JPH0316091A - Semiconductor recorder - Google Patents

Semiconductor recorder

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Publication number
JPH0316091A
JPH0316091A JP1151067A JP15106789A JPH0316091A JP H0316091 A JPH0316091 A JP H0316091A JP 1151067 A JP1151067 A JP 1151067A JP 15106789 A JP15106789 A JP 15106789A JP H0316091 A JPH0316091 A JP H0316091A
Authority
JP
Japan
Prior art keywords
word line
pair
potential
word
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1151067A
Other languages
Japanese (ja)
Inventor
Atsushi Oba
敦 大庭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1151067A priority Critical patent/JPH0316091A/en
Publication of JPH0316091A publication Critical patent/JPH0316091A/en
Pending legal-status Critical Current

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  • Static Random-Access Memory (AREA)

Abstract

PURPOSE:To execute the operation at a high speed by providing a current source by which a current value drawn out of a pair of word lines is varied in accordance with the potential of the pair of word lines on every pair of word lines, and drawing out a current from the pair of word lines by the current source. CONSTITUTION:A current source 22 by which a current value drawn out of pairs of word lines 4 - 7 is varied in accordance with the potential of the pairs of word lines is provided on every pair of word lines 4 - 7. That is, a discharge current of the word line at the time when the pairs of word lines 4, 5 are migrated from a selecting state to a non-selecting state is increased, and also, a drawing-out current from the pair of word lines migrated to the non-selecting state is decreased continuously. Accordingly, a fall of the word line is executed quickly, and also, after the word line is migrated from the selecting state to the non-selecting state, the potential of the word line does not float up. In such a way, the operation can be executed at a high speed.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体記憶装置に関し、特にバイポーラトラ
ンジスタを用いたRAM (ランダムアクセスメモリ)
において、ワード線やメモリセルに蓄積される電荷を放
電するワードディスチャージ回路に用いて有効なもので
ある。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a semiconductor memory device, and in particular to a RAM (random access memory) using bipolar transistors.
It is effective for use in word discharge circuits that discharge charges accumulated in word lines and memory cells.

〔従来の技術〕[Conventional technology]

第11図は例えは特開昭56−37884号公報に示さ
れた従来の半導体記憶装置のワード線選択回路及びワー
ド・ディスチャージ回路を示す回路図であり、ここでは
2行2列の半導体記憶装置の例を示している。図におい
て、1及び2はECL (エミッタカップルドロジック
)のNOR回路によるワード線選択回路であり、ワード
線選択信号X00XOIがワード線選択回路lに、ワー
ド線選択信号X10.X11がワード線選択回路2にそ
れぞれ入力され、比較参照電位3がワード線選択回路1
.2に共通して与えられている。
FIG. 11 is a circuit diagram showing a word line selection circuit and a word discharge circuit of a conventional semiconductor memory device disclosed in, for example, Japanese Patent Laid-Open No. 56-37884. An example is shown. In the figure, 1 and 2 are word line selection circuits using ECL (emitter-coupled logic) NOR circuits, and the word line selection signal X00XOI is sent to the word line selection circuit l, and the word line selection signal X10. X11 is input to the word line selection circuit 2, and the comparison reference potential 3 is input to the word line selection circuit 1.
.. It is given in common to 2.

MCOO,MCOI,MCIO.MCI 1はメモリセ
ルであり、MCOO,MCOIが正側のワード線4及び
負側ワード線5に、MCIO,MCl1が正側ワード線
6及び負側ワード線7に接続され、メモリセルMCOO
,MCIOがビッl− 線対8.9に、メモリセルMC
O 1,MCI 1がビット線対10.11に接続され
ている。また、BDo,BDIはビット綿ドライバであ
り、BDOがビット線対8.9に、BDIがビット,%
91対10.11にそれぞれ接続され、共にYアドレス
制御回路40により制御されている。12は負側ワード
線5に、13は負側ワード線7にそれぞれ接続された定
電流源、14はワード線対4.5に、15はワード線対
6,7にそれぞれ接続されたワード・ディスチャージ回
路、16.17はワード・デイスチャージ回路14.1
5に共通に接続された定電流源、30は読みだし/書き
込み制御回路である。
MCOO, MCOI, MCIO. MCI1 is a memory cell, MCOO and MCOI are connected to the positive word line 4 and negative word line 5, MCIO and MCl1 are connected to the positive word line 6 and negative word line 7, and the memory cell MCOO
, MCIO is connected to bit line pair 8.9, memory cell MC
O 1 and MCI 1 are connected to bit line pair 10.11. In addition, BDo and BDI are bit cotton drivers, BDO is bit line pair 8.9, BDI is bit line pair 8.9, and BDI is bit line pair 8.9.
91 and 10.11, respectively, and both are controlled by the Y address control circuit 40. 12 is a constant current source connected to the negative side word line 5, 13 is a constant current source connected to the negative side word line 7, 14 is a word line pair 4.5, and 15 is a word line source connected to the word line pair 6, 7, respectively. Discharge circuit, 16.17 is word discharge circuit 14.1
5 is a constant current source commonly connected, and 30 is a read/write control circuit.

次に動作について説明する.例えばメモリセルMCOO
を選択するには、ワード線対4.5を選択状態の″H 
++レベルにし、かつビット線ドライバBDOを活性化
することにより行う。ワード線対4.5を選択するには
ワード線選択回路1の入力XOO,XOIの両方を参照
基準電位3より低いレベルにし、その他のワード線選択
回路2の複数の入力の少なくとも1つの入力レベルを参
照基準電位3より高いレベルにすることによりワード線
対4.5のみが“H゛レベルの選択状態になる。
Next, we will explain the operation. For example, memory cell MCOO
To select word line pair 4.5, select “H”.
This is done by setting the bit line driver BDO to ++ level and activating the bit line driver BDO. To select word line pair 4.5, set both inputs XOO and XOI of word line selection circuit 1 to a level lower than reference standard potential 3, and set the input level of at least one of the plurality of inputs of other word line selection circuits 2. By setting the word line pair 4.5 to a level higher than the reference potential 3, only the word line pair 4.5 becomes selected at the "H" level.

次にメモリセルMCIOを選択するには、ワード線選択
回路1の入力XOO,XOIの少なくとも1つを″1{
 I1レベルにし、ワード線選択回路2の入力XIO,
Xllの両方を“L”レベルにしてワード線対6.7を
選択の“H”゜レベルにする。
Next, to select memory cell MCIO, at least one of the inputs XOO and XOI of word line selection circuit 1 is set to ``1{
I1 level, input XIO of word line selection circuit 2,
The word line pair 6.7 is set to the selected "H" level by setting both Xll to "L" level.

このとき、次に選択されるメモリセルM.C10への切
り換えを高速に行うためには非選択になるワード線対4
.5の電位を高速に立ち下げる必要がある。ワード・デ
ィスチャージ回路14.15はそれぞれが接続されたワ
ード線対が立ち下がる時に共通電流源l6と負側ワード
線をつなぐスイッチ回路として動作し、共通電流源16
の大きな電流を利用して選択から非選択の状態に移行す
るワード線対の放電を行うため、その電位を急速に立ち
下げることができる。また、定電流源1213は保持電
流源であり、メモリセルMCOO,MCIIの記憶内容
を保持するためのものである。
At this time, the next selected memory cell M. In order to quickly switch to C10, word line pair 4 becomes unselected.
.. It is necessary to lower the potential of 5 at high speed. The word discharge circuits 14 and 15 operate as a switch circuit that connects the common current source l6 and the negative side word line when the word line pair to which they are connected falls,
Since the word line pair transitioning from the selected state to the non-selected state is discharged using a large current, the potential thereof can be rapidly lowered. Further, the constant current source 1213 is a holding current source, and is for holding the memory contents of the memory cells MCOO and MCII.

〔発明が解決しようとする課題] ところで、従来の半導体記憶装置において、特にメモリ
セルMCOO〜MCIIが第12図に示した様な飽和型
メモリセルにより構成される場合、ワード線対が選択状
態より非選択状態に移行する際に、第13図に示す様に
、ワード・ディスチャージ回路がカレントスイ・ソチと
して動作するために、該回路が切り換わると同時にワー
ド線対から引き抜く電流が急速にOFFされるため、メ
モリセルに蓄積された電荷がワード線に溢れ出し、ワー
ド線対の電位が一旦上昇する現象が知られている。
[Problems to be Solved by the Invention] By the way, in a conventional semiconductor memory device, especially when the memory cells MCOO to MCII are constituted by saturated memory cells as shown in FIG. When transitioning to the non-selected state, as shown in FIG. 13, the word discharge circuit operates as a current switch, so the current drawn from the word line pair is rapidly turned off at the same time as the circuit is switched. It is known that the electric charge accumulated in the memory cell overflows to the word line, causing the potential of the word line pair to rise once.

この様なワード線電位の再上昇があると次に非選択状態
から選択状態に移行するワード線対との間に二重選択状
態を生じ、読みだし及び書き込み、特に書き込み動作が
阻害され、書き込みに要する時間が長くなるとか、誤書
き込みが起こるなどの問題がある。
If the word line potential rises again in this way, a double selection state will occur between the word line pair that will next transition from a non-selected state to a selected state, and read and write operations, especially write operations, will be inhibited, and write operations will be inhibited. There are problems such as it takes a long time to write, and writing errors occur.

本発明は上記のような従来のものの問題点を解消するた
めになされたもので、選択状態から非選択状態に移行す
るワード線対の電位の立ち下げを急速に行えると共に、
非選択状態に移行した後のワード線対の電位の再上昇を
防止することのできる半導体記憶装置を得ることを目的
とする。
The present invention has been made in order to solve the problems of the conventional ones as described above, and it is possible to rapidly lower the potential of a pair of word lines transitioning from a selected state to a non-selected state, and
It is an object of the present invention to provide a semiconductor memory device that can prevent the potential of a word line pair from rising again after transitioning to a non-selected state.

〔課題を解決するための手段〕[Means to solve the problem]

本発明に係る半導体記憶装置は、ワード線対の電位に応
じてワード線対から引き抜く電流値が変化する電流源を
、各ワード線対毎に設けたものである。
In the semiconductor memory device according to the present invention, a current source is provided for each word line pair, and the current value drawn from the word line pair changes depending on the potential of the word line pair.

〔作用] 本発明における半導体記憶装置は、上述のような電流源
を設けることにより、ワード線対が選択状態から非選択
状態に移行するときのワード線放電電流を大きくすると
共に、非選択状態に移行するワード線対からの引き抜き
電流を連続的に減少させるようにしたので、ワード線の
立ち下がりが急速に行われ、なおかつ、ワード線が選択
状態から非選択状態に移行した後のワード線電位の浮き
上がりがなく、高速な動作を行うことができる。
[Function] By providing the current source as described above, the semiconductor memory device of the present invention increases the word line discharge current when the word line pair transitions from the selected state to the unselected state, and also increases the word line discharge current when the word line pair transitions from the selected state to the unselected state. Since the current drawn from the transitioning word line pair is continuously reduced, the word line falls rapidly and the word line potential after the word line transitions from the selected state to the non-selected state There is no lifting and high-speed operation is possible.

〔実施例〕〔Example〕

以下、本発明の実施例を図について説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第l図は本発明の一実施例による半導体記憶装置を示し
、図において、l及び2はECL (エミッタカップル
ドロジック)のNOR回路によるワード線選択回路であ
り、ワード線選択信号X00,XOIがワード線選択回
路1に、ワード線選択信号XIO,Xllがワード線選
択回路2にそれぞれ入力され、比較参照電位3がワード
線選択回路1,2に共通して与えられている。MCOO
,MCo 1,MCI O,MCI 1はメモリセルで
あり、MCOO,MCO 1が正側ワード線4及び負側
ワード線5に、MCIO,MCI 1が正側ワード線6
及び負側ワード線7に接続され、MCOO,MCIOが
ビット線対8,9に、MCOI,MCIlがビット線対
10.11にそれぞれ接続されている。
FIG. 1 shows a semiconductor memory device according to an embodiment of the present invention. In the figure, 1 and 2 are word line selection circuits using ECL (emitter coupled logic) NOR circuits, and word line selection signals X00 and XOI are Word line selection signals XIO and Xll are respectively input to word line selection circuit 1 and word line selection circuit 2, and comparison reference potential 3 is commonly applied to word line selection circuits 1 and 2. MCOO
, MCo 1, MCI O, MCI 1 are memory cells, MCOO, MCO 1 are connected to the positive word line 4 and negative word line 5, and MCIO, MCI 1 are connected to the positive word line 6.
and negative side word line 7, MCOO and MCIO are connected to bit line pairs 8 and 9, and MCOI and MCI1 are connected to bit line pair 10 and 11, respectively.

また、BDO,BDIはピント線ドライバであり、BD
Oがビット線対8.9に、BDIがビット線対10.1
1にそれぞれ接続され、共にYアドレス制御回路40に
より制御されている。14,l5はワード・ディスチャ
ージ回路であり、それぞれ抵抗l8及びPNPトランジ
スタ19、抵抗20及びPNP }ランジスタ21から
横戒されており、PNP }ランジスタ19,21はそ
れぞれ抵抗18.20を介して負側ワード線5,7に工
ξツタが接続され、定電圧発生回路22にベースが、負
側電源にコレクタが接続されている。なお、30は読み
だし/書き込み制御回路である。
In addition, BDO and BDI are focus line drivers, and BD
O to bit line pair 8.9, BDI to bit line pair 10.1
1, and both are controlled by the Y address control circuit 40. 14 and l5 are word discharge circuits, which are connected to the resistor l8 and the PNP transistor 19, respectively, and from the resistor 20 and the PNP transistor 21, and the PNP transistors 19 and 21 are connected to the negative side through the resistor 18 and 20, respectively. A power supply is connected to the word lines 5 and 7, a base is connected to the constant voltage generating circuit 22, and a collector is connected to the negative power source. Note that 30 is a read/write control circuit.

次に動作について説明する。ワード線対4,5を選択す
るにはワード線選択回路1の入力XOO.XOlの両方
を“L″レベルにする。次にワード線対6.7を選択し
、ワード線対4.5を非選択状態にするにはワード線選
択回路1の入力XOO,XOIの少なくとも1つを゛H
 11レベルにし、ワード線選択回路2の入力XIO,
Xllの両方をt+ L II レヘルにする。このと
きのワード線4.56.7の電位及びワード・ディスチ
ャージ回路14.15に流れる電流を第2図に示す。
Next, the operation will be explained. To select word line pair 4 and 5, input XOO. of word line selection circuit 1 is used. Set both XOl to “L” level. Next, to select the word line pair 6.7 and make the word line pair 4.5 unselected, at least one of the inputs XOO and XOI of the word line selection circuit 1 is set to ``H''.
11 level, input XIO of word line selection circuit 2,
Set both Xll to t+ L II level. The potential of word line 4.56.7 and the current flowing through word discharge circuit 14.15 at this time are shown in FIG.

ワード・ディスチャージ回路14に流れる電流(los
s)は簡単のためPNP トランジスタのベース・工ξ
ツタ間電圧(V.)が一定であると仮定すると、定電圧
発生回路22により与えられる電位(VIIEF )と
ワード線5の電位(■エ)及びワート・ディスチャージ
回路の抵抗18.19の抵抗値(Rots )により次
式より求められる。
The current flowing through the word discharge circuit 14 (los
s) is the base structure of the PNP transistor ξ for simplicity.
Assuming that the voltage between the vines (V.) is constant, the potential (VIIEF) given by the constant voltage generation circuit 22, the potential of the word line 5 (■D), and the resistance value of the resistor 18.19 of the word discharge circuit. (Rots) is obtained from the following equation.

ワー1゛・ディスチャージ回路l4に流れる電流は第2
図に示した様にワード線対4,5が選択状態になるとき
、最大値となり、非選択状態に移行するに従い徐々に減
少し、非選択状態で最小値となる。この最小値はワード
線対が非選択状態にあるときメモリセルの記憶内容の保
持に必要な電流値に設定される。この様にワード・ディ
スチャージ回路はワード線対が選択状態から非選択状態
に移行する初期に大きな電流を流し、ワード線電位が非
選択の電位に近づくに従いその電流値を減少させるので
、選択状態から非選択状態に移行するワード線対の電位
は立ち下がり始めには急速に変化し、非選択状態に近付
くに従い緩やかに変化する。
The current flowing through the power 1 discharge circuit l4 is
As shown in the figure, when the word line pair 4 and 5 are in the selected state, the value is the maximum value, gradually decreases as the pair of word lines 4 and 5 go into the non-selected state, and becomes the minimum value in the non-selected state. This minimum value is set to a current value necessary to hold the memory contents of the memory cell when the word line pair is in a non-selected state. In this way, the word discharge circuit causes a large current to flow in the initial stage when the word line pair transitions from the selected state to the unselected state, and as the word line potential approaches the unselected potential, the current value decreases. The potential of the word line pair transitioning to the unselected state changes rapidly at the beginning of falling, and gradually changes as it approaches the unselected state.

このように、本実施例によれば、ワード・ディスチャー
ジ回路をワード線の電位と定電圧発生回路により与えら
れる電位との差電圧により制御され、連続的に電流値を
変化させる電流源により構或するようにしたので、選択
から非選択へと移行するワード線の電位の放電を急速か
つ安定に実行でき、しかも非選択状態に移行した後のワ
ード線対の電位の再上昇を防止することができる。
As described above, according to this embodiment, the word discharge circuit is controlled by the voltage difference between the potential of the word line and the potential given by the constant voltage generation circuit, and is constructed of a current source that continuously changes the current value. As a result, it is possible to rapidly and stably discharge the potential of the word line that changes from selected to unselected state, and to prevent the potential of the word line pair from rising again after the transition to the unselected state. can.

第3図は第1図に示した回路をさらに改良したものであ
り、ワード・ディスチャージ回路14,l5にコンデン
サ23.24及び抵抗25.26からなる遅延素子51
.52をそれぞれ追加したものである。即ち、コンデン
サ23.24の一端を負ワード線5.7に、他端をPN
Pトランジスタ19.21のベースに接続し、PNP 
l−ランジスタ19,21のベースをそれぞれ抵抗25
.26を介して定電圧発生回路22に接続している。
FIG. 3 shows a further improvement of the circuit shown in FIG. 1, in which a delay element 51 consisting of a capacitor 23, 24 and a resistor 25, 26 is added to the word discharge circuit 14, l5.
.. 52 respectively. That is, one end of the capacitor 23.24 is connected to the negative word line 5.7, and the other end is connected to the PN
Connect to the base of P transistor 19.21, PNP
The bases of l-transistors 19 and 21 are connected to resistors 25 and 25, respectively.
.. It is connected to the constant voltage generation circuit 22 via 26.

次に第3図に示した回路の動作について説明する。第4
図はワード線対4,5が選択状態から非選択状態に、ワ
ード線対6.7が非選択状態から選択状態に移行する場
合の各接点の電位及び電流を示したものである。負側ワ
ード線5に接続されたワード・ディスチャージ回路14
において、負側ワード線5から引き抜く電流(loss
)は、PNP}ランジスタl9のベース・工ξツタ間電
圧(V.)と、PNP トランジスタl9のヘース電位
(vcN.rL)と負側ワード線5の電位(VW.)及
びワード・ディスチャージ回路の抵抗l8の抵抗値(R
D+s )により次式より求められる。
Next, the operation of the circuit shown in FIG. 3 will be explained. Fourth
The figure shows the potential and current at each contact point when the word line pair 4, 5 transitions from the selected state to the unselected state, and the word line pair 6.7 transitions from the unselected state to the selected state. Word discharge circuit 14 connected to negative side word line 5
, the current (loss
) is the voltage between the base and the terminal (V.) of the PNP transistor l9, the Hase potential (vcN.rL) of the PNP transistor l9, the potential of the negative side word line 5 (VW.), and the voltage of the word discharge circuit. Resistance value of resistor l8 (R
D+s) is obtained from the following formula.

ここで、負側ワード線5の電位一(VW.)とPNPト
ランジスタ19のベース電位( V CIITL )と
の差電圧(Vows )を考えると上式は次のように書
き換えられる。
Here, considering the voltage difference (Vows) between the potential (VW.) of the negative side word line 5 and the base potential (VCIITL) of the PNP transistor 19, the above equation can be rewritten as follows.

この差電圧(Vows )はPNP l−ランジスタの
電流増幅率が充分に大きいと考えると負側ワード線5の
電位(VW−)と定電圧発生回路22より与?られる電
位(■■,)との電位差に対して、コンデンサ23及び
抵抗25の値で決まる時間分(δt)だけ遅れて変化す
る。そのため負側ワード線5に流れる電流(I.s)は
第1図に示した場合に較べて、遅延時間(Δt)だけ遅
れて変化する.このときワード線対4.5の立ち下がり
時間は立ち下がりのときに流れる電流が多い分だけ第1
図に示した回路の場合より速くなる。また、ワード線対
6.7の立ち上がりについても、第1図の回路ではワー
ド線の立ち上がりの途中からワード線放電電流が流れ始
めるため立ち上がり波形がなまるのに対して、ワード線
放電電流の流れるのが遅れるため立ち上がり波形のなま
りがなく、より高速に動作させることができる。
Considering that the current amplification factor of the PNP l-transistor is sufficiently large, this difference voltage (Vows) is given by the potential (VW-) of the negative side word line 5 and the constant voltage generation circuit 22? It changes with a delay of a time (δt) determined by the values of the capacitor 23 and the resistor 25 with respect to the potential difference with the potential (■■,). Therefore, the current (I.s) flowing through the negative side word line 5 changes with a delay of the delay time (Δt) compared to the case shown in FIG. At this time, the falling time of word line pair 4.5 is longer than the first line due to the large amount of current flowing at the falling edge.
This is faster than the circuit shown in the figure. Regarding the rise of the word line pair 6.7, in the circuit shown in Figure 1, the word line discharge current starts flowing in the middle of the rise of the word line, so the rising waveform is blunted, whereas the word line discharge current flows. Because there is a delay in the start-up waveform, there is no rounding of the rising waveform, allowing for faster operation.

なお、上記両実施例ではワード・ディスチャージ回路に
よりワード線が非選択時の保持電流を与えるように構威
したものを示したが、第5図に示す様に保持電流の電流
源41.42を別に設けても同様の効果が得られる。
In both of the above embodiments, a word discharge circuit is used to provide a holding current when the word line is not selected, but as shown in FIG. Even if it is provided separately, similar effects can be obtained.

また、第6図に示した様に抵抗43.44等により、ワ
ード・ディスチャージ回路の出力を正側ワード線に接続
して、メモリセルから正側ワード線に溢れ出して来る電
荷も同時に放電する様にすることも出来る。
In addition, as shown in Figure 6, the output of the word discharge circuit is connected to the positive word line using resistors 43, 44, etc., and the charges overflowing from the memory cells to the positive word line are also discharged at the same time. You can also make it look like this.

また、以上の各実施例では、電位差により出力電流値が
制御される電流値をPNPトランジスタと抵抗とで構戒
した例を示したが、この電流源を例えば第7図ないし第
10図に示した様にpMOS61のみで、或いは、pM
OS61及び抵抗62で構或してもよく、上記実施例と
同様の効果が得られる。
Further, in each of the above embodiments, an example was shown in which the current value whose output current value is controlled by the potential difference was controlled using a PNP transistor and a resistor, but this current source is shown in FIGS. 7 to 10, for example. As shown in pMOS61 only, or pM
The structure may be made of the OS 61 and the resistor 62, and the same effect as in the above embodiment can be obtained.

〔発明の効果〕〔Effect of the invention〕

以上のように、本発明に係る半導体記憶装゛置によれば
、ワード線対の電位に応じてワード線対から引き抜く電
流値が変化する電流源を各ワード線対毎に設け、該電流
源によりワード線対から電流を引き抜くようにしたので
、ワード線の立ち下がりが急速に行われ、なおかつ、ワ
ード線が選択状態から非選択状態に移行した後のワード
線電位の浮き上がりがなく、高速な動作を行えるものが
得られる効果がある。
As described above, according to the semiconductor memory device of the present invention, a current source whose current value drawn from the word line pair changes depending on the potential of the word line pair is provided for each word line pair, and the current source Since the current is drawn from the word line pair using This has the effect of providing something that can perform the movements.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の第1の実施例による半導体記憶装置の
要部を示す回路図、第2図は第l図の回路の動作を示す
図、第3図は本発明の第2の実施例による半導体記憶装
置の要部を示す図、第4図は第3図の回路の動作を示す
図、第5図,第6図第7図,第8図,第9図.第10図
は本発明の他の実施例を示す図、第11図は従来の半導
体記憶装置を示す回路図、第12図は飽和型メモリセル
を示す回路図、第13図は従来の半導体記憶装置の動作
を示す図である。 図において、1,2はワード線選択回路、45,6.7
はワード線、8,9,10.11はビット線、14.1
5はワード・ディスチャージ回路、18.20は抵抗、
19.21はPNPトランジスタ、22は定電圧発生回
路、23.24はコンデンサ、25.26は抵抗、30
は読みだし/書き込み制御回路、40はYアドレス制御
回路、MCOO,MCOI.MCIO,MCI lはメ
モリセル、 BDO、 BDIはビット線ドライバであ る。 なお図中同一符号は同一又は相当部分を示す。
FIG. 1 is a circuit diagram showing the main parts of a semiconductor memory device according to a first embodiment of the present invention, FIG. 2 is a diagram showing the operation of the circuit of FIG. 4 is a diagram showing the operation of the circuit of FIG. 3, FIG. 5, FIG. 6, FIG. 7, FIG. 8, FIG. FIG. 10 is a diagram showing another embodiment of the present invention, FIG. 11 is a circuit diagram showing a conventional semiconductor memory device, FIG. 12 is a circuit diagram showing a saturated memory cell, and FIG. 13 is a conventional semiconductor memory FIG. 3 is a diagram showing the operation of the device. In the figure, 1 and 2 are word line selection circuits, 45, 6.7
is word line, 8, 9, 10.11 is bit line, 14.1
5 is a word discharge circuit, 18.20 is a resistor,
19.21 is a PNP transistor, 22 is a constant voltage generation circuit, 23.24 is a capacitor, 25.26 is a resistor, 30
40 is a read/write control circuit, 40 is a Y address control circuit, MCOO, MCOI. MCIO and MCI1 are memory cells, and BDO and BDI are bit line drivers. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] (1)複数のワード線対と複数のビット線対とそれぞれ
のワード線対とビット線対の交点にメモリセルが接続さ
れ、 ワード線対の電位を選択及び非選択の状態に応じて切換
えることにより読出し及び書込み動作を行う半導体記憶
装置において、 ワード線対の一方又は両方に直接或いは遅延素子を介し
て接続され、該ワード線の電位に応じてワード線対より
引き抜く電流値が制御される電流源を各ワード線対毎に
設けたことを特徴とする半導体記憶装置。
(1) A memory cell is connected to a plurality of word line pairs, a plurality of bit line pairs, and the intersection of each word line pair and bit line pair, and the potential of the word line pair is switched according to the selected/unselected state. In a semiconductor memory device that performs read and write operations, a current is connected to one or both of a pair of word lines directly or through a delay element, and the value of the current drawn from the pair of word lines is controlled according to the potential of the word line. A semiconductor memory device characterized in that a source is provided for each word line pair.
JP1151067A 1989-06-13 1989-06-13 Semiconductor recorder Pending JPH0316091A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1151067A JPH0316091A (en) 1989-06-13 1989-06-13 Semiconductor recorder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1151067A JPH0316091A (en) 1989-06-13 1989-06-13 Semiconductor recorder

Publications (1)

Publication Number Publication Date
JPH0316091A true JPH0316091A (en) 1991-01-24

Family

ID=15510581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1151067A Pending JPH0316091A (en) 1989-06-13 1989-06-13 Semiconductor recorder

Country Status (1)

Country Link
JP (1) JPH0316091A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7474557B2 (en) 2001-06-29 2009-01-06 International Business Machines Corporation MRAM array and access method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7474557B2 (en) 2001-06-29 2009-01-06 International Business Machines Corporation MRAM array and access method thereof

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