JPH03160616A - Double-layer perpendicular magnetic recording medium and its production - Google Patents

Double-layer perpendicular magnetic recording medium and its production

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Publication number
JPH03160616A
JPH03160616A JP29974389A JP29974389A JPH03160616A JP H03160616 A JPH03160616 A JP H03160616A JP 29974389 A JP29974389 A JP 29974389A JP 29974389 A JP29974389 A JP 29974389A JP H03160616 A JPH03160616 A JP H03160616A
Authority
JP
Japan
Prior art keywords
layer
magnetic recording
magnetization
perpendicular magnetic
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29974389A
Other languages
Japanese (ja)
Other versions
JP2798745B2 (en
Inventor
Atsushi Kuga
淳 久我
Hideaki Yoshimoto
吉本 秀明
Junji Numazawa
沼澤 潤二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Broadcasting Corp
Original Assignee
Nippon Hoso Kyokai NHK
Japan Broadcasting Corp
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Publication date
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Priority to JP1299743A priority Critical patent/JP2798745B2/en
Publication of JPH03160616A publication Critical patent/JPH03160616A/en
Application granted granted Critical
Publication of JP2798745B2 publication Critical patent/JP2798745B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To obtain a double-layer tape for perpendicular magnetic recording having stable properties and to realize the production method of such tapes at high productivity by constituting the magnetic layer for magnetic recording of two-layer structure comprising a base of smaller saturation magnetization and an upper layer of larger saturation magnetization. CONSTITUTION:A layer of low coercive force having the axis of easy magnetization in its surface plane, for example, Permalloy layer B (Ni-Fe) is formed to 0.075mum thickness on a nonmagnetic substrate film A such as polyimide film by sputtering an opposite target. Then magnetic recording layers having the axis of easy magnetization perpendicular to the plane, such as Co-Cr are deposited into two layers. The first base layer C has smaller saturation magnetization with <= 0.05mum thickness, while the second upper layer D has larger saturation magnetization with such thickness that the total thickness with the lower layer becomes <=0.15mum. Since the saturation magnetization of the Co-Cr base layer adjacent to the Permalloy layer is small, a double-layer tape for perpendicular magnetic recording having good characteristics can be obtained with little deterioration of initial magnetic permeability.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は垂直磁気記録媒体及びその製造方法に関する
ものである. (発明の概要) この発明は垂直磁気記録二層媒体及びその製造方法に関
するもので、非磁性基板上に膜面内に磁化容易軸を有す
る低保磁力磁性層と膜面に垂直方向の磁化容易軸を有す
る磁気記録磁性層を順次形成してなる垂直磁気記録媒体
において、その磁気記録磁性層を飽和磁化のより小さい
下地層と飽和磁化のより大きい上部層とで形成し、これ
ら一連の磁性層を特定條件のスパッタリング法で形成し
ている。かくて高密度化に適した性能の高い垂直磁気記
録媒体と効率のよい製造方法を実現している。
[Detailed Description of the Invention] (Field of Industrial Application) This invention relates to a perpendicular magnetic recording medium and a method for manufacturing the same. (Summary of the Invention) The present invention relates to a perpendicular magnetic recording dual-layer medium and a method for manufacturing the same. In a perpendicular magnetic recording medium in which a magnetic recording magnetic layer having an axis is sequentially formed, the magnetic recording magnetic layer is formed of an underlayer with a lower saturation magnetization and an upper layer with a higher saturation magnetization, and the magnetic recording layer of the series of magnetic recording layers is is formed using a sputtering method under specific conditions. In this way, a high-performance perpendicular magnetic recording medium suitable for high-density storage and an efficient manufacturing method have been realized.

(従来の技術) 近年、磁気記録の高密度化の要求にともない、磁性層の
膜厚方向に記録する、いわゆる垂直磁気記録方式の研究
が盛んに行なわれている。
(Prior Art) In recent years, with the demand for higher density magnetic recording, research has been actively conducted on so-called perpendicular magnetic recording methods in which recording is performed in the thickness direction of a magnetic layer.

これら垂直磁気記録媒体はおもに真空蒸着法、スパッタ
法あるいはメッキ法によって作製され、特にスバッタ法
により作製された垂直磁気記録媒体は、磁性膜の磁気特
性の制御が容易であるため盛んに研究がなされている。
These perpendicular magnetic recording media are mainly manufactured by vacuum evaporation, sputtering, or plating methods. In particular, perpendicular magnetic recording media manufactured by the sputtering method have been actively researched because the magnetic properties of the magnetic film can be easily controlled. ing.

しかしながら高密度の記録を行なう場合、記録されるビ
ット長の大幅な縮小や、狭トラック化、広帯域化を必要
とするため高C/N化が必要となる。
However, when performing high-density recording, it is necessary to significantly reduce the recorded bit length, narrow tracks, and widen the band, and therefore, a high C/N is required.

このため、Co − Cr合金からなる垂直磁気記録層
とベースフィルムとの間にNi−Fe合金からなる軟磁
性層を形成した、いわゆる「垂直磁気記録二層媒体」と
垂直磁気記録用ヘッドの組み合わせによる記録方式が研
究されている。
For this reason, a combination of a perpendicular magnetic recording head and a so-called "perpendicular magnetic recording dual-layer medium" in which a soft magnetic layer made of a Ni-Fe alloy is formed between a perpendicular magnetic recording layer made of a Co-Cr alloy and a base film. A recording method is being researched.

この方式によれば、垂直磁気記録用ヘッドの主磁極と垂
直二層媒体の軟磁性層との間に、強レ)磁気的相互作用
が働き、膜厚方向に対して垂直に磁力線を発生できるた
め、高記録密度におレ)ても理想的な垂直磁気記録が行
なえ、再生時におレ)ても軟磁性層がリターンバスとな
るため高再生出力力く得られている. (発明が解決しようとする課題) 垂直磁気記録二層テープを実現しようとすればGo−C
r/ Ni −Fe垂直磁気記録二層媒体の膜厚を0.
25μm程度以下にする必要がある。これは二層媒体の
厚みを厚くするとテープ自体の柔軟性が失なわれて使用
上種々の欠点がでてくるからである。
According to this method, strong magnetic interaction occurs between the main pole of the perpendicular magnetic recording head and the soft magnetic layer of the perpendicular dual-layer medium, generating lines of magnetic force perpendicular to the film thickness direction. Therefore, ideal perpendicular magnetic recording can be performed even at high recording densities, and even during playback, the soft magnetic layer acts as a return bus, resulting in high playback output power. (Problem to be solved by the invention) In order to realize a perpendicular magnetic recording double layer tape, Go-C
The film thickness of the r/Ni-Fe perpendicular magnetic recording dual-layer medium was set to 0.
It needs to be about 25 μm or less. This is because when the thickness of the two-layer medium is increased, the tape itself loses its flexibility, resulting in various disadvantages in use.

従来の垂直二層媒体では軟磁性層であるパーマロイ膜(
Ni−Fe)の膜厚はそれ自体は薄くできるが、この厚
さを0.1 μm以下に薄くするとその上のCo−Cr
硬磁性層とパーマロイ層との間の磁気的な相互作用によ
るパーマロイ層の磁気特性の劣化が著しくなり、安定し
た性能のよい二層テープが実現されないという欠点があ
った。そしてこのことが垂直磁気記録二層テープの市販
化を困難にしている. そこで本発明の目的は、安定した性能のよい垂直磁気記
録の可能な二層テープとそれを量産性よく製造するため
の製造方法を提供せんとするものである。
Conventional perpendicular two-layer media uses a permalloy film (permalloy), which is a soft magnetic layer.
The film thickness of Ni-Fe (Ni-Fe) itself can be made thin, but if this thickness is reduced to 0.1 μm or less, the Co-Cr on it
The magnetic interaction between the hard magnetic layer and the permalloy layer causes a significant deterioration in the magnetic properties of the permalloy layer, resulting in a drawback that a two-layer tape with stable performance cannot be realized. This makes it difficult to commercialize double-layer perpendicular magnetic recording tapes. SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a two-layer tape capable of perpendicular magnetic recording with stable performance and a manufacturing method for manufacturing the same with good mass productivity.

(課題を解決するための手段) 本発明者らはかかる問題に対し、鋭意検討の結果、垂直
磁気記録二層媒体ではCo − Crの飽和磁化と膜厚
が0.05μmから0.1 μmのバーマロイの初透磁
率との間には強い相関があり、Co − Crの飽和磁
化が大きくなるにつれてパーマロイの初透磁率が小さく
なることを見いだした。
(Means for Solving the Problems) The inventors of the present invention have investigated this problem and found that in perpendicular magnetic recording dual-layer media, the saturation magnetization and film thickness of Co-Cr are 0.05 μm to 0.1 μm. It was found that there is a strong correlation between the initial magnetic permeability of Vermalloy and that the initial magnetic permeability of Permalloy decreases as the saturation magnetization of Co-Cr increases.

そこで、膜厚0.075μmのバーマロイ層上に飽和磁
化が51〜514 (emu/cc)のCo − Cr
を作製し、その上にさらに飽和磁化が514 (emu
/cc)のCo − Crを、下地層と上部層との全厚
が0.15μmになるまで作製することによりパーマロ
イの初透磁率を劣化させない事ができること、及びそれ
を効率よく製造する方法を見いだした。また、パーマロ
イ膜の飽和磁歪定数λ,をFeの&II威を変えて制御
することでパーマロイ膜の磁化容易軸が膜面内にありか
つテープ走行方向に対して60度から120度の範囲に
する事ができた。
Therefore, Co-Cr with a saturation magnetization of 51 to 514 (emu/cc) was deposited on a vermalloy layer with a thickness of 0.075 μm.
, and further saturation magnetization of 514 (emu
/cc) of Co-Cr until the total thickness of the underlayer and upper layer is 0.15 μm, it is possible to prevent the initial magnetic permeability of permalloy from deteriorating, and how to efficiently manufacture it. I found it. In addition, by controlling the saturation magnetostriction constant λ of the permalloy film by changing the &II strength of Fe, the axis of easy magnetization of the permalloy film is within the film plane and is within the range of 60 degrees to 120 degrees with respect to the tape running direction. I was able to do something.

(作 用) 本発明によれば、垂直磁気記録二層媒体のバーマロイ7
1 (Ni−Fe)のすぐ上層のCo − Crの下地
層の飽和磁化がより小さいので、その初透磁率は左程劣
化することなく、性能のよい垂直磁気記録用二層テープ
が実現でき、またこれらの層を制御の容易なスバッタ法
により効率よく製造できるので量産性の高い製造方法が
実現できる. (実施例) 以下添付図面を参照し実施例により本発明を詳細に説明
する。
(Function) According to the present invention, Vermalloy 7 of the perpendicular magnetic recording dual layer medium
1. Since the saturation magnetization of the Co-Cr underlayer immediately above the (Ni-Fe) layer is smaller, its initial permeability does not deteriorate to the left, making it possible to realize a double-layer tape for perpendicular magnetic recording with good performance. Furthermore, since these layers can be manufactured efficiently using the easily controlled sputtering method, a manufacturing method with high mass productivity can be realized. (Examples) The present invention will be described in detail below by way of examples with reference to the accompanying drawings.

第1図に本発明に係る垂直磁気記録二層媒体の基本構戒
を模式的に示す。第1図示構威をより詳細に説明すると
、まず、膜面内に磁化容易軸を有する低保磁力磁性層例
えばパーマロイ層(Ni−Fe)がポリイミドフィルム
からなる非磁性基板フィルム上に後述する対向ターゲッ
トスパッタ法により例えば0.075μmの厚さに被着
される。続いて膜而に垂直方向の磁化容易軸を有する磁
気記録層例えばCo−Cr層を被着するのであるが、本
発明ではこれを二段階にわけて被着する. すなわち第IN目のCo − Cr下地層はより小さい
飽和磁化50emu/cc〜200e+wu/ccを有
して0.05μ−の厚み以下に形戒され、第2層目のC
o − Cr上部層はより大きい飽和磁化200emu
/ccを越えて下地層の厚みとの和が0,15μmの厚
み以下に形成される。
FIG. 1 schematically shows the basic structure of the perpendicular magnetic recording dual-layer medium according to the present invention. To explain the structure shown in FIG. 1 in more detail, first, a low coercive force magnetic layer, such as a permalloy layer (Ni-Fe) having an axis of easy magnetization in the film plane, is placed on a non-magnetic substrate film made of a polyimide film, as described below. It is deposited to a thickness of, for example, 0.075 μm by target sputtering. Subsequently, a magnetic recording layer, such as a Co--Cr layer, having an axis of easy magnetization perpendicular to the film is deposited, but in the present invention, this is deposited in two stages. That is, the IN-th Co-Cr underlayer has a smaller saturation magnetization of 50 emu/cc to 200 e+wu/cc and is shaped to a thickness of 0.05 μ- or less, and the second layer C
The o-Cr top layer has a larger saturation magnetization of 200 emu
/cc and the sum of the thickness of the base layer is 0.15 μm or less.

これらの成膜條件は以下にのべる具体例でより詳細に説
明されるが、第1から第5までの具体例から同時に1層
目のCo−Criの適切な威膜條件が第3図示のパーマ
ロイ膜の初透磁率変化より求めることができる。第3図
はCo − Cr第lN目の飽和磁化をパラメータにそ
の戒長膜厚に対するバーマローf膜の初透磁率の変化を
示した実験曲線であるが、このデータ曲線よりCo−C
r第1層目の適切な戒膜條件は飽和磁化が50emu/
cc〜200emu/cc ,膜厚は初透磁率の膜厚に
対する飽和曲線より厚みの小さい所を取って0.05μ
謄以下と一応設定できる。
These film forming conditions will be explained in more detail in the specific examples given below, but at the same time, from the first to fifth specific examples, the appropriate film forming conditions for the first layer of Co-Cri are permalloy shown in the third figure. It can be determined from the initial magnetic permeability change of the film. Figure 3 is an experimental curve showing the change in the initial magnetic permeability of the Barmalow f film with respect to its predetermined film thickness using the lNth saturation magnetization of Co-Cr as a parameter.
rAppropriate film conditions for the first layer are saturation magnetization of 50 emu/
cc~200emu/cc, the film thickness is 0.05μ by taking the point where the thickness is smaller than the saturation curve of initial permeability versus film thickness.
It can be set as below.

(具体例l) バーマロイ の ターゲット: Ni−Fe (Ni : 80原子%、
スパッタアルゴン圧:ls+Torr 投入パワー    : 1,O kW Fe : 20原子%) 基板温度     :115゜C 膜厚       : 0.075μm飽和磁歪定数 
  : + 4 XIO−’1  のCo−Cr  の
 ’131 ターゲット: Co−Cr (Co : 67原子%、
Cr : 33原子%)スパッタアルゴン圧:1mTo
rr 投入パワー    : 1.0 kW 基板温度     : 115゜C 膜厚       : 0.015 〜0.075 μ
m飽和磁化     : 51 (emu/cc)2 
 のco−Cr,の ターゲット: Co−Cr (Co : 79原子%、
Cr : 21原子%)スパッタアルゴン圧: l m
Torr投入パワー    : 1.O kW 基板温度     :115゜C 膜厚:l層目のCo−Crと合わせて0.15μmにな
ること飽和磁化     : 514 (emu/cc
)(具体例2) 具体例lにおける、1層目のCo−Cr膜のターゲット
をCo : 70原子%、Cr : 30原子%、飽和
磁化を160 (e+wu/cc)とする. (具体例3) 具体例lにおける、11目のCo − Cr膜のターゲ
ットをCo : 73原子%、Cr : 27原子%、
飽和磁化を221 (emu/cc)とする。
(Specific example 1) Vermalloy target: Ni-Fe (Ni: 80 atomic%,
Sputtering argon pressure: ls+Torr Input power: 1,0 kW Fe: 20 atomic%) Substrate temperature: 115°C Film thickness: 0.075 μm Saturation magnetostriction constant
: +4 XIO-'1 of Co-Cr '131 Target: Co-Cr (Co: 67 atomic%,
Cr: 33 at%) Sputtering argon pressure: 1 mTo
rr Input power: 1.0 kW Substrate temperature: 115°C Film thickness: 0.015 to 0.075 μ
m Saturation magnetization: 51 (emu/cc)2
co-Cr, target: Co-Cr (Co: 79 atomic%,
Cr: 21 atomic%) Sputtering argon pressure: l m
Torr input power: 1. O kW Substrate temperature: 115°C Film thickness: 0.15 μm in total with Co-Cr in the 1st layer Saturation magnetization: 514 (emu/cc
) (Specific Example 2) In Specific Example 1, the target of the first layer Co--Cr film is Co: 70 atomic %, Cr: 30 atomic %, and the saturation magnetization is 160 (e+wu/cc). (Specific Example 3) In Specific Example 1, the target of the 11th Co-Cr film was Co: 73 at%, Cr: 27 at%,
The saturation magnetization is 221 (emu/cc).

(具体例4) 具体例lにおける、IN目のCo − Cr膜のターゲ
ットをCo : 76原子%、Cr : 24原子%、
飽和磁化を355 (emu/cc)−とする. (具体例5) 具体例lにおける、1層目のCo−Crl’Jのターゲ
ットをCo : 79原子%、Cr : 21原子%、
飽和磁化を514 (emu/cc)とする. 以上のようにして、膜厚0.075 μ−のパーマロイ
膜上に膜厚0.15μmの2層からなるCo − Cr
合金膜が形成される.これによってバーマロイ膜と飽和
磁化の小さい1層目のCo − Cr膜との間の磁気的
相互作用が弱まるため、パーマロイ膜の初透磁率を劣化
させないことができる。
(Specific Example 4) In Specific Example 1, the target of the IN-th Co-Cr film was Co: 76 at%, Cr: 24 at%,
The saturation magnetization is set to 355 (emu/cc). (Specific Example 5) In Specific Example 1, the first layer Co-Crl'J target was Co: 79 at%, Cr: 21 at%,
The saturation magnetization is set to 514 (emu/cc). As described above, a Co-Cr layer consisting of two layers with a film thickness of 0.15 μm was formed on a permalloy film with a film thickness of 0.075 μm.
An alloy film is formed. This weakens the magnetic interaction between the Vermalloy film and the first-layer Co-Cr film, which has a small saturation magnetization, so that the initial magnetic permeability of the Permalloy film can be prevented from deteriorating.

1層目と2層目のCo − Cr膜の飽和磁化の値を変
えるには、上記のように各層毎に同一m或の一対のター
ゲットを用いる以外に、第2図に示した対向ターゲット
スバッタ法のように対向した一対のターゲットをCo 
− Crターゲット1(Co:67原子%、Cr : 
33原子%)とCo − Crターゲット2(Co:7
9原子%、Cr : 21原子%)とする事により、飽
和磁化の小さい1層目のCo − Cr膜と飽和磁化の
大きい2層目のCo−CrHを一度に形戒することがで
きる。
To change the saturation magnetization value of the first and second Co-Cr films, in addition to using a pair of targets with the same m for each layer as described above, it is also possible to A pair of targets facing each other like a grasshopper method
- Cr target 1 (Co: 67 atomic%, Cr:
33 at%) and Co-Cr target 2 (Co:7
9 atomic %, Cr: 21 atomic %), the first layer of Co--Cr film with low saturation magnetization and the second layer of Co--CrH with high saturation magnetization can be combined at the same time.

第2図においてターゲッl−1の中心からその近傍のス
リットlを見込む角度をθ.、遠方のスリット2を見込
む角度をθ12、また他方のターゲット2の中心からそ
の近傍のスリット2を見込む角度をθ.、遠方のスリッ
ト1を見込む角度をθ2lとした時、θl2とθ.とが
常に零度となる形状のマクス5を配置する.このときマ
スク5をマスク4の円周に沿って動かせば、θ.とθ1
2が連動して変化し、スリット1とスリット2の幅が変
わることで1層目と2層目の膜厚を制御できる。膜厚計
8により、マスク5の位置とスパッタ投入ハワーを制御
すれば、IN目と2層目の膜厚を所望の厚さとすること
ができる。
In FIG. 2, the angle from the center of target l-1 to the slit l in its vicinity is θ. , the angle at which the distant slit 2 is viewed is θ12, and the angle at which the nearby slit 2 is viewed from the center of the other target 2 is θ. , when the angle at which the distant slit 1 is viewed is θ2l, θl2 and θ. Arrange a max 5 whose shape is always zero. At this time, if the mask 5 is moved along the circumference of the mask 4, θ. and θ1
2 changes in conjunction with each other, and by changing the widths of slit 1 and slit 2, the film thicknesses of the first and second layers can be controlled. By controlling the position of the mask 5 and the sputtering power using the film thickness gauge 8, the film thicknesses of the IN-th and second layers can be set to desired thicknesses.

この事を確認するために、第4図の様に対向した一対の
組或比の異なるGo − Crターゲッ}1(Co:7
3原子%、Cr : 27原子%)とターゲット2(C
O:79原子%、Cr : 21原子%)をスパッタし
たときの基板上の飽和磁化を調べた。
In order to confirm this, we prepared a pair of opposing Go-Cr targets with different composition ratios}1 (Co:7) as shown in Figure 4.
3 atomic%, Cr: 27 atomic%) and target 2 (C
The saturation magnetization on the substrate when sputtering O: 79 atomic %, Cr: 21 atomic %) was investigated.

土色迩υ劃i住 ターゲット1 : Co−Cr (Co : 73原子
%、Cr : 27原子%、飽和磁化22Hen+u/
cc) )ターゲット2 : Co−Cr (Co :
 79原子%、Cr : 21原子%、飽和磁化514
(es+u/cc) )ターゲットlとターゲット2と
の距idl:flewスバッタアルゴン圧: 1 sT
orr投入パワー    ? 1.0 kk 基板温度     =115℃ 膜厚       : 0.15μ曽 第5図にターゲット1とターゲット2との間に形成され
たCo − Crスパッタ膜の飽和磁化分布を示す。「
ターゲット1からの距離」とは第4図でターゲット1の
表面からターゲット2の方向に測った距離である。
Target 1: Co-Cr (Co: 73 atomic%, Cr: 27 atomic%, saturation magnetization 22Hen+u/
cc)) Target 2: Co-Cr (Co:
79 at%, Cr: 21 at%, saturation magnetization 514
(es+u/cc)) Distance between target 1 and target 2 idl:frew Spatter argon pressure: 1 sT
orr input power? 1.0 kk Substrate temperature = 115°C Film thickness: 0.15 μm Figure 5 shows the saturation magnetization distribution of the Co--Cr sputtered film formed between target 1 and target 2. "
"Distance from Target 1" is the distance measured from the surface of Target 1 in the direction of Target 2 in FIG.

第6図(a)は前記Ni−Fe (Ni : 80原子
%、Fe : 20原子%、飽和磁歪定数+4X10−
’)膜のテープ走行方向のM−Hループ(磁化曲線)、
第6図(ロ)は同じ膜のテープ走行方向に対して垂直方
向のM一Hルーブである.この図からテープ走行方向に
対して垂直方向が磁化容易軸となっていることがわかる
FIG. 6(a) shows the Ni-Fe (Ni: 80 at%, Fe: 20 at%, saturation magnetostriction constant +4X10-
') M-H loop (magnetization curve) in the tape running direction of the film,
Figure 6 (b) shows the M-H lube of the same film in the direction perpendicular to the tape running direction. It can be seen from this figure that the direction perpendicular to the tape running direction is the axis of easy magnetization.

また第6図(C)はNi−Pe (Ni : 84原子
%、Pe : 16原子%、飽和磁歪定数−7X10−
’)膜のテープ走行方向のM−Hループ、第6図(d)
は同じ膜のテープ走行方向に対して垂直方向のM−Hル
ープである。この図からテープ走行方向が磁化容易軸と
なっている. さらにパーマロイ層の飽和磁歪定数を+2×10から+
1×10−’程度にする事で、バーマロイ層の磁化容易
軸が膜面内にあり、かつテープ走行方向に対して60度
から120度の範囲とする事ができた.以上実施例によ
り本発明に係る二層媒体及びその製造方法について詳細
に述べてきたが、本発明はこれに限定されることなく、
本発明の要旨を逸脱することなく各種の変形、変更の可
能なことは自明であろう。
Further, Fig. 6(C) shows Ni-Pe (Ni: 84 at%, Pe: 16 at%, saturation magnetostriction constant -7X10-
') M-H loop in the tape running direction of the membrane, Figure 6(d)
is the M-H loop of the same film in the direction perpendicular to the tape running direction. From this figure, the tape running direction is the axis of easy magnetization. Furthermore, the saturation magnetostriction constant of the permalloy layer is increased from +2×10 to +
By setting the magnetic field to about 1×10-', the axis of easy magnetization of the vermalloy layer was within the film plane and within the range of 60 degrees to 120 degrees with respect to the tape running direction. Although the two-layer medium and the manufacturing method thereof according to the present invention have been described in detail through Examples above, the present invention is not limited thereto.
It will be obvious that various modifications and changes can be made without departing from the spirit of the invention.

(発明の効果) 以上詳細に説明してきたように、本発明によれば、垂直
磁気記録用二層媒体の膜面内に磁化容易軸を有する低保
磁力磁性層パーマロイ膜の膜厚を0.05μmから0.
1 μmと薄<シてもその初透磁率を劣化させることな
く、その上に膜面に垂直方向の磁化容易軸を有する磁気
記録磁性層Co−Cr股を設けることができるので、二
層膜全体の膜厚を0.25μm以下に押えることができ
て高密度記録の可能な狭トラック化、広帯域化および高
C/N化が満足される垂直磁気記録媒体が得られる。
(Effects of the Invention) As described above in detail, according to the present invention, the film thickness of the low coercive force magnetic layer permalloy film having an axis of easy magnetization in the film plane of a two-layer medium for perpendicular magnetic recording is reduced to 0. 0.05μm to 0.05μm
Even if the thickness is as thin as 1 μm, the magnetic recording magnetic layer Co-Cr having an axis of easy magnetization perpendicular to the film surface can be provided thereon without deteriorating its initial magnetic permeability. A perpendicular magnetic recording medium can be obtained in which the total film thickness can be suppressed to 0.25 μm or less, and which satisfies the requirements of narrow tracks, wide band, and high C/N that enable high-density recording.

また本発明製造方法によれば比較的制御の容易な対向タ
ーゲットスパッタ法がこの製造法に適用でき、かつCo
 − Cr層の下地層と上部層が一対のターゲットを2
つの異なった組成のターゲットとし、可動マスクを使用
制御することにより2IWの飽和磁化と膜厚が容易に制
御できるので量産性の高い製造方法を提供することがで
きる。
Furthermore, according to the manufacturing method of the present invention, the facing target sputtering method, which is relatively easy to control, can be applied to this manufacturing method, and Co
- The base layer and the upper layer of the Cr layer have a pair of targets.
By using targets with two different compositions and controlling the use of a movable mask, the saturation magnetization and film thickness of 2IW can be easily controlled, making it possible to provide a manufacturing method with high mass productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る垂直磁気記録媒体の模式的略構戊
図を示し、 第2図はCo − CrのIN目と2層目を一対のター
ゲットで同時に作製できる本発明に係る対向ターゲット
スパッタ装置の模式図を示し、 第3図はl層目のCo − Cr膜の飽和磁化を51〜
514(emu/cc)と変化させたときのパーマロイ
膜の初透磁率対l層目のCo − Cr膜厚の実験デー
タを示し、第4図は対向した一対の組成比の異なるCo
 − Crターゲットと基板フィルムの模式図を示し、
第5図は対向した一対の組成比の異なるCo − Cr
ターゲット間に形戊されたCo−Crスパッタ膜の飽和
磁化分布を示し、 第6図(a)〜(d)は飽和磁歪定数の異なるパーマロ
イ膜の磁化曲線を示す。 A・・・基板フィルム   C・・・1層目のCo −
 CrB・・・パーマロイ層   D・・・2層目のC
o − Cr1 ”・Co−Crターゲット1(Co:
67原子%、Cr : 33原子%)2 ・・・Co−
Crターゲット2(Cos79原子%、Cr : 21
原子%)3・・・パーマロイターゲット(Ni:80原
子%、Fe : 20原子%4・・・マスク     
 5・・・移動マスク6・・・スリットl     7
・・・スリット28・・・膜厚計      9・・・
供給ローラ10・・・巻取リローラ   11・・・基
板フイルム12・・・キャン 13・・・CO−Crターゲット1(Co:73原子%
、Cr : 27原子%)14・・・Co−Crターゲ
ット2(Co:79原子%、Cr : 21原子%)1
5・・・基板フィルム ) @1図 未ダ’jJArs債5重為磁気記斜■叢イ本ク線N的M
鎮^図第3図 第4図 l5 某4反方ルム
FIG. 1 shows a schematic structural diagram of a perpendicular magnetic recording medium according to the present invention, and FIG. 2 shows a facing target according to the present invention in which the IN layer and the second layer of Co-Cr can be simultaneously produced using a pair of targets. A schematic diagram of the sputtering apparatus is shown, and FIG. 3 shows the saturation magnetization of the l-th Co-Cr film at
514 (emu/cc) and the experimental data of the initial magnetic permeability of the permalloy film versus the Co-Cr film thickness of the 1st layer.
- shows a schematic diagram of a Cr target and a substrate film,
Figure 5 shows a pair of facing Co-Cr with different composition ratios.
The saturation magnetization distribution of a Co--Cr sputtered film formed between targets is shown, and FIGS. 6(a) to 6(d) show magnetization curves of permalloy films having different saturation magnetostriction constants. A... Substrate film C... First layer Co −
CrB...Permalloy layer D...Second layer C
o-Cr1”・Co-Cr target 1 (Co:
67 atomic%, Cr: 33 atomic%)2...Co-
Cr target 2 (Cos 79 atomic%, Cr: 21
atomic%) 3... Permalloy target (Ni: 80 atomic%, Fe: 20 atomic% 4... Mask
5...Moving mask 6...Slit l 7
...Slit 28...Film thickness gauge 9...
Supply roller 10... Take-up reroller 11... Substrate film 12... Can 13... CO-Cr target 1 (Co: 73 atomic%
, Cr: 27 atomic%) 14...Co-Cr target 2 (Co: 79 atomic%, Cr: 21 atomic%) 1
5...Substrate film)
Chin^ Figure 3 Figure 4 Figure 15 A certain 4-sided lum

Claims (1)

【特許請求の範囲】 1、非磁性基板上の膜面内に磁化容易軸を有する低保磁
力磁性層と膜面に垂直方向の磁化容易軸を有する磁気記
録磁性層を順次形成してなる磁気記録媒体において、 前記磁気記録磁性層が飽和磁化のより小さ い下地層と飽和磁化のより大きい上部層とからなること
を特徴とする垂直磁気記録二層媒体。 2、前記磁気記録磁性層の下地層の厚さと下地層および
上部層の厚さの和とがそれぞれ0.05μm以下および
0.15μm以下であることを特徴とする請求項1記載
の垂直磁気記録二層媒体。 3、前記磁気記録磁性層の下地層の飽和磁化および上部
層の飽和磁化がそれぞれ50emu/ccから200e
mu/ccまでおよび200emu/ccを越えたもの
であることを特徴とする請求項1または2記載の垂直磁
気記録二層媒体。 4、前記膜面内に磁化容易軸を有する低保磁力磁性層の
厚みが0.05μmから0.1μmまでであることを特
徴とする請求項1から3いずれかに記載の垂直磁気記録
二層媒体。 5、前記膜面内に磁化容易軸を有する低保磁力磁性層の
前記磁化容易軸がテープ走行方向に対し60度から12
0度の範囲にあることを特徴とする請求項1から4いず
れかに記載の垂直磁気記録二層媒体。 6、前記膜面内に磁化容易軸を有する低保磁力磁性層の
飽和磁歪定数λ_sが+2×10^−^7から+1×1
0^−^6までであることを特徴とする請求項1から5
いずれかに記載の垂直磁気記録二層媒体。 7、請求項1から6いずれかに記載の垂直磁気記録二層
媒体を製造するにあたり、順次に形成される低保磁力磁
性層及び磁気記録磁性層がスパッタリング法により形成
されることを特徴とする垂直磁気記録二層媒体の製造方
法。 8、前記磁気記録磁性層の下地層と上部層とが対向ター
ゲットスパッタ装置の一対のターゲットの強磁性材料の
組成をそれぞれ変えることにより引続く順次に形成され
ることを特徴とする請求項7記載の垂直磁気記録二層媒
体の製造方法。 9、前記一対のターゲットの一方のターゲット1の中心
からその近傍のスリット1を見込む角度をθ_1_1遠
方のスリット2を見込む角度をθ_1_2とし、前記一
対のターゲットの他方のターゲット2の中心からその近
傍のスリット2を見込む角度をθ_2_2遠方のスリッ
ト1を見込む角度をθ_2_1とした時、θ_1_2と
θ_2_1とを常に零度とするマスクを配設し、そのマ
スクの位置を変えることにより、θ_1_1とθ_2_
2とを連動して変化させ前記下地層の膜厚と前記上部層
の膜厚とを制御することを特徴とする請求項8記載の垂
直磁気記録二層媒体の製造方法。
[Claims] 1. A magnetic field formed by sequentially forming a low coercive force magnetic layer having an easy axis of magnetization in the film plane on a non-magnetic substrate and a magnetic recording magnetic layer having an easy axis of magnetization perpendicular to the film plane. A two-layer perpendicular magnetic recording medium, characterized in that the magnetic recording layer comprises an underlayer with a lower saturation magnetization and an upper layer with a higher saturation magnetization. 2. Perpendicular magnetic recording according to claim 1, wherein the thickness of the underlayer of the magnetic recording magnetic layer and the sum of the thicknesses of the underlayer and the upper layer are 0.05 μm or less and 0.15 μm or less, respectively. Dual layer media. 3. The saturation magnetization of the underlayer and the upper layer of the magnetic recording magnetic layer are each from 50 emu/cc to 200 e
The perpendicular magnetic recording dual-layer medium according to claim 1 or 2, characterized in that the perpendicular magnetic recording dual-layer medium has a magnetic flux up to mu/cc and exceeding 200 emu/cc. 4. The perpendicular magnetic recording double layer according to any one of claims 1 to 3, wherein the low coercive force magnetic layer having an easy axis of magnetization in the film plane has a thickness of 0.05 μm to 0.1 μm. Medium. 5. The easy axis of magnetization of the low coercive force magnetic layer having an easy axis of magnetization in the film plane is between 60 degrees and 12 degrees with respect to the tape running direction.
5. The perpendicular magnetic recording dual-layer medium according to claim 1, wherein the perpendicular magnetic recording dual-layer medium is in a range of 0 degrees. 6. The saturation magnetostriction constant λ_s of the low coercive force magnetic layer having an easy axis of magnetization in the film plane is from +2×10^-^7 to +1×1
Claims 1 to 5 characterized in that the range is 0^-^6.
The perpendicular magnetic recording dual-layer medium according to any one of the above. 7. In manufacturing the perpendicular magnetic recording dual-layer medium according to any one of claims 1 to 6, the low coercive force magnetic layer and the magnetic recording magnetic layer formed in sequence are formed by a sputtering method. A method for manufacturing a perpendicular magnetic recording dual-layer medium. 8. The underlayer and the upper layer of the magnetic recording magnetic layer are formed successively by changing the compositions of the ferromagnetic materials of a pair of targets in a facing target sputtering device, respectively. A method for manufacturing a perpendicular magnetic recording dual-layer medium. 9. The angle from the center of one target 1 of the pair of targets to the slit 1 in its vicinity is θ_1_1, the angle to view the far slit 2 is θ_1_2, and the angle from the center of the other target 2 of the pair of targets to the nearby slit 1 is θ_1_1 If the angle at which the slit 2 is viewed is θ_2_2 and the angle at which the distant slit 1 is viewed is θ_2_1, then by providing a mask that always sets θ_1_2 and θ_2_1 at zero degrees and changing the position of the mask, θ_1_1 and θ_2_
9. The method of manufacturing a perpendicular magnetic recording dual-layer medium according to claim 8, wherein the thickness of the underlayer and the thickness of the upper layer are controlled by changing the thickness of the underlayer and the upper layer in conjunction with each other.
JP1299743A 1989-11-20 1989-11-20 Method of manufacturing perpendicular magnetic recording double layer medium Expired - Fee Related JP2798745B2 (en)

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Application Number Priority Date Filing Date Title
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JP2798745B2 JP2798745B2 (en) 1998-09-17

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0661695A2 (en) * 1993-12-28 1995-07-05 TDK Corporation Magnetic recording medium
US7862913B2 (en) 2006-10-23 2011-01-04 Hitachi Global Storage Technologies Netherlands B.V. Oxide magnetic recording layers for perpendicular recording media
US7901801B2 (en) 2007-07-04 2011-03-08 Kabushiki Kaisha Toshiba Perpendicular magnetic recording medium and magnetic recording apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63201912A (en) * 1987-02-18 1988-08-22 Hitachi Ltd Magnetic recording medium and its production

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63201912A (en) * 1987-02-18 1988-08-22 Hitachi Ltd Magnetic recording medium and its production

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0661695A2 (en) * 1993-12-28 1995-07-05 TDK Corporation Magnetic recording medium
EP0661695A3 (en) * 1993-12-28 1996-09-18 Tdk Corp Magnetic recording medium.
KR100238342B1 (en) * 1993-12-28 2000-01-15 사토 히로시 Magnetic recording medium
US7862913B2 (en) 2006-10-23 2011-01-04 Hitachi Global Storage Technologies Netherlands B.V. Oxide magnetic recording layers for perpendicular recording media
US7901801B2 (en) 2007-07-04 2011-03-08 Kabushiki Kaisha Toshiba Perpendicular magnetic recording medium and magnetic recording apparatus

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