JPH03166540A - Silver halide photographic sensitive material subjected to antistatic treatment - Google Patents
Silver halide photographic sensitive material subjected to antistatic treatmentInfo
- Publication number
- JPH03166540A JPH03166540A JP30699489A JP30699489A JPH03166540A JP H03166540 A JPH03166540 A JP H03166540A JP 30699489 A JP30699489 A JP 30699489A JP 30699489 A JP30699489 A JP 30699489A JP H03166540 A JPH03166540 A JP H03166540A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- groups
- layer
- halide photographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 99
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 53
- 239000004332 silver Substances 0.000 title claims abstract description 53
- 239000000463 material Substances 0.000 title claims abstract description 26
- 239000000839 emulsion Substances 0.000 claims abstract description 30
- 239000002245 particle Substances 0.000 claims abstract description 22
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 13
- 229920001600 hydrophobic polymer Polymers 0.000 claims abstract description 11
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000002985 plastic film Substances 0.000 claims abstract description 7
- 229920006255 plastic film Polymers 0.000 claims abstract description 7
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 3
- 229920001940 conductive polymer Polymers 0.000 claims description 10
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 9
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 238000011161 development Methods 0.000 abstract description 13
- 238000012545 processing Methods 0.000 abstract description 8
- 238000003860 storage Methods 0.000 abstract description 7
- 230000006866 deterioration Effects 0.000 abstract description 4
- 239000007859 condensation product Substances 0.000 abstract description 3
- 238000000586 desensitisation Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229920003169 water-soluble polymer Polymers 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 53
- 150000001875 compounds Chemical class 0.000 description 21
- 108010010803 Gelatin Proteins 0.000 description 16
- 239000008273 gelatin Substances 0.000 description 16
- 229920000159 gelatin Polymers 0.000 description 16
- 235000019322 gelatine Nutrition 0.000 description 16
- 235000011852 gelatine desserts Nutrition 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 12
- 230000018109 developmental process Effects 0.000 description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 10
- 125000001424 substituent group Chemical group 0.000 description 9
- 239000000084 colloidal system Substances 0.000 description 8
- 238000005336 cracking Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000004816 latex Substances 0.000 description 7
- 229920000126 latex Polymers 0.000 description 7
- 238000012856 packing Methods 0.000 description 7
- 150000003283 rhodium Chemical class 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000011593 sulfur Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 6
- 206010070834 Sensitisation Diseases 0.000 description 6
- 229910021607 Silver chloride Inorganic materials 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 229920000573 polyethylene Polymers 0.000 description 6
- 230000008313 sensitization Effects 0.000 description 6
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 4
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- KAMCBFNNGGVPPW-UHFFFAOYSA-N 1-(ethenylsulfonylmethoxymethylsulfonyl)ethene Chemical compound C=CS(=O)(=O)COCS(=O)(=O)C=C KAMCBFNNGGVPPW-UHFFFAOYSA-N 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 238000007720 emulsion polymerization reaction Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 3
- 235000019252 potassium sulphite Nutrition 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- ZOJBYZNEUISWFT-UHFFFAOYSA-N allyl isothiocyanate Chemical compound C=CCN=C=S ZOJBYZNEUISWFT-UHFFFAOYSA-N 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 125000004069 aziridinyl group Chemical group 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 229960004106 citric acid Drugs 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 229940074391 gallic acid Drugs 0.000 description 2
- 235000004515 gallic acid Nutrition 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 2
- 235000019345 sodium thiosulphate Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229920006027 ternary co-polymer Polymers 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- NJVOHKFLBKQLIZ-UHFFFAOYSA-N (2-ethenylphenyl) prop-2-enoate Chemical group C=CC(=O)OC1=CC=CC=C1C=C NJVOHKFLBKQLIZ-UHFFFAOYSA-N 0.000 description 1
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical group CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical group C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- OXLXSOPFNVKUMU-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid Chemical class CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC OXLXSOPFNVKUMU-UHFFFAOYSA-N 0.000 description 1
- BHUXAQIVYLDUQV-UHFFFAOYSA-N 1-(diethylamino)propan-2-ol Chemical compound CCN(CC)CC(C)O BHUXAQIVYLDUQV-UHFFFAOYSA-N 0.000 description 1
- TXJYONBSFGLSSF-UHFFFAOYSA-N 1-(diethylamino)propane-1,2-diol Chemical compound CCN(CC)C(O)C(C)O TXJYONBSFGLSSF-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- AHABMLPWPUZVOI-UHFFFAOYSA-N 1-n,1-n-diethylbenzene-1,2,4-triamine Chemical compound CCN(CC)C1=CC=C(N)C=C1N AHABMLPWPUZVOI-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- IQMGXSMKUXLLER-UHFFFAOYSA-N 2-hydroxy-5-sulfobenzoic acid;sodium Chemical compound [Na].OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O IQMGXSMKUXLLER-UHFFFAOYSA-N 0.000 description 1
- GQKDZDYQXPOXEM-UHFFFAOYSA-N 3-chlorocatechol Chemical compound OC1=CC=CC(Cl)=C1O GQKDZDYQXPOXEM-UHFFFAOYSA-N 0.000 description 1
- YBMTWYWCLVMFFD-UHFFFAOYSA-N 3-methylbutyl 3,4,5-trihydroxybenzoate Chemical compound CC(C)CCOC(=O)C1=CC(O)=C(O)C(O)=C1 YBMTWYWCLVMFFD-UHFFFAOYSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- XPAZGLFMMUODDK-UHFFFAOYSA-N 6-nitro-1h-benzimidazole Chemical compound [O-][N+](=O)C1=CC=C2N=CNC2=C1 XPAZGLFMMUODDK-UHFFFAOYSA-N 0.000 description 1
- JAJIPIAHCFBEPI-UHFFFAOYSA-N 9,10-dioxoanthracene-1-sulfonic acid Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)O JAJIPIAHCFBEPI-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- 235000001674 Agaricus brunnescens Nutrition 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 101150065749 Churc1 gene Proteins 0.000 description 1
- 229920002307 Dextran Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- RPWFJAMTCNSJKK-UHFFFAOYSA-N Dodecyl gallate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 RPWFJAMTCNSJKK-UHFFFAOYSA-N 0.000 description 1
- 101100136092 Drosophila melanogaster peng gene Proteins 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- SQUHHTBVTRBESD-UHFFFAOYSA-N Hexa-Ac-myo-Inositol Natural products CC(=O)OC1C(OC(C)=O)C(OC(C)=O)C(OC(C)=O)C(OC(C)=O)C1OC(C)=O SQUHHTBVTRBESD-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
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- 239000000020 Nitrocellulose Substances 0.000 description 1
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- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
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- MSZJEPVVQWJCIF-UHFFFAOYSA-N butylazanide Chemical compound CCCC[NH-] MSZJEPVVQWJCIF-UHFFFAOYSA-N 0.000 description 1
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- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
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- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
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- 150000001868 cobalt Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- IZEKFCXSFNUWAM-UHFFFAOYSA-N dipyridamole Chemical group C=12N=C(N(CCO)CCO)N=C(N3CCCCC3)C2=NC(N(CCO)CCO)=NC=1N1CCCCC1 IZEKFCXSFNUWAM-UHFFFAOYSA-N 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical group C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- 229960000878 docusate sodium Drugs 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 239000000555 dodecyl gallate Substances 0.000 description 1
- 235000010386 dodecyl gallate Nutrition 0.000 description 1
- 229940080643 dodecyl gallate Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000002951 idosyl group Chemical class C1([C@@H](O)[C@H](O)[C@@H](O)[C@H](O1)CO)* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- CDAISMWEOUEBRE-GPIVLXJGSA-N inositol Chemical compound O[C@H]1[C@H](O)[C@@H](O)[C@H](O)[C@H](O)[C@@H]1O CDAISMWEOUEBRE-GPIVLXJGSA-N 0.000 description 1
- 229960000367 inositol Drugs 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- VOEYXMAFNDNNED-UHFFFAOYSA-N metolcarb Chemical compound CNC(=O)OC1=CC=CC(C)=C1 VOEYXMAFNDNNED-UHFFFAOYSA-N 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001007 puffing effect Effects 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- CDAISMWEOUEBRE-UHFFFAOYSA-N scyllo-inosotol Natural products OC1C(O)C(O)C(O)C(O)C1O CDAISMWEOUEBRE-UHFFFAOYSA-N 0.000 description 1
- IYKVLICPFCEZOF-UHFFFAOYSA-N selenourea Chemical compound NC(N)=[Se] IYKVLICPFCEZOF-UHFFFAOYSA-N 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- DTPQZKZONQKKSU-UHFFFAOYSA-N silver azanide silver Chemical compound [NH2-].[Ag].[Ag].[Ag+] DTPQZKZONQKKSU-UHFFFAOYSA-N 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 1
- 235000010378 sodium ascorbate Nutrition 0.000 description 1
- 229960005055 sodium ascorbate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 1
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000626 sulfinic acid group Chemical group 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical class 0.000 description 1
- WAGFXJQAIZNSEQ-UHFFFAOYSA-M tetraphenylphosphonium chloride Chemical compound [Cl-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 WAGFXJQAIZNSEQ-UHFFFAOYSA-M 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- 125000002769 thiazolinyl group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylene diamine Substances C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229920001567 vinyl ester resin Chemical class 0.000 description 1
- 239000012224 working solution Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、プラスチックフイルム支持体用の帯電防止層
に関し、特に帯電防止能の優れたハロゲン化銀写真感光
材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an antistatic layer for a plastic film support, and particularly to a silver halide photographic light-sensitive material having excellent antistatic ability.
一般にプラスチイツクフィルム支持体は、帯電性が強く
、これが使用上多くの制約を与えている例は多い。例え
ばハロゲン化銀写真感光材料においてはポリエチレンテ
レ7タレートのような支持体が一般に使用されるが、、
特に冬季の如き低湿度において帯電し易い。最近のよう
に高感度写真乳剤を高速度で塗布したり、高感度の感光
材料を自動プリンターを通して露光処理をする場合、特
に帯電防止対策が重要である。Generally, plastic film supports have strong electrostatic properties, and this often imposes many restrictions on their use. For example, supports such as polyethylene tere-7-talate are generally used in silver halide photographic materials.
It is easy to be charged especially in low humidity such as winter. Antistatic measures are especially important when high-speed photographic emulsions are coated at high speeds or when high-sensitivity photosensitive materials are exposed to light using automatic printers, as has been the case recently.
感光材料が帯電すると、その放電によりスタチックマー
クがでたり、またはゴミ等の異物を付着し、これにより
ビンホールを発生させたりして著しく品質を劣化し、そ
の修正のため非常に作業性をおとしてしまう。このため
、一般に感光材料では帯電防止剤が使用され、最近では
、含フッ素界面活性剤、カチオン界面活性剤、両性界面
活性剤、ポリエチレンオキサイド基を含有する界面活性
剤ないし高分子化合物、スルホン酸又はリン酸基を分子
内に有するポリマー等が用いられている。When a photosensitive material is charged, static marks appear due to the discharge, or foreign substances such as dust adhere to it, which causes bottle holes and deteriorates the quality significantly, making it extremely difficult to repair. It will be. For this reason, antistatic agents are generally used in photosensitive materials, and recently antistatic agents have been used, such as fluorine-containing surfactants, cationic surfactants, amphoteric surfactants, surfactants or polymer compounds containing polyethylene oxide groups, sulfonic acids, Polymers having phosphoric acid groups in their molecules are used.
特にフッ素系界面活性剤による帯電列調整、あるいは導
電性ボリマーによる導電性向上が多く使用されてきてお
り、例えば特開昭49−91165号および同49−1
21523号にはボリマー主鎖中に解離基を有するイオ
ン型ポリマーを適用する例が開示されている。In particular, adjusting the charge series using fluorine-based surfactants or improving conductivity using conductive polymers has been widely used, for example, JP-A-49-91165 and JP-A-49-1.
No. 21523 discloses an example in which an ionic polymer having a dissociative group in the main chain of the polymer is applied.
しかしながら、これらの従来技術では、現像処理により
、帯電防止能が大幅に劣化してしまう。However, in these conventional techniques, the antistatic ability is significantly deteriorated by the development process.
これはアルカリを用いる現像工程、酸性の定着工程、水
洗等の工程を経ることにより帯電防止能が失われるもの
と思われる。したがって印刷感光材料等のように、処理
済みフイルムをさらに用いてプリントするような場合に
、ゴミの付着によるビンホール発生等の問題を生ずる。This is thought to be because the antistatic ability is lost through processes such as a developing process using an alkali, an acidic fixing process, and washing with water. Therefore, when a processed film is further used for printing, such as printing photosensitive materials, problems such as bottle holes occur due to adhesion of dust.
このため例えば特開昭55−84658号、同61−1
74542号ではカルボキシル基を有する水溶性導電性
ポリマー カルポキシル基を有する疎水性ポリマー及び
多官能アジリジンからなる帯電防止層が提案されている
。この方法によれば処理後にも帯電防止能を残すことが
できるが、この帯電防止層は、この層の上にハレーシa
ン防止層などの親水性コロイド層を設けた場合、経時保
存中にひび劃れを生じ、商品価値を大きく損なうことが
分かった。さらに、この帯電防止層を有するプラスチッ
クフィルム支持体に、テトラゾリウム化合物またはヒド
ラジン化合物を使った超硬調化乳剤を適用した場合、経
時保存で減惑する欠点を有することが分かった。For this reason, for example, JP-A Nos. 55-84658 and 61-1
No. 74542 proposes an antistatic layer comprising a water-soluble conductive polymer having a carboxyl group, a hydrophobic polymer having a carboxyl group, and a polyfunctional aziridine. According to this method, it is possible to retain antistatic properties even after treatment, but this antistatic layer is coated with Haleshia.
It has been found that when a hydrophilic colloid layer such as an anti-coagulation layer is provided, cracking occurs during storage over time, greatly reducing commercial value. Furthermore, it has been found that when an ultra-high contrast emulsion using a tetrazolium compound or a hydrazine compound is applied to a plastic film support having an antistatic layer, the emulsion becomes unsightly when stored over time.
上記のような問題に対し、本発明の目的は、現像処理等
の処理後も帯電防止能の劣化が起こらず、経時保存中に
ひび割れを生じないハロゲン化銀写真感光材料を提供す
ることであり、別の巨的としては、テトラゾリウム化合
物またはヒドラジン化合物を使った超硬調化乳剤を適用
した場合経時で減感せず安定性の高いハロゲン化銀写真
感光材料を提供することである。In order to solve the above-mentioned problems, an object of the present invention is to provide a silver halide photographic material that does not deteriorate in antistatic ability even after processing such as development, and does not crack during storage over time. Another major objective is to provide a silver halide photographic material that does not desensitize over time and is highly stable when an ultra-high contrast emulsion using a tetrazolium compound or a hydrazine compound is applied.
本発明の上記目的は、■水溶性導電性ポリマー■疎水性
ボリマー粒子■硬化剤の反応生威物からなる帯電防止層
を有してなるプラスチックフィルム支持体において、該
硬化剤が環状糖類とエピクロルヒドリンの縮合物である
ことを特徴とする帯電防止層を有するハロゲン化銀写真
感光材料により達成された。The above object of the present invention is to provide a plastic film support comprising: (1) a water-soluble conductive polymer, (2) hydrophobic polymer particles, and (2) an antistatic layer consisting of a reaction product of a hardening agent, wherein the hardening agent is a cyclic sugar and epichlorohydrin. This was achieved with a silver halide photographic material having an antistatic layer characterized by being a condensation product of.
尚、上記感光性乳剤層中には、ヒドラジン化合物または
テトラゾリウム化合物を含有することが望ましい。The photosensitive emulsion layer preferably contains a hydrazine compound or a tetrazolium compound.
以下、本発明の詳細について説明する。The details of the present invention will be explained below.
本発明の水溶性導電性ポリマーは、単独で使用すること
によっても透明な層を形威し得るが、少しの乾燥条件の
ブレによって層のひび割れを引き起こしてしまう。本発
明の構或ではそのひび割れを防ぐために疎水性ボリマー
粒子を含有しているが、その効果は大きい。Although the water-soluble conductive polymer of the present invention can form a transparent layer even when used alone, a slight fluctuation in drying conditions may cause cracks in the layer. The structure of the present invention contains hydrophobic polymer particles to prevent cracking, and the effect is significant.
本発明の請求項l記載の水溶性導電性ボリマーについて
は、スルホン酸基、硫酸エステル基、4級アンモニウム
塩、3級アンモニウム塩、カルポキシル基、ポリエチレ
ンオキシド基から選ばれる少なくとも1つの導電性基を
有するボリマーが挙げられる。これらの基のうちスルホ
ン酸基、硫酸エステル基、4級アンモニウム塩基が好ま
しい。The water-soluble conductive polymer according to claim 1 of the present invention has at least one conductive group selected from a sulfonic acid group, a sulfuric acid ester group, a quaternary ammonium salt, a tertiary ammonium salt, a carpoxyl group, and a polyethylene oxide group. Examples include polymers with Among these groups, sulfonic acid groups, sulfuric acid ester groups, and quaternary ammonium bases are preferred.
導電性基はボリマーl分子当たり5重量%以上を必要と
する。水溶性の導電性ポリマー中に含まれるカルポキシ
基、ヒドロキシ基、アミノ基、エポキシ基、アジリジン
基、活性メチレン基、スルフィン酸基、アルデヒド基、
ビニルスルホン基のうち、カルボキシ基、ヒドロキシ基
、アミノ基、エボキシ基、アジリジン基、アルデヒド基
が好ましい。The amount of conductive groups required is at least 5% by weight per molecule of polymer. Carpoxy groups, hydroxy groups, amino groups, epoxy groups, aziridine groups, active methylene groups, sulfinic acid groups, aldehyde groups contained in water-soluble conductive polymers,
Among vinyl sulfone groups, carboxy groups, hydroxy groups, amino groups, epoxy groups, aziridine groups, and aldehyde groups are preferred.
これらの基はボリマー1分子当たり5重量%以上必要と
する。ボリマーの分子量は、3000〜toooooで
あり、好ましくは3500〜sooooである。These groups are required in an amount of 5% by weight or more per polymer molecule. The molecular weight of the polymer is 3000 to toooo, preferably 3500 to soooo.
以下、本発明に用いられる水溶性導電性ポリマーの化合
物例を挙げるがこれに限定されるものではない。Examples of water-soluble conductive polymer compounds used in the present invention are listed below, but the present invention is not limited thereto.
A−1
ホモポリマー
A−2
ホモボリマー
A−3
A−4
)り3Na
A−5
S03Na
A−6
So 3Na
A−7
A−8
SO.Na
A−9
A − 11
A − 12
SO.Na
A − 13
CH,
−
A − 14
CHxOS03N&
A − 15
A − 17
A−19
A−20
A−21
A−22
A−23
デキストランサル7エイ
ト
置換度
2.0
Mn=10万
A−24
A−25
A−27
A−28
A−29
A−30
A−31
A −32
A−33
A−34
A−35
A−36
A −37
A−38
A−39
A−40
A−41
A−42
A−43
SO.Na
x:y:z−80:10:10
Mu″q1万
A−44
A−45
A−46
x:y:z:w−40:30=20:10Mn匈5万
A−47
A−48
A−49
A−50
尚、上記(1)〜(50)において、x,7,z,Wは
それぞれ単量体成分のモル%を、又Mnは平均分子量(
本uyim書中、平均分子量とは数平均分子量を示す。A-1 Homopolymer A-2 Homopolymer A-3 A-4 ) 3Na A-5 S03Na A-6 So 3Na A-7 A-8 SO. Na A-9 A-11 A-12 SO. Na A-13 CH, - A-14 CHxOS03N&A-15 A-17 A-19 A-20 A-21 A-22 A-23 Dextran sal 7-eight substitution degree 2.0 Mn=100,000 A-24 A- 25 A-27 A-28 A-29 A-30 A-31 A-32 A-33 A-34 A-35 A-36 A-37 A-38 A-39 A-40 A-41 A-42 A -43 SO. Na x:y:z-80:10:10 Mu″q10,000A-44 A-45 A-46 x:y:z:w-40:30=20:10Mn匈50,000A-47 A-48 A -49 A-50 In (1) to (50) above, x, 7, z, and W each represent mol% of the monomer component, and Mn represents the average molecular weight (
In this book, the average molecular weight refers to the number average molecular weight.
)を表す。) represents.
これらのボリマーは市販又は常法によって得られる七ノ
マーを重合することにより合或することが出来る。これ
らの化合物の添加量は0.01g−10g/1が好まし
く、特に好ましくは0.1g〜5g/1である。These polymers can be synthesized by polymerizing heptanomers that are commercially available or obtained by conventional methods. The amount of these compounds added is preferably 0.01 g to 10 g/1, particularly preferably 0.1 g to 5 g/1.
次に本発明の水溶性導電性ボリマー層中に含有させる疎
水性ボリマー粒子は、実質的に水に溶解しない所謂ラテ
ックス状で含有されている。この疎水性ボリマーは、ス
チレン、スチレン11導体、アルキルアクリレート、ア
ルキルメタクリレート、ォレ7イン誘導体、ハロゲン化
エチレン誘導体、アクリルアミド誘導体、メタクリルア
ミド誘導体ビニルエステル誘導体、アクリ口ニトリル等
の中から任意の組み合わせで選ばれた七ノマーを重合し
て得られる。特にスチレン誘導体、アルキルアクリレー
ト、アルキルメタクリレートが少なくとも30モル%含
有されているのが好ましい。特に50モル%以上が好ま
しい。Next, the hydrophobic polymer particles contained in the water-soluble conductive polymer layer of the present invention are contained in a so-called latex form that is substantially insoluble in water. This hydrophobic polymer may be any combination of styrene, styrene 11 conductor, alkyl acrylate, alkyl methacrylate, ole7yne derivative, halogenated ethylene derivative, acrylamide derivative, methacrylamide derivative, vinyl ester derivative, acrylonitrile, etc. Obtained by polymerizing selected heptanomers. In particular, it is preferable that at least 30 mol% of styrene derivatives, alkyl acrylates, and alkyl methacrylates are contained. Particularly preferred is 50 mol% or more.
疎水性ポリマーをラテックス状にするには乳化重合をす
る、固体状のポリマーを低沸点溶媒に溶かして微分散後
、溶媒を留去するという2つの方法があるが粒径が細か
く、シかもそろったものができるという点で乳化重合す
ることが好ましい。There are two methods to make a latex from a hydrophobic polymer: emulsion polymerization, or dissolving a solid polymer in a low boiling point solvent and finely dispersing it, followed by distilling off the solvent. Emulsion polymerization is preferable because it allows the production of
乳化重合の際に用いる界面活性剤としては、アニオン性
、ノニオン性を用いるのが好ましく、モノマーに対しl
O重量%以下が好ましい。多量の界面活性剤は導電性層
をくもらせる原因となる。As the surfactant used during emulsion polymerization, it is preferable to use an anionic or nonionic surfactant, and it is preferable to use an anionic or nonionic surfactant.
It is preferably 0% by weight or less. A large amount of surfactant causes clouding of the conductive layer.
疎水性ボリマーの分子量は3000以上であれば良く、
分子量による透明性の差はほとんどない。The molecular weight of the hydrophobic polymer should be 3000 or more,
There is almost no difference in transparency depending on molecular weight.
本発明の疎水性ボリマーの具体例を挙げる。Specific examples of the hydrophobic polymer of the present invention will be given below.
B
7
B
8
B−10
B−12
B−13
COOCH.
COOCIHsOH
COOH
B − 14
CI.
B−15
CN COOC+Hs n COOH
次に本発明においては硬化剤として水酸基を有する環状
糖類とエピクロルヒドリンの縮合物を用いることを特徴
としているがこれらの化合物は好ましくは下記具体例で
示すことができる。B 7 B 8 B-10 B-12 B-13 COOCH. COOCIHsOH COOH B-14 CI. B-15 CN COOC+Hs n COOH
Next, the present invention is characterized in that a condensate of a hydroxyl group-containing cyclic saccharide and epichlorohydrin is used as a curing agent, and these compounds are preferably shown in the following specific examples.
(1)イノシトールとエピクロルヒドリンとの縮合物
C−1
C−2
八
OCR,CHCHよ
OH
C−3
ハ
C−4
ハ
(2)
イドースとエピクロルヒドリンとの縮合物C−5
CI!OH
八
CH*OCHtCHCHx
(3)
グルコースとエピクロルヒドリンの縮合物C−7
ハ
CHtOCHxCHCHt
C−8
^
CHzOCHzCHCHz
C−9
本発明に用いられるヒドラジン化合物は、好ましくは下
記一般式〔H〕で表される化合物である。(1) Condensate of inositol and epichlorohydrin C-1 C-2 8 OCR, CHCH OH C-3 HaC-4 Ha (2) Condensate of idose and epichlorohydrin C-5 CI! OH 8CH*OCHtCHCHx (3) Condensate of glucose and epichlorohydrin C-7 CHtOCHxCHCHt C-8 ^ CHzOCHzCHCHz C-9 The hydrazine compound used in the present invention is preferably a compound represented by the following general formula [H]. be.
一般式1”H)
R.−N −N −C−R,
式中、R.はl価の有機残基を表し、R,は水素原子ま
たはl価の有機残基を表し、Q.及びQ,は水素原子、
アルキルスルホニル基(R換基を有するものも含む)、
アリールスルホニル基(置換基を有するものも含む)を
表し、x1は酸素原子またはイオウ厚子を表す。一般式
(1)で表される化合物のうち%Xlが酸素厚子であり
、かつRsが水素原子である化合物が更に好ましい。General formula 1"H) R.-N-N-C-R, where R. represents a l-valent organic residue, R represents a hydrogen atom or a l-valent organic residue, Q. and Q, is a hydrogen atom,
Alkylsulfonyl groups (including those with R substituents),
It represents an arylsulfonyl group (including those having a substituent), and x1 represents an oxygen atom or a sulfur atom. Among the compounds represented by the general formula (1), compounds in which %Xl is an oxygen atom and Rs is a hydrogen atom are more preferred.
上記R+及びR,のl価の有機残基としては、芳香族残
基、複素環残基及び脂肪族残基が包含される。The l-valent organic residues of R+ and R include aromatic residues, heterocyclic residues, and aliphatic residues.
芳香族残基としては、フエニル基、ナ7チル基及びこれ
らに置換基(例えばアルキル基、アルコキシ基、アシル
ヒドラジノ基、ジアルキルアミノ基、アルコキシ力ルボ
ニル基、シアノ基、カルボキシ基、ニトロ基、アルキル
チオ基、ヒドロキシ基、スルホニル基、カルバモイル基
、ハロゲン原子、アシルアミノ基、スルホンアミド基、
ウレア基、チオウレア基など)のついたものを含む。置
換基のついたものの具体例として、例えば、4−メチル
フェニル基、4−エチルフェニル基、4−オキシエチル
7エニル基、4−Fデシルフェニル基、4−カルポキシ
フエニル基、4−ジエチルアミノフエニル基、4−才ク
チルアミノフェニル基、4−ペンジルアミノ7エニル基
、4−アセトアミドー2−メチル7エニル基、4−(3
−エチルチオウレイド)7エニル基、4−[2−(2.
4−ジーtert−プチル7エノキシ)プチルアミド]
7エニル基、4−[2−(2.4−ジーtert−プチ
ル7エノキシ)プチルアミド]7エニル基などを挙げる
ことができる。Aromatic residues include phenyl groups, natyl groups, and substituents thereof (for example, alkyl groups, alkoxy groups, acylhydrazino groups, dialkylamino groups, alkoxy carbonyl groups, cyano groups, carboxy groups, nitro groups, alkylthio groups). , hydroxy group, sulfonyl group, carbamoyl group, halogen atom, acylamino group, sulfonamide group,
urea group, thiourea group, etc.). Specific examples of those with substituents include 4-methylphenyl group, 4-ethylphenyl group, 4-oxyethyl 7enyl group, 4-F decylphenyl group, 4-carpoxyphenyl group, 4-diethylaminophenyl group, etc. enyl group, 4-cutylaminophenyl group, 4-pendylamino 7-enyl group, 4-acetamido-2-methyl 7-enyl group, 4-(3
-ethylthioureido)7enyl group, 4-[2-(2.
4-di-tert-butyl-7enoxy)butylamide]
7-enyl group, 4-[2-(2,4-di-tert-butyl-7-enoxy)butylamido]7-enyl group, and the like.
複素環残基としては、酸素、窒素、硫黄、まt;はセレ
ン厚子のうち少なくとも一つを有する五員もしくは六員
の単環または縮合環で、これらに置換基がついてもよい
。具体的には例えば、ビロリン環、ビリジン環、キノリ
ン環、インドール環、オキサゾール環、ペンゾオキサゾ
ール環、ナフトオキサゾール環、イミダゾール環、ペン
ゾイミダゾール環、チアゾリン環、チアゾール環、ペン
ゾチアゾール環、ナフトチアゾール環、セレナゾール環
、ペンゾセレナゾール環、ナフトセレナゾール環などの
残基を挙げることが出来る。The heterocyclic residue is a five- or six-membered monocyclic or condensed ring having at least one of oxygen, nitrogen, sulfur, and selenium, which may have a substituent. Specifically, for example, biroline ring, biridine ring, quinoline ring, indole ring, oxazole ring, penzoxazole ring, naphthoxazole ring, imidazole ring, penzimidazole ring, thiazoline ring, thiazole ring, penzothiazole ring, naphtho Examples include residues such as a thiazole ring, a selenazole ring, a penzoselenazole ring, and a naphthoselenazole ring.
これらの複素環は、メチル基、エチル基等炭素数1〜4
のアルキル基、メトキシ基、エトキシ基等炭素数1〜4
のアルコキシ基、7エニル基等の炭素数6〜l8のアリ
ール基や、クロル、プロム等のハロゲン原子、アルコキ
シ力ルボニル基、シアノ基、アミノ基等で置換されてい
てもよい。These heterocycles have 1 to 4 carbon atoms, such as a methyl group or an ethyl group.
Alkyl group, methoxy group, ethoxy group, etc. having 1 to 4 carbon atoms
may be substituted with an aryl group having 6 to 18 carbon atoms such as an alkoxy group or a 7-enyl group, a halogen atom such as chloro or prom, an alkoxycarbonyl group, a cyano group, an amino group, or the like.
脂肪族残基としては、直鎖及び分岐のアルキル基、シク
ロアルキル基及びこれらに置換基のついたもの、並びに
アルケニル基及びアルキニル基を含む。Aliphatic residues include linear and branched alkyl groups, cycloalkyl groups, and those with substituents, as well as alkenyl groups and alkynyl groups.
直鎮及び分岐のアルキル基としては、例えば炭素数1〜
18、好ましくは1〜8のアルキル基であって、具体的
には例えばメチル基、エチル基、インブチル基、l−オ
クチル基等である。Straight and branched alkyl groups include, for example, those having 1 to 1 carbon atoms.
18, preferably an alkyl group of 1 to 8, and specific examples include a methyl group, an ethyl group, an inbutyl group, and a l-octyl group.
シクロアルキル基としては、例えば炭素数3〜lOのも
ので、具体的には例えばシクロプロビル基、シクロヘキ
シル基、アダマンチル基等である。アルキル基やシクロ
アルキル基に対する置換基としてはアルコキシ基(例え
ばメトキシ基、エトキシ基、フロポキシ基、ブトキシ基
等)、アルコキシカルボニル基、カルバモイル基、ヒド
ロキシ基、アルキルチオ基、アミド基、アシロキシ基、
シアノ基、スルホニル基、ハロゲン原子(例えば塩素、
臭素、弗素、沃素など)、アリール基(例えば7エニル
基、ハロゲンR換7エニル基、アルキル置換フェニル基
)等であり、置換されたものの具体例としては例えば3
−メトキシプロビル基、エトキシ力ルポニルメチル基、
4−クロロシクロヘキシル基、ペンジル基、p−メチル
ベンジル基、p−クロロベンジル基などを挙げることが
できる。また、アルケニル基としては例えばアリル(a
lLyl)基、アルキニル基としては例えばグロバルギ
ル基を挙げることができる。Examples of the cycloalkyl group include those having 3 to 10 carbon atoms, and specific examples thereof include a cycloprobyl group, a cyclohexyl group, and an adamantyl group. Substituents for alkyl groups and cycloalkyl groups include alkoxy groups (e.g. methoxy, ethoxy, fropoxy, butoxy, etc.), alkoxycarbonyl groups, carbamoyl groups, hydroxy groups, alkylthio groups, amide groups, acyloxy groups,
Cyano group, sulfonyl group, halogen atom (e.g. chlorine,
bromine, fluorine, iodine, etc.), aryl groups (e.g., 7-enyl group, halogen-R-substituted 7-enyl group, alkyl-substituted phenyl group), and specific examples of substituted groups include 3
-methoxyprobyl group, ethoxylponylmethyl group,
Examples include 4-chlorocyclohexyl group, penzyl group, p-methylbenzyl group, and p-chlorobenzyl group. In addition, examples of alkenyl groups include allyl (a
Examples of the lLyl) group and the alkynyl group include a globargyl group.
本発明のヒドラジン化合物の好ましい具体例を以下に示
すが、
本発明は何等これによって限定さ
れるものではない。Preferred specific examples of the hydrazine compound of the present invention are shown below, but the present invention is not limited thereto in any way.
H−2
H−3
H
4
CH+
しI13
H−5
H−6
H−7
H−8
H−9
H − 10
H−11
H−12
H−13
H−14
H −15
H−18
H−19
H−20
H−21
CI,
H−23
H−24
H−25
CH.
H−28
H−29
H−30
H−31
H−32
H−33
H−34
H−35
しfl.
CsH++(t)
H−36
H−37
H−38
H−39
S
H−40
H−41
H−42
H−43
H−44
H−45
H−46
一般式(H)で表わされるヒドラジン化合物の添加位置
はハロゲン化銀乳剤層及び/または支持体上のハロゲン
化銀乳剤層側にある非感光層であるが、好ましくは、ハ
ロゲン化銀乳剤層及び/またはその下層である。添加量
は、10一″〜10−1モル/銀lモルが好ましく、更
に好ましくはIO−4〜IO−1モル/銀lモルである
。H-2 H-3 H 4 CH+ I13 H-5 H-6 H-7 H-8 H-9 H-10 H-11 H-12 H-13 H-14 H-15 H-18 H-19 H-20 H-21 CI, H-23 H-24 H-25 CH. H-28 H-29 H-30 H-31 H-32 H-33 H-34 H-35 Fl. CsH++(t) H-36 H-37 H-38 H-39 S H-40 H-41 H-42 H-43 H-44 H-45 H-46 Addition of hydrazine compound represented by general formula (H) The position is the silver halide emulsion layer and/or a non-light-sensitive layer on the silver halide emulsion layer side of the support, preferably the silver halide emulsion layer and/or a layer below it. The amount added is preferably from 10<-1> to 10<-1> mol/l mole of silver, more preferably from IO<-4> to IO<-1> mole/l mole of silver.
次に本発明に用いられるテトラゾリウム化合物について
説明する。Next, the tetrazolium compound used in the present invention will be explained.
テトラゾリウム化合物は下記一般式で示すことができる
。The tetrazolium compound can be represented by the following general formula.
一般式(T)
本発明において、上記一般式〔T〕で示されるトリ7エ
ニルテトラゾリウム化合物の7エニル基の置換基Rl、
R2、R3は水素原子もしくは電子吸引性度を示すハメ
ットのシグマ値CaP)が負又は正のものが好ましい。General formula (T) In the present invention, a substituent Rl of the 7enyl group of the tri7enyltetrazolium compound represented by the above general formula [T],
R2 and R3 are preferably hydrogen atoms or those having a negative or positive Hammett's sigma value (CaP) indicating the degree of electron attraction.
特に負のものが好ましい。In particular, negative ones are preferred.
フェニル置換におけるハメットのシグマ値は多くの文献
、例えばジャーナル・オブ・メディカルケミストリ−(
Journal of Medical Chemis
try)第20巻、304頁、l977午、記載のC.
ハンシュ(C.Hansch)等の報文等に見ることが
出米、とくに好ましい負のシグマ値を有する基としては
、例えばメチル基(σP−−0.17以下いずれもσP
値)エチル基(−0.15)、シクロプロビル基(−0
.21)、n−プロビル基(−0.13)、isoプロ
ビル基(−0.15)、シクロブチル基(−0.15)
、n−プチル基(−0.16)、isO−プチル基(−
0.20)、n−ペンチル基(−0.15)、シクaヘ
キシル基(−0.22)、アミノ基(−0.66)、ア
セチルアミノ基(−0.15)、ヒドロキシル基( −
0.37)、メトキシ基(−0.27)、エトキシ基(
−0.24)、プロボキシ基(−0.25)、プトキ
シ基(−0.32)、ペントキシ基(−0.34)等が
挙げられ、これらはいずれも本発明の一般式(T)の化
合物の置換基として有用である。Hammett's sigma values for phenyl substitution have been reported in many publications, such as the Journal of Medical Chemistry (
Journal of Medical Chemistry
try) Volume 20, page 304, 1977 pm, C.
Particularly preferable groups having negative sigma values, such as those found in reports by C. Hansch et al.
value) ethyl group (-0.15), cycloprobyl group (-0
.. 21), n-probyl group (-0.13), isoprobyl group (-0.15), cyclobutyl group (-0.15)
, n-butyl group (-0.16), isO-butyl group (-
0.20), n-pentyl group (-0.15), cyclohexyl group (-0.22), amino group (-0.66), acetylamino group (-0.15), hydroxyl group (-
0.37), methoxy group (-0.27), ethoxy group (
-0.24), proboxy group (-0.25), putoxy group (-0.32), pentoxy group (-0.34), etc., all of which represent the general formula (T) of the present invention. Useful as a substituent for compounds.
以下本発明に用いられる一般式〔T〕の化合物の具体例
を挙げるが、本発明の化合物はこれに限(例示化合物)
T−1
T−4
T−5
T−6
T−7
T−8
T−9
T − 10
T − 11
T − 12
T − 13
T−14
T−15
T − 16
↑−17
T−18
本発明に用いられるテトラゾリウム化合物は、例えばケ
ミカル・レビx − (Che+++ical Rev
iews)第55巻、第335頁〜483頁に記載の方
法に従って容易に合或することができる。Specific examples of compounds of general formula [T] used in the present invention are listed below, but the compounds of the present invention are limited to these (exemplary compounds) T-1 T-4 T-5 T-6 T-7 T-8 T-9 T-10 T-11 T-12 T-13 T-14 T-15 T-16 ↑-17 T-18 The tetrazolium compound used in the present invention is, for example, Chemical Rev
iews), Vol. 55, pp. 335-483.
本発明のテトラゾリウム化合物は、本発明のハロゲン化
銀写真感光材料中に含有されるハロゲン化銀1モル当り
約lmg以上10gまで、好ましくは約10+*g以上
約2gまでの範囲で用いられるのが好ましい。The tetrazolium compound of the present invention is used in an amount of about 1 mg to 10 g, preferably about 10+*g to about 2 g, per mole of silver halide contained in the silver halide photographic material of the present invention. preferable.
本発明に使用するテトラゾリウム化合物は、単独でもち
いることにより好ましい特性を得ることができるが、複
数をいかなる比率で組み合わせても好ましい特性を劣化
させることはない。The tetrazolium compounds used in the present invention can provide preferable properties when used alone, but the preferable properties will not deteriorate even when a plurality of them are combined in any ratio.
本発明の好ましい一つの実施態様として、本発明に係わ
るテトラゾリウム化合物をハロゲン化銀乳剤層中に添加
することが挙げられる。又本発明の別の好ましい*施態
様においては、ハロゲン化銀乳剤層に直接隣接する親水
性コロイド層、又は中間層を介して隣接する親水性コロ
イド層に添加される。One preferred embodiment of the present invention is to add the tetrazolium compound according to the present invention to a silver halide emulsion layer. In another preferred embodiment of the invention, it is added to a hydrophilic colloid layer directly adjacent to the silver halide emulsion layer, or to a hydrophilic colloid layer adjacent via an intermediate layer.
又別の態様としては、本発明に係わるテトラゾリウム化
合物を適当な有機溶媒、例えばメタノール、エタノール
等のアルコール類ヤエーテル類、エステル類等に溶解し
てオーバーコート法等によりハロゲン化銀写真感光材料
のハロゲン化銀乳剤層側の最外層になる部分に直接塗布
してハロゲン化銀写真感光材料に含有せしめてもよい。In another embodiment, the tetrazolium compound according to the present invention is dissolved in a suitable organic solvent, for example, alcohols such as methanol and ethanol, ethers, esters, etc., and the halogen of the silver halide photographic light-sensitive material is coated by an overcoating method or the like. It may be incorporated into the silver halide photographic material by directly coating the outermost layer on the silver halide emulsion layer side.
本発明に係るハロゲン化銀写真感光材料に用いるハロゲ
ン化銀は、任意の組或の塩化銀、塩臭化銀、塩沃臭化銀
等で少なくとも50モル%の塩化銀を含有することが好
ましい。ハロゲン化銀粒子の平均粒径は0.025〜0
.5μ會の範囲のものが好ましく用いられる゛が0.0
5〜0.30μ−がより好ましい。The silver halide used in the silver halide photographic material according to the present invention preferably contains at least 50 mol% of silver chloride in any combination of silver chloride, silver chlorobromide, silver chloroiodobromide, etc. . The average grain size of silver halide grains is 0.025 to 0.
.. Those with a range of 5 μm are preferably used, and ゛ is 0.0.
5 to 0.30μ is more preferable.
本発明に係るハロゲン化銀粒子の単分散度は、下記式(
1)で定義され、その値は5〜60が好ましく、より好
ましくは8〜30となるよう調製する。The monodispersity of the silver halide grains according to the present invention is expressed by the following formula (
1), and its value is preferably adjusted to 5-60, more preferably 8-30.
本発明に係るハロゲン化銀粒子の粒径は、便宜的に立方
晶粒子の稜長で表し、単分散度は粒径の標準偏差を平均
粒径で割った値を100倍した数値で表す。The grain size of the silver halide grains according to the present invention is conveniently expressed by the edge length of the cubic grain, and the monodispersity is expressed by the value obtained by dividing the standard deviation of the grain size by the average grain size times 100.
又、本発明で用い得るハロゲン化銀としては、少なくと
も2層の多層積層構造を有するタイプのものを好ましく
用いることができる。たとえばコア部に塩化銀、シェル
部に臭化銀、逆にコア部を臭化銀、シェル部を塩化銀で
ある塩臭化銀粒子であってもよい。このときヨードは任
意の層に5%モル以内で含有させることができる。Further, as the silver halide that can be used in the present invention, a type having a multilayer laminated structure of at least two layers can be preferably used. For example, silver chlorobromide particles may have silver chloride in the core and silver bromide in the shell, or conversely, silver bromide in the core and silver chloride in the shell. At this time, iodine can be contained in any layer within 5% by mole.
又、少なくとも2種類の粒子を混合して用いることもで
きる。例えば主乳粒子は10モル%以下の塩化銀及び5
モル%以下のヨードを含有する立方晶、八面体又は平板
状の塩沃臭化銀粒子であり、副粒子はヨード5モル%以
下で塩化銀50モル%以上含有する立方晶、八面体又は
平板状塩沃臭化銀粒子からなる混合粒子とすることがで
きる.このように粒子を混合して用いる場合は、主・副
粒子の化学増感は任意であるが、副粒子は主粒子より化
学増感(イオウ増感や金増感)を控えることにより感度
を低くしてもよいし、粒子径や内部にドープするロジウ
ムなどの貴金属の量を調節して感度を低下させてもよい
。また副粒子の内部を金でカブらせてもよいし、コア/
シェル法でコアとシェルの組或を変化させてカブらせて
もよい。主粒子と副粒子は小粒子程よいが、例えば0.
025μm〜1.0μ鵬の任意の値をとることができる
。Furthermore, a mixture of at least two types of particles can also be used. For example, the main milk grains contain less than 10 mol% silver chloride and 5
Cubic, octahedral, or tabular silver chloroiodobromide grains containing iodine of mol% or less; subgrains are cubic, octahedral, or tabular grains containing iodine of 5 mol% or less and silver chloride of 50 mol% or more. It can be a mixed grain consisting of silver chloroiodobromide grains. When using a mixture of particles in this way, chemical sensitization of the main and sub particles is optional, but the sensitivity of the sub particles can be increased by refraining from chemical sensitization (sulfur sensitization or gold sensitization) compared to the main particles. The sensitivity may be lowered, or the sensitivity may be lowered by adjusting the particle size or the amount of noble metal such as rhodium doped inside. Furthermore, the inside of the sub-particle may be covered with gold, or the core/particle may be covered with gold.
The shell method may be used to change the combination of the core and shell to form a cover. The smaller the main particles and sub-particles, the better, for example 0.
It can take any value from 0.025 μm to 1.0 μm.
本発明に用いるハロゲン化銀乳剤調製時には、ロジウム
塩を添加して感度または階調をコントロールする事がで
きる。ロジウム塩の添加は一般には粒子形或時が好まし
いが、化学熟戊時、乳剤塗布液調製時でも良い。When preparing the silver halide emulsion used in the present invention, a rhodium salt can be added to control the sensitivity or gradation. It is generally preferable to add the rhodium salt in the form of particles, but it may also be added during chemical ripening or when preparing an emulsion coating solution.
本発明に用いるハロゲン化銀乳剤に添加されるロジウム
塩は、単純な塩の他に複塩でも良い。代表的には、ロジ
ウムクロライド、ロジウムトリクロライド、ロジウムア
ンモニウムクロライドなどが用いられる。The rhodium salt added to the silver halide emulsion used in the present invention may be a simple salt or a double salt. Typically, rhodium chloride, rhodium trichloride, rhodium ammonium chloride, etc. are used.
ロジウム塩の添加量は、必要とする感度、階調により自
由に変えられるが銀1モルに対して10−”モルからl
θ−4モルの範囲が特に有用である。The amount of rhodium salt added can be changed freely depending on the required sensitivity and gradation, but it ranges from 10-'' mol to 1 mol of silver.
A range of θ-4 moles is particularly useful.
まt;ロジウム塩を使用するときに、他の無機化合物例
えばイリジウム塩、白金塩、タリウム塩、コバルト塩、
金塩などを併用しても良い。イリジクム塩はしばしば高
照度特性の改良の目的で、銀lモル当り101モルから
lO−′モルの範囲まで好ましく用いることができる。When using rhodium salts, other inorganic compounds such as iridium salts, platinum salts, thallium salts, cobalt salts,
Gold salt etc. may also be used together. Iridicum salts can be used preferably in the range of 101 moles to 10-' moles per mole of silver, often for the purpose of improving high-light properties.
本発明において用いられるハロゲン化銀は種々の化学増
感剤によって増感することができる。増感剤としては、
例えば活性ゼラチン、硫黄増感剤(チオ硫酸ソーダ、ア
リルチオ力ルバミド、チオ尿素、アリルイソチオシアネ
ート等)、セレン増感剤(N,N−ジメチルセレノ床素
、セレノ尿素等)、還元増感剤(トリエチレンテトラミ
ン、塩化第1スズ等)、例えばカリウムクロロオーライ
ト、カリウムオーリチオシアネート、カリウムクロロオ
ーレート、2−オーロスルホベンゾチアゾールメチルク
ロライド、アンモニウムクロロパラデート、カリウムク
ロロプラチネート、ナトリウムクロロパラダイト等で代
表される各種貴金属増感剤等をそれぞれ単独で、あるい
は2種以上併用して用いることができる。なお金増感剤
を使用する場合は助剤的にロダンアンモンを使用するこ
ともできる。The silver halide used in the present invention can be sensitized with various chemical sensitizers. As a sensitizer,
For example, activated gelatin, sulfur sensitizers (sodium thiosulfate, allyl thiorubamide, thiourea, allyl isothiocyanate, etc.), selenium sensitizers (N,N-dimethylselenobase, selenourea, etc.), reduction sensitizers ( (triethylenetetramine, stannous chloride, etc.), such as potassium chloroaurite, potassium aurithiocyanate, potassium chloroaurate, 2-olosulfobenzothiazole methyl chloride, ammonium chloroparadate, potassium chloroplatinate, sodium chloroparadite, etc. Various noble metal sensitizers represented by can be used alone or in combination of two or more. When using a metal sensitizer, rhodanammonium can also be used as an auxiliary agent.
また本発明に用いられるノ1ロゲン化銀乳剤は、例えば
米国特許第3.567.456号、同3,615,63
9、同3,579,345、同3,615,608、同
3,598,596、同3,598,955、同3,5
92,653、同3,582.343号、特公昭40−
267511同40−27332、同43−13167
、同45−8833、同47−8746号等の明細書に
記載されている減感色素及び/又は紫外線吸収剤を用い
ることができる。Further, the silver nitride emulsion used in the present invention is disclosed in, for example, U.S. Pat.
9, 3,579,345, 3,615,608, 3,598,596, 3,598,955, 3,5
92,653, No. 3,582.343, Special Publication No. 1973-
267511 40-27332, 43-13167
, 45-8833, 47-8746, and the like can be used.
さらに本発明に用いられるハロゲン化銀乳剤は、例えば
米国特許第2.444.607号、同第2.716,0
62号、同第3.512,982号、西独国出願公告第
1,189.380号、同第2.058.626号、同
第2.118.411号、特公昭43−4133号、米
国特許第3.342.596号、特公昭47−4417
号、西独国出願公告第2.149.789号、特公昭3
9一2825号、特公昭49−13566号等に記載さ
れている化合物、好ましくは、例えば5.6−トリメチ
レン−7−ヒドロキシーS−トリアゾロ(1.5−a)
ピリミジン、5.6−テトラメチレン−7−ヒドロキシ
ーS一トリアゾロ(1.5−a)ピリミジン、5−メチ
ル−7−ヒドロキシ−S−}リアゾロ(1.5−a)ピ
リミジン、5−メチル−7−ヒドロキシーS一トリアゾ
ロ(1.5−a)ピリミジン、7−ヒドロキシン−S−
トリアゾロン(1.5−a)ビリミジン、5−メチル−
6−ブロモー7−ヒドロキシ=S−}リアゾロ(1.5
−a)ピリミジン、没食子酸エステル(例えば没食子酸
イソアミル、没食子酸ドデシル、没食子酸プロビル、没
食子酸ナトリウム)、メルカブタン類(1−7エニルー
5−メルカプトテトラゾール、2−メルヵプトベンツチ
アゾール)、ペンゾトリアゾール類(5−7’oムヘン
ットリアゾール、5−メチルベンットリアゾール)、ベ
ンツィミダゾールI[(6−ニトロベンツイミダゾール
)等を用いて安定化することができる。Further, the silver halide emulsion used in the present invention is, for example, US Pat. No. 2.444.607, US Pat.
No. 62, No. 3.512,982, West German Application Publication No. 1,189.380, No. 2.058.626, No. 2.118.411, Japanese Patent Publication No. 43-4133, U.S. Patent No. 3.342.596, Special Publication No. 47-4417
No., West German Application Publication No. 2.149.789, Special Publication No. 3
Compounds described in No. 9-2825, Japanese Patent Publication No. 49-13566, etc., preferably, for example, 5,6-trimethylene-7-hydroxy-S-triazolo (1.5-a)
Pyrimidine, 5,6-tetramethylene-7-hydroxy-S-triazolo(1.5-a)pyrimidine, 5-methyl-7-hydroxy-S-}riazolo(1.5-a)pyrimidine, 5-methyl-7 -Hydroxy-S-triazolo(1.5-a)pyrimidine, 7-hydroxy-S-
Triazolone (1.5-a) pyrimidine, 5-methyl-
6-Bromo7-hydroxy=S-}riazolo(1.5
-a) Pyrimidines, gallic acid esters (e.g. isoamyl gallate, dodecyl gallate, probyl gallate, sodium gallate), mercaptans (1-7enyl-5-mercaptotetrazole, 2-mercaptobenzthiazole), penzo It can be stabilized using triazoles (5-7'o muhenttriazole, 5-methylbenttriazole), benzimidazole I [(6-nitrobenzimidazole), etc.
本発明に係るハロゲン化銀写真感光材料及び/又は現像
液中には、アミノ化合物を含有することが好ましい。The silver halide photographic material and/or developer according to the present invention preferably contains an amino compound.
本発明に好ましく用いられるアミノ化合物は、第1級〜
第4級アミンすべてを包含する。好ましいアミノ化合物
の例としてアルカノールアミン類が挙げられる。以下、
好ましい具体例を列挙するが、これらに限定されるもの
でない。The amino compounds preferably used in the present invention are primary to
Includes all quaternary amines. Examples of preferred amino compounds include alkanolamines. below,
Preferred specific examples will be listed, but the invention is not limited thereto.
ジエチルアミノエタノール
ジエチルアミノブタノール
ジエチルアミノプロパン−1.2−ジオールジメチルア
ミノプロパン−1.2−ジオールジエタノールアミン
ジエチルアミノーl−グロパノール
トリエタノールアミン
ジプロビルアミノプロパン−1.2−ジオールジオクチ
ルアミノ−1−エタノール
ジオクチルアミノプロパン−1.2−ジオールドデシル
アミノプロパン−1.2−ジオールドデシルアミノ−1
−プロバノール
ドデシルアミノーl一エタノール
アミノプロパン−1.2−ジオール
ジエチルアミノー2−プロパノール
ジプロバノールアミン
グリシン
トリエチルアミン
トリエチレンジアミン
アミノ化合物はハロゲン化銀写真感光材料の感光層側の
塗設層(例えばハロゲン化銀乳剤層、保護層、下引層の
親水性コロイド層)の少なくとも1層及び/又は現像液
中に含有させればよく、好ましい実施態様は現像液中に
含有する態様である。diethylaminoethanoldiethylaminobutanoldiethylaminopropane-1,2-dioldimethylaminopropane-1,2-dioldiethanolaminediethylaminol-gropanoltriethanolaminediprobylaminopropane-1,2-dioldioctylamino-1-ethanoldioctylamino Propane-1,2-diolddecylaminopropane-1,2-diolddecylamino-1
-Probanol dodecylamino-1-ethanolaminopropane-1,2-diol diethylamino-2-propanol diprobanolamine glycine triethylamine triethylene diamine It may be contained in at least one layer (silver emulsion layer, protective layer, hydrophilic colloid layer of subbing layer) and/or in the developer, and a preferred embodiment is a mode in which it is contained in the developer.
アミノ化合物の含有量は含有させる対象、アミノ化合物
の種類等によって異なるが、コントラスト促進量が必要
である。The content of the amino compound varies depending on the object to be included, the type of the amino compound, etc., but a contrast promoting amount is required.
又現像性を高めるために、フエニドンやハイドロキノン
のような現像主薬、ペンゾトリアゾールのような抑制剤
を乳剤側に含有せしめることができる。あるいは処理液
の処理能力を上げるために、パッキング層に現像主薬や
抑制剤を含有せしめることができる。Further, in order to improve the developability, a developing agent such as phenidone or hydroquinone, or an inhibitor such as penzotriazole can be contained in the emulsion. Alternatively, in order to increase the processing ability of the processing solution, the packing layer may contain a developing agent or an inhibitor.
本発明に特に有利に用いられる親水性コロイドはゼラチ
ンであるが、ゼラチン以外の親水性コロイドとしては、
例えばコロイド状アルブミン、寒天、アラビアゴム、ア
ルギン酸、加水分解されたセルロースアセテート、アク
リルアミド、イミド化ボリアミド、ポリビニルアルコー
ル、加水分解されたポリビニルアセテート、ゼラチン誘
導体、例えば米国特許第2.614.928号、同第2
.525.753号に記載されている如きフエニル力ル
バミルゼラチン、アシル化ゼラチン、フタル化ゼラチン
、あるいは米国特許第2.548.520号、同第2.
831.767号に記載されている如きアクリル酸スチ
レン、アクリル酸エステル、メタクリル酸、メタクリル
酸エステル等のエチレン基を持つ重合可能な単量体をゼ
ラチンにグラ7ト重合したもの等を挙げることができ、
これらの親水性コロイドはノ\ロゲン化銀を含有しない
層、例えばハレーション防止層、保護層、中間層等l二
も適用できる。The hydrophilic colloid particularly advantageously used in the present invention is gelatin, but hydrophilic colloids other than gelatin include:
For example, colloidal albumin, agar, gum arabic, alginic acid, hydrolyzed cellulose acetate, acrylamide, imidized polyamide, polyvinyl alcohol, hydrolyzed polyvinyl acetate, gelatin derivatives, such as U.S. Pat. Second
.. 525.753, acylated gelatin, phthalated gelatin, or as described in U.S. Pat. No. 2,548,520, U.S. Pat.
Examples include gelatin polymerized with polymerizable monomers having ethylene groups such as styrene acrylate, acrylic ester, methacrylic acid, and methacrylic ester as described in No. 831.767. I can do it,
These hydrophilic colloids can also be applied to layers that do not contain silver halide, such as antihalation layers, protective layers, intermediate layers, etc.
本発明に用いる支持体としては、例えばバライタ紙、ポ
リエチレン被覆紙、ポリプロピレン合虞祇、ガラス板、
セルロースアセテート、セルロースナイトレート、例え
ばポリエチレンテレフタレート等のポリエステル7イル
ム、ボリアミド7イルム、ポリグロビレンフィルム、ボ
リカーポネートフィルム、ポリスチレン7イルム等が代
表的なものとして包含される。これらの支持体は、それ
ぞれハロゲン化銀写真感光材料の使用目的に応じて適宜
選択される。Examples of the support used in the present invention include baryta paper, polyethylene coated paper, polypropylene composite, glass plate,
Typical examples include cellulose acetate, cellulose nitrate, polyester 7-ilm such as polyethylene terephthalate, polyamide 7-ilm, polyglobylene film, polycarbonate film, polystyrene 7-ilm, and the like. These supports are appropriately selected depending on the intended use of the silver halide photographic material.
本発明に係るハロゲン化銀写真感光材料の現像に用いら
れる現像主薬としては次のものが挙げられる。HO−
(CI− CH). − OH型現像主薬の代表的なも
のとしては、ハイドロキノンがあり、その他にカテコー
ル、ビロガロール及びその誘導体ならびにアスコルビン
酸、クロロハイドロキノン、プロモハイドロキノン、メ
チルハイドロキノン、2.3−ジブロモハイドロキノン
、2.5−ジエチルハイドロキノン、カテコール、4−
クロロカテコール、4−7エ二ルー力テコール、3−メ
トキシー力テコール、4−アセチルービ口ガロール、ア
スコルビン酸ソーダ等がある。Examples of developing agents used in developing the silver halide photographic material according to the present invention include the following. HO-
(CI-CH). - Typical OH type developing agents include hydroquinone, as well as catechol, birogallol and its derivatives, ascorbic acid, chlorohydroquinone, promohydroquinone, methylhydroquinone, 2.3-dibromohydroquinone, and 2.5-diethyl. Hydroquinone, catechol, 4-
Examples include chlorocatechol, 4-7enylic acidol, 3-methoxylic acidol, 4-acetyloxyalcohol, and sodium ascorbate.
また、I{O− (CH− CH). − NHオ型現
像剤としては、オルト及びバラのアミノフェノールが代
表的なもので、4−アミノフェノール、2−アミノー6
−クエニルフェノール、2−アミノー4−クロロ〜6−
7ェニル7エノール、N−メチルーp−アミノフェニー
ル等がある。Also, I{O- (CH- CH). - Typical NH O-type developers include ortho and rose aminophenols, 4-aminophenol, 2-amino-6
-Quenylphenol, 2-amino-4-chloro~6-
Examples include 7-phenyl 7-enol, N-methyl-p-aminophenyl, and the like.
更に、HIN− (CH− CH).− NL型現像剤
としては例えば4−アミノー2−メチノレーN,N−ジ
エチノレアニリン、2.4−ジアミノーN,N−ジエチ
ルアニリン、N−(4−アミノー3−メチノレフェニノ
レ)一七ルホリン、p−7エニレンジアミン等がある。Furthermore, HIN- (CH- CH). - Examples of the NL type developer include 4-amino-2-methynole-N,N-diethynoleaniline, 2,4-diamino-N,N-diethylaniline, and N-(4-amino-3-methynolephenylene)17. Examples include luforin and p-7 enylenediamine.
ヘテロ環型現像剤としては、l−7zニルー3−ビラゾ
リドン、l−7ェニルー4,4−ジメチル−3−ビラゾ
リドン、l−7ェニルー4−メチル−4−ヒドロキシメ
チル−3−ビラゾリドンのよう々3−ビラゾリドン類、
1−7ユニル−4−アミノー5−ビラゾロン、5−アミ
ノラウシル等を挙げることができる。Examples of the heterocyclic developer include l-7zny-3-virazolidone, l-7phenyl-4,4-dimethyl-3-virazolidone, and l-7phenyl-4-methyl-4-hydroxymethyl-3-virazolidone. - vilazolidones,
Examples include 1-7unyl-4-amino-5-virazolone and 5-aminolaucil.
その他、T.H.ジェームス著ザ・セオリイ・オブ・ザ
・ホトグラフィック・プロセス第4版(The The
ory of Photographic Proce
ss FourthEdi tioa)# 2’91〜
334頁及びジャーナル・オプ・ジ・アメリカン・ケミ
カル・ソサエティ(Journal ofthe Am
erican Chemical Society)第
73巻、第3,100頁(1951)に記載されている
ごとき現像剤が本発明に有効に使用し得るものである。Others, T. H. The Theory of the Photographic Process, 4th Edition, by James
ory of Photographic Process
ss FourthEdi tioa)# 2'91~
334 pages and Journal of the American Chemical Society.
The developer described in Erican Chemical Society, Vol. 73, p. 3, 100 (1951) can be effectively used in the present invention.
これらの現像剤は単独で使用しても2種以上組み合わせ
てもよいが、2種以上を組み合わせて用いる方が好まし
い。また本発明にかかる感光材料の現像に使用する現像
液には保恒剤として、例えば亜硫酸ンーダ、亜硫酸カリ
、等の亜硫酸塩を用いても、本発明の効果が損なわれる
ことはない。又保恒剤としてヒドロキシルアミン、ヒド
ラジド化合物を用いることができ、この場合その使用量
は現像液12当たり5〜500gが好ましく、より好ま
しくは20〜200gである。These developers may be used alone or in combination of two or more types, but it is preferable to use two or more types in combination. Further, even if a sulfite salt such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the photosensitive material according to the invention, the effects of the invention will not be impaired. Further, hydroxylamine or a hydrazide compound can be used as a preservative, and in this case, the amount used is preferably 5 to 500 g, more preferably 20 to 200 g per 12 of the developer.
また現像液には有機溶媒としてグリコール類を含有させ
てもよく、そのようなグリコール類としテハエチレング
リコール、ジエチレングリコール、プロピレングリコー
ル、トリエチレングリコール、1.4−ブタンジオール
、1.5−ペンタンジオール等があるが、ジエチレング
リコールが好ましく用いられる。そしてこれらグリコー
ル類の好ましい使用量は現像液lQ当たり5〜500g
で、より好ましくは20〜200gである。これらの有
機溶媒は単独でも併用しても用いることができる。Further, the developer may contain glycols as an organic solvent, and examples of such glycols include tetraethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1.4-butanediol, 1.5-pentanediol, etc. However, diethylene glycol is preferably used. The preferred amount of these glycols used is 5 to 500 g per 1Q of developer solution.
The amount is more preferably 20 to 200 g. These organic solvents can be used alone or in combination.
本発明に係るハロゲン化銀写真感光材料は、上記の如き
現像抑制剤を含んだ現像液を用いて現像処理することに
より極めて保存安定性に優れた感光材料を得ることがで
きる。By developing the silver halide photographic material according to the present invention using a developer containing the above-mentioned development inhibitor, a photographic material having extremely excellent storage stability can be obtained.
上記の組成になる現像液のpH値は好ましくは9〜l3
であるが、保恒性及び写真特性上からpH値はlO〜l
2の範囲が更に好ましい。現像液中の陽イオンについて
は、ナトリウムよりカリウムイオンの比率が高い程現像
液の活性度を高めることができるので好ましい。The pH value of the developer having the above composition is preferably 9 to 13
However, from the viewpoint of preservation and photographic properties, the pH value is 10 to 1
A range of 2 is more preferred. Regarding cations in the developer, it is preferable that the ratio of potassium ions is higher than that of sodium because the activity of the developer can be increased.
本発明に係るハロゲン化銀写真感光材料は、種々の条件
で処理することができる。処理温度は、例えば現像温度
は50℃以下が好ましく、特に25℃〜40℃前後が好
ましく、又現像時間は2分以内に終了することが一般的
であるが、特に好ましくは10秒〜50秒が好効果をも
たらすことが多い。又現像以外の処理工程、例えば水洗
、停止、安定、定着、更に必要に応じて前硬膜、中和等
の工程を採用することは任意であり、これらは適宜省略
することもできる。更にまた、これらの処理は皿現像、
枠現像などいわゆる手現像処理でも、ローラー現像、ハ
ンガー現像など機械現像であってもよい。The silver halide photographic material according to the present invention can be processed under various conditions. As for the processing temperature, for example, the development temperature is preferably 50°C or lower, particularly preferably around 25°C to 40°C, and the developing time is generally completed within 2 minutes, particularly preferably 10 seconds to 50 seconds. often has positive effects. Furthermore, it is optional to employ processing steps other than development, such as washing with water, stopping, stabilizing, fixing, and if necessary, prehardening and neutralization, and these steps can be omitted as appropriate. Furthermore, these processes include plate development,
It may be a so-called manual development process such as frame development, or a mechanical development process such as roller development or hanger development.
以下実施例によって本発明を具体的に説明する。 EXAMPLES The present invention will be specifically explained below with reference to Examples.
尚、当然のことではあるが、本発明は以下述べる実施例
に限定されるものではない。It should be noted that, as a matter of course, the present invention is not limited to the embodiments described below.
実施例l
下引き処理したポリエチレンテレ7タレートに50W/
m”・■inのエネルギーでコロナ放電した後下記構或
の帯電防止液を、下記の付量になる様に3o■/一in
の速さでロールフィットコーティングパン及びエアーナ
イフを使用して塗布した。Example 1 50W/50W to undercoated polyethylene tele7 talate
After performing a corona discharge with an energy of m"・■in, apply an antistatic liquid of the following composition to the amount of 3o■/1in.
The coating was applied using a roll-fit coating pan and an air knife at a speed of .
(帯電防止層)
水溶性導電性ポリマー表−1に示す 0.6g/m”疎
水性ボリマー粒子 表−1に示す 0.4g/+*”硬
膜剤( C ) 0.1g/m
”90゜c, 2分間乾燥し140℃、90秒間熱処理
した。(Antistatic layer) Water-soluble conductive polymer 0.6 g/m as shown in Table-1 Hydrophobic polymer particles 0.4 g/+* as shown in Table-1 Hardener (C) 0.1 g/m
It was dried at 90°C for 2 minutes and heat treated at 140°C for 90 seconds.
この帯電防止層の上にゼラチンを2.0g/s’になる
様に塗布しヒビワレ試験を行った。ゼラチンの硬膜剤と
しては、ホルマリン、2,4−ジクロロ−6−ヒドロキ
シ−S−}リアジンナトリウムを用いた。結果を表−1
に示す。Gelatin was applied onto this antistatic layer at a rate of 2.0 g/s' and a cracking test was conducted. Formalin and sodium 2,4-dichloro-6-hydroxy-S-}lyazine were used as hardeners for gelatin. Table 1 shows the results.
Shown below.
〈ヒビワレ試験〉
試験片を乾燥したシリカゲルで相対湿度がほぼ0%にな
った容器に入れ密封し、40℃で3日保存する。保存後
試験片を容器から取り出し、ヒビワレの程度を目視でラ
ンク付けした。<Crack Test> The test piece is sealed with dry silica gel in a container with a relative humidity of approximately 0%, and stored at 40°C for 3 days. After storage, the test pieces were taken out of the container and visually ranked for the degree of cracking.
○:ヒビワレナシ △:ヒビワレは若干生じるが実
用上可a:特開昭55−84658号記載
0
表−1の結果より本発明の試料はヒビワレに対して優れ
た効果を有することが明らかである。○: No cracking △: Some cracking occurs, but is acceptable for practical use a: 0 described in JP-A-55-84658 From the results in Table 1, it is clear that the samples of the present invention have an excellent effect on cracking.
実施例2
(乳剤の調製)
pH 3.0の酸性雰囲気下でコントロールドダブルジ
ェット法によりロジウム塩を、銀1モル当たり10リモ
ル含有する平均粒経0−11IImsハロゲン化銀組戊
単分散度l5、臭化銀を5モル%含む塩臭化銀粒子を作
戊した。粒子の戊長は、ペンジルアデニンを1%のゼラ
チン水溶液lI2当たり30s+g含有する系で行った
。銀とハライドの混台後、6−メチル−4−ヒドロキシ
−1.3.3a.7テトラザインデンをハロゲン化銀1
モル当たり600mg加え、その後水洗、脱塩した。Example 2 (Preparation of emulsion) A rhodium salt was prepared by a controlled double jet method in an acidic atmosphere at pH 3.0, with an average grain size of 0 to 11 IIms, a silver halide composition containing 10 lmol per mole of silver, and a monodispersity of 15. , silver chlorobromide grains containing 5 mol % of silver bromide were prepared. The elongation of the particles was carried out in a system containing 30 s+g of penzyladenine per 1% gelatin aqueous solution lI2. After mixing silver and halide, 6-methyl-4-hydroxy-1.3.3a. 7 tetrazaindene to silver halide 1
600 mg per mole was added, and then washed with water and desalted.
次いで、ハロゲン化銀1モル当たり60argの6−メ
チル−4−ヒドロキシ−1.3.3a,7−テトラザイ
ンデンを加えた後、ハロゲン化銀1モル当たり15mg
のチオ硫酸ナトリウムを加え、60℃でイオウ増感をし
た。イオウ増感後安定剤として6−メチル−4−ヒドロ
キシ−1.3.3a.7−テトラザインデンをハロゲン
化銀1モル当たり600一g加えた。Then 60 arg of 6-methyl-4-hydroxy-1.3.3a,7-tetrazaindene per mole of silver halide was added followed by 15 mg per mole of silver halide.
of sodium thiosulfate was added, and sulfur sensitization was carried out at 60°C. 6-Methyl-4-hydroxy-1.3.3a. as a stabilizer after sulfur sensitization. 600 grams of 7-tetrazaindene was added per mole of silver halide.
得られた乳剤に添加剤を下記の付量になるように調製添
加し、特開昭59−19941号の実施例−1によりラ
テックス下引処理した厚さ100,u園のポリエチレン
テレ7タレート支持体上に塗布した。Additives were added to the obtained emulsion in the amounts shown below, and a latex subbing treatment was performed according to Example 1 of JP-A No. 59-19941 to obtain a polyethylene tele-7 tallate support with a thickness of 100 mm. applied on the body.
ラテックスボリマー:スチレンーブチルアクリレートー
アクリル酸3元共重合
ボリマー 1.0 g/m”テトラフェ
ニルホスホニウムクロライド30 mg/m”
サポニン 200 ■guys
”ポリエチレングリコーノレ 10G Him
”ハイドロキノン 200 1g/一
スチレンーマレイン酸共重合体20 ■g/1ヒドラ
ジン化合物(表−2に示す) 50 Him”5−メ
チルベンゾトリアゾール 30 mg/s”減感
色素(M) 20 B/s”ア
ルカリ処理ゼラチン(等電点4.9)1.5 g/s’
ビス(ビニルスルホニルメチル)エーテル15 m
gl醜3
銀量
2・8 g7口”
(乳剤層保護膜)
乳剤層保護膜として、下記の付量になるよう調製し、乳
剤とともに同時重層塗布した。Latex polymer: Styrene-butyl acrylate acrylic acid ternary copolymer polymer 1.0 g/m"Tetraphenylphosphonium chloride 30 mg/m"Saponin 200 ■guys
”Polyethylene Glyco Nore 10G Him
"Hydroquinone 200 1g/mono-styrene-maleic acid copolymer 20 g/1 hydrazine compound (shown in Table-2) 50 Him" 5-methylbenzotriazole 30 mg/s" Desensitizing dye (M) 20 B/s "Alkali-treated gelatin (isoelectric point 4.9) 1.5 g/s'
Bis(vinylsulfonylmethyl)ether 15 m
gl Ugly 3 Silver amount 2.8 g7 mouth'' (Emulsion layer protective film) An emulsion layer protective film was prepared in the following amount and coated simultaneously with the emulsion in a multilayer manner.
弗素化ジオクチルスルホフハク酸エステル200厘g/
s”
ドデシルベンゼンスノレホン酸ナトリウムlOO1g/
1
マット剤:ポリメタクリル酸メチル(平均粒径3.5μ
一) 100 mg/m”硝酸
リチウム塩 30 mg/+*’没
食子酸プロビルエステル 300 ■g/12−
メルカプトベンツイミダゾールー5−スルホン酸ナトリ
ウム 30 mg/m”アルカリ
処理ゼラチン(等電点4.9) 1.3 g/s”コロ
イダルシリ力 30 鳳g/■2スチ
レンーマレイン酸共11 合体100 ■gets”
ビス(ビニルスルホニルメチル)エーテル15 mg
/+*”
つぎに、乳剤層と反対側の支持体上に、あらかじめ30
冒/11inのパワーでコロナ放電しt;後、ポリ(ス
チレンープチルアクリレートーグリシジルメタクリレー
ト)ラテックスポリマーをヘキサメチレンアジりジン硬
暎剤の存在下で塗布し、さらに帯電防止層を実施例1と
同様に塗布し、ついで下記組成のパッキング層を添加剤
が下記付量になるように調製し、塗布した。Fluorinated dioctyl sulfosuccinate ester 200 g/
s” Sodium dodecylbenzenesnolephonate lOO1g/
1 Matting agent: Polymethyl methacrylate (average particle size 3.5μ
1) 100 mg/m"Lithium nitrate 30 mg/+*'Gallic acid probyl ester 300 g/12-
Mercaptobenzimidazole-sodium 5-sulfonate 30 mg/m" Alkali-treated gelatin (isoelectric point 4.9) 1.3 g/s" Colloidal silicate force 30 Og/■2 Styrene-maleic acid 11 Combined 100 ■ “gets”
Bis(vinylsulfonylmethyl)ether 15 mg
/+*” Next, 30%
After corona discharge with a power of 11 in., a poly(styrene-butyl acrylate glycidyl methacrylate) latex polymer was applied in the presence of a hexamethyleneaziridine hardener and an antistatic layer was applied as in Example 1. Coating was carried out in the same manner, and then a packing layer having the composition shown below was prepared and applied so that the amount of additives was as shown below.
(パッキング層)
ラテックスポリマー:プチルアクリレートースチレン共
重合体 0.5 gem”スチレンーマレイ
ン酸共重合体 100 一g/1クエン酸(塗布後p
H5.4に調製) 40 mg/m”サボニン
200 lIg/m”硝酸リチウム
塩 30 1g/■1パッキング染
料
(b)
(c)
SO 3 Na
アルカリ処理ゼラチン 2.0g/m”ビ
ス(ビニルスルホニルメチル)エーテル15 mg八
一
(パフキング層保護膜)
添加剤を下記付量になるよう調製し、パッキング層上部
に同時重層塗布した。(Packing layer) Latex polymer: butyl acrylate styrene copolymer 0.5 gem” styrene-maleic acid copolymer 100 1 g/1 citric acid (after coating p.
Prepared at H5.4) 40 mg/m”Sabonin
200 lIg/m" Lithium nitrate salt 30 1g/■1 Packing dye (b) (c) SO 3 Na Alkali-treated gelatin 2.0g/m" Bis(vinylsulfonylmethyl)ether 15 mg Yaichi (puffing layer protective film) Additives were prepared in the amounts shown below and were simultaneously coated on top of the packing layer.
ジオクチルスルホコハク酸エステル
200 tag/o”
マット剤:ポリメタクリル酸メチル
(乎均粒径4.0μ−) 50 m
g/a”アルカリ処理ゼラチン(等電点4.9)1.0
g/m”
弗素化ドデシルベンゼンスルホン酸
ナ ト リ ウ ム
50 mg/m茸ビス(ビニルスルホ
ニルメチル)
工一テル 20■g/■2な
お、上記塗布液のpHはあらかじめ5.4に調製してか
ら塗布した。Dioctylsulfosuccinate 200 tag/o” Matting agent: Polymethyl methacrylate (average particle size 4.0 μ-) 50 m
g/a” alkali-treated gelatin (isoelectric point 4.9) 1.0
g/m” Sodium fluorinated dodecylbenzenesulfonate
50 mg/m Mushroom Bis(vinylsulfonylmethyl) Koichitel 20 g/2 2 The pH of the above coating solution was adjusted to 5.4 before coating.
以上のようにして得られた試料をそれぞれ2つに分け、
一方は23℃相対湿度55%で3日間保存した。残りの
一方は23℃相対湿度55%で3時間調湿し後、重ねた
状態で防湿袋に封入し、55℃で3日間保存して強制劣
化させ経時代用試料を作威した.両方の試料を、ステッ
プウエッジを通して露光後、下記に示す現像液、定着液
を使用して現像処理した後、感度及び表面比抵抗を求め
た。なお感度は光学濃度で1.0になる露光量とし、相
対感度で表した。結果を表2に示した。Divide each sample obtained as above into two,
One was stored for 3 days at 23° C. and 55% relative humidity. The remaining one was conditioned for 3 hours at 23°C and 55% relative humidity, then sealed in a moisture-proof bag in a stacked state, and stored at 55°C for 3 days to undergo forced deterioration and create an aging sample. After exposing both samples to light through a step wedge, they were developed using the developer and fixer shown below, and then the sensitivity and surface resistivity were determined. Note that the sensitivity was expressed as a relative sensitivity, with the exposure amount giving an optical density of 1.0. The results are shown in Table 2.
男』L森Jul並一
工程 温度 時間
現像 34℃ 15秒
定着 32℃ lO秒
水洗 常温 lO秒
現像液処方
ハイドロキノン 25 gl−フ
ェニル−4,4ジメチル−3−
ビラゾリドン 0.4g臭化ナト
リウム 3g5−メチルベンゾトリ
アゾール 0.3g5−ニトロインダゾール
0.05gジエチルアミノプロパン−1.2
−ジオール10 g
亜i酸カリウム 90 g5−スル
ホサリチル酸ナトリウム 75 gエチレンジアミ
ン四酢酸ナトリウム
2g
水でII2に仕上げた。``Man'' L Mori Jul average step Temperature Time development 34℃ 15 seconds fixing 32℃ 1O seconds Washing Room temperature 1O seconds Developer formulation Hydroquinone 25 gl-Phenyl-4,4dimethyl-3-virazolidone 0.4g Sodium bromide 3g 5-methyl Benzotriazole 0.3g5-nitroindazole
0.05g diethylaminopropane - 1.2
-Diol 10 g Potassium sulfite 90 g Sodium 5-sulfosalicylate 75 g Sodium ethylenediaminetetraacetate 2 g Finished to II2 with water.
pHは、苛性ソーダで11.5とした。The pH was adjusted to 11.5 with caustic soda.
定着液処方
(組戒A)
チオ硫酸アンモニウム(72.5v%水溶液)240
m(1
亜硫酸ナトリウム 17 g酢酸ナ
トリウム・3水塩 6.5g1!酸
6gクエン酸
ナトリウム・2水塩2 g
酢酸(90w%水溶液) 13.6mg
(組fRB)
純水(イオン交換水) 17 mQ硫
18 (50v%の水溶液) 4.7g[
酸アルミニウム(AM,O.換算含量が8.1v%の水
溶液) 26.5g定着液の使用時に
水500m(2中に上記組成A1組IgBの順に溶かし
、lI2に仕上げて用いた。この表2の結果から本発明
の試料は、経時保存による感度低下が少なく、また処理
後の帯電防止能の劣化も少ないことが分かる。Fixer prescription (Kumiai A) Ammonium thiosulfate (72.5v% aqueous solution) 240
m (1 Sodium sulfite 17 g Sodium acetate trihydrate 6.5 g 1! acid
6g Sodium citrate dihydrate 2g Acetic acid (90w% aqueous solution) 13.6mg
(Set fRB) Pure water (ion exchange water) 17 mQ sulfur 18 (50v% aqueous solution) 4.7g [
When using 26.5 g of fixer solution, 26.5 g of acid aluminum (an aqueous solution with an AM, O. equivalent content of 8.1 v%) were dissolved in 500 ml of water (the above composition A1 group IgB was dissolved in the order of 2, finished to 1I2, and used. Table 2 From the results, it can be seen that the samples of the present invention show less sensitivity loss due to storage over time, and less deterioration of antistatic ability after processing.
実施例3
実施例2と同様にして、ロジウム塩を銀lモル当たり1
0−’モルを含有し、平均粒径0.20μ■、単分散度
20の臭化銀を2モル%含む塩臭化銀粒子を作或した。Example 3 Similar to Example 2, rhodium salt was added at 1 mole of silver per mole of silver.
Silver chlorobromide grains containing 2 mol % of silver bromide with an average particle diameter of 0.20 .mu.m and a monodispersity of 20 were prepared.
これを実施例2と同様に処理、水洗、脱塩後イオウ増感
を施した。This was treated in the same manner as in Example 2, washed with water, desalted, and then sulfur sensitized.
得られた乳剤に添加剤を下記の付量になるように調製添
加し、実施例lで用いた下引加工済ポリエチレンテレ7
タレート支持体上に塗布した。Additives were added to the obtained emulsion in the amounts shown below to obtain the subbed polyethylene Tele 7 used in Example 1.
Coated on a tallate support.
ラテックスポリマー:
スチレン・プチルアクリレートアクリル酸3元共重合ボ
リマー 1.0g/璽!7エノール
l Ilgim”サボニン
200■g/−3ドデシルベ
ンゼン
スルホン酸ナトリウム 50mg/−ステ
トラゾリウム化合物(表−3に示す)50■g/s”化
合物(N)
化合物(0)
スチレンーマレイン酸共重合体
アルカリ処理ゼラチン(等電点4,9)銀量
ホルマリン
化合物(N)
40mg/m”
50mg/+a”
20+mg/m”
2.0g/1
3.5g/m”
10mg/m”
化合物(0)
尚、塗布液はあらかじめ水酸化ナトリウムpH6.5に
調整したのち塗布した。乳剤保護膜として、添加剤を下
記の付量になるように調製し、乳剤塗布液とともに同時
重層塗布した。Latex polymer: Styrene/butyl acrylate acrylic acid ternary copolymer polymer 1.0g/seal! 7 enol
l Ilgim”Sabonin
200 g/-3 Sodium dodecylbenzenesulfonate 50 mg/-stetrazolium compound (shown in Table 3) 50 g/s" Compound (N) Compound (0) Styrene-maleic acid copolymer Alkali-treated gelatin (etc.) Electrical point 4,9) Silver amount Formalin compound (N) 40mg/m"50mg/+a"20+mg/m" 2.0g/1 3.5g/m"10mg/m" Compound (0) The coating liquid should be prepared in advance. The sodium hydroxide solution was applied after adjusting the pH to 6.5. As an emulsion protective film, additives were prepared in the amounts shown below and were coated simultaneously with the emulsion coating solution.
弗素化ジオクチル
スルホコハク酸エステル loo+sg/m″
ジオクチノレスノレホコハク酸エステノレ 100mg
/量3マット剤:不定型シリカ 50■g
/−8化合物(0 ) 3
0mg/鵬25−メチノレベンゾトリアゾーノレ
20mg/s”化合物(P)
500■g/1没食子酸プロビルエステル
300mg/■オスチレンーマレイン酸共重合体
100mg/m’アルカリ処理ゼラチン(等電点
4.9) 1.0g/一”ホルマリン
101g/−8尚、あらかじめクエン酸
でpH 5.4に調整したのち塗布した。Fluorinated dioctyl sulfosuccinate loo+sg/m″
Dioctinoresnorephosuccinic acid ester 100mg
/Amount 3 Matting agent: Amorphous silica 50g
/-8 compound (0) 3
0mg/Peng 25-methynolebenzotriazole
20mg/s” Compound (P)
500g/1 gallic acid probyl ester
300mg/■Ostyrene-maleic acid copolymer
100mg/m' alkali-treated gelatin (isoelectric point 4.9) 1.0g/1" formalin
101g/-8 The pH was adjusted to 5.4 with citric acid before coating.
化合物(P)
次に乳剤層とは、反対側の支持体上に、実施例2と全く
同様にして帯電防止層、パッキング層を設けた。ただし
この時のパッキング層の硬膜剤はホルマリンを使用した
。Compound (P) Next, an antistatic layer and a packing layer were provided on the support opposite to the emulsion layer in exactly the same manner as in Example 2. However, formalin was used as the hardening agent for the packing layer at this time.
実施例2と同様に処理し、評価した。It was treated and evaluated in the same manner as in Example 2.
ただし、現像液は下記のものを用いた。得られた結果を
表−3に示す。However, the following developer was used. The results obtained are shown in Table 3.
(組或A)
純水(イオン交換水) 150mQエ
チレンジアミン四酢酸二ナトリウム塩 2gジエチレン
グリコール 50g亜硫酸カリウム(
55%W/V水溶液) 100ml2炭酸カリウ
ム 50gハイドロキノン
15g1−フェニルー5−メル
カプトテトラゾール 30mg水酸化カリウム 使用液
のpHをlO.4にする量臭化カリウム
4.5g(組或B)
純水(イオン交換水) 3tsgジ
エチレングリコール 50gエチレン
ジアミン四酢酸二
ナトリウム塩 25mg酢酸
(90%水溶液) 0 . 3m(
2!−フェニル−3−ビラゾリドン
500一g
現像液の使用時に水500ml2中に上記組戊A1組成
表3の結果からも実施例2のヒドラジン化合物の場合と
同様に本発明の試料は経時保存による感度低下が少なく
、処理後の帯電防止能の劣化も少ない。(Set A) Pure water (ion exchange water) 150mQ ethylenediaminetetraacetic acid disodium salt 2g diethylene glycol 50g potassium sulfite (
55% W/V aqueous solution) 100ml potassium carbonate 50g hydroquinone
15g 1-phenyl-5-mercaptotetrazole 30mg potassium hydroxide Adjust the pH of the working solution to lO. Potassium bromide amount to 4
4.5g (group B) Pure water (ion exchange water) 3tsg diethylene glycol 50g ethylenediaminetetraacetic acid disodium salt 25mg acetic acid (90% aqueous solution) 0. 3m (
2! - Phenyl-3-virazolidone 500 1 g When using the developer, prepare the above composition in 500 ml of water. From the results of Composition Table 3, it can be seen that, as in the case of the hydrazine compound of Example 2, the sensitivity of the sample of the present invention decreases due to storage over time. There is little deterioration in antistatic ability after treatment.
本発明により、処理後も帯電防止能の劣化がおこらず、
しかも親水性コロイド層を上層に設けた場合のひびわれ
を生じないプラスティックフィルム支持体用の帯電防止
層及びこの帯電防止層を超硬調乳剤に適用した場合、経
時で減感しない安定性の高いハロゲン化銀写真感光材料
を提供することができた。According to the present invention, the antistatic ability does not deteriorate even after treatment,
Moreover, when a hydrophilic colloid layer is provided as an upper layer, an antistatic layer for a plastic film support that does not cause cracking, and when this antistatic layer is applied to an ultra-high contrast emulsion, a highly stable halogenated layer that does not desensitize over time. We were able to provide a silver photographic material.
Claims (1)
ー粒子(3)硬化剤の反応生成物からなる帯電防止層を
有してなるプラスチックフィルム支持体において、該硬
化剤が環状糖類とエピクロルヒドリンの縮合物であるこ
とを特徴とする帯電防止層を有するハロゲン化銀写真感
光材料。 [2]感光性乳剤層中にヒドラジン化合物またはテトラ
ゾリウム化合物を含有することを特徴とする請求項1記
載のハロゲン化銀写真感光材料。[Scope of Claims] [1] A plastic film support comprising an antistatic layer comprising (1) a water-soluble conductive polymer, (2) hydrophobic polymer particles, and (3) a reaction product of a curing agent. 1. A silver halide photographic material having an antistatic layer, wherein the hardening agent is a condensate of a cyclic sugar and epichlorohydrin. [2] The silver halide photographic material according to claim 1, wherein the photosensitive emulsion layer contains a hydrazine compound or a tetrazolium compound.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30699489A JPH03166540A (en) | 1989-11-27 | 1989-11-27 | Silver halide photographic sensitive material subjected to antistatic treatment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30699489A JPH03166540A (en) | 1989-11-27 | 1989-11-27 | Silver halide photographic sensitive material subjected to antistatic treatment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03166540A true JPH03166540A (en) | 1991-07-18 |
Family
ID=17963740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30699489A Pending JPH03166540A (en) | 1989-11-27 | 1989-11-27 | Silver halide photographic sensitive material subjected to antistatic treatment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03166540A (en) |
-
1989
- 1989-11-27 JP JP30699489A patent/JPH03166540A/en active Pending
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