JPH0317393B2 - - Google Patents
Info
- Publication number
- JPH0317393B2 JPH0317393B2 JP26685886A JP26685886A JPH0317393B2 JP H0317393 B2 JPH0317393 B2 JP H0317393B2 JP 26685886 A JP26685886 A JP 26685886A JP 26685886 A JP26685886 A JP 26685886A JP H0317393 B2 JPH0317393 B2 JP H0317393B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- plating
- holes
- adhesive
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 26
- 239000000853 adhesive Substances 0.000 claims description 13
- 230000001070 adhesive effect Effects 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 239000003054 catalyst Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 241000218645 Cedrus Species 0.000 claims description 7
- 150000004703 alkoxides Chemical class 0.000 claims description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000007772 electroless plating Methods 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 12
- 239000010410 layer Substances 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 238000007788 roughening Methods 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
産業上の利用分野
本発明はアデイテイブ法により生産する印刷配
線板の製造方法に関する。
従来の技術
従来アデイテイブ法により配線板を製造すると
き、絶縁基板はパラジウムやパラジウム化合物等
のめつき触媒を含有すると共に、基板表面にはめ
つき触媒入りの接着剤を塗布したものが用いられ
ている。
この後、絶縁基板にスルホール用の孔明けを行
い、この孔内のめつき析出速度を向上するため
に、シーダー処理を施している。シーダー処理
後、基板表面のシーダーをバフ研摩により除去
し、次いで、めつきレジスト層を形成し、接着材
層の表面を粗化し、無電解銅めつき液に基板を浸
漬し、導電層を形成して配線板を製造している。
発明が解決しようとする問題点
従来の配線板の製造方法において、接着剤層の
表面粗化処理は酸を用いて行うために、前工程で
孔の内壁面に付着しているシーダーの一部を溶融
除去し、孔内のめつき析出速度を遅くしてしまう
欠点をもつていた。孔内のめつき析出がおくれる
と、孔内の銅めつきが均一につかなくなり、めつ
きボイド(欠陥部)を生じ、後工程ではんだあげ
時にブローホールが発生し、はんだの欠陥を生ず
るものである。
孔内のめつき析出速度を速くするには、シーダ
ーの残存量を増加させる必要がある。しかしシー
ダーの濃度を増大したり、基板をテイツプする時
間を増加することは、価格が増加するのみで改善
されない。また酸の処理時間を短縮すると接着剤
表面の粗面化が小さくなり、基板への銅箔の接着
力強度が低下してしまう。
問題点を解決するための手段
本発明は上記の欠点を改良し、めつき析出速度
が早く、はんだ処理の欠陥が生じない印刷配線板
を提供するためのものである。
本発明は、めつき触媒入り接着剤を塗布した絶
縁基板を基材とし、この基材にスルホール用の孔
明けを行い、シーダー処理を施し、このスルホー
ル用の孔内壁に金属アルコキシドの加水分解によ
る金属酸化物皮膜を設け、基材表面にめつきレジ
スト層を形成し、接着剤表面を化学粗化し、アル
カリ溶剤で洗浄し、無電解めつき液で銅回路を形
成してなる印刷配線板の製造方法である。
金属アルコキシドは一般にM(OR)nで示す。
MはSi、Ti、Al、Zr、Fe等の金属であり、Rは
メチル、エチル、ブチル等のアルキル基、nは1
〜4の整数である。主に用いられるものはSi
(OC2H5)4、Al(OC4H9)3、Ti(OC3H11)4、Ba
(OC3H7)2等であり、水で所定の濃度に稀釈して
用いる。これらのアルコキシドは加水分解や熱分
解でアルコール等を発生して架橋をし、金属酸化
物皮膜になる。通常は加水分解が早まるよう使用
直前に酸を添加して使用する。これらの金属酸化
物は酸には比較的強いが、強アルカリには耐性が
ない。
接着剤表面を粗化する際に、通常の粗化液は
H2SO4、NaF、Cr2O5系または、HBF4、
Na2Cr2O7系を用いるが、これらの酸によつては、
孔内壁に設けた皮膜は溶解されずに残つてシーダ
ー層を保護する。この後アルカリ液で洗浄すると
金属酸化物皮膜が溶解してシーダーが露出する。
皮膜の厚さは数μmでよい。
金属酸化物皮膜は、金属アルコキシドの濃度及
び充填剤添加で調整ができる。充填剤としては、
SiO2、Al2O3、BaO、TiO2などが用いられ、こ
れらの微粉を均一に分散して使用する。
孔明けした基板を金属アルコキシドの溶液に浸
漬し、孔内壁に塗布後、約150℃に加熱し、乾燥
と同時に加水分解させ、酸化皮膜を形成する。こ
のとき接着剤の表面に形成される皮膜はバフ等で
除去し、孔内のみに酸化皮膜層を形成する。
アルカリ洗浄液は、酸化皮膜の厚さや金属成分
により異なるがNaOH、KOHの水溶液を40〜70
℃に加温して用いる。
めつき液は通常PH12位で温度70〜75℃で用い
る。
以上の処理により、シーダーの孔内残存量が増
加するので、基材中のめつき触媒は省略しても、
充分なめつき析出特性を示し、はんだ処理時に欠
陥が生じない配線板が製造できる。
実施例
実施例 1
めつき触媒入り接着剤(日立化成工業株式会社
製HA−21型)が表面に塗布された厚さ1.5mmのめ
つき触媒が含まれた紙エポキシ樹脂積層板(日立
化成工業株式会社製ACL−E−144型)を基材と
して用いる。
この基材にスルホール用の孔明けを行い、孔内
を洗浄した後、シーダー(日立化成工業株式会社
製HS−201B)処理を行い、孔内壁部にシーダー
を付着させる。
この後、10%硫酸で処理し、TiO2を充填剤と
したアルコキシシリケート溶液(日研研究所製グ
ラスカG1100A)の10重量%溶液に浸漬し、120
℃30分乾燥する。
次に、接着剤表面をバフ研摩して接着剤表面に
付着したシーダー及び酸化皮膜を除去する。
ついで、基材の所定箇所にめつきレジストイン
ク(日立化成工業株式会社製HNR−01BK)を
厚さ20μmスクリーン印刷し、温度160℃の雰囲
気中に30分間放置して硬化して回路と逆パターン
のめつきレジスト層を形成する。
この後、基材をNaF(20g/)、H2SO4(400
ml/)、Cr2O5(40g/)からなる40℃の粗化
液で7分間処理し、接着剤の表面を化学粗化し、
洗浄後、70℃の苛性ソーダ(10重量%)液中で10
分間処理して、酸化皮膜層を除去してシーダーを
露出させる。
次に無電解めつき液に基材を浸漬して、厚さ
25μmの導電回路を形成し、さらに、半田レジス
ト層や文字印刷処理を行い印刷配線板を製造す
る。
実施例 2
実施例1に基づいて、TiO2の充填剤を除去し
た溶液(日研研究所製グラスカG90型)を用い
(固形分は18%)、他は同じ工程で印刷配線板を製
造する。
実施例 3
実施例に基づいて、めつき触媒を含まない基板
(日立化成工業株式会社製LE−47)を用い、地は
同工程で印刷配線板を製造する。
比較例 1
実施例1において、アルコキシド処理を省略し
た方法で印刷配線板を製造する。
以上の方法で作成した配線板の特性を表に示
す。
INDUSTRIAL APPLICATION FIELD The present invention relates to a method for manufacturing a printed wiring board produced by an additive method. Conventional technology Conventionally, when manufacturing wiring boards by the additive method, an insulating substrate contains a plating catalyst such as palladium or a palladium compound, and an adhesive containing a plating catalyst is applied to the surface of the substrate. . Thereafter, holes for through holes were formed in the insulating substrate, and a seeder treatment was performed to improve the plating deposition rate in the holes. After the seeder treatment, remove the seeder on the substrate surface by buffing, then form a plating resist layer, roughen the surface of the adhesive layer, and immerse the substrate in electroless copper plating solution to form a conductive layer. The company manufactures wiring boards. Problems to be Solved by the Invention In the conventional manufacturing method of wiring boards, the surface roughening treatment of the adhesive layer is performed using acid. This has the disadvantage that it melts and removes the metal, slowing down the rate of plating precipitation inside the holes. If the plating precipitation inside the hole is delayed, the copper plating inside the hole will not be uniformly applied, causing plating voids (defects), which will cause blowholes during soldering in the post-process, resulting in solder defects. It is. In order to increase the rate of plating deposition in the holes, it is necessary to increase the amount of remaining seeder. However, increasing the concentration of the seeder or increasing the time for taping the substrate only increases the cost and does not provide any improvement. Furthermore, if the acid treatment time is shortened, the roughening of the adhesive surface becomes smaller, and the adhesive strength of the copper foil to the substrate decreases. Means for Solving the Problems The present invention aims to improve the above-mentioned drawbacks and provide a printed wiring board which has a fast plating deposition rate and does not cause defects in solder processing. The present invention uses an insulating substrate coated with an adhesive containing a plating catalyst as a base material, drills holes for through holes in this base material, performs a seeder treatment, and forms the inner wall of the through hole by hydrolyzing metal alkoxide. A printed wiring board is produced by providing a metal oxide film, forming a plating resist layer on the base material surface, chemically roughening the adhesive surface, cleaning with an alkaline solvent, and forming a copper circuit with an electroless plating solution. This is the manufacturing method. Metal alkoxides are generally designated M(OR)n.
M is a metal such as Si, Ti, Al, Zr, Fe, etc., R is an alkyl group such as methyl, ethyl, butyl, and n is 1
It is an integer of ~4. Mainly used is Si
( OC2H5 ) 4 , Al ( OC4H9 ) 3 , Ti( OC3H11 ) 4 , Ba
(OC 3 H 7 ) 2 , etc., and is used after being diluted with water to a specified concentration. These alkoxides generate alcohol and the like through hydrolysis or thermal decomposition and crosslink, forming a metal oxide film. Usually, an acid is added just before use to speed up hydrolysis. These metal oxides are relatively resistant to acids, but not strong alkalis. When roughening the adhesive surface, the usual roughening liquid is
H 2 SO 4 , NaF, Cr 2 O 5 or HBF 4 ,
Na 2 Cr 2 O 7 system is used, but depending on these acids,
The film provided on the inner wall of the hole remains undissolved and protects the cedar layer. After this, when washed with an alkaline solution, the metal oxide film is dissolved and the cedar is exposed.
The thickness of the film may be several μm. The metal oxide film can be adjusted by adjusting the metal alkoxide concentration and the addition of fillers. As a filler,
SiO 2 , Al 2 O 3 , BaO, TiO 2 , etc. are used, and their fine powders are uniformly dispersed. The drilled substrate is immersed in a metal alkoxide solution, coated on the inner walls of the holes, and then heated to about 150°C, dried and simultaneously hydrolyzed to form an oxide film. At this time, the film formed on the surface of the adhesive is removed with a buff or the like, and an oxide film layer is formed only within the holes. The alkaline cleaning solution varies depending on the thickness of the oxide film and the metal components, but an aqueous solution of NaOH or KOH is used at a concentration of 40 to 70%.
Warm to ℃ before use. The plating solution is usually used at a pH of around 12 and a temperature of 70 to 75°C. The above treatment increases the amount of seeder remaining in the pores, so even if the plating catalyst in the base material is omitted,
It is possible to produce a wiring board that exhibits sufficient plating and precipitation characteristics and that does not cause defects during soldering. Examples Example 1 Paper epoxy resin laminate containing a plating catalyst with a thickness of 1.5 mm (model HA-21, manufactured by Hitachi Chemical Co., Ltd.) coated with a plating catalyst-containing adhesive (model HA-21, manufactured by Hitachi Chemical Co., Ltd.) on the surface. ACL-E-144 type manufactured by Co., Ltd.) is used as the base material. After drilling holes for through holes in this base material and cleaning the inside of the hole, a cedar treatment (HS-201B manufactured by Hitachi Chemical Co., Ltd.) is performed to adhere the cedar to the inner wall of the hole. After this, it was treated with 10% sulfuric acid and immersed in a 10% by weight solution of an alkoxysilicate solution with TiO 2 as a filler (Glasca G1100A manufactured by Nikken Institute).
Dry at ℃ for 30 minutes. Next, the adhesive surface is buffed to remove the cedar and oxide film adhering to the adhesive surface. Next, a plating resist ink (HNR-01BK manufactured by Hitachi Chemical Co., Ltd.) was screen printed to a thickness of 20 μm on a predetermined location on the base material, and left in an atmosphere at a temperature of 160°C for 30 minutes to harden and form a pattern opposite to the circuit. Form a plating resist layer. After this, the base material was treated with NaF (20 g/), H 2 SO 4 (400
ml/), Cr 2 O 5 (40 g/) at 40°C for 7 minutes to chemically roughen the surface of the adhesive.
After cleaning, 10% in caustic soda (10% by weight) solution at 70°C.
Process for 1 minute to remove the oxide film layer and expose the cedar. Next, the base material is immersed in an electroless plating solution to determine the thickness.
A 25 μm conductive circuit is formed, and a solder resist layer and character printing are then applied to produce a printed wiring board. Example 2 Based on Example 1, a printed wiring board was manufactured by using a TiO 2 filler-free solution (Glaska G90 type manufactured by Nikken Research Institute) (solid content: 18%) and using the same process except for the same process. . Example 3 Based on Example 3, a printed wiring board is manufactured using the same process using a substrate that does not contain a plating catalyst (LE-47 manufactured by Hitachi Chemical Co., Ltd.). Comparative Example 1 A printed wiring board is manufactured using the method of Example 1, but omitting the alkoxide treatment. The characteristics of the wiring board produced by the above method are shown in the table.
【表】【table】
【表】
発明の効果
本発明の構成は以上に説明したとおりのもの
で、スルホールのめつき性が大幅に向上し、はん
だ処理のブローホールが大幅に減少し、はんだ後
の修正作業が低減でき、スルホールの信頼性が向
上した。また、酸化皮膜はめつき液槽に入る前工
程のアルカリ洗浄槽中で除去されるため、めつき
液中への不純物の持ち込みが大幅に減少し、めつ
き銅の特性向上にも寄与する発明である。[Table] Effects of the Invention The structure of the present invention is as explained above, and the through-hole plating performance is greatly improved, blowholes during soldering are significantly reduced, and correction work after soldering can be reduced. , the reliability of through holes has been improved. In addition, since the oxide film is removed in the alkaline cleaning tank before entering the plating solution tank, the introduction of impurities into the plating solution is greatly reduced, and this invention also contributes to improving the properties of the plated copper. be.
Claims (1)
とし、この基材にスルホール用の孔明けを行い、
シーダー処理をし、このスルホール用の孔内壁に
金属アルコキシドの加水分解による金属酸化物皮
膜を形成し、基材表面にめつきレジスト層を形成
し、接着剤表面を化学粗化し、アルカリ溶剤で洗
浄し、無電解めつき液に基材を浸漬して導電回路
を形成することを特徴とする印刷配線板の製造方
法。1 A substrate coated with a plating catalyst-containing adhesive is used as a base material, and holes for through-holes are drilled in this base material.
A cedar treatment is performed to form a metal oxide film on the inner wall of the through-hole by hydrolysis of metal alkoxide, a plating resist layer is formed on the base material surface, the adhesive surface is chemically roughened, and then washed with an alkaline solvent. A method for manufacturing a printed wiring board, comprising: forming a conductive circuit by immersing a base material in an electroless plating solution.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26685886A JPS63120497A (en) | 1986-11-10 | 1986-11-10 | Manufacture of printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26685886A JPS63120497A (en) | 1986-11-10 | 1986-11-10 | Manufacture of printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63120497A JPS63120497A (en) | 1988-05-24 |
JPH0317393B2 true JPH0317393B2 (en) | 1991-03-07 |
Family
ID=17436637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26685886A Granted JPS63120497A (en) | 1986-11-10 | 1986-11-10 | Manufacture of printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63120497A (en) |
-
1986
- 1986-11-10 JP JP26685886A patent/JPS63120497A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63120497A (en) | 1988-05-24 |
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