JPH03153388A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JPH03153388A
JPH03153388A JP1291304A JP29130489A JPH03153388A JP H03153388 A JPH03153388 A JP H03153388A JP 1291304 A JP1291304 A JP 1291304A JP 29130489 A JP29130489 A JP 29130489A JP H03153388 A JPH03153388 A JP H03153388A
Authority
JP
Japan
Prior art keywords
elements
recording
recording medium
optical recording
recording layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1291304A
Other languages
Japanese (ja)
Inventor
Yutaka Ueda
裕 上田
Toru Yashiro
徹 八代
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP1291304A priority Critical patent/JPH03153388A/en
Publication of JPH03153388A publication Critical patent/JPH03153388A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a phase changing recording material with high sensitivity and excellent anti-humidity properties by using an element which is defined to a specified range as an average composition of a recording layer in a film thickness direction. CONSTITUTION:The average composition atomic % of a recording layer in a film thickness direction is expressed by a formula. In the formula, 50<=alpha<=90, 5<=x<=30, 0<=y<=20, 0<=z<=20, alpha+x+y+z=100 deg.C, A is one or more elements selected from group IV b elements; and B is one or more elements selected from among groups IVa, Va and VIa elements. For example, A is Ge, Sn and PbB is Ti, Zr, V, Cr. The crystal temperature of a Sb and Cu series is increased by adding group Nb element to the series and the amorphous phase becomes more stable. The anti-humidity properties of the series are improved by adding groups IVa, Va and VIa elements.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は相変化型光記録媒体、特に、耐湿性の優れた光
記録媒体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a phase change optical recording medium, and particularly to an optical recording medium with excellent moisture resistance.

[従来の技術] 相変化型記録媒体の発明は非常に多数であるがTeを主
成分とするものが多い。
[Prior Art] There are many inventions of phase change recording media, and many of them contain Te as a main component.

最も古いものでは特公昭41−28891号公報にTe
−Ge系、As−Te−Ge系、Te−0系等が開示さ
れている。比較的最近の代表的なものとして特開昭63
−225H4号公報に示されているxGeTe (1−
x)SbzTe3を挙げることができる。
The oldest one is Te Kokoku No. 41-28891
-Ge type, As-Te-Ge type, Te-0 type, etc. are disclosed. A relatively recent representative example is JP-A-63.
xGeTe (1-
x) SbzTe3.

相変化を利用した光記録は記録膜の変形を伴わないため
、2枚のディスクを直接貼り合わせた両面ディスクや記
録膜の上に直接保護層を設けた単板ディスクができると
いう長所をもっている。
Optical recording using phase change does not involve deformation of the recording film, so it has the advantage of being able to produce double-sided discs made by directly bonding two discs together, or single-disc discs in which a protective layer is provided directly on the recording film.

ディスクの層構成は単板ディスクを例にとると、第2図
に示すように基板上に誘電体層、記録層、誘電体層を順
次積層した構成をとるのが一般的になっている。これは
記録層を堅牢な誘電体で挾むことにより記録消去の工程
で記録層が変形するのを防ぐためである。この誘電体層
は吸湿防止層ともなるため、ディスクの耐湿性も良好な
ものとなる。
Taking a single-plate disk as an example, the typical layer structure of a disk is such that a dielectric layer, a recording layer, and a dielectric layer are sequentially laminated on a substrate as shown in FIG. This is to prevent the recording layer from being deformed during the recording/erasing process by sandwiching the recording layer between strong dielectric materials. Since this dielectric layer also serves as a moisture absorption prevention layer, the disk also has good moisture resistance.

ところでアモルファス−結晶間の可逆的相変化のうちア
モルファス相から結晶相への変化は高感度であるため、
これのみを利用して高感度追記型ディスクとすることが
可能である。この場合誘電体による挟持は不要であり、
低コストの追記型ディスクとするためにも例えば第1図
に示すように樹脂成形基板に直接記録層を設けた構成が
望ましい。この場合吸湿防止層がないため、記録層自体
の耐湿性が重要になる。
By the way, among the reversible phase changes between amorphous and crystal, the change from an amorphous phase to a crystalline phase is highly sensitive, so
By utilizing only this, it is possible to create a high-sensitivity write-once type disc. In this case, there is no need for dielectric sandwiching,
In order to obtain a low-cost write-once disc, it is desirable to have a structure in which a recording layer is directly provided on a resin-molded substrate, as shown in FIG. 1, for example. In this case, since there is no moisture absorption prevention layer, the moisture resistance of the recording layer itself is important.

さて、これまで種々提案されてきた相変化材料はTeを
主成分とするものが多い。Teは半導体レーザー波長域
での吸収が大きく、又アモルファス相が形成されやすい
ため、相変化型記録材に適している。しかしTe単独で
は結晶化温度が低すぎるため室温でアモルファス相が不
安定である。そこで種々の元素との組合せが試みられ、
記録、再生特性については非常に優れた材料が得られて
きている(特開昭63−225934)。
Now, many of the various phase change materials that have been proposed so far have Te as a main component. Te has a large absorption in the semiconductor laser wavelength range, and an amorphous phase is easily formed, so it is suitable for a phase change recording material. However, since the crystallization temperature of Te alone is too low, the amorphous phase is unstable at room temperature. Therefore, combinations with various elements were tried,
Materials with very excellent recording and reproducing properties have been obtained (Japanese Patent Laid-Open No. 63-225934).

ところがTeの耐湿性が悪いため、第2図のようなディ
スク構成はとれるが、第1図のような低コストの構成で
は信頼性が確保できないという問題がある。
However, since Te has poor moisture resistance, although a disk configuration as shown in FIG. 2 can be used, there is a problem in that reliability cannot be ensured with a low-cost configuration as shown in FIG. 1.

[発明が解決しようとする課題] 本発明は耐湿性に優れた相変化型記録材料を提供しよう
とするものである。
[Problems to be Solved by the Invention] The present invention aims to provide a phase change recording material with excellent moisture resistance.

[課題を解決するための手段] 本発明において記録層の主成分はsbである。[Means to solve the problem] In the present invention, the main component of the recording layer is sb.

sbはTeと似て、半導体レーザー波長域での吸収が大
きく、かつアモルファス相が形成されやすい。そして、
耐湿性はTeに比較するとかなり良好である。Sbも単
独では結晶化温度が低すぎアモルファス相が不安定とな
るため、添加元素によりアモルファス相の安定化をする
必要がある。本発明者らは種々の元素とsbとの組合せ
で記録膜を作製し、その記録特性を調べた。この場合、
いわゆるas −depoの膜はアモルファス相であり
、この状態を未記録状態として、レーザー光照射により
結晶相の記録マークを形成する結晶化記録方式を用いて
評価した。
Similar to Te, sb has large absorption in the semiconductor laser wavelength range and is likely to form an amorphous phase. and,
Moisture resistance is quite good compared to Te. If Sb is used alone, the crystallization temperature will be too low and the amorphous phase will become unstable, so it is necessary to stabilize the amorphous phase by adding elements. The present inventors produced recording films using combinations of various elements and sb, and investigated their recording characteristics. in this case,
The so-called as-depo film is in an amorphous phase, and this state was treated as an unrecorded state and evaluated using a crystallization recording method in which recording marks of a crystalline phase are formed by laser beam irradiation.

その結果はとんどの場合記録と同時にノイズレベルが増
加してしまい、信号振幅が大きい割1: C/ Nが悪
かった。しかし添加元素にCuを選んだ時のみ特異的に
ノイズレベルの増加がないという現象を見出した。そこ
で記録層の第2の必須成分はCuである。sbとCuの
系にIVb族元素を添加することにより系の結晶化温度
が上昇しアモルファス相がより安定となる。
The result was that in most cases the noise level increased at the same time as recording, and the C/N ratio was poor considering the signal amplitude was large. However, we have found a phenomenon in which the noise level does not specifically increase only when Cu is selected as the additive element. Therefore, the second essential component of the recording layer is Cu. By adding a group IVb element to the sb and Cu system, the crystallization temperature of the system increases and the amorphous phase becomes more stable.

又、sbとCuの系にNa%Va、Via族元素を添加
すると系の耐湿性がより゛向上する。以上のことから本
発明は記録層の膜厚方向の平均組成(原子%)が下記一
般式で表わされることを特徴とする光記録媒体である。
Furthermore, when Na%Va and Via group elements are added to the sb and Cu system, the moisture resistance of the system is further improved. Based on the above, the present invention is an optical recording medium characterized in that the average composition (atomic %) of the recording layer in the film thickness direction is expressed by the following general formula.

二股式〕 ・ i Sb、Cux AY Bz [ただし、5G≦a ≦90. 5≦x ≦30.  
O≦y ≦20.0≦2≦20、a + x + y 
+ z m 100 、 AはlVb族元素から選ばれ
る一つ以上の元素1、BはIVaSVas Via族元
素から選ばれる少くとも一つ以上の元素を表わす]。
Two-pronged type] ・i Sb, Cux AY Bz [However, 5G≦a≦90. 5≦x≦30.
O≦y≦20.0≦2≦20, a + x + y
+ z m 100 , A represents one or more elements 1 selected from the lVb group elements, B represents at least one or more elements selected from the IVaSVas Via group elements].

上記構成により高感度でがっ耐湿性に優れた相変化型記
録材料が得られることを見出し本発明に到ったものであ
る。
The inventors have discovered that the above structure provides a phase change recording material with high sensitivity and excellent moisture resistance, leading to the present invention.

上記一般式において、αが50未満では充分な記録感度
が得られず、90を越えるとアモルファス相が不安定と
なる。
In the above general formula, if α is less than 50, sufficient recording sensitivity cannot be obtained, and if it exceeds 90, the amorphous phase becomes unstable.

Xが5未満では既に述べたCuによるノイズレベル増加
の抑制効果が不充分となり、3oを越えると記録感度が
低下する。
If X is less than 5, the effect of suppressing the increase in noise level due to Cu as described above will be insufficient, and if it exceeds 3o, recording sensitivity will decrease.

y、zがそれぞれは20を越えるとやはり記録感度が低
下する。
When y and z each exceed 20, the recording sensitivity also decreases.

記録層の形成は真空蒸着、スパッタリング等で行うこと
ができる。真空蒸着においては複数の蒸着源からの共蒸
着を行うのが組成制御の面から望ましい。又、スパッタ
リングにおいては所望の組成の合金ターゲットを用いて
も、あるいは各組成に応じた面積比で各元素のチップを
モザイク状に組合せた複合ターゲットを用いてもよい。
The recording layer can be formed by vacuum deposition, sputtering, or the like. In vacuum evaporation, it is desirable to perform co-evaporation from a plurality of evaporation sources from the viewpoint of composition control. Further, in sputtering, an alloy target having a desired composition may be used, or a composite target may be used in which chips of each element are combined in a mosaic shape at an area ratio according to each composition.

記録層の膜厚は100〜300G! 、好ましくは30
0〜2000人である。
The thickness of the recording layer is 100~300G! , preferably 30
0 to 2000 people.

基板材料としてはポリカーボネート、PMMA1ポリオ
レフィン、エポキシ等の透明樹脂あるいはガラスを用い
ることができる。基板表面にはトラッキング用案内溝や
案内ビット、更にはアドレス信号などのプリフォーマッ
トが形成されていてもよい。
As the substrate material, polycarbonate, PMMA1 polyolefin, transparent resin such as epoxy, or glass can be used. Tracking guide grooves, guide bits, and preformats such as address signals may be formed on the substrate surface.

記録層の上に適宜保護層を設けることが可能でその材料
例としては、SiO,5iOz、TiO2,5i3Nn
、ZnS等の無機化合物、ポリカーボネート、アクリル
、ポリアミド、エポキシ、ポリオレフィンその他の樹脂
材料等が使用できる。アクリル系あるいはエポキシ系の
紫外線硬化型樹脂も好適な材料例である。上記の各材料
を単独で用いてもよいし複数を混合あるいは積層して用
いてもよい。
A protective layer can be suitably provided on the recording layer, and examples of the material include SiO, 5iOz, TiO2, 5i3Nn.
, inorganic compounds such as ZnS, polycarbonate, acrylic, polyamide, epoxy, polyolefin, and other resin materials can be used. Acrylic or epoxy ultraviolet curing resins are also suitable examples of materials. Each of the above materials may be used alone, or a plurality of them may be mixed or laminated.

保護層の厚さは特に制限はなく、耐擦傷性を重視する場
合には厚くするなど目的に応じ適当に選べばよい。
The thickness of the protective layer is not particularly limited, and may be appropriately selected depending on the purpose, such as increasing the thickness if scratch resistance is important.

又、基板と記録層の間に必要に応じて下引層を設けても
よいのはもちろんである。
It goes without saying that an undercoat layer may be provided between the substrate and the recording layer, if necessary.

[実施例] 以下、実施例によって本発明を具体的に説明する。[Example] Hereinafter, the present invention will be specifically explained with reference to Examples.

実施例1 トラッキング用案内溝付きのポリカーボネート射出成形
基板上にスパッタリング法によりその組成がほぼSb 
、5Cu 15G e 5 T i Bなる記録層を約
700人の厚さに設けた。
Example 1 Sputtering was performed on a polycarbonate injection molded substrate with a tracking guide groove, the composition of which was approximately Sb.
, 5Cu 15G e 5 Ti B was formed to a thickness of about 700 mm.

この媒体を光デイスクテスタに装着し、レーザー光波長
780ns、 N、A、0.5、線速度11.3Iil
s e c、記録信号周波数3.7MHz、記録光パワ
ー5 s Vs再生光パワー0.5mWの条件で記録再
生し、そのC/N (バンド幅30kHz)を測定した
This medium was installed in an optical disk tester, and the laser beam wavelength was 780 ns, N, A, 0.5, and linear velocity was 11.3 Iil.
Recording and reproduction were performed under the following conditions: sec, recording signal frequency of 3.7 MHz, recording light power of 5 s Vs, reproduction light power of 0.5 mW, and the C/N (bandwidth of 30 kHz) was measured.

更にこの媒体を60℃、90%RHの環境に30日間保
存した後、再度上記の条件でC/Nを測定した。
Furthermore, after storing this medium in an environment of 60° C. and 90% RH for 30 days, the C/N was measured again under the above conditions.

実施例2〜7 記録層組成をそれぞれ S b BCu rsG e 5 Z r BS  b
  6sCu  ssG  e  5  V  15S
b6sCussGe5 Crys SbssCutsSns Ties S b 65Cu 15P b 5 T i 1sS 
b 6sCu  +5T  i  2gとした以外は実
施例1と同じ条件で光記録媒体を作製し、同じ条件で試
験をした。
Examples 2 to 7 Recording layer compositions S b BCursG e 5 Z r BS b
6sCu ssG e 5 V 15S
b6sCussGe5 Crys SbssCutsSns Ties S b 65Cu 15P b 5 T i 1sS
b An optical recording medium was produced under the same conditions as in Example 1, except that 2 g of 6sCu +5T i was used, and tested under the same conditions.

実施例8 実施例1において記録層上に更にZnSの保護層を約2
000 A設けた以外は実施例1と同じ条件で光記録媒
体を作製し、同じ条件で試験をした。
Example 8 In Example 1, a protective layer of ZnS was further added on the recording layer by approximately 2
An optical recording medium was produced under the same conditions as in Example 1 except that 000 A was provided, and tested under the same conditions.

実施例9 実施例1において記録層上に更にエポキシ系の紫外線硬
化型樹脂保護層を約5μ謹設けた以外は実施例1と同じ
条件で光記録媒体を作製し、同じ条件で試験をした。
Example 9 An optical recording medium was prepared under the same conditions as in Example 1, except that an epoxy ultraviolet curable resin protective layer of about 5 μm was further provided on the recording layer in Example 1, and tested under the same conditions.

比較例1 実施例1において記録層組成をGe2゜sb、。Comparative example 1 In Example 1, the recording layer composition was Ge2°sb.

・T e 、6とした以外は実施例1と同じ条件で光記
録媒体を作製し、同じ条件で試験をした。
- An optical recording medium was produced under the same conditions as in Example 1, except that T e was 6, and tested under the same conditions.

比較例2 比較例1において記録層上に更にZnSの保護層を約2
000人設けた以外は比較例1と同じ条件で光記録媒体
を作製し、同じ条件で試験をした。
Comparative Example 2 In Comparative Example 1, a protective layer of ZnS was further added on the recording layer by approximately 2
An optical recording medium was produced under the same conditions as in Comparative Example 1, except that the number of participants was 1,000, and the test was conducted under the same conditions.

比較例3 比較例1において記録層上に更にエポキシ系の紫外線硬
化型樹脂の保護層を約5μm設けた以外は比較例1と同
じ条件で光記録媒体を作製し、同じ条件で試験をした。
Comparative Example 3 An optical recording medium was prepared under the same conditions as in Comparative Example 1, except that a protective layer of epoxy ultraviolet curable resin with a thickness of about 5 μm was further provided on the recording layer in Comparative Example 1, and tested under the same conditions.

評価結果を表−1に示す。The evaluation results are shown in Table-1.

表−1 第1図は本発明の光記録媒体の構成の一例を示す、断面
の模式図、 第2図は従来の光記録媒体の構成を示す断面の模式図で
ある。
Table 1 FIG. 1 is a schematic cross-sectional view showing an example of the structure of the optical recording medium of the present invention. FIG. 2 is a schematic cross-sectional view showing the structure of a conventional optical recording medium.

l・・・紫外線硬化樹脂層、2・・・記録層、訃・・基
板、4・・・誘電体層。
l...ultraviolet curing resin layer, 2...recording layer, 2...substrate, 4...dielectric layer.

Claims (3)

【特許請求の範囲】[Claims] (1)記録層の膜厚方向の平均組成(原子%)が下記一
般式で表わされることを特徴とする光記録媒体。 一般式 Sb_αCu_XA_YB_Z ただし、 50≦α≦90 5≦x≦30 0≦y≦20 0≦z≦20 α+x+y+z=100 AはIVb族元素から選ばれる一つ以上の元 素、 BはIVa、Va、VIa族元素から選ばれる 一つ以上の元素を表わす。
(1) An optical recording medium characterized in that the average composition (atomic %) of the recording layer in the film thickness direction is represented by the following general formula. General formula Sb_αCu_XA_YB_Z However, 50≦α≦90 5≦x≦30 0≦y≦20 0≦z≦20 α+x+y+z=100 A is one or more elements selected from group IVb elements, B is group IVa, Va, VIa group Represents one or more elements selected from the elements.
(2)一般式中のAで表わされる元素がGe、Sn、P
bの中の一つ以上の元素であることを特徴とする請求項
(1)記載の光記録媒体。
(2) The element represented by A in the general formula is Ge, Sn, P
The optical recording medium according to claim 1, wherein the optical recording medium is one or more elements of b.
(3)一般式中のBで表わされる元素がTi、Zr、V
、Crの中の一つ以上の元素であることを特徴とする請
求項(1)又は(2)記載の光記録媒体。
(3) The element represented by B in the general formula is Ti, Zr, V
, Cr. , Cr.
JP1291304A 1989-11-10 1989-11-10 Optical recording medium Pending JPH03153388A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1291304A JPH03153388A (en) 1989-11-10 1989-11-10 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1291304A JPH03153388A (en) 1989-11-10 1989-11-10 Optical recording medium

Publications (1)

Publication Number Publication Date
JPH03153388A true JPH03153388A (en) 1991-07-01

Family

ID=17767162

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1291304A Pending JPH03153388A (en) 1989-11-10 1989-11-10 Optical recording medium

Country Status (1)

Country Link
JP (1) JPH03153388A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6960421B2 (en) 2002-03-08 2005-11-01 Ricoh Company, Ltd. Optical recording medium and fabricating method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6960421B2 (en) 2002-03-08 2005-11-01 Ricoh Company, Ltd. Optical recording medium and fabricating method thereof

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