課題]
本発明は高い透明性、磯城的強度を備え高湿時に画像流
れによる解像度の低下のおきない安定な保護層を設ける
ことにより高画質かつ耐久性のある電子写真感光体を提
供しようとするものである。[Problems to be Solved by the Invention] The present invention provides electrophotography with high image quality and durability by providing a stable protective layer that has high transparency and strong strength and does not cause a decrease in resolution due to image blurring in high humidity. The purpose is to provide a photoreceptor.
[課題を解決するための手段]
前記課題を解決するための本発明の構成は、特許請求の
範囲に記載のとおり、導電性支持体上に光導電層とその
表面保護層を有し、表面保護層の材料が金属あるいは金
属酸化物の微粉末が分散している結着樹脂である電子写
真用感光体において、結着樹脂が下記一般式で示される
ビスフェノールAポリカーボネート樹脂であることを特
徴とする電子写真用感光体である。[Means for Solving the Problems] The structure of the present invention for solving the problems described above has a photoconductive layer and a surface protective layer on a conductive support, as described in the claims. An electrophotographic photoreceptor in which the material of the protective layer is a binder resin in which fine powder of metal or metal oxide is dispersed, characterized in that the binder resin is a bisphenol A polycarbonate resin represented by the following general formula. This is a photoreceptor for electrophotography.
一般式 ただし、 nは50〜400の整数である。general formula however, n is an integer from 50 to 400.
本発明に用いられる金属あるいは金属酸化物微粉末とし
ては、銅、スズ、アルミニウム、インジウム等の金属、
あるいは酸化スズ、酸化亜鉛、酸化チタン、酸化インジ
ウム、酸化アンチモン、酸化ビスマス、アンチモンをド
ーブした酸化スズ、スズをドープした酸化インジウム等
の金属酸化物微粉末をもちいることができる。The metal or metal oxide fine powder used in the present invention includes metals such as copper, tin, aluminum, and indium;
Alternatively, metal oxide fine powders such as tin oxide, zinc oxide, titanium oxide, indium oxide, antimony oxide, bismuth oxide, antimony-doped tin oxide, and tin-doped indium oxide can be used.
これらの金属あるいは金属酸化物微粉末は2種以上混合
してもかまわない。これら微粉末の平均拉径は0.3μ
m以下好ましくは0.1μm以下であることが保護層の
透過率の点から好ましい。Two or more of these metal or metal oxide fine powders may be mixed. The average diameter of these fine powders is 0.3μ
m or less, preferably 0.1 μm or less, from the viewpoint of transmittance of the protective layer.
保護層の固有抵抗は10’〜1o1〕Ωcanであり、
膜厚は0.5〜30μm1好ましくはl−10μmであ
る。この厚さが0.5μm未満では保護層の機械的強度
が弱く、かつ耐摩粍性が小さく、長期の使用に対して保
護層の効果がなくなり、30μmを超えると保護層中に
電GIが蓄積されくり返し使用時に残留電位が増大する
。The specific resistance of the protective layer is 10' to 1o1]Ωcan,
The film thickness is 0.5 to 30 μm, preferably 1-10 μm. If the thickness is less than 0.5 μm, the mechanical strength of the protective layer will be weak and the abrasion resistance will be low, making the protective layer ineffective for long-term use, and if it exceeds 30 μm, electrical GI will accumulate in the protective layer. Residual potential increases when used repeatedly.
この保護層は上記ポリカーボネート樹脂中に金属あるい
は金属酸化物微粉末を混合もしくは分散し、光導電層上
にディッピングもしくはスプレー塗布し、あるいはフィ
ルム状にした後接着することにより形成される。This protective layer is formed by mixing or dispersing metal or metal oxide fine powder in the polycarbonate resin, dipping or spray coating on the photoconductive layer, or forming the mixture into a film and then adhering it.
さらに光導電層としてはSe,Se−Te,AS2Se
)等のSe合金、ZnO,CdS,CdSe等のII−
Vl族化合物の粒子を樹脂に分散させたもの、ポリビニ
ルカルバゾール等の有機光導電材料あるいはa−Si等
が用いられる。Furthermore, as a photoconductive layer, Se, Se-Te, AS2Se can be used.
), etc., II- such as ZnO, CdS, CdSe, etc.
Used are particles of a Vl group compound dispersed in a resin, an organic photoconductive material such as polyvinylcarbazole, or a-Si.
光導電層の構成は特に制約がなく、単層でも電荷発生層
と電荷輸送層の積層であってもかまわない。There are no particular restrictions on the structure of the photoconductive layer, and it may be a single layer or a stack of a charge generation layer and a charge transport layer.
さらに保護層と光導電層との間に密着性を高めるための
接着層や電荷注入を阻止するための電気的バリアー層を
設けてもよい。Further, an adhesive layer for increasing adhesion and an electrical barrier layer for preventing charge injection may be provided between the protective layer and the photoconductive layer.
導電性支持体としては導電体あるいは導電処理をした絶
縁体が用いられる。たとえばA1、Ni,Fe,Cu,
Auなどの金属あるいは合金、ポリエステル、ポリカー
ボネート、ポリイミド、ガラス等の絶縁性基体上にAI
,Ag,Au等の金属あるいはIn203、Sn02等
の導電材料の薄膜を形戊したもの、導電処理をした紙等
が例示できる。As the conductive support, a conductor or an insulator treated for conductivity is used. For example, A1, Ni, Fe, Cu,
AI on an insulating substrate such as metal or alloy such as Au, polyester, polycarbonate, polyimide, glass, etc.
Examples include thin films of metals such as , Ag, and Au, or conductive materials such as In203 and Sn02, and paper that has been subjected to conductive treatment.
また導電性支持体の形状は特に制約はなく、必要に応じ
て板状、ドラム状、ベルト状のものが用いられる。Further, there are no particular restrictions on the shape of the conductive support, and plate-like, drum-like, or belt-like ones may be used as required.
以下本発明に於ける実施刈を示す。The actual cutting in the present invention will be shown below.
[実施例]
アルミニウム素管(80■φX 340IIIIL )
を前処理(洗浄)を施した後、真空蒸着装置内にセツト
し、AszSe3合金を支持体上の膜厚が60μmにな
るように下記条件で抵抗加熱蒸着を行い光導電層を作製
した。[Example] Aluminum raw tube (80■φX 340IIIL)
After pretreatment (cleaning), the substrate was placed in a vacuum evaporation apparatus, and the AszSe3 alloy was subjected to resistance heating evaporation under the following conditions so that the film thickness on the support was 60 μm, thereby producing a photoconductive layer.
蒸着条件
真空度3X to’ Torr
支持体温度 200℃
ボート温度 450℃
次にこの光導電層上にシリコーン樹脂(東レシリコーン
社v AY42−441)のりグロイン溶液を乾燥後の
厚さが0.2μ信になるように塗布し中間層を作製した
。Vapor deposition conditions Vacuum degree: 3X to' Torr Support temperature: 200°C Boat temperature: 450°C Next, a silicone resin (Toray Silicone Co., Ltd. v AY42-441) glue groin solution was applied to the photoconductive layer so that the thickness after drying was 0.2 μm. An intermediate layer was prepared by applying the following coatings to form an intermediate layer.
さらにこの上に下記構造式(1)で示されるビスフェノ
ールA1ポリカーボネート樹脂5重量部と酸化スズ3重
量部とシクロヘキサノン12oTIlffffi部を加
えボールミルで100時間分散した分散岐とした。Furthermore, 5 parts by weight of bisphenol A1 polycarbonate resin represented by the following structural formula (1), 3 parts by weight of tin oxide, and 12 parts by weight of cyclohexanone were added thereto, and dispersed in a ball mill for 100 hours to obtain a dispersion branch.
さらにこの分散液にジクロルメタンを40重量部加え、
スプレー塗工にて塗布し3μmの保護層を設けて電子写
真感光体とした。Furthermore, 40 parts by weight of dichloromethane was added to this dispersion,
A 3 μm protective layer was applied by spray coating to prepare an electrophotographic photoreceptor.
ただしnは約150
比較例
結着樹脂を下記構追式(II)で示されるビスフェノー
ルZポリカーボネート樹脂にかえた他は丈施例と全く同
様にして感光体を作製した。However, n is approximately 150.A photoreceptor was prepared in the same manner as in the Example, except that the binder resin of Comparative Example was replaced with a bisphenol Z polycarbonate resin represented by the following structural formula (II).
ただし、nは約350
上記のようにして得た本発明の感光体と比較用の感光体
を用いて30℃、9a%の環境下で複写枚数10000
0枚の画像テストを行い解像力を5・ト価した。これら
の粘果を表1に示す。However, n is approximately 350. Using the photoreceptor of the present invention obtained as described above and the photoreceptor for comparison, the number of copies was 10,000 at 30°C and 9a% environment.
A 0-image test was conducted and the resolution was rated at 5. These mucilages are shown in Table 1.
表1
この結果より本発明は高温、高湿下の環境に於いて解像
力の低下を引き起こすことがなく、良好な画像特性を示
すことがわかる。Table 1 From these results, it can be seen that the present invention exhibits good image characteristics without causing a decrease in resolution in an environment of high temperature and high humidity.
[発明の効果]
以上説明したように、本発明によれば長期の使用に際し
高湿下で生じる画像流れを防止でき信頼性の高い保護層
を持つ電子写真用感光体が得られる。[Effects of the Invention] As described above, according to the present invention, it is possible to obtain an electrophotographic photoreceptor having a highly reliable protective layer that can prevent image fading that occurs under high humidity during long-term use.
Claims (1)
面保護層の材料が金属あるいは金属酸化物の微粉末が分
散している結着樹脂である電子写真用感光体において、
結着樹脂が下記一般式で示されるビスフェノールAポリ
カーボネート樹脂であることを特徴とする電子写真用感
光体。 一般式 ▲数式、化学式、表等があります▼ ただし、 nは50〜400の整数である。[Scope of Claims] Electrophotography comprising a photoconductive layer and its surface protective layer on a conductive support, and the material of the surface protective layer is a binder resin in which fine powder of metal or metal oxide is dispersed. In the photoreceptor for
A photoreceptor for electrophotography, characterized in that the binder resin is a bisphenol A polycarbonate resin represented by the following general formula. General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ However, n is an integer from 50 to 400.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15051689A JPH0317655A (en) | 1989-06-15 | 1989-06-15 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15051689A JPH0317655A (en) | 1989-06-15 | 1989-06-15 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0317655A true JPH0317655A (en) | 1991-01-25 |
Family
ID=15498569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15051689A Pending JPH0317655A (en) | 1989-06-15 | 1989-06-15 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0317655A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109153846A (en) * | 2016-05-27 | 2019-01-04 | 出光兴产株式会社 | Resin composition, electrophotographic photoreceptor, and electrophotographic apparatus |
-
1989
- 1989-06-15 JP JP15051689A patent/JPH0317655A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109153846A (en) * | 2016-05-27 | 2019-01-04 | 出光兴产株式会社 | Resin composition, electrophotographic photoreceptor, and electrophotographic apparatus |
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