JPH03169394A - Suspension wastewater recovery apparatus - Google Patents
Suspension wastewater recovery apparatusInfo
- Publication number
- JPH03169394A JPH03169394A JP1311328A JP31132889A JPH03169394A JP H03169394 A JPH03169394 A JP H03169394A JP 1311328 A JP1311328 A JP 1311328A JP 31132889 A JP31132889 A JP 31132889A JP H03169394 A JPH03169394 A JP H03169394A
- Authority
- JP
- Japan
- Prior art keywords
- water
- wastewater
- turbid
- ultrafiltration
- pure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002351 wastewater Substances 0.000 title claims abstract description 75
- 238000011084 recovery Methods 0.000 title claims abstract description 16
- 239000000725 suspension Substances 0.000 title abstract 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 79
- 238000000108 ultra-filtration Methods 0.000 claims abstract description 32
- 238000000926 separation method Methods 0.000 claims abstract description 20
- 238000005119 centrifugation Methods 0.000 claims abstract description 10
- 238000001914 filtration Methods 0.000 claims abstract 2
- 239000000126 substance Substances 0.000 claims description 15
- 239000012528 membrane Substances 0.000 abstract description 7
- 230000007613 environmental effect Effects 0.000 abstract description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 239000011863 silicon-based powder Substances 0.000 description 13
- 235000012431 wafers Nutrition 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000003456 ion exchange resin Substances 0.000 description 3
- 229920003303 ion-exchange polymer Polymers 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- XJKVPKYVPCWHFO-UHFFFAOYSA-N silicon;hydrate Chemical compound O.[Si] XJKVPKYVPCWHFO-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- 238000011001 backwashing Methods 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
【発明の詳細な説明】
［ＩＲ要］
純水中に異物が含まれた顕濁排水から異物を除去して純
水を回収する顕濁排水回収装置に関し、顕濁排水を効率
よく処理し．しかも頴濁排水の全量を純水として回収す
ることができる顕濁排水回収装置を提供することを目的
とし、
純水中に異物が含まれた顕濁排水から異物を除去して純
水を回収する顕濁排水回収装置において、前記顕濁排水
を異物と水に分離する遠心分離手段と、前記遠心分離手
段により分離された水を限外ろ過して回収純水を生戒す
る限外ろ過手段とを有し、前記限外ろ過手段によりろ過
されずに排出された排出水を前記遠心分離手段に戻すよ
うに構戒する。[Detailed Description of the Invention] [IR Required] The present invention relates to a turbid wastewater recovery device that removes foreign substances from turbid wastewater containing foreign substances in pure water and recovers pure water, and efficiently processes the turbid wastewater. Moreover, the purpose is to provide a turbid wastewater recovery device that can recover the entire amount of turbid wastewater as pure water, and recovers pure water by removing foreign substances from the turbid wastewater that contains foreign substances in the pure water. A turbid wastewater recovery device comprising: centrifugal separation means for separating the turbid wastewater into foreign matter and water; and ultrafiltration means for ultrafiltering the water separated by the centrifugal separation means to obtain recovered pure water. and is arranged to return the waste water discharged without being filtered by the ultrafiltration means to the centrifugal separation means.
［産業上の利用分野Ｊ
本発明は純水中に異物が含まれた顕濁排水から異物を除
去して純水を回収する顕濁排水回収装置に関ずる．
［従来の技術］
ＬＳＩプロセスにおいては、半導体ウエーハやその他の
材料、治具等を何回も洗浄する必要があり大量の純水が
使用されている．例えば半導体ウエーハの研磨プロセス
や、半導体ウエーハのダイシングプロセスでは、洗浄に
使用された純水中にシリコン粉等の異物が含まれている
．このような顕濁排水の処理方法としては、■凝集沈殿
法、■マイクロフィルタ法、■砂沈殿法、■限外ろ過（
Ｕ Ｆ ＝ ｕｌｔｒａ Ｆｉｌｔｅｒａｔｉｏｎ）
法、■遠心分離法等が従来から用いられ、異物を除去し
た後に廃水として捨てるか、一部は再使用のために回収
している。[Industrial Application Field J] The present invention relates to a turbid wastewater recovery device that removes foreign substances from turbid wastewater containing foreign substances in pure water and recovers pure water. [Prior Art] In the LSI process, it is necessary to wash semiconductor wafers, other materials, jigs, etc. many times, and a large amount of pure water is used. For example, in the polishing process of semiconductor wafers and the process of dicing semiconductor wafers, foreign substances such as silicon powder are contained in the pure water used for cleaning. Treatment methods for such turbid wastewater include ■ coagulation sedimentation method, ■ microfilter method, ■ sand sedimentation method, and ■ ultrafiltration (
U F = ultra Filteration)
Conventionally, methods such as centrifugation and centrifugation have been used, and after removing foreign substances, they are either discarded as wastewater or a portion is recovered for reuse.
［発明か解決しようとする課題］
近年は環境基準がますます厳しくなり廃水として捨てる
ことなく全量を再使用のために回収することが望ましい
。また、近年のＬＳＩプロセスでは大量の顕濁排水が生
ずるため、効率よく顕濁排水を処理することが望ましい
。しかしながら、従来の処理方法にはそれぞれ一長一短
があり、決定的な処理方法がなかった．
本発明の目的は、顕濁排水を効率よく処理し、しかも顕
濁排水の全量を純水として回収することができる顕濁排
水回収装置を提供することにある。[Problem to be solved by the invention] In recent years, environmental standards have become increasingly strict, and it is desirable to recover the entire amount for reuse without discarding it as wastewater. Furthermore, since recent LSI processes generate a large amount of turbid wastewater, it is desirable to treat the turbid wastewater efficiently. However, each of the conventional processing methods has its advantages and disadvantages, and there is no definitive processing method. An object of the present invention is to provide a turbid wastewater recovery device that can efficiently treat turbid wastewater and recover the entire amount of turbid wastewater as pure water.
［課題を解決するための手段］ 本発明の原理を第１図及び第２図を用いて説明する。[Means to solve the problem] The principle of the present invention will be explained using FIGS. 1 and 2.
本発明は、異物除去効率は漬れているが排水の全量を回
収することができない限外ろ過法と、異物処理効率は劣
るが排水の全量を回収することができる遠心分離法を組
合わせることにより、顕濁排水を効率よく、しかも排水
の全量を回収することができるようにしたものである．
第１図において、純水を使用するプロセス装置からの顕
濁排水は、遠心分離手段２により遠心分離されて異物と
水に分離される。分離された水は、限外ろ過手段４によ
り限外ろ過され純水として回収される．回収された純水
は再びプロセス装置で用いられる。一方、限外ろ過手段
４により限外ろ過されなかったりジエクト水は、遠心分
離手段２に戻され、顕濁排水と共に再び遠心分離手段２
により処理される．なお、遠心分離手殴２で分離された
異物は廃棄物として廃棄される．
第２図においては、プロセス装置からの顕濁排水は、先
ず限外ろ過手段６により限外ろ過される。The present invention combines the ultrafiltration method, which has a high foreign matter removal efficiency but cannot recover the entire amount of waste water, and the centrifugation method, which has a low foreign matter removal efficiency but can recover the entire amount of waste water. This makes it possible to efficiently collect turbid wastewater and to recover the entire amount of wastewater. In FIG. 1, turbid wastewater from a process device using pure water is centrifuged by centrifugal separation means 2 and separated into foreign matter and water. The separated water is ultrafiltered by ultrafiltration means 4 and recovered as pure water. The recovered pure water is used again in the process equipment. On the other hand, water that has not been ultrafiltered by the ultrafiltration means 4 or that has not been ultrafiltered is returned to the centrifugal separation means 2 and is returned to the centrifugal separation means 2 along with the turbid waste water.
Processed by . Note that the foreign matter separated by centrifugation and hand punching 2 is discarded as waste. In FIG. 2, the turbid wastewater from the process equipment is first ultrafiltered by ultrafiltration means 6. In FIG.
限外ろ過された水は純水として回収され、再びプロセス
装置で用いられる．一方、限外ろ過手段４により限外ろ
過されなかったりジエクト水は、遠心分離手Ｖｌ８によ
り遠心分離されて異物と水に分離される．分離された水
は、限外ろ過手段６に戻され、顕濁排水と共に再び限外
ろ過千段６により処理される。なお、遠心分離手殴８で
分離された弘杓は廃棄物として廃棄される。The ultrafiltered water is recovered as pure water and used again in the process equipment. On the other hand, the extracted water that has not been ultrafiltered by the ultrafiltration means 4 is centrifuged by the centrifugal separator V18 and separated into foreign matter and water. The separated water is returned to the ultrafiltration means 6 and treated together with the turbid wastewater by the ultrafiltration stage 6 again. Note that the ladle separated by the centrifugal separation and hand punching 8 is discarded as waste.
［作用］
本発明によれば、異物除去効率が優れている限外ろ過法
と、全排水量を回収することができる遠心分離法とを組
合わせたので、顕濁排水を効率よく、しかも全排水量を
回収することができる。[Function] According to the present invention, the ultrafiltration method, which has excellent foreign matter removal efficiency, and the centrifugation method, which can recover the total amount of waste water, are combined, so that the turbid waste water can be efficiently removed and the total amount of waste water can be recovered. can be recovered.
［実施例］
本発明の第１の実施例による顕濁排水回収装置を第３図
を用いて説明する。[Example] A turbid wastewater recovery device according to a first example of the present invention will be described using FIG. 3.
本実施例の顕濁排水回収装置は、ウエーハをダイシング
するダイシング装置からの顕濁排水から異物のシリコン
粉を除去して純水とし．て回収する。The turbid wastewater recovery device of this embodiment removes foreign silicon powder from the turbid wastewater from a dicing device that dices wafers and converts it into pure water. and collect it.
ダイシング″Ａｆｉｌｏからシリコン粉を含んだ顕濁排
水は、貯水タンク１２に一旦貯水される。貯水された顕
濁排水は貯水タンク１２から遠心分離装置１４に注入さ
れる。遠心分離装置１４は、遠心力を利用して比重の異
なるものを分離する装置である．円筒状の遠心分離容器
１４ａをモータ１ｔ１ｂにより約２０００Ｏｒｐｍで回
転させると、２濁排水からシリコン粉と水が分離される
．分離したシリコン粉がある程度たまるとモータ１４ｂ
を停止させて遠心分離容器１４ａからシリコン粉を取り
出して廃棄する。遠心分離装置１４により分離された水
は一旦貯水タンク１６に貯水される。The turbid wastewater containing silicon powder from the dicing "Afilo" is temporarily stored in the water storage tank 12.The stored turbid wastewater is injected from the water storage tank 12 into the centrifugal separator 14.The centrifugal separator 14 This is a device that uses force to separate substances with different specific gravity.When the cylindrical centrifugal separation container 14a is rotated at about 2000 rpm by the motor 1t1b, silicon powder and water are separated from the turbid wastewater.The separated silicon When a certain amount of powder accumulates, the motor 14b
The silicon powder is taken out from the centrifuge container 14a and discarded. The water separated by the centrifugal separator 14 is temporarily stored in a water storage tank 16.
貯水タンク１６の水は、ボング１８により限外ろ過装置
２０に注入される．限外ろ過装置２０では、円筒の中に
中空のＵＰ （＝Ｕｌｔｒａ Ｆｉｌｔｅｒａｔｉｏ１
））膜が設けられており、ＵＰ膜を透過して限外ろ過さ
れたものが純水として回収され、ろ過されなかったもの
がリジェクト水として排出される．遠心分離装置１４で
完全に分離されずシリコン粉を含んでいたとしても、限
外ろ過装置２０により確実にろ過される。Water in the water storage tank 16 is injected into the ultrafiltration device 20 by the bong 18. In the ultrafiltration device 20, a hollow UP (=Ultra Filterio1
)) A membrane is installed, and the water that passes through the UP membrane and is ultrafiltered is recovered as pure water, and the water that is not filtered is discharged as reject water. Even if the silicon powder is not completely separated by the centrifugal separator 14 and contains silicon powder, it is reliably filtered by the ultrafilter 20.
限外ろ過装置２０からのりジェクト水は、顕濁排水を貯
水する貯水タンク１２に戻され、再び顕濁ＪＪｊ水回収
装置の処理系に入れられる。The water ejected from the ultrafiltration device 20 is returned to the water storage tank 12 that stores turbid wastewater, and is again introduced into the treatment system of the turbid JJJ water recovery device.
一方、限外ろ過装置２０により限外ろ過された純水は、
イオン交１１Ａ樹脂２２により陰陽両イオンか除去され
た後、ダイシング装置１０に送られて純ノｋとして再使
用される。On the other hand, the pure water ultrafiltered by the ultrafiltration device 20 is
After both negative and negative ions are removed by the ion exchanger 11A resin 22, it is sent to the dicing device 10 and reused as pure ion.
このように本実施例によれば、ダイシング装置からの顕
濁排水を効率よく、しかも顕濁排水の全藍を回収できる
ので、最終的な廃水処理装置を設ける必要がなく投資コ
ストを低減できる。また、廃水が全く発生しないため公
害問題の抜本的解決か可能である。また、本実施例では
遠心分離装置で頚濁排水からシリコン粉を除去した後に
限外ろ過装置でろ過するようにしているので、限外ろ過
″Ａ置のＵＰ膜に対する負荷が軽減され、ＵＦ膜のｎ命
が長くなると共に、ＵＰ膜の逆洗浄や薬湾洗ｎの頻度を
減らすことができる。As described above, according to this embodiment, the turbid wastewater from the dicing device can be efficiently recovered, and all the indigo in the turbid wastewater can be recovered, so that it is not necessary to provide a final wastewater treatment device, and investment costs can be reduced. Furthermore, since no wastewater is generated, it is possible to completely solve the pollution problem. In addition, in this example, silicon powder is removed from the turbid wastewater using a centrifugal separator and then filtered using an ultrafiltration device, so the load on the UP membrane in the ultrafiltration position A is reduced, and the UF membrane In addition to extending the life of the UP membrane, the frequency of backwashing and cleaning of the UP membrane can be reduced.
本発明の第２の実施例による顕濁排水回収装置を第４図
を用いて説明する。A turbid wastewater recovery device according to a second embodiment of the present invention will be explained with reference to FIG.
本実施−１の顕濁排水回収装置は、ウエーハを研磨する
ウエーハ研磨装置からの顕濁排水から異物のシリコン粉
を除去して純水として回収する。The turbid wastewater recovery device of this embodiment-1 removes silicon powder, which is a foreign substance, from the turbid wastewater from a wafer polishing device that polishes wafers, and recovers it as pure water.
ウエーハ研磨装置３０からシリコン粉を含んだ顕濁排水
は、貯ｌＦ．タンク３２に一旦貯水される。The turbid wastewater containing silicon powder from the wafer polishing device 30 is stored in a storage IF. Water is temporarily stored in the tank 32.
貯水された顕濁排水は貯水タンク３２からボング３４に
より限外ろ過装置３６に注入される。限外ろ過装置３６
では、限外ろ過されたものが純水として回収され、ろ過
されなかったものがリジエクト水として排出される。シ
リコン粉はりジェクト水中に含まれている。The stored turbid wastewater is injected from the water storage tank 32 into an ultrafiltration device 36 through a bong 34. Ultrafiltration device 36
In this case, the ultrafiltered water is recovered as pure water, and the unfiltered water is discharged as reject water. Silicon powder is included in the injection water.
限外ろ過装置３６からのりジェクト水は遠心分離装置３
８に注入される。円筒状の遠心分離容器３８ａをモータ
３８ｂにより約２００００ｒｐｍで回転させると、シリ
コン粉と水が分離される。The paste water from the ultrafiltration device 36 is transferred to the centrifugal separator 3
Injected into 8. When the cylindrical centrifugal separation container 38a is rotated at about 20,000 rpm by the motor 38b, silicon powder and water are separated.
分離されたシリコン粉はある程度たまると取り出して廃
棄される。分離された水は、顕濁排水を貯水する貯水タ
ンク３２に戻され、再び顕濁排水回収装置の処理系に入
れられる。Once the separated silicon powder has accumulated to a certain extent, it is taken out and discarded. The separated water is returned to the water storage tank 32 that stores the turbid wastewater, and is again introduced into the treatment system of the turbid wastewater recovery device.
一方、限外ろ過装置３６により限外ろ過された純水は、
イオン交換樹脂４０により陰陽両イオンか除去された後
、ウエーハ？ｉＪｌ晧装置３０に送られて純水として再
使用される。On the other hand, the pure water ultrafiltered by the ultrafiltration device 36 is
After both negative and negative ions are removed by the ion exchange resin 40, the wafer? The water is sent to the iJl water system 30 and reused as pure water.
本発明は上記実施例に限らず種々の変形が可能である。The present invention is not limited to the above-mentioned embodiments, and various modifications are possible.
飼えば、上記実施例ではダイシング装置やウ工−ハ研磨
装置に顕濁排水回収装置を設けたが、純水を用いるもの
であれば、いかなるプロセス装置にも本発明の！Ａ濁排
水回収装置を設けることかできる。In the above embodiments, the dicing equipment and wafer polishing equipment were provided with a turbid wastewater collection device, but the present invention can be applied to any process equipment that uses pure water. A: A turbid wastewater recovery device can be installed.
〔発明の効果］
以上の通り、本発明によれば、顕濁排水を効率よく処理
し、しかも顕濁排水の全量を純水として回収することが
できる。[Effects of the Invention] As described above, according to the present invention, turbid wastewater can be efficiently treated and the entire amount of the turbid wastewater can be recovered as pure water.
第１図、第２Ｉ２ｌは本発明の原理図、第３図は本発明
の第１の実施例による顕濁排水回収装置を示す図、
第４１２は本発明の第２の実施例による顕濁排水回収装
置を示す図である。
図において、
２・・・遠心分離手段
４・・・限外ろ過手段
６・・・限外ろ過手段
８・・・遠心分離手段
１０・・・ダインング装置
１２・・・貯水タンク
１４・・・遠心分離装置
１４ａ・・・遠心分離容器
１４ｂ・・・モータ
１６・・・貯水タンク
１８・・・ポンプ
２０・・・限外ろ過装置
２２・・・イオン交換樹脂
３０・・・ウエーハ研磨装置
３２・・・貯水タンク
３４・・・ポンプ
３６・・・限外ろ過装置
３
３
３
ｌ１
８・・・遠心分離装置
８ａ・・・遠心分離容器
８ｂ・・・モータ
０・・・イオン交換樹脂
出頼人 富 士 通 株1 and 2I2l are diagrams of the principle of the present invention, FIG. 3 is a diagram showing a turbid wastewater recovery device according to the first embodiment of the present invention, and 412 is a diagram showing the turbid wastewater according to the second embodiment of the present invention. It is a figure showing a collection device. In the figure, 2... centrifugal separation means 4... ultrafiltration means 6... ultrafiltration means 8... centrifugal separation means 10... ding device 12... water storage tank 14... centrifugation Separation device 14a...Centrifugal separation container 14b...Motor 16...Water tank 18...Pump 20...Ultrafiltration device 22...Ion exchange resin 30...Wafer polishing device 32...・Water storage tank 34...Pump 36...Ultrafiltration device 3 3 3 l1 8...Centrifugal separator 8a...Centrifugal separation container 8b...Motor 0...Ion exchange resin source wealth Shitsu Co., Ltd.
Claims (1)
て純水を回収する顕濁排水回収装置において、 前記顕濁排水を異物と水に分離する遠心分離手段と、 前記遠心分離手段により分離された水を限外ろ過して回
収純水を生成する限外ろ過手段とを有し、前記限外ろ過
手段によりろ過されずに排出された排出水を前記遠心分
離手段に戻すことを特徴とする顕濁排水回収装置。 ２、純水中に異物が含まれた顕濁排水から異物を除去し
て純水を回収する顕濁排水回収装置において、 前記顕濁排水を限外ろ過して回収純水を生成する限外ろ
過手段と、 前記限外ろ過手段によりろ過されずに排出された排出水
を異物と水に分離する遠心分離手段とを有し、 前記遠心分離手段により分離された水を前記限外ろ過手
段に戻すことを特徴とする顕濁排水回収装置。[Scope of Claims] 1. A turbid wastewater collection device for recovering pure water by removing foreign substances from turbid wastewater containing foreign substances in pure water, comprising: a centrifugal system for separating the turbid wastewater into foreign substances and water; It has a separation means, and an ultrafiltration means for ultrafiltering the water separated by the centrifugal separation means to produce recovered pure water, and the waste water discharged without being filtered by the ultrafiltration means is A turbid wastewater collection device characterized in that the turbid wastewater is returned to the centrifugal separation means. 2. In a turbid waste water recovery device that removes foreign substances from turbid waste water containing foreign substances and recovers pure water, an ultrafilter that generates recovered pure water by ultrafiltering the turbid waste water. It has a filtration means, and a centrifugal separation means for separating waste water discharged without being filtered by the ultrafiltration means into foreign matter and water, and the water separated by the centrifugation means is sent to the ultrafiltration means. A device for collecting turbid wastewater, which is characterized by its ability to return wastewater.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1311328A JPH03169394A (en) | 1989-11-30 | 1989-11-30 | Suspension wastewater recovery apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1311328A JPH03169394A (en) | 1989-11-30 | 1989-11-30 | Suspension wastewater recovery apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03169394A true JPH03169394A (en) | 1991-07-23 |
Family
ID=18015812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1311328A Pending JPH03169394A (en) | 1989-11-30 | 1989-11-30 | Suspension wastewater recovery apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03169394A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0894770A1 (en) * | 1997-07-30 | 1999-02-03 | Procoat Technologies | Process and device for treating opaque pollutants in industrial and/or agricultural wastewater |
| JP2010064197A (en) * | 2008-09-11 | 2010-03-25 | Nomura Micro Sci Co Ltd | Method and device of treating silicon-containing drain |
| CN104150629A (en) * | 2014-08-20 | 2014-11-19 | 郑州银科尔科技有限公司 | Membrane filtration device and application method thereof |
| CN104150630A (en) * | 2014-08-20 | 2014-11-19 | 郑州银科尔科技有限公司 | Heavy metal capture device |
| JP2015139861A (en) * | 2014-01-30 | 2015-08-03 | 株式会社クラレ | Coolant recycling method and recycled coolant intermediate product |
| JP2022045350A (en) * | 2021-01-21 | 2022-03-18 | 株式会社三井Ｅ＆Ｓマシナリー | Cleaning wastewater treatment apparatus of marine vessel exhaust gas |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01218602A (en) * | 1988-02-25 | 1989-08-31 | Nitto Denko Corp | Method for separation treatment of liquid containing fine particles |
-
1989
- 1989-11-30 JP JP1311328A patent/JPH03169394A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01218602A (en) * | 1988-02-25 | 1989-08-31 | Nitto Denko Corp | Method for separation treatment of liquid containing fine particles |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0894770A1 (en) * | 1997-07-30 | 1999-02-03 | Procoat Technologies | Process and device for treating opaque pollutants in industrial and/or agricultural wastewater |
| FR2766811A1 (en) * | 1997-07-30 | 1999-02-05 | Procoat Technologies | METHOD AND DEVICE FOR THE TREATMENT OF WASHING WATER FROM SLEEPING SAUCES |
| JP2010064197A (en) * | 2008-09-11 | 2010-03-25 | Nomura Micro Sci Co Ltd | Method and device of treating silicon-containing drain |
| JP2015139861A (en) * | 2014-01-30 | 2015-08-03 | 株式会社クラレ | Coolant recycling method and recycled coolant intermediate product |
| CN104150629A (en) * | 2014-08-20 | 2014-11-19 | 郑州银科尔科技有限公司 | Membrane filtration device and application method thereof |
| CN104150630A (en) * | 2014-08-20 | 2014-11-19 | 郑州银科尔科技有限公司 | Heavy metal capture device |
| JP2022045350A (en) * | 2021-01-21 | 2022-03-18 | 株式会社三井Ｅ＆Ｓマシナリー | Cleaning wastewater treatment apparatus of marine vessel exhaust gas |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5087370A (en) | Method and apparatus to detoxify aqueous based hazardous waste | |
| RU2007148011A (en) | METHOD AND APPARATUS FOR PROCESSING OF WASTE ABRASIVE SUSPENSIONS FOR REGENERATION OF THEIR COMPONENTS OF USE | |
| JP5769082B2 (en) | Cleaning treatment method for radioactive material contaminated soil | |
| WO2007097046A1 (en) | Method and apparatus for treating silicon particle | |
| EP1055448A3 (en) | Method of filtering a fluid | |
| JP5261090B2 (en) | Method and apparatus for treating wastewater containing silicon | |
| TW200841991A (en) | Process and apparatus for treating exhausted abrasive slurries from the lapping process for the recovery of their reusable abrasive component | |
| JPH03169394A (en) | Suspension wastewater recovery apparatus | |
| JPH0931486A (en) | Purification of rolling oil | |
| JP4234806B2 (en) | Slurry separation method and apparatus | |
| JP2000288935A (en) | Method and device for recovering non-colloidal abrasive material | |
| JP2001009723A (en) | Abrasive recovering device | |
| JP5891800B2 (en) | Glass polishing method | |
| JP2001121421A (en) | Water recovery system | |
| JPS59115717A (en) | Treatment of coolant for cold rolling of steel | |
| JP3185398B2 (en) | Water purification equipment | |
| JPH0356773B2 (en) | ||
| JPH1128338A (en) | Method and device for separating slurried polishing liquid for semiconductor | |
| JP2005334992A (en) | Waste fluid treating device, waste fluid treating method, and manufacturing system for semiconductor device | |
| JPH0760071A (en) | Filtration of suspension | |
| JP2001198823A (en) | Recovery device for abrasive | |
| TWI504558B (en) | High efficiency recovery of nitric acid separation equipment and its method | |
| JP2001009217A (en) | Filtration of dispersed liquid of fine solid particle | |
| JP2000229286A (en) | Water recovering device | |
| JP2019219397A (en) | Method for pre-purifying solutions containing radionuclides |